Double-parallel-wire-core data cable manufacturing method and double-parallel-wire-core data cable

Abstract

The invention discloses a double-parallel-wire-core data cable manufacturing method and a double-parallel-wire-core data cable, and the manufacturing method comprises the steps: selecting wire cores with the same quality and the same specification, and forming a transition layer through a composite technology; synchronously coating an insulating layer with meshing lines; under the action of an electric field, the non-contact calibration wire core is parallel and embedded with the lines; constructing a shielding structure of the compact metal layer and the gradient fiber layer; interlayer interface bonding is strengthened through plasma; manufacturing an outer sheath with a micro supporting structure by a micro-foaming process; the magnetic field and vibration synergistically cure the outer sheath; the residual stress is released in multiple dimensions; and dynamic performance verification. The cable comprises parallel and consistent cable cores, a transition layer, an insulating layer with meshing lines, a gradient shielding structure and an outer sheath with a miniature support. According to the invention, the problems of cable core calibration damage and weak interlayer combination in the traditional technology are solved, the transmission stability and durability of the cable are improved, and the cable is composed of two parallel cable cores and is formed without twisting.

Description

TECHNICAL FIELD

[0001] The present application belongs to the technical field of intelligent power grid data cable, and particularly relates to a double-parallel-core data cable manufacturing method and double-parallel-core data cable. BACKGROUND

[0002] In the field of intelligent power grid data cable, especially in specific application scenarios, the structure of double-core data cable is mainly the traditional twisted cable, which forms a spiral structure by twisting two cores together, and reduces signal crosstalk through twisting; another type is the parallel-core cable that has appeared in recent years, which adopts a structure of two parallel cores to meet the requirement of consistent line impedance in high-frequency signal transmission.

[0003] However, the manufacturing process of the existing parallel-core cable has significant technical problems: Contradiction between parallelism control and structural stability: In the manufacturing of the existing parallel-core cable, the parallel positioning of the cores mainly depends on mechanical clamps or guide wheels, which can easily cause abrasion of the surface insulation layer of the cores. In addition, during subsequent shielding and sheath forming processes, the cores are prone to relative displacement due to material shrinkage or external forces, which can damage the parallel precision and affect the stability of signal transmission.

[0004] Insufficient coordination between multi-layer structures: The combination between the insulation layer, the shielding layer and the outer sheath of the parallel-core cable is mainly physical adhesion, and the interface between the layers lacks effective bonding force. In the long-term use process, the interface between the layers is prone to separation due to factors such as vibration and temperature change, which can cause a decrease in shielding effectiveness or cracking of the sheath, significantly shortening the service life of the cable.

[0005] Although the traditional twisted cable improves the structural stability through the twisted structure, it is prone to signal delay due to the difference in twist length during high-frequency signal transmission, which cannot meet the high-precision transmission requirement. Although the existing parallel-core cable solves the delay problem, it is difficult to balance the parallel precision and structural reliability due to the defects in the manufacturing process, which becomes a key bottleneck restricting the performance improvement. SUMMARY

[0006] The present application aims to provide a double-parallel-core data cable manufacturing method and double-parallel-core data cable to solve the problems raised in the background.

[0007] Therefore, the present application provides a double-parallel-core data cable manufacturing method, which includes the following steps: S1. Selecting two homogeneous and identical-specification metal wires as cores and forming a transition layer through surface modification by a composite process; S2. Simultaneously coating the two modified cores with an insulation layer, and forming matching engagement lines on the outer surface of the insulation layer; S3. The two wire cores with the insulating layer are calibrated to a parallel state by electric field action, kept at a constant distance and engaged with the meshing structure; S4. A gradient shielding structure comprising a dense metal layer and a fiber layer is constructed outside the two wire cores; S5. The wire core assembly with the gradient shielding structure is subjected to plasma interface treatment; S6. An outer sheath with a micro support structure is formed outside the gradient shielding structure by a micro foaming process; S7. The outer sheath is subjected to a solidification treatment under the synergistic action of a magnetic field and vibration; S8. The cable after solidification is subjected to multi-dimensional stress release treatment; S9. The treated cable is subjected to dynamic performance verification.

[0008] In the present application, a further embodiment is that the composite process in S1 comprises plasma etching and vapor deposition, a microscopically rough surface is formed by inert gas plasma etching, and a nanoscale metal transition layer is formed by chemical vapor deposition, and the two wire cores are kept side by side and fixed and rotated synchronously by a synchronous driving mechanism during the treatment process.

[0009] In the present application, a further embodiment is that the synchronous coating in S2 adopts a double-cavity co-extrusion die with a dynamic spoiler structure, and the insulating material forms a periodic micro-orientation along the length direction by periodic rotation of the spoiler, and the meshing structure is a mirror-symmetrical triangular tooth structure.

[0010] In the present application, a further embodiment is that the electric field action in S3 is realized by a plurality of electrostatic field generators in a vacuum parallel calibration cavity, the wire cores are suspended by using a gradient electric field, the electric field strength is adjusted in real time to ensure that the parallelism deviation of the wire core axis is controlled within a preset range.

[0011] In the present application, a further embodiment is that the dense metal layer in S4 is formed by atomic layer deposition technology, metal organic compounds and reaction gas are alternately introduced to completely cover the outer surface of the two wire core insulating layers and form an integrated structure, the fiber layer adopts a directional weaving process, and silver-plated fibers, carbon fibers and glass fibers are used from inside to outside to form a gradient structure with decreasing conductivity.

[0012] In the present application, a further embodiment is that the plasma interface treatment in S5 adopts high-frequency radio frequency plasma, the interface molecules of the shielding layer and the insulating layer are broken and recombined to form covalent bonds by adjusting the power and treatment time, and the cable moves at a constant speed during the treatment process.

[0013] In the present application, further embodiments are that the micro-foaming process in S6 forms bubbles by supercritical fluid injection, uses the pulse pressure change in the mold cavity to make the bubble size periodically distributed along the length direction, and the micro support structure is radially arranged in the cross section.

[0014] In the present application, further embodiments are that the solidification treatment in S7 is performed in an alternating magnetic field environment, while axial ultrasonic vibration is applied, the magnetic field strength and vibration frequency are kept synchronous adjustment, and the molecular directional arrangement of the sheath material is promoted by the magnetostrictive effect.

[0015] In the present application, further embodiments are that the multi-dimensional stress release in S8 first applies axial tensile stress, then superimposes radial uniform pressure, and finally applies torsional stress, each direction stress is loaded to the peak value and then slowly released according to the preset program, and the temperature field changes synchronously during the process.

[0016] A double parallel core data cable is manufactured by a double parallel core data cable manufacturing method, comprising two parallel and identical wire cores, a transition layer is arranged on the outer surface of the wire core, an insulation layer is wrapped outside the transition layer, the outer surface of the insulation layer is provided with meshing patterns that are embedded with each other, a gradient shielding structure is collectively wrapped outside the insulation layer, and an outer sheath with a periodic micro support structure is wrapped outside the gradient shielding structure.

[0017] The present application has the following advantages: 1. The data cable manufacturing method for the smart grid, step S3 uses electric field to realize non-contact parallel calibration of the wire core, avoiding damage to the insulation layer by mechanical contact; at the same time, the meshing patterns on the outer surface of the insulation layer form an embedded structure after parallel positioning, and are wrapped with the subsequent integrated shielding layer, so that the two wire cores form a double fixation of "mechanical locking + overall constraint", completely solving the problem of relative deviation of traditional parallel cables, and ensuring that the wire core maintains a high-precision parallel state for a long time. Compared with the torsion cable, the parallel wire core manufactured by the method eliminates the signal delay caused by twisting, and significantly improves the consistency and accuracy of high-frequency signal transmission.

[0018] 2. The transition layer formed by the composite process of step S1 provides a molecular level bonding basis for the wire core and the insulation layer; the plasma interface treatment of step S5 tightly bonds the shielding layer and the insulation layer through covalent bonds; and the micro-foaming outer sheath of step S6 forms a physical meshing structure with the gradient shielding layer. Compared with the simple physical adhesion in the prior art, the multi-layer structure "chemical bonding + physical locking" design significantly improves the interlayer bonding strength, effectively resists the risk of interlayer peeling under conditions such as vibration and temperature cycling, prolongs the service life compared with traditional parallel cables, and solves the problem of sheath cracking caused by twisting stress in the torsion cable.

[0019] 3. Optimizing the overall structure performance, adapting to complex use environment: the magnetic field of step S7 and vibration synergistic curing makes the outer sheath form a directional arrangement of microstructure, the impact resistance and weather resistance are enhanced; the multi-dimensional stress release treatment of step S8 eliminates the residual stress inside the cable, avoiding deformation or fracture in the use process. The overall structure design not only retains the advantages of parallel wire cores in high-frequency transmission, but also has better structural stability than the torsion cable, and can adapt to long-term reliable work in various complex environments. BRIEF DESCRIPTION OF DRAWINGS

[0020] Figure 1 is a flowchart of the manufacturing method of the application. DETAILED DESCRIPTION

[0021] The technical solutions in the embodiments of the present application will be clearly described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art belong to the scope of protection of the present application.

[0022] In the description of the present application, it should be noted that the terms used herein are only for describing the specific embodiments, and are not intended to limit the exemplary embodiments according to the present application. For the convenience of description, the sizes of the parts shown in the drawings are not drawn in accordance with the actual proportional relationship. The technology, methods and devices known to those skilled in the related art can not be discussed in detail, but should be considered as part of the authorized description. In all examples shown and discussed herein, any specific value should be interpreted as merely exemplary, and not as a limitation. Therefore, other examples of exemplary embodiments can have different values. It should be noted that similar reference numerals and letters represent similar items in the following drawings, so once an item is defined in one drawing, it does not need to be further discussed in subsequent drawings.

[0023] It should be noted that the terms "first", "second" and the like in the specification and claims of the present application are used to distinguish similar objects, and are not intended to describe a specific order or sequence. It should be understood that the data used in this way can be interchanged under appropriate circumstances, so that the embodiments of the present application can be implemented in an order other than that illustrated or described herein, and the objects distinguished by "first", "second" and the like are generally a class, and do not limit the number of objects, for example, the first object can be one or more. In addition, "and / or" in the specification and claims means at least one of the connected objects, and the character " / ", generally represents a "or" relationship between the associated objects before and after.

[0024] It should be noted that in the description of the present application, the terms of orientation such as "front, back, up, down, left, right", "transverse, vertical, perpendicular, horizontal" and "top, bottom" and the like indicated orientation or position relationship are generally based on the orientation or position relationship shown in the drawings, only for the convenience of describing the present application and simplifying the description, without making the opposite statement, these orientation terms do not indicate and imply that the device or element referred to must have a particular orientation or be constructed and operated in a particular orientation, therefore, it cannot be understood as a limitation on the scope of protection of the present application, the orientation terms "inner, outer" refer to the inner and outer of the contour of each component itself.

[0025] It should be noted that in the present application, the terms "include", "contain" or any other variant thereof are intended to cover non-exclusive inclusion, so that the process, method, article or device including a series of elements not only includes those elements, but also includes other elements not explicitly listed, or includes elements inherent to such process, method, article or device. Without more limitation, the element defined by the sentence "including a…" does not exclude the presence of other identical elements in the process, method, article or device including the element. In addition, it should be pointed out that the scope of the methods and devices in the embodiments of the present application is not limited to performing functions in the order shown or discussed, but can also include performing functions in a substantially simultaneous manner or in the opposite order according to the functions involved, for example, the described method can be performed in an order different from that described, and various steps can also be added, omitted or combined. In addition, the features described with reference to certain examples can be combined in other examples.

[0026] The embodiment provides a double parallel wire core data cable manufacturing method, comprising the following steps: S1. Select two homogeneous and same-specification metal wires as the core, and perform surface modification to form a transition layer through a composite process. The specific implementation process is as follows: first, two metal wires with consistent composition, diameter and mechanical properties are selected from the same batch of metal wires to ensure that their electrical characteristics match in the signal transmission process. The two cores are fixed on a synchronous transmission mechanism and sent into a sealed processing cavity. First, the plasma etching equipment is started, inert gas is introduced to form a plasma environment, high-energy ion bombardment is used to remove the oxide layer and impurities and form a uniform micro-rough structure, and the surface specific area is increased. Then switch to the gas deposition mode, introduce metal source gas, and deposit a nanoscale uniform transition layer on the rough surface. The transition layer not only improves the interfacial bonding strength of the core and the subsequent insulating layer, but also optimizes the electrical conductivity uniformity of the core surface, reduces signal transmission loss, and the bonding strength is increased by more than 40% compared with the traditional single surface treatment process.

[0027] S2. Synchronously coat the modified two wire cores with an insulation layer, and form mutually matching meshing lines on the outer surface of the insulation layer. The specific implementation process is as follows: the two wire cores with the surface modified are sent into a double-cavity co-extrusion molding mold in parallel, two flow channels symmetrically distributed in the mold are provided, and the insulation material is simultaneously introduced into the two flow channels after being melted and plasticized. A dynamic disturbance component is installed in the mold, the disturbance vane is periodically rotated by a servo motor, and the insulation material forms a periodic micro-orientation structure along the length direction in the flow process, thereby improving the anti-tearing performance of the insulation layer. A mirror-symmetrical triangular tooth-shaped line forming structure is designed at the outlet of the mold, and when the insulation material coated wire core is extruded from the mold, mutually matching meshing lines are synchronously formed in the cooling and setting process. This synchronous coating process ensures that the thickness deviation of the insulation layers of the two wire cores is less than 0.01 mm, the matching accuracy of the meshing lines is controlled within 0.005 mm, and the accuracy of the subsequent parallel calibration of the wire cores is effectively guaranteed.

[0028] S3. Calibrate the two wire cores coated with the insulation layer to a parallel state through the action of an electric field, and keep a constant distance and meshing lines embedded. The specific implementation process is as follows: after the wire core enters the vacuum parallel calibration cavity, a plurality of electrostatic field generators in the cavity are started to form a gradient electric field distributed along the length direction. The wire core is suspended in the air under the action of the electric field force, avoiding contact with any mechanical parts. A laser interference measurement system installed in the cavity monitors the relative position of the two wire cores in real time, and the data is fed back to the control system to dynamically adjust the output intensity of each group of electrostatic field generators, so that the parallelism deviation of the wire core axis is controlled within 0.002 mm / m. At the same time, the wire cores are pushed closer to each other through the axial fine adjustment mechanism until the meshing lines on the outer surface of the insulation layer are completely embedded, forming a physical locking structure. This non-contact calibration method completely solves the problem of insulation layer wear caused by traditional mechanical calibration, and the relative displacement amount of the wire cores after the meshing lines are embedded is controlled within 0.001 mm.

[0029] S4. Construct a gradient shielding structure containing a dense metal layer and a fiber layer outside the two wire cores. The specific implementation process is as follows: first, the wire core assembly after parallel calibration is sent into an atomic layer deposition device, a dense metal layer with uniform thickness is deposited on the outer surface of the insulation layer of the two wire cores by alternately introducing a metal organic compound and a reaction gas, the metal layer completely covers the surface of the insulation layer and forms a continuous integrated structure between the two wire cores, and the shielding effectiveness can reach more than 80 dB. Then the wire core assembly is moved to a braiding machine, and a fiber layer is formed outside the metal layer by using a directional braiding process. Silver-plated fibers, carbon fibers and glass fibers are introduced in a preset ratio in sequence during the braiding process to form a gradient structure with decreasing conductivity from inside to outside. The proportion of silver-plated fibers is 30% to ensure shielding continuity, the proportion of carbon fibers is 50% to improve structural strength, and the proportion of glass fibers is 20% to enhance corrosion resistance. The gradient design ensures the shielding performance while reducing the weight by 25%.

[0030] S5. Plasma interface treatment is performed on the wire core assembly with a gradient shielding structure. The specific implementation process is that the wire core assembly uniformly passes through a high-frequency radio frequency plasma treatment cavity, a high-energy plasma beam is generated by a plasma generator, and the interface region of the shielding layer and the insulating layer is directionally bombarded. By accurately controlling the plasma power (500-800 W) and the treatment time (10-15 seconds), the molecular chains at the interface are broken and active free radicals are formed, and these active groups react with each other to form stable covalent bonds. In the treatment process, an inert gas atmosphere is maintained inside the cavity to avoid interface oxidation. After this treatment, the interfacial peel strength of the shielding layer and the insulating layer is increased to more than 15 N / cm, which is much higher than the 5 N / cm of the traditional process, effectively preventing shielding failure caused by interlayer separation.

[0031] S6. A micro-foaming process is used outside the gradient shielding structure to form an outer sheath with a micro support structure. The specific implementation process is that the wire core assembly is sent into a micro-foaming injection mold, and a predetermined gap is formed between the mold cavity and the wire core assembly. Carbon dioxide supercritical fluid is injected into the molten sheath material through a supercritical fluid injection system to form uniform bubble nuclei. The inner wall of the mold is designed with periodically distributed microstructure protrusions, which cooperate with the pulsed pressure change (5-15 MPa periodic fluctuation) in the mold cavity to form a periodically distributed structure along the length direction of the bubble during growth. At the same time, through special cavity design, the sheath cross section forms a radial arrangement of micro support structures. This structure design makes the outer sheath weight reduced by 30% while the impact strength is increased by 40%, and has excellent cushioning performance.

[0032] S7. The outer sheath is subjected to a magnetic field and vibration synergistic solidification treatment. The specific implementation process is that the cable with an incompletely solidified outer sheath is sent into a magnetic vibration synergistic solidification device, which provides an alternating magnetic field environment of 0.1-0.5T, and at the same time, an axial ultrasonic vibration of 20-30kHz is applied by an ultrasonic generator. The magnetic field strength and vibration frequency are synchronously adjusted by a control system, and the magnetic strain effect is used to promote the directional arrangement of the sheath material molecules along the magnetic field direction. The sheath temperature is monitored in real time during the treatment process, and is maintained at 10-20°C above the material glass transition temperature, promoting molecular diffusion and crosslinking reaction. After this treatment, the tensile strength of the outer sheath is increased by 20%, the weather resistance is increased by 30%, and the internal stress distribution is more uniform.

[0033] S8. After curing, the cable is subjected to multi-dimensional stress release treatment. The specific implementation process is: the cable is fixed on a multi-axis stress testing device, first 5-10% tensile stress is applied along the axial direction, and then slowly released after 10 minutes; then uniform radial pressure (0.5-1 MPa) is applied through the hydraulic system, and then gradually unloaded after 15 minutes; finally, ±30° torsional stress is applied, and then the initial state is restored after 10 minutes. During the whole process, the ambient temperature slowly rises from room temperature to 80°C and then drops to room temperature, forming a temperature cycle synergy. Through this multi-dimensional stress release, the internal residual stress of the cable is reduced by more than 60%, effectively avoiding size changes and structural cracking during subsequent use.

[0034] S9. The treated cable is subjected to dynamic performance verification. The specific implementation process is: the cable is installed on a dynamic test platform, and multi-parameter tests are performed under simulated actual use conditions. Including: vibration test in the frequency range of 10-2000 Hz, while monitoring signal transmission attenuation; ±90° bending cycle test (10000 times) to detect structural integrity; test the change of insulation resistance under temperature cycle conditions of-40°C to 85°C. Real-time monitoring of high-frequency signal transmission performance is realized by using a vector network analyzer, and internal structural defects are detected by using ultrasonic flaw detection technology. The test results show that the signal transmission stability of the cable manufactured by this process is improved by 50% compared with traditional cables under dynamic conditions, and the service life is extended to more than 15 years.

[0035] In this embodiment, the composite process in S1 includes plasma etching and vapor deposition. First, a microscopically rough surface is formed by inert gas plasma etching, and then a nanoscale metal transition layer is formed by chemical vapor deposition. The two cores are kept side by side and fixed and rotated synchronously by a synchronous driving mechanism during the processing. In specific implementation, argon is selected as the plasma etching gas source, the etching power is controlled at 300-500 W, and the processing time is 5-8 minutes, so that the core surface forms a rough structure with Ra0.5-1 μm. In the vapor deposition stage, metal organic compounds are used as precursors to react at a temperature of 200-300°C to form a metal transition layer with a thickness of 50-100 nm. The synchronous driving mechanism controls the two cores to rotate synchronously at a speed of 5-10 r / min through a servo motor, ensuring the uniformity of the circumferential direction processing. This composite process increases the surface activity of the core by 3 times, providing an excellent bonding basis for subsequent insulation layer coating, and solving the problem of insufficient bonding force between traditional cores and insulation layers.

[0036] In this embodiment, the synchronization package in S2 adopts a double-cavity co-extrusion die with a dynamic turbulence structure. The periodic rotation of the turbulence sheet causes the insulation material to form a periodic micro-orientation along the length direction, and the meshing pattern is a mirror-symmetrical triangular tooth structure. In specific implementation, the two flow channels of the double-cavity co-extrusion die are designed completely symmetrically, and the flow channel size error is controlled within 0.002 mm. The dynamic turbulence structure is composed of 3 groups of turbulence sheets that are staggered with each other, and is driven to rotate periodically within a range of 0-60° through a cam mechanism, with the rotation frequency matching the line core running speed (5-10 Hz). The meshing pattern forming structure is designed as a triangular tooth with a top angle of 60°, a tooth height of 0.2-0.5 mm, and a tooth pitch of 1-2 mm, and the patterns in the left and right cavities are strictly mirror-symmetrical. This design causes the insulation layer material to form a periodic orientation structure, and the tensile strength is improved by 25%. At the same time, the mirror-image tooth pattern ensures the accuracy of subsequent line core embedding, and the line core parallelism deviation can be controlled within 0.003 mm / m.

[0037] In this embodiment, the electric field in S3 is realized by a plurality of electrostatic field generators in a vacuum parallel calibration cavity. The line core is suspended by using a gradient electric field, and the electric field strength is adjusted in real time by monitoring to ensure that the line core axis parallelism deviation is controlled within a preset range. In specific implementation, the vacuum degree of the vacuum parallel calibration cavity is maintained below 1×10 -3 Pa, and a group of electrostatic field generators is arranged every 50 cm along the length direction, each group containing 4 symmetrically distributed electrodes. The measurement accuracy of the laser interference measurement system reaches 0.1 μm, the sampling frequency is 100 Hz, and the line core position data is fed back to the control system in real time. The control system adjusts the voltage (0-5000 V) of each electrode according to the deviation value to form a gradient electric field, so that the line core suspension height is maintained at 0.5-1 mm. Through this closed-loop control, the line core axis parallelism deviation can be stably controlled within 0.002 mm / m, which is much higher than the 0.01 mm / m precision of traditional mechanical calibration, and provides a stable line structure for high-frequency signal transmission.

[0038] In this embodiment, the dense metal layer in S4 is formed by atomic layer deposition technology, using the way of alternately introducing metal organic compounds and reaction gas, completely covering the outer surface of the two-core insulation layer and forming an integrated structure, and the fiber layer adopts directional weaving process, using silver-plated fiber, carbon fiber and glass fiber from inside to outside to form a gradient structure with decreasing conductivity. In specific implementation, in the atomic layer deposition process, metal organic compounds (such as trimethylaluminum) and reaction gas (such as oxygen) are alternately introduced into the reaction chamber, and the pulse time is controlled at 0.5-2 seconds each time. A 20-50 nm thick dense metal layer is formed through 50-100 deposition cycles, and the metal layer forms a continuous connection between the two cores without any gap. In the fiber weaving stage, a 16-spindle weaving machine is used, silver-plated fiber (diameter 50 μm), carbon fiber (diameter 7 μm) and glass fiber (diameter 10 μm) are configured in a ratio of 3:5:2, the weaving angle is controlled at 30-45°, and the weaving density is ensured uniform by the tension control system. The shielding effectiveness of this gradient shielding structure can reach 85 dB, and the bending radius is reduced by 30% compared to traditional shielding structures, balancing shielding performance and flexibility.

[0039] In this embodiment, the plasma interface treatment in S5 uses high-frequency radio frequency plasma, which breaks and recombines the molecules at the interface between the shielding layer and the insulation layer to form covalent bonds by adjusting the power and processing time, and the cable moves at a constant speed during the processing. In specific implementation, a 13.56 MHz high-frequency radio frequency power source is used to generate plasma, the power adjustment range is 500-800 W, and a mixture of argon and hydrogen gas (volume ratio 9:1) is introduced into the processing cavity, with a gas flow rate of 50-100 sccm. The cable moves at a speed of 1-2 m / min to ensure that the processing time at each position reaches 10-15 seconds. Plasma treatment forms uniform covalent bond connections at the interface, and tests show that the peel strength of the shielding layer and the insulation layer is increased from 5 N / cm in traditional processes to 15-20 N / cm, completely solving the interlayer peeling problem and ensuring long-term stability of the shielding performance.

[0040] In this embodiment, the micro-foaming process in S6 forms bubbles by supercritical fluid injection, uses the pulse pressure change in the mold cavity to make the bubble size periodically distributed along the length direction, and the micro support structure is radially arranged in the cross section. In specific implementation, carbon dioxide is used as the supercritical fluid, the injection pressure is controlled at 15-20 MPa, and the injection amount is 0.5-1.5% of the mass of the polymer melt. The mold temperature is kept at 80-120℃, the pressure in the mold cavity is changed by a servo valve to achieve a pulse change of 5-15 MPa, and the period is matched with the linear speed (1-2 seconds / period). The mold cavity cross section is designed with 12-16 radial protrusions to promote the formation of radial support structures, the support rib width is 0.1-0.3 mm, and the height is 0.5-1 mm. This structure makes the outer sheath have a 30% weight reduction while the compression strength is increased by 40%, and has excellent heat dissipation performance.

[0041] In this embodiment, the solidification treatment in S7 is carried out in an alternating magnetic field environment, while axial ultrasonic vibration is applied, the magnetic field strength and vibration frequency are kept synchronous adjustment, and the molecular directional arrangement of the sheath material is promoted by the magnetostrictive effect. In specific implementation, an electromagnet is used to generate an alternating magnetic field of 0.1-0.5T, the magnetic field frequency is consistent with the ultrasonic vibration frequency (20-30kHz). An ultrasonic transducer generates axial vibration, the amplitude is controlled at 5-10μm, and the power density is 50-100W / cm 2 . During the treatment process, the sheath temperature is monitored in real time by infrared temperature measurement, and kept at 10-20℃ above the material glass transition temperature (usually 80-120℃). The synergistic effect of the magnetic field and vibration makes the molecules of the sheath material directional along the magnetic field direction, the crystallinity is increased by 15-20%, the tensile strength is increased by 20%, the weather resistance is significantly improved, and the service life is extended to more than 15 years after accelerated aging test.

[0042] In this embodiment, the multi-dimensional stress release in S8 first applies axial tensile stress, then superimposes radial uniform pressure, and finally applies torsional stress, each direction stress is loaded to the peak value according to the preset program and then slowly released, accompanied by a change in the temperature field during the process. In specific implementation, the axial tensile stress is applied by a servo motor, which gradually increases from 0 to 30% of the material yield strength, and then slowly releases at a rate of 0.5% / min after 10 minutes. The radial pressure is applied by a hydraulic system, which is uniformly distributed around the cable, the pressure value is 0.5-1MPa, and the pressure is linearly released after 15 minutes. The torsional stress is applied by a rotating mechanism to a torsional angle of ±30°, which is slowly reset after 10 minutes. During the whole process, the environmental temperature rises from room temperature to 80℃ at a rate of 2℃ / min, and then decreases to room temperature at a rate of 1℃ / min after 30 minutes. This multi-dimensional stress release makes the internal residual stress of the cable reduced by 60-70%, effectively avoiding deformation and cracking in the subsequent use process, and the dimensional stability is improved by 50%.

[0043] A double parallel wire core data cable is manufactured by a double parallel wire core data cable manufacturing method, comprising two parallel and identical wire cores, a transition layer is arranged on the outer surface of the wire core, an insulation layer is wrapped outside the transition layer, the outer surface of the insulation layer is provided with meshing grooves that are embedded with each other, a gradient shielding structure is wrapped outside the insulation layer, and an outer sheath with a periodic micro support structure is wrapped outside the gradient shielding structure. The wire core is made of high-purity oxygen-free copper wire, the diameter deviation is controlled within 0.001 mm, and the electrical performance is consistent. The transition layer is a 50-100 nm thick metal compound layer, which forms a metallurgical bond with the wire core to improve the interface conductivity and bonding force. The insulation layer is made of fluoroplastic with a temperature resistance grade of 150 DEG C or above, the thickness is 0.2-0.5 mm, the triangular tooth-shaped meshing grooves on the outer surface realize precise embedding, and the embedding gap is less than 0.005 mm. The gradient shielding structure is composed of a 20-50 nm dense metal layer and a fiber woven layer, and the shielding effectiveness is greater than or equal to 85 dB. The outer sheath is made of flame-retardant polyolefin material, the radial micro support structure inside the outer sheath improves the compressive strength by 40%, and the periodic bubble distribution realizes a 30% weight reduction effect. Compared with the traditional product, the high-frequency signal transmission loss of the cable is reduced by 30%, the bending life is improved to more than 100,000 times, and the long-term use requirements of high-precision data transmission scenes can be met.

[0044] The embodiments of the present application are described above in combination with the drawings, and the embodiments and features in the embodiments of the present application can be combined with each other without conflict, and the present application is not limited to the above-mentioned specific embodiments, which are only illustrative and not restrictive. Those skilled in the art can make many forms under the guidance of the present application without departing from the scope of the present application, which are all within the protection scope of the present application.

Claims

1. A method for manufacturing a dual-parallel core data cable, characterized in that, Includes the following steps: S1. Select two metal wires of the same type and specification as the core, and perform surface modification through a composite process to form a transition layer; S2. The two modified wire cores are simultaneously wrapped with an insulation layer, and the outer surface of the insulation layer forms matching meshing patterns; S3. Align the two insulating cores to a parallel state by applying an electric field, maintaining a constant spacing and interlocking mesh patterns; S4. Construct a gradient shielding structure containing a dense metal layer and a fiber layer outside the two wire cores; S5. Perform plasma interface treatment on the wire core assembly with gradient shielding structure; S6. An outer sheath with a micro-support structure is formed on the outside of the gradient shielding structure using a micro-foaming process; S7. The outer sheath undergoes a curing treatment that combines magnetic field and vibration; S8. Perform multi-dimensional stress relief treatment on the cured cable; S9. Perform dynamic performance verification on the treated cable.

2. The method for manufacturing a dual-parallel core data cable according to claim 1, characterized in that, The composite process described in S1 includes plasma etching and vapor deposition. First, an inert gas plasma etching process is used to form a micro-rough surface, and then a chemical vapor deposition process is used to form a nanoscale metal transition layer. During the process, the two wire cores are kept parallel and fixed and rotated synchronously by a synchronous drive mechanism.

3. The method for manufacturing a dual parallel core data cable according to claim 1, characterized in that, The synchronous coating described in S2 uses a dual-cavity co-extrusion mold with a dynamic turbulence structure. The periodic rotation of the turbulence plate causes the insulating material to form a periodic micro-orientation along the length direction, and the meshing pattern is a mirror-symmetrical triangular tooth structure.

4. The method for manufacturing a dual parallel core data cable according to claim 1, characterized in that, The electric field effect described in S3 is achieved by multiple sets of electrostatic field generators in the vacuum parallel calibration cavity. The core wire is suspended by the gradient electric field, and the electric field strength is dynamically adjusted by real-time monitoring to ensure that the parallelism deviation of the core wire axis is controlled within a preset range.

5. The method for manufacturing a dual-parallel core data cable according to claim 1, characterized in that, The dense metal layer described in S4 is formed by atomic layer deposition technology, using an alternating introduction of metal-organic compounds and reactive gases to completely cover the outer surface of the insulation layer of the two wire cores and form an integrated structure. The fiber layer adopts a directional braiding process, using silver-plated fibers, carbon fibers and glass fibers from the inside out to form a gradient structure with decreasing conductivity.

6. The method for manufacturing a dual parallel core data cable according to claim 1, characterized in that, The plasma interface treatment described in S5 uses high-frequency radio frequency plasma. By adjusting the power and processing time, the molecules at the interface between the shielding layer and the insulation layer are broken and recombined to form covalent bonds. During the processing, the cable moves at a constant speed.

7. The method for manufacturing a dual parallel core data cable according to claim 1, characterized in that, The micro-foaming process described in S6 forms bubbles by injecting supercritical fluid, and uses pulsed pressure changes in the mold cavity to make the bubble size periodically distributed along the length direction, with the micro-support structure arranged radially in the cross-section.

8. The method for manufacturing a dual parallel core data cable according to claim 1, characterized in that, The curing process described in S7 is carried out in an alternating magnetic field environment, while axial ultrasonic vibration is applied. The magnetic field strength and vibration frequency are adjusted synchronously to promote the directional alignment of the sheath material molecules through the magnetostrictive effect.

9. The method for manufacturing a dual parallel core data cable according to claim 1, characterized in that, The multi-dimensional stress release described in S8 first applies axial tensile stress, then superimposes radial uniform pressure, and finally applies torsional stress. The stress in each direction is loaded to its peak value according to a preset program and then slowly released, accompanied by a coordinated change in the temperature field.

10. A dual-parallel core data cable, characterized in that, The cable is manufactured using the method for manufacturing a dual parallel core data cable according to any one of claims 1 to 9. It includes two parallel and identical cores, a transition layer on the outer surface of the cores, an insulation layer wrapped around the transition layer, interlocking patterns on the outer surface of the insulation layer, a gradient shielding structure wrapped around the insulation layer, and an outer sheath with a periodic micro support structure wrapped around the gradient shielding structure.

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