A silicon carbide coated graphite tray support device

Abstract

The application relates to the technical field of vapor deposition equipment, and discloses a silicon carbide coating graphite carrier disc supporting device, which comprises a bearing table, the top of the bearing table is provided with an adjusting disc, the bottom of the adjusting disc is rotationally provided with a rotating disc, the rotating disc and the adjusting disc are graphite discs, the top of the rotating disc is provided with a plurality of first positioning grooves, and the outer side of the adjusting disc is provided with a plurality of second positioning grooves. The relative positions of the adjusting disc and the rotating disc are adjusted, so that the epitaxial wafer is in a closed cavity formed during the exhaust process of a reaction chamber; at the moment, a high-speed airflow is formed through air injection, the by-products attached to the surface of the adjusting disc are cleaned, the number of the epitaxial wafers accommodated by the graphite base is adjusted by moving the shielding disc, the shielding disc can be cleaned synchronously in cooperation with the cleaning operation, the cleaning efficiency of the supporting device is improved, the maintenance period is prolonged, and the flexibility and reliability in use are ensured.

Description

Technical Field

[0001] This application relates to the field of vapor deposition equipment technology, and more particularly to a silicon carbide coated graphite disk support device. Background Technology

[0002] In metal-organic chemical vapor deposition (MOCVD), the graphite substrate is the core component that supports and heats the substrate. Existing graphite substrates include a carrier disk and positioning grooves for placing the epitaxial wafer. During operation, the graphite carrier disk is placed within the reaction chamber, and the epitaxial wafer fills the positioning grooves on the graphite carrier disk. After the chamber is closed, a drive assembly rotates the graphite carrier disk, while a heating assembly heats the disk and introduces reactive gas into the reaction chamber. Simultaneously, a evacuation assembly at the bottom of the reaction chamber evacuates the gas to maintain stable pressure. After vapor deposition, an inert gas is slowly introduced into the chamber simultaneously with evacuation to prevent contamination from reactive gas when the chamber is opened later.

[0003] However, during the use of traditional graphite substrates, byproducts will be deposited on the surface of the graphite substrate. Now, there is a possibility that the byproducts may fall off. After the graphite substrate has been used for a long time, a lot of byproducts will be deposited on the graphite disk. The detached byproducts will peel off onto the epitaxial wafer, which will affect the quality of the final epitaxial wafer. Therefore, it is necessary to manually clean the graphite substrate with a handheld spray gun after the epitaxial wafer is removed, which will lead to a decrease in overall production efficiency and make it difficult to guarantee the cleaning quality. If high-speed jet cleaning is used in the reaction chamber during the reaction completion stage, the accumulated byproducts are easily blown up and fall onto the surface of the epitaxial wafer, affecting the subsequent epitaxial wafer processing. Summary of the Invention

[0004] This application proposes a silicon carbide coated graphite carrier support device, which has the advantages of improving cleaning efficiency and reducing the maintenance frequency of graphite base, in order to solve the problems of by-products deposited during manual cleaning of graphite base affecting production efficiency and making it difficult to control cleaning quality.

[0005] To achieve the above objectives, this application adopts the following technical solution: a silicon carbide coated graphite carrier support device, comprising a support platform, an adjustment plate on the top of the support platform, a rotating plate rotatably disposed at the bottom of the adjustment plate, both the rotating plate and the adjustment plate being graphite plates, a plurality of first positioning grooves being formed on the top of the rotating plate, a plurality of second positioning grooves being formed on the outer side of the adjustment plate, a plurality of second clearance grooves being fixedly disposed at the bottom of the adjustment plate, a plurality of second sealing rings being fixedly disposed at the bottom of the adjustment plate, and further comprising an adjustment mechanism for driving the rotating plate and the adjustment plate to rotate;

[0006] The adjustment mechanism can drive the adjustment plate to rotate, rise, and fall relative to the rotating plate. It works with the No. 2 sealing ring to seal between the adjustment plate and the rotating plate in each rotational position, so that the No. 2 clearance groove, together with the No. 2 sealing ring and the No. 1 positioning groove, forms a cavity to accommodate the epitaxial wafer.

[0007] Furthermore, the adjustment mechanism includes a drive shaft, which is fixedly connected to the adjustment disc. A transmission shaft is rotatably arranged on the inner side of the support platform. A connecting shaft is rotatably arranged near the top of the support platform. A coupler is arranged inside the support platform. A connecting disc is fixedly connected to the top of the connecting shaft. The connecting disc is fixedly connected to the rotating disc.

[0008] Furthermore, the drive shaft is configured as a splined shaft, the transmission shaft is slidably sleeved on the outside of the drive shaft, the transmission shaft is an internal splined shaft, the connecting shaft is collinear with the axis of the transmission shaft, the bottom end of the drive shaft is rotatably engaged with a connecting plate, and both sides of the bottom of the connecting plate are provided with drive mechanisms.

[0009] Furthermore, the rotation radius and number of the second positioning slot are adapted to the rotation radius and number of the first positioning slot, and the second avoidance slot and the second positioning slot are arranged alternately.

[0010] Furthermore, the top of the rotating disk is provided with several No. 1 clearance grooves, and the bottom of the adjusting disk is fixedly provided with several No. 1 sealing rings, which are arranged in a ring and alternately with the No. 2 sealing rings.

[0011] Furthermore, the radius of the second avoidance groove is adapted to the radius of the second positioning groove and is smaller than the radius of the first avoidance groove. The radius of the first positioning groove is smaller than the radius of the second positioning groove. The sidewalls of both the first positioning groove and the first avoidance groove are set as stepped surfaces.

[0012] Furthermore, a shielding plate is provided on the top of the rotating disk, a connecting block is slidably arranged inside the shielding plate, a magnetic block is fixedly sleeved in the middle of the connecting block, a spring is fixedly connected to the top of the magnetic block, one end of the spring is fixedly connected to the inner wall of the second clearance groove, inclined grooves are opened on both sides of the connecting block, and protrusions are slidably arranged in the inclined grooves. Sliding rods are slidably sleeved on both sides of the shielding plate, one end of the sliding rod is fixedly connected to the protrusion, and several electromagnets are fixedly arranged at the bottom of the rotating disk.

[0013] Furthermore, the number of the shielding plates is set to at least two, and the shielding plates are arranged symmetrically about the axis of the drive shaft. The number of electromagnets is adapted to the sum of the number of the first positioning slot and the first avoidance slot.

[0014] Furthermore, the first sealing ring includes a ring body, and the inner side of the ring body is provided with a stepped groove for engaging the sliding rod, and the second sealing ring is inverted L-shaped.

[0015] The beneficial effects of this invention are as follows:

[0016] 1. The silicon carbide coated graphite carrier support device provided in this application has an adjustment mechanism that drives the adjustment plate to rise and fall and rotate at a rated angle relative to the rotating plate. This allows the second clearance groove of the adjustment plate to cooperate with the second sealing ring and the first adjustment groove to form a closed cavity for accommodating the epitaxial wafer. During the gas replacement process after the reaction in the reaction chamber is completed, high-speed gas is ejected through the jet assembly in the reaction chamber to form an airflow, which cleans the by-products attached to the surface of the adjustment plate. The rotation of the adjustment plate also improves the cleaning efficiency, ensures the cleaning efficiency, and extends the maintenance cycle of the support device.

[0017] 2. The silicon carbide coated graphite carrier support device provided in this application adjusts the position of the inclined groove by moving the connecting block through an electromagnet and a magnetic block, thereby adjusting the extension and retraction state of the sliding rod. When the sliding rod is in the extended state, the first sealing ring or the second sealing ring moves, driving the corresponding shielding plate to move, thereby adjusting the number of first positioning slots with shielding plates as needed. When the demand for different single wheels changes, it is not necessary to replace the graphite base corresponding to the number of epitaxial wafers, and the shielding plate can be cleaned simultaneously with the cleaning operation, further improving the flexibility and reliability of the support device. Attached Figure Description

[0018] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the provided drawings without creative effort:

[0019] Figure 1 This is a schematic diagram of the overall structure of this application;

[0020] Figure 2 This is a schematic cross-sectional view of the overall structure of this application;

[0021] Figure 3 This is a schematic diagram of the structure at the drive shaft of this application;

[0022] Figure 4 This is a schematic cross-sectional view of the positioning groove in this application;

[0023] Figure 5 For this application Figure 4 Enlarged view of the structure at point A in the image;

[0024] Figure 6 This is a schematic cross-sectional view of the structure at the clearance groove in this application;

[0025] Figure 7 This is a schematic diagram of the structure at the rotating disk in this application;

[0026] Figure 8 This is a schematic diagram of the structure at the bottom of the adjustment disc in this application.

[0027] In the diagram: 1. Support platform; 2. Rotating disk; 3. Adjusting disk; 4. Positioning groove 1; 5. Positioning groove 2; 6. Sealing ring 1; 601. Ring body; 602. Stepped groove; 7. Sealing ring 2; 8. Avoidance groove 1; 9. Avoidance groove 2; 10. Drive shaft; 11. Transmission shaft; 12. Connecting shaft; 13. Coupler; 14. Connecting disk; 15. Connecting plate; 16. Drive mechanism; 17. Heating component; 18. Shielding disk; 19. Electromagnet; 20. Magnetic block; 21. Connecting block; 22. Inclined groove; 23. Sliding rod; 24. Protrusion. Detailed Implementation

[0028] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0029] Example 1, as Figures 1-8 A silicon carbide-coated graphite disk support device includes a support platform 1, which is disposed in a reaction chamber. (See reference...) Figure 2 A heating component 17 is provided on the top of the support platform 1. A drive shaft 10 is provided on the inner side of the support platform 1. The drive shaft 10 is driven by a drive component, which can be composed of a drive motor and a gearbox. The input end of the gearbox is connected to the output end of the drive motor, and the output end of the gearbox is connected to the drive shaft 10. The drive motor and the gearbox drive the drive shaft 10 to rotate. The axis of the drive shaft 10 is vertical. An adjustment disk 3 is fixedly connected to the top of the drive shaft 10. A rotating disk 2 is rotatably provided at the bottom of the adjustment disk 3. The rotating disk 2 is rotatably provided on the outer side of the drive shaft 10. A transmission shaft 11 is rotatably provided on the inner side of the support platform 1. A connecting shaft 12 is rotatably provided on the inner side of the support platform 1 near the top. A coupler 13 is provided inside the support platform 1.

[0030] Coupler 13 is used to drive the connecting shaft 12 and the transmission shaft 11, and can adjust the engagement state of the transmission shaft 11 and the connecting shaft 12. (See reference...) Figure 3The drive shaft 10 is a splined shaft, and the transmission shaft 11 is slidably sleeved on the outside of the drive shaft 10. The drive shaft 10 can drive the transmission shaft 11 to rotate while the transmission shaft 11 can slide axially relative to the drive shaft 10. When the coupler 13 keeps the transmission shaft 11 and the connecting shaft 12 engaged, the rotation of the transmission shaft 11 drives the connecting shaft 12 to rotate through the coupler 13. The transmission shaft 11 is an internal splined shaft, and the connecting shaft 12 is a hollow shaft.

[0031] The axes of the connecting shaft 12 and the drive shaft 11 are collinear. A connecting plate 14 is fixedly connected to the top of the connecting shaft 12. The connecting plate 14 is fixedly connected to the rotating plate 2. A connecting plate 15 is rotatably engaged at the bottom of the drive shaft 10. While the drive shaft 10 can rotate relative to the connecting plate 15, the connecting plate 15 can drive the drive shaft 10 to move axially. A drive mechanism 16 is provided on both sides of the bottom of the connecting plate 15. The drive mechanism 16 is an electric push rod. The electric push rod is fixedly installed in the support platform 1. The output end of the electric push rod is fixedly connected to the connecting plate 15. The drive mechanism is used to adjust the height of the connecting plate 15. The rotating plate 2 and the adjusting plate 3 are both graphite plates.

[0032] The top of the rotating disk 2 has several No. 1 positioning slots 4, which are arranged in a ring at even intervals. The outer side of the adjusting disk 3 has several No. 2 positioning slots 5. The rotation radius and number of the No. 2 positioning slots 5 are matched with those of the No. 1 positioning slots 4. The No. 2 positioning slots 5 are through slots, and their initial positions correspond to the positions of the No. 1 positioning slots 4 and No. 2 positioning slots 5. (See reference...) Figure 8 The bottom of the adjusting plate 3 is fixedly provided with several No. 2 clearance grooves 9, which are arranged in a ring at even intervals. The No. 2 clearance grooves 9 and the No. 2 positioning grooves 5 are arranged alternately. (See reference...) Figure 7 The top of the rotating disk 2 has several No. 1 clearance slots 8.

[0033] The rotation radius and number of the first-level clearance groove 8 are matched with the rotation radius and number of the second-level clearance groove 9. Several first-level sealing rings 6 are fixedly installed at even intervals on the bottom of the adjusting plate 3, and several second-level sealing rings 7 are fixedly installed at even intervals on the bottom of the adjusting plate 3. The first-level sealing rings 6 and second-level sealing rings 7 are arranged in a ring and alternately. The number of first-level sealing rings 6 matches the number of second-level positioning grooves 5 and is located outside the second-level positioning grooves 5. The number of second-level sealing rings 7 matches the number of second-level clearance grooves 9 and is located outside the second-level clearance grooves 9. The radius of the second-level clearance groove 9 matches the radius of the second-level positioning groove 5 and is smaller than the radius of the first-level clearance groove 8. The radius of the first-level positioning groove 4 is smaller than the radius of the second-level positioning groove 5. The sidewalls of both the first-level positioning groove 4 and the first-level clearance groove 8 are set as stepped surfaces. (See reference...) Figure 5The stepped surface of positioning groove 4 is compatible with sealing ring 6. (See reference) Figure 6 The stepped surface of the first relief groove 8 is adapted to the second sealing ring 7.

[0034] The No. 1 sealing ring 6 and the No. 2 positioning groove 5 are used to position the epitaxial sheet. In the initial state, the No. 1 clearance groove 8 and the No. 2 clearance groove 9 are positioned correspondingly. At this time, the No. 2 sealing ring 7 is in the No. 1 clearance groove 8, and the No. 1 sealing ring 6 is in the No. 1 positioning groove 4. The cross-sectional shapes of the No. 1 sealing ring 6 and the No. 2 sealing ring 7 are adapted to the corresponding stepped surfaces of the No. 1 positioning groove 4 and the No. 1 clearance groove 8, so that after the adjustment plate 3 is rotated and raised, the No. 2 clearance groove 9 can cooperate with the No. 1 positioning groove 4 to accommodate the epitaxial sheet. The bottom of the No. 2 sealing ring 7 can contact the stepped surface of the No. 1 positioning groove 4 to form a static seal, and the No. 1 sealing ring 6 can contact the bottom surface of the No. 1 clearance groove 8 to form a seal.

[0035] In use, the epitaxial wafer is placed into each of the second positioning slots 5 and the corresponding first positioning slot 4. The second positioning slot 5 cooperates with the first positioning slot 4 to complete the positioning. After the reaction chamber is sealed, the reaction gas is introduced into the reaction chamber through the jet assembly in the reaction chamber. The drive assembly drives the drive shaft 10 to rotate, and the coupler remains engaged. The drive shaft 10 drives the adjustment disk 3 to rotate. At the same time, the drive shaft 10 drives the transmission shaft 11 to rotate. The transmission shaft 11 drives the connecting shaft 12 to rotate through the coupler 13. The rotation of the connecting shaft 12 drives the connecting disk 14 to rotate, thereby driving the rotating disk 2 and the adjustment disk 3 to rotate synchronously. After the reaction is completed, the drive shaft 10 stops rotating, the coupler 13 switches to the disengaged state, and the brake integrated on the coupler 13 automatically locks the connecting shaft 12.

[0036] The drive mechanism 16 extends, causing the connecting plate 15 to rise. The connecting plate 15 then drives the drive shaft 10 to rise, which in turn drives the adjusting disc 3 to rise. This raises the bottom height of the first sealing ring 6 and the second sealing ring 7 above the top surface of the rotating disc 2. The drive shaft 10 rotates at a rated angle, aligning the position of the first positioning groove 4 with the position of the second clearance groove 9. At this point, the drive mechanism 16 causes the connecting plate 15 to descend until the first sealing ring 6 contacts the bottom surface of the first clearance groove 8, while the second sealing ring 7 contacts the stepped surface of the first positioning groove 4. The inner wall of the device, together with the second sealing ring 7 and the second clearance groove 9, forms a closed cavity. At this time, the coupler 13 switches to the engaged state and drives the drive shaft 10 to rotate. At this time, a high-speed inert gas is introduced into the reaction cavity to form an airflow. With the epitaxial wafer in a closed and protected state, the by-products remaining on the top surface of the regulating plate 3 are blown off and extracted by following the airflow. Thus, during the gas replacement process after the reaction is completed, the regulating plate 3 and the second positioning groove 5 are cleaned simultaneously. With the rotation of the regulating plate 3, the cleaning efficiency is further improved, thereby extending the maintenance cycle of the support device.

[0037] Example 2, as Figures 1-2 and Figures 4-8 Based on Embodiment 1, a shielding plate 18 is provided on the top of the rotating disk 2. The specifications of the shielding plate 18 are adapted to the specifications of the epitaxial sheet. A connecting block 21 is slidably provided inside the shielding plate 18. The connecting block 21 can slide axially relative to the shielding plate 18. A magnetic block 20 is fixedly sleeved in the middle of the connecting block 21. A spring is fixedly connected to the top of the magnetic block 20. One end of the spring is fixedly connected to the inner wall of the second relief groove 9. The spring is used to push the magnetic block 20 to move to the bottom. Inclined grooves 22 are provided on both sides of the connecting block 21. A protrusion 24 is slidably provided in the inclined grooves 22. Sliding rods 23 are slidably sleeved on both sides of the shielding plate 18. The sliding rods 23 can move radially relative to the shielding plate 18.

[0038] One end of the sliding rod 23 is fixedly connected to the protrusion 24. The number of shielding plates 18 is set to at least two, and the shielding plates 18 are arranged symmetrically about the axis of the drive shaft 10. Several electromagnets 19 are fixedly installed at the bottom of the rotating disk 2. The several electromagnets 19 are arranged in a ring with uniform intervals. The number of electromagnets 19 is adapted to the sum of the number of the first positioning groove 4 and the first clearance groove 8. The electromagnets 19 can form a repulsive force with the magnetic block 20. The first sealing ring 6 includes a ring body 601. The inner side of the ring body 601 is provided with a stepped groove 602 for engaging the sliding rod 23. The second sealing ring 7 is inverted L-shaped. The shielding plate 18 is initially located in the first clearance groove 8. The sliding rod 23 extends out of the shielding plate 18 and engages between the adjusting disk 3 and the second sealing ring 7.

[0039] In practical applications, different numbers of positioning slots are required for graphite bases to accommodate epitaxial wafers with varying production volumes in a single batch, in order to avoid excessive contamination due to empty positioning slots. This embodiment provides a method for addressing this issue:

[0040] When the number of No. 1 positioning slot 4 and No. 2 positioning slot 5 needs to be adjusted, the two symmetrically arranged shielding plates 18 cooperate in pairs. The electromagnet 19 corresponding to the shielding plate 18 is activated. The electromagnet 19, together with the magnetic block 20, overcomes the spring force and pushes the connecting block 21 to rise relative to the shielding plate 18. The connecting block 21 drives the inclined groove 22 to move relative to the sliding rod 23. The inner wall of the inclined groove 22 abuts against the protrusion 24, driving the protrusion 24 to move radially. The sliding rod 23 at the bottom of the protrusion 24 moves horizontally and retracts. At this time, the adjustment plate 3 rises without driving the sliding rod 23 to rise. Conversely, the electromagnet 19 remains closed. The rise, rotation and descent of the adjustment plate 3 drive the No. 2 sealing ring 7 to move. The No. 2 sealing ring 7 drives the sliding rod 23 to move, thereby driving the shielding plate 18 to transfer into the No. 1 positioning slot 4, completing the shielding of the No. 1 positioning slot 4, thereby avoiding excessive contamination of the No. 1 positioning slot 4 in the subsequent reaction process and improving the flexibility of the support device.

[0041] The stepped groove 602 of the first sealing ring 6 can also work with the second positioning groove 5 to complete the limiting sliding rod. The position of the shielding plate 18 can be adjusted by the first sealing ring 6 and the second sealing ring 7 as needed, further improving the flexibility of use. During the cleaning process, the second positioning groove 5 corresponds to the first avoidance groove 8. At this time, the shielding plate 18 in the first avoidance groove 8 is partially embedded in the second positioning groove 5, thereby cleaning the by-products attached to the top surface of the shielding plate 18 at the same time. This allows the number of applications of the first positioning groove 4 and the second positioning groove 5 to be adjusted as needed, while ensuring cleaning efficiency and ease of use.

[0042] The above description of the disclosed embodiments enables those skilled in the art to make or use the invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the invention. Therefore, the invention is not to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A silicon carbide-coated graphite disk support device, comprising a support platform (1), characterized in that, The top of the support platform (1) is provided with an adjustment plate (3), and the bottom of the adjustment plate (3) is provided with a rotating plate (2). Both the rotating plate (2) and the adjustment plate (3) are graphite plates. The top of the rotating plate (2) is provided with several No. 1 positioning grooves (4), and the outer side of the adjustment plate (3) is provided with several No. 2 positioning grooves (5). The bottom of the adjustment plate (3) is fixedly provided with several No. 2 clearance grooves (9), and the bottom of the adjustment plate (3) is fixedly provided with several No. 2 sealing rings (7). The platform also includes an adjustment mechanism, which is used to drive the rotating plate (2) and the adjustment plate (3) to rotate. The adjustment mechanism can drive the adjustment plate (3) to rotate, rise and fall relative to the rotating plate (2) and cooperate with the second sealing ring (7) to seal between the adjustment plate (3) and the rotating plate (2) in each rotation position, so that the second clearance groove (9) cooperates with the second sealing ring (7) and the first positioning groove (4) to form a cavity for accommodating the epitaxial sheet.

2. The silicon carbide-coated graphite carrier support device according to claim 1, characterized in that, The adjustment mechanism includes a drive shaft (10), which is fixedly connected to the adjustment disk (3). A transmission shaft (11) is rotatably provided on the inner side of the support platform (1). A connecting shaft (12) is rotatably provided at the top position inside the support platform (1). A coupler (13) is provided inside the support platform (1). A connecting disk (14) is fixedly connected to the top of the connecting shaft (12). The connecting disk (14) is fixedly connected to the rotating disk (2).

3. The silicon carbide-coated graphite carrier support device according to claim 2, characterized in that, The drive shaft (10) is a spline shaft, and the transmission shaft (11) is slidably sleeved on the outside of the drive shaft (10). The transmission shaft (11) is an internal spline shaft. The axis of the connecting shaft (12) is collinear with that of the transmission shaft (11). The bottom end of the drive shaft (10) is rotatably engaged with a connecting plate (15). Both sides of the bottom of the connecting plate (15) are provided with drive mechanisms (16).

4. The silicon carbide-coated graphite carrier support device according to claim 1, characterized in that, The rotation radius and number of the second positioning groove (5) are adapted to the rotation radius and number of the first positioning groove (4), and the second avoidance groove (9) and the second positioning groove (5) are arranged alternately.

5. The silicon carbide coated graphite disk support device according to claim 2, characterized in that, The top of the rotating disk (2) is provided with several first-level clearance grooves (8), and the bottom of the adjusting disk (3) is fixedly provided with several first-level sealing rings (6). The first-level sealing rings (6) and the second-level sealing rings (7) are arranged in a ring and alternately.

6. The silicon carbide-coated graphite carrier support device according to claim 5, characterized in that, The radius of the second avoidance groove (9) is matched with the radius of the second positioning groove (5) and is smaller than the radius of the first avoidance groove (8). The radius of the first positioning groove (4) is smaller than the radius of the second positioning groove (5). The side walls of the first positioning groove (4) and the first avoidance groove (8) are both set as stepped surfaces.

7. The silicon carbide-coated graphite carrier support device according to claim 5, characterized in that, The top of the rotating disk (2) is provided with a shielding disk (18), and a connecting block (21) is slidably provided in the shielding disk (18). A magnetic block (20) is fixedly sleeved in the middle of the connecting block (21). A spring is fixedly connected to the top of the magnetic block (20). One end of the spring is fixedly connected to the inner wall of the second clearance groove (9). Inclined grooves (22) are provided on both sides of the connecting block (21). A protrusion (24) is slidably provided in the inclined groove (22). A sliding rod (23) is slidably sleeved on both sides of the shielding disk (18). One end of the sliding rod (23) is fixedly connected to the protrusion (24). Several electromagnets (19) are fixedly provided at the bottom of the rotating disk (2).

8. The silicon carbide-coated graphite carrier support device according to claim 7, characterized in that, The number of the shielding discs (18) is set to at least two, and the shielding discs (18) are arranged symmetrically about the axis of the drive shaft (10). The number of electromagnets (19) is adapted to the sum of the number of the first positioning slot (4) and the first avoidance slot (8).

9. A silicon carbide-coated graphite carrier support device according to claim 5, characterized in that, The first sealing ring (6) includes a ring body (601), and the inner side of the ring body (601) is provided with a stepped groove (602) for engaging the sliding rod (23). The second sealing ring (7) is in the shape of an inverted L.

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