High-flux solid electrolyte screening method and system based on continuous mask plate

Abstract

The invention relates to the technical field of high throughput, in particular to a high-throughput solid electrolyte screening method and system based on a continuous mask plate. The invention provides a high-flux solid electrolyte screening method based on continuous masks. The method comprises the following steps: determining a plurality of target materials and continuous masks, coating sequences and coating motion parameters corresponding to each target material according to preset demand information; when one target material is coated, each round of coating of the continuous mask plate is controlled to perform combined movement according to preset moving distances corresponding to a main direction and an offset direction in sequence until a to-be-coated area is completely exposed or the continuous mask plate completely covers the to-be-coated area after the continuous mask plate performs multi-round combined movement; and after coating of various target materials is completed, high-flux solid electrolyte screening is carried out on the solid electrolyte in all the unit areas of the to-be-coated area. The multi-directional movement of the mask plate is realized through the cooperative movement in the main direction and the offset direction, so that different target materials are accurately coated along the set direction, and the accurate control of the deposition amount of each area is achieved.

Description

Technical Field

[0001] This invention relates to the field of high-throughput technology, and in particular to a high-throughput solid electrolyte screening method and system based on a continuous mask plate. Background Technology

[0002] Traditional methods for screening material components and ratios generally employ a trial-and-error approach. By changing the components and ratios of the materials each time, different material samples are prepared, and suitable materials are selected through testing. However, this method is inefficient, has a long development cycle, high development costs, and is not suitable for the development of multi-materials.

[0003] Existing high-throughput preparation screening methods for vacuum coating include continuous masking and discrete masking. Discrete masking involves placing the mask below and close to the sample, with the coating source positioned below the mask. Depending on the mask pattern and the method of changing the mask, films of different material thicknesses can be deposited in different areas.

[0004] The continuous masking method involves moving the mask during deposition to gradually change the film thickness along the masking direction. That is, the sample remains stationary during deposition, and the mask is moved to expose more or less of the sample to the deposition source. Areas exposed to the deposition source for longer periods will have a thicker film layer deposited, thus creating a gradient in film thickness across the sample due to variations in deposition time.

[0005] In continuous masking methods, the mask plate can only move in one direction due to its mechanical transmission structure. Therefore, in high-throughput screening of multi-component materials, it is necessary to rotate the sample angle to achieve high-throughput screening of different components. During this process, the targets are in different positions. However, in continuous masking, the sample cannot rotate during the coating process. Consequently, the film thickness of the target material farther from the sample will be less than that of the closer target material. This will cause deviations in the material composition ratio of different regions on the sample from the set values, especially for multi-component materials with more than three components, which has a greater impact and is detrimental to high-throughput screening. Summary of the Invention

[0006] To address the aforementioned problems, this invention provides a high-throughput solid electrolyte screening method and system based on a continuous mask plate.

[0007] To solve the above-mentioned technical problems, the present invention provides the following technical solution: a high-throughput solid electrolyte screening method based on a continuous mask, comprising the following steps: determining multiple target materials and the corresponding continuous mask, coating sequence, and coating motion parameters for each target material according to preset requirement information; the area of ​​the continuous mask is larger than the area of ​​the area to be coated, and the coating motion parameters include preset moving distances corresponding to the principal direction and the offset direction with a preset origin on the area to be coated as the coordinate origin; when coating one target material, controlling the continuous mask to perform combined movements according to the preset moving distances corresponding to the principal direction and the offset direction in each round of coating until the continuous mask completely exposes or completely covers the area to be coated after multiple rounds of combined movements, thus completing the coating of one target material; and controlling multiple targets to perform coating of multiple target materials in multiple unit areas of the area to be coated according to the coating sequence, and then performing high-throughput solid electrolyte screening on the solid electrolytes formed in all unit areas of the area to be coated.

[0008] Preferably, the preset requirement information includes multiple target materials used in the solid electrolyte to be prepared, the stacking order of the multiple target materials in the area to be coated, the coating rate corresponding to the multiple target materials, and the coating thickness of each unit area in the area to be coated, wherein each unit area includes multiple cell areas.

[0009] Preferably, determining multiple target materials and corresponding continuous mask plates, coating sequence, and coating motion parameters for each target material based on preset requirement information specifically includes the following steps: determining the multiple target materials and coating sequence to be coated based on the multiple target materials used in the solid electrolyte to be prepared and their stacking sequence in the solid electrolyte according to the preset requirement information; determining the target coating direction corresponding to each target material based on the coating thickness of different unit areas on the area to be coated based on the coating thickness of each target material; decomposing the target coating direction into a main direction and an offset direction; forming a preset angle between the target coating direction and the main direction, the preset angle being 0°-360°; and determining the preset moving distances corresponding to the main direction and offset direction of the continuous mask plate corresponding to each target material on the area to be coated based on the different unit areas on the area to be coated based on the different unit areas on the area to be coated based on the different unit areas on the area to be coated based on the different target materials on the area to be coated.

[0010] Preferably, decomposing the target coating direction into a main direction and an offset direction specifically includes: establishing a rectangular coordinate system with a preset origin on the area to be coated as the origin, taking the X direction of the rectangular coordinate system as the main direction and the Y direction as the offset direction; forming a preset angle of 0°-180° between the X and Y directions; and decomposing the target coating direction into the X and Y directions.

[0011] Preferably, when coating one type of target material, the continuous mask is controlled to perform combined movements according to preset moving distances corresponding to the main direction and offset direction in each round of coating, until the continuous mask completely exposes or completely covers the area to be coated after multiple rounds of combined movements, thus completing the coating of one type of target material. Specifically, this includes the following steps: selecting the first type of target material as the target target material according to the coating sequence, and determining the target continuous mask material corresponding to the target target material; placing the target continuous mask material between the coating source and the area to be coated, and ensuring that the target continuous mask material completely covers the area to be coated. The target area to be coated is described; the displacement of the continuous target mask is controlled to combine the displacements in each round according to the preset moving distances in the X and Y directions corresponding to each unit area on the target area, moving from the current unit area to the next unit area, exposing the target unit area; the target material is coated onto the target unit area through the coating source according to the coating time and coating rate set for the target unit area; after the target unit area is coated, the continuous target mask is controlled to continue to move step by step until the target area to be coated is completely exposed on the continuous target mask, thus completing the coating of the target material.

[0012] Preferably, controlling the continuous mask plate to perform each round of coating in combination according to the preset moving distances corresponding to the main direction and the offset direction specifically includes the following steps: placing the target continuous mask plate between the coating source and the area to be coated, and making the target area to be coated completely exposed on the target continuous mask plate; controlling the displacement of the target continuous mask plate in each round to perform a combination displacement according to the preset moving distances corresponding to the X and Y directions of each unit area on the area to be coated, moving from the current unit area to the next unit area, covering the current unit area, and taking the next unit area as the target unit area.

[0013] Preferably, the preset moving distance includes a first preset unit distance in the X direction and a second preset unit distance in the Y direction; controlling the target continuous mask to sequentially perform combined displacement according to the preset moving distances corresponding to the X and Y directions of each unit area on the area to be coated, moving from the current unit area to the next unit area, specifically includes the following steps: controlling the target continuous mask to move from the current unit area along the X direction by a first preset unit distance to a first position; controlling the target continuous mask to move from the first position along the Y direction by a second preset unit distance to a second position to reach the next unit area, exposing the target unit area; the line connecting the second position and the preset origin of the area to be coated forms a preset angle with the X direction.

[0014] Preferably, when coating one type of target material, the continuous mask plate is controlled to perform combined movements according to preset moving distances corresponding to the main direction and offset direction in each round of coating until the continuous mask plate completely exposes the area to be coated or completely covers the area to be coated after multiple rounds of combined movements. After completing the coating of one type of target material, the method further includes: when changing the target material according to the coating sequence, determining whether the direction of change of coating thickness of the already coated target material in different unit areas of the area to be coated is the same as or opposite to the direction of change of coating thickness of the currently coated target material in different unit areas of the area to be coated; if not, the continuous mask plate needs to be replaced to correspond to the target material to be coated.

[0015] Preferably, after controlling multiple targets to be coated sequentially in multiple unit areas of the area to be coated according to the coating sequence, high-throughput solid electrolyte screening is performed on the solid electrolytes formed in all unit areas of the area to be coated. Specifically, the following steps are included: controlling multiple targets to be coated sequentially in multiple unit areas of the area to be coated according to the coating sequence; placing the sample film in a heat treatment chamber for annealing treatment, so that solid electrolytes with different material ratios are formed in each cell area of ​​the unit area; and performing high-throughput solid electrolyte screening on the solid electrolytes formed in all cell areas of all the unit areas.

[0016] To solve the above-mentioned technical problems, the present invention provides another technical solution as follows: a high-throughput solid electrolyte screening system, applied to any of the above-mentioned high-throughput solid electrolyte screening methods based on a continuous mask, comprising: a substrate providing a coating area; a coating apparatus including multiple coating sources, the coating sources being used to load targets and sputter the targets onto the coating area of ​​the substrate; a continuous mask; a control device for determining multiple targets and the corresponding continuous mask, coating sequence, and coating motion parameters for each target according to preset requirement information; the area of ​​the continuous mask is larger than the area of ​​the coating area, and the coating motion parameters include preset moving distances corresponding to the principal direction and the offset direction with a preset origin on the coating area as the coordinate origin; and a driving device controlled by the control device. The device control is used to drive the continuous mask plate to move; the control device is also used to control the continuous mask plate to move in combination according to the preset moving distances corresponding to the main direction and the offset direction in each round of coating when one coating source is coating one target material, until the area to be coated is completely exposed or the continuous mask plate completely covers the coating source, thus completing the coating of one target material; the control device is also used to control multiple targets to be coated in multiple unit areas of the area to be coated in order to form solid electrolytes; the high-throughput solid electrolyte screening system also includes a screening device, which is used to perform high-throughput solid electrolyte screening on the solid electrolytes formed in all unit areas of the area to be coated.

[0017] Compared with the prior art, the high-throughput solid electrolyte screening method and system based on continuous mask plates provided by the present invention have the following beneficial effects: 1. This invention provides a high-throughput solid electrolyte screening method based on a continuous mask plate. First, various target materials and their corresponding continuous mask plates, coating sequence, and coating motion parameters are determined according to preset requirements. The area of ​​the continuous mask plate is larger than the area to be coated. The coating motion parameters include motion parameters corresponding to the principal direction and offset direction with a preset origin as the coordinate origin. When coating a single target material, the continuous mask plate is controlled to sequentially perform combined movements according to preset moving distances corresponding to the principal direction and offset direction. Coating is performed after each round of combined movements. Through multiple rounds of movements, the area to be coated is completely exposed or completely covered, completing the coating of a single target material. Finally, the sequential coating of various target materials is completed according to the coating sequence, forming a solid electrolyte in the area to be coated and performing high-throughput screening. By customizing different preset moving distances for the main direction and offset direction for the continuous mask plate corresponding to each target material, equivalent motion paths in any direction can be accurately synthesized. Compared with the existing technology where the mask plate can only move in one direction, this embodiment can achieve multi-directional movement by combining the main direction and offset direction. This allows for precise control of the exposed areas of each target material without rotating the area to be coated, thereby adjusting the coating position of each target material in different areas to be coated, and thus precisely controlling the film thickness in different areas after coating of each target material. Moreover, each target material has a corresponding preset moving distance for the main direction and offset direction, which enables different targets to achieve coating in different coating directions. At the same time, it can also precisely control the deposition amount of each target material in different areas of the area to be coated, ensuring that the proportion of each element in the final ternary or multi-element solid electrolyte presents a preset and precise distribution, thereby improving the accuracy and reliability of high-throughput screening data. In addition, this embodiment does not require rotating the sample; the same effect can be achieved simply by controlling the movement of the continuous mask plate in a two-dimensional plane, simplifying the equipment structure, improving the stability and repeatability of the system, and reducing manufacturing and maintenance costs.

[0018] 2. The preset requirements information in the embodiments of this invention includes the selection of various target materials, the arrangement of the stacking sequence, the control of the coating rate, and the precise setting of the film thickness in each unit region. This constructs a complete process parameter system for coating, enabling the digitalization and standardization of the composition design and structural control of the solid electrolyte, ensuring that the film thickness and composition of each unit region can be accurately achieved according to the preset gradient requirements. Furthermore, this parameter control improves the repeatability of the experiment and facilitates flexible adjustment of the process scheme according to different screening targets.

[0019] 3. In this embodiment of the invention, the target coating direction for each target material can be determined according to preset requirements. The target coating direction is decomposed into a main direction and an offset direction, and preset moving distances corresponding to the main direction and the offset direction are set. By precisely controlling the combined movement of the continuous mask plate within the preset moving distances corresponding to the main direction and the offset direction, the target coating direction can be selected in any direction within a preset angle range of 0°-360°. Furthermore, this decomposition allows the target coating direction for different target materials to be decomposed into a combination of the main direction and the offset direction. This allows operators to adjust the distance combination of the main direction and the offset direction to achieve different distribution patterns of various components in the area to be coated, ranging from simple linear to complex two-dimensional gradients, thus improving the flexibility and accuracy of designing different material compositions in different areas.

[0020] 4. In this embodiment of the invention, by establishing a Cartesian coordinate system and clearly defining the X-direction as the primary direction and the Y-direction as the offset direction, a coordinate system with a preset origin and the X-direction as the primary direction and the Y-direction as the offset direction is realized. This ensures that the primary direction and the offset direction are perpendicular, facilitating the selection of any direction within this two-dimensional coordinate system for the target coating direction of each target material through combinations of the X and Y directions. Furthermore, the establishment of the coordinate system ensures that the motion parameters of different targets are comparable and repeatable under the same coordinate system. When changing targets, operators only need to adjust the motion parameters under a unified coordinate system to achieve precise control of the gradient direction of different materials, improving the convenience and process stability of preparing solid electrolytes through continuous mask movement.

[0021] 5. In this embodiment of the invention, when performing a coating operation on a target material, a multi-round displacement and coating cycle is employed to achieve orderly exposure of the area to be coated through precise stepping of a continuous mask, thereby achieving coating of the target material. During each round of coating, the continuous mask first completes a preset displacement, followed by a timed coating operation. This step-by-step execution method helps ensure that each unit area on the area to be coated receives precisely controlled deposition time, thus achieving precise control of the film thickness by controlling the exposure time of each target unit area.

[0022] 6. In the embodiments of the present invention, when performing a coating operation on a target material, the selective masking of the area to be coated can be achieved by gradually moving the mask plate, realizing a reverse control scheme of gradually covering the area to be coated from a fully exposed state. This is more conducive to accurately controlling the coating time of the target material, so as to achieve precise control of the coating transition of different target materials through rapid masking.

[0023] 7. In this embodiment of the invention, by setting a first preset unit distance in the X direction and a second preset unit distance in the Y direction corresponding to different target materials, it is convenient for the operator to accurately set the displacement of each movement step of the continuous mask in the X and Y directions. By combining different movement sequence combinations, the continuous mask can move in different directions, thereby realizing the coating of different target materials in different coating directions.

[0024] 8. In this embodiment of the invention, by judging the change of the coating direction of adjacent targets, the timing of continuous mask replacement is determined, ensuring that when the gradient direction of adjacent targets needs to be kept continuous, a suitable continuous mask can be automatically selected, thereby ensuring that the gradient directions of different material layers match each other.

[0025] 9. In this embodiment of the invention, an annealing process is introduced, which accelerates the movement of atoms in the sample films coated with different target materials in each cell region under heat treatment, thereby accelerating the full fusion between the layers corresponding to each target material. At the same time, heating ensures that the crystal structure and densification of different target material components in the cell region meet the requirements, ensuring that the final solid electrolyte sample has excellent electrochemical performance and reliability.

[0026] 10. The present invention also provides a high-throughput solid electrolyte screening system, which has the same beneficial effects as the above-mentioned high-throughput solid electrolyte screening method based on a continuous mask plate, and will not be described in detail here. Attached Figure Description

[0027] To more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0028] Figure 1 This is a flowchart of the steps of the high-throughput solid electrolyte screening method based on a continuous mask provided in the first embodiment of the present invention.

[0029] Figure 2 This is a schematic diagram showing the positions of the coating source, the continuous mask, and the area to be coated in the high-throughput solid electrolyte screening method based on a continuous mask provided in the first embodiment of the present invention.

[0030] Figure 3 This is a schematic diagram of the target material starting to be coated, which is one of the high-throughput solid electrolyte screening methods based on continuous mask plates provided in the first embodiment of the present invention.

[0031] Figure 4This is a schematic diagram of the composition gradient of various targets in a solid electrolyte, which is part of a high-throughput solid electrolyte screening method based on a continuous mask provided in the first embodiment of the present invention.

[0032] Figure 5 This is a schematic diagram of the state during the target coating process of a high-throughput solid electrolyte screening method based on a continuous mask plate provided in the first embodiment of the present invention.

[0033] Figure 6 This is a schematic diagram of the target material coating completion state in one of the high-throughput solid electrolyte screening methods based on continuous mask plates provided in the first embodiment of the present invention.

[0034] Figure 7 This is a schematic diagram of the cell region of the area to be coated in the high-throughput solid electrolyte screening method based on a continuous mask provided in the first embodiment of the present invention.

[0035] Figure 8 This is a schematic diagram of the combined displacement of the continuous mask in the high-throughput solid electrolyte screening method based on the continuous mask provided in the first embodiment of the present invention. Figure 1 .

[0036] Figure 9 This is a schematic diagram of the combined displacement of the continuous mask in the high-throughput solid electrolyte screening method based on the continuous mask provided in the first embodiment of the present invention. Figure 2 .

[0037] Figure 10 This is a top view schematic diagram of the film layers after different material coatings are completed, provided by the high-throughput solid electrolyte screening method based on a continuous mask provided in the first embodiment of the present invention.

[0038] Figure 11 This is an example diagram of a continuous mask used in the preparation of high-throughput LLTO solid electrolytes, provided by the high-throughput solid electrolyte screening method based on a continuous mask according to the first embodiment of the present invention.

[0039] Figure 12 This is a schematic diagram of the framework of the high-throughput solid electrolyte screening system provided in the second embodiment of the present invention.

[0040] Explanation of reference numerals in the attached diagram: 1. High-throughput solid electrolyte screening system; 2. Sample film; 3. Solid electrolyte; 10. Substrate; 11. Area to be coated; 20. Coating apparatus; 21. Coating source; 30. Continuous mask; 40. Control device; 50. Drive device; 60. Screening device; 111. Unit area; 1111, cell range. Detailed Implementation

[0041] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the invention.

[0042] In the embodiments provided by this invention, it should be understood that "B corresponding to A" means that B is associated with A, and B can be determined based on A. However, it should also be understood that determining B based on A does not mean determining B solely based on A; B can also be determined based on A and / or other information.

[0043] It should be understood that the phrase "one embodiment" or "an embodiment" throughout the specification means that a specific feature, structure, or characteristic related to the embodiment is included in at least one embodiment of the invention. Therefore, "in one embodiment" or "in an embodiment" appearing throughout the specification does not necessarily refer to the same embodiment. Furthermore, these specific features, structures, or characteristics can be combined in any suitable manner in one or more embodiments. Those skilled in the art should also recognize that the embodiments described in the specification are optional embodiments, and the actions and modules involved are not necessarily essential to the invention.

[0044] In various embodiments of the present invention, it should be understood that the sequence number of each process does not necessarily imply the order of execution. The execution order of each process should be determined by its function and internal logic, and should not constitute any limitation on the implementation process of the embodiments of the present invention.

[0045] The flowcharts and block diagrams in the accompanying drawings illustrate methods and possible architectures, functions, and operations according to various embodiments of this application. In this regard, each block in the flowchart or block diagram may represent part of a step. It should also be noted that in some alternative implementations, the functions indicated in the blocks may occur in a different order than those indicated in the drawings. For example, two consecutively indicated blocks may actually be executed substantially in parallel, or they may sometimes be executed in reverse order, depending on the functions involved.

[0046] Please see Figure 1 The first embodiment of the present invention provides a high-throughput solid electrolyte screening method based on a continuous mask, comprising the following steps: Step S10: Determine various target materials and the corresponding continuous mask plate 30, coating sequence, and coating motion parameters for each target material based on the preset requirements information; Step S20: When coating one type of target material, the continuous mask 30 is controlled to perform combined movements according to preset moving distances corresponding to the main direction and offset direction in each round of coating, until the continuous mask 30 completely exposes the area to be coated 11 or completely covers the area to be coated 11 after multiple rounds of combined movements, thus completing the coating of one type of target material; and Step S30: After controlling multiple target materials to be coated in multiple unit regions 111 of the area to be coated 11 according to the coating sequence, the solid electrolyte 3 formed in all unit regions 111 of the area to be coated 11 is screened using high-throughput solid electrolyte 3.

[0047] See also Figure 2 and Figure 3 In step S10, the area of ​​the continuous mask 30 is larger than the area of ​​the area to be coated 11, and the coating motion parameters include the principal direction f1 with a preset origin on the area to be coated 11 as the coordinate origin (e.g., ...). Figure 2 As shown in f1) and offset direction f2 (as shown in f2) Figure 2 The preset movement distances corresponding to f2) shown are as follows; Specifically, the preset requirement information can be information pre-set by the user based on the material composition and film thickness information of the multi-component solid electrolyte 3 to be prepared, screened, and analyzed. The continuous mask 30 can be a single, uninterrupted mask, rather than composed of multiple small patterns or discrete mask sheets. Please refer to [link to relevant documentation]. Figure 2The area of ​​the continuous mask 30 needs to be larger than the area of ​​the area to be coated 11, so that during the coating process, the continuous mask 30 can always cover the areas of the area to be coated 11 that do not currently need to be coated and expose the areas of the area to be coated 11 that currently need to be coated. This effectively prevents leakage of the coating source 21 due to insufficient size of the continuous mask 30. Furthermore, the distance between the continuous mask 30 and the area to be coated 11 is much smaller than the distance between the continuous mask 30 and the coating source 21. That is, the closer the continuous mask 30 is to the area to be coated 11, the better its coverage of the area to be coated 11 and the smaller its wraparound coating, thus ensuring that the material ejected from the coating source 21 does not reach the area covered by the continuous mask 30. Wraparound coating means that areas not illuminated by the coating source 21 may still be coated. In this embodiment, it is necessary to ensure that the continuous mask 30 is close to the area to be coated 11, but the two are not in contact, thereby avoiding the influence of the movement of the continuous mask 30 on the coating on the area to be coated 11. In this embodiment, the target material refers to various raw materials used to synthesize the target solid electrolyte 3. Specifically, it refers to solid source materials bombarded by high-energy particles, such as ions or lasers, during physical vapor deposition processes, such as sputtering and pulsed laser deposition. Under bombardment, atoms, molecules, or ions of the target material are excited, detach from the target surface, pass through the vacuum chamber, and finally deposit on the opposite area to be coated 11, forming the desired solid electrolyte 3 (e.g., ...). Figure 4 (As shown in the figure). In this embodiment, the coating source 21 can be coated using evaporation or sputtering coating processes.

[0048] The coating sequence is as follows: preparation of multi-element solid electrolyte 3 (e.g. Figure 4 As shown in the diagram, the order in which different types of target materials are deposited is determined by the stacking order of different material layers of the multi-component solid electrolyte 3 to be prepared, screened, and analyzed. The preset origin is usually set by the operator at a specific position in the area to be coated 11, and can serve as a reference point for all movements of all masks. The main direction f1 and the offset direction f2 are the movement directions of the continuous mask 30 in two different dimensions, respectively. By setting different coating cycles for different target materials and the same target material, and setting different combinations of preset movement distances for the main direction and offset direction, the movement direction and trajectory of the continuous mask 30 can be precisely controlled, realizing the "omnidirectional movement" of the continuous mask 30 in any direction during the coating process. This allows for the flexible creation of film thickness gradients that vary along different directions without rotating the sample or the continuous mask 30, thereby precisely controlling the material composition ratio of each region.

[0049] For details, please continue reading Figure 3 - Figure 5In step S20, the coating of each target material is a continuous multi-round coating. Specifically, the continuous mask plate 30 is controlled to move in multiple rounds in combination, so that the area to be coated 11 is gradually displaced to be fully exposed or the continuous mask plate 30 completely covers the area to be coated 11, thus completing the coating of one target material.

[0050] Each round of coating requires first controlling the continuous mask plate 30 corresponding to the target material to move sequentially by a preset distance according to the main direction and offset direction to complete the combined movement, so that the continuous mask plate 30 can move along the preset path to the target position between the areas to be coated 11. After ensuring that the continuous mask plate 30 completely covers the area that does not need to be coated and exposes the area that needs to be coated, the exposure timing and exposure time of different areas of the area to be coated 11 are precisely controlled to control the coating source 21 loaded with the target material to coat the exposed area on the area to be coated 11 for a set time. After the coating is completed, it means that one round of coating of the target material is completed.

[0051] The above combined motion process is repeated. After each cycle of main direction movement – ​​offset direction movement – ​​coating, the continuous mask 30 moves to a new position. The area covered by the continuous mask 30 varies, and the coating area of ​​this target material through the coating source 21 in each round is also different, resulting in different film thicknesses in different areas. This coating process continues until, after multiple rounds of combined motion, the continuous mask 30 either completely exposes the area to be coated 11 to the coating source 21 or completely covers the coating source 21, thus completing the entire coating process for this target material.

[0052] Please continue reading. Figure 3 and Figure 6 In step S30, since the continuous mask plate 30 moves in multiple rounds, the coating of each target material is also performed step by step. Different areas on the area to be coated 11 have different total exposure times due to their different positions, thus depositing films of different thicknesses. Therefore, the area to be coated 11 can be divided according to the film thickness, so that the area to be coated 11 forms multiple unit regions 111, and the film thickness between the multiple unit regions 111 can exhibit a linear variation.

[0053] Specifically, after coating the first target material, the next target material can be changed according to the preset coating sequence. Each target material is equipped with a dedicated continuous mask 30 and has independently set coating motion parameters for the main direction and offset direction. The aforementioned single-target coating process is repeated to complete the coating operation of all targets in the coating area 11 in sequence. Since different targets are coated in a preset order, each target material can achieve a specific component distribution in multiple unit regions 111 on the coating area 11 through independently set coating motion parameters for the main direction and offset direction. Finally, a solid electrolyte 3 with a precise component gradient is formed in multiple unit regions 111 of the coating area 11, providing a rich and reliable sample library for high-throughput screening.

[0054] After sequential coating of all targets, a solid electrolyte 3 with a compositional gradient formed in the coating area 11 is used for high-throughput screening. By testing various performance indicators of the solid electrolyte 3 in different regions, the optimal material composition ratio is quickly screened. For example, if the required targets are target 1, target 2, target 3, and target 4, and the coating sequence is target 1, target 2, target 3, and target 4 respectively, the multi-layer solid electrolyte 3 formed after coating with multiple targets can be referenced. Figure 6 The diagram shows the composition gradient of a solid electrolyte.

[0055] Understandably, by customizing different preset moving distances for the main direction and offset direction of the continuous mask 30 corresponding to each target material, it is possible to accurately synthesize equivalent motion paths in any direction. Compared with the prior art where the mask can only move in one direction, in this embodiment, the combination of the main direction and offset direction can achieve movement in any direction, so that the area to be coated 11 can achieve precise control of the exposed area of ​​each target material without rotation, thereby adjusting the coating position of each target material on the area to be coated 11, and thus precisely controlling the film thickness of different areas after coating of each target material; and each target material has a corresponding preset moving distance for the main direction and offset direction, so that different targets material can achieve coating in different coating directions, and at the same time, the deposition amount of each target material on different areas of the area to be coated 11 can be precisely controlled, ensuring that the proportion of each element in the final ternary or multi-element solid electrolyte 3 presents a preset and precise distribution, thereby improving the accuracy and reliability of high-throughput screening data. In addition, this embodiment does not require rotating the sample; the same effect can be achieved simply by controlling the movement of the continuous mask plate 30 in a two-dimensional plane. This simplifies the equipment structure, improves the stability and repeatability of the system, and reduces manufacturing and maintenance costs.

[0056] Furthermore, the preset requirement information includes multiple target materials used in the solid electrolyte 3 to be prepared, the stacking order of the multiple target materials in the coating area 11, the coating rate corresponding to the multiple target materials, and the coating thickness of each unit region 111 on the coating area 11, wherein each unit region 111 includes multiple cell regions 1111.

[0057] Specifically, when a user wants to prepare a certain multi-component solid electrolyte 3 and wants to screen the optimal combination of various materials in the multi-component solid electrolyte 3, the user can predetermine multiple target materials for the desired multi-component solid electrolyte 3 and set the stacking order for the coating layers corresponding to each target material. This stacking order is the order in which different target materials are deposited, that is, the stacking order determines the coating order. For example, whether to deposit the lithium layer first, then the lanthanum-zirconium layer, or the reverse order. In this embodiment, the stacking order is not limited, and the user can set and adjust it according to the actual situation.

[0058] More specifically, the coating rate is the film thickness deposited by each target material on the coating area 11 per unit time. The film thickness of a target material in a certain area is the product of the coating rate of that target material and the total coating time in that area. With the coating rate kept constant, the content of each target material in the solid electrolyte 3 formed in a certain unit area 111 can be precisely controlled by controlling the coating time. Before formally preparing the multi-electrolyte solid electrolyte 3, trial coatings can be performed on the materials to be coated, and the optimal process parameters for the targets of various materials can be determined. Simultaneously, samples can be coated using the same coating area 11 to test the coating rate of various materials. The process parameters for the targets of various materials include, but are not limited to, background vacuum, process pressure, gas flow rate, working power of the coating source 21, and target-substrate distance. Among these, background vacuum refers to the reference vacuum state reached by the gas in the vacuum system, which is a key parameter for high-precision processes such as vacuum coating and single-atom cooling. By determining the process parameters for each target material during the coating process, it was ensured that the film thickness and composition of each region could accurately meet the preset design, thereby guaranteeing the quality consistency of the final solid electrolyte sample library and the accuracy and reliability of the screening data.

[0059] Please see Figure 7It should be noted that, in order to achieve high-throughput screening for the batch preparation of several multi-element solid electrolytes 3 containing the same multiple elements but with different proportions of different elements, the user can divide the area to be coated 11 into several cell regions 1111 according to a preset arrangement, such as an array arrangement. The shape of the cell regions 1111 is not limited and can be rectangles, triangles, etc., filling the area to be coated 11 without gaps. After coating the entire area to be coated 11 with multiple target materials, a solid electrolyte 3 formed by multiple target material coatings can be formed on each cell region 1111, that is, one cell region 1111 corresponds to one solid electrolyte 3.

[0060] In this embodiment, the user can set the coating thickness of each target material to vary linearly along a set direction, such as from thin to thick or from thick to thin. This set direction is the coating direction of that target material. For example, the coating thickness of the target material can be made thinner along direction F, and direction F is the coating direction of that target material. Since the coating thickness of each target material can vary linearly along the set direction, the area to be coated 11 can be divided into equal-spaced units along the coating direction, forming multiple equally spaced unit regions 111. Each unit region 111 can include multiple cell regions 1111. After coating, the film thickness within each unit region 111 also varies from thin to thick or from thick to thin along the coating direction. Furthermore, when the coating direction of a certain target material is not parallel to the boundary of the area to be coated 11, the sizes of the divided unit regions 111 are not the same. Optionally, the area to be coated 11 can be divided into progressively increasing spacing sections along the coating direction, forming multiple unit regions 111 with progressively increasing spacing. In this embodiment, the corresponding division method can be selected according to the actual situation, and this embodiment does not impose any restrictions on it. At the same time, since the coating direction of each target material is different, the spacing settings for multiple targets can be the same or different, and can be selected according to the actual situation.

[0061] Understandably, by controlling the preset requirements, including the selection of various target materials, the arrangement of the stacking sequence, the control of the coating rate, and the precise setting of the film thickness in unit region 111, a complete coating process parameter system was constructed. This enabled the digitalization and standardization of the composition design and structural control of the solid electrolyte 3, ensuring that the film thickness and composition of each unit region 111 could be precisely achieved according to the preset gradient requirements. Furthermore, this parameter control improved the repeatability of the experiment, facilitating flexible adjustment of the process scheme according to different screening targets.

[0062] Further, step S10 specifically includes the following steps: S101: Determine the multiple target materials and coating sequence to be coated based on the multiple target materials used in the solid electrolyte 3 to be prepared and their stacking sequence in the solid electrolyte 3, as specified in the preset requirements information. S102: Determine the target coating direction corresponding to each target material based on the coating thickness of different unit regions 111 on the area to be coated 11 for each target material; S103: Decompose the target coating direction into a main direction and an offset direction; a preset angle is formed between the target coating direction and the main direction, the preset angle being 0°-360°; and S104: Determine the preset moving distances corresponding to the main direction and offset direction of each unit region 111 of the continuous mask plate 30 on the coating area 11 for each target material according to the different unit regions 111 on the coating area 11 for each target material.

[0063] Specifically, in step S101, the stacking order must correspond to the coating order. For example, the stacking order of the prepared solid electrolyte 3 from bottom to top is target A, target B, target C, and target D. The coating order will also be target A, target B, target C, and target D.

[0064] In step S102, since the user can set the coating thickness of each target material to vary linearly along the set direction, such as from thin to thick or from thick to thin, the coating thickness of multiple unit regions 111 on the area to be coated 11 corresponding to a target material also varies linearly from thin to thick or from thick to thin in the set direction, and the set direction can be directly used as the target coating direction of the target material.

[0065] More specifically, in steps S103-S104, the main direction can be perpendicular to the offset direction. By combining the main direction and the offset direction, full coverage of any angle within the range of 0°-360°, 0°-180°, or 0°-90° can be achieved, meaning the user can select any direction within the plane for the gradient change of the film thickness. For example, when the preset angle is 0°, the target coating direction is exactly the same as the main direction, and the film thickness will strictly change along the main direction. When the preset angle is 180°, the target coating direction is opposite to the main direction, and the film thickness will strictly change in the opposite direction of the main direction. When the preset angle is 90°, the target coating direction is perpendicular to the main direction and the same as the offset direction, and the film thickness will strictly change along the offset direction. When the preset angle is 270°, the target coating direction is perpendicular to the main direction and the same as the offset direction, and the film thickness will strictly change in the opposite direction of the offset direction. When the preset angle is 90°, 45° means that the target coating direction is northeast. The film thickness will change along this oblique direction. At this time, the target coating direction corresponding to the 45° direction can be decomposed into the main direction and the offset direction.

[0066] Therefore, when the coating direction of a certain target material is the same as or opposite to one of the main direction or offset direction of the continuous mask plate 30, the target coating direction does not need to be decomposed. The target coating direction is one of the main direction, offset direction, opposite direction of the main direction, or opposite direction of the offset direction. In this case, in the equally spaced division unit area 111 for the target material along the coating direction, the spacing is the preset moving distance of the continuous mask plate 30 along the coating direction. If the coating direction of a certain target material is a composite direction of the main direction and offset direction of the continuous mask plate 30, and the composite direction, i.e., the target coating direction, forms a preset angle with the main direction, the preset angle being any angle other than 0°, 90°, 270°, and 360°, then the target coating direction needs to be decomposed into the main direction and offset direction. In this case, in the equally spaced division unit area 111 for the target material along the coating direction, the spacing can be decomposed into the first preset distance and the second preset distance corresponding to the main direction and the offset direction, respectively.

[0067] Understandably, by pre-setting the required information, the target coating direction for each target material can be determined. This target coating direction is then decomposed into a main direction and an offset direction, with preset moving distances corresponding to these directions. By precisely controlling the combined movement of the continuous mask 30 within these preset moving distances, the target coating direction can be selected in any direction within a preset angle range of 0°-360°. Furthermore, this decomposition allows the target coating direction for different target materials to be decomposed into a combination of main and offset directions. This means that operators only need to adjust the distance combination between the main and offset directions to achieve various component distribution patterns in the coating area 11, ranging from simple linear to complex two-dimensional gradients, thus improving the flexibility and accuracy of designing different material compositions in different areas.

[0068] Further, step S103 specifically includes: S1031: Establish a rectangular coordinate system with the preset origin on the area to be coated as the origin, and take the X direction of the rectangular coordinate system as the principal direction and the Y direction as the offset direction; and S1032: Decompose the target coating direction into the X and Y directions.

[0069] Specifically, a Cartesian coordinate system, namely the XY coordinate system, is established with a preset origin on the area to be coated 11, usually the center or a corner as the origin. The direction pointed to by the X-axis is the X direction, and the direction pointed to by the Y-axis is the Y direction. The preset origin is set to (0,0). A preset angle θ is set between the target coating direction of a target material and the X direction. θ belongs to any angle range of 0°-360°, 0°-180°, or 0°-90°. The user-defined target coating direction is decomposed into two components along the X-axis and Y-axis. This decomposition must satisfy the Pythagorean theorem: (hypotenuse)² = (Δx)² + (Δy)². The target coating direction, i.e., the angle θ, is determined by the ratio of the displacement components: θ = arctan(Δy / Δx). Therefore, by controlling the ratio of the displacement components in the Y and X directions in each round of combined motion of the continuous mask plate 30 to match the set angle, the actual path of each target material after each round of combined motion can be made to coincide with the set route, thereby enabling the continuous mask plate 30 to move in any angle range of 0°-360°, 0°-180°, or 0°-90°.

[0070] When the target material is controlled to perform each round of combined motion, each round of combined motion produces a total displacement effect in the coating direction of the target. This total displacement is the spacing L of the dividing unit area 111. The spacing L is preset by the user. Therefore, when the preset angle and the spacing L are known, the spacing L can be decomposed to obtain the X-direction displacement component, i.e., the first preset distance, and the Y-direction displacement component, i.e., the second preset distance. X-direction displacement component (Δx) = L × cos(θ); Y-direction displacement component (Δy) = L × sin(θ).

[0071] For example, when θ is between 0° and 360°, the equivalent displacement of the continuous mask 30 required per round along the target coating direction is L = 1 unit.

[0072]

[0073] Understandably, by establishing a Cartesian coordinate system and explicitly defining the X-direction as the primary direction and the Y-direction as the offset direction, a coordinate system with a preset origin suggesting the X-direction as the primary direction and the Y-direction as the offset direction is achieved. This ensures that the primary and offset directions are perpendicular, facilitating the selection of any direction within this two-dimensional coordinate system for the target coating direction of each target material through combinations of the X and Y directions. Furthermore, the establishment of this coordinate system ensures the comparability and repeatability of motion parameters for different targets within the same coordinate system. When changing targets, operators only need to adjust the motion parameters within a unified coordinate system to achieve precise control of the gradient direction of different materials, improving the convenience and process stability of preparing solid electrolytes 3 through the continuous movement of the mask 30.

[0074] As a first optional coating embodiment using a single target material, the coating process of a target material, step S20, specifically includes the following steps: S211: Based on the coating sequence, the first type of target material is used as the target target material, and the target continuous mask plate 30 corresponding to the target target material is determined; S212: Place the target continuous mask 30 between the coating source 21 and the area to be coated 11, and make the target continuous mask 30 completely cover the area to be coated 11; S213: Control the target continuous mask plate 30 to perform a combination displacement in each round according to the preset moving distances corresponding to the X and Y directions of each unit area 111 on the area to be coated 11, and move from the current unit area 111 to the next unit area 111 to expose the target unit area 111. S214: The target material is coated onto the target unit region 111 through the coating source 21 according to the coating time and coating rate set for the target unit region 111; S215: After the target unit area 111 is coated, the target continuous mask plate 30 is controlled to continue to move gradually until the area to be coated 11 is completely exposed in the target continuous mask plate 30, thus completing the coating of the target material.

[0075] Specifically, in step S211, during the formal coating process, multiple targets need to be coated sequentially according to the coating order. Specifically, the first target is used as the target for the first coating. Since the target coating directions of the multiple targets are different, the shape of the continuous mask 30 corresponding to each target may also be different. Therefore, before coating, it is necessary to determine the continuous mask 30 that matches the coating direction shape of the target being coated to ensure the best masking effect and motion accuracy.

[0076] In step S212, the selected target continuous mask 30 is precisely placed at a predetermined position between the coating source 21 and the area to be coated 11. This predetermined position is where the distance between the continuous mask 30 and the coating source 21 is much greater than the distance between the continuous mask 30 and the area to be coated 11, and the target continuous mask 30 completely covers the area to be coated 11, ensuring that all areas of the area to be coated 11 are covered by the continuous mask and are not exposed under the coating source 21.

[0077] In step S213, since the coating of each target material is a continuous multi-round coating, in each round of coating for the first target material, the continuous mask plate 30 needs to be controlled to perform combined displacement according to the preset moving distances corresponding to the X and Y directions of each unit region 111, so as to achieve precise displacement of the continuous mask plate 30 from the current unit region 111 to the next unit region 111, so that a new target unit region 111 and all previously exposed unit regions 111 are exposed to the coating source 21. After this round of displacement, all the unit regions 111 exposed on the area to be coated 11 are the target unit regions 111 that need to be coated. That is, in this embodiment, in each round of coating, the exposed area will increase with the increase of the number of coating rounds, and the covered area will decrease with the increase of the number of coating rounds. That is, the earlier a unit region 111 is exposed, the longer the total coating time for that area, the greater the coating thickness, and the smaller the covered area.

[0078] In step S214, for each round of coating for each target material, the coating source 21 is started only after the continuous mask 30 has moved into place and stopped moving. According to the pre-set coating time and coating rate for the target unit region 111, the target material is deposited onto the exposed area. Since the coating thickness of a certain region is the product of the total coating time and coating rate for that region, under the same coating rate, the user-defined film thickness can be formed on the unit region 111 by controlling the coating time.

[0079] In step S215, after the coating of the current target unit area 111 is completed, the control process of steps S203 and S204 is repeated. By cyclically executing the combined displacement-coating operation sequence, the continuous mask 30 is moved step by step along a preset path, exposing each unit area 111 of the area to be coated 11 for coating in sequence, until the area to be coated 11 is completely exposed to the target continuous mask 30, thus completing the entire coating process of this type of target material.

[0080] For example, the unit region 111 corresponding to the first target material is divided into the first unit region, the second unit region, the third unit region, the fourth unit region, and the fifth unit region along the target coating direction. The continuous mask 30 is controlled to move from a preset origin to the boundary between the first and second unit regions and then stops, exposing the first unit region for coating. The coating time is set to t1. Then, the continuous mask 30 is controlled to move to the boundary between the second and third unit regions and then stops, exposing the first and second unit regions together for coating. The coating time is set to t2. This process continues until all areas of the area to be coated 11 are exposed. At this point, the total coating time for the first unit region is T1 = t1 + t2 + t3 + t4 + t5; the total coating time for the second unit region is T2 = t2 + t3 + t4 + t5; the total coating time for the third unit region is T3 = t3 + t4 + t5; the total coating time for the fourth unit region is T4 = t4 + t5; and the total coating time for the fifth unit region is T5 = t5 + t4 + t5. t5; The total coating time is different, and the coating thickness is also different. Moreover, the multiple unit regions 111 are divided according to the coating direction. Therefore, under the same coating rate, the coating thickness of the target material can vary linearly in the multiple unit regions 111 along the target coating direction of the target material.

[0081] Understandably, when performing a coating operation on a target material, a multi-round displacement and coating cycle is employed to achieve orderly exposure of the area 11 to be coated through precise stepping of the continuous mask 30, thereby achieving coating of the target material. In each round of coating, the continuous mask 30 first completes a preset displacement, followed by a timed coating operation. This step-by-step execution method helps ensure that each unit area 111 on the area to be coated receives precisely controlled deposition time, thereby achieving precise control of the film thickness by controlling the exposure time of each target unit area 111.

[0082] As a second optional single-target coating embodiment, in the coating process of a single target, step S203: controlling the continuous mask plate 30 to perform combined movements in each round of coating according to the preset moving distances corresponding to the main direction and the offset direction, specifically includes the following steps: S2031: Place the target continuous mask 30 between the coating source 21 and the area to be coated 11, and make the target area to be coated 11 completely exposed to the target continuous mask 30; S2032: Control the target continuous mask plate 30 to perform a combination displacement in each round according to the preset moving distances corresponding to the X and Y directions of each unit area 111 on the area to be coated 11, move from the current unit area 111 to the next unit area 111, cover the current unit area 111, and take the next unit area 111 as the target unit area 111.

[0083] Specifically, the selected target continuous mask 30 is precisely placed at a predetermined position between the coating source 21 and the area to be coated 11. This predetermined position is where the distance between the continuous mask 30 and the coating source 21 is much greater than the distance between the continuous mask 30 and the area to be coated 11, ensuring that the target area to be coated 11 is completely exposed to the target continuous mask 30, so that all areas of the area to be coated 11 can be directly exposed to the coating source 21 and receive uniform coating deposition.

[0084] More specifically, the movement of the continuous mask 30 and the method of obtaining the film thickness in this embodiment are the same as in the previous embodiment, and will not be repeated here. The difference is that after each round of displacement in this embodiment, the current unit region 111 is covered by the target continuous mask 30, and all unit regions 111 exposed on the area to be coated 11 after this round of displacement are the target unit regions 111 that need to be coated. That is, in each round of coating in this embodiment, the covered area will increase with the increase of the number of coating rounds, and the exposed area will decrease with the increase of the number of coating rounds. Therefore, in this embodiment, the later a unit region 111 is covered, the longer the total coating time for that region and the greater the film thickness; conversely, the earlier a region is covered, the shorter the total coating time and the thinner the film thickness. By precisely controlling the timing of the continuous mask 30 covering each unit region 111, a film thickness decreasing gradient from the early covered region to the late covered region can be formed on the area to be coated 11, realizing precise gradient distribution control of film thickness. In other words, this embodiment provides a reverse control scheme that achieves selective masking of the area to be coated 11 by gradually moving the continuous mask plate 30, and gradually covers the area to be coated 11 from a fully exposed state. This is more conducive to accurately controlling the coating time of the target material, so as to achieve precise control of the coating transition of different target materials through rapid masking.

[0085] Please see Figure 8 and Figure 9 Further, step S2131: controlling the target continuous mask 30 to sequentially perform combined displacement according to the preset moving distances corresponding to the X and Y directions of each unit region 111 on the area to be coated 11, moving from the current unit region 111 to the next unit region 111, specifically including the following steps: S21311: Control the target continuous mask plate 30 to move from the current unit region 111 along the X direction by a first preset unit distance to the first position; S21312: Control the target continuous mask plate 30 to move a second preset unit distance along the Y direction from the first position to the second position to reach the next unit area 111, exposing the target unit area 111; the line connecting the second position and the preset origin of the area to be coated 11 forms a preset angle with the X direction.

[0086] Specifically, please refer to Figure 8 In step S21311, during one round of coating, the combined displacement of the continuous mask 30 is to first control the target continuous mask 30 to move a first preset unit distance along the X direction from the starting position of the current unit region 111 to reach a precise first position A (e.g., ...). Figure 8 As shown in A). The first preset unit distance is the basic displacement calculated by the above steps S1031 and S1032 based on the preset spacing L and preset angle θ, to ensure that the continuous mask plate 30 is accurately positioned in the X direction.

[0087] Specifically, please refer to Figure 9 In step S21312, after completing the X-direction displacement, the target continuous mask plate 30 is controlled to move from the first position along the Y-direction by a second preset unit distance to reach the precise second position B (e.g., ...). Figure 9 As shown in Figure B). This second position B is the position where the current target unit area 111 can be exposed. The line connecting the second position B and the preset origin (0,0) of the area to be coated 11 forms a precise preset angle θ with the X direction (e.g., ...). Figure 9 As shown in θ). This preset angle θ can be achieved by controlling the ratio of the distance Δx between the first preset unit and the distance Δy between the second preset unit, specifically satisfying the following mathematical relationship: θ = arctan(Δy / Δx); Wherein, Δx is the first preset unit distance, and Δy is the second preset unit distance. Both the first and second preset unit distances are the basic displacements calculated by the above steps S1031 and S1032 based on the preset spacing L and preset angle θ, ensuring that the continuous mask plate 30 is accurately positioned in the X and Y directions.

[0088] Understandably, by precisely controlling the numerical combination of the distance Δx between the first preset unit and the distance Δy between the second preset unit, any preset angle within the range of 0°-360° can be synthesized. For example: When Δy = 0, the resultant angle is 0° or 180°. When Δx = Δy, the resultant angle is 45° or 225°. When Δx = 0, the resultant angle is 90° or 270°. By adjusting the different proportional relationships between the distance Δx of the first preset unit and the distance Δy of the second preset unit, precise synthesis of arbitrary angles such as 14°, 40°, and 75° can be achieved. This allows the actual movement direction of the continuous mask 30 to match the set target coating direction, thus achieving precise coating. In other words, by decomposing the complex oblique displacement into two orthogonal linear displacement movements, the complex two-dimensional trajectory control is simplified into two one-dimensional linear control problems. Furthermore, through a simple combination of two linear displacement movements, the continuous mask 30 achieves "omnidirectional movement" capability covering 0°-360° omnidirectional angles within a two-dimensional plane. This also avoids accuracy errors caused by composite movements, ensures the accuracy of positioning for each unit region 111, and simplifies the complexity of the mechanical structure.

[0089] Optionally, in this embodiment, the target continuous mask 30 can be first controlled to move a second preset unit distance along the Y direction from the current unit region 111 to the second position; then, the target continuous mask 30 can be controlled to move a first preset unit distance along the X direction from the second position to the first position to reach the next unit region 111, exposing the target unit region 111. At this time, the line connecting the first position and the preset origin of the area to be coated 11 forms a preset angle with the X direction. That is, in this embodiment, the sequential movement direction of the continuous mask 30 in each round of coating can be interchanged, as long as the continuous mask 30 can reach the set position after the combined movement and the preset origin forms a preset angle with the X direction.

[0090] It should be noted that the coating starting point may differ for different target materials. Therefore, before performing combined movements, the continuous mask plate 30 corresponding to each target material must first be moved to the set coating starting point, and multiple rounds of combined movements can be performed from the coating starting point. Optionally, the preset origin can coincide with one of the coating starting points to better determine the position of the continuous mask plate 30. Furthermore, after step S20, the method further includes: S21: When changing the target material according to the coating sequence for coating, determine whether the direction of change of the coating thickness of the target material that has been coated in the coating area 11 corresponding to different unit areas 111 on the coating area 11 is the same as or opposite to the direction of change of the coating thickness of the target material that is currently being coated in the coating area 11 corresponding to different unit areas 111 on the coating area 11. S22: If not, the continuous mask 30 needs to be replaced with a target material that is currently being coated.

[0091] Specifically, the direction of film thickness change is the target coating direction. The system determines whether the target coating direction of the target material that has already been coated is the same as or opposite to the target coating direction of the target material currently being coated in the coating area 11. If the determination is the same, the target material currently being coated can be matched with the previously coated continuous mask 30, and no replacement is needed. When the determination shows that the film thickness change directions of the two targets are neither the same nor opposite, i.e., there is any other angular difference between their film thickness gradient directions, meaning the target coating direction of the target material that has already been coated is not parallel to the target coating direction of the target material currently being coated in the coating area 11, the continuous mask 30 is replaced to correspond with the target material currently being coated, ensuring that the new continuous mask 30 can achieve the specific film thickness gradient direction requirements of the target material.

[0092] Further, step S30: After controlling multiple target materials to be coated sequentially in multiple unit regions 111 of the area to be coated 11 according to the coating sequence, the solid electrolyte 3 formed in all unit regions 111 of the area to be coated 11 is subjected to high-throughput solid electrolyte screening, specifically including the following steps: S301: Control multiple targets to be coated sequentially in multiple unit regions 111 of the area to be coated 11 according to the coating sequence, to form a sample thin film; Specifically, according to the pre-set process parameters and coating sequence, different target materials and their corresponding continuous mask plates 30 are replaced sequentially on the coating area 11 to be coated. For each target material, a specific film thickness gradient distribution is achieved by controlling the combined movement of the continuous mask plate 30 in the main direction and the offset direction. Through the sequential deposition of multiple target materials, a sample film composed of the same target material and the same stacking sequence is formed in each cell region 1111 of each unit region 111 on the coating area 11, but the coating thickness of each target material is different.

[0093] S302: The sample film 2 is placed in a heat treatment chamber for annealing, so that solid electrolytes 3 with different material ratios are formed in each cell region 1111 within the unit region 111. The solid electrolytes 3 formed in all cell regions 1111 within all the unit regions 111 are subjected to high-throughput solid electrolyte screening.

[0094] Specifically, the coated sample film is transferred to a heat treatment chamber for annealing. The heat treatment can be carried out in a controlled atmosphere, such as an inert gas or a specific oxygen partial pressure atmosphere, according to a preset heating program. By precisely controlling the annealing temperature, holding time, and cooling rate, the mutual diffusion and reaction between different elements are promoted. This causes the amorphous film to be transformed into a solid electrolyte 3 with a specific crystal structure, forming doped solid electrolyte 3 with different material ratios in each cell region 1111.

[0095] After annealing, high-throughput screening is performed on the solid electrolyte 3 formed in all unit regions 111. For example, an automated testing system can be used to measure key performance parameters such as ionic conductivity, electronic conductivity, and electrochemical window of the solid electrolyte 3 in each unit region 1111 in parallel. Through rapid characterization techniques, the microstructure and phase composition of different component regions are analyzed. A composition-structure-performance relationship map is established, so that the optimal solid electrolyte 3 formulation can be screened by comparing the levels of key performance parameters such as ionic conductivity, electronic conductivity, and electrochemical window.

[0096] Please see Figure 10 The following is a complete example of formulation screening for A-site doping in the preparation of high-throughput LLTO solid electrolytes (CA, Nb): The first step involves selecting four targets with a purity of no less than 99.9 wt% for the LLTO solid electrolyte 3 to be prepared: lithium oxide (Li₂O), lanthanum oxide (La₂O₃), titanium (TiO₂), and A-site doped calcium oxide (CaO). These targets are then installed at different target sites. Trial deposition is performed on each material, and the optimal process parameters for each target are determined. Samples are deposited using a substrate 10, with a deposition area 11 set on the substrate 10. The deposition area of ​​this area 11 can be less than or equal to the area of ​​the substrate 10, to test the deposition rate of each material. Finally, the required continuous mask 30 and deposition sequence are determined according to the preset requirements.

[0097] Specifically, the target deposition direction for TiO2 can be set to the positive X-axis; the target deposition direction for La2O3 to the positive Y-axis; the target deposition direction for Li2O to be at 45° along the X-axis; and the target deposition direction for CaO to be at 135° along the X-axis. Since the target deposition directions for Li2O and CaO are at 45° and 135° along the X-axis, respectively, the shapes of the continuous mask plates 30 corresponding to these two targets need to be customized according to the deposition direction.

[0098] The second step involves placing the cleaned substrate 10 into the coating equipment. During TiO2 coating, the distance between the first preset unit and the coating time for the continuous mask 30 in each coating cycle are set according to preset requirements. The continuous mask 30 is then controlled to move along the positive X-axis. After TiO2 coating is completed, please refer to [link to documentation]. Figure 10 A top-view schematic diagram of the TiO2 layer after coating on the area to be coated 11. The depth of the color indicates the thickness of the coating in the corresponding area. The darker the color, the thicker the coating.

[0099] The third step is to repeat the second step, and perform coating on various target materials according to the coating sequence: To deposit La2O3, the continuous mask 30 is controlled to move along the Y-axis; please refer to [link / reference needed] for details. Figure 10 A top view of the La2O3 layer after coating is completed on the area to be coated 11.

[0100] For Li₂O deposition, replace the continuous mask 30 and control its combined displacement along the X-axis at 45°; please refer to [link / reference needed]. Figure 10 A top view of the Li2O layer after coating is completed on the area to be coated 11.

[0101] For CaO deposition, replace the continuous mask 30 and control its combined displacement along the X-axis at 135°; please refer to [link / reference needed]. Figure 10 A top view of the film layer after the CaO layer is deposited on the area to be coated 11.

[0102] The fourth step involves placing the deposited sample film 2 in a heat treatment chamber for annealing, allowing the four materials to fully fuse and form a solid electrolyte 3 with different elemental ratios in each cell. High-throughput screening is then performed on all cell regions 1111 for the solid electrolyte 3. For details, please refer to [link to relevant documentation]. Figure 10 A top view of the solid electrolyte 3 on the area 11 to be coated after thin annealing of the sample.

[0103] Understandably, after the four target materials are coated, the second and third steps can be repeated to deposit a film structure with four or more overlapping layers of the four materials. Specifically, on the basis of the four corresponding film layers of the above four materials, a film is then deposited to form a film structure with five or more layers.

[0104] It should be noted that since the target deposition directions for Li2O and CaO are along the 45° and 135° directions of the X-axis, respectively, if a thickness gradient with the same direction as the target deposition is required on the area to be deposited 11, i.e., the thickness of the Li2O deposition layer decreases sequentially along the 45° direction of the X-axis and the thickness of the CaO deposition layer decreases sequentially along the 135° direction of the X-axis, the continuous mask 30 for depositing Li2O and CaO can be referred to [reference needed]. Figure 11 The shape of the continuous photomask 30. That is, the shape of the continuous photomask 30 can be selected according to the different angles of the coating direction, so that the composite direction of the combined movement of the continuous photomask 30 can be better matched with the changing direction of the coating thickness.

[0105] Please see Figure 12 The second embodiment of the present invention provides a high-throughput solid electrolyte screening system 1, applied to implement any one of the high-throughput solid electrolyte screening methods based on continuous mask plates in the first embodiment, comprising: Substrate 10 provides a coating area 11; The coating apparatus 20 includes a plurality of coating sources 21, which are used to load targets and sputter the targets onto the coating area 11 of the substrate 10; Continuous mask 30; The control device 40 is used to determine multiple target materials and the corresponding continuous mask plate 30, coating sequence and coating motion parameters for each target material according to preset requirement information; the area of ​​the continuous mask plate 30 is larger than the area of ​​the area to be coated 11, and the coating motion parameters include preset moving distances corresponding to the main direction and the offset direction with the preset origin on the area to be coated 11 as the coordinate origin. The drive device 50 is connected to the control device 40 and is used to drive the continuous mask plate 30 to move. The control device 40 is also used to control a coating source 21 to coat a target material. When the coating source 21 coats a target material, the control drive device 50 drives the continuous mask plate 30 to perform combined movements according to the preset moving distances corresponding to the main direction and the offset direction in each round of coating, until the area to be coated 11 is completely exposed or the continuous mask plate 30 completely covers the area to be coated 11, thereby completing the coating of a target material. The control device 40 is also used to control multiple targets to be coated in multiple unit areas 111 of the area to be coated 11 in sequence according to the coating order to form a solid electrolyte 3. The high-throughput solid electrolyte screening system 1 further includes a screening device 60, which is used to perform high-throughput screening of the solid electrolytes 3 formed in all unit regions 111 of the area to be coated 11.

[0106] Understandably, in this embodiment, a coating area 11 may be provided on the substrate 10, and the coating area of ​​the coating area 11 may be less than or equal to the area of ​​the substrate 10.

[0107] This invention provides a high-throughput solid electrolyte screening system 1, which employs the high-throughput solid electrolyte screening method based on a continuous mask as described in the first embodiment above to achieve rapid and efficient screening of solid electrolytes. The specific limitations in the first embodiment also apply to the high-throughput solid electrolyte screening system 1.

[0108] The second embodiment of the present invention provides a high-throughput solid electrolyte 3 screening system that automates the entire process from material preparation to performance screening. The coordinated operation of the control device 40 and the drive device 50 enables the continuous mask 30 to move omnidirectionally in a two-dimensional plane through a combination of main and offset directions, thereby accurately controlling the deposition distribution of multiple target materials in the coating area 11 without rotating the sample. The system controls the movement trajectory of the mask by preset parameterization, which not only solves the problem of compositional distortion caused by traditional single-direction movement, but also ensures the precise control of the proportion of each element in the multi-element material system in the two-dimensional gradient direction. At the same time, the integration of the screening device 60 realizes a closed-loop operation of preparation and testing, which significantly improves the efficiency and accuracy of solid electrolyte 3 material research and development, and greatly reduces the research and development cost and cycle.

[0109] The above provides a detailed description of a high-throughput solid electrolyte screening method and system based on a continuous mask plate disclosed in the embodiments of the present invention. Specific examples have been used to illustrate the principles and implementation methods of the present invention. The descriptions of the above embodiments are only for the purpose of helping to understand the method and core ideas of the present invention. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of the present invention. Therefore, the content of this specification should not be construed as a limitation of the present invention. Any modifications, equivalent substitutions, and improvements made within the principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A high-throughput solid-state electrolyte screening method based on continuous mask sheets, characterized by: The method comprises the following steps: According to the preset demand information, determine a plurality of target materials and the corresponding continuous mask plate, film coating sequence and film coating motion parameters of each target material; the area of the continuous mask plate is larger than the area of the to-be-coated film area, and the film coating motion parameters include the preset moving distance corresponding to the main direction and the offset direction with the preset origin on the to-be-coated film area as the coordinate origin. When one of the target materials is used for film coating, the continuous mask plate is controlled to perform combined motion according to the preset moving distance corresponding to the main direction and the offset direction in each round of film coating, until the continuous mask plate completely exposes or completely covers the to-be-coated film area after a plurality of rounds of combined motion, and the film coating of one target material is completed. And After controlling the plurality of target materials to perform film coating of the plurality of target materials in a plurality of unit areas of the to-be-coated film area according to the film coating sequence, the solid-state electrolyte corresponding to each unit area in the to-be-coated film area is subjected to high-throughput solid-state electrolyte screening.

2. The continuous mask-based high-throughput solid-state electrolyte screening method of claim 1, wherein: The preset demand information includes the plurality of target materials used by the solid-state electrolyte to be prepared, the stacking sequence of the plurality of target materials in the to-be-coated film area, and the film coating rate of the plurality of target materials and the film thickness of each unit area on the to-be-coated film area. Each unit area includes a plurality of unit cell areas.

3. The continuous mask sheet-based high-throughput solid-state electrolyte screening method of claim 2, wherein: According to the preset demand information, determine a plurality of target materials and the corresponding continuous mask plate, film coating sequence and film coating motion parameters, specifically comprising the following steps: According to the plurality of target materials used by the solid-state electrolyte to be prepared and the stacking sequence in the solid-state electrolyte in the preset demand information, determine the plurality of target materials and the film coating sequence currently required for film coating; According to the film coating thickness of each target material in different unit areas on the to-be-coated film area, determine the target film coating direction corresponding to each target material; Decompose the target film coating direction into a main direction and an offset direction; the target film coating direction and the main direction form a preset angle, and the preset angle is 0°-360°; and According to the different unit areas of each target material on the to-be-coated film area, determine the preset moving distance corresponding to the main direction and the offset direction of each unit area of the continuous mask plate corresponding to each target material on the to-be-coated film area.

4. The continuous mask sheet based high-throughput solid-state electrolyte screening method of claim 3, wherein: Decomposing the target film coating direction into a main direction and an offset direction specifically includes: Establishing a rectangular coordinate system with a preset origin on the to-be-coated film area as the coordinate origin, taking the X direction of the rectangular coordinate system as the main direction, and taking the Y direction as the offset direction; Decompose the target film coating direction into X direction and Y direction; the X direction and the Y direction form a preset angle of 0°-180°.

5. The continuous mask-based high-throughput solid-state electrolyte screening method of claim 4, wherein: When one of the target materials is used for film coating, the continuous mask plate is controlled to perform combined motion according to the preset moving distance corresponding to the main direction and the offset direction in each round of film coating, until the continuous mask plate completely exposes or completely covers the to-be-coated film area after a plurality of rounds of combined motion, and the film coating of one target material is completed, specifically comprising the following steps: According to the film coating sequence, take the first target material as the target material, and determine the target continuous mask plate corresponding to the target material; Placing the target continuous mask plate between the film coating source and the to-be-coated film area, and making the target continuous mask plate completely cover the to-be-coated film area; Controlling each round of displacement of the target continuous mask plate to sequentially combine the preset moving distances corresponding to the X direction and the Y direction of each unit area on the to-be-coated film area, and displace from the current unit area to the next unit area to expose the target unit area; According to the target unit area corresponding to the preset film coating time and the preset film coating rate, the target material is coated on the target unit area through the film coating source; After the target unit area is coated, the target continuous mask plate is controlled to continue to displace step by step until the to-be-coated film area is completely exposed to the target continuous mask plate, and the film coating of the target material is completed.

6. The continuous mask sheet based high-throughput solid-state electrolyte screening method of claim 4, wherein: Controlling each round of film coating of the continuous mask plate to sequentially combine the preset moving distances corresponding to the main direction and the offset direction, specifically including the following steps: Placing the target continuous mask plate between the film coating source and the to-be-coated film area, and making the target to-be-coated film area completely exposed to the target continuous mask plate; Controlling each round of displacement of the target continuous mask plate to sequentially combine the preset moving distances corresponding to the X direction and the Y direction of each unit area on the to-be-coated film area, and displace from the current unit area to the next unit area to cover the current unit area and take the next unit area as the target unit area.

7. The continuous mask sheet based high-throughput solid-state electrolyte screening method according to claim 5 or 6, wherein: The preset moving distance includes a first preset unit distance corresponding to the X direction and a second preset unit distance corresponding to the Y direction; Controlling each round of displacement of the target continuous mask plate to sequentially combine the preset moving distances corresponding to the X direction and the Y direction of each unit area on the to-be-coated film area, and displace from the current unit area to the next unit area, specifically including the following steps: Controlling the target continuous mask plate to move from the current unit area to the first position along the X direction by a first preset unit distance; Controlling the target continuous mask plate to move from the first position to the second position along the Y direction by a second preset unit distance to reach the next unit area, and expose the target unit area; the line between the second position and the preset origin of the to-be-coated film area forms a preset angle with the X direction.

8. The continuous mask sheet based high-throughput solid-state electrolyte screening method of claim 4, wherein: When one kind of target material is coated, controlling each round of film coating of the continuous mask plate to sequentially combine the preset moving distances corresponding to the main direction and the offset direction, until the to-be-coated film area is completely exposed or the continuous mask plate completely covers the to-be-coated film area after multiple rounds of combined motion, and the film coating of one kind of target material is completed, the method further includes: When the target material is replaced according to the film coating sequence for film coating, judging whether the change direction of the film thickness of the different unit areas on the to-be-coated film area of the target material whose film coating is completed is the same as or opposite to the change direction of the film thickness of the different unit areas on the to-be-coated film area of the target material currently being coated; If not, the continuous mask plate corresponding to the target material currently being coated needs to be replaced.

9. The continuous mask sheet based high-throughput solid-state electrolyte screening method of claim 4, wherein: After the plurality of targets are controlled to be sequentially plated in the plurality of unit areas of the to-be-coated area according to the coating sequence, the solid electrolyte formed in all the unit areas of the to-be-coated area is subjected to high-throughput solid electrolyte screening, and the method specifically comprises the following steps: The plurality of targets are controlled to be sequentially plated in the plurality of unit areas of the to-be-coated area according to the coating sequence, and a sample film is formed; The sample film is placed in a heat treatment chamber for annealing treatment, so that the solid electrolyte doped with different material ratios is formed in each unit cell area in the unit area, and the high-throughput solid electrolyte screening is performed on the solid electrolyte formed in all the unit cell areas in all the unit areas.

10. A high-throughput solid-state electrolyte screening system for use in a continuous mask sheet-based high-throughput solid-state electrolyte screening method according to any one of claims 1-9, characterized in that: Comprise: A substrate provides a to-be-coated area; A coating device comprising a plurality of coating sources for loading targets and sputtering targets to the to-be-coated area of the substrate; A continuous mask plate; A control device is used to determine a plurality of targets and the corresponding continuous mask plate, coating sequence and coating motion parameters of each target according to the preset requirement information; the area of the continuous mask plate is larger than the area of the to-be-coated area, and the coating motion parameters include preset movement distances corresponding to the main direction and the offset direction with the preset origin on the to-be-coated area as the coordinate origin; A driving device controlled by the control device is used to drive the continuous mask plate to move; The control device is also used to control one of the coating sources to coat one type of target, and to control the driving device to drive the continuous mask plate to move in combination according to the preset movement distances corresponding to the main direction and the offset direction in each round of coating, until the to-be-coated area is completely exposed or the continuous mask plate completely covers the coating source, and the coating of one type of target is completed; The control device is also used to control the plurality of targets to be sequentially plated in the plurality of unit areas of the to-be-coated area according to the coating sequence, and to form solid electrolyte; The high-throughput solid electrolyte screening system further comprises a screening device for high-throughput solid electrolyte screening of the solid electrolyte formed in all the unit areas of the to-be-coated area.

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