A shower head gas mixing structure for a thin film deposition apparatus

Abstract

The application discloses a shower head gas mixing structure for a thin film deposition device, and belongs to the technical field of semiconductor production, comprising two pressure regulating mechanisms for regulating input gas pressure, speed regulating mechanisms for regulating input gas flow rate arranged on the pressure regulating mechanisms, and mixing mechanisms for mixing multiple gases arranged on the speed regulating mechanisms; the pressure regulating mechanisms can monitor the gas inlet pressure of the first gas in real time; when the pressure is normal, the gas follows a normal path; when the pressure is insufficient, the system can automatically switch to a pressure boosting path without delay, the centrifugal impeller is used to pressurize the gas, and the output pressure is ensured to be stable within a preset range; the speed regulating mechanisms are designed in a unique hexagonal adjusting flow plate, the adjusting flow plates can be synchronously and equidistantly opened and closed through a slant groove turntable and a motor drive, the gas flow rate can be regulated, and the flow rate of the first gas can be matched with that of the second gas.

Description

Technical Field

[0001] This invention relates to the field of semiconductor manufacturing technology, and in particular to a gas mixing structure for a spray head used in thin film deposition equipment. Background Technology

[0002] In high-precision manufacturing fields such as semiconductor manufacturing and optical thin film preparation, the quality of thin film deposition directly affects the performance and long-term reliability of the final device. As the core space for thin film deposition, the stability and uniformity of the gas field environment inside the process chamber are key factors in ensuring thin film quality. Furthermore, the gas mixing and distribution performance of the spray head, a crucial component for the entry of process gases into the chamber, is a prerequisite for the uniformity of the gas field within the chamber. In existing thin film deposition equipment, it is typically necessary to thoroughly and uniformly mix two or more process gases before they enter the reaction chamber.

[0003] However, existing gas mixing structures face the following major technical bottlenecks: instability of the upstream gas source or supply system can cause fluctuations in the pressure of the input gas; traditional mixing structures lack effective adaptive pressure compensation mechanisms; when the input pressure of one gas is insufficient, it will directly disrupt the predetermined mixing ratio and total flow rate with the other gas, resulting in instability of the gas mixture entering the chamber, ultimately forming a thin film with uneven thickness and compositional deviation on the substrate; in order to achieve a precise mixing ratio, the flow rate of each gas needs to be independently and precisely controlled. Existing technologies mostly rely on external mass flow controllers, which have limited response speed and dynamic matching capabilities with the other gas. When the mixing ratio needs to be dynamically adjusted according to process requirements, it is difficult to achieve rapid and precise synchronization of the flow rates of the two gases, posing a risk of mixing delay or ratio mismatch.

[0004] In summary, the shortcomings of the existing technology are mainly reflected in three aspects: lack of adaptability to inlet pressure fluctuations, insufficient precision and flexibility in gas flow rate control, and the need to improve the final mixing uniformity. These deficiencies directly restrict the further improvement of thin film deposition quality. Summary of the Invention

[0005] To address the aforementioned technical problems, the purpose of this invention is to provide a novel spray head gas mixing structure capable of automatically compensating for gas pressure fluctuations, precisely controlling and matching gas flow rate, and simultaneously achieving efficient and thorough mixing. The technical solution adopted by this invention is as follows: a spray head gas mixing structure for thin film deposition equipment, comprising two pressure regulating mechanisms for adjusting the input gas pressure, a speed regulating mechanism for adjusting the input gas flow rate connected to the pressure regulating mechanism, and a mixing mechanism for mixing multiple gases connected to the speed regulating mechanism;

[0006] The pressure regulating mechanism includes a main inlet pipe and an outlet pipe. A first tee and a second tee are fixedly installed on the main inlet pipe. A pressure detection module for detecting intake pressure and a pressure compensation module for compensating for insufficient intake pressure are provided next to the main inlet pipe.

[0007] Furthermore, the pressure regulating mechanism includes a booster pipe fixedly installed on the second tee, a front valve housing fixedly installed on the booster pipe, a conventional outlet pipe fixedly installed on the front valve housing, an outlet tee fixedly installed on the conventional outlet pipe, the outlet pipe and the outlet tee fixedly installed, and the main inlet pipe connected to the external inlet pipe of the first gas.

[0008] Furthermore, a rear valve body is fixedly installed on the main inlet pipe, a booster inlet pipe is fixedly installed on the rear valve body, a booster box is fixedly installed on the booster inlet pipe, a booster outlet pipe is fixedly installed on the booster box, and the booster outlet pipe is fixedly installed with the outlet tee.

[0009] Furthermore, a pressure pipe is fixedly installed on the first tee, a piston box is fixedly installed on the pressure pipe, a piston column is slidably installed inside the piston box, a piston disc is fixedly installed on the piston column, the piston disc slides inside the piston box, a piston spring is provided between the piston disc and the piston box, the piston spring is sleeved outside the piston column, a transverse rod is fixedly installed on the piston column, a front switch plate and a rear switch plate are fixedly installed at both ends of the transverse rod respectively, the front switch plate slides inside the front valve housing, and the rear switch plate slides inside the rear valve housing. When the front switch plate closes the front valve housing, the rear switch plate opens the rear valve housing, and when the rear switch plate closes the rear valve housing, the front switch plate opens the front valve housing.

[0010] Furthermore, a booster motor is fixedly installed on the booster box, and a booster impeller is fixedly installed on the motor shaft of the booster motor. The booster impeller is provided with multiple booster through holes, and a hole is provided at the center of the booster impeller, which is connected to the booster through holes. The booster inlet pipe delivers gas to the hole at the center of the booster impeller. The gas passes through the booster through holes and reaches the booster box. After being pressurized, the gas leaves from the booster outlet pipe.

[0011] The first type of gas enters the main inlet pipe. A portion of the gas enters the booster pipe through the second three-way valve, and another portion enters the pressure pipe through the first three-way valve. Due to the pressure of the intake gas, the gas entering the piston box through the pressure pipe pushes the piston disc and piston rod inward, compressing the piston spring. The piston rod drives the front switch plate and the rear switch plate to move through the lateral rod, causing the front switch plate to open the front valve housing and the rear switch plate to close the rear valve housing. At this time, the gas enters the speed regulating mechanism through the main inlet pipe, the second three-way valve, the booster pipe, the front valve housing, the conventional outlet pipe, the outlet three-way valve, and the outlet pipe.

[0012] If the gas pressure is insufficient, the gas enters the piston box through the pressure pipe and cannot drive the piston disc and piston rod to move. At this time, the front switch plate closes the front valve housing and the rear switch plate opens the rear valve housing. The gas then enters the booster box through the main inlet pipe, the rear valve housing, and the booster inlet pipe. Subsequently, the gas enters the central hole of the booster impeller. The booster motor drives the booster impeller to rotate at high speed. Through centrifugal force, the gas that has entered the central hole of the booster impeller is discharged from the booster through hole into the booster box. After being pressurized, the gas enters the outlet tee through the booster outlet pipe and then enters the speed regulating mechanism through the outlet pipe.

[0013] Furthermore, the speed regulating mechanism includes an inlet sleeve fixedly installed on the outlet pipe, one end of a speed regulating cylinder fixedly installed on the inlet sleeve, and an outlet sleeve fixedly installed on the other end of the speed regulating cylinder. Both the inlet sleeve and the outlet sleeve are provided with six sliding grooves, and a sliding plate is slidably installed in the sliding groove. An adjusting block is fixedly installed on the sliding plate, and a sliding column is fixedly installed on the adjusting block. A hexagonal through hole is provided at the center of the inlet sleeve and the outlet sleeve.

[0014] Furthermore, two internal motors are fixedly installed inside the speed regulating cylinder. Motor gears are fixedly installed on the motor shafts of the internal motors. Inclined slot turntables are rotatably installed inside the inlet sleeve and the outlet sleeve. An internal gear ring is fixedly installed on the inclined slot turntable. The internal gear ring meshes with the motor gear. Six inclined sliding grooves are provided on the inclined slot turntable, and the sliding column slides in the inclined sliding grooves.

[0015] Furthermore, the regulating block is fixedly installed with regulating flow plates, and the regulating flow plates on the six regulating blocks provided on the inlet sleeve are respectively fixedly installed with the regulating flow plates on the six regulating blocks provided on the outlet sleeve.

[0016] The first gas enters the inlet sleeve from the outlet pipe, and then enters the six regulating flow plates through the hexagonal through-hole at the center of the inlet sleeve. The six regulating flow plates form a closed structure, and then the gas leaves through the hexagonal through-hole at the center of the outlet sleeve.

[0017] The internal motor rotates, driving the motor gear to rotate, which in turn drives the inclined slot turntable to rotate via the internal gear ring. The sliding column slides within the inclined slot, causing the adjusting block and sliding plate to slide along the slot. This causes the six adjusting blocks and adjusting flow plates to move synchronously. When the six adjusting flow plates open, the space between them increases, reducing the gas flow velocity. When the six adjusting flow plates close, the space between them increases, increasing the gas flow velocity. This allows for adjustment of the intake speed of the first gas as needed.

[0018] Furthermore, the mixing mechanism includes a confluence cylinder with two fixed plates fixedly installed inside. A main gas channel is provided inside the confluence cylinder, and an inlet ring groove is connected to the main gas channel. A mixing cylinder is fixedly installed below the confluence cylinder, and a spiral mixer is connected inside the mixing cylinder. The spiral mixer is located below the inlet ring groove. The mixing cylinder is connected to an external thin film deposition device. Two inlet bends are fixedly installed on the confluence cylinder. The inlet bends are fixedly installed to the outflow sleeve. The inlet bends are connected to the main gas channel through the inlet ring groove. The main gas channel is connected to an external inlet pipe for a second type of gas.

[0019] The first gas, after its pressure and speed are adjusted according to the flow rate of the second gas, enters the manifold through the inlet bend and then enters the main gas channel through the inlet ring groove. The second gas enters from above the manifold and then enters the spiral mixer together. The two gases are thoroughly mixed in the spiral mixer, and then the mixed gases enter the thin film deposition equipment together. The first gas is automatically adjusted according to the flow rate and supply pressure of the second gas to match the second gas, so that the first and second gases are mixed more evenly.

[0020] The beneficial effects of this invention compared with the prior art are: (1) The pressure regulating mechanism set in this invention can monitor the inlet pressure of the first gas in real time. When the pressure is normal, the gas follows the conventional path. When the pressure is insufficient, the system can automatically switch to the boosting path without delay and use the centrifugal impeller to pressurize the gas, ensuring that the output pressure is stable within the preset range, providing a stable gas pressure prerequisite for subsequent precise mixing; (2) The speed regulating mechanism set in this invention adopts a unique hexagonal regulating flow plate design. Through the inclined slot turntable and motor drive, the synchronous and equidistant opening and closing of the six regulating flow plates can be realized, which can regulate the gas flow rate and ensure the first gas's pressure is stable within the preset range. A gas can be accurately adjusted to the target flow rate according to the flow rate of the second gas or the process formula requirements, laying a solid foundation for achieving a precise mixing ratio; (3) The mixing mechanism set up in this invention introduces the first gas after pressure and speed regulation through the annular layout of the inlet ring groove, and pre-mixes it with the second gas entering from above in the main gas channel. Then, they enter the spiral mixer together. The spiral mixer, through its special flow channel design, forces the gas to generate strong swirling and shearing, which greatly increases the gas contact area and mixing energy, thereby achieving full and uniform mixing of the two gases at the molecular level in a very short distance and time. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of the overall structure of the present invention.

[0022] Figure 2 This is a schematic diagram of the hybrid mechanism structure of the present invention.

[0023] Figure 3This is a schematic diagram of the pressure regulating mechanism of the present invention. Figure 1 .

[0024] Figure 4 This is a schematic diagram of the pressure regulating mechanism of the present invention. Figure 2 .

[0025] Figure 5 This is a schematic diagram of the pressure regulating mechanism of the present invention. Figure 3 .

[0026] Figure 6 This is a schematic diagram of the pressure regulating mechanism of the present invention. Figure 4 .

[0027] Figure 7 This is a schematic diagram of the speed regulating mechanism of the present invention. Figure 1 .

[0028] Figure 8 This is a schematic diagram of the speed regulating mechanism of the present invention. Figure 2 .

[0029] Figure 9 This is a schematic diagram of the speed regulating mechanism of the present invention. Figure 3 .

[0030] Figure 10 This is a schematic diagram of the speed regulating mechanism of the present invention. Figure 4 .

[0031] Figure 11 This is a schematic diagram of the speed regulating mechanism of the present invention. Figure 5 .

[0032] Reference numerals: 101-Main inlet pipe; 102-First tee; 103-Second tee; 104-Pressure pipe; 105-Boost pipe; 106-Piston box; 107-Front valve body; 108-Regular outlet pipe; 109-Outlet tee; 110-Outlet pipe; 111-Boost outlet pipe; 112-Boost box; 113-Boost motor; 114-Rear valve body; 115-Boost impeller; 116-Boost through hole; 117-Boost inlet pipe; 118-Piston disc; 119-Piston column; 120-Piston spring; 121-Transverse rod; 122-Front switch plate; 123-Rear switch plate; 201-Speed ​​regulating cylinder; 202-Inlet sleeve; 203-Outlet sleeve; 204-Inner motor; 205-Motor gear; 206-Slanted groove turntable; 207-Inner gear ring; 208-Adjusting flow plate; 209-Adjusting block; 210-Sliding column; 211-Slide groove; 212-Sliding plate; 213-Slanted slide groove; 301-Fixing plate; 302-Merging cylinder; 303-Inlet bend; 304-Mixing cylinder; 305-Main air passage; 306-Inlet ring groove; 307-Spiral mixer. Detailed Implementation

[0033] The specific embodiments of the present invention will be further described below with reference to the accompanying drawings.

[0034] Example: Reference Figures 1-11 A spray head gas mixing structure for a thin film deposition equipment includes two pressure regulating mechanisms for adjusting the input gas pressure, a speed regulating mechanism for adjusting the input gas flow rate connected to the pressure regulating mechanism, and a mixing mechanism for mixing multiple gases provided on the speed regulating mechanism.

[0035] The pressure regulating mechanism includes a main inlet pipe 101 and an outlet pipe 110. A first tee 102 and a second tee 103 are fixedly installed on the main inlet pipe 101. A pressure detection module for detecting intake pressure and a pressure compensation module for compensating for insufficient intake pressure are provided next to the main inlet pipe 101.

[0036] like Figures 3-6 As shown, the pressure regulating mechanism includes a booster pipe 105 fixedly installed on the second tee 103, a front valve housing 107 fixedly installed on the booster pipe 105, a conventional outlet pipe 108 fixedly installed on the front valve housing 107, an outlet tee 109 fixedly installed on the conventional outlet pipe 108, an outlet pipe 110 fixedly installed on the outlet tee 109, and a main inlet pipe 101 connected to the inlet pipe of the first type of gas.

[0037] like Figures 3-6 As shown, a rear valve housing 114 is fixedly installed on the main inlet pipe 101, a booster inlet pipe 117 is fixedly installed on the rear valve housing 114, a booster box 112 is fixedly installed on the booster inlet pipe 117, a booster outlet pipe 111 is fixedly installed on the booster box 112, and the booster outlet pipe 111 is fixedly installed with the outlet tee 109.

[0038] like Figures 3-6 As shown, a pressure pipe 104 is fixedly installed on the first tee 102, a piston box 106 is fixedly installed on the pressure pipe 104, a piston rod 119 is slidably installed inside the piston box 106, a piston disc 118 is fixedly installed on the piston rod 119, the piston disc 118 slides inside the piston box 106, a piston spring 120 is provided between the piston disc 118 and the piston box 106, the piston spring 120 is sleeved on the outside of the piston rod 119, and a piston rod 119 is fixedly installed on the piston rod 119. A lateral moving rod 121 is fixedly installed. A front switch plate 122 and a rear switch plate 123 are fixedly installed at both ends of the lateral moving rod 121, respectively. The front switch plate 122 slides inside the front valve housing 107, and the rear switch plate 123 slides inside the rear valve housing 114. When the front switch plate 122 closes the front valve housing 107, the rear switch plate 123 opens the rear valve housing 114. When the rear switch plate 123 closes the rear valve housing 114, the front switch plate 122 opens the front valve housing 107.

[0039] like Figures 3-6As shown, a booster motor 113 is fixedly installed on the booster box 112, and a booster impeller 115 is fixedly installed on the motor shaft of the booster motor 113. The booster impeller 115 is provided with multiple booster through holes 116. A hole is provided at the center of the booster impeller 115, and the hole communicates with the booster through holes 116. The booster inlet pipe 117 delivers gas to the hole at the center of the booster impeller 115. The gas passes through the booster through holes 116 and reaches the booster box 112. After being pressurized, the gas leaves from the booster outlet pipe 111.

[0040] The first type of gas enters the main inlet pipe 101. A portion of the gas enters the booster pipe 105 through the second three-way valve 103, and a portion of the gas enters the pressure pipe 104 through the first three-way valve 102. Due to the pressure of the intake gas, the gas entering the piston box 106 through the pressure pipe 104 pushes the piston disc 118 and piston rod 119 inward. The piston spring 120 is compressed, and the piston rod 119 drives the front switch plate 122 and the rear switch plate 123 to move through the lateral rod 121. This causes the front switch plate 122 to open the front valve housing 107, and the rear switch plate 123 to close the rear valve housing 114. At this time, the gas enters the speed regulating mechanism through the main inlet pipe 101, the second three-way valve 103, the booster pipe 105, the front valve housing 107, the conventional outlet pipe 108, the outlet three-way valve 109, and the outlet pipe 110.

[0041] If the gas pressure is insufficient, the gas enters the piston box 106 through the pressure pipe 104, and cannot push the piston disc 118 and piston column 119 to move. At this time, the front switch plate 122 closes the front valve housing 107, and the rear switch plate 123 opens the rear valve housing 114. At this time, the gas enters the booster box 112 through the main inlet pipe 101, the rear valve housing 114, and the booster inlet pipe 117. Then the gas enters the center hole of the booster impeller 115. The booster motor 113 drives the booster impeller 115 to rotate at high speed. Through centrifugal force, the gas that entered the center hole of the booster impeller 115 is discharged from the booster through hole 116 into the booster box 112. Then the pressurized gas enters the outlet tee 109 through the booster outlet pipe 111. Then the gas enters the speed regulating mechanism through the outlet pipe 110.

[0042] like Figures 7-11 As shown, the speed regulating mechanism includes an inlet sleeve 202 fixedly installed on the outlet pipe 110. One end of a speed regulating cylinder 201 is fixedly installed on the inlet sleeve 202, and an outlet sleeve 203 is fixedly installed on the other end of the speed regulating cylinder 201. Six sliding grooves 211 are provided on both the inlet sleeve 202 and the outlet sleeve 203. A sliding plate 212 is slidably installed in the sliding groove 211. An adjusting block 209 is fixedly installed on the sliding plate 212. A sliding column 210 is fixedly installed on the adjusting block 209. A hexagonal through hole is provided at the center of the inlet sleeve 202 and the outlet sleeve 203.

[0043] like Figures 7-11As shown, two internal motors 204 are fixedly installed inside the speed regulating cylinder 201. A motor gear 205 is fixedly installed on the motor shaft of the internal motor 204. An inclined groove turntable 206 is rotatably installed in the inlet sleeve 202 and the outlet sleeve 203. An internal gear ring 207 is fixedly installed on the inclined groove turntable 206. The internal gear ring 207 meshes with the motor gear 205. Six inclined sliding grooves 213 are provided on the inclined groove turntable 206. The sliding column 210 slides in the inclined sliding grooves 213.

[0044] like Figures 7-11 As shown, an adjusting plate 208 is fixedly installed on the adjusting block 209. The adjusting plates 208 on the six adjusting blocks 209 on the inlet sleeve 202 are fixedly installed on the six adjusting blocks 209 on the outlet sleeve 203, respectively.

[0045] The first gas enters the inlet sleeve 202 through the outlet pipe 110. Then, the gas enters the six regulating flow plates 208 through the hexagonal through hole at the center of the inlet sleeve 202. The six regulating flow plates 208 form a closed structure. Then, the gas leaves through the hexagonal through hole at the center of the outlet sleeve 203.

[0046] The internal motor 204 rotates, driving the motor gear 205 to rotate, which in turn drives the inclined slot turntable 206 to rotate via the internal gear ring 207. The sliding column 210 slides within the inclined slot 213, causing the adjusting block 209 and the sliding plate 212 to slide along the slot 211. This causes the six adjusting blocks 209 and the adjusting flow plate 208 to move synchronously. When the six adjusting flow plates 208 open, the space enclosed by the adjusting flow plates 208 increases, causing the gas flow velocity through the adjusting flow plates 208 to decrease. When the six adjusting flow plates 208 contract, the space enclosed by the adjusting flow plates 208 decreases, causing the gas flow velocity through the adjusting flow plates 208 to increase. Thus, the intake speed of the first gas can be adjusted according to the requirements.

[0047] like Figure 2 As shown, the mixing mechanism includes a confluence cylinder 302, with two fixed plates 301 fixedly installed inside the confluence cylinder 302. A main air passage 305 is provided inside the confluence cylinder 302, and an air inlet ring groove 306 is provided on the main air passage 305. A mixing cylinder 304 is fixedly installed below the confluence cylinder 302, and a spiral mixer 307 is provided inside the mixing cylinder 304. The spiral mixer 307 is located below the air inlet ring groove 306. The mixing cylinder 304 is connected to an external thin film deposition device at its lower part. Two air inlet bends 303 are fixedly installed on the confluence cylinder 302. The air inlet bends 303 are fixedly installed with an outlet sleeve 203. The air inlet bends 303 are connected to the main air passage 305 through the air inlet ring groove 306. The main air passage 305 is connected to an external second gas inlet pipe at its upper part.

[0048] The first gas, after its pressure and speed are adjusted according to the flow rate of the second gas, enters the confluence cylinder 302 through the inlet bend 303, and then enters the main gas channel 305 through the inlet ring groove 306. The second gas enters from above the confluence cylinder 302, and then the first and second gases enter the spiral mixer 307 together. The two gases are thoroughly mixed in the spiral mixer 307, and then the mixed gases enter the thin film deposition equipment together. The first gas is automatically adjusted according to the flow rate and supply pressure of the second gas to match the second gas, so that the first and second gases are mixed more evenly.

[0049] Working principle: The first type of gas enters the main inlet pipe 101. Part of the gas enters the booster pipe 105 through the second three-way valve 103, and part of the gas enters the pressure pipe 104 through the first three-way valve 102. Due to the pressure of the intake gas, the gas entering the piston box 106 through the pressure pipe 104 pushes the piston disc 118 and piston rod 119 inward. The piston spring 120 is compressed. The piston rod 119 drives the front switch plate 122 and the rear switch plate 123 to move through the lateral rod 121. This causes the front switch plate 122 to open the front valve housing 107 and the rear switch plate 123 to close the rear valve housing 114. At this time, the gas enters the speed regulating mechanism through the main inlet pipe 101, the second three-way valve 103, the booster pipe 105, the front valve housing 107, the conventional outlet pipe 108, the outlet three-way valve 109, and the outlet pipe 110.

[0050] If the gas pressure is insufficient, the gas enters the piston box 106 through the pressure pipe 104, and cannot push the piston disc 118 and piston column 119 to move. At this time, the front switch plate 122 closes the front valve housing 107, and the rear switch plate 123 opens the rear valve housing 114. At this time, the gas enters the booster box 112 through the main inlet pipe 101, the rear valve housing 114, and the booster inlet pipe 117. Then the gas enters the center hole of the booster impeller 115. The booster motor 113 drives the booster impeller 115 to rotate at high speed. Through centrifugal force, the gas that entered the center hole of the booster impeller 115 is discharged from the booster through hole 116 into the booster box 112. Then the pressurized gas enters the outlet tee 109 through the booster outlet pipe 111. Then the gas enters the speed regulating mechanism through the outlet pipe 110.

[0051] The first gas enters the inlet sleeve 202 through the outlet pipe 110. Then, the gas enters the six regulating flow plates 208 through the hexagonal through hole at the center of the inlet sleeve 202. The six regulating flow plates 208 form a closed structure. Then, the gas leaves through the hexagonal through hole at the center of the outlet sleeve 203.

[0052] The internal motor 204 rotates, driving the motor gear 205 to rotate, which in turn drives the inclined slot turntable 206 to rotate via the internal gear ring 207. The sliding column 210 slides within the inclined slot 213, causing the adjusting block 209 and the sliding plate 212 to slide along the slot 211. This causes the six adjusting blocks 209 and the adjusting flow plate 208 to move synchronously. When the six adjusting flow plates 208 open, the space between them increases, reducing the gas flow velocity. When the six adjusting flow plates 208 contract, the space between them increases, increasing the gas flow velocity. This allows the intake speed of the first gas to be adjusted as needed.

[0053] The first gas, after its pressure and speed are adjusted according to the flow rate of the second gas, enters the confluence cylinder 302 through the inlet bend 303, and then enters the main gas channel 305 through the inlet ring groove 306. The second gas enters from above the confluence cylinder 302, and then the first and second gases enter the spiral mixer 307 together. The two gases are thoroughly mixed in the spiral mixer 307, and then the mixed gases enter the thin film deposition equipment together. The first gas is automatically adjusted according to the flow rate and supply pressure of the second gas to match the second gas, so that the first and second gases are mixed more evenly.

[0054] The above description is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the present invention based on the technical solution and inventive concept of the present invention should be covered within the scope of protection of the present invention.

Claims

1. A showerhead gas mixing structure for a thin film deposition apparatus, comprising two pressure regulating mechanisms for regulating the pressure of input gas, characterized in that: The speed regulating mechanism is connected with a mixing mechanism for mixing multiple gases; The pressure regulating mechanism comprises a main inflow pipe (101) and an outlet pipe (110), the first three-way pipe (102) and the second three-way pipe (103) are fixedly installed on the main inflow pipe (101), and a pressure detecting module and a pressure supplementing module are arranged beside the main inflow pipe (101) for detecting the inlet gas pressure and supplementing the pressure when the inlet gas pressure is insufficient; The mixing mechanism comprises a converging cylinder (302), two fixed plates (301) are fixedly installed in the converging cylinder (302), and the main inflow pipe (101) is fixedly installed in the fixed plate (301); The pressure regulating mechanism comprises a booster pipe (105) fixedly installed on the second three-way pipe (103), the front valve shell (107) is fixedly installed on the booster pipe (105), the conventional outlet pipe (108) is fixedly installed on the front valve shell (107), the outlet three-way pipe (109) is fixedly installed on the conventional outlet pipe (108), the outlet pipe (110) is fixedly installed on the outlet three-way pipe (109), and the main inflow pipe (101) is connected with an inlet gas pipeline of the first gas; The rear valve shell (114) is fixedly installed on the main inflow pipe (101), the booster inflow pipe (117) is fixedly installed on the rear valve shell (114), the booster tank (112) is fixedly installed on the booster inflow pipe (117), the booster outlet pipe (111) is fixedly installed on the booster tank (112), and the booster outlet pipe (111) is fixedly installed on the outlet three-way pipe (109); The pressure pipe (104) is fixedly installed on the first three-way pipe (102), the piston tank (106) is fixedly installed on the pressure pipe (104), the piston column (119) is slidingly installed in the piston tank (106), the piston disc (118) is fixedly installed on the piston column (119), the piston disc (118) slides in the piston tank (106), the piston spring (120) is arranged between the piston disc (118) and the piston tank (106), the piston spring (120) is sleeved on the outside of the piston column (119), the horizontal moving rod (121) is fixedly installed on the piston column (119), the front switch plate (122) and the rear switch plate (123) are fixedly installed at the two ends of the horizontal moving rod (121), respectively, the front switch plate (122) slides in the front valve shell (107), the rear switch plate (123) slides in the rear valve shell (114), when the front switch plate (122) closes the front valve shell (107), the rear switch plate (123) opens the rear valve shell (114), and when the rear switch plate (123) closes the rear valve shell (114), the front switch plate (122) opens the front valve shell (107).

2. The showerhead gas mixing structure for a thin film deposition apparatus according to claim 1, wherein: The booster box (112) is fixedly installed with a booster motor (113), the motor shaft of the booster motor (113) is fixedly installed with a booster impeller (115), a plurality of booster through holes (116) are arranged on the booster impeller (115), a hole is arranged at the center of the booster impeller (115) and communicates with the booster through hole (116), and the booster inlet pipe (117) delivers gas into the hole at the center of the booster impeller (115), the gas reaches the booster box (112) through the booster through hole (116), and the gas leaves from the booster outlet pipe (111) after being pressurized.

3. The showerhead gas delivery structure for a thin film deposition apparatus of claim 1, wherein: The speed regulating mechanism comprises an inlet sleeve (202) fixedly installed on the outlet pipe (110), one end of a speed regulating cylinder (201) fixedly installed on the inlet sleeve (202), a flow-out sleeve (203) fixedly installed on the other end of the speed regulating cylinder (201), six sliding grooves (211) arranged on the inlet sleeve (202) and the flow-out sleeve (203), a sliding plate (212) slidably installed in the sliding groove (211), an adjusting block (209) fixedly installed on the sliding plate (212), a sliding column (210) fixedly installed on the adjusting block (209), and a hexagonal hole arranged at the center of the inlet sleeve (202) and the flow-out sleeve (203).

4. The showerhead gas delivery structure for a thin film deposition apparatus of claim 3, wherein: Two inner motors (204) are fixedly installed in the speed regulating cylinder (201), a motor gear (205) is fixedly installed on the motor shaft of the inner motor (204), an inclined chute turntable (206) is rotatably installed in the inlet sleeve (202) and the flow-out sleeve (203), an inner gear ring (207) is fixedly installed on the inclined chute turntable (206), the inner gear ring (207) is engaged with the motor gear (205), and six inclined sliding grooves (213) are arranged on the inclined chute turntable (206).

5. The showerhead gas delivery structure for a thin film deposition apparatus of claim 4, wherein: The adjusting block (209) is fixedly installed with an adjusting flow plate (208), the adjusting flow plate (208) on the six adjusting blocks (209) arranged on the inlet sleeve (202) is fixedly installed with the adjusting flow plate (208) on the six adjusting blocks (209) arranged on the flow-out sleeve (203).

6. The showerhead gas delivery structure for a thin film deposition apparatus of claim 5, wherein: The confluence cylinder (302) is provided with a main gas channel (305), the main gas channel (305) is provided with an air inlet ring groove (306), the confluence cylinder (302) is fixedly installed below a mixing cylinder (304), the mixing cylinder (304) is provided with a spiral mixer (307), the spiral mixer (307) is located below the air inlet ring groove (306), the mixing cylinder (304) is connected with an external film deposition device below, the confluence cylinder (302) is fixedly installed with two air inlet bends (303), the air inlet bends (303) are fixedly installed with the flow-out sleeve (203), the air inlet bends (303) communicate with the main gas channel (305) through the air inlet ring groove (306), and the main gas channel (305) is connected with an air inlet pipeline of a second kind of gas above.

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