Multi-slit micro-stress supporting structure for aerospace application

Abstract

The invention belongs to the technical field of optical remote sensing, and relates to a multi-slit micro-stress supporting structure for aerospace application. The structure comprises an upper end slit assembly, a lower end slit assembly, a slit support, a slit rear reflector assembly, a first trimming pad, a second trimming pad and a third trimming pad. The upper-end slit assembly and the lower-end slit assembly are connected with the slit support through corresponding trimming pads, and the trimming pads are used for adjusting the coplanarity of the upper-end slit assembly and the lower-end slit assembly; the slit rear reflector assembly is installed on the support through a third trimming pad and used for turning the incident light of the slit at the lower end. The upper-end slit assembly and the lower-end slit assembly are same modules and respectively comprise slit glass, a cover plate and a frame, the glass is bonded in the frame, and the cover plate is not in contact with the glass; the side of the support is provided with an accurate measuring mirror. The structure solves the problems that a single slit is difficult to process and support, the surface shape is poor, the coplanarity of double slits is difficult to adjust, the environmental adaptability is poor, the size and the weight are large, and the layout is unreasonable.

Description

Technical Field

[0001] This invention belongs to the field of optical remote sensing technology, specifically relating to a multi-slit micro-stress support structure for aerospace applications. Background Technology

[0002] With the rapid development of aerospace optical remote sensing technology, the performance requirements for optical remote sensors are increasing, especially in terms of the two core indicators: spatial resolution and imaging swath width. Slit-type spectral imagers, as a mainstream technology, typically use prisms or gratings to achieve dispersion, with the slit serving as its primary image plane. The length of the slit directly limits the system's imaging coverage width, while its width plays a decisive role in the system's spectral resolution. Therefore, the positional accuracy and surface shape accuracy of the slit become key factors affecting the final imaging quality of the entire spectral imaging system.

[0003] To meet the demands of ultra-wide field-of-view imaging, spectral imaging systems require ultra-long slits at the primary image plane. In the visible and short-wave infrared bands, such slits are typically made of thin strips of optical glass. However, increasing the slit length brings multiple challenges: on the one hand, the processing difficulty of optical materials increases significantly, placing extremely high demands on the straightness of the slit edges and surface roughness; on the other hand, during spacecraft launch and on-orbit operation, the slit must withstand severe high and low temperature fluctuations, mechanical vibrations, and humid heat, among other complex environmental conditions. The longer the slit, the more difficult the design of its structural support system becomes, and the greater the challenge in maintaining shape stability and positional accuracy.

[0004] To address these challenges, multi-slit splicing technology has emerged, offering advantages in two main aspects: First, shortening the length of a single slit effectively reduces the difficulty of ultra-precision machining, simplifies the design of the support structure, and enhances the system's stability in harsh environments. Second, in the dual-slit splicing scheme, the size of various optical components (such as collimating lenses, dispersive elements, and focusing lenses) in the subsequent beam splitting path can be reduced without altering the design of the front imaging lens group, thereby reducing the overall complexity of optical processing and the system's manufacturing cost.

[0005] However, replacing the traditional single slit with a double slit also introduces new technical challenges. The most prominent of these is controlling assembly precision, specifically ensuring extremely high coplanarity and straightness at the splicing point between the two slits. Any slight misalignment or tilt will cause discontinuities or distortions in the spectral data. The two spliced ​​slits must be "on the same plane" (coplanarity), and the error must be controlled within micrometers or even nanometers. Even a slight difference in elevation will cause light to deflect, ultimately resulting in "fracturing" or "blurring" in the image. Achieving this high-precision splicing assembly process is extremely difficult. To ensure coplanarity, a complex, high-precision support structure is required, which increases the overall size and weight of the slit assembly (contradicting the aerospace "lightweight" requirements). Furthermore, the more complex the support structure, the worse its stability in aerospace environments such as high and low temperatures and vibrations (low environmental adaptability), and the more compact the overall spatial layout becomes, further limiting the installation of other components (unreasonable spatial layout).

[0006] In summary, double-slit structures typically face challenges such as difficulty in adjusting coplanarity, weak environmental adaptability, potential increase in overall volume and weight, more complex optomechanical layout, and increased difficulty in engineering implementation. These are all key issues that need to be addressed in practical applications. Summary of the Invention

[0007] The purpose of this invention is to provide a multi-slit micro-stress support structure for aerospace applications, which solves the problems of existing ultra-long single slits having high processing and support difficulty, poor slit integration surface accuracy; or double slits having difficulty adjusting coplanarity, poor environmental adaptability, large size and heavy weight, unreasonable spatial layout and low engineering feasibility.

[0008] This invention is achieved through the following technical solution: This invention discloses a double-slit micro-stress support structure for aerospace applications, comprising an upper slit assembly, a first trimming pad, a lower slit assembly, a second trimming pad, a slit bracket, a slit rear reflector assembly, and a third trimming pad. The upper slit assembly is connected to the slit support via the first trimming pad, and the lower slit assembly is connected to the slit support via the second trimming pad; the first trimming pad and the second trimming pad are used to adjust the coplanarity of the upper slit assembly and the lower slit assembly. Both the upper slit assembly and the lower slit assembly adopt a modular design and have the same structure. The upper slit assembly includes an upper slit glass, an upper slit cover plate, and an upper slit frame; the upper slit glass is bonded to the upper slit frame around its perimeter; the upper slit cover plate is connected to the upper slit frame and is used to suppress stray light incident on the slit, and the upper slit cover plate and the upper slit glass do not directly contact each other. The slit rear reflector assembly is connected to the slit support via a third trimming pad, and is used to deflect the incident light from the lower slit assembly; A precision measuring mirror is mounted on the side of the slit support to facilitate observation of the position and orientation of the upper and lower slit components.

[0009] Furthermore, the slit support includes a first plate, a second plate, and a third plate. The second plate and the third plate are both perpendicularly connected to the first plate. The upper slit assembly and the lower slit assembly are mounted on the second plate. The third plate is perpendicularly connected to the second plate. The slit rear reflector assembly is mounted on the third plate.

[0010] Furthermore, the second plate is provided with four slit frame mounting bosses. The two slit frame mounting bosses at the upper end are connected to the upper slit assembly, and the two slit frame mounting bosses at the lower end are used to connect to the lower slit assembly. The mounting boss of the slit frame is used to ensure the flatness of the mounting surface and facilitate the adjustment of the coplanarity of the upper slit assembly and the lower slit assembly; A side auxiliary positioning hole is installed on the side of the second plate, which is used to install the precision measuring mirror.

[0011] Furthermore, the second plate is pre-machined with an upper slit frame mounting groove and a lower slit frame mounting groove; the upper slit frame mounting groove is used to install the upper slit assembly, and the lower slit frame mounting groove is used to install the lower slit assembly.

[0012] Furthermore, the upper slit frame includes a frame body and two mounting bosses, which are symmetrically connected to the upper part of the frame body for connection with the upper slit cover plate. The frame body has a pre-fabricated groove for installing the upper slit glass; The frame body has multiple injection grooves prefabricated on the shell side wall, which are used to inject epoxy glue and silicone rubber to fix the upper slit glass. Two lugs extend from the mounting platform, each lug having a pre-drilled pin hole and a connecting hole. The pin hole is used to achieve the reset relationship between the upper slit assembly and the slit bracket. The connecting hole is used to fix the assembly to the slit bracket.

[0013] Furthermore, the glue injection groove on the short side of the frame body is used for direct injection of epoxy glue; The glue injection groove on the long side of the frame body uses epoxy glue and silicone rubber injected alternately to reduce adhesive stress.

[0014] Furthermore, root cleaning grooves are prefabricated at the four corners of the settling tank, which are used to achieve right-angle root cleaning.

[0015] Furthermore, the slit rear reflector assembly includes a slit rear reflector and a reflector mounting base; the slit rear reflector is bonded to the reflector mounting base with epoxy adhesive.

[0016] Furthermore, the reflector bonding base includes a connecting base and a reflector mounting base perpendicularly connected to the connecting base. The reflector mounting base is provided with an overflow groove, and a first limiting boss and a second limiting boss are provided around the overflow groove. The first limiting boss and the second limiting boss are arranged perpendicularly to limit the position of the reflector behind the slit from two directions. The connecting base is attached to the slit bracket; The overflow trough includes a main channel and multiple parallel adhesive channels that are perpendicularly connected to the main channel.

[0017] Furthermore, the slit rear reflector adopts a prismatic structure.

[0018] Compared with the prior art, the present invention has the following beneficial technical effects: This invention discloses a multi-slit micro-stress support structure for aerospace applications. To achieve high stability, micro-stress support, and rapid and convenient adjustment of the double slits, the slit glass is bonded to the upper slit frame via multiple perforated small dots around its perimeter. This reduces the stress during adhesive curing and ensures high-precision surface accuracy of the slit glass. A modular design and adjustment approach is adopted, with individual slits installed within the slit frame, and the double slits independently bonded as components. These components are then mounted on the slit support via trimming pads. The coplanarity of the double slits is adjusted by grinding the thickness of the trimming pads. Rapid adjustment of the coplanarity of the double slits is achieved through the modular design and trimming pad adjustment process, supplemented by a precision measuring mirror.

[0019] To facilitate the layout and adjustment of complex systems, a slit rear reflector assembly is installed behind the lower slit assembly to deflect the optical path. The spatial layout of the dual-path optics can be adjusted by adjusting the angle of the slit rear reflector, which facilitates engineering feasibility.

[0020] The double-slit micro-stress support structure has a compact overall layout and good mechanical and thermal stability. It can be widely used in aerospace slit hyperspectral imaging systems and can also serve as the primary image plane of the system to improve the imaging performance of the optical system.

[0021] Furthermore, the slit rear reflector assembly adopts a back-bonding method, which significantly improves bonding strength and stability compared to bottom bonding due to the larger bonding area. In addition, the overflow groove design avoids stress concentration caused by adhesive layer pushing, thus preventing any impact on the surface accuracy of the reflective surface.

[0022] Furthermore, the slit rear reflector adopts a prism design. On the one hand, the design of the two right-angled sides facilitates the spatial positioning of optical components. On the other hand, the chamfered design, which serves as a reflective surface, reduces the overall size of the system and facilitates miniaturization. Attached Figure Description

[0023] Figure 1This is a schematic diagram of a double-slit micro-stress support structure for aerospace applications according to the present invention. Figure 2 for Figure 1 Another view direction; Figure 3 This is a three-dimensional schematic diagram of the upper slit assembly of the present invention; Figure 4 This is a three-dimensional schematic diagram of the slit frame of the present invention; Figure 5 This is a three-dimensional schematic diagram of the reflector bonding base of the present invention; Figure 6 This is a three-dimensional schematic diagram of the slit support of the present invention; Figure 7 This is a schematic diagram of the structure of the slit rear reflector.

[0024] Among them, 1. Upper slit assembly; 2. First trimming pad; 3. Lower slit assembly; 4. Second trimming pad; 5. Slit support; 6. Slit rear reflector assembly; 7. Third trimming pad; 11. Upper slit glass; 12. Upper slit cover plate; 13. Upper slit frame; 131. Mounting boss; 132. Countersunk groove; 133. Glue injection groove; 134. Pin hole; 135. Root cleaning groove; 136. Connecting hole; 501. First plate; 502. Second plate; 503. Third plate; 51. Slit frame mounting boss; 52. Side auxiliary positioning hole; 53. Slit bracket pin hole; 54. Upper slit frame mounting groove; 55. Lower slit frame mounting groove; 61. Slit rear reflector; 62. Reflector mounting base; 621. First limiting boss; 622. Second limiting boss; 623. Glue overflow groove; 624. Adhesive seat pin hole. Detailed Implementation

[0025] To make the objectives, technical solutions, and advantages of the present invention clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the invention; that is, the described embodiments are only a part of the embodiments of the present invention, and not all of them.

[0026] The components described and illustrated in the accompanying drawings and embodiments of this invention can be arranged and designed in various different configurations. Therefore, the detailed description of the embodiments of the invention provided in the following drawings is not intended to limit the scope of the claimed invention, but merely to illustrate one selected embodiment of the invention. All other embodiments obtained by those skilled in the art based on the accompanying drawings and embodiments of this invention without inventive effort are within the scope of protection of this invention.

[0027] It should be noted that the terms "comprising," "including," or any other variations are intended to cover non-exclusive inclusion, such that a process, element, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to the process, element, method, article, or apparatus. Furthermore, the terms "horizontal" and "vertical" are based on the orientation and positional relationship of the devices or components shown in the accompanying drawings and are used only for better description of the invention, not to require that the shown devices, components, or apparatus must have that specific orientation, and therefore should not be construed as limiting the invention.

[0028] The features and performance of the present invention will be further described in detail below with reference to embodiments.

[0029] like Figure 1 and Figure 2 As shown, the present invention discloses a double-slit micro-stress support structure for aerospace applications, including an upper slit assembly 1, a first trimming pad 2, a lower slit assembly 3, a second trimming pad 4, a slit bracket 5, a slit rear reflector assembly 6, and a third trimming pad 7.

[0030] like Figure 1 and Figure 6 As shown, the slit support 5 includes a first plate 501, a second plate 502, and a third plate 503. The second plate 502 and the third plate 503 are both vertically connected to the first plate 501. The upper slit assembly 1 and the lower slit assembly 3 are mounted on the second plate 502. The third plate 503 is vertically connected to the second plate 502. The slit rear reflector assembly 6 is mounted on the third plate 503.

[0031] Specifically, the third plate 503 is a trapezoidal plate.

[0032] The upper slit assembly 1 is connected to the second plate 502 of the slit support 5 via a first trimming pad 2 and screws; the lower slit assembly 3 is connected to the second plate 502 of the slit support 5 via a second trimming pad 4 and screws; the slit rear reflector assembly 6 is connected to the third plate 503 of the slit support 5 via a third trimming pad 7 and screws.

[0033] Both the upper slit assembly 1 and the lower slit assembly 3 adopt a modular and integrated design approach. Except for their installation positions, their structural forms and design concepts are identical. The first trimming pad 2 and the second trimming pad 4 each include multiple trimming pads, used to adjust the coplanarity of the upper slit assembly 1 and the lower slit assembly 3, thereby replacing the function of an extra-long slit.

[0034] The slit rear reflector assembly 6 can be used to refract the optical path, enabling the adjustment of the position of the optical element behind the slit, thus facilitating engineering feasibility. The center height of the slit rear reflector assembly 6 can be adjusted by adjusting the thickness of the third trimming pad 7, facilitating the complete refraction of the incident light rays from the lower slit assembly 3.

[0035] like Figure 2 As shown, the slit rear reflector assembly 6 includes a slit rear reflector 61 and a reflector mounting base 62. The slit rear reflector 61 is bonded to the reflector mounting base 62 with epoxy adhesive 8217.

[0036] like Figure 3 As shown, the upper slit assembly 1 includes an upper slit glass 11, an upper slit cover plate 12, and an upper slit frame 13. The upper slit glass 11 is placed inside the upper slit frame 13 and bonded together with epoxy adhesive and silicone rubber around its perimeter. The upper slit cover plate 12 is connected to the upper slit frame 13 by multiple screws and is mainly used to suppress stray light incident on the slit. It does not directly contact the upper slit glass 11, thus avoiding direct contact between optical and structural components, which could affect the surface and positional accuracy of the upper slit glass 11.

[0037] like Figure 4 As shown, the upper slit frame 13 includes a frame body and two mounting bosses 131. The two mounting bosses 131 are symmetrically connected to the upper part of the frame body and are used to connect with the upper slit cover plate 12.

[0038] The frame body has a pre-fabricated recess 132, which is used to install the upper slit glass 11, and adopts a clearance fit.

[0039] Multiple injection grooves 133 are prefabricated on the sidewalls of the frame body. These grooves are used to inject 2216 epoxy resin and silicone rubber to fix the upper slit glass 11. Specifically, one injection groove 133 is prefabricated on each of the short sides of the frame body for direct injection of 2216 epoxy resin. The injection grooves 133 on the long sides use an alternating injection method of 2216 epoxy resin and silicone rubber to reduce adhesive stress.

[0040] The mounting boss 131 also has two protruding lugs, each with a pre-drilled pin hole 134 and a connecting hole 136. The pin hole 134 is used to install a pin, realizing the reset relationship between the upper slit assembly 1 and the slit bracket 5. The connecting hole 136 is used to fix it to the slit bracket 5. The pin hole 134 facilitates high-precision positioning, and after disassembly, it is easy to reposition.

[0041] More preferably, root cleaning grooves 135 are prefabricated at the four corners of the settling tank 132. The root cleaning grooves 135 are used to achieve right-angle root cleaning, avoiding interference with the upper slit glass 11, which would cause the upper slit glass 11 to crack and chip.

[0042] like Figure 5 As shown, the reflector bonding base 62 includes a connecting base and a reflector mounting base perpendicularly connected to the connecting base. The reflector mounting base is provided with a first limiting boss 621, a second limiting boss 622, and an overflow groove 623. The connecting base has a bonding base pin hole 624.

[0043] The first limiting boss 621 and the second limiting boss 622 are arranged vertically to limit the position of the slit rear reflector 61 from two directions.

[0044] The overflow groove 623 is used for the overflow of 8217 epoxy adhesive, thereby improving the bonding strength. The overflow groove 623 includes a main channel and multiple parallel adhesive channels perpendicularly connected to the main channel, which greatly increases the bonding area.

[0045] The adhesive seat pin hole 624 is used to install pins, which facilitates the repositioning of the slit rear reflector assembly 6 and the slit bracket 5.

[0046] like Figure 6 As shown, the second plate 502 is provided with four slit frame mounting bosses 51. The two upper slit frame mounting bosses 51 are connected to the upper slit assembly 1, and the two lower slit frame mounting bosses 51 are used to connect to the lower slit assembly 3. Specifically, the slit frame mounting bosses 51 are connected to two lug bolts on the mounting boss 131.

[0047] The mounting boss 51 of the slit frame is used to ensure the flatness of the mounting surface, facilitating the adjustment of the coplanarity of the upper slit assembly 1 and the lower slit assembly 3. A side auxiliary positioning hole 52 is installed on the side of the second plate 502. The side auxiliary positioning hole 52 is used to install a precision measuring mirror, facilitating the observation of the position and attitude of the entire double slit assembly in the system.

[0048] A slit bracket pin hole 53 is installed on the side of the first plate 501. The slit bracket pin hole 53 is used to install pins to facilitate the reset relationship of the entire double slit assembly in the spectral imaging system.

[0049] The second plate 502 has a pre-machined upper slit frame mounting groove 54 and a lower slit frame mounting groove 55. The upper slit frame mounting groove 54 is used to install the upper slit assembly 1, and the lower slit frame mounting groove 55 is used to install the lower slit assembly 3.

[0050] Specifically, in combination Figure 3 The structure of the upper slit frame 13, part of the structure of the upper slit frame 13 needs to be embedded in the upper slit frame mounting groove 54 and the lower slit frame mounting groove 55.

[0051] like Figure 7 As shown, the slit rear reflector 61 adopts a prism design. On the one hand, the design of the two right-angled sides facilitates the spatial positioning of the optical components. On the other hand, the chamfered design, which serves as a reflective surface, reduces the overall size of the system and facilitates miniaturization.

[0052] This invention discloses a highly stable multi-slit micro-stress support structure for aerospace applications. This structure innovatively adopts a modular design concept, achieving high-precision coplanarity control and micro-stress environment maintenance for a dual-slit system through the organic combination of composite bonding technology and precision adjustment techniques. To achieve high-stability support and rapid, portable adjustment of the dual-slit assembly, this invention employs a composite bonding method using small-area epoxy adhesive and silicone rubber distributed at multiple points around the perimeter. This significantly reduces residual stress generated during assembly while ensuring bonding strength. Specifically, each slit is first precisely installed into a dedicated slit frame, initially fixed using a precisely controlled micro-dot matrix of epoxy adhesive, and then further sealed with silicone rubber edge bonding. This composite bonding method effectively suppresses the stress concentration problem caused by traditional large-area bonding.

[0053] The dual-slit assembly employs a modular design, consisting of independently bonded molding followed by integration. Each slit assembly is connected to the slit support via four high-precision trimming pads, forming an adjustable connection. By precisely adjusting the thickness differences of each trimming pad, combined with real-time feedback from a machine vision measurement system, efficient adjustment of the coplanarity of the dual slits can be achieved, with an adjustment accuracy down to the sub-micron level. Notably, a high-reflectivity precision mirror is integrated behind one of the slits. This mirror not only performs optical path deflection but its angle can also be precisely controlled via a fine-tuning mechanism, allowing for flexible adjustment of the spatial layout of the dual optical paths and significantly improving the system's engineering adaptability in complex aerospace environments.

[0054] This micro-stress support structure features a compact layout design. Finite element analysis optimizes the mechanical transmission paths of each component, ensuring excellent dimensional stability even under extreme temperature cycling conditions in space. Its innovative micro-stress control technology and rapid adjustment scheme make this structure particularly suitable for aerospace slit-type hyperspectral imaging systems. It can serve as a key primary image plane element, effectively improving the imaging resolution and contrast of the optical system, and providing crucial technical support for the miniaturization and high-precision development of aerospace remote sensing payloads.

[0055] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention and not to limit it. Although the present invention has been described in detail with reference to the above embodiments, those skilled in the art should understand that modifications or equivalent substitutions can still be made to the specific implementation of the present invention. Any modifications or equivalent substitutions that do not depart from the spirit and scope of the present invention should be covered within the protection scope of the present invention.

Claims

1. A double-slit micro-stress support structure for aerospace applications, characterized in that, It includes an upper slit assembly (1), a first trimming pad (2), a lower slit assembly (3), a second trimming pad (4), a slit support (5), a slit rear reflector assembly (6), and a third trimming pad (7). The upper slit assembly (1) is connected to the slit support (5) via the first trimming pad (2), and the lower slit assembly (3) is connected to the slit support (5) via the second trimming pad (4); the first trimming pad (2) and the second trimming pad (4) are used to adjust the coplanarity of the upper slit assembly (1) and the lower slit assembly (3); Both the upper slit assembly (1) and the lower slit assembly (3) adopt a modular design and have the same structure; The upper slit assembly (1) includes an upper slit glass (11), an upper slit cover plate (12), and an upper slit frame (13); the upper slit glass (11) is bonded to the upper slit frame (13) on all four sides; the upper slit cover plate (12) is connected to the upper slit frame (13) to suppress stray light incident on the slit, and the upper slit cover plate (12) and the upper slit glass (11) are not in direct contact; The slit rear reflector assembly (6) is connected to the slit bracket (5) via the third trimming pad (7) to refract the incident light from the lower slit assembly (3); A precision measuring mirror is installed on the side of the slit support (5) to facilitate observation of the position and orientation of the upper slit assembly (1) and the lower slit assembly (3).

2. The double-slit micro-stress support structure for aerospace applications according to claim 1, characterized in that, The slit support (5) includes a first plate (501), a second plate (502), and a third plate (503). The second plate (502) and the third plate (503) are both vertically connected to the first plate (501). The upper slit assembly (1) and the lower slit assembly (3) are mounted on the second plate (502). The third plate (503) is vertically connected to the second plate (502). The slit rear reflector assembly (6) is mounted on the third plate (503).

3. A double-slit micro-stress support structure for aerospace applications according to claim 2, characterized in that, The second plate (502) is provided with four slot frame mounting bosses (51). The two slot frame mounting bosses (51) at the upper end are connected to the upper slot assembly (1), and the two slot frame mounting bosses (51) at the lower end are used to connect to the lower slot assembly (3). The mounting boss (51) of the slit frame is used to ensure the flatness of the mounting surface and facilitate the adjustment of the coplanarity of the upper slit assembly (1) and the lower slit assembly (3); A side auxiliary positioning hole (52) is installed on the side of the second plate (502), and the side auxiliary positioning hole (52) is used to install the precision measuring mirror.

4. A double-slit micro-stress support structure for aerospace applications according to claim 2, characterized in that, The second plate (502) is pre-processed with an upper slit frame mounting groove (54) and a lower slit frame mounting groove (55); the upper slit frame mounting groove (54) is used to install the upper slit assembly (1), and the lower slit frame mounting groove (55) is used to install the lower slit assembly (3).

5. A double-slit micro-stress support structure for aerospace applications according to claim 1, characterized in that, The upper slit frame (13) includes a frame body and two mounting bosses (131). The two mounting bosses (131) are symmetrically connected to the upper part of the frame body and are used to connect with the upper slit cover plate (12). The frame body has a pre-fabricated groove (132) for installing the upper slit glass (11). The frame body has multiple injection grooves (133) prefabricated on the shell side wall. The injection grooves (133) are used to inject epoxy glue and silicone rubber to fix the upper slit glass (11). The mounting boss (131) also has two protruding lugs, which are pre-made with pin holes (134) and connecting holes (136); the pin holes (134) are used to realize the reset relationship between the upper slit assembly (1) and the slit bracket (5); the connecting holes (136) are used to fix the slit bracket (5).

6. A double-slit micro-stress support structure for aerospace applications according to claim 5, characterized in that, The injection groove (133) on the shell on the short side of the frame body is used for direct injection of epoxy resin; The epoxy resin and silicone rubber are injected alternately into the injection groove (133) on the long side of the frame body to reduce adhesive stress.

7. A double-slit micro-stress support structure for aerospace applications according to claim 5, characterized in that, Root cleaning grooves (135) are prefabricated at the four corners of the settling tank (132), and the root cleaning grooves (135) are used to achieve right-angle root cleaning.

8. A double-slit micro-stress support structure for aerospace applications according to claim 1, characterized in that, The slit rear reflector assembly (6) includes a slit rear reflector (61) and a reflector mounting base (62); the slit rear reflector (61) is bonded to the reflector mounting base (62) with epoxy adhesive.

9. A double-slit micro-stress support structure for aerospace applications according to claim 8, characterized in that, The reflector bonding base (62) includes a connecting base and a reflector mounting base perpendicularly connected to the connecting base. The reflector mounting base is provided with an overflow groove (623). A first limiting boss (621) and a second limiting boss (622) are provided around the overflow groove (623). The first limiting boss (621) and the second limiting boss (622) are arranged perpendicularly to limit the position of the slit rear reflector (61) from two directions. The connecting base is connected to the slit bracket (5); The overflow groove (623) includes a main channel and multiple parallel glue channels that are perpendicularly connected to the main channel.

10. A double-slit micro-stress support structure for aerospace applications according to claim 9, characterized in that, The slit rear reflector (61) adopts a prismatic structure.

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