A method for continuous deposition of synthetic quartz glass ingots

Abstract

The application relates to the technical field of glass deposition, in particular to a continuous deposition method for synthetic quartz glass ingots, which comprises the following steps: cooling the first type of quartz glass ingot during discharging; interval transportation of the first type of quartz glass ingot based on the determined initial discharging speed; cutting the first type of quartz glass ingot into the second type of quartz glass ingot based on the transportation interval and the initial cutting speed; periodically detecting the roughness, quality and volume of the cutting surface of the second type of quartz glass ingot, and simultaneously detecting the first temperature value of the isolation module and the second temperature value of the second type of quartz glass ingot during discharging; judging the qualified degree of the quartz glass ingot based on the quality and volume, and redetermining the cutting speed; the application can periodically cut and detect the deposited quartz glass ingot, so that the cooling process of the quartz glass ingot is sufficiently controlled, and the continuous deposition of the high-quality quartz glass ingot is ensured.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of glass deposition, in particular to a continuous deposition method of synthetic quartz glass ingot. BACKGROUND

[0002] One of the production methods of synthetic quartz glass ingot is to provide a high temperature environment by hydrogen-oxygen flame, so that the gaseous precursor undergoes chemical reaction and deposits to form a solid film. This process belongs to the branch of chemical vapor deposition, which uses the heat generated by hydrogen-oxygen flame combustion to drive the reaction. In the preparation of quartz glass, high-purity silicon tetrachloride vapor is carried by oxygen to the hydrogen-oxygen flame, and the combustion generates water vapor, which reacts with silicon tetrachloride vapor to form high-purity quartz glass. After the deposition of the quartz glass ingot is completed, the deposition furnace is turned off and cooled to room temperature under certain conditions. After the cooled quartz glass ingot is taken out, the deposition process of the quartz glass ingot is carried out again. However, this production method cannot perform continuous deposition of the quartz glass ingot, resulting in energy waste during preheating of the furnace, shortening of the service life of the burner and the deposition furnace due to drastic changes in temperature, and other disadvantages.

[0003] Chinese Patent Publication No. CN119263596A discloses a deposition device, a deposition method, and a quartz glass. The deposition device includes a furnace body, a deposition assembly, a support assembly, a main torch, and multiple auxiliary torches. The furnace body has an air inlet channel and an air outlet channel. The support assembly has a defined rotation axis, and the support assembly can rotate around the rotation axis. The main torch has a first jet direction, which is parallel to the direction of the rotation axis. The auxiliary torch has a second jet direction, which has an included angle θ with the first jet direction, and 10°≤θ≤15°. The deposition method includes the following steps: preheating the furnace body to a first temperature. Open the air inlet channel and the air outlet channel of the furnace body. Control the rotation of the support assembly. When the temperature in the furnace body rises to a second temperature, the raw gas carrying the silicon-containing compound and the first mixed gas are fed into the furnace body. Control the support assembly to move away from the main torch; it can be seen that the deposition device, the deposition method, and the quartz glass have the following problems: the deposited quartz glass ingot cannot be periodically cut and detected to ensure the continuous deposition of high-quality quartz glass ingot in the process of fully regulating the cooling process of the quartz glass ingot. SUMMARY

[0004] Therefore, the present application provides a continuous deposition method of synthetic quartz glass ingot to overcome the problem that the deposited quartz glass ingot cannot be periodically cut and detected in the prior art to ensure the continuous deposition of high-quality quartz glass ingot in the process of fully regulating the cooling process of the quartz glass ingot.

[0005] To achieve the above-mentioned purpose, the present application provides a continuous deposition method of synthetic quartz glass ingot, which comprises,

[0006] depositing raw materials of a synthetic quartz glass ingot according to predetermined steps into a first type of quartz glass ingot;

[0007] cooling the first type of quartz glass ingot during discharging, transporting the first type of quartz glass ingot at intervals based on a determined initial discharging speed, and cutting the first type of quartz glass ingot into a second type of quartz glass ingot at an initial cutting speed based on the intervals of transportation;

[0008] periodically detecting roughness, mass and volume of a cutting surface of the second type of quartz glass ingot, and detecting a first temperature value of the isolation module and a second temperature value of the second type of quartz glass ingot during discharging;

[0009] based on the roughness, determining the eligibility of the cutting process to re-determine the cutting speed;

[0010] based on the first temperature value and the second temperature value, determining the eligibility of the cooling process to re-determine the working state of the heating assembly;

[0011] based on the mass and volume, determining the eligibility of the quartz glass ingot to re-determine the cutting speed, or, based on the fact that adjusting the cutting speed alone is not sufficient to meet the requirements of the eligibility of the quartz glass ingot, determining an adjustment mode to adjust the cooling effect, wherein,

[0012] based on the fact that adjusting the cutting speed to an extreme value is still not sufficient to meet the requirements of the eligibility of the quartz glass ingot, determining the adjustment mode to be adjusting the working state of the heating assembly to regulate the first temperature value during the cooling process by adjusting the heating assembly;

[0013] based on the fact that adjusting the cutting speed and the working state of the heating assembly to an extreme value is still not sufficient to meet the requirements of the eligibility of the quartz glass ingot, determining the adjustment mode to be adjusting the discharging speed, and re-determining the discharging speed by adjusting the deposition speed of the first type of quartz glass ingot to regulate the cooling time.

[0014] Further, the process of determining the eligibility of the quartz glass ingot based on the mass and volume includes,

[0015] determining the actual density of the second type of quartz glass ingot based on the mass and volume, and determining the density deviation rate in combination with the ideal density,

[0016] comparing the density deviation rate with a preset density deviation rate to determine the eligibility of the second type of quartz glass ingot,

[0017] based on the unqualified second type of quartz glass ingot, regulating the cutting speed to ensure the eligibility of the second type of quartz glass ingot.

[0018] Further, the process of determining the eligibility of the cooling process includes,

[0019] The intelligent control module obtains a first temperature value of a first temperature sensor installed on the isolation module to measure the internal temperature of the isolation module and a second temperature value of a temperature sensor installed on the protection module to measure the temperature of the second type of quartz glass weight, and determines a first temperature change rate based on the initial temperature value of the first type of quartz glass weight after settling in the deposition furnace,

[0020] The first temperature change rate is compared with a first preset temperature change rate range to determine the eligibility of the cooling process,

[0021] Based on the unqualified cooling process, the heating assembly is regulated to re-determine the first temperature value to meet the eligibility requirement of the cooling process.

[0022] Further, the process of re-determining the cutting speed based on the roughness of the cutting surface of the second type of quartz glass weight includes,

[0023] The intelligent control module obtains the roughness of the cutting surface of the second type of quartz glass weight,

[0024] The roughness is compared with a preset roughness to determine its eligibility,

[0025] Based on the unqualified roughness, the cutting speed is adjusted to reduce to meet the eligibility requirement of the roughness of the cutting surface of the second type of quartz glass weight.

[0026] Further, based on the unqualified quartz glass weight, when it is confirmed that the regulation of the cutting speed is insufficient to meet the eligibility requirement of the quartz glass weight, the second preset temperature change rate range is re-determined based on the first preset temperature change rate range and the first temperature change rate.

[0027] Further, based on the density deviation rate of the quartz glass weight not meeting the preset density deviation rate, it is determined that the discharge speed needs to be adjusted,

[0028] Based on the excess value of the density deviation rate exceeding the preset density deviation rate, the subsequent discharge speed is determined in combination with the current discharge speed and the deposition speed of the quartz glass weight.

[0029] Further, in response to the density deviation rate of the quartz glass weight not meeting the preset density deviation rate, when the subsequent discharge speed is adjusted, a deposition speed correction value is set for the subsequent discharge speed to eliminate the influence of different deposition speeds on the discharge speed, wherein the deposition speed correction value is positively correlated with the discharge speed.

[0030] Further, the transport interval is related to the cutting speed, and the faster the cutting speed, the shorter the transport interval.

[0031] Further, the periodic detection of the roughness of the cutting surface of the quartz glass ingot is related to the periodic interval of the detection of the mass and volume of the quartz glass ingot and the qualification of the quartz glass ingot.

[0032] Further, the synthetic quartz glass ingot deposition process comprises carrying the initial flow rate of high-purity silicon tetrachloride vapor to the oxyhydrogen flame in the deposition furnace by oxygen, burning to generate water vapor, and generating a hydrolysis reaction with the silicon tetrachloride vapor to form silica deposition on the support assembly to form a high-purity quartz glass ingot.

[0033] Compared with the prior art, the beneficial effects of the present application are that the deposited quartz glass ingot can be periodically cut and detected to ensure the continuous deposition of high-quality quartz glass ingots in the process of fully regulating the cooling of the quartz glass ingot.

[0034] Further, based on the fact that the density deviation rate of the quartz glass ingot does not meet the preset density deviation rate, it is determined that the discharge speed needs to be adjusted, and the subsequent discharge speed is determined based on the exceeding value of the density deviation rate exceeding the preset density deviation rate and the current discharge speed and deposition speed of the quartz glass ingot; in response to the fact that the density deviation rate of the quartz glass ingot does not meet the preset density deviation rate, the subsequent discharge speed is adjusted, and the subsequent discharge speed is set with a correction value of the deposition speed to eliminate the influence of different deposition speeds on the discharge speed, wherein the correction value of the deposition speed is positively correlated with the discharge speed; thereby, in the process of preparing the current quartz glass ingot, the deposition speed of the quartz glass ingot is adjusted to ensure the continuity of the deposition of the quartz glass ingot under the condition that the quality of the prepared quartz glass ingot is ensured.

[0035] Further, the periodic interval of the periodic transportation of the quartz glass ingot is related to the cutting speed, and the faster the cutting speed, the shorter the periodic interval. Thus, the integrity of the quartz glass ingot processing period is ensured, and redundant processing time is avoided, that is, neither cutting of the quartz glass ingot nor discharging of the quartz glass ingot is performed, which leads to excessive deposition of the quartz glass ingot in the deposition furnace, causing the deposition furnace reaction to stop, and affecting the preparation speed of the quartz glass ingot.

[0036] Further, the periodic detection of the roughness of the cutting surface of the quartz glass ingot is related to the periodic interval of the detection of the mass and volume of the quartz glass ingot and the qualification of the quartz glass ingot. Thus, when the cutting of the quartz glass ingot is detected to be unqualified, the cutting speed can be corrected in time to ensure that the end surface of the quartz glass ingot is qualified; when the quality of the quartz glass ingot is detected to be unqualified, the cooling process can be corrected in time to avoid the prepared quartz glass ingot being cooled too quickly, which leads to unqualified quality, resulting in a large number of defective products of the prepared quartz glass ingot, causing waste of raw materials and waste of production time.

[0037] Further, based on the adjustment of the lowering speed of the supporting assembly and the cutting speed of the quartz glass ingot at an insufficient adjustment to meet the density deviation rate, according to the first preset temperature change rate range, the second preset temperature change rate range is re-determined in combination with the first temperature change rate, and based on the re-determined second preset temperature change rate range, the working state of the heating assembly is adjusted to re-determine the first temperature value, so that the density deviation rate is determined to be qualified, and if the density deviation rate is still not determined to be qualified, the deposition speed of the quartz glass ingot in the deposition furnace is adjusted to correct the lowering speed of the supporting assembly and the discharge speed, so that the hydrogen-oxygen flame chemical vapor deposition process in the deposition furnace can be continuously produced to synthesize the quartz glass ingot, the cutting of the cutting module and the alternate supporting and discharging of the two supporting assemblies of the cut quartz glass ingot are realized, and the purpose of continuous deposition of the synthesized quartz glass ingot is achieved. After adjusting the deposition speed of the quartz glass ingot in the deposition furnace, the cutting speed and the working state of the heating assembly need to be adjusted to the ideal state first, and then the deposition speed of the quartz glass ingot in the deposition furnace and the discharge speed are adjusted to ensure that the quartz glass ingot after adjusting the deposition speed of the quartz glass ingot in the deposition furnace is determined and based on the determination result, each module or each component is adjusted and controlled. BRIEF DESCRIPTION OF DRAWINGS

[0038] Figure 1 Flow chart for continuous deposition of the synthesized quartz glass ingot of the present application;

[0039] Figure 2 Flow chart for adjusting and controlling several influencing factors to ensure the qualification of the quartz glass ingot of the present application;

[0040] Figure 3 Flow chart for determining the qualification of the quartz glass ingot of the present application;

[0041] Figure 4 Flow chart for adjusting the heating assembly to re-determine the first temperature value based on the cooling process of the unqualified quartz glass ingot of the present application;

[0042] Figure 5 Structural schematic diagram for continuous deposition of the synthesized quartz glass ingot of the present application.

[0043] In the figure: hearth 01, furnace bottom 02, isolation module 03, heating assembly 04, temperature sensor 05, cutting module 06, negative pressure assembly 07, cutting assembly 08, protection module 09, switching platform 11, supporting assembly 12, laser ranging assembly 13. DETAILED DESCRIPTION

[0044] In order to make the objects and advantages of the present application clearer, the following further describes the present application with reference to the embodiments. It should be understood that the specific embodiments described herein are only used to explain the present application and not to limit the present application.

[0045] The preferred embodiments of the present application are described below with reference to the accompanying drawings. Those skilled in the art should understand that these embodiments are only used to explain the technical principles of the present application and not to limit the protection scope of the present application.

[0046] It should be noted that, in the description of the present application, the terms indicating the direction or positional relationship such as "upper", "lower", "left", "right", "inner", "outer" and the like are based on the direction or positional relationship shown in the drawings, which is only for the convenience of description and does not indicate or imply that the device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present application.

[0047] In addition, it should also be noted that, in the description of the present application, unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connection" should be understood broadly, for example, it can be fixed connection, or detachable connection, or integrally connected; it can be mechanical connection, or electrical connection; it can be directly connected, or indirectly connected through an intermediate medium, or the internal communication of two elements. Those skilled in the art can understand the specific meaning of the above terms in the present application according to the specific circumstances.

[0048] Please refer to Figure 1 The drawings show the embodiments of the continuous deposition, cutting and detection of the qualified synthetic quartz glass ingot:

[0049] A method for continuously depositing a synthetic quartz glass ingot, comprising,

[0050] Depositing raw materials of the synthetic quartz glass ingot into a first type of quartz glass ingot according to predetermined steps;

[0051] Cooling the first type of quartz glass ingot during discharging, transporting the first type of quartz glass ingot at intervals based on a determined initial discharging speed, and cutting the first type of quartz glass ingot into a second type of quartz glass ingot at an initial cutting speed based on the transport interval;

[0052] Periodically detecting the roughness, quality and volume of the cutting surface of the second type of quartz glass ingot, and simultaneously detecting the first temperature value of the isolation module and the second temperature value of the second type of quartz glass ingot during discharging;

[0053] Based on the roughness, determining the eligibility of the cutting process to re-determine the cutting speed;

[0054] determining the eligibility of the cooling process based on the first temperature value and the second temperature value to re-determine the working state of the heating assembly;

[0055] determining the eligibility of the quartz glass ingot based on the mass and the volume to re-determine the cutting speed, or determining the adjustment mode as adjusting the cooling effect when the adjustment of the cutting speed alone is insufficient to meet the requirement of the eligibility of the quartz glass ingot, wherein,

[0056] determining the adjustment mode as adjusting the working state of the heating assembly when the adjustment of the cutting speed to the extreme value is still insufficient to meet the requirement of the eligibility of the quartz glass ingot, and adjusting the first temperature value in the cooling process by adjusting the working state of the heating assembly;

[0057] determining the adjustment mode as adjusting the discharge speed when the adjustment of the cutting speed and the working state of the heating assembly to the extreme value is still insufficient to meet the requirement of the eligibility of the quartz glass ingot, and re-determining the discharge speed by adjusting the deposition speed of the first type of quartz glass ingot to adjust the cooling time.

[0058] Reference Figure 3 for details of the embodiment of adjusting the discharge speed of the quartz glass ingot to ensure the eligibility of the quartz glass ingot:

[0059] Further, the process of determining the eligibility of the quartz glass ingot based on the mass and the volume includes,

[0060] determining the actual density of the second type of quartz glass ingot based on the mass and the volume, and determining the density deviation rate in combination with the ideal density,

[0061] comparing the density deviation rate with the preset density deviation rate to determine the eligibility of the second type of quartz glass ingot,

[0062] adjusting the cutting speed based on the unqualified second type of quartz glass ingot to ensure the eligibility of the second type of quartz glass ingot.

[0063] Reference Figure 4 for details of the embodiment of adjusting the working state of the heating assembly based on the unqualified quartz glass ingot in the cooling process to re-determine the first temperature value:

[0064] Further, the process of determining the eligibility of the cooling process includes,

[0065] the intelligent control module obtains a first temperature value of a first temperature sensor installed on the isolation module to measure the internal temperature thereof and a second temperature value of a temperature sensor installed on the protection module to measure the temperature of the second type of quartz glass ingot, and determines a first temperature change rate in combination with an initial temperature value of the first type of quartz glass ingot after being deposited in the deposition furnace,

[0066] comparing the first temperature change rate with the first preset temperature change rate range, determining the eligibility of the cooling process,

[0067] Based on the unqualified cooling process, the heating assembly is regulated to re-determine the first temperature value to meet the eligibility requirement of the cooling process.

[0068] Further, the process of re-determining the cutting speed based on the roughness includes,

[0069] The intelligent control module acquires the roughness of the cutting surface of the second type of quartz glass ingot,

[0070] Comparing the roughness with the preset roughness, determining its eligibility,

[0071] Based on the unqualified roughness, the cutting speed is adjusted to reduce to meet the eligibility requirement of the roughness of the cutting surface of the second type of quartz glass ingot.

[0072] Further, based on the unqualified quartz glass ingot, when it is confirmed that the cutting speed of the quartz glass ingot is insufficient to meet the eligibility requirement of the quartz glass ingot, the working state of the heating assembly is re-determined according to the first preset temperature change rate range and the first temperature change rate to re-determine the second preset temperature change rate range.

[0073] Further, based on the density deviation rate of the quartz glass ingot not meeting the preset density deviation rate, it is determined that the discharge speed needs to be adjusted,

[0074] Based on the exceeding value of the density deviation rate exceeding the preset density deviation rate, the subsequent discharge speed is determined in combination with the current discharge speed and the deposition speed of the quartz glass ingot.

[0075] Further, in response to the density deviation rate of the quartz glass ingot not meeting the preset density deviation rate, when the subsequent discharge speed is adjusted, the subsequent discharge speed is set with a correction value of the deposition speed to eliminate the influence of different deposition speeds on the discharge speed, wherein the correction value of the deposition speed is positively correlated with the discharge speed. Thus, in the process of preparing the current quartz glass ingot, the deposition of the quartz glass ingot cannot be continuously prepared, and the quality of the prepared quartz glass ingot is ensured, so as to adjust the deposition speed of the quartz glass ingot to ensure the continuity of the deposition of the quartz glass ingot.

[0076] Further, the transport interval is related to the cutting speed, and the faster the cutting speed, the shorter the transport interval. Thus, the integrity of the processing quartz glass ingot cycle is ensured, and redundant processing time is avoided, that is, neither cutting of the quartz glass ingot nor discharging of the quartz glass ingot is performed, which leads to excessive deposition of the quartz glass ingot in the deposition furnace, causing the deposition furnace reaction to stop, affecting the preparation speed of the quartz glass ingot.

[0077] Further, the periodic detection of the roughness of the cutting surface of the quartz glass ingot is related to the quality and volume of the quartz glass ingot. Therefore, when the cutting of the quartz glass ingot is detected to be unqualified, the cutting speed can be corrected in time to ensure that the end surface of the quartz glass ingot is qualified. When the quality of the quartz glass ingot is detected to be unqualified, the cooling process can be corrected in time to avoid the rapid cooling of the prepared quartz glass ingot, which leads to unqualified quality and a large number of defective products, resulting in waste of raw materials and production time.

[0078] Further, the synthesis quartz glass ingot deposition process includes carrying the initial flow rate of high-purity silicon tetrachloride vapor into the oxyhydrogen flame in the deposition furnace by oxygen, burning to generate water vapor, and hydrolyzing the silicon tetrachloride vapor to generate silica deposition on the support assembly to form high-purity quartz glass ingot. Thus, the continuous deposition of the quartz glass ingot is ensured, and the preparation of the quartz glass ingot is performed.

[0079] Specifically, embodiments of the structure and function of the device used in the continuous deposition method of the synthesized quartz glass ingot are described in detail.

[0080] The deposition furnace includes a hearth and a furnace bottom, and the furnace bottom can rotate to perform the oxyhydrogen flame chemical vapor deposition process to complete the deposition preparation of the quartz glass ingot. The high-purity silicon tetrachloride vapor is carried into the oxyhydrogen flame by oxygen, burned to generate water vapor, and hydrolyzed with the silicon tetrachloride vapor to generate silica deposition to achieve the deposition preparation of the quartz glass ingot.

[0081] The supporting module comprises a switching platform capable of moving on a plane, the switching platform is provided with two discharge holes coinciding with the outer contour of the quartz glass ingot, each discharge hole is provided with a vertically lifting supporting assembly corresponding to the discharge hole, the supporting assembly supports the deposited quartz glass ingot to move in the deposition direction, in the vertical deposition state, the formed quartz glass ingot can move under its own gravity when the supporting assembly is lowered, so as to realize the discharge in the deposition direction, when the supporting assembly supporting the quartz glass ingot is lowered to the preset position, the quartz glass ingot is cut by the cutting assembly, after the cutting is completed, the switching platform moves in the plane, the quartz glass ingot on the cutting assembly is separated from the upper quartz glass ingot along with the movement of the switching platform, and the lower end surface of the upper quartz glass ingot gradually contacts the plane of the switching platform in the process of being separated from the lower quartz glass ingot, until the other supporting assembly is attached to the lower end surface of the quartz glass ingot which has not been discharged, at this time, the quartz glass ingot which has been discharged is taken off from the corresponding supporting assembly, when the discharge of the quartz glass ingot is completed, the supporting assembly is raised until the upper end surface of the supporting assembly coincides with the upper end surface of the switching platform, and the other supporting assembly is lowered to support the cut quartz glass ingot, until the upper end surface of the part of the quartz glass ingot coincides with the upper end surface of the switching platform, the plane of the switching platform is moved again, the positions of the two supporting assemblies are switched again, the discharge of the part of the quartz glass ingot which has been cut is carried out, and the process is repeated to realize the continuous discharge and continuous deposition of the deposited quartz glass ingot.

[0082] The isolation module is arranged on the furnace bottom and covers the outer contour of the deposited quartz glass ingot, provides an isolation space, and ensures the isolation of the external environment and the space in the deposition furnace, prevents the external space from affecting the environment in the internal space of the deposition furnace, and causes the hydrogen-oxygen flame chemical vapor deposition process to be unable to proceed, the deposition processing of the quartz glass ingot to be interrupted or affected;

[0083] The isolation module comprises a heating assembly, the heating assembly can adjust the temperature of the space in the isolation module, so as to adjust the temperature change rate of the deposited quartz glass ingot in the cooling process, control the cooling speed of the quartz glass ingot, and further control the quality of the quartz glass ingot;

[0084] The cutting module is arranged on the isolation module, provides a space for cutting the quartz glass ingot, further comprises a cutting assembly, the cutting assembly can rotate around the quartz glass ingot to periodically cut the quartz glass ingot, so as to complete the separation of part of the deposited quartz glass ingot, facilitate the discharge of the cut part of the quartz glass ingot, and ensure the continuous cutting, discharging and deposition of the deposited quartz glass ingot.

[0085] The negative pressure assembly is arranged on the cutting module and can form a negative pressure environment in the space of the cutting module, so that the air on both sides flows to the space of the cutting module and then flows out through the negative pressure assembly, thereby sufficiently isolating the space below the cutting module from the space of the isolation module, ensuring that the space of the isolation module protects the quartz glass ingot deposition environment inside the deposition furnace, and ensuring the qualification of the deposition environment and stable deposition of the quartz glass ingot.

[0086] The protection module is arranged at the lower part of the cutting module and supports the upper part of the module, can protect the quartz glass ingot which automatically falls under the action of gravity, and can also limit the quartz glass ingot when the switching platform moves. The protection module further includes a fixing assembly which can tightly fix the outer contour of the quartz glass ingot to ensure that the cutting position and integrity will not deviate due to movement of the quartz glass ingot when the cutting assembly cuts the quartz glass ingot, ensuring that the quartz glass ingot can be fully cut and separated, and preventing incomplete cutting which can cause the switching platform to be stuck and unable to discharge.

[0087] The measurement module includes a laser ranging assembly installed on the supporting assembly to measure the distance of the supporting assembly falling, determine the distance between the two end faces of the cut quartz glass ingot, and check the falling speed of the supporting assembly in combination with the falling time of the supporting assembly to ensure the accuracy of continuous deposition and cutting and discharging of the supporting assembly supporting the quartz glass ingot. The measurement module further includes a plurality of measurement assemblies which respectively measure the mass, volume and roughness of the cut quartz glass ingot to be delivered to the intelligent control module.

[0088] Specifically, embodiments for determining the qualification of cutting processing during periodic cutting of a quartz glass ingot are described in detail.

[0089] The intelligent control module obtains the roughness value of the quartz glass ingot measured by the measurement module, and determines the qualification of cutting of the quartz glass ingot,

[0090] The roughness value is compared with a preset roughness value,

[0091] If the roughness value is less than or equal to the preset roughness value, the cutting of the quartz glass ingot is qualified,

[0092] If the roughness value is greater than the preset roughness value, the cutting of the quartz glass ingot is unqualified,

[0093] When the roughness value is less than or equal to the preset roughness value, the cutting speed can be increased to ensure that the cut quartz glass ingot is qualified while increasing the speed of continuous deposition, cutting and discharging of the quartz glass ingot, thereby rapidly producing the quartz glass ingot;

[0094] When the roughness value is greater than the preset roughness value, the cutting speed can be reduced to ensure the qualification of the cutting of the quartz glass ingot.

[0095] By judging the roughness of the cutting surface of the quartz glass ingot cut down for cutting, it is ensured that when cutting the deposited quartz glass ingot, the end face of the cut quartz glass ingot is qualified, and secondary processing is not required, thereby avoiding waste of the quartz glass ingot and optimizing some preparatory links of the quartz glass ingot in use, and increasing the use efficiency and convenience of the quartz glass ingot.

[0096] Specifically, the embodiment for judging the quality of the quartz glass ingot by detecting the mass and volume of the quartz glass ingot is described in detail:

[0097] According to the mass and volume of each quartz glass ingot cut down for cutting, the density deviation rate is determined, and the qualification of the density deviation rate of the cut quartz glass ingot is judged,

[0098] According to the density deviation rate, the descending speed of the supporting assembly is re-determined,

[0099] The process of determining the density deviation rate includes,

[0100] The intelligent control module acquires the mass and volume of the cut quartz glass ingot measured by the measuring module,

[0101] The mass divided by the volume determines the actual density,

[0102] The ideal density-actual density=density deviation amount,

[0103] The density deviation amount ÷ ideal density=density deviation rate,

[0104] The density deviation rate is compared with the preset density deviation rate, and the qualification of the density deviation rate of the quartz glass ingot is judged,

[0105] If the density deviation rate is less than the preset density deviation rate, the density deviation rate of the quartz glass ingot is unqualified,

[0106] If the density deviation rate is greater than or equal to the preset density deviation rate, the density deviation rate of the quartz glass ingot is qualified,

[0107] The qualification of the density deviation rate of the quartz glass ingot can reflect the qualification of the quality of the quartz glass ingot;

[0108] When the density deviation rate is less than the preset density deviation rate, the cutting speed is adjusted according to the cutting quality of the quartz glass ingot, so as to prolong the time of the quartz glass ingot after settling to discharging, so as to ensure that the quartz glass ingot can complete the cooling process in a controllable environment. When the cutting speed is not enough to meet the requirement of the density deviation rate of the quartz glass ingot based on the separate adjustment of the cutting speed, the lowering speed of the supporting assembly is re-determined according to the cutting speed of the quartz glass ingot and the current lowering speed of the supporting assembly, and the lowering speed of the supporting assembly is reduced, so as to ensure that the quartz glass ingot after settling is cooled at a temperature in the isolation module, the cutting module and the protection module, so as to avoid that the settled quartz glass ingot quickly enters the cutting stage and the discharging stage, and quickly cools with the normal temperature environment in the discharging process, which causes that the cooling speed is too fast to affect the quality of the quartz glass ingot;

[0109] The temperature of the space in the isolation module is adjusted by adjusting the heating assembly to adjust the cooling process of the settled quartz glass ingot, so as to control the cooling speed of the quartz glass ingot, and then control the quality of the quartz glass ingot;

[0110] Specifically, the embodiment for determining the quality of the cooling process is described in detail:

[0111] The temperature of the space in the isolation module is periodically detected to determine the quality of the cooling process,

[0112] The intelligent control module obtains the first temperature value and the second temperature value of the temperature sensor installed on the isolation module and the protection module to measure the temperature of the quartz glass ingot during cooling, so as to determine the temperature change rate and judge the quality of the cooling process,

[0113] The initial temperature value of the quartz glass ingot after settling in the settling furnace is determined,

[0114] The first temperature difference is determined by subtracting the second temperature value from the initial temperature value,

[0115] The time interval of the switching platform movement is determined as the first interval,

[0116] The length of the cut quartz glass ingot is determined as the first length,

[0117] The length of the bottom of the settling furnace from the lower end surface of the protection module is determined as the second length,

[0118] The first cooling time is determined by the second length ÷ the first length × the first interval,

[0119] The first temperature change rate is determined by the first temperature difference ÷ the first cooling time,

[0120] The quality of the cooling process of the quartz glass ingot is determined by comparing the first temperature change rate with the first preset temperature change rate range,

[0121] When the first temperature change rate is within the first preset temperature change rate range, the quartz glass ingot cooling process is qualified,

[0122] When the first temperature change rate is not within the first preset temperature change rate range, the quartz glass ingot cooling process is unqualified,

[0123] When the temperature change rate is within the preset temperature change rate range, and the first temperature change rate is greater than the maximum value of the first preset temperature change rate range,

[0124] The heating assembly is adjusted to increase the temperature of the space in the isolation module, so that the quartz glass ingot obtains more heat to reduce the temperature change rate during the cooling process of the quartz glass ingot, avoids rapid cooling of the quartz glass ingot, and makes the cooling process of the quartz glass ingot qualified to ensure the settling quality of the quartz glass ingot. When the adjustment of the heating assembly to increase the temperature of the space in the isolation module to the extreme value is still insufficient to meet the control of the cooling process, the lowering speed of the support assembly is adjusted according to the deposition speed of the quartz glass ingot to speed up the transportation speed of the quartz glass ingot after settling, so as to reduce the cooling process time of the quartz glass ingot, so that the cooling process of the quartz glass ingot is qualified;

[0125] When the temperature change rate is within the preset temperature change rate range, and the first temperature change rate is less than the minimum value of the first preset temperature change rate range,

[0126] The heating assembly is adjusted to decrease the temperature of the space in the isolation module, so that the quartz glass ingot obtains less heat to reduce the temperature change rate during the cooling process of the quartz glass ingot, ensures sufficient cooling of the quartz glass ingot, and makes the cooling process of the quartz glass ingot qualified to ensure the settling quality of the quartz glass ingot. When the adjustment of the heating assembly to decrease the temperature of the space in the isolation module to the extreme value is still insufficient to meet the control of the cooling process, the lowering speed of the support assembly is adjusted according to the deposition speed of the quartz glass ingot to slow down the transportation speed of the quartz glass ingot after settling, so as to increase the cooling process time of the quartz glass ingot, so that the cooling process of the quartz glass ingot is qualified;

[0127] Specifically, embodiments of adjusting the temperature of the space in the isolation module during the cooling process to adjust the cooling process of the quartz glass ingot are described in detail:

[0128] According to the first preset temperature change rate range, the first temperature change rate is determined, and the second preset temperature change rate range is determined,

[0129] The first temperature value minus the second temperature value determines the second temperature difference,

[0130] The distance between the two temperature sensors is determined as the third length,

[0131] The third length ÷ the first length × the first interval = the second cooling time,

[0132] second temperature difference ÷ second cooling time = second temperature change rate,

[0133] comparing the second temperature change rate with the second preset temperature change rate range, to determine the eligibility of the temperature of the space in the isolation module,

[0134] if the second temperature change rate is within the second preset temperature change rate range, it is determined that the temperature of the space in the isolation module is qualified,

[0135] if the second temperature change rate is outside the second preset temperature change rate range, it is determined that the temperature of the space in the isolation module is unqualified,

[0136] When the second temperature change rate is outside the second preset temperature change rate range, the heating assembly is adjusted according to the second preset temperature change rate range to achieve the adjustment of the temperature of the space in the isolation module, so that the second temperature change rate is within the second preset temperature change rate range, to ensure the qualification of the temperature of the space in the isolation module, and further ensure the qualification of the quartz glass ingot cooling process.

[0137] Reference Figure 2 , on the basis of ensuring the qualification of the quartz glass ingot, embodiments for adjusting the cutting speed, the discharge speed and the temperature of the quartz glass ingot during the cooling process to ensure the continuous deposition of the synthetic quartz glass ingot are described in detail:

[0138] based on the adjustment of the lowering speed of the supporting assembly and the cutting speed of the quartz glass ingot being insufficient to meet the density deviation rate,

[0139] According to the first preset temperature change rate range, the second preset temperature change rate range is re-determined in combination with the first temperature change rate, and based on the re-determined second preset temperature change rate range, the working state of the heating assembly is adjusted to re-determine the first temperature value, so that the density deviation rate is determined to be qualified,

[0140] If the density deviation rate cannot still be determined to be qualified, the deposition speed of the quartz glass ingot in the deposition furnace is adjusted to correct the lowering speed of the supporting assembly and the discharge speed, so that the continuous production of the synthetic quartz glass ingot by the hydrogen-oxygen flame chemical vapor deposition process in the deposition furnace can be achieved, and the cutting of the quartz glass ingot by the cutting module and the discharge of the cut quartz glass ingot by the two supporting assemblies can be alternately performed, to achieve the purpose of continuous deposition of the synthetic quartz glass ingot. After adjusting the deposition speed of the quartz glass ingot in the deposition furnace, the cutting speed and the working state of the heating assembly need to be adjusted to the ideal state first, and then the deposition speed of the quartz glass ingot in the deposition furnace and the discharge speed are adjusted, to ensure that the quartz glass ingot after the deposition speed of the quartz glass ingot in the deposition furnace is adjusted is determined, and based on the determination result, each module or each component is adjusted.

[0141] So far, the technical solutions of the present application have been described in combination with the preferred embodiments shown in the drawings, but those skilled in the art can easily understand that the protection scope of the present application is obviously not limited to these specific embodiments. Those skilled in the art can make equivalent changes or replacements to the related technical features without departing from the principles of the present application, and the technical solutions after these changes or replacements will all fall within the protection scope of the present application. In order to make the purposes and advantages of the present application more clear and explicit, the present application will be further described in combination with the embodiments; it should be understood that the specific embodiments described herein are only used to explain the present application and not to limit the present application.

[0142] The preferred embodiments of the present application will be described below with reference to the drawings. Those skilled in the art should understand that these embodiments are only used to explain the technical principles of the present application and are not intended to limit the protection scope of the present application.

[0143] It should be noted that in the description of the present application, the terms "upper", "lower", "left", "right", "inner", "outer" and the like indicating the direction or positional relationship of the terms are based on the direction or positional relationship shown in the drawings, which is only for the convenience of description and does not indicate or imply that the device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present application.

[0144] In addition, it should also be noted that in the description of the present application, unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connection" should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or integrally connected; it can be mechanically connected, or it can be electrically connected; it can be directly connected, or it can be indirectly connected through an intermediate medium, or it can be the communication inside two elements. Those skilled in the art can understand the specific meaning of the above terms in the present application according to the specific circumstances.

[0145] Please refer to Figure 1 The drawings show the details of the embodiments of the synthetic quartz glass ingot continuous deposition, cutting and detecting its eligibility:

[0146] A synthetic quartz glass ingot continuous deposition method, comprising,

[0147] Depositing raw materials of the synthetic quartz glass ingot into a first type of quartz glass ingot according to predetermined steps;

[0148] Cooling the first type of quartz glass ingot during the discharging process, transporting the first type of quartz glass ingot at intervals based on the determined initial discharging speed, and cutting the first type of quartz glass ingot into a second type of quartz glass ingot at the initial cutting speed based on the transportation interval;

[0149] Periodically detecting the roughness, quality and volume of the cutting surface of the second type of quartz glass ingot, and detecting the first temperature value of the isolation module and the second temperature value of the second type of quartz glass ingot during discharging;

[0150] Based on the roughness, the eligibility of the cutting process is determined to re-determine the cutting speed;

[0151] Based on the first temperature value and the second temperature value, the eligibility of the cooling process is determined to re-determine the working state of the heating assembly;

[0152] Based on the quality and volume, the eligibility of the quartz glass ingot is determined to re-determine the cutting speed, or, when the cutting speed alone is not enough to meet the requirements of the eligibility of the quartz glass ingot, the adjustment mode is determined to adjust the cooling effect, wherein,

[0153] When the cutting speed is adjusted to the extreme value and still not enough to meet the requirements of the eligibility of the quartz glass ingot, the adjustment mode is determined to adjust the working state of the heating assembly, and the first temperature value during the cooling process is adjusted by adjusting the heating assembly;

[0154] When the cutting speed and the working state of the heating assembly are adjusted to the extreme value and still not enough to meet the requirements of the eligibility of the quartz glass ingot, the adjustment mode is determined to adjust the discharging speed, and the discharging speed of the first type of quartz glass ingot is adjusted to re-determine the discharging speed, and the cooling time is adjusted.

[0155] Reference Figure 3 Detailed description of the embodiment of adjusting the discharging speed of the quartz glass ingot to ensure the eligibility of the quartz glass ingot:

[0156] Further, the process of determining the eligibility of the quartz glass ingot based on the quality and volume includes,

[0157] Based on the quality and volume, the actual density of the second type of quartz glass ingot is determined, and the ideal density is determined to determine the density deviation rate,

[0158] The density deviation rate is compared with the preset density deviation rate to determine the eligibility of the second type of quartz glass ingot,

[0159] Based on the unqualified second type of quartz glass ingot, the cutting speed is adjusted to ensure the eligibility of the second type of quartz glass ingot.

[0160] Reference Figure 4 Detailed description of the embodiment of adjusting the working state of the heating assembly based on the unqualified quartz glass ingot cooling process to re-determine the first temperature value:

[0161] Further, the process of determining the eligibility of the cooling process includes,

[0162] The intelligent control module obtains a first temperature value of a first temperature sensor installed on the isolation module to measure the internal temperature thereof and a second temperature value of a temperature sensor installed on the protection module to measure the temperature of the second type of quartz glass weight, and determines a first temperature change rate based on an initial temperature value of the first type of quartz glass weight after being settled in the deposition furnace,

[0163] The first temperature change rate is compared with a first preset temperature change rate range to determine the eligibility of the cooling process,

[0164] Based on the unqualified cooling process, the heating assembly is regulated to re-determine the first temperature value to meet the eligibility requirement of the cooling process.

[0165] Further, the process of re-determining the cutting speed based on the roughness includes,

[0166] The intelligent control module obtains the roughness of the cutting surface of the second type of quartz glass weight,

[0167] The roughness is compared with a preset roughness to determine its eligibility,

[0168] Based on the unqualified roughness, the cutting speed is adjusted to be reduced to meet the eligibility requirement of the roughness of the cutting surface of the second type of quartz glass weight.

[0169] Further, based on the unqualified quartz glass weight, when it is confirmed that the cutting speed of the quartz glass weight is insufficient to meet the eligibility requirement of the quartz glass weight, the second preset temperature change rate range is re-determined based on the first preset temperature change rate range and the first temperature change rate, and the working state of the heating assembly is re-determined.

[0170] Further, based on the density deviation rate of the quartz glass weight not meeting the preset density deviation rate, it is determined that the discharge speed needs to be adjusted,

[0171] Based on the exceeding value of the density deviation rate exceeding the preset density deviation rate, the subsequent discharge speed is determined in combination with the current discharge speed and the deposition speed of the quartz glass weight.

[0172] Further, in response to the density deviation rate of the quartz glass weight not meeting the preset density deviation rate, when the subsequent discharge speed is adjusted, a deposition speed correction value is set for the subsequent discharge speed to eliminate the influence of different deposition speeds on the discharge speed, wherein the deposition speed correction value is positively correlated with the discharge speed. Thus, in the process of preparing the current quartz glass weight, the deposition speed of the quartz glass weight is adjusted to ensure the continuity of the deposition of the quartz glass weight, while ensuring the quality of the prepared quartz glass weight.

[0173] Further, the transport interval is related to the cutting speed, the faster the cutting speed, the shorter the transport interval. Thus, the integrity of the quartz glass ingot processing cycle is ensured, and redundant processing time is avoided, that is, neither cutting of the quartz glass ingot nor discharging of the quartz glass ingot is performed, which leads to excessive deposition of the quartz glass ingot in the deposition furnace, causing the deposition furnace reaction to stop, affecting the preparation speed of the quartz glass ingot.

[0174] Further, the periodic detection of the roughness of the cutting surface of the quartz glass ingot is related to the periodic interval of the detection of the quality and volume of the quartz glass ingot and the qualification of the quartz glass ingot. Thus, when the cutting of the quartz glass ingot is detected to be unqualified, the cutting speed can be corrected in time to ensure that the end surface of the quartz glass ingot is cut and processed to be qualified; when the quality of the quartz glass ingot is detected to be unqualified, the cooling process can be corrected in time to avoid the prepared quartz glass ingot being cooled too fast, which leads to unqualified quality, resulting in a large number of defective products of the prepared quartz glass ingot, causing waste of raw materials and waste of production time.

[0175] Further, the deposition process of the synthetic quartz glass ingot includes carrying the initial flow rate of high-purity silicon tetrachloride vapor to the oxyhydrogen flame in the deposition furnace by oxygen, burning to generate water vapor, and hydrolyzing the silicon tetrachloride vapor to generate silicon dioxide, which is deposited on the support assembly to form a high-purity quartz glass ingot. Thus, the continuous deposition of the quartz glass ingot is ensured, and the preparation of the quartz glass ingot is performed.

[0176] Specifically, embodiments of the structure and function of the device used in the continuous deposition method of the synthetic quartz glass ingot are described in detail:

[0177] The deposition furnace includes a furnace chamber and a furnace bottom, the furnace bottom is rotatable, and is used for performing a hydrogen-oxygen flame chemical vapor deposition process to complete the deposition preparation of the quartz glass ingot, that is, the high-purity silicon tetrachloride vapor is carried to the hydrogen-oxygen flame by oxygen, burned to generate water vapor, and the product silicon dioxide is deposited to realize the deposition preparation of the quartz glass ingot;

[0178] The supporting module comprises a switching platform capable of moving on a plane, the switching platform is provided with two discharge holes coinciding with the outer contour of the quartz glass ingot, each discharge hole is provided with a vertically lifting supporting assembly corresponding to the discharge hole, the supporting assembly supports the deposited quartz glass ingot to move in the deposition direction, in the vertical deposition state, the formed quartz glass ingot can move under its own gravity when the supporting assembly is lowered, so as to realize the discharge in the deposition direction, when the supporting assembly supporting the quartz glass ingot is lowered to the preset position, the quartz glass ingot is cut by the cutting assembly, after the cutting is completed, the switching platform moves in the plane, the quartz glass ingot on the cutting assembly is separated from the upper quartz glass ingot along with the movement of the switching platform, and the lower end surface of the upper quartz glass ingot gradually contacts the plane of the switching platform in the process of being separated from the lower quartz glass ingot, until the other supporting assembly is attached to the lower end surface of the quartz glass ingot which has not been discharged, at this time, the quartz glass ingot which has been discharged is taken off from the corresponding supporting assembly, when the discharge of the quartz glass ingot is completed, the supporting assembly is raised until the upper end surface of the supporting assembly coincides with the upper end surface of the switching platform, and the other supporting assembly is lowered to support the cut quartz glass ingot, until the upper end surface of the part of the quartz glass ingot coincides with the upper end surface of the switching platform, the plane of the switching platform is moved again, the positions of the two supporting assemblies are switched again, the discharge of the part of the quartz glass ingot which has been cut is carried out, and the process is repeated to realize the continuous discharge and continuous deposition of the deposited quartz glass ingot.

[0179] The isolation module is arranged on the furnace bottom and covers the outer contour of the deposited quartz glass ingot, provides an isolation space, and ensures the isolation of the external environment and the space in the deposition furnace, prevents the external space from affecting the environment in the internal space of the deposition furnace, and causes the hydrogen-oxygen flame chemical vapor deposition process to be unable to proceed, the deposition processing of the quartz glass ingot to be interrupted or affected;

[0180] The isolation module comprises a heating assembly, the heating assembly can adjust the temperature of the space in the isolation module, so as to adjust the temperature change rate of the deposited quartz glass ingot in the cooling process, control the cooling speed of the quartz glass ingot, and further control the quality of the quartz glass ingot;

[0181] The cutting module is arranged on the isolation module, provides a space for cutting the quartz glass ingot, further comprises a cutting assembly, the cutting assembly can rotate around the quartz glass ingot to periodically cut the quartz glass ingot, so as to complete the separation of part of the deposited quartz glass ingot, facilitate the discharge of the cut part of the quartz glass ingot, and ensure the continuous cutting, discharging and deposition of the deposited quartz glass ingot.

[0182] The negative pressure assembly is arranged on the cutting module and can form a negative pressure environment in the space of the cutting module, so that the air on both sides flows to the space of the cutting module and then flows out through the negative pressure assembly, thereby sufficiently isolating the space below the cutting module from the space of the isolation module, ensuring that the space of the isolation module protects the quartz glass ingot deposition environment inside the deposition furnace, and ensuring the qualification of the deposition environment and stable deposition of the quartz glass ingot.

[0183] The protection module is arranged at the lower part of the cutting module and supports the upper part of the module, can protect the quartz glass ingot which automatically falls under the action of gravity, and can also limit the quartz glass ingot when the switching platform moves. The protection module further includes a fixing assembly which can tightly fix the outer contour of the quartz glass ingot to ensure that the cutting position and integrity will not deviate due to movement of the quartz glass ingot when the cutting assembly cuts the quartz glass ingot, ensuring that the quartz glass ingot can be fully cut and separated, and preventing incomplete cutting which can cause the switching platform to be stuck and unable to discharge.

[0184] The measurement module includes a laser ranging assembly installed on the supporting assembly to measure the distance of the supporting assembly falling, determine the distance between the two end faces of the cut quartz glass ingot, and check the falling speed of the supporting assembly in combination with the falling time of the supporting assembly, to ensure the accuracy of continuous deposition and cutting and discharging of the supporting assembly supporting the quartz glass ingot. The measurement module further includes a plurality of measurement assemblies which respectively measure the mass, volume and roughness of the cut surface of the discharged quartz glass ingot to be transmitted to the intelligent control module.

[0185] Specifically, embodiments for determining the qualification of cutting processing in the process of periodically cutting the quartz glass ingot are described in detail.

[0186] The intelligent control module obtains the roughness value of the quartz glass ingot measured by the measurement module, and determines the qualification of cutting the quartz glass ingot,

[0187] The roughness value is compared with the preset roughness value,

[0188] If the roughness value is less than or equal to the preset roughness value, the cutting of the quartz glass ingot is qualified,

[0189] If the roughness value is greater than the preset roughness value, the cutting of the quartz glass ingot is unqualified,

[0190] When the roughness value is less than or equal to the preset roughness value, the cutting speed can be increased to ensure that the cut quartz glass ingot is qualified, and the speed of continuous deposition, cutting and discharging of the quartz glass ingot is increased to quickly produce the quartz glass ingot;

[0191] When the roughness value is greater than the preset roughness value, the cutting speed can be reduced to ensure that the cutting of the quartz glass ingot is qualified.

[0192] By judging the roughness of the cutting surface of the quartz glass ingot cut down for cutting, it is ensured that when cutting the deposited quartz glass ingot, the end face of the cut quartz glass ingot is qualified, and secondary processing is not required, thereby avoiding waste of the quartz glass ingot and optimizing some preparatory links of the quartz glass ingot in use, and increasing the use efficiency and convenience of the quartz glass ingot.

[0193] Specifically, the embodiment for judging the quality of the quartz glass ingot by detecting the mass and volume of the quartz glass ingot is described in detail:

[0194] According to the mass and volume of each quartz glass ingot cut down for cutting, the density deviation rate is determined, and the qualification of the density deviation rate of the cut quartz glass ingot is judged,

[0195] According to the density deviation rate, the descending speed of the supporting assembly is re-determined,

[0196] The process of determining the density deviation rate includes,

[0197] The intelligent control module obtains the mass and volume of the cut quartz glass ingot measured by the measuring module,

[0198] The mass divided by the volume determines the actual density,

[0199] The ideal density-actual density=density deviation amount,

[0200] The density deviation amount ÷ ideal density=density deviation rate,

[0201] The density deviation rate is compared with the preset density deviation rate, and the qualification of the density deviation rate of the quartz glass ingot is judged,

[0202] If the density deviation rate is less than the preset density deviation rate, the density deviation rate of the quartz glass ingot is unqualified,

[0203] If the density deviation rate is greater than or equal to the preset density deviation rate, the density deviation rate of the quartz glass ingot is qualified,

[0204] The qualification of the density deviation rate of the quartz glass ingot can reflect the qualification of the quality of the quartz glass ingot;

[0205] When the density deviation rate is less than the preset density deviation rate, the cutting speed is adjusted according to the cutting quality of the quartz glass ingot, so as to prolong the time of the quartz glass ingot after settling to discharging, so as to ensure that the quartz glass ingot can complete the cooling process in a controllable environment. When the cutting speed is not enough to meet the requirement of the density deviation rate of the quartz glass ingot, the lowering speed of the supporting assembly is re-determined according to the cutting speed of the quartz glass ingot and the current lowering speed of the supporting assembly, and the lowering speed of the supporting assembly is reduced, so as to ensure that the quartz glass ingot after settling is cooled in the temperature of the isolation module, the cutting module and the protection module, so as to avoid that the settled quartz glass ingot quickly enters the cutting stage and the discharging stage, and quickly cools with the normal temperature environment in the discharging process, which causes that the cooling speed is too fast to affect the quality of the quartz glass ingot;

[0206] The temperature of the space in the isolation module is adjusted by adjusting the heating assembly, so as to adjust the cooling process of the settled quartz glass ingot, so as to control the cooling speed of the quartz glass ingot, and then control the quality of the quartz glass ingot;

[0207] Specifically, the embodiment for determining the quality of the cooling process is described in detail:

[0208] The temperature of the space in the isolation module is periodically detected, and the quality of the cooling process is determined,

[0209] The intelligent control module obtains the first temperature value and the second temperature value of the temperature sensor installed on the isolation module and the protection module to measure the temperature of the quartz glass ingot during cooling, so as to determine the temperature change rate and judge the quality of the cooling process,

[0210] The initial temperature value of the quartz glass ingot after settling in the settling furnace is determined,

[0211] The first temperature difference is determined by subtracting the second temperature value from the initial temperature value,

[0212] The time interval of the switching platform movement is determined as the first interval,

[0213] The length of the cut quartz glass ingot is determined as the first length,

[0214] The length of the bottom of the settling furnace from the lower end surface of the protection module is determined as the second length,

[0215] The first cooling time is determined by the second length ÷ the first length × the first interval,

[0216] The first temperature change rate is determined by the first temperature difference ÷ the first cooling time,

[0217] The quality of the cooling process of the quartz glass ingot is determined by comparing the first temperature change rate with the first preset temperature change rate range,

[0218] When the first temperature change rate is within the first preset temperature change rate range, the quartz glass ingot cooling process is qualified,

[0219] When the first temperature change rate is not within the first preset temperature change rate range, the quartz glass ingot cooling process is unqualified,

[0220] When the temperature change rate is within the preset temperature change rate range, and the first temperature change rate is greater than the maximum value of the first preset temperature change rate range,

[0221] The heating assembly is adjusted to increase the temperature of the space in the isolation module, so that the quartz glass ingot obtains more heat to reduce the temperature change rate during the cooling process of the quartz glass ingot, avoids rapid cooling of the quartz glass ingot, and makes the cooling process of the quartz glass ingot qualified to ensure the settling quality of the quartz glass ingot. When the adjustment of the heating assembly to increase the temperature of the space in the isolation module to the extreme value is still insufficient to meet the control of the cooling process, the lowering speed of the support assembly is adjusted according to the deposition speed of the quartz glass ingot to speed up the transportation speed of the quartz glass ingot after settling, so as to reduce the cooling process time of the quartz glass ingot, so that the cooling process of the quartz glass ingot is qualified;

[0222] When the temperature change rate is within the preset temperature change rate range, and the first temperature change rate is less than the minimum value of the first preset temperature change rate range,

[0223] The heating assembly is adjusted to decrease the temperature of the space in the isolation module, so that the quartz glass ingot obtains less heat to reduce the temperature change rate during the cooling process of the quartz glass ingot, and ensures sufficient cooling of the quartz glass ingot. Make the cooling process of the quartz glass ingot qualified to ensure the settling quality of the quartz glass ingot. When the adjustment of the heating assembly to decrease the temperature of the space in the isolation module to the extreme value is still insufficient to meet the control of the cooling process, the lowering speed of the support assembly is adjusted according to the deposition speed of the quartz glass ingot to slow down the transportation speed of the quartz glass ingot after settling, so as to increase the cooling process time of the quartz glass ingot, so that the cooling process of the quartz glass ingot is qualified;

[0224] Specifically, embodiments of adjusting the temperature of the space in the isolation module during the cooling process to adjust the cooling process of the quartz glass ingot are described in detail:

[0225] According to the first preset temperature change rate range, in combination with the first temperature change rate, a second preset temperature change rate range is determined,

[0226] The first temperature value minus the second temperature value determines a second temperature difference,

[0227] The distance between the two temperature sensors is determined as a third length,

[0228] The third length ÷ the first length × the first interval = the second cooling time,

[0229] second temperature difference ÷ second cooling time = second temperature change rate,

[0230] comparing the second temperature change rate with the second preset temperature change rate range, to determine the eligibility of the temperature of the space in the isolation module,

[0231] if the second temperature change rate is within the second preset temperature change rate range, it is determined that the temperature of the space in the isolation module is qualified,

[0232] if the second temperature change rate is outside the second preset temperature change rate range, it is determined that the temperature of the space in the isolation module is unqualified,

[0233] When the second temperature change rate is outside the second preset temperature change rate range, the heating assembly is adjusted according to the second preset temperature change rate range to achieve the adjustment of the temperature of the space in the isolation module, so that the second temperature change rate is within the second preset temperature change rate range, to ensure the qualification of the temperature of the space in the isolation module, and further ensure the qualification of the quartz glass ingot cooling process.

[0234] Reference Figure 2 Based on the above-mentioned ensuring the qualification of the quartz glass ingot, embodiments for adjusting the cutting speed, the discharge speed and the temperature of the quartz glass ingot during the cooling process to ensure the continuous deposition of the synthetic quartz glass ingot are described in detail:

[0235] When the adjustment of the lowering speed of the supporting assembly and the cutting speed of the quartz glass ingot is not sufficient to meet the density deviation rate,

[0236] According to the first preset temperature change rate range, the second preset temperature change rate range is re-determined in combination with the first temperature change rate, and based on the re-determined second preset temperature change rate range, the working state of the heating assembly is adjusted to re-determine the first temperature value, so that the density deviation rate is determined to be qualified,

[0237] If the density deviation rate cannot still be determined to be qualified, the deposition speed of the quartz glass ingot in the deposition furnace is adjusted to correct the lowering speed of the supporting assembly and the discharge speed, so that the continuous production of the synthetic quartz glass ingot by the hydrogen-oxygen flame chemical vapor deposition process in the deposition furnace can be achieved, and the cutting of the quartz glass ingot by the cutting module and the discharge of the cut quartz glass ingot by the two supporting assemblies can be alternately performed, to achieve the purpose of continuous deposition of the synthetic quartz glass ingot. After adjusting the deposition speed of the quartz glass ingot in the deposition furnace, the cutting speed and the working state of the heating assembly need to be adjusted to the ideal state first, and then the deposition speed of the quartz glass ingot in the deposition furnace and the discharge speed are adjusted, to ensure that the quartz glass ingot after the adjustment of the deposition speed of the quartz glass ingot in the deposition furnace is determined and the various modules or components are adjusted based on the determination result.

[0238] So far, the technical solutions of the present application have been described in combination with the preferred embodiments shown in the drawings, but it is easy for those skilled in the art to understand that the protection scope of the present application is obviously not limited to these specific embodiments. Those skilled in the art can make equivalent changes or replacements to the related technical features without departing from the principles of the present application, and the technical solutions after these changes or replacements will all fall within the protection scope of the present application.

Claims

1. A method for continuous deposition of synthetic quartz glass ingots, characterized in that comprising, depositing raw materials of the synthetic quartz glass ingot according to a predetermined procedure to form a first type of quartz glass ingot; cooling the first type of quartz glass ingot during discharging, transporting the first type of quartz glass ingot at an interval based on a determined initial discharging speed, and cutting the first type of quartz glass ingot into a second type of quartz glass ingot at an initial cutting speed based on the interval; periodically detecting the roughness, mass, and volume of the cutting surface of the second type of quartz glass ingot, and detecting the first temperature value of the isolation module and the second temperature value of the second type of quartz glass ingot during discharging; based on the roughness, determining the eligibility of the cutting process to re-determine the cutting speed; based on the first temperature value and the second temperature value, determining the eligibility of the cooling process to re-determine the working state of the heating assembly; based on the mass and volume, determining the eligibility of the second type of quartz glass ingot to re-determine the cutting speed, or, based on the fact that adjusting the cutting speed alone is not sufficient to meet the eligibility requirements of the second type of quartz glass ingot, determining an adjustment mode to adjust the cooling effect, wherein, based on the fact that adjusting the cutting speed to an extreme value is still not sufficient to meet the eligibility requirements of the second type of quartz glass ingot, determining the adjustment mode to be adjusting the working state of the heating assembly to regulate the first temperature value during the cooling process by adjusting the heating assembly; based on the fact that adjusting the cutting speed and the working state of the heating assembly to an extreme value is still not sufficient to meet the eligibility requirements of the second type of quartz glass ingot, determining the adjustment mode to be adjusting the discharging speed, and re-determining the discharging speed by adjusting the deposition speed of the first type of quartz glass ingot to regulate the cooling time; the process of determining the eligibility of the second type of quartz glass ingot based on the mass and volume includes, determining the actual density of the second type of quartz glass ingot based on the mass and volume, and determining the density deviation rate based on the ideal density, comparing the density deviation rate with a preset density deviation rate to determine the eligibility of the second type of quartz glass ingot, based on the unqualified second type of quartz glass ingot, regulating the cutting speed to ensure the eligibility of the second type of quartz glass ingot.

2. The method according to claim 1, wherein the process of determining the eligibility of the cooling process includes, the intelligent control module obtains the first temperature value of the first temperature sensor installed on the isolation module to measure the internal temperature of the isolation module and the second temperature value of the temperature sensor installed on the protection module to measure the temperature of the second type of quartz glass ingot, and determines the first temperature change rate based on the initial temperature value of the first type of quartz glass ingot after settling in the deposition furnace, compares the first temperature change rate with a first preset temperature change rate range to determine the eligibility of the cooling process, based on the unqualified cooling process, regulates the heating assembly to re-determine the first temperature value to meet the eligibility requirements of the cooling process.

3. The method according to claim 2, wherein the process of determining the eligibility of the cutting process based on the roughness to re-determine the cutting speed includes, the intelligent control module obtains the roughness of the cutting surface of the second type of quartz glass ingot, compares the roughness with a preset roughness to determine its eligibility, Based on the unqualified roughness, the cutting speed is adjusted to meet the roughness requirements of the second type of quartz glass ingot.

4. The continuous deposition method of synthetic quartz glass ingot according to claim 3, wherein, When it is determined that the cutting speed is insufficient to meet the requirements of the second type of quartz glass ingot based on the unqualified second type of quartz glass ingot, the working state of the heating assembly is re-determined according to the first preset temperature change rate range and the first temperature change rate.

5. The continuous deposition method of synthetic quartz glass ingot according to claim 4, wherein, When the density deviation rate of the second type of quartz glass ingot does not meet the preset density deviation rate, it is determined that the discharge speed needs to be adjusted, Based on the exceeding value of the density deviation rate exceeding the preset density deviation rate, the subsequent discharge speed is determined in combination with the current discharge speed and the deposition speed of the first type of quartz glass ingot.

6. The continuous deposition method of synthetic quartz glass ingot according to claim 5, wherein, In response to the density deviation rate of the second type of quartz glass ingot not meeting the preset density deviation rate, the subsequent discharge speed is adjusted, and a deposition speed correction value is set for the subsequent discharge speed to eliminate the influence of different deposition speeds on the discharge speed, wherein the deposition speed correction value is positively correlated with the discharge speed.

7. The continuous deposition method of synthetic quartz glass ingot according to claim 1, wherein, The transport interval is related to the cutting speed, and the faster the cutting speed, the shorter the transport interval.

8. The synthetic quartz glass boule continuous deposition method according to claim 1, characterized by, The roughness of the cutting surface of the second type of quartz glass ingot is periodically detected, and the periodic interval of detecting the mass and volume of the second type of quartz glass ingot is related to the qualification of the quartz glass ingot.

9. The synthetic quartz glass boule continuous deposition method according to claim 1, characterized by, The deposition process of the synthetic quartz glass ingot includes carrying the high-purity silicon tetrachloride vapor with an initial flow rate by oxygen into the hydrogen-oxygen flame in the deposition furnace, burning to generate water vapor, and generating a hydrolysis reaction with the silicon tetrachloride vapor to form silica deposition on the support assembly to form a high-purity quartz glass ingot.

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