Telescope adjustment method, device, equipment and medium

Abstract

The invention discloses a telescope installation and adjustment method, device and equipment and a medium, and relates to the technical field of optical installation and adjustment, and the method comprises the steps: obtaining an ideal wave surface diagram of a telescope to be installed and adjusted at a target field point through optical simulation software, and adding a plurality of misalignment amounts to the optical simulation software, extracting a plurality of corresponding maladjustment wavefront diagrams at the target view field point; according to the plurality of misalignment amounts and the plurality of misaligned wavefront diagrams, determining wavefront diagram sensitivities corresponding to the plurality of misalignment amounts, and combining the wavefront diagram sensitivities to obtain a wavefront diagram sensitivity matrix; an interferometer is used for collecting an actually-measured wave surface diagram of the telescope to be installed and adjusted at the target view field point, and wave surface diagram variable quantities caused by a plurality of misalignment quantities are determined through the actually-measured wave surface diagram and the ideal wave surface diagram; and based on the wave surface diagram variable quantity and the wave surface diagram sensitivity matrix, establishing a relationship between the target misalignment quantity vector and the actually measured wave surface diagram so as to determine the target misalignment quantity vector, and carrying out adjustment operation on the telescope to be adjusted according to the target misalignment quantity vector.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of optical alignment technology, in particular to a telescope alignment method, device, equipment and medium. BACKGROUND

[0002] With the increasing demand of astronomical observation, the aperture of the telescope is getting larger and larger to improve the imaging resolution and detection sensitivity. However, as the aperture of the telescope is getting larger and larger, the alignment of the optical system is getting more and more difficult. The alignment of the large telescope usually needs to use multiple field detection results for multiple rounds of alignment, for example, the method based on the sensitivity matrix of the aberration coefficient, which has high cost and low efficiency.

[0003] Therefore, how to optimize the telescope alignment method to improve the alignment efficiency of the telescope is a technical problem to be solved at present. SUMMARY

[0004] Therefore, the purpose of the present application is to provide a telescope alignment method, device, equipment and medium, which can optimize the telescope alignment method to improve the alignment efficiency of the telescope. The specific scheme is as follows:

[0005] In a first aspect, the present application provides a telescope alignment method, comprising:

[0006] obtaining an ideal wavefront map of a to-be-aligned telescope at a target field point by an optical simulation software, and adding a plurality of misalignment amounts to the optical simulation software respectively to extract a plurality of misaligned wavefront maps corresponding to the target field point; the plurality of misalignment amounts are misalignment amounts under different misalignment amount dimensions;

[0007] determining wavefront map sensitivities corresponding to the plurality of misalignment amounts respectively according to the plurality of misalignment amounts and the plurality of misaligned wavefront maps, and combining the wavefront map sensitivities to obtain a wavefront map sensitivity matrix;

[0008] collecting a measured wavefront map of the to-be-aligned telescope at the target field point by an interferometer to determine wavefront map variation amounts caused by the plurality of misalignment amounts through the measured wavefront map and the ideal wavefront map;

[0009] establishing a relationship between a target misalignment amount vector and the measured wavefront map based on the wavefront map variation amounts and the wavefront map sensitivity matrix to determine the target misalignment amount vector, and performing an alignment operation on the to-be-aligned telescope according to the target misalignment amount vector.

[0010] Optionally, the adding a plurality of misalignment amounts to the optical simulation software respectively to extract a plurality of misaligned wavefront maps corresponding to the target field point comprises:

[0011] determining a plurality of misalignment dimensions according to an optical system of the to-be-assembled telescope, and adding misalignments of a target misalignment dimension to the optical simulation software to extract a corresponding misaligned wavefront map at the target field point; the target misalignment dimension is any misalignment dimension in the plurality of misalignment dimensions;

[0012] determining any misalignment dimension in the plurality of misalignment dimensions which is not added with misalignments as a new target misalignment dimension, and jumping to the step of adding misalignments of a target misalignment dimension to the optical simulation software until all the plurality of misalignment dimensions are added to obtain a plurality of corresponding misaligned wavefront maps at the target field point.

[0013] Optionally, the determining of the wavefront map sensitivity corresponding to each of the plurality of misalignments according to the plurality of misalignments and the plurality of misaligned wavefront maps comprises:

[0014] determining a quotient value between each of the plurality of misaligned wavefront maps and the misalignment corresponding thereto respectively to determine the quotient value as the wavefront map sensitivity corresponding to each of the plurality of misalignments.

[0015] Optionally, the combining of the wavefront map sensitivities to obtain a wavefront map sensitivity matrix comprises:

[0016] horizontally splicing the wavefront map sensitivities to obtain a corresponding vector combination, and determining the vector combination as the wavefront map sensitivity matrix.

[0017] Optionally, the determining of the wavefront map change amount caused by the plurality of misalignments through the measured wavefront map and the ideal wavefront map comprises:

[0018] determining a difference value between the measured wavefront map and the ideal wavefront map, and determining the difference value as the wavefront map change amount caused by the plurality of misalignments.

[0019] Optionally, the establishing of a relationship between a target misalignment vector and the measured wavefront map based on the wavefront map change amount and the wavefront map sensitivity matrix to determine the target misalignment vector comprises:

[0020] determining a product of the target misalignment vector and the wavefront map sensitivity matrix as the wavefront map change amount to establish the relationship between the target misalignment vector and the measured wavefront map, and determining the target misalignment vector by using a least square method.

[0021] Optionally, the determining of the target misalignment vector by using the least square method comprises:

[0022] performing a left pseudo-inverse operation on the wavefront map sensitivity matrix to obtain a corresponding operation result;

[0023] determining a product between the operation result and the wavefront map variation as the target misalignment vector.

[0024] In a second aspect, the present application provides a telescope adjustment device, comprising:

[0025] a misalignment addition module configured to obtain an ideal wavefront map of a to-be-adjusted telescope at a target field point by using optical simulation software, and add a plurality of misalignments to the optical simulation software respectively to extract a plurality of post-misalignment wavefront maps corresponding to the target field point; the plurality of misalignments are misalignments in different misalignment dimensions;

[0026] a sensitivity combination module configured to determine wavefront map sensitivities corresponding to the plurality of misalignments respectively according to the plurality of misalignments and the plurality of post-misalignment wavefront maps, and combine the wavefront map sensitivities to obtain a wavefront map sensitivity matrix;

[0027] a wavefront map acquisition module configured to acquire a measured wavefront map of the to-be-adjusted telescope at the target field point by using an interferometer, and determine wavefront map variations caused by the plurality of misalignments by using the measured wavefront map and the ideal wavefront map;

[0028] a telescope adjustment module configured to establish a relationship between a target misalignment vector and the measured wavefront map based on the wavefront map variations and the wavefront map sensitivity matrix, to determine the target misalignment vector, and to perform an adjustment operation on the to-be-adjusted telescope according to the target misalignment vector.

[0029] In a third aspect, the present application provides an electronic device, comprising:

[0030] a memory configured to save a computer program;

[0031] a processor configured to execute the computer program to implement the aforementioned telescope adjustment method.

[0032] In a fourth aspect, the present application provides a computer readable storage medium configured to save a computer program; wherein the computer program is executed by a processor to implement the aforementioned telescope adjustment method.

[0033] In the present application, an ideal wave surface diagram of a telescope to be assembled and adjusted at a target field point is obtained by optical simulation software, and a plurality of misadjustment amounts are added to the optical simulation software respectively to extract a plurality of misadjusted wave surface diagrams corresponding to the target field point; the plurality of misadjustment amounts are misadjustment amounts under different misadjustment amount dimensions; wave surface diagram sensitivities corresponding to the plurality of misadjustment amounts are determined according to the plurality of misadjustment amounts and the plurality of misadjusted wave surface diagrams, and the wave surface diagram sensitivities are combined to obtain a wave surface diagram sensitivity matrix; a measured wave surface diagram of the telescope to be assembled and adjusted at the target field point is collected by an interferometer, so as to determine wave surface diagram change amounts caused by the plurality of misadjustment amounts through the measured wave surface diagram and the ideal wave surface diagram; a relationship between a target misadjustment amount vector and the measured wave surface diagram is established based on the wave surface diagram change amounts and the wave surface diagram sensitivity matrix, so as to determine the target misadjustment amount vector, and an assembling and adjusting operation is performed on the telescope to be assembled and adjusted according to the target misadjustment amount vector. As can be seen from the above, in the present application, an ideal wave surface diagram of a telescope to be assembled and adjusted at a target field point is obtained by optical simulation software, a plurality of misadjustment amounts under different misadjustment amount dimensions are added and corresponding misadjusted wave surface diagrams are extracted, wave surface diagram sensitivities of the plurality of misadjustment amounts are determined according to the plurality of misadjustment amounts and the misadjusted wave surface diagrams, the wave surface diagram sensitivities are combined to obtain a wave surface diagram sensitivity matrix, a measured wave surface diagram of the target field point is collected by an interferometer, wave surface diagram change amounts caused by misadjustment amounts are determined in combination with the ideal wave surface diagram, a relationship between a target misadjustment amount vector and the measured wave surface diagram is established based on the wave surface diagram change amounts and the wave surface diagram sensitivity matrix, the target misadjustment amount vector is determined, and the telescope to be assembled and adjusted is adjusted accordingly. In this way, through the above process of the present application, assembling and adjusting are performed in combination with optical simulation and measured data, the correlation between misadjustment amounts and wave surface changes is quantified by constructing a sensitivity matrix, the wavefront measurement result is fully utilized, the actual misadjustment condition of the telescope is accurately positioned, and low efficiency or insufficient precision caused by blind assembling and adjusting is avoided; only the wavefront measurement result at the target field point is used to obtain a multi-dimensional misadjustment amount vector, the wave aberration detection result of each frequency band from a low-order to a high-order aberration coefficient (determined by the resolution of the interferometer) is fully utilized, and multiple fields are not needed, thereby reducing the cost and time of assembling and adjusting; assembling and adjusting operations are carried out based on the explicit target misadjustment amount vector, the optical performance of the telescope tends to be ideal, the precision and efficiency of assembling and adjusting are greatly improved, the imaging quality of the telescope is ensured, and the assembling and adjusting method of the telescope is optimized to improve the efficiency of assembling and adjusting of the telescope. BRIEF DESCRIPTION OF DRAWINGS

[0034] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, brief descriptions will be given to the drawings needed to be used in the embodiments or prior art descriptions. Obviously, the drawings in the following description are only embodiments of the present application, and other drawings can be obtained by those skilled in the art without any creative effort.

[0035] Figure 1 This is a flowchart of a telescope assembly and adjustment method disclosed in this application;

[0036] Figure 2 This is a schematic diagram of the timing process of a telescope assembly and adjustment method disclosed in this application;

[0037] Figure 3 This is a schematic diagram illustrating the solution of a target misalignment vector disclosed in this application;

[0038] Figure 4 This is a schematic diagram of the structure of a telescope assembly and adjustment device disclosed in this application;

[0039] Figure 5 This is a structural diagram of an electronic device disclosed in this application. Detailed Implementation

[0040] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0041] As the demands of astronomical observations continue to increase, telescope apertures are becoming larger to improve imaging resolution and detection sensitivity. However, with the increasing apertures, the difficulty of assembling and adjusting the optical systems also increases. The assembly and adjustment of large telescopes typically requires multiple rounds of adjustments using detection results from multiple fields of view, such as methods based on aberration coefficient sensitivity matrices. These methods are costly and inefficient.

[0042] To overcome the above-mentioned technical problems, this application provides a telescope assembly and adjustment method that can optimize the telescope assembly and adjustment method to improve the efficiency of telescope assembly and adjustment.

[0043] See Figure 1 As shown, an embodiment of the present invention discloses a telescope assembly and adjustment method, including:

[0044] Step S11: Obtain the ideal wavefront diagram of the telescope to be installed at the target field of view using optical simulation software, and add several misalignment values ​​to the optical simulation software to extract several misaligned wavefront diagrams at the target field of view; the several misalignment values ​​are misalignment values ​​under different misalignment dimensions.

[0045] In this embodiment, the ideal wavefront diagram of the telescope to be installed and adjusted under the designed state at the target field of view is obtained using optical simulation software, denoted as... Then, for the dimension of misalignment that needs to be solved, several misalignment quantities under different misalignment dimensions are added to the optical simulation software, thereby extracting several misaligned wavefront maps corresponding to the target field of view. It can be understood that the target field of view is consistent with the field of view corresponding to the wavefront aberration data used during actual assembly and adjustment. For example... Figure 2 The diagram shown is a flowchart of a telescope assembly and adjustment method provided in this application.

[0046] It should be noted that the processing flow for obtaining the several misaligned wavefront plots is as follows: Several misalignment dimensions are determined based on the optical system of the telescope to be installed, and the misalignment of the target misalignment dimension is added to the optical simulation software to extract the corresponding misaligned wavefront plot at the target field of view. The target misalignment dimension is any one of the several misalignment dimensions. Any misalignment dimension among the several misalignment dimensions that has not yet been added is determined as a new target misalignment dimension, and the process jumps to the step of adding the target misalignment dimension to the optical simulation software, until all several misalignment dimensions have been added, resulting in the corresponding several misaligned wavefront plots at the target field of view. That is, first, several misalignment dimensions are determined based on the optical system of the telescope to be installed, for example, the 6 degrees of freedom of the secondary mirror are used as misalignment, and the misalignment of any target misalignment dimension is added to the optical simulation software, denoted as... Extract the misaligned wavefront plot corresponding to the target field of view point, denoted as... Then, any dimension without added offset is set as the new target offset dimension, and the steps of adding offset and extracting wavefront plots are repeated until all offset dimensions are added, ultimately obtaining several offset wavefront plots at that field of view point. In this way, this embodiment, by simulating wavefront conditions under different offset states, can provide basic data for subsequent analysis of the correlation between offset and wavefront changes, avoiding the losses caused by repeated testing on a physical telescope. Simultaneously, it quickly obtains wavefront references under multiple offset scenarios, laying the groundwork for accurate determination of offset and subsequent assembly and adjustment work.

[0047] Step S12: Determine the wavefront plot sensitivity corresponding to each of the several misalignment quantities and the several misaligned wavefront plots, and combine the wavefront plot sensitivities to obtain a wavefront plot sensitivity matrix.

[0048] In this embodiment, based on the plurality of offset quantities and the corresponding plurality of offset wavefront plots, the wavefront plot sensitivity corresponding to each offset quantity is determined, and then the wavefront plot sensitivities are combined to finally obtain the wavefront plot sensitivity matrix.

[0049] It should be noted that the process for determining the wavefront sensitivity corresponding to each of the several misalignments and the several misaligned wavefront plots is as follows: The quotient between each of the several misaligned wavefront plots and its corresponding misalignment is determined, and this quotient is used as the wavefront sensitivity corresponding to each of the several misalignments. That is, for each misalignment and its corresponding misaligned wavefront plot, the quotient is calculated, and this quotient is the wavefront sensitivity corresponding to the misalignment. The specific formula for calculating the wavefront sensitivity is as follows:

[0050] ;

[0051] in, The wavefront plot sensitivity is characterized by the i-th misalignment. Characterizes the i-th imbalance quantity; The offset wavefront plot represents the i-th offset quantity. It should be further noted that the process of combining the wavefront plot sensitivities to obtain the wavefront plot sensitivity matrix is ​​as follows: the wavefront plot sensitivities are horizontally concatenated to obtain corresponding vector combinations, and these vector combinations are determined as the wavefront plot sensitivity matrix. That is, the wavefront plot sensitivities corresponding to each offset quantity are horizontally concatenated to form vector combinations, and these vector combinations are the wavefront plot sensitivity matrix. The specific formula for determining the wavefront plot sensitivity matrix is ​​as follows:

[0052] ;

[0053] in, This is the wavefront sensitivity matrix; This represents the wavefront sensitivity corresponding to the nth offset; n is the number of offsets. In this way, this embodiment constructs a system sensitivity matrix by quantifying the correlation between offsets and wavefront changes using quotient values. This provides a basis for establishing the correspondence between offsets and measured wavefronts, making subsequent offset calculations more accurate and avoiding assembly deviations caused by a lack of quantified correlation. The horizontally spliced ​​combination method yields the wavefront sensitivity matrix, which can systematically integrate the sensitivity data of all offsets, making the matrix structure clearly correspond to the correlation between each offset dimension and wavefront changes, ensuring a smooth subsequent calculation process and accurate results.

[0054] Step S13: Use an interferometer to acquire the measured wavefront diagram of the telescope to be adjusted at the target field of view, so as to determine the wavefront diagram change caused by the several misalignments through the measured wavefront diagram and the ideal wavefront diagram.

[0055] In this embodiment, an interferometer is used to acquire the measured wavefront plot of the telescope to be adjusted at the target field of view, that is, the wavefront plot under the current misalignment condition, denoted as . Then, by comparing the measured wavefront diagram with the ideal wavefront diagram, the amount of change in the wavefront diagram caused by the several misalignments is determined.

[0056] It should be noted that the process for determining the wavefront pattern change caused by the several misalignments using the measured wavefront pattern and the ideal wavefront pattern is as follows: The difference between the measured wavefront pattern and the ideal wavefront pattern is determined, and this difference is defined as the wavefront pattern change caused by the several misalignments. That is, the difference between the measured wavefront pattern and the ideal wavefront pattern is calculated; this difference represents the change in the measured wavefront pattern relative to the initial design caused by the several misalignments. The specific formula for calculating the wavefront pattern change is as follows:

[0057] ;

[0058] in, This represents the change in the wavefront diagram. In this way, this embodiment compares the measured wavefront diagram with the ideal one, directly taking the difference between the two. This accurately captures the wavefront difference caused by misalignment, providing measured data for subsequent derivation of the target misalignment. It avoids the impact of theoretical and practical deviations on the alignment accuracy, ensuring the accuracy and efficiency of subsequent misalignment calculations and guaranteeing the accuracy of telescope alignment.

[0059] Step S14: Based on the wavefront pattern change and the wavefront pattern sensitivity matrix, establish the relationship between the target misalignment vector and the measured wavefront pattern to determine the target misalignment vector, and perform the adjustment operation on the telescope to be adjusted according to the target misalignment vector.

[0060] In this embodiment, based on the wavefront pattern change and the wavefront pattern sensitivity matrix, a correlation relationship is established between the target misalignment vector and the measured wavefront pattern (applicable only to wavefront patterns with a single field of view). Then, the target misalignment vector is determined, and the telescope to be adjusted is adjusted according to the target misalignment vector.

[0061] It should be noted that the process for determining the target offset vector is as follows: the product of the target offset vector and the wavefront pattern sensitivity matrix is ​​used to determine the wavefront pattern change, thereby establishing the relationship between the target offset vector and the measured wavefront pattern. The target offset vector is then determined using the least squares method. In other words, the product of the target offset vector and the wavefront pattern sensitivity matrix is ​​set to equal the wavefront pattern change, thus establishing the relationship between the target offset vector and the measured wavefront pattern. The specific expression for this relationship is as follows:

[0062] ;

[0063] in, The target misalignment vector to be determined is represented. After determining the relationship, the target misalignment vector is obtained by solving the least squares method. The following is the derivation process of the expression for the relationship between the target misalignment vector and the measured wavefront plot:

[0064] In traditional models based on aberration coefficient sensitivity matrices, for a single misalignment... ,have:

[0065] ;

[0066] in, The sensitivity coefficient characterizing the Zernike polynomial coefficient of the i-th term. This represents the difference in Zernike coefficients before and after the misalignment, where n is the number of Zernike coefficients. Multiplying both sides by the corresponding Zernike polynomial, it can be rewritten as:

[0067] ;

[0068] in, Let represent the i-th Zernike polynomial. Then, summing both sides of the equation over all terms yields:

[0069] ;

[0070] in, This is the wavefront diagram sensitivity matrix. This is a difference diagram of the wavefronts before and after the misalignment. Extending this to all misalignments that need to be solved, let... , Then we can get:

[0071] ;

[0072] Summing the above equations, we get:

[0073] ;

[0074] in, This indicates that the j-th imbalance needs to be solved. This represents the wavefront sensitivity map corresponding to each misalignment, also known as the wavefront sensitivity map. This represents the difference in wavefronts before and after all misalignments. The above formula can be rewritten as:

[0075] ;

[0076] The above formula can be further rewritten as:

[0077] ;

[0078] That is, the relationship between the derived target misalignment vector and the measured wavefront plot. Where K, X, ... The specific formulas for each are as follows:

[0079] ;

[0080] ;

[0081] ;

[0082] like Figure 3 The diagram illustrates the solution for the target misalignment vector provided in this application. It should be further noted that the process for determining the target misalignment vector using the least squares method is as follows: A left pseudo-inverse operation is performed on the wavefront pattern sensitivity matrix to obtain the corresponding operation result; the product of the operation result and the wavefront pattern change is determined as the target misalignment vector. That is, first, a left pseudo-inverse operation is performed on the wavefront pattern sensitivity matrix to obtain the corresponding operation result; then, the operation result is multiplied by the wavefront pattern change, and the resulting product is the target misalignment vector. The specific formula for solving the target misalignment vector using the least squares method is as follows:

[0083] ;

[0084] in, Characterized by the inversion of the wavefront pattern sensitivity matrix; Characterizes the operation of finding the inverse matrix; The result of the operation is described above.

[0085] In this way, this embodiment establishes a correlation by quantifying the matrix product of data and solves it using the least squares method, which can accurately pinpoint the actual misalignment of the telescope, avoid the problem of solving due to matrix invertibility, effectively reduce the impact of measurement errors, and make the assembly and adjustment operation more targeted. By performing the assembly and adjustment based on a clear target misalignment vector, the optical system deviation can be efficiently corrected, the imaging accuracy of the telescope can be rapidly improved, and the accuracy of the assembly and adjustment operation and its optical performance at the target field of view can be guaranteed.

[0086] As can be seen from the above, the embodiments of this application obtain the ideal wavefront map of the target field of view of the telescope to be assembled and adjusted using optical simulation software, add several offset quantities under different offset dimensions and extract the corresponding offset wavefront maps, determine the wavefront map sensitivity of each offset quantity based on the several offset quantities and the offset wavefront maps, combine the wavefront map sensitivities to obtain the wavefront map sensitivity matrix, use an interferometer to acquire the measured wavefront map of the target field of view, determine the wavefront map change caused by the offset quantity in combination with the ideal wavefront map, establish the relationship between the target offset vector and the measured wavefront map based on the wavefront map change and the wavefront map sensitivity matrix, determine the target offset vector, and then assemble and adjust the telescope to be assembled and adjusted accordingly. In this way, through the above-described process of the embodiments of this application, combining optical simulation and measured data for assembly and adjustment, the correlation between the misalignment and wavefront changes is quantified by constructing a sensitivity matrix. By fully utilizing the wavefront measurement results, the actual misalignment of the telescope can be accurately located, avoiding the inefficiency or insufficient accuracy caused by blind assembly and adjustment. The multi-dimensional misalignment vector can be obtained using only the wavefront measurement results at the target field of view. The detection results of wavefront aberrations in each frequency band (determined by the interferometer resolution) from low-order to high-order aberration coefficients are fully utilized, eliminating the need for multiple fields of view and reducing the cost and time of assembly and adjustment. The assembly and adjustment operation is carried out based on a clear target misalignment vector, allowing the optical performance of the telescope to approach the ideal state, greatly improving the accuracy and efficiency of assembly and adjustment, ensuring the imaging quality of the telescope, and thus optimizing the telescope assembly and adjustment method to improve the efficiency of telescope assembly and adjustment.

[0087] Accordingly, see Figure 4 As shown in the figure, this application embodiment also provides a telescope adjustment device, including:

[0088] The offset addition module 11 is used to obtain the ideal wavefront diagram of the telescope to be adjusted at the target field of view through optical simulation software, and add several offsets to the optical simulation software to extract several offset wavefront diagrams at the target field of view; the several offsets are offsets under different offset dimensions.

[0089] Sensitivity combination module 12 is used to determine the wavefront pattern sensitivity corresponding to each of the plurality of offset quantities and the plurality of offset wavefront patterns, and to combine the wavefront pattern sensitivities to obtain a wavefront pattern sensitivity matrix.

[0090] The wavefront acquisition module 13 is used to acquire the measured wavefront map of the telescope to be adjusted at the target field of view using an interferometer, so as to determine the wavefront map change caused by the several misalignments through the measured wavefront map and the ideal wavefront map;

[0091] The telescope assembly and adjustment module 14 is used to establish the relationship between the target misalignment vector and the measured wavefront based on the wavefront pattern change and the wavefront pattern sensitivity matrix, so as to determine the target misalignment vector, and to perform assembly and adjustment operations on the telescope to be assembled and adjusted according to the target misalignment vector.

[0092] In some specific embodiments, the misalignment addition module 11 may specifically include:

[0093] The offset input unit is used to determine several offset dimensions based on the optical system of the telescope to be installed and to add the offset of the target offset dimension to the optical simulation software in order to extract the corresponding offset wavefront plot at the target field of view; the target offset dimension is any one of the several offset dimensions.

[0094] The step jump unit is used to determine any one of the several offset dimensions that has not been added as a new target offset dimension, and jump to the step of adding the offset of the target offset dimension to the optical simulation software, until all the several offset dimensions have been added, and obtain several offset wavefront maps at the target field of view.

[0095] In some specific embodiments, the sensitivity combination module 12 may specifically include:

[0096] The quotient determination unit is used to determine the quotient between the plurality of misaligned wavefront plots and their respective corresponding misalignment amounts, so as to determine the quotient as the wavefront plot sensitivity corresponding to each of the plurality of misalignment amounts.

[0097] In some specific embodiments, the sensitivity combination module 12 may specifically include:

[0098] The matrix determination unit is used to horizontally stitch the wavefront pattern sensitivities to obtain corresponding vector combinations, and to determine the vector combinations as the wavefront pattern sensitivity matrix.

[0099] In some specific embodiments, the wavefront acquisition module 13 may specifically include:

[0100] The change determination unit is used to determine the difference between the measured wavefront pattern and the ideal wavefront pattern, and to determine the difference as the change in the wavefront pattern caused by the plurality of misalignments.

[0101] In some specific embodiments, the telescope adjustment module 14 may specifically include:

[0102] The vector determination submodule is used to determine the change in the wavefront pattern by multiplying the target offset vector with the wavefront pattern sensitivity matrix, so as to establish the relationship between the target offset vector and the measured wavefront pattern, and to determine the target offset vector using the least squares method.

[0103] In some specific implementations, the vector determination submodule may specifically include:

[0104] The matrix pseudo-inverse unit is used to perform a left pseudo-inverse operation on the wavefront pattern sensitivity matrix to obtain the corresponding operation result;

[0105] A vector determination unit is used to determine the target misalignment vector by multiplying the operation result with the wavefront plot change.

[0106] Furthermore, embodiments of this application also disclose an electronic device, Figure 5 This is a structural diagram of an electronic device 20 according to an exemplary embodiment. The content of the diagram should not be construed as limiting the scope of this application. Specifically, the electronic device 20 may include: at least one processor 21, at least one memory 22, a power supply 23, a communication interface 24, an input / output interface 25, and a communication bus 26. The memory 22 stores a computer program, which is loaded and executed by the processor 21 to implement the relevant steps in the telescope assembly and adjustment method disclosed in any of the foregoing embodiments. Furthermore, the electronic device 20 in this embodiment may specifically be an electronic computer.

[0107] In this embodiment, the power supply 23 is used to provide operating voltage for each hardware device on the electronic device 20; the communication interface 24 can create a data transmission channel between the electronic device 20 and external devices, and the communication protocol it follows can be any communication protocol applicable to the technical solution of this application, and is not specifically limited here; the input / output interface 25 is used to acquire external input data or output data to the outside world, and its specific interface type can be selected according to specific application needs, and is not specifically limited here.

[0108] In addition, the memory 22, as a carrier for resource storage, can be a read-only memory, random access memory, disk or optical disk, etc. The resources stored thereon can include operating system 221, computer program 222, etc., and the storage method can be temporary storage or permanent storage.

[0109] The operating system 221 is used to manage and control the various hardware devices on the electronic device 20 and the computer program 222, which may be Windows Server, Netware, Unix, Linux, etc. In addition to including a computer program capable of performing the telescope adjustment method executed by the electronic device 20 as disclosed in any of the foregoing embodiments, the computer program 222 may further include computer programs capable of performing other specific tasks.

[0110] Furthermore, this application also discloses a computer-readable storage medium for storing a computer program; wherein, when the computer program is executed by a processor, it implements the aforementioned telescope adjustment method. Specific steps of this method can be found in the corresponding content disclosed in the foregoing embodiments, and will not be repeated here.

[0111] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on its differences from other embodiments. Similar or identical parts between embodiments can be referred to interchangeably. For the apparatus disclosed in the embodiments, since it corresponds to the method disclosed in the embodiments, the description is relatively simple; relevant parts can be referred to in the method section.

[0112] Those skilled in the art will further recognize that the units and algorithm steps of the various examples described in conjunction with the embodiments disclosed herein can be implemented in electronic hardware, computer software, or a combination of both. To clearly illustrate the interchangeability of hardware and software, the components and steps of the various examples have been generally described in terms of functionality in the foregoing description. Whether these functions are implemented in hardware or software depends on the specific application and design constraints of the technical solution. Those skilled in the art can use different methods to implement the described functions for each specific application, but such implementation should not be considered beyond the scope of this application.

[0113] The steps of the methods or algorithms described in conjunction with the embodiments disclosed herein can be implemented directly by hardware, a software module executed by a processor, or a combination of both. The software module can be located in random access memory (RAM), main memory, read-only memory (ROM), electrically programmable ROM, electrically erasable programmable ROM, registers, hard disk, removable disk, CD-ROM, or any other form of storage medium known in the art.

[0114] Finally, it should be noted that in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0115] The technical solutions provided in this application have been described in detail above. Specific examples have been used to illustrate the principles and implementation methods of this application. The descriptions of the above embodiments are only for the purpose of helping to understand the methods and core ideas of this application. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of this application. Therefore, the content of this specification should not be construed as a limitation of this application.

Claims

1. A method for assembling and adjusting a telescope, characterized in that, include: The ideal wavefront diagram of the telescope to be adjusted at the target field of view is obtained by optical simulation software, and several misalignment values ​​are added to the optical simulation software to extract several misaligned wavefront diagrams at the target field of view; the several misalignment values ​​are misalignment values ​​under different misalignment dimensions; Based on the aforementioned offset quantities and the aforementioned offset wavefront plots, the wavefront plot sensitivities corresponding to each of the aforementioned offset quantities are determined, and the wavefront plot sensitivities are combined to obtain a wavefront plot sensitivity matrix. An interferometer is used to acquire the measured wavefront plot of the telescope to be adjusted at the target field of view, so as to determine the wavefront plot changes caused by the several misalignments by means of the measured wavefront plot and the ideal wavefront plot. Based on the wavefront pattern change and the wavefront pattern sensitivity matrix, a relationship is established between the target misalignment vector and the measured wavefront pattern to determine the target misalignment vector, and the telescope to be adjusted is adjusted according to the target misalignment vector.

2. The telescope assembly and adjustment method according to claim 1, characterized in that, The step of adding several offset values ​​to the optical simulation software to extract several offset wavefront maps at the target field of view includes: Based on the optical system of the telescope to be installed and adjusted, several misalignment dimensions are determined, and the misalignment of the target misalignment dimension is added to the optical simulation software to extract the corresponding post-misalignment wavefront plot at the target field of view; the target misalignment dimension is any one of the several misalignment dimensions. Any offset dimension that has not been added to the offset dimension among the several offset dimension is determined as the new target offset dimension, and the process jumps to the step of adding the offset of the target offset dimension to the optical simulation software, until all the several offset dimensions are added, and the corresponding several offset wavefront maps at the target field of view are obtained.

3. The telescope assembly and adjustment method according to claim 1, characterized in that, The step of determining the wavefront plot sensitivity corresponding to each of the plurality of offset quantities and the plurality of offset wavefront plots includes: The quotient between the several misaligned wavefront plots and their respective corresponding misalignment amounts is determined, and the quotient is used as the wavefront plot sensitivity corresponding to each of the several misalignment amounts.

4. The telescope assembly and adjustment method according to claim 1, characterized in that, The process of combining the wavefront pattern sensitivities to obtain a wavefront pattern sensitivity matrix includes: The wavefront plot sensitivities are horizontally spliced ​​to obtain corresponding vector combinations, and these vector combinations are determined as the wavefront plot sensitivity matrix.

5. The telescope assembly and adjustment method according to claim 1, characterized in that, The determination of the wavefront plot changes caused by the plurality of misalignments using the measured wavefront plot and the ideal wavefront plot includes: The difference between the measured wavefront plot and the ideal wavefront plot is determined, and the difference is defined as the change in wavefront plot caused by the plurality of misalignments.

6. The telescope assembly and adjustment method according to any one of claims 1 to 5, characterized in that, The step of establishing the relationship between the target misalignment vector and the measured wavefront pattern based on the wavefront pattern change and the wavefront pattern sensitivity matrix, in order to determine the target misalignment vector, includes: The product of the target offset vector and the wavefront pattern sensitivity matrix is ​​determined as the wavefront pattern change, so as to establish the relationship between the target offset vector and the measured wavefront pattern, and the target offset vector is determined by the least squares method.

7. The telescope assembly and adjustment method according to claim 6, characterized in that, The determination of the target misalignment vector using the least squares method includes: Perform a left pseudo-inverse operation on the wavefront pattern sensitivity matrix to obtain the corresponding operation result; The product of the operation result and the wavefront plot change is determined as the target misalignment vector.

8. A telescope adjustment device, characterized in that, include: The offset addition module is used to obtain the ideal wavefront diagram of the telescope to be adjusted at the target field of view through optical simulation software, and add several offsets to the optical simulation software to extract several offset wavefront diagrams at the target field of view; the several offsets are offsets under different offset dimensions; The sensitivity combination module is used to determine the wavefront pattern sensitivity corresponding to each of the several offset quantities and the several offset wavefront patterns, and to combine the wavefront pattern sensitivities to obtain a wavefront pattern sensitivity matrix. The wavefront acquisition module is used to acquire the measured wavefront map of the telescope to be adjusted at the target field of view using an interferometer, so as to determine the wavefront map changes caused by the several misalignments through the measured wavefront map and the ideal wavefront map; The telescope assembly and adjustment module is used to establish the relationship between the target misalignment vector and the measured wavefront image based on the wavefront image change and the wavefront image sensitivity matrix, so as to determine the target misalignment vector, and to perform assembly and adjustment operations on the telescope to be assembled and adjusted according to the target misalignment vector.

9. An electronic device, characterized in that, include: Memory, used to store computer programs; A processor for executing the computer program to implement the telescope adjustment method as described in any one of claims 1 to 7.

10. A computer-readable storage medium, characterized in that, Used to store a computer program; wherein, when the computer program is executed by a processor, it implements the telescope adjustment method as described in any one of claims 1 to 7.

Images