Quartz tube cleaning device, cleaning method and cleaning system

Abstract

The invention discloses a quartz tube cleaning device. The quartz tube cleaning device comprises a cleaning tank, a rotating mechanism, an acid liquor supply mechanism, a flushing mechanism and a drying mechanism. The rotating mechanism is used for bearing the quartz tube and driving the quartz tube to rotate; the acid liquor supply mechanism can input acid liquor into the cleaning tank and pump the acid liquor out of the cleaning tank; the flushing mechanism can spray pure water to the outer wall of the quartz tube through an external spray head and spray pure water to the interior of the quartz tube through an internal spray head; the drying mechanism is used for spraying dry gas to the quartz tubes in the cleaning tank. After a quartz tube is placed in the cleaning tank, the quartz tube can be subjected to acid pickling through the acid liquor supply mechanism, and then the quartz tube is subjected to pure water flushing through the flushing mechanism; and finally, the quartz tube can be dried through the drying mechanism, a plurality of cleaning stations do not need to be arranged to execute different cleaning steps, and therefore carrying equipment does not need to be additionally arranged to carry the quartz tube to move among the cleaning stations, and the cleaning cost is reduced. The invention further discloses a cleaning method and a cleaning system.

Description

TECHNICAL FIELD

[0001] The application belongs to the technical field of quartz tube cleaning, and particularly relates to a quartz tube cleaning device, a cleaning method and a cleaning system. BACKGROUND

[0002] Indium phosphide substrates have application markets in the fields of high-frequency high-power devices, optical fiber communication, wireless transmission, radio astronomy and other radio frequency devices. Radio frequency devices manufactured using indium phosphide substrates have shown excellent performance in satellite, radar and other application scenarios. They have strong competitiveness in the radio frequency front end of radar and communication systems, analog / hybrid signal wide bandwidth circuits, and are suitable for high-speed data processing, high-precision wide bandwidth A / D conversion and other applications. In addition, indium phosphide-based radio frequency device-related devices such as low-noise amplifiers, modules and receivers are also widely used in satellite communication, millimeter wave radar, active and passive millimeter wave imaging and other equipment. At the bandwidth level of 100GHz and above, the use of indium phosphide-based radio frequency devices has obvious advantages in wireless transmission of backhaul networks and point-to-point communication networks. In the future, in 6G communication or even 7G communication wireless transmission networks, indium phosphide substrates are expected to become the mainstream substrate material for radio frequency devices.

[0003] The preparation process of an indium phosphide substrate generally includes three stages. The first stage is crystal growth to form an indium phosphide single crystal ingot. The second stage is wafer forming, in which the single crystal ingot is sliced to form a wafer. The third stage is wafer processing to form an indium phosphide substrate. In the preparation process, crystal growth is the most critical and technically most difficult step. The quality of the grown crystal directly determines the upper limit of the performance and reliability of the device.

[0004] In the crystal growth process, a diffusion furnace and other equipment are usually used, and a quartz tube is also used as a process chamber or reaction chamber in the diffusion furnace. The cleanliness of the quartz tube directly affects the quality of the crystal growth. Therefore, the quartz tube is usually cleaned before use. The existing cleaning of the quartz tube usually includes acid pickling, pure water rinsing and drying of the quartz tube. However, the existing cleaning steps of the quartz tube are distributed in multiple stations, and in addition to the cleaning equipment, a handling device is also needed to transfer the quartz tube between different stations, resulting in high equipment cost. SUMMARY

[0005] The technical problem to be solved by the present application is that the existing quartz tube cleaning steps are distributed in different stations, and a handling device is needed to transfer the quartz tube between different stations, resulting in high equipment cost. To solve this technical problem, a quartz tube cleaning device, a cleaning method and a cleaning system are provided, which can clean the quartz tube and have low cost.

[0006] The technical solution provided by the present application is as follows: A quartz tube cleaning device comprises: a cleaning tank; a rotating mechanism arranged in the cleaning tank, the rotating mechanism being configured to carry and drive a quartz tube to rotate; an acid liquid supply mechanism configured to input and extract acid liquid from the cleaning tank; a flushing mechanism including an external nozzle and an internal nozzle arranged in the cleaning tank, the flushing mechanism being configured to spray pure water to an outer wall of the quartz tube through the external nozzle, and the flushing mechanism being configured to spray pure water to an inner portion of the quartz tube through the internal nozzle; a drying mechanism configured to spray dry gas to the quartz tube in the cleaning tank.

[0007] With the quartz tube cleaning device, after the quartz tube is placed in the cleaning tank, the acid liquid supply mechanism can be used to provide acid liquid to perform pickling on the quartz tube, then the flushing mechanism can be used to perform pure water flushing on the quartz tube, and finally the drying mechanism can be used to perform drying on the quartz tube. In this way, the pickling, pure water flushing and drying operations can be sequentially performed in the cleaning tank, without the need to set multiple cleaning stations to perform different cleaning steps, so that additional conveying equipment is not needed to convey the quartz tube between the multiple cleaning stations, thereby reducing the cleaning cost. In addition, during the cleaning process, the quartz tube can be kept rotating under the driving of the rotating mechanism, so that the quartz tube can be conveniently and comprehensively cleaned, and the cleaning effect on the quartz tube is improved.

[0008] Further, the flushing mechanism further includes a water supply assembly and a drainage assembly, the water supply assembly being connected with the external nozzle and the internal nozzle; a plurality of drainage openings are formed in the bottom of the cleaning tank, and the drainage assembly is connected with the plurality of drainage openings.

[0009] Further, the drainage assembly includes a buffer, a plurality of drainage pipes and a plurality of drainage valves, the plurality of drainage pipes are connected with the buffer and the plurality of drainage openings, and each of the drainage valves is arranged in a corresponding one of the drainage pipes.

[0010] Further, the cleaning tank is further provided with an overflow opening, and the height of the overflow opening is higher than the height of the quartz tube.

[0011] Further, the drying mechanism includes an external air nozzle and an internal air nozzle, the drying mechanism is configured to spray dry gas to the outer wall of the quartz tube through the external air nozzle, and the drying mechanism is configured to spray dry gas to the inner portion of the quartz tube through the internal air nozzle.

[0012] Further, a telescopic assembly is further included, the telescopic assembly is arranged in the cleaning tank and connected with the internal nozzle and the internal air nozzle, so as to drive the internal nozzle and the internal air nozzle to extend into or move out of the quartz tube.

[0013] Further, the spraying direction of the internal nozzle is towards the bottom wall of the quartz tube and is inclined downward relative to the axial direction of the quartz tube.

[0014] Further, the spraying direction of the internal nozzle is towards the bottom wall of the quartz tube and is inclined downward relative to the axial direction of the quartz tube.

[0015] A cleaning method based on the quartz tube cleaning device, the cleaning method comprising the steps of: S110, placing the quartz tube on the rotating mechanism, the rotating mechanism driving the quartz tube to rotate; S120, the acid liquid supply mechanism inputs hydrofluoric acid into the cleaning tank until the acid liquid immerses the quartz tube; S130, the acid liquid supply mechanism extracts the hydrofluoric acid in the cleaning tank; S140, the flushing mechanism flushes the outer wall and the inner wall of the quartz tube through the external nozzle and the internal nozzle; S150, the drying mechanism sprays dry gas towards the quartz tube.

[0016] A cleaning system comprising a process chamber, a gas extraction device and the quartz tube cleaning device, the cleaning device being arranged in the process chamber, and the gas extraction device being used to extract the gas in the process chamber.

[0017] In summary, the quartz tube cleaning device, the cleaning method and the cleaning system provided by the present application have at least one of the following advantages: 1. The quartz tube is subjected to pickling, pure water flushing and drying in the cleaning tank, without the need to set up a conveying device, thereby reducing the cost; 2. The rotating mechanism drives the quartz tube to rotate during the cleaning process, thereby improving the cleaning effect and the cleaning efficiency; 3. The plurality of liquid discharge ports and the drainage assembly can quickly discharge the water after the quartz tube is immersed in the pure water, thereby improving the cleaning efficiency; 4. The internal nozzle and the internal gas nozzle can be driven to extend into the quartz tube through the telescopic assembly, thereby improving the cleaning effect and the cleaning efficiency; 5. When the internal nozzle and the internal gas nozzle extend into the quartz tube, the spraying directions of the internal nozzle and the internal gas nozzle are both towards the bottom wall of the quartz tube and are inclined downward relative to the axial direction of the quartz tube, thereby achieving comprehensive cleaning of the quartz tube and providing downward pressure for the quartz tube, thereby reducing the sliding phenomenon of the quartz tube on the rotating mechanism. BRIEF DESCRIPTION OF DRAWINGS

[0018] The accompanying drawings are included to provide a further understanding of the present application, and constitute a part of the specification, illustrate the present application together with the embodiments thereof, and explain the present application, but are not for restricting the present application.

[0019] Figure 1A structure schematic diagram of a quartz tube cleaning device provided by an embodiment of the present application is shown in the figure. Figure 2 A structure schematic diagram of a cleaning tank and a rotating mechanism in the quartz tube cleaning device shown in the figure. Figure 1 Figure 3 A structure schematic diagram of an acid liquid removing supply mechanism in the quartz tube cleaning device shown in the figure. Figure 1 Figure 4 A flow chart of a cleaning method provided by an embodiment of the present application is shown in the figure.

[0020] Label explanation: 200, quartz tube; 110, cleaning tank; 120, rotating mechanism; 121, rotating driving part; 122, driving roller; 122, supporting roller; 130, acid liquid supply mechanism; 131, liquid storage tank; 132, liquid supply assembly; 133, liquid return assembly; 141, external spray head; 142, internal spray head; 143, drainage assembly; 144, buffer part; 145, liquid discharge pipe; 146, liquid discharge valve; 151, external air nozzle; 152, internal air nozzle. DETAILED DESCRIPTION

[0021] In order to make the above objectives, features and advantages of the present application more apparent and comprehensible, the specific embodiments of the present application are described in detail below in combination with the drawings. In the following description, a lot of specific details are set forth in order to fully understand the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without departing from the connotation of the present application, therefore the present application is not limited by the specific embodiments disclosed below.

[0022] In the description of the present application, it should be understood that the terms “center”, “longitudinal”, “transverse”, “length”, “width”, “thickness”, “upper”, “lower”, “front”, “back”, “left”, “right”, “vertical”, “horizontal”, “top”, “bottom”, “inner”, “outer”, “clockwise”, “counterclockwise”, “axial”, “radial”, “circumferential” and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation of the present application.

[0023] ​​In addition, the terms "first", "second", etc. are used herein only to describe different instances, and are not used to denote or imply relative importance or a number of indications of the technical features indicated. Thus, the technical features defined with "first", "second", etc. can explicitly or implicitly include at least one of the technical features. In the description of the present application, the meaning of "a plurality of" is at least two, such as two, three, etc., unless otherwise explicitly and specifically limited.

[0024] In the present application, unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connecting", "fixing" and the like should be understood broadly, for example, it can be fixedly connected, or it can be detachably connected, or it can be integrated; it can be mechanically connected, or it can be electrically connected; it can be directly connected, or it can be indirectly connected through an intermediate medium; it can be the internal communication of two elements or the interaction relationship between two elements, unless otherwise explicitly limited. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0025] In the present application, unless otherwise explicitly specified and limited, the first feature is "on" or "under" the second feature, which can be direct contact between the first and second features, or indirect contact between the first and second features through an intermediate medium. Moreover, the first feature "above", "above" and "above" the second feature can be directly above or obliquely above the first feature, or only indicate that the horizontal height of the first feature is higher than that of the second feature. The first feature "below", "below" and "below" the second feature can be directly below or obliquely below the first feature, or only indicate that the horizontal height of the first feature is less than that of the second feature.

[0026] It should be noted that when an element is referred to as "fixed to" or "disposed on" another element, it can be directly on the other element or there can be a middle element. When an element is considered to be "connected" to another element, it can be directly connected to the other element or there can be a middle element. The terms "vertical", "horizontal", "up", "down", "left", "right" and similar expressions used herein are for illustrative purposes only and are not the only embodiment.

[0027] In one aspect, the present application provides a quartz tube cleaning device, which can clean and dry the quartz tube, and the cleaning and drying steps can be carried out at the same station, without the need to set up a conveying device to convey the quartz tube to different stations for cleaning, which is lower in cost.

[0028] As Figure 1 and Figure 2As shown, in one embodiment, the quartz tube 200 cleaning device comprises a cleaning tank 110, a rotating mechanism 120, an acid liquid supply mechanism 130, a flushing mechanism, and a drying mechanism. The rotating mechanism 120 is arranged in the cleaning tank 110 and is used to carry and drive the quartz tube 200 to rotate. The acid liquid supply mechanism 130 can input and extract acid liquid from the cleaning tank 110. The flushing mechanism is used to spray pure water to the quartz tube 200 in the cleaning tank 110. The drying mechanism is used to spray dry gas to the quartz tube 200 in the cleaning tank 110. Thus, after the quartz tube 200 is placed on the rotating mechanism 120, the rotating mechanism 120 drives the quartz tube 200 to rotate, and then the acid liquid supply mechanism 130 inputs acid liquid into the cleaning tank 110 until the acid liquid immerses the quartz tube 200. After a period of immersion, the acid liquid supply mechanism 130 extracts the acid liquid. Next, the flushing mechanism sprays pure water to the quartz tube 200 to clean the residual acid liquid and impurities on the quartz tube 200. Finally, the drying mechanism sprays dry gas to the quartz tube 200 to dry the quartz tube 200.

[0029] By using the above quartz tube 200 cleaning device, after the quartz tube 200 is placed in the cleaning tank 110, acid liquid can be provided by the acid liquid supply mechanism 130 to perform acid pickling on the quartz tube 200, and then the flushing mechanism is used to perform pure water flushing on the quartz tube 200. Finally, the drying mechanism can be used to dry the quartz tube 200. Thus, acid pickling, pure water flushing, and drying operations can be sequentially performed in the cleaning tank 110, without the need to set multiple cleaning stations to perform different cleaning steps, thereby reducing the need to additionally set a conveying device to convey the quartz tube 200 between multiple cleaning stations, and reducing the cleaning cost. In addition, during the cleaning process, the quartz tube 200 can be driven to rotate by the rotating mechanism 120, thereby facilitating comprehensive cleaning of the quartz tube 200 and improving the cleaning effect of the quartz tube 200.

[0030] In one embodiment, the rotating mechanism 120 comprises a rotating drive 121, a drive roller 122, and a support roller 122. The drive roller 122 and the support roller 122 are both rotatably arranged in the cleaning tank 110, and are arranged in parallel and spaced apart from each other, and are used to support and enable the quartz tube 200 to rotate. The rotating drive 121 is connected with the drive roller 122 to drive the drive roller 122 to rotate, thereby driving the quartz tube 200 to rotate.

[0031] It should be noted that in the embodiment, the rotating driving member 121 is located outside the cleaning tank 110, one end of the driving roller 122 can extend out of the cleaning tank 110 and be connected with the rotating driving member 121, and a conventional sealing structure is arranged between the driving roller 122 and the cleaning tank 110 to avoid acid liquid leakage when the acid liquid is soaked. In addition, in other embodiments, the rotating mechanism 120 can be provided with multiple driving rollers 122 and multiple supporting rollers 122, the rotating driving member 121 is connected with the multiple driving rollers 122 at the same time, so as to support and simultaneously drive the multiple quartz tubes 200 to rotate, realize cleaning of the multiple quartz tubes 200, and improve the cleaning efficiency.

[0032] In one embodiment, the driving roller 122 and the supporting roller 122 extend in the length direction of the cleaning tank 110, and the supporting roller 122 can be adjusted in position along the width direction of the cleaning tank 110, so that the rotating mechanism 120 can be suitable for more different sizes of quartz tubes 200, and the versatility of the cleaning device is improved. It should be noted that for the installation of the supporting roller 122, a sliding groove extending in the width direction can be formed in the inner wall of the cleaning tank 110 at both ends, bearings are slidably arranged in the two sliding grooves, and the two ends of the supporting roller 122 are connected to the two bearing seats. Further, the bottom wall of the sliding groove can be sequentially provided with multiple arc-shaped grooves along the extension direction thereof, the arc-shaped grooves of the bottom walls of the two sliding grooves correspond to each other, the bearing seat is placed in different arc-shaped grooves to adjust the position of the supporting roller 122 along the width direction of the cleaning tank 110, and the movement of the supporting roller 122 during cleaning can also be avoided. In addition, it can be determined that the position of the bearing seat can be adjusted according to the size of the quartz tube 200 before cleaning, which will not be described here.

[0033] In one embodiment, the acid liquid supply mechanism 130 includes a liquid storage tank 131, a liquid supply assembly 132, and a liquid return assembly 133. The liquid storage tank 131 is used to store acid liquid, such as hydrofluoric acid. The liquid supply assembly 132 is connected with the liquid storage tank 131, and is used to transport the acid liquid in the liquid storage tank 131 into the cleaning tank 110; the liquid return assembly 133 is connected with the liquid storage tank 131, and is used to input the acid liquid in the cleaning tank 110 into the liquid storage tank 131.

[0034] For the liquid supply assembly 132: the liquid supply assembly 132 includes a liquid supply pump and a liquid supply pipe. The liquid supply pump is connected with the liquid storage tank 131, one end of the liquid supply pipe is connected with the liquid supply pump, and the other end extends into the cleaning tank 110, so as to pump the acid liquid into the cleaning tank 110 through the liquid supply pump and the liquid supply pipe.

[0035] For the liquid return assembly 133: the liquid return assembly 133 includes a liquid return pump and a liquid return pipe. The liquid return pump is connected with the liquid storage tank 131, and the liquid return pipe is connected with the liquid return pump at one end and connected with the bottom of the cleaning tank 110 at the other end, so as to transport the acid liquid in the cleaning tank 110 back to the liquid storage tank 131 through the liquid return pump and the liquid return pipe. Further, the bottom of the cleaning tank 110 is provided with a liquid return port, and the liquid return pipe is connected with the liquid return port. Of course, in other embodiments, the liquid return pipe can also be directly inserted from above the cleaning tank 110, and the end of the liquid return pipe away from the liquid return pump extends to the bottom of the cleaning tank 110, so as to ensure that the acid liquid in the cleaning tank 110 is extracted as much as possible.

[0036] Further, the liquid return assembly 133 also includes a filter, which is arranged on the liquid return pipe and used for filtering the recovered acid liquid. It should be noted that when the acid liquid is hydrofluoric acid, the liquid supply pump, the liquid supply pipe, the liquid return pump, the liquid return pipe, and the filter all need to be made of materials resistant to corrosion of hydrofluoric acid. These materials are well known to those skilled in the art, and those skilled in the art can select appropriate materials according to needs, which will not be described here.

[0037] In an embodiment, the flushing mechanism includes external nozzles 141 and internal nozzles 142 arranged outside the cleaning tank 110. The flushing mechanism can spray pure water on the outer wall of the quartz tube 200 through the external nozzles 141, and can spray pure water into the interior of the quartz tube 200 through the internal nozzles 142. In this way, in cooperation with the rotation mechanism 120 driving the quartz tube 200 to rotate, the quartz tube 200 can be comprehensively flushed by the external nozzles 141 and the internal nozzles 142, and the cleaning effect of the quartz tube 200 can be improved. Specifically to Figure 1 In the embodiment shown, the number of external nozzles 141 is multiple. In addition, it can be determined that if the cleaning device can simultaneously clean multiple quartz tubes 200, each quartz tube 200 can be flushed by the external nozzles 141 and the internal nozzles 142.

[0038] In an embodiment, the flushing mechanism also includes a water supply assembly. The water supply assembly is connected with the external nozzles 141 and the internal nozzles 142 to supply pure water to the external nozzles 141 and the internal nozzles 142. It can be understood that the water supply assembly can also include a water storage tank, a delivery pump, and a delivery pipeline, which will not be described here.

[0039] Further, the flushing mechanism also includes a drainage assembly 143. The bottom of the cleaning tank 110 is provided with multiple liquid discharge ports, and the drainage assembly 143 is connected with the multiple liquid discharge ports to realize rapid drainage through the multiple liquid discharge ports and the drainage assembly 143, thereby improving the cleaning efficiency. It should be explained that when the quartz tube 200 is flushed with pure water, the water can be first accumulated in the cleaning tank 110 without drainage, so that the quartz tube 200 is immersed, and then the water is rapidly discharged through the drainage port and the drainage assembly 143, thereby improving the cleaning efficiency.

[0040] Further, the cleaning tank 110 is also provided with an overflow port, the height of the overflow port is higher than the height of the quartz tube 200, so that the pure water can be overflowed and discharged after the quartz tube 200 is immersed in the pure water. The water discharged from the overflow port can also be transported to the waste water treatment device.

[0041] In one embodiment, the drainage assembly 143 comprises a buffer 144, a plurality of drainage pipes 145 and a plurality of drainage valves 146. The plurality of drainage pipes 145 are connected with the buffer 144 and the plurality of drainage ports, so as to transport the water discharged from the plurality of drainage ports to the buffer 144; each drainage valve 146 is arranged in a corresponding drainage pipe 145, so as to control the opening and closing of the drainage pipe 145, and further control the drainage action of the drainage assembly 143.

[0042] Further, the drainage assembly 143 further comprises an overflow pipe. One end of the overflow pipe is connected with the overflow port, and the other end is connected with the buffer 144, so as to input the overflowed water into the buffer 144. Meanwhile, it can be determined that the buffer 144 is provided with a waste water outlet, which is connected with the waste water treatment device. In actual application, in order to facilitate operation, the drainage valve 146 can be an electromagnetic valve.

[0043] For the action of the flushing mechanism, it needs to be noted that after the acid solution is drawn out, the water supply assembly supplies water to the external nozzle 141 and the internal nozzle 142, and the pure water is sprayed to the outer wall and the inside of the quartz tube 200. During the flushing process, the drainage valve 146 is closed, and the water is accumulated in the cleaning tank 110 until the quartz tube 200 is immersed and discharged from the overflow port. After soaking for a period of time, the drainage valve 146 is opened, and the water in the cleaning tank 110 is quickly discharged to the buffer 144 through the drainage port. After the water is discharged, the above steps can be repeated to flush the quartz tube 200 again, which is not limited herein. After the flushing is completed, the drying operation is performed.

[0044] In addition, it needs to be further noted that in order to improve the soaking speed of the pure water, a water inlet pipe can also be arranged, one end of the water inlet pipe is connected with the water supply assembly, and the other end extends into the cleaning tank 110, so as to directly transport the pure water into the cleaning tank 110.

[0045] In one embodiment, the drying mechanism comprises an external air nozzle 151 and an internal air nozzle 152. The drying mechanism can spray dry gas to the outer wall of the quartz tube 200 through the external air nozzle 151, and can spray dry gas to the inside of the quartz tube 200 through the internal air nozzle 152, so as to comprehensively dry the quartz tube 200. The dry gas can be hot nitrogen gas, so as to accelerate the drying efficiency.

[0046] Further, the drying mechanism further comprises a gas supply assembly. The gas supply assembly is connected with the external gas nozzle 151 and the internal gas nozzle 152 to supply dry gas to the external gas nozzle 151 and the internal gas nozzle 152. It can be understood that the gas supply assembly can comprise a gas source and a gas supply pump, which are not described herein.

[0047] It can be determined from the above embodiments that the internal nozzle 142 and the internal gas nozzle 152 are fixed relative to the cleaning tank 110 in the above embodiments. In other embodiments, the internal nozzle 142 and the internal gas nozzle 152 can also be movably arranged. For example, the cleaning device further comprises a telescopic assembly arranged in the cleaning tank 110 and connected with the internal nozzle 142 and the internal gas nozzle 152 to drive the internal nozzle 142 and the internal gas nozzle 152 to extend into or move out of the quartz tube 200. By extending the internal nozzle 142 and the internal gas nozzle 152 into the quartz tube 200, the cleaning effect and the drying efficiency can be further improved.

[0048] Further, the spraying directions of the internal nozzle 142 and the internal gas nozzle 152 are both towards the bottom wall of the quartz tube 200 and inclined downward relative to the axial direction of the quartz tube 200. In this way, after the internal nozzle 142 or the internal gas nozzle 152 extends into the interior of the quartz tube 200, pure water and dry gas can be sprayed obliquely downward, which, in combination with the rotation of the quartz tube 200, can achieve comprehensive cleaning of the interior of the quartz tube 200 and can provide a downward pressure to the quartz tube 200 to increase the contact pressure between the quartz tube 200 and the rotating mechanism 120 and reduce the slipping phenomenon.

[0049] In actual applications, the telescopic assembly comprises a telescopic driving member and a mounting seat, and the telescopic driving member is connected with the mounting seat. The internal nozzle 142 and the internal gas nozzle 152 are both arranged on the mounting seat, and the internal nozzle 142 is connected with the water supply assembly through a telescopic hose, and the internal gas nozzle 152 is connected with the gas supply assembly through a telescopic hose. It should be noted that the telescopic driving member can also be arranged outside the cleaning tank 110 and connected with the mounting seat through a connecting rod, and the connecting rod is sealed relative to the cleaning tank 110. In addition, the telescopic driving member can be a pneumatic cylinder or an electric cylinder, which is not limited herein.

[0050] Based on the above cleaning device, the application further provides a cleaning method, which comprises the following steps: S110, placing the quartz tube 200 on the rotating mechanism 120, and driving the quartz tube 200 to rotate by the rotating mechanism 120; S120, inputting hydrofluoric acid into the cleaning tank 110 by the acid liquid supply mechanism 130 until the hydrofluoric acid immerses the quartz tube 200; S130, extracting the hydrofluoric acid in the cleaning tank 110 by the acid liquid supply mechanism 130; S140, flushing the outer wall and the inner wall of the quartz tube 200 by the flushing mechanism through the external nozzle 141 and the internal nozzle 142; and S150, spraying dry gas towards the quartz tube 200 by the drying mechanism.

[0051] Specifically, in S110, the quartz tube 200 is placed on the driving roller 122 and the supporting roller 122, the rotating driving member 121 drives the driving roller 122 to rotate, thereby driving the quartz tube 200 to rotate, and the rotating speed of the quartz tube 200 is 4-6r / min. For example, it can be 4r / min, 5r / min, 6r / min.

[0052] In S120 and S130, the acid liquid supply mechanism 130 is used to supply hydrofluoric acid. The hydrofluoric acid in the liquid storage tank 131 is first delivered into the cleaning tank 110 through the liquid supply assembly 132 until the hydrofluoric acid immerses the quartz tube 200. After the quartz tube 200 is immersed in the acid liquid for 15-20min, the hydrofluoric acid in the cleaning tank 110 is pumped back into the liquid storage tank 131 through the liquid return assembly 133.

[0053] In S140, the water supply assembly delivers pure water to the external nozzle 141 and the internal nozzle 142 to spray pure water towards the outer wall and the inner wall of the quartz tube 200. During the flushing process, the liquid discharge valve 146 is closed so that the pure water accumulates in the cleaning tank 110 and immerses the quartz tube 200. After 30-60s of immersion, the water supply is stopped, and the liquid discharge valve 146 is opened to quickly discharge the water in the cleaning tank 110. As described above, in order to improve the cleaning effect, step S130 can be repeated 1-2 times.

[0054] In S150, the gas supply assembly sprays clean nitrogen gas at 80℃ towards the outer wall and the inner wall of the quartz tube 200 through the external gas nozzle 151 and the internal gas nozzle 152 to dry the quartz tube 200. The drying time is 4-6min. For example, it can be 4min, 5min, 6min.

[0055] In one embodiment, after the drying is completed, the cleaning method further comprises step S160 that the rotating mechanism 120 stops driving the quartz tube 200 to rotate, and then the quartz tube 200 is taken out, and the cleaning of the quartz tube 200 is completed.

[0056] On the other hand, the application also provides a cleaning system, which comprises the quartz tube 200 cleaning device in the above embodiments.

[0057] Further, the cleaning system further comprises a process chamber and a gas extraction device. The cleaning device is arranged in the process chamber, and the gas extraction device is used to extract the gas in the process chamber so that the process chamber is kept in a negative pressure state to avoid the overflow of the acid gas generated during the cleaning process.

[0058] In summary, the quartz tube 200 cleaning device, the cleaning method and the cleaning system provided by the application have at least one of the following advantages: 1. The quartz tube 200 is subjected to pickling, pure water flushing and drying in the cleaning tank 110, and no conveying equipment is needed, thereby reducing the cost; 2. During the cleaning process, the quartz tube 200 is driven to rotate by the rotating mechanism 120, which can improve the cleaning effect and cleaning efficiency; 3. By setting multiple drain ports and drainage components 143, water can be quickly drained after the quartz tube 200 is immersed in pure water, thus improving cleaning efficiency. 4. The internal nozzle 142 and internal air nozzle 152 can be driven to extend into the quartz tube 200 through the telescopic component, which can improve the cleaning effect and cleaning efficiency. 5. When the internal nozzle 142 and the internal air nozzle 152 are inserted into the quartz tube 200, the spray direction of the internal nozzle 142 and the internal air nozzle 152 is towards the bottom wall of the quartz tube 200, and is inclined downward relative to the axis of the quartz tube 200. This can achieve comprehensive cleaning of the inside of the quartz tube 200, while providing downward pressure to the quartz tube 200 and reducing the slippage of the quartz tube 200 on the rotating mechanism 120.

[0059] Although embodiments of this application have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and variations can be made to these embodiments without departing from the principles and spirit of this application, the scope of which is defined by the appended claims and their equivalents.

Claims

1. A quartz tube cleaning device, characterized in that, include: Cleaning tank; A rotating mechanism is provided inside the cleaning tank, and the rotating mechanism is used to support the quartz tube and drive the quartz tube to rotate; An acid supply mechanism is capable of feeding acid into the cleaning tank and extracting acid from the cleaning tank. The rinsing mechanism includes an external nozzle and an internal nozzle disposed in the cleaning tank. The rinsing mechanism is capable of spraying pure water toward the outer wall of the quartz tube through the external nozzle, and the rinsing mechanism is capable of spraying pure water toward the inside of the quartz tube through the internal nozzle. The drying mechanism is used to spray drying gas into the quartz tube inside the cleaning tank.

2. The quartz tube cleaning device according to claim 1, characterized in that, The flushing mechanism also includes a water supply component and a drainage component, wherein the water supply component is connected to the external nozzle and the internal nozzle; The bottom of the cleaning tank has multiple drain ports, and the drainage assembly is connected to the multiple drain ports.

3. The quartz tube cleaning device according to claim 2, characterized in that, The drainage assembly includes a buffer, multiple drainage pipes, and multiple drainage valves. The multiple drainage pipes are connected to the buffer and multiple drainage ports, and each drainage valve is disposed on a corresponding drainage pipe.

4. The quartz tube cleaning device according to claim 2, characterized in that, The cleaning tank is also provided with an overflow port, the height of which is higher than the height of the quartz tube.

5. The quartz tube cleaning device according to claim 1, characterized in that, The drying mechanism includes an external air nozzle and an internal air nozzle. The drying mechanism can spray drying gas towards the outer wall of the quartz tube through the external air nozzle, and can spray drying gas towards the inside of the quartz tube through the internal air nozzle.

6. The quartz tube cleaning device according to claim 5, characterized in that, It also includes a telescopic assembly, which is disposed in the cleaning tank and connected to the internal nozzle and the internal air nozzle to drive the internal nozzle and the internal air nozzle to extend into or remove from the quartz tube.

7. The quartz tube cleaning device according to claim 6, characterized in that, The internal air nozzle sprays air towards the bottom wall of the quartz tube and is inclined downward relative to the axial direction of the quartz tube.

8. The quartz tube cleaning device according to claim 6, characterized in that, The internal nozzle sprays towards the bottom wall of the quartz tube and is inclined downward relative to the axial direction of the quartz tube.

9. A cleaning method, based on the quartz tube cleaning apparatus according to any one of claims 1-8, characterized in that, The cleaning method includes the following steps: S110, the quartz tube is placed on the rotating mechanism, and the rotating mechanism drives the quartz tube to rotate; S120, the acid supply mechanism inputs hydrofluoric acid into the cleaning tank until the acid solution immerses the quartz tube; S130, the acid supply mechanism extracts hydrofluoric acid from the cleaning tank; S140, the rinsing mechanism rinses the outer and inner walls of the quartz tube through external and internal nozzles; S150, the drying mechanism sprays drying gas into the quartz tube.

10. A cleaning system, characterized in that, The device includes a process chamber, an air extraction device, and a quartz tube cleaning device as described in any one of claims 1-8, wherein the cleaning device is disposed in the process chamber, and the air extraction device is used to extract gas from the process chamber.

Images