Photovoltaic device and preparation method thereof, and photovoltaic cell module
By forming sub-openings on opposite sides of the photoelectric conversion layer, laser etching of the photoelectric conversion layer is avoided, thus solving the stability problem of perovskite solar cells during laser scribing and improving the stability of the device.
Patent Information
- Application Number
- CN202411004323.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-07-24
- Publication Date
- 2026-02-03
AI Technical Summary
During the laser etching process of perovskite solar cells, the laser scribing can come into contact with the perovskite layer, causing the perovskite layer to be exposed, which is prone to collapse and damage, affecting the stability of the device.
A first sub-opening and a second sub-opening are formed on opposite sides of the photoelectric conversion layer to avoid direct etching of the photoelectric conversion layer. By setting the first and second sub-openings in the film structure of the photovoltaic device, it is ensured that the photoelectric conversion layer does not form an exposed cut surface, thus preventing collapse.
This improves the stability of photovoltaic devices, prevents the collapse of the photoelectric conversion layer, and enhances the overall stability of the devices.
Smart Images

Figure CN121463636A_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of photovoltaic device technology, specifically to a photovoltaic device and its preparation method, and a photovoltaic cell module. Background Technology
[0002] Perovskite solar cells are a rapidly developing third-generation type of solar cell, possessing advantages such as high efficiency, low cost, and simple manufacturing processes. In recent years, an increasing number of researchers have been actively promoting the technological development and practical application of perovskite solar modules. Currently, small-area (e.g., less than 1 cm²) perovskite solar cells are becoming increasingly common. 2 Perovskite solar cell efficiency has exceeded 25%, and the efficiency of perovskite solar cell modules has also reached commercial standards. However, the stability of perovskite solar cell modules still needs further improvement to meet commercial requirements.
[0003] However, during the laser etching process for scribing perovskite solar cells, the laser scribing contacts the perovskite layer. The laser cuts through the perovskite layer, completely exposing the cut surface without a film layer to fill the scribed area. This makes the perovskite layer highly susceptible to collapse and surface damage, leading to a decrease in the stability of the perovskite solar cell. Therefore, improving the device stability of perovskite solar cells has become a pressing issue in this field. Summary of the Invention
[0004] This application provides a photovoltaic device and its fabrication method, as well as a photovoltaic cell module, aiming to solve the problem of how to improve the device stability of perovskite solar cells.
[0005] A first aspect of this application provides a photovoltaic device, the photovoltaic device comprising:
[0006] substrate;
[0007] A first electrode layer, a first functional layer, a photoelectric conversion layer, and a second functional layer are sequentially stacked on one side of the substrate, with the second functional layer disposed close to the substrate.
[0008] The photovoltaic device includes a first opening, which includes a first sub-opening and a second sub-opening correspondingly disposed on opposite sides of the photoelectric conversion layer.
[0009] The first sub-opening penetrates the first electrode layer and the first functional layer along a first direction, and the second sub-opening penetrates the second functional layer along the first direction, wherein the first direction is the direction from the substrate to the photoelectric conversion layer.
[0010] In one optional embodiment, the photovoltaic device further includes a second electrode layer disposed between the second functional layer and the substrate;
[0011] The photovoltaic device includes a second opening that extends through the second electrode layer along the first direction.
[0012] In one alternative embodiment, the second opening is filled with the material of the second functional layer.
[0013] In one alternative embodiment, the photovoltaic device includes a third opening that extends through the first functional layer, the photoelectric conversion layer, and the second functional layer along the first direction.
[0014] In one alternative embodiment, the third opening is filled with the material of the first electrode layer.
[0015] In one optional embodiment, the photovoltaic device includes a plurality of sub-cells arranged at intervals along a second direction, with an isolation region provided between adjacent sub-cells, and the second direction being a direction perpendicular to the first direction;
[0016] The third opening is located within the isolation area to enable electrical connection between the first and second electrode layers of adjacent sub-cells.
[0017] In one alternative embodiment, each of the sub-cells includes a first connection portion located on the first electrode layer and a second connection portion located on the second electrode layer, the first connection portion and the second connection portion extending to isolation regions located on both sides of the sub-cell;
[0018] Within the isolation area, the third opening is connected to the first connection portion of the first sub-battery and the second connection portion of the second sub-battery, wherein the first sub-battery and the second sub-battery are any two adjacent sub-batteries.
[0019] In one alternative embodiment, the first opening and the second opening are disposed within the isolation area, and the first opening and the second opening are respectively disposed on opposite sides of the third opening along the second direction.
[0020] In one alternative embodiment, the light-emitting layer comprises at least a perovskite-type compound.
[0021] In one optional embodiment, the first electrode layer is a cathode layer, and the first functional layer is an electron transport layer;
[0022] The second electrode layer is an anode layer, and the second functional layer is a hole transport layer.
[0023] The second aspect of this application provides a photovoltaic cell module, which includes the photovoltaic device described in any one of the first aspects of this application.
[0024] A third aspect of this application provides a method for fabricating a photovoltaic device, the method comprising:
[0025] Provide substrate;
[0026] A second functional layer, a photoelectric conversion layer, a first functional layer, and a first electrode layer are sequentially formed on one side of the substrate, with the second functional layer disposed close to the substrate.
[0027] The photovoltaic device includes a first opening, which includes a first sub-opening and a second sub-opening correspondingly disposed on opposite sides of the photoelectric conversion layer.
[0028] The first sub-opening penetrates the first electrode layer and the first functional layer along a first direction, and the second sub-opening penetrates the second functional layer along the first direction, wherein the first direction is the direction from the substrate to the photoelectric conversion layer.
[0029] In one alternative embodiment, the first opening is prepared according to the following steps:
[0030] After the first electrode layer is formed, the first electrode layer in the first target area is used as the laser focus to perform laser etching on the first electrode layer and the first functional layer to form the first sub-opening.
[0031] Using the second functional layer within the second target area as the laser focus, laser etching is performed on the second functional layer to form the second sub-opening. The orthographic projection of the second target area on the substrate coincides with the orthographic projection of the first target area on the substrate.
[0032] In one alternative embodiment, the first opening is prepared according to the following steps:
[0033] After the second functional layer is formed, the second functional layer in the second target area is used as the laser focus to perform laser etching to form the second sub-opening;
[0034] After the first electrode layer is formed, the first electrode layer in the first target area is used as the laser focus to perform laser etching on the first electrode layer and the first functional layer to form the first sub-opening. The orthographic projection of the second target area on the substrate coincides with the orthographic projection of the first target area on the substrate.
[0035] Beneficial effects:
[0036] This application provides a photovoltaic device and its fabrication method, as well as a photovoltaic cell module. The photovoltaic device includes: a substrate; a first electrode layer, a first functional layer, a photoelectric conversion layer, and a second functional layer sequentially stacked on one side of the substrate, with the second functional layer disposed close to the substrate; the photovoltaic device includes a first opening, the first opening including a first sub-opening and a second sub-opening correspondingly disposed on opposite sides of the photoelectric conversion layer, wherein the first sub-opening penetrates the first electrode layer and the first functional layer along a first direction, and the second sub-opening penetrates the second functional layer along the first direction, the first direction being the direction from the substrate to the photoelectric conversion layer. This application, by forming the first sub-opening and the second sub-opening on opposite sides of the photoelectric conversion layer, effectively divides the film layers on both sides of the photoelectric conversion layer without contacting the photoelectric conversion layer, thereby preventing the formation of unfilled scribing cut surfaces in the photoelectric conversion layer, preventing the collapse of the photoelectric conversion layer, and improving the device stability of the photovoltaic device. Attached Figure Description
[0037] To more clearly illustrate the technical solutions of the embodiments of this application, the drawings used in the description of the embodiments of this application will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0038] Figure 1 This is a schematic diagram of the hierarchical structure of a photovoltaic device according to an embodiment of this application;
[0039] Figure 2 This is an enlarged schematic diagram of the isolation region structure between adjacent sub-cells in a photovoltaic device according to an embodiment of this application.
[0040] Explanation of reference numerals in the attached drawings: 11, substrate; 21, first electrode layer; 22, second electrode layer; 31, first functional layer; 32, second functional layer; 41, photoelectric conversion layer; 51, first opening; 511, first sub-opening; 512, second sub-opening; 52, second opening; 53, third opening; 61, isolation region; 611, first connecting portion; 612, second connecting portion. Detailed Implementation
[0041] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.
[0042] In the accompanying drawings, the size of constituent elements, the thickness of layers, or areas may sometimes be exaggerated for clarity. Therefore, any implementation of this disclosure is not necessarily limited to the dimensions shown in the drawings, and the shapes and sizes of the components in the drawings do not reflect true proportions. Furthermore, the drawings schematically illustrate ideal examples, and any implementation of this disclosure is not limited to the shapes or values shown in the drawings.
[0043] Perovskite solar cells are a rapidly developing third-generation type of solar cell, possessing advantages such as high efficiency, low cost, and simple manufacturing processes. In recent years, an increasing number of researchers have been actively promoting the technological development and practical application of perovskite solar modules. Currently, small-area (e.g., less than 1 cm²) perovskite solar cells are becoming increasingly common. 2 Perovskite solar cell efficiency has exceeded 25%, and the efficiency of perovskite solar cell modules has also reached commercial standards. However, the stability of perovskite solar cell modules still needs further improvement to meet commercial requirements.
[0044] However, during the laser etching process for scribing perovskite solar cells, the laser scribing contacts the perovskite layer. The laser cuts the perovskite layer, completely exposing the cut surface. Furthermore, there is no film layer to fill the scribing area of the perovskite layer after cutting. This makes the perovskite layer extremely prone to collapse and cut surface damage, thereby reducing the stability of the perovskite solar cell.
[0045] In view of this, embodiments of this application propose a photovoltaic device. Figure 1 This application illustrates a schematic diagram of the hierarchical structure of a photovoltaic device according to an embodiment of the present application, as shown below. Figure 1 As shown, the photovoltaic device includes: a substrate 11; a second functional layer 32 disposed on one side of the substrate 11; a photoelectric conversion layer 41 disposed on the side of the second functional layer 32 away from the substrate 11; a first functional layer 31 disposed on the side of the photoelectric conversion layer 41 away from the substrate 11; and a first electrode layer 21 disposed on the side of the photoelectric conversion layer 41 away from the substrate 11.
[0046] In this embodiment, the substrate 11 supports other film layers of the photovoltaic device and protects the photovoltaic device from water and oxygen intrusion from the external environment. In some optional embodiments, to ensure that the laser can pass through the substrate 11 to perform laser etching on other film layers on one side of the substrate 11, the substrate 11 is a transparent substrate; on the other hand, making the substrate 11 a transparent substrate can increase the carrier absorption of the photovoltaic device and improve the power generation of the photovoltaic device. Optionally, the substrate 11 includes, but is not limited to, a glass substrate, a ceramic substrate, and a plastic substrate. Exemplarily, the material of the substrate 11 can be at least one of glass, PET, PI, PE, or PVC.
[0047] In this embodiment, the photovoltaic device further includes a second electrode layer 22, which is disposed between the second functional layer 32 and the substrate 11. The first electrode layer 21 and the second electrode layer 22 have opposite polarities and are used to draw out the current generated by the photovoltaic device. In some optional embodiments, one of the first electrode layer 21 and the second electrode layer 22 serves as the cathode layer of the photovoltaic device in the discharge state, and the other serves as the anode layer of the photovoltaic device in the discharge state. The following illustrative description of some embodiments of this application uses the first electrode layer 21 as the cathode layer and the second electrode layer 22 as the anode layer as an example. It is readily understood that the embodiments of this application are not limited to this, as long as they share the same technical concept.
[0048] In some optional embodiments, in order to ensure that the laser can pass through the second electrode layer 22 to perform laser etching on other film layers on the side of the second electrode layer 22 away from the substrate 11, the second electrode layer 22 is a transparent conductive electrode. For example, the material of the second electrode layer 22 can be at least one of fluorine-doped tin oxide (FTO), indium tin oxide (ITO), zinc aluminum oxide (AZO), indium zinc oxide (IZO), and zinc gallium oxide (GZO).
[0049] In some optional embodiments, the material of the first electrode layer 21 may be the same as or different from the material of the second electrode layer 22. Optionally, the material of the first electrode layer 21 may be at least one of a metal (e.g., nickel, aluminum, copper, silver, etc.) or its alloy, or a metal oxide (e.g., FTO, ITO, AZO, IZO, and GZO, etc.).
[0050] In this embodiment, the first functional layer 31 and the second functional layer 32 are respectively disposed close to the first electrode layer 21 and the second electrode layer 22. The first functional layer 31 and the second functional layer 32 are used to improve the carrier transport efficiency of the photovoltaic device. Specifically, when the first electrode layer 21 is the cathode and the second electrode layer 22 is the anode, the first functional layer 31 is an electron transport layer used to transport electrons and block hole transport. By setting the first functional layer 31 and the second functional layer 32, the recombination of electrons and holes when electrons are transported to the cathode layer (first electrode layer 21) is reduced. The second functional layer 32 is a hole transport layer used to transport holes and block electron transport. By setting the second functional layer 32, the recombination of electrons and holes when holes are transported to the anode layer (second electrode layer 22) is reduced, thereby increasing the overall photoelectric conversion efficiency of the photovoltaic device.
[0051] In this embodiment, the photoelectric conversion layer 41 is used to convert the light energy of the light incident on the photovoltaic device into electrical energy based on the photovoltaic effect, and to generate electrons and holes. The electrons generated by the photoelectric conversion layer 41 are transmitted to the first electrode layer 21 through the first functional layer 31, and the holes generated by the photoelectric conversion layer 41 are transmitted to the second electrode layer 22 through the second functional layer 32.
[0052] In some optional embodiments, the photoelectric conversion layer 41 includes at least a perovskite compound, which has a narrow band gap, a wide absorption spectrum and high thermal stability. Using a perovskite compound as the photoelectric conversion material of the photoelectric conversion layer 41 can generate electricity stably and provide stable power output.
[0053] For large-area photovoltaic devices, to obtain the required voltage and current output, the photovoltaic device needs to be divided into multiple sub-cells by laser etching. Openings are formed by these etched lines to achieve electrical connections between the multiple sub-cells (e.g., multiple sub-cells can be connected in series, parallel, or a hybrid connection, where some sub-cells are connected in series and others in parallel). Specifically, the photovoltaic device includes a first opening 51, which is used to divide the first functional layer 31, the second functional layer 32, and the first electrode layer 21 of adjacent sub-cells. Since the first functional layer 31 and the second functional layer 32 are located on opposite sides of the photoelectric conversion layer 41, if the first opening 51 is formed by laser etching from one side of the photoelectric conversion layer 41, the first opening 51 will penetrate the photoelectric conversion layer 41, exposing the cut surface of the first opening 51 on the photoelectric conversion layer 41. This can easily cause the material of the photoelectric conversion layer 41 to collapse, affecting the stability of the photovoltaic device. Therefore, in this embodiment of the application, the first opening 51 includes a first sub-opening 511 and a second sub-opening 512 correspondingly disposed on opposite sides of the photoelectric conversion layer 41, wherein the first sub-opening 511 penetrates the first electrode layer 21 and the first functional layer 31 along a first direction, and the second sub-opening 512 penetrates the second functional layer 32 along the first direction, wherein the first direction is the direction from the substrate 11 to the photoelectric conversion layer 41.
[0054] In this embodiment, the first opening 51 is divided into a first sub-opening 511 and a second sub-opening 512, which are disconnected and disposed on opposite sides of the photoelectric conversion layer 41 along the first direction. The first sub-opening 511 penetrates the film layer (including the first electrode layer 21 and the first functional layer 31) on the side of the photoelectric conversion layer 41 away from the substrate 11, so that the bottom of the opening of the first sub-opening 511 is the surface of the photoelectric conversion layer 41 on the side away from the substrate 11. The second sub-opening 512 penetrates the second functional layer 32 on the side of the photoelectric conversion layer 41 close to the substrate 11, so that the bottom of the opening of the second sub-opening 512 is the surface of the photoelectric conversion layer 41 close to the substrate 11. This ensures that the formation process of the first opening 51 does not etch the photoelectric conversion layer 41, avoids the formation of exposed cut surfaces on the photoelectric conversion layer 41, effectively protects the structure of the photoelectric conversion layer 41, and improves the stability of the photovoltaic device.
[0055] Furthermore, each of the first openings 51 has a first sub-opening 511 and a second sub-opening 512 correspondingly arranged along the first direction. Specifically, the first sub-opening 511 and the second sub-opening 512 have the same width along the second direction, and the orthographic projections of the first sub-opening 511 and the second sub-opening 512 on the substrate 11 coincide, wherein the second direction is a direction perpendicular to the first direction (i.e., ...). Figure 1 For example, the first direction is the vertical direction, and the second direction is the horizontal direction.
[0056] It should be noted that the opening mentioned in the embodiments of this application refers to the linear groove structure formed by etching the film structure of the photovoltaic device based on the laser etching process, and the bottom of the opening refers to the bottom of the groove structure.
[0057] In some alternative embodiments, the second sub-opening 512 extends through the second functional layer 32, which is disposed on the side of the photoelectric conversion layer 41 near the substrate 11, and the second sub-opening 512 is not filled with material.
[0058] In some optional embodiments, the photovoltaic device further includes a second opening 52 that extends through the second electrode layer 22 along the first direction. The second opening 52 is used to divide the second electrode layer 22 of adjacent sub-cells. Since the second electrode layer 22 is disposed between the second functional layer 32 and the substrate 11, to avoid the second electrode layer 22 being exposed on its side at the second opening 52 and affecting the performance of the photovoltaic device, the second opening 52 is filled with the second functional layer 32.
[0059] In some optional embodiments, the photovoltaic device further includes a third opening 53, which penetrates the first functional layer 31, the photoelectric conversion layer 41, and the second functional layer 32 along the first direction. The third opening 53 is used to electrically connect the first electrode layer 21 and the second electrode layer 22 of adjacent sub-cells. Since the photoelectric conversion layer 41 is disposed between the first electrode layer 21 and the second electrode layer 22, and the third opening is used to conduct electricity between the first electrode layer 21 and the second electrode layer 22, the third opening 53 needs to penetrate the photoelectric conversion layer 41. To avoid exposing the side of the photoelectric conversion layer 41 formed at the third opening 53, which would affect the stability of the photovoltaic device, the third opening 53 is filled with the first electrode layer 21. By filling the third opening 53 with the first electrode layer 21, the side of the photoelectric conversion layer 41 exposed at the third opening 53 is covered, thereby preventing the photoelectric conversion layer 41 from collapsing and improving the stability of the photovoltaic device.
[0060] In some alternative embodiments, the photovoltaic device includes a plurality of sub-cells spaced apart along the second direction, with an isolation region 61 provided between adjacent sub-cells. The isolation region 61 generally cannot utilize light, resulting in light waste. For example, when the photovoltaic device is a photovoltaic cell, the isolation region corresponds to the dead zone of the photovoltaic cell. Figure 2 This illustration shows an enlarged schematic diagram of the isolation region structure between adjacent sub-cells in a photovoltaic device according to an embodiment of this application, as shown below. Figure 2 As shown, the isolation region 61 is disposed between two adjacent sub-batteries. Specifically, the boundaries of the isolation region 61 on opposite sides along the second direction are the boundaries of the first opening 51 and the second opening 52 away from each other, and the first opening 51 and the second opening are disposed within the isolation region 61.
[0061] In some alternative embodiments, the first electrode layer 21 of the sub-battery includes a region of the first electrode layer 21 divided by the first sub-opening 511, and the second electrode layer 22 of the sub-battery includes a region of the second electrode layer 22 divided by the second opening 52. Since both the first sub-opening 511 and the second opening 52 are located within the isolation region 61, each sub-battery includes a first connecting portion 611 located in the first electrode layer 21 and a second connecting portion 612 located in the second electrode layer 22. The first connecting portion 611 and the second connecting portion 612 extend to the isolation regions 61 located on both sides of the sub-battery.
[0062] In other words, the first connection portion 611 and the second connection portion 612 of the same sub-battery are located in different isolation regions 61; among two adjacent sub-batteries, the first connection portion 611 of one sub-battery and the second connection portion 612 of the other sub-battery are located in the same isolation region 61. Specifically, the sub-battery includes a first sub-battery and a second sub-battery, which are any two adjacent sub-batteries. The third opening 53 can achieve electrical connection between the first sub-battery and the second sub-battery by connecting the first electrode layer 21 of the first sub-battery and the second electrode layer 22 of the second sub-battery. Therefore, in this embodiment, the third opening 53 is disposed in the isolation region 61, and the third opening 53 connects the first connection portion 611 of the first sub-battery and the second connection portion 612 of the second sub-battery respectively.
[0063] In some optional embodiments, the first opening and the second opening are respectively disposed on opposite sides of the third opening along the second direction. In order to ensure that the electrical connection between two adjacent sub-cells is achieved through the third opening 53, within the same isolation region 61, the orthographic projection of the first connection portion 611 on the substrate 11 and the orthographic projection of the second connection portion 612 on the substrate 11 at least partially overlap, and the orthographic projection of the third opening 53 on the substrate 11 is disposed within the overlapping area of the orthographic projections of the first connection portion 611 and the second connection portion 612 on the substrate 11.
[0064] This application provides a photovoltaic device, comprising: a substrate; a first electrode layer, a first functional layer, a photoelectric conversion layer, and a second functional layer sequentially stacked on one side of the substrate, the second functional layer being disposed close to the substrate; the photovoltaic device includes a first opening, the first opening including a first sub-opening and a second sub-opening correspondingly disposed on opposite sides of the photoelectric conversion layer, wherein the first sub-opening penetrates the first electrode layer and the first functional layer along a first direction, and the second sub-opening penetrates the second functional layer along the first direction, the first direction being the direction from the substrate to the photoelectric conversion layer. This application, by forming the first sub-opening and the second sub-opening on opposite sides of the photoelectric conversion layer, effectively divides the film layers on both sides of the photoelectric conversion layer without contacting the photoelectric conversion layer, thereby preventing the formation of unfilled scribing cut surfaces in the photoelectric conversion layer, preventing the collapse of the photoelectric conversion layer, and improving the device stability of the photovoltaic device.
[0065] Based on the same inventive concept, this application discloses a photovoltaic cell module, which includes the photovoltaic device described in the embodiments of this application.
[0066] In some alternative embodiments, the photovoltaic cell module further includes a cover plate disposed on the side of the first electrode layer 21 opposite to the substrate 11, for protecting the film structure of the photovoltaic device and allowing incident light to pass through the substrate to irradiate the photovoltaic device.
[0067] In some alternative embodiments, the cover plate is a transparent cover plate to increase the absorption of light from the outside by the photovoltaic device. Exemplarily, the material of the cover plate includes, but is not limited to, glass, ceramic, and plastic cover plates.
[0068] The photovoltaic cell modules disclosed in this application can serve as a power source for electrical devices, providing electrical energy to them. These electrical devices include, but are not limited to, devices used in fields such as construction, military, travel, national defense, and power supply. For example, these devices can be mobile phones, tablets, laptops, electric toys, power tools, electric vehicles, electric cars, ships, spacecraft, photovoltaic greenhouses, photovoltaic water heaters, etc.
[0069] Based on the same inventive concept, this application discloses a method for fabricating a photovoltaic device. The method includes: providing a substrate 11; and sequentially forming a second functional layer 32, a photoelectric conversion layer 41, a first functional layer 31, and a first electrode layer 21 on one side of the substrate 11, wherein the second functional layer 32 is disposed close to the substrate 11; the photovoltaic device includes a first opening 51, the first opening 51 including a first sub-opening 511 and a second sub-opening 512 correspondingly disposed on opposite sides of the photoelectric conversion layer 41, wherein the first sub-opening 511 penetrates the first electrode layer 21 and the first functional layer 31 along a first direction, and the second sub-opening 512 penetrates the second functional layer 32 along the first direction, wherein the first direction is the direction from the substrate to the photoelectric conversion layer.
[0070] In this embodiment of the application, the photovoltaic device further includes: a second electrode layer 22 disposed between the second functional layer 32 and the substrate 11; a second opening 52 penetrating the second electrode layer 22 along the first direction; and a third opening 53 penetrating the first functional layer 31, the photoelectric conversion layer 41, and the second functional layer 32 along the first direction.
[0071] To better understand the fabrication method of the photovoltaic device provided in the embodiments of this application, the fabrication method of the photovoltaic device will be described in detail below:
[0072] First, a substrate 11 is provided; a second electrode layer 22 is formed on one side of the substrate 11, wherein the process for forming the second electrode layer 22 includes, but is not limited to, any one or more of evaporation, sputtering, spraying, thermal spray decomposition, atomic layer deposition, chemical vapor deposition, printing, or slot coating; the second electrode layer 22 is laser etched with the second electrode layer 22 as the laser focus to form the second opening 52, and the second electrode layer 22 is divided into multiple units through the second opening 52, wherein the second electrode layer 22 in each unit is used as the second electrode layer 22 of each sub-cell.
[0073] In some optional embodiments, the first sub-opening 511 and the second sub-opening 512 can be formed separately before and after the formation of the photoelectric conversion layer 41. Since the second functional layer 32 is formed on the side of the second electrode layer 22 facing away from the substrate 11, the second sub-opening 512 penetrating the second functional layer 32 can be formed after the second opening 52 is formed. Specifically, after the second opening 52 is formed, the second functional layer 32 is formed on the side of the second electrode layer 22 facing away from the substrate 11, and the second functional layer 32 fills the interior of the second opening 52. The process for forming the second functional layer 32 includes, but is not limited to, any one or more of evaporation, sputtering, spraying, thermal spray decomposition, atomic layer deposition, chemical vapor deposition, printing, or slot coating. Subsequently, the second functional layer 32 is laser-etched with the laser focus in the second target area to form the second sub-opening 512.
[0074] After the second sub-opening 512 is formed, the photoelectric conversion layer 41 is formed on the side of the second functional layer 32 facing away from the substrate 11. The photoelectric conversion layer 41 fills the interior of the second sub-opening 512. The material of the photoelectric conversion layer 41 includes at least a perovskite compound. The process for forming the photoelectric conversion layer 41 includes, but is not limited to, any one or more of evaporation, sputtering, spraying, thermal spray decomposition, atomic layer deposition, chemical vapor deposition, printing, or slot coating. Subsequently, the first functional layer 31 is formed on the side of the photoelectric conversion layer 41 facing away from the substrate 11. The process for forming the first functional layer 31 includes, but is not limited to, any one or more of evaporation, sputtering, spraying, thermal spray decomposition, atomic layer deposition, chemical vapor deposition, printing, or slot coating.
[0075] After the first functional layer 31 is formed, laser etching is performed on the first functional layer 31, the photoelectric conversion layer 41, and the second functional layer 32, using the first functional layer 31 as the laser focus, to form the third opening 53. The first electrode layer 21 and the second electrode layer 22 of adjacent sub-cells are connected through the third opening 53. Then, the first electrode layer 21 is formed on the side of the first functional layer 31 facing away from the substrate 11. The process for forming the first functional layer 31 and the first electrode layer 21 includes, but is not limited to, any one or more of the following: vapor deposition, sputtering, spraying, thermal spray decomposition, atomic layer deposition, chemical vapor deposition, printing, or slot coating.
[0076] Finally, after forming the first electrode layer 21, laser etching is performed on the first electrode layer 21 and the first functional layer 31 using the first electrode layer 21 in the first target area as the laser focus to form the first sub-opening 511. The orthographic projection of the second target area on the substrate coincides with the orthographic projection of the first target area on the substrate, so that the first sub-opening 511 and the second sub-opening 512 are correspondingly disposed on opposite sides of the photoelectric conversion layer 41. This application effectively avoids the first opening 51 affecting the structure of the photoelectric conversion layer 41 by forming the second sub-opening 512 on the side of the photoelectric conversion layer 41 closer to the substrate 11 before forming the photoelectric conversion layer 41, and then forming the first sub-opening 511 on the side away from the substrate 11 after forming the photoelectric conversion layer 41, thus ensuring the stability of the photovoltaic device.
[0077] In some alternative embodiments, to further reduce the process flow, the first sub-opening 511 and the second sub-opening 512 can be formed after the photoelectric conversion layer 41 is formed. Specifically, after the second opening 52 is formed, the second functional layer 32 is formed on the side of the second electrode layer 22 facing away from the substrate 11, and the second functional layer 32 fills the interior of the second opening 52. Subsequently, the photoelectric conversion layer 41 is formed on the side of the second functional layer 32 facing away from the substrate 11, and the material of the photoelectric conversion layer 41 includes at least a perovskite-type compound. The first functional layer 31 is formed on the side of the photoelectric conversion layer 41 facing away from the substrate 11.
[0078] After the first functional layer 31 is formed, laser etching is performed on the first functional layer 31, the photoelectric conversion layer 41, and the second functional layer 32, using the first functional layer 31 as the laser focus, to form the third opening 53. The first electrode layer 21 and the second electrode layer 22 of adjacent sub-cells are connected through the third opening 53. Then, the first electrode layer 21 is formed on the side of the first functional layer 31 facing away from the substrate 11. The first electrode layer 21 fills the interior of the third opening 53, preventing the sides of the photoelectric conversion layer 41 inside the third opening from being exposed.
[0079] After the first electrode layer 21 is formed, the first electrode layer 21 and the first functional layer 31 are laser etched with the first electrode layer 21 in the first target area as the laser focus to form the first sub-opening 511; the second functional layer 32 in the second target area is laser etched with the second functional layer 32 as the laser focus to form the second sub-opening 512. The orthographic projection of the second target area on the substrate 11 coincides with the orthographic projection of the first target area on the substrate 11.
[0080] It should be noted that the first sub-opening 511 and the second sub-opening 512 are obtained by laser etching of two laser beams located on opposite sides of the photoelectric conversion layer 41 along the first direction. The two laser beams can operate simultaneously to form the first sub-opening 511 and the second sub-opening 512 on both sides of the photoelectric conversion layer 41 at the same time; the two laser beams can also operate separately to form the first sub-opening 511 and the second sub-opening 512 sequentially. It is easy to understand that the first sub-opening 511 can be formed first, and then the second sub-opening 512 can be formed, or the second sub-opening 512 can be formed first, and then the first sub-opening 511 can be formed. The operation process of the two laser beams can be determined according to the actual situation, and this application does not impose any restrictions here.
[0081] In this embodiment, after forming the second opening 52 and the third opening 53, two laser beams located on opposite sides of the photoelectric conversion layer 41 are used to perform laser etching on both sides of the photoelectric conversion layer 41. This allows the first electrode layer 21, the first functional layer 31, and the second functional layer 32 to be divided into multiple units corresponding to multiple sub-cells without damaging the structure of the photoelectric conversion layer 41, thus preventing the collapse of the photoelectric conversion layer 41 and improving the stability of the photovoltaic device.
[0082] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on the differences from other embodiments. The same or similar parts between the various embodiments can be referred to each other.
[0083] In the description of this specification, it should be understood that the terms "center", "thickness", "upper", "lower", "front", "rear", "horizontal", "top", "bottom", "inner", "outer", "axial", "radial", "circumferential", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application.
[0084] In this application, unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," and "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection, an electrical connection, or a communication connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.
[0085] In this application, unless otherwise expressly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature being directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature being directly above or diagonally above the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.
[0086] The foregoing application provides many different implementations or examples for carrying out different structures of this application. To simplify this application, the components and arrangements of specific examples are described above. Of course, these are merely examples and are not intended to limit this application. Furthermore, reference numerals and / or reference letters may be repeated in different examples; such repetition is for simplification and clarity and does not in itself indicate a relationship between the various implementations and / or arrangements discussed.
[0087] The terms "an embodiment," "embodiment," or "one or more embodiments" as used herein mean that a particular feature, structure, or characteristic described in connection with an embodiment is included in at least one embodiment of this application. Furthermore, please note that the examples of the phrase "in one embodiment" do not necessarily all refer to the same embodiment.
[0088] Numerous specific details are set forth in the specification provided herein. However, it will be understood that embodiments of this application may be practiced without these specific details. In some instances, well-known methods, structures, and techniques have not been shown in detail so as not to obscure the understanding of this specification.
[0089] Finally, it should be noted that in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or terminal device that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or terminal device. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or terminal device that includes said element.
[0090] The foregoing has provided a detailed description of a photovoltaic device and its fabrication method, as well as a photovoltaic cell module. Specific examples have been used to illustrate the principles and implementation methods of this application. The descriptions of the above embodiments are only for the purpose of helping to understand the method and core ideas of this application. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of this application. Therefore, the content of this specification should not be construed as a limitation of this application.
Claims
1. A photovoltaic device, characterized in that, The photovoltaic device includes: substrate; A first electrode layer, a first functional layer, a photoelectric conversion layer, and a second functional layer are sequentially stacked on one side of the substrate, with the second functional layer disposed close to the substrate. The photovoltaic device includes a first opening, which includes a first sub-opening and a second sub-opening correspondingly disposed on opposite sides of the photoelectric conversion layer. The first sub-opening penetrates the first electrode layer and the first functional layer along a first direction, and the second sub-opening penetrates the second functional layer along the first direction, wherein the first direction is the direction from the substrate to the photoelectric conversion layer.
2. The photovoltaic device according to claim 1, characterized in that, The photovoltaic device further includes a second electrode layer, which is disposed between the second functional layer and the substrate. The photovoltaic device includes a second opening that extends through the second electrode layer along the first direction.
3. The photovoltaic device according to claim 2, characterized in that, The second opening is filled with the material of the second functional layer.
4. The photovoltaic device according to claim 2, characterized in that, The photovoltaic device includes a third opening that extends through the first functional layer, the photoelectric conversion layer, and the second functional layer along the first direction.
5. The photovoltaic device according to claim 4, characterized in that, The third opening is filled with the material of the first electrode layer.
6. The photovoltaic device according to claim 4, characterized in that, The photovoltaic device includes multiple sub-cells arranged at intervals along a second direction, with an isolation area between adjacent sub-cells, and the second direction is perpendicular to the first direction. The third opening is located within the isolation area to enable electrical connection between the first and second electrode layers of adjacent sub-cells.
7. The photovoltaic device according to claim 6, characterized in that, Each of the sub-cells includes a first connection portion located on the first electrode layer and a second connection portion located on the second electrode layer, the first connection portion and the second connection portion extending to isolation regions located on both sides of the sub-cell; Within the isolation area, the third opening is connected to the first connection portion of the first sub-battery and the second connection portion of the second sub-battery, wherein the first sub-battery and the second sub-battery are any two adjacent sub-batteries.
8. The photovoltaic device according to claim 6, characterized in that, The first opening and the second opening are disposed within the isolation area, and the first opening and the second opening are respectively disposed on opposite sides of the third opening along the second direction.
9. The photovoltaic device according to claim 1, characterized in that, The luminescent layer comprises at least a perovskite-type compound.
10. The photovoltaic device according to claim 2, characterized in that, The first electrode layer is a cathode layer, and the first functional layer is an electron transport layer; The second electrode layer is an anode layer, and the second functional layer is a hole transport layer.
11. A photovoltaic cell module, characterized in that, The photovoltaic cell module includes the photovoltaic device according to any one of claims 1 to 10.
12. A method for fabricating a photovoltaic device, characterized in that, The method includes: Provide substrate; A second functional layer, a photoelectric conversion layer, a first functional layer, and a first electrode layer are sequentially formed on one side of the substrate, with the second functional layer disposed close to the substrate. The photovoltaic device includes a first opening, which includes a first sub-opening and a second sub-opening correspondingly disposed on opposite sides of the photoelectric conversion layer. The first sub-opening penetrates the first electrode layer and the first functional layer along a first direction, and the second sub-opening penetrates the second functional layer along the first direction, wherein the first direction is the direction from the substrate to the photoelectric conversion layer.
13. The method for fabricating a photovoltaic device according to claim 12, characterized in that, The first opening is prepared according to the following steps: After the first electrode layer is formed, the first electrode layer in the first target area is used as the laser focus to perform laser etching on the first electrode layer and the first functional layer to form the first sub-opening. Using the second functional layer within the second target area as the laser focus, laser etching is performed on the second functional layer to form the second sub-opening. The orthographic projection of the second target area on the substrate coincides with the orthographic projection of the first target area on the substrate.
14. The method for fabricating a photovoltaic device according to claim 12, characterized in that, The first opening is prepared according to the following steps: After the second functional layer is formed, the second functional layer in the second target area is used as the laser focus to perform laser etching to form the second sub-opening; After the first electrode layer is formed, the first electrode layer in the first target area is used as the laser focus to perform laser etching on the first electrode layer and the first functional layer to form the first sub-opening. The orthographic projection of the second target area on the substrate coincides with the orthographic projection of the first target area on the substrate.