Pressure control system of process furnace and pressure adaptive control method
By employing a parallel pipeline structure and dynamic gas flow regulation in the vapor deposition equipment, the problem of low pressure control accuracy was solved, resulting in higher film quality and rate.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- 湖南德智新材料股份有限公司
- Filing Date
- 2025-09-04
- Publication Date
- 2026-08-04
AI Technical Summary
Existing vapor deposition equipment has low pressure control accuracy, which cannot meet the requirements for silicon wafer film quality in the process furnace, and the response speed is slow.
By adopting a parallel main and branch pipeline structure, combined with pressure detection components and regulating devices, pressure adaptive control is achieved through dynamic adjustment of air flow, thereby improving the accuracy and stability of pressure control.
This improves the accuracy and stability of pressure control, ensuring the uniformity and rate of film deposition on the silicon wafer surface within the process chamber.
Smart Images
Figure CN121277111B_ABST
Abstract
Description
Technical Field
[0001] This application relates to the fields of semiconductor and photovoltaic technology, specifically to a pressure control system and pressure adaptive control method for a process furnace. Background Technology
[0002] With the development of semiconductor and photovoltaic technologies, thin film deposition processes are used to deposit thin films on silicon wafer surfaces to produce corresponding properties. Thin film deposition processes include various process modes such as chemical vapor deposition (CVD) and physical vapor deposition (PVD). The equipment used to deposit thin films on silicon wafer surfaces is called a vapor deposition (VCD) system. In existing VCD systems, to ensure film quality, the pressure in the furnace must be kept relatively stable, and a pressure control system is generally installed to regulate the pressure. However, due to the influence of various dynamic factors such as the gas charge and exhaust rates and internal reactions within the furnace, current methods rely solely on pressure sensors for adjustment. This results in a slow response time and low pressure control accuracy, failing to meet the high film quality requirements of silicon wafers within the furnace. Summary of the Invention
[0003] In view of this, this application provides a pressure control system and pressure adaptive control method for a process furnace, which solves the problem that the pressure control accuracy and stability in the process furnace cannot meet the requirements.
[0004] In a first aspect, one embodiment of this application provides a pressure control system for a process furnace. The process furnace has a process chamber and an exhaust structure communicating with the process chamber. The exhaust structure and the process chamber are connected by a main pipe and a branch pipe connected in parallel. The cross-sectional area of the main pipe is larger than that of the branch pipe. The process chamber has a preset pressure. The pressure control system includes: a pressure detection component disposed in the process furnace, configured to collect the pressure in the process chamber to form a pressure data set, and further configured to acquire a first pressure in the process chamber at a first moment, wherein the pressure data set includes multiple pressure data collected at different times; and a first regulating member disposed at the location where the main pipe and the branch pipe are connected in parallel, the first regulating member being able to operate to regulate the gas flowing through the main pipe. The flow rate includes a first regulating element having a first pressure regulating range; a second regulating element, disposed in a branch pipe, capable of adjusting the gas flow rate through the branch pipe, and having a second pressure regulating range; and a control component electrically connected to a pressure detection component, the first regulating element, and the second regulating element, respectively. At least when the first regulating element is activated to allow gas to flow through the main pipe, the control component is configured to receive a pressure data set and process the pressure data set to obtain the pressure change trend in the process chamber. The control component is also configured to activate the first regulating element and / or the second regulating element based on the pressure change trend, a preset pressure, a first pressure, a first pressure regulating range, and a second pressure regulating range, so that the pressure in the process chamber is maintained at the preset pressure.
[0005] In conjunction with the first aspect of this application, in some embodiments, the first pressure adjustment range is between ±1.5 times the preset pressure and ±1.1 times the preset pressure; the second pressure adjustment range is between ±1.1 times the preset pressure and ±1.03 times the preset pressure.
[0006] In conjunction with the first aspect of this application, in some embodiments, the pressure change trend includes a slow decreasing trend, a rapid decreasing trend, a slow increasing trend, a rapid increasing trend, and an oscillation period; when the pressure in the process chamber is in a rapid increasing trend or a rapid decreasing trend, a first pressure adjustment range is set between ±1.5 times the preset pressure and ±1.2 times the preset pressure, and a second pressure adjustment range is set between ±1.1 times the preset pressure and ±1.05 times the preset pressure; when the pressure in the process chamber is in a slow increasing trend or a slow decreasing trend, a first pressure adjustment range is set between ±1.2 times the preset pressure and ±1.1 times the preset pressure, and a second pressure adjustment range is set between ±1.05 times the preset pressure and ±1.03 times the preset pressure.
[0007] In conjunction with the first aspect of this application, in some embodiments, the pressure detection component includes: a first pressure detection element disposed in a process furnace, the first pressure detection element having a first pressure detection range; and a second pressure detection element disposed in the process furnace, the second pressure detection element having a second pressure detection range greater than the first pressure detection range. When the first pressure is less than or equal to 13000 torr, the control component is configured to acquire the pressure detected by the first pressure detection element as pressure data and / or the first pressure of the pressure data set.
[0008] In conjunction with the first aspect of this application, in some embodiments, the device further includes: a third pressure detection element disposed on the main pipeline, configured to detect the pressure of the main pipeline; and a fourth pressure detection element disposed on the branch pipeline, configured to detect the pressure of the branch pipeline; wherein the third and fourth pressure detection elements are electrically connected to a control component, and the control component is configured to calculate based on the detected pressure of the main pipeline and the pressure of the branch pipeline, and if the absolute value of the difference between the two pressures divided by the pressure of the branch pipeline is greater than 0.01, an alarm procedure is triggered to prevent the first and second regulating elements from closing simultaneously.
[0009] Secondly, one embodiment of this application provides a pressure adaptive control method applied to a process furnace. The process furnace has a process chamber and an exhaust structure communicating with the process chamber. The exhaust structure and the process chamber are connected by a main pipe and a branch pipe in parallel. The cross-sectional area of the main pipe is larger than that of the branch pipe. The process chamber has a preset pressure. The pressure adaptive control method includes: collecting the pressure inside the process chamber to obtain a pressure data set including multiple pressure data and a first pressure of the process chamber at a first moment; setting a first pressure adjustment range of a first regulator and a second pressure adjustment range of a second regulator according to the preset pressure, wherein the first regulator can adjust the gas flow rate of the main pipe and the second regulator can adjust the gas flow rate of the branch pipe; at least when the first regulator is turned on to allow gas to flow through the main pipe, a control component processes the pressure data set to obtain a pressure change trend, and the control component activates the first regulator and / or the second regulator according to the pressure change trend, the preset pressure, the first pressure, the first pressure adjustment range, and the second pressure adjustment range to maintain the pressure of the process chamber at the preset pressure.
[0010] In conjunction with the second aspect of this application, in some embodiments, collecting the pressure inside the process chamber to obtain a pressure data set including multiple pressure data and a first pressure of the process chamber at a first moment includes: using a pressure detection component to collect the pressure inside the process chamber once at a preset time interval, denoted as {p1, p2, p3...pN}, where N is a positive integer; subtracting the pressure collected at the previous preset time from the pressure collected at the next preset time {p2-p1, p3-p2...pN-pN-1} to obtain a pressure data set {A1, A2...AN-1}; in every two adjacent pressure data in the pressure data set, selecting the time corresponding to the last collected pressure as the first moment, and using the next pressure data as the first pressure.
[0011] In conjunction with the second aspect of this application, in some embodiments, setting a first pressure adjustment range for the first adjustment member and a second pressure adjustment range for the second adjustment member according to a preset pressure includes: setting the first pressure adjustment range between ±1.5 times the preset pressure and ±1.1 times the preset pressure, and setting the second pressure adjustment range between ±1.1 times the preset pressure and ±1.03 times the preset pressure.
[0012] In conjunction with the second aspect of this application, in some embodiments, the control component processes the pressure data set to obtain a pressure change trend, and the control component activates the first and / or second adjustment components according to the pressure change trend, a preset pressure, a first pressure, a first pressure adjustment range, and a second pressure adjustment range to maintain the pressure in the process chamber at the preset pressure. This includes: taking two adjacent pressure data sets AN-2 and AN-1 from the pressure data set, dividing the former pressure data by the latter pressure data to obtain the intermediate data B at the first moment, denoted as B = AN-2 / AN-1; if 0 < B < 1, AN-2 > 0, AN-1 > 0, the pressure change trend is a slow decreasing trend; if B > 1, AN-2 > 0, AN-1 > 0, the pressure change trend is a rapid decreasing trend; if 0 < B < 1, AN-2 < 0, AN-1 < 0, the pressure change trend is a rapid increasing trend; if B > 1, AN-2 < 0, AN-1 < 0, the pressure change trend is a slow increasing trend; if B < 0, one of AN-2 and AN-1 is greater than or equal to AN-1. If the pressure is 0 or less than 0, the pressure change trend is in an oscillation period; if the pressure in the process chamber is in a rapid upward or downward trend, the first pressure adjustment range is set between ±1.5 times the preset pressure and ±1.2 times the preset pressure, and the second pressure adjustment range is set between ±1.1 times the preset pressure and ±1.05 times the preset pressure; if the pressure in the process chamber is in a slow upward or downward trend, the first pressure adjustment range is set between ±1.2 times the preset pressure and ±1.1 times the preset pressure, and the second pressure adjustment range is set between ±1.05 times the preset pressure and ±1.03 times the preset pressure; combining the pressure change trend, if the first pressure at the first moment is within the first pressure adjustment range, the control component activates the first adjustment element to increase or decrease the air flow rate in the main pipeline until the first pressure reaches the second pressure adjustment range or the oscillation period; if the first pressure at the first moment is within the second pressure adjustment range, the control component activates the second adjustment element to increase or decrease the air flow rate in the branch pipeline until the first pressure reaches the preset pressure.
[0013] In conjunction with the second aspect of this application, in some embodiments, the preset time is 10 seconds.
[0014] The pressure control system and adaptive pressure control method for the process furnace provided in this application embodiment can adjust the airflow through the corresponding main pipe and branch pipe by setting a first and a second adjusting component, respectively. The pressure detection component can intermittently collect the pressure in the process chamber, so that the pressure detection component can calculate the pressure change trend based on the detected pressure. Then, the opening degree of the first and second adjusting components is dynamically adjusted according to the pressure change trend, the preset pressure, the first pressure, the first pressure adjustment range, and the second pressure adjustment range, which improves the pressure control accuracy and stability. Furthermore, this dynamic adjustment method improves the adjustment speed and ensures that the pressure in the process chamber is always maintained at the preset pressure, reducing pressure deviation and benefiting the uniformity and film deposition rate of silicon wafers in the process chamber. Attached Figure Description
[0015] The above and other objects, features, and advantages of this application will become more apparent from the more detailed description of the embodiments of this application in conjunction with the accompanying drawings. The drawings are provided to further illustrate the embodiments of this application and form part of the specification. They are used together with the embodiments of this application to explain this application and do not constitute a limitation thereof. In the drawings, the same reference numerals generally represent the same components or steps.
[0016] Figure 1 The diagram shown is a schematic diagram of a pressure control system for a process furnace provided in an embodiment of this application.
[0017] Figure 2 The diagram shown is a schematic diagram of a pressure control system for a process furnace provided in another embodiment of this application.
[0018] Figure 3 The diagram shown is a flowchart of a pressure adaptive control method provided in an embodiment of this application.
[0019] Figure 4 The diagram shown is a flowchart of a pressure adaptive control method provided in another embodiment of this application.
[0020] Figure 5 The diagram shown is a flowchart of a pressure adaptive control method provided in another embodiment of this application.
[0021] Figure 6 The diagram shown is a flowchart of a pressure adaptive control method provided in another embodiment of this application. Detailed Implementation
[0022] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.
[0023] Figure 1 The diagram shown is a schematic diagram of a pressure control system for a process furnace provided in an embodiment of this application. Figure 2 The diagram shown is a schematic diagram of a pressure control system for a process furnace provided in another embodiment of this application.
[0024] This application provides a pressure control system for a process furnace, such as... Figure 1 and Figure 2 The process furnace 1 has a process chamber 11 and an exhaust structure 2 and an intake structure communicating with the process chamber 11. The process chamber 11 is configured to accommodate silicon wafers. The process furnace 1 has an intake port and an exhaust port communicating with the process chamber 11. The intake port is used to communicate with the intake structure to allow at least one gas to enter the process chamber 11, and the exhaust port is used to communicate with the exhaust structure 2 to allow the gas in the process chamber 11 to be discharged. The pressure control system is configured to control and regulate the pressure in the process chamber 11.
[0025] It is understandable that the process furnace 1 is used in process equipment, which includes equipment capable of performing deposition and coating processes on silicon wafers. The deposition and coating equipment includes various types of equipment such as chemical vapor deposition equipment and physical vapor deposition equipment, which can be adapted to meet actual needs.
[0026] Optionally, the gas supplied to the process chamber 11 by the air intake structure can be one type or multiple types. It can be a purge gas used to purge the silicon wafer surface, or multiple reaction gases used to deposit a film on the silicon wafer surface. It can be adapted to actual needs and is not specifically limited.
[0027] Optionally, the exhaust structure 2 may include an exhaust pump, which is connected to the exhaust port via an exhaust pipe. The suction force provided by the exhaust pump can exhaust the gas in the process chamber 11. A filter structure may also be connected to the exhaust pipe to filter dust, harmful gases, etc. in the gas, which can be adapted to actual needs.
[0028] The extraction structure 2 includes a main pipe 21 and branch pipes 22 connected in parallel with a portion of the main pipe 21. The cross-sectional area of the main pipe 21 is larger than that of the branch pipe 22. When the extraction pump draws gas from the process chamber 11, the gas can flow to the extraction pump through both the main pipe 21 and the branch pipe 22. It is important to emphasize that the cross-sectional areas of the main pipe 21 and the branch pipe 22 can be adaptively selected based on various conditions such as the required extraction rate, the size of the process chamber 11, and the suction force of the extraction pump. The ratio of the cross-sectional area of the branch pipe 22 to that of the main pipe 21 can be set to 1:5, 1:4, 1:6, etc. In this embodiment, the diameter of the main pipe 21 is set to 100 mm, and the diameter of the branch pipe 22 is set to 20 mm, but this is not a limitation.
[0029] The pressure control system includes a pressure detection component 3, a first regulating component 4, a second regulating component 5, and a control component 6. The pressure detection component 3 is located in the process furnace 1 and is configured to collect pressure data within the process chamber 11 to form a pressure data set. The pressure detection component 3 is also configured to acquire the first pressure of the process chamber 11 at a first moment. The pressure data set includes multiple pressure data collected at different times. The first regulating component 4 is located at the parallel connection between the main pipe 21 and the branch pipe 22. The first regulating component 4 can operate to regulate the air flow rate through the main pipe 21 and has a first pressure regulation range. The second regulating component 5 is located in the branch pipe 22 and can operate to regulate the air flow rate through the branch pipe 22. The second regulating component 5 has a second pressure regulation range. The control component 6 is electrically connected to the pressure detection component 3, the first regulator 4, and the second regulator 5, respectively. At least when the first regulator 4 is turned on to allow gas to flow through the main pipeline 21, the control component 6 is configured to receive pressure data sets and process the pressure data sets to obtain the pressure change trend in the process chamber 11. The control component 6 is also configured to activate the first regulator 4 and / or the second regulator 5 according to the pressure change trend, the preset pressure, the first pressure, the first pressure adjustment range, and the second pressure adjustment range, so as to maintain the pressure in the process chamber 11 at the preset pressure.
[0030] The pressure control system of the process furnace provided in this application embodiment can adjust the airflow in the corresponding main pipe 21 and branch pipe 22 respectively through the first adjusting member 4 and the second adjusting member 5. The pressure detection component 3 can intermittently collect the pressure in the process chamber 11, so that the pressure detection component 3 can calculate the pressure change trend based on the detected pressure. Then, based on the pressure change trend, the preset pressure, the first pressure, the first pressure adjustment range, and the second pressure adjustment range, the opening degree of the first adjusting member 4 and the second adjusting member 5 is dynamically adjusted, which improves the pressure control accuracy and stability. Furthermore, this dynamic adjustment method improves the adjustment speed and can ensure that the pressure in the process chamber 11 is always maintained at the preset pressure, reducing pressure deviation and benefiting the uniformity and film deposition rate of silicon wafers in the process chamber 11.
[0031] Optionally, the preset pressure set in the process chamber 11 is the pressure that needs to be maintained in the chamber during the deposition of a film on the silicon wafer surface. The specific magnitude of the preset pressure can be adaptively adjusted according to the specific deposition process used on the silicon wafer, such as chemical or physical processes, without being specifically limited.
[0032] Optionally, the first regulating component 4 installed on the main pipeline 21 can be a piezoelectric ceramic quick valve with high response speed and nanometer-level step accuracy, and the second regulating component 5 installed on the branch pipeline 22 can be a magnetic levitation regulating valve with long service life and close to zero friction loss, which is beneficial to the adjustment accuracy when fine-tuning the air flow.
[0033] Optionally, the pressure detection component 3 can be configured as a pressure sensor on the process furnace 1. The probe of the pressure sensor can extend into the process chamber 11 to detect the pressure in the process chamber 11 and form a pressure data set. The control component 6 can perform specific calculations based on the data in the pressure data set, and then make a comprehensive judgment based on the preset first pressure, preset pressure, first pressure adjustment range, and second pressure adjustment range. Based on the judgment result, it can adjust the first adjustment component 4 or the second adjustment component 5, and the specific opening degree of the adjustment. That is, this disclosure adopts a multi-point detection combination method to form a pressure data set, so as to determine the pressure change trend in the process chamber 11 and then perform corresponding pressure adjustment processing. This avoids the situation where large errors occur due to local turbulence caused by deposition in the process chamber 11 during a single sampling, which is beneficial to improving the accuracy and precision of the pressure detection results.
[0034] Optionally, the control component 6 may include an electrically connected controller 61, a processor, and a control instrument 62, etc. The operator can input process parameters such as a predetermined pressure, a first pressure adjustment range, and a second pressure adjustment range on the control instrument 62. The controller 61 can receive and send various data, and the processor can perform data calculation and processing based on the data provided by the controller 61 and return the calculation results to the controller 61. This will not be described in detail.
[0035] Optionally, the pressure detection component 3 may include a first pressure detection element and a second pressure detection element. The first pressure detection element is disposed in the process furnace 1 and has a first pressure detection range. The second pressure detection element is disposed in the process furnace 1 and has a second pressure detection range, which is greater than the first pressure detection range. When the first pressure is less than or equal to 13000 torr, the control component 6 is configured to acquire the pressure detected by the first pressure detection element as the pressure data and / or the first pressure in the pressure data set. That is, when the process furnace 1 is working, the first and second pressure detection elements can detect the pressure in the process chamber 11 through operation. During a period of time when the process chamber 11 is evacuated or gas is started to be introduced, the pressure in the process chamber 11 gradually increases from atmospheric pressure to the first pressure. At this time, the control component 6 records the pressure data acquired by the first and second pressure detection elements as the standard. As the detected pressure increases to greater than 13000 torr, the control component 6 uses the data acquired by the second pressure detection element as the standard, which helps to further improve the pressure detection accuracy in the process chamber 11. It should be emphasized that the pressure detection ranges set for the first and second pressure detection elements can be selected according to actual needs, without specific limitations.
[0036] Optionally, the first pressure is set to the optimized pressure data detected by the pressure detection component 3. That is, two pressure data are collected at preset time intervals, and the first moment of collecting the first pressure is the moment of collecting the next pressure data. The first pressure is the value corresponding to the next pressure data. This process is repeated continuously during multiple detections and overwrites the previous data. In other words, the first pressure is variable as time changes, and the first moment also changes accordingly. This will not be explained in detail.
[0037] Optionally, the preset time can be set to 10 seconds. In other examples, the preset time can also be set to 8 seconds, 12 seconds, etc., without specific limitations.
[0038] In some optional embodiments, the first pressure adjustment range is set between ±1.5 times the preset pressure and ±1.1 times the preset pressure, and the second pressure adjustment range is set between ±1.1 times the preset pressure and ±1.03 times the preset pressure. That is, when the pressure in the process chamber 11 is between ±1.5 times the preset pressure and ±1.1 times the preset pressure, the pressure can be adjusted by adjusting the opening of the first adjusting member 4; when the pressure in the process chamber 11 is between ±1.1 times the preset pressure and ±1.03 times the preset pressure, the pressure can be adjusted by adjusting the opening of the second adjusting member 5. The main pipe 21 corresponding to the first adjusting member 4 is used for coarse pressure adjustment when the preset pressure is relatively large, and the branch pipe 22 corresponding to the second adjusting member 5 is used for fine pressure adjustment when the preset pressure is relatively small. More specifically, the first regulating component 4 corresponds to the main pipeline 21, which is used to undertake more than 80% of the pressure coarse adjustment, and the second regulating component 5 corresponds to the branch pipeline 22, which is used to undertake the pressure fine adjustment within a range of ±5% of the preset pressure. The pressure change trend obtained by multiple sampling calculations is used for dynamic compensation during adjustment, so that the process chamber 11 can always be maintained at the preset pressure. This overcomes the situation that the pressure cannot be quickly restored to the preset pressure under different operating conditions such as switching different process gases or sudden changes in deposition rate in the process chamber 11.
[0039] Optionally, a pressure transmitter electrically connected to the control component 6 and the pressure sensing component 3 is also included. The pressure transmitter is configured to convert signals for signal transmission between the pressure sensing component 3 and the control component 6, which will not be described in detail.
[0040] Understandably, pressure change trends include a slow decreasing trend, a rapid decreasing trend, a slow increasing trend, a rapid increasing trend, and a period of fluctuation. When the pressure in process chamber 11 is in a rapid increasing or decreasing trend, the first pressure adjustment range is set between ±1.5 times the preset pressure and ±1.2 times the preset pressure, and the second pressure adjustment range is set between ±1.1 times the preset pressure and ±1.05 times the preset pressure. When the pressure in process chamber 11 is in a slow increasing or slow decreasing trend, the first pressure adjustment range is set between ±1.2 times the preset pressure and ±1.1 times the preset pressure, and the second pressure adjustment range is set between ±1.05 times the preset pressure and ±1.03 times the preset pressure.
[0041] In some optional embodiments, the pressure detection component 3 further includes a third pressure detection element 7 and a fourth pressure detection element 8. The third pressure detection element 7 is disposed on the main pipeline 21 and configured to detect the pressure of the main pipeline 21. The fourth pressure detection element 8 is disposed on the branch pipeline 22 and configured to detect the pressure of the branch pipeline 22. The third pressure detection element 7 and the fourth pressure detection element 8 are electrically connected to the control component 6. The control component 6 is configured to calculate based on the detected pressures of the main pipeline 21 and the branch pipeline 22. If the absolute value of the difference between the two pressures divided by the pressure of the branch pipeline 22 is greater than 0.01, an alarm procedure is triggered to prevent the first regulating element 4 and the second regulating element 5 from closing simultaneously. Through the configuration of the third pressure detection element 7 and the fourth pressure detection element 8 and the program settings of the control component 6, a physical interlock is formed between the first regulating element 4 and the second regulating element 5. Both are simultaneously checked to prevent a continuous rise in pressure or even an explosion in the process chamber 11 caused by their simultaneous complete closure, thereby improving safety performance.
[0042] Optionally, the details of the third pressure detection element 7 and the fourth pressure detection element 8 can be found in the descriptions of the first and second pressure detection elements, and will not be repeated here.
[0043] Figure 3 The diagram shown is a flowchart of a pressure adaptive control method provided in an embodiment of this application. Figure 4 The diagram shown is a flowchart of a pressure adaptive control method provided in another embodiment of this application. Figure 5 The diagram shown is a flowchart of a pressure adaptive control method provided in another embodiment of this application. Figure 6 The diagram shown is a flowchart of a pressure adaptive control method provided in another embodiment of this application.
[0044] This disclosure also provides a pressure adaptive control method, applied to the pressure control system of the process furnace described in the above embodiments, so as to realize that the pressure in the process chamber can be automatically and dynamically adjusted.
[0045] like Figures 3 to 6 This application provides a pressure adaptive control method, the specific steps of which are as follows:
[0046] S101. Collect the pressure inside the process chamber to obtain a pressure data set including multiple pressure data and the first pressure of the process chamber at the first moment.
[0047] It is understandable that this pressure adaptive control method is a method of dynamically adjusting the pressure at least when the first regulator is activated, and it will not be emphasized separately thereafter.
[0048] Optionally, the pressure data set includes at least two pressure data points. Each pressure data point is the actual pressure in the process chamber detected by the pressure detection component at a certain moment. The two adjacent data points are iteratively overlaid and calculated. The moment corresponding to the actual pressure in the process chamber detected at the next moment is taken as the first moment. The two pressure data points are processed to obtain the first pressure, which is the real-time pressure in the process chamber at the first moment after processing.
[0049] Specific methods include:
[0050] S1011. The pressure in the process chamber is collected once at a preset time interval using a pressure detection component and recorded as {p1, p2, p3...pN}, where N is a positive integer.
[0051] S1012. Subtract the pressure collected at the previous preset time from the pressure collected at the next preset time {p2-p1, p3-p2......pN-pN-1} to obtain the pressure data group {A1, A2......AN-1};
[0052] S1013. In each pair of adjacent pressure data in the pressure data group, select the time corresponding to the last collected pressure as the first moment, and take the next pressure data as the first pressure.
[0053] Optionally, the preset time can be set to 10 seconds, and the pressure detection component collects the pressure in the process chamber every 10 seconds. During the process of obtaining the pressure data set {A1, A2, ..., AN-1}, when two pressure data points are obtained from each pressure data set, the control component performs a calculation on the two pressure data points to determine the pressure change area in the process chamber at that time, thereby facilitating rapid adjustment of the pressure in the process chamber.
[0054] S102. Set the first pressure adjustment range of the first regulator and the second pressure adjustment range of the second regulator according to the preset pressure, wherein the first regulator can adjust the air flow rate of the main pipeline and the second regulator can adjust the air flow rate of the branch pipeline.
[0055] In this step, by pre-setting the pressure adjustment range of the first and second regulating components, the main pipeline corresponding to the first regulating component is used for adjustment when the flow rate changes greatly, and the branch pipeline corresponding to the second regulating component is used for adjustment when the flow rate changes little, so as to improve the adjustment accuracy and stability.
[0056] Specific methods include:
[0057] S1021. Set the first pressure adjustment range between ±1.5 times the preset pressure and ±1.1 times the preset pressure, and set the second pressure adjustment range between ±1.1 times the preset pressure and ±1.03 times the preset pressure.
[0058] S103. At least when the first regulating element is opened to allow gas to flow through the main pipeline, the control component processes the pressure data set to obtain the pressure change trend, and the control component activates the first regulating element and / or the second regulating element according to the pressure change trend, the preset pressure, the first pressure, the first pressure adjustment range, and the second pressure adjustment range to maintain the pressure in the process chamber at the preset pressure.
[0059] Specific methods include:
[0060] S1031. Take two adjacent pressure data AN-2 and AN-1 from the pressure data group, divide the previous pressure data by the next pressure data, and obtain the intermediate data B at the first moment, denoted as B = AN-2 / AN-1.
[0061] S1032. If 0 < B < 1, AN-2 > 0, and AN-1 > 0, the pressure change trend is a slow downward trend. If B > 1, AN-2 > 0, and AN-1 > 0, the pressure change trend is a rapid downward trend. If 0 < B < 1, AN-2 < 0, and AN-1 < 0, the pressure change trend is a rapid upward trend. If B > 1, AN-2 < 0, and AN-1 < 0, the pressure change trend is a slow upward trend. If B < 0, and one of AN-2 and AN-1 is greater than 0 while the other is less than 0, the pressure change trend is a period of fluctuation.
[0062] S1033. When the pressure in the process chamber is in a rapid upward or downward trend, the first pressure adjustment range is set between ±1.5 times the preset pressure and ±1.2 times the preset pressure, and the second pressure adjustment range is set between ±1.1 times the preset pressure and ±1.05 times the preset pressure.
[0063] S1034. When the pressure in the process chamber is in the slow upward trend or the slow downward trend, the first pressure adjustment range is set between ±1.2 times the preset pressure and ±1.1 times the preset pressure, and the second pressure adjustment range is set between ±1.05 times the preset pressure and ±1.03 times the preset pressure.
[0064] S1035. Based on the pressure change trend, if the first pressure at the first moment is within the first pressure adjustment range, the control component causes the first adjustment element to operate to increase or decrease the air flow rate of the main pipeline until the first pressure reaches the second pressure adjustment range or the oscillation period. If the first pressure at the first moment is within the second pressure adjustment range, the control component causes the second adjustment element to operate to increase or decrease the air flow rate of the branch pipeline until the first pressure reaches the preset pressure.
[0065] For example, when the first pressure detected by the pressure detection component is within the first pressure adjustment range of the first regulator, a coarse adjustment can be made by adjusting the opening of the main pipe through the first regulator. Then, by calculating the pressure change trend in the above steps, the first pressure adjustment range of the first regulator is further narrowed, which helps improve the pressure adjustment accuracy, allowing the first pressure to be adjusted to the second pressure adjustment range or to the oscillation period. Then, the above steps are repeated for the case where the first pressure is within the second pressure adjustment range of the second regulator, i.e., fine adjustment is made by adjusting the opening of the branch pipe through the second regulator. This improves the accuracy and stability of the dynamic pressure adjustment in the process chamber.
[0066] The basic principles of this application have been described above with reference to specific embodiments. However, it should be noted that the advantages, benefits, and effects mentioned in this application are merely examples and not limitations, and should not be considered as essential features of each embodiment of this application. Furthermore, the specific details disclosed above are for illustrative and facilitative purposes only, and are not limitations. These details do not limit the application to the necessity of employing the aforementioned specific details for implementation.
[0067] The block diagrams of devices, apparatuses, devices, and systems involved in this application are merely illustrative examples and are not intended to require or imply that they must be connected, arranged, or configured in the manner shown in the block diagrams. As those skilled in the art will recognize, these devices, apparatuses, devices, and systems can be connected, arranged, and configured in any manner. Words such as “comprising,” “including,” “having,” etc., are open-ended terms meaning “including but not limited to,” and are used interchangeably with them. The terms “or” and “and” as used herein refer to the terms “and / or,” and are used interchangeably with them unless the context clearly indicates otherwise. The term “such as” as used herein refers to the phrase “such as but not limited to,” and is used interchangeably with it.
[0068] It should also be noted that in the apparatus, equipment, and methods of this application, the components or steps can be disassembled and / or recombined. These disassemblies and / or recombinations should be considered as equivalent solutions of this application.
[0069] The above description of the disclosed aspects is provided to enable any person skilled in the art to make or use this application. Various modifications to these aspects will be readily apparent to those skilled in the art, and the general principles defined herein can be applied to other aspects without departing from the scope of this application. Therefore, this application is not intended to be limited to the aspects shown herein, but rather to be accorded the widest scope consistent with the principles and novel features disclosed herein.
[0070] The above description has been given for purposes of illustration and description. Furthermore, this description is not intended to limit the embodiments of this application to the forms disclosed herein. Although numerous exemplary aspects and embodiments have been discussed above, those skilled in the art will recognize certain variations, modifications, alterations, additions, and sub-combinations thereof.
[0071] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Any modifications or equivalent substitutions made within the spirit and principles of this application should be included within the protection scope of this application.
[0072] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Any modifications or equivalent substitutions made within the spirit and principles of this application should be included within the protection scope of this application.
Claims
1. A pressure control system for a process furnace, characterized by, The process furnace has a process chamber and an exhaust structure communicating with the process chamber. The exhaust structure and the process chamber are connected by a main pipe and branch pipes in parallel. The cross-sectional area of the main pipe is larger than that of the branch pipes. The process chamber has a preset pressure. The pressure control system includes: A pressure detection component is disposed in the process furnace. The pressure detection component is configured to collect the pressure in the process chamber to form a pressure data set. The pressure detection component is also configured to acquire the first pressure of the process chamber at a first moment. The pressure data set includes multiple pressure data collected at different times. A first regulating element is disposed at a position where the main pipeline and the branch pipeline are connected in parallel. The first regulating element is capable of operating to regulate the air flow rate through the main pipeline. The first regulating element has a first pressure regulation range. A second regulating member is disposed in the branch pipe. The second regulating member is operable to regulate the air flow rate through the branch pipe. The second regulating member has a second pressure regulation range. A control component is electrically connected to the pressure detection component, the first regulator, and the second regulator, respectively. At least when the first regulator is activated to allow gas to flow through the main pipeline, the control component is configured to receive the pressure data set and process the pressure data set to obtain the pressure change trend in the process chamber. The control component is also configured to activate the first regulator and / or the second regulator according to the pressure change trend, the preset pressure, the first pressure, the first pressure adjustment range, and the second pressure adjustment range, so that the pressure in the process chamber is maintained at the preset pressure.
2. The pressure control system for the process furnace according to claim 1, characterized in that, The first pressure adjustment range is between ±1.5 times the preset pressure and ±1.1 times the preset pressure; The second pressure adjustment range is between ±1.1 times the preset pressure and ±1.03 times the preset pressure.
3. The pressure control system of a process furnace according to claim 2, characterized in that The pressure change trends include a slow downward trend, a rapid downward trend, a slow upward trend, a rapid upward trend, and a period of fluctuation; When the pressure in the process chamber is in the rapid upward trend or the rapid downward trend, the first pressure adjustment range is set between ±1.5 times the preset pressure and ±1.2 times the preset pressure, and the second pressure adjustment range is set between ±1.1 times the preset pressure and ±1.05 times the preset pressure. The pressure in the process chamber is in the slow upward trend or the slow downward trend. The first pressure adjustment range is set between ±1.2 times the preset pressure and ±1.1 times the preset pressure, and the second pressure adjustment range is set between ±1.05 times the preset pressure and ±1.03 times the preset pressure.
4. The pressure control system of a process furnace according to claim 1, wherein The pressure detection component includes: A first pressure detection element is disposed in the process furnace, and the first pressure detection element has a first pressure detection range; A second pressure detection element is disposed in the process furnace. The second pressure detection element has a second pressure detection range, which is greater than the first pressure detection range. When the first pressure is less than or equal to 13000 torr, the control component is configured to acquire the pressure detected by the first pressure detection element as the pressure data of the pressure data set and / or the first pressure.
5. The pressure control system of a process furnace according to any one of claims 1-4, characterized in that, Also includes: A third pressure detection element is disposed on the main pipeline, and the third pressure detection element is configured to detect the pressure of the main pipeline; A fourth pressure detection element is disposed on the branch pipe, and the fourth pressure detection element is configured to detect the pressure of the branch pipe; The third and fourth pressure detection elements are electrically connected to the control component. The control component is configured to calculate based on the detected pressure of the main pipeline and the pressure of the branch pipeline. If the absolute value of the difference between the two pressures divided by the pressure of the branch pipeline is greater than 0.01, an alarm procedure is triggered to prevent the first and second regulating elements from closing simultaneously.
6. A method of pressure adaptive control, characterized by A pressure control system for a process furnace, wherein the process furnace has a process chamber and an extraction structure communicating with the process chamber, the extraction structure and the process chamber are connected by a main pipe and branch pipes in parallel, the cross-sectional area of the main pipe is larger than the cross-sectional area of the branch pipes, the process chamber has a preset pressure, and the pressure adaptive control method includes: The pressure inside the process chamber is collected to obtain a pressure data set including multiple pressure data and the first pressure of the process chamber at the first moment. The first pressure adjustment range of the first adjusting member and the second pressure adjustment range of the second adjusting member are set according to the preset pressure, wherein the first adjusting member can adjust the air flow rate of the main pipe and the second adjusting member can adjust the air flow rate of the branch pipe. At least when the first regulating element is activated to allow gas to flow through the main pipeline, the control component processes the pressure data set to obtain the pressure change trend, and the control component activates the first regulating element and / or the second regulating element according to the pressure change trend, the preset pressure, the first pressure, the first pressure adjustment range, and the second pressure adjustment range to maintain the pressure in the process chamber at the preset pressure.
7. The pressure-adaptive control method of claim 6, wherein, The process involves collecting pressure data within the process chamber to obtain a pressure data set including multiple pressure data points and a first pressure within the process chamber at a first moment, including: The pressure inside the process chamber is collected once at a preset time interval using a pressure detection component and denoted as {p1, p2, p3...pN}, where N is a positive integer; Subtract the pressure collected at the previous preset time from the pressure collected at the next preset time {p2-p1, p3-p2......pN-pN-1} to obtain the pressure data group {A1, A2......AN-1}; In each pair of adjacent pressure data in the pressure data group, the time corresponding to the last collected pressure is selected as the first moment, and the subsequent pressure data is taken as the first pressure.
8. The pressure-adaptive control method of claim 7, wherein, The method of setting the first pressure adjustment range of the first adjusting member and the second pressure adjustment range of the second adjusting member according to the preset pressure includes: The first pressure adjustment range is set between ±1.5 times the preset pressure and ±1.1 times the preset pressure, and the second pressure adjustment range is set between ±1.1 times the preset pressure and ±1.03 times the preset pressure.
9. The pressure-adaptive control method of claim 8, wherein, The control component processes the pressure data set to obtain a pressure change trend, and the control component activates the first adjustment element and / or the second adjustment element according to the pressure change trend, the preset pressure, the first pressure, the first pressure adjustment range, and the second pressure adjustment range to maintain the pressure in the process chamber at the preset pressure, including: Take two adjacent pressure data AN-2 and AN-1 from the pressure data group, divide the previous pressure data by the next pressure data, and obtain the intermediate data B at the first moment, denoted as B = AN-2 / AN-1. If 0 < B < 1, AN-2 > 0, and AN-1 > 0, the pressure change trend is a slow downward trend. If B > 1, AN-2 > 0, and AN-1 > 0, the pressure change trend is a rapid downward trend. If 0 < B < 1, AN-2 < 0, and AN-1 < 0, the pressure change trend is a rapid upward trend. If B > 1, AN-2 < 0, and AN-1 < 0, the pressure change trend is a slow upward trend. If B < 0, and one of AN-2 and AN-1 is greater than 0 while the other is less than 0, the pressure change trend is in a period of fluctuation. When the pressure in the process chamber is in the rapid upward trend or the rapid downward trend, the first pressure adjustment range is set between ±1.5 times the preset pressure and ±1.2 times the preset pressure, and the second pressure adjustment range is set between ±1.1 times the preset pressure and ±1.05 times the preset pressure. The pressure in the process chamber is in the slow upward trend or the slow downward trend. The first pressure adjustment range is set between ±1.2 times the preset pressure and ±1.1 times the preset pressure, and the second pressure adjustment range is set between ±1.05 times the preset pressure and ±1.03 times the preset pressure. Based on the pressure change trend, if the first pressure at the first moment is within the first pressure adjustment range, the control component activates the first adjustment element to increase or decrease the air flow rate of the main pipeline until the first pressure reaches the second pressure adjustment range or the oscillation period. If the first pressure at the first moment is within the second pressure adjustment range, the control component activates the second adjustment element to increase or decrease the air flow rate of the branch pipeline until the first pressure reaches the preset pressure.
10. The method of adaptive pressure control of claim 7, wherein, The preset time is 10 seconds.