Objective lens device for electron beam system and electron beam system

Abstract

The invention discloses an objective lens device for an electron beam system and the electron beam system. The objective lens device comprises an objective lens body and at least two objective lens electrodes which are arranged around the outer side of an objective lens pole shoe of the objective lens body, are uniformly distributed in a circumferential array with an electron detector in the electron beam system, and are configured to cooperate with a second voltage of the electron detector when a first voltage is synchronously applied, and the signal electrons in the whole circumferential direction are regulated to move towards the target detection direction. By using the scheme of the invention, the signal electrons in the full circumferential direction can be accurately guided, the detection efficiency of the detector is effectively improved, and the system semaphore and the imaging quality are enhanced.

Description

Technical Field

[0001] This application relates to the general field of electronic detection technology. More specifically, this application relates to an objective lens device and an electron beam system for use in an electron beam system. Background Technology

[0002] In modern scientific research and industrial testing, electron beam systems or scanning electron microscopes are widely used in scenarios such as sample morphology observation and composition analysis. The realization of their core functions depends on the efficient detection of signal electrons. Signal electrons (such as secondary electrons and backscattered electrons) are key information carriers generated after the electron beam bombards the sample surface. By capturing, transmitting, and analyzing these signal electrons, the microscopic features and material composition of the sample can be reconstructed. Therefore, the detection efficiency of signal electrons directly determines the upper limit of the entire system's performance.

[0003] However, current electron detectors in electron beam systems can only attract signal electrons through the electric field of the front-end grid, making it difficult to capture signal electrons distributed throughout the entire circumference, resulting in a large number of electrons escaping. Alternatively, they can only acquire a small number of high-angle signal electrons, leading to insufficient signal quantity. Both of these situations result in low system signal-to-noise ratio and poor image resolution, failing to meet the requirements for high-precision analysis.

[0004] In view of this, this application provides an objective lens device scheme for an electron beam system, so as to accurately guide the signal electrons in the full circumferential direction, effectively improve the detection efficiency of the detector, and enhance the system signal quantity and imaging quality. Summary of the Invention

[0005] In order to at least solve one or more of the technical problems mentioned above, this application proposes an objective lens device scheme for an electron beam system in several aspects.

[0006] In a first aspect, this application provides an objective lens device for an electron beam system, comprising: an objective lens body, at least two objective lens electrodes arranged around the outer side of the objective lens pole piece of the objective lens body, uniformly distributed in a circumferential array with an electron detector in the electron beam system, and configured to, when a first voltage is synchronously applied, cooperate with a second voltage of the electron detector to control the movement of signal electrons in the entire circumferential direction toward the target detection direction.

[0007] In some embodiments, each of the objective electrodes is secured to the outer periphery of the objective pole shoe of the objective body via a corresponding insulating bracket.

[0008] In some embodiments, the insulating connecting frame includes a first connector and a second connector. The first connector is fixed to the outer wall of the objective lens body. One end of the second connector is connected to the first connector, and the other end of the second connector is connected to the objective electrode to fix the objective electrode around the outer side of the objective electrode shoe of the objective lens body.

[0009] In some embodiments, the fixing method of the first connector and the connection method of the second connector both include one or more of screws, adhesive, or slots.

[0010] In some embodiments, the shape of the objective electrode is adapted to the outer contour of the objective lens body or is rectangular, and the height of the objective electrode does not exceed the lower end face of the objective lens body.

[0011] In some embodiments, the target detection direction is external detection, and the objective electrode is configured to be synchronously applied a first negative voltage, which, in conjunction with a second positive voltage of the electron detector, controls the movement of signal electrons along the entire circumferential direction toward the electron detector.

[0012] In some embodiments, where the target detection direction is in-lens detection, the objective electrode is configured to be synchronously applied a first negative voltage, which, in conjunction with a second negative voltage of the electron detector, regulates the movement of signal electrons in the entire circumferential direction into the objective body.

[0013] In some embodiments, the voltage range of the first voltage is -200V to 0V, and the voltage range of the second voltage is -200V to 500V.

[0014] In a second aspect, this application provides an electron beam system, comprising at least: an objective lens device as described in one or more embodiments of the first aspect; and an electron detector arranged outside the objective pole piece of the objective lens body in the objective lens device, and uniformly distributed in a circumferential array with the objective electrodes in the objective lens device.

[0015] In some embodiments, the target detection direction of the electron beam system is external detection, the objective lens electrode is synchronously applied a first negative voltage, and the electron detector is applied a second positive voltage, which cooperate to control the movement of signal electrons in the entire circumferential direction toward the electron detector.

[0016] In some embodiments, the target detection direction of the electron beam system is in-mirror detection, the objective lens electrode is synchronously applied a first negative voltage, and the electron detector is applied a second negative voltage, which cooperate to control the movement of signal electrons in the entire circumferential direction into the objective lens body.

[0017] The objective lens device scheme for the electron beam system provided above solves the problems of incomplete signal electron capture and low detection efficiency in the prior art by adding objective lens electrodes arranged in a circumferential array with the electron detector on the outside of the objective lens pole piece and cooperating with differential voltage control. This effectively improves the signal-to-noise ratio, imaging clarity and analysis accuracy of the electron beam system, while having the advantages of strong structural compatibility and flexible control, and can be adapted to different types of signal electron detectors. Attached Figure Description

[0018] The above and other objects, features, and advantages of exemplary embodiments of this application will become readily understood by reading the following detailed description with reference to the accompanying drawings. In the drawings, several embodiments of this application are illustrated by way of example and not limitation, and the same or corresponding reference numerals denote the same or corresponding parts, wherein: Figure 1 An exemplary schematic diagram of the signal electron emission trajectory is shown; Figure 2 This is an exemplary structural block diagram illustrating an objective lens device 200 for an electron beam system according to an embodiment of this application; Figure 3 This is an exemplary schematic diagram illustrating an objective lens device for an electron beam system according to an embodiment of this application; Figure 4 This is an exemplary schematic diagram illustrating external detection according to an embodiment of this application; Figure 5 This is an exemplary schematic diagram illustrating intramural detection according to an embodiment of this application; Figure 6 This is an exemplary structural block diagram illustrating an electron beam system 600 according to an embodiment of this application; Figure 7 This is an exemplary schematic diagram illustrating an electron beam system according to an embodiment of this application. Detailed Implementation

[0019] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this application. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0020] It should be understood that the terms "comprising" and "including" used in the specification and claims of this application indicate the presence of the described features, integrals, steps, operations, elements and / or components, but do not exclude the presence or addition of one or more other features, integrals, steps, operations, elements, components and / or collections thereof.

[0021] It should also be understood that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the application. As used in this specification and claims, the singular forms “a,” “an,” and “the” are intended to include the plural forms unless the context clearly indicates otherwise. It should also be understood that the term “and / or” as used in this specification and claims refers to any combination and all possible combinations of one or more of the associated listed items, and includes such combinations.

[0022] As used in this specification and claims, the term "if" may be interpreted, depending on the context, as "when," "once," "in response to determination," or "in response to detection." Similarly, the phrase "if determined" or "if [described condition or event] is detected" may be interpreted, depending on the context, as "once determined," "in response to determination," "once [described condition or event] is detected," or "in response to detection of [described condition or event]."

[0023] A signal detector is a device used to detect various electronic signals. As the front-end device in the entire detection system, the detection efficiency of the signal detector determines the amount of signal received at the front end of the system. Therefore, the detection efficiency of the signal detector has a significant impact on the signal-to-noise ratio and resolution of the entire system. Common types include ET-type detectors, PN-type detectors, and MCP detectors.

[0024] It's important to understand that an electron beam system or scanning electron microscope typically contains more than a single detector. To meet various application requirements, an electron beam system often employs two or more signal electron detectors. Examples include the ET electron detector located below the objective lens and an electron detector within the microscope tube. In practical applications, when the electron beam is emitted from the tip, it is focused and deflected by a series of electron optics devices before striking the sample surface. Within the sample, the electron beam undergoes a series of elastic or inelastic scattering events, exciting secondary electrons, backscattered electrons, and other signal electrons. These signal electrons 102 are emitted from the sample surface 101 in a cosine distribution, for example... Figure 1 An exemplary schematic diagram of the signal electron emission trajectory is shown.

[0025] Taking an ET (Electronic Tolerancing) detector as an example, it is typically designed to be located on one side of the objective lens to detect signal electrons emitted from the sample surface below the objective lens. In applications, an ET detector includes at least a grid, a scintillator, and a photomultiplier tube, with the grid at the very front of the detector, the part closest to the sample stage and objective lens. During operation, a positive voltage is usually applied to the grid to attract negatively charged signal electrons, increasing the number of electrons detected. However, signal electrons follow a cosine distribution and are uniformly distributed across a 360-degree azimuth. Applying a positive voltage to the grid primarily enhances the absorption of signal electrons closer to the ET detector. The attraction is weaker in other directions, especially those opposite the detector, causing many electrons to escape or collide with the inner walls of the device and fail to be effectively captured.

[0026] In addition to the detectors located near the objective lens, there are also detectors designed inside the microscope tube. These in-tube detectors detect signal electrons emitted from the sample stage that enter the tube. Only high-angle signal electrons can enter the tube, while low-angle electrons cannot be utilized due to radial diffusion, resulting in a very low percentage of detected signal electrons. Both of these situations lead to low system signal-to-noise ratio and poor image resolution, failing to meet the requirements for high-precision analysis.

[0027] Based on this, this application provides an objective lens device for an electron beam system. By adding objective lens electrodes arranged in a circumferential array with the electron detector on the outside of the objective lens pole piece, and cooperating with differentiated voltage control, it is possible to achieve precise guidance of signal electrons in the entire circumferential direction, effectively increase the number of signal electrons, improve the detection efficiency of the detector, and enhance the system signal quantity and imaging quality.

[0028] The specific embodiments of this application will now be described in detail with reference to the accompanying drawings.

[0029] Figure 2 This is an exemplary structural block diagram illustrating an objective lens device 200 for an electron beam system according to an embodiment of this application. Figure 2 As shown, the objective lens device 100 may include an objective lens body 201 and at least two objective lens electrodes 202. The at least two objective lens electrodes 202 are arranged around the outer periphery of the objective lens pole piece of the objective lens body, uniformly distributed in a circular array with the electron detector in the electron beam system, and configured to, when a first voltage is synchronously applied, cooperate with a second voltage of the electron detector to control the movement of signal electrons along the entire circumferential direction toward the target detection direction.

[0030] As can be understood, the objective lens body 201 is the core optical component in the electron beam system used to focus the electron beam. The objective lens pole piece at its lower end is a critical area near the sample stage, directly affecting the focusing accuracy of the electron beam and the trajectory of the signal electrons. In the actual implementation scenario, the objective lens pole piece is annular, and its lower end face maintains a preset working distance from the sample stage to ensure that the electron beam can accurately bombard the sample surface after focusing.

[0031] The objective electrode 202 is a conductive component added in this embodiment of the application. It is used to generate an electric field to control the movement of signal electrons. Its material can be a metal with excellent conductivity, such as copper, aluminum, or stainless steel, to ensure stable electric field strength. At least two objective electrodes 202 are provided, evenly distributed in a circular array with the electron detector in the electron beam system. Preferably, three objective electrodes 202 are provided. In this scenario, the electron detector in the electron beam system (e.g., an ET-type detector) is arranged in one position on the outside of the objective electrode shoe, and the three objective electrodes cover the other three positions respectively, evenly distributed in a circular array to achieve full circumferential coverage, laying the foundation for full-angle control.

[0032] During operation, the objective lens electrodes are configured to simultaneously apply a first voltage, while the electron detector's grid (such as the front-end grid of an ET-type detector) applies a second voltage, creating a synergistic electric field. By adjusting the polarities of the first and second voltages, the direction and intensity of the electric field can be altered, thereby guiding signal electrons toward the target detection direction. This voltage-synergistic mode overcomes the limitations of relying solely on the detector's own voltage application (which has a limited adjustment range), enabling finer control of the electric field and improving detection efficiency.

[0033] In some embodiments, each objective electrode is secured to the outer periphery of the objective pole shoe of the objective body via a corresponding insulating connector. In some embodiments, the insulating connector includes a first connector and a second connector, the first connector being secured to the outer wall of the objective body, one end of the second connector being connected to the first connector, and the other end of the second connector being connected to the objective electrode, thereby securing the objective electrode to the outer periphery of the objective pole shoe of the objective body.

[0034] An insulating connector is a component used to mechanically fix and electrically isolate the objective lens electrodes from the objective lens body. It can be made of insulating materials such as ceramic, polytetrafluoroethylene (PTFE), or epoxy resin to prevent electric field disturbances caused by electrical conduction between the electrodes and the objective lens. In some implementations, the first and second connectors of the insulating connector can be integrally molded or detachable.

[0035] In other implementation scenarios, the first connector can be an arc-shaped plate structure that fits the outer contour of the objective lens body to ensure a close and fixed fit. The second connector is a columnar or sheet-like structure, with one end fixedly connected to the first connector and the other end fixed to the back of the objective lens electrode, allowing the objective lens electrode to be suspended outside the objective lens pole piece without affecting the transmission path of the electron beam.

[0036] In some embodiments, the fixing method of the first connector and the connection method of the second connector both include one or more of screws, adhesive, or slots. That is, the fixing method of the first connector to the objective lens body can be, for example, but not limited to, one or more of screws, adhesive, or slots. The connection method between the second connector and the first connector and the objective lens electrode can be, for example, but not limited to, one or more of screws, adhesive, or slots. The design of multiple fixing methods ensures the stability and flexibility of electrode installation, adapting to different equipment assembly requirements.

[0037] In some embodiments, the shape of the objective electrode is adapted to the outer contour of the objective lens body or is rectangular, and the height of the objective electrode does not exceed the lower end face of the objective lens body. The shape of the objective electrode is perfectly adapted to the outer contour of the objective lens pole piece, and is arc-shaped with a radius of curvature consistent with the objective lens pole piece, ensuring uniform distance between the electrode and the objective lens pole piece, and guaranteeing electric field uniformity. Uneven distance is avoided, as it leads to an unbalanced distribution of electric field intensity, with some areas having excessively strong control force and others having excessively weak force, making it impossible to achieve uniform control around the entire circumference.

[0038] The lower end face of the objective electrode does not exceed the lower end face of the objective lens body; that is, the electrode as a whole is located above the objective lens pole piece. This prevents the electrode from blocking the focusing path of the electron beam and ensures that the electric field generated by the electrode covers the signal electron emission area above the sample stage, thus achieving effective control of the signal electrons.

[0039] Figure 3 This is an exemplary schematic diagram illustrating an objective lens device for an electron beam system according to an embodiment of this application. It should be understood that... Figure 3 The above Figure 2 One specific embodiment of the objective lens device 200, therefore the above regarding Figure 2 The description also applies to Figure 3 .

[0040] like Figure 3The figure shows a right view of the objective lens assembly, which includes an objective lens body 201 and three objective lenses 202. The three objective lenses 202 are arranged around the outer periphery of the objective lens pole piece of the objective lens body, forming a uniform circular array with the electron detector in the electron beam system. Each objective lens 202 is connected to a corresponding insulating connector 301. The figure shows that the insulating connector 301 includes a first connector 301-1 and a second connector 301-2. As previously described, the first connector 301-1 is fixed to the outer wall of the objective lens body, and one end of the second connector 301-2 is fixedly connected to the first connector, while the other end is fixed to the back of the objective lens 202. Furthermore, the position of the objective lens 202 does not exceed the lower end face of the objective lens body 201.

[0041] In the implementation scenario, by simultaneously applying a first voltage to the objective lens electrodes and a second voltage to the electron detector in the electron beam system, combined with differentiated voltage control, precise guidance of signal electrons in the entire circumferential direction is achieved, effectively increasing the number of signal electrons, improving the detector's detection efficiency, and enhancing the system's signal quantity and imaging quality. In some embodiments, the voltage range of the first voltage can be -200V to 0V, and the voltage range of the second voltage can be -200V to 500V.

[0042] In some embodiments, where the target detection direction is external detection, the objective lens electrodes are configured to be simultaneously subjected to a first negative voltage, which, in conjunction with a second positive voltage on the electron detector, modulates the movement of signal electrons along the entire circumferential direction toward the electron detector. That is, for a scenario where the detector is positioned below and outside the objective lens pole piece, a negative voltage (e.g., -100V) is simultaneously applied to the objective lens electrodes, and a positive voltage (e.g., 450V) is applied to the grid of the electron detector to precisely guide signal electrons from all directions toward the external electron detector.

[0043] Specifically, the electron beam is emitted from the tip of the lens and, after being focused and deflected by a series of electron optical devices, precisely bombards the sample surface. Elastic and inelastic scattering occurs within the sample, exciting secondary electrons and backscattered electrons, which are emitted from the sample surface in a uniform 360-degree cosine distribution. When the negative voltage of the objective electrode generates a radially outward repulsive electric field, the negatively charged signal electrons are repelled by this field, thus inhibiting their diffusion towards the three electrodes and preventing them from escaping or colliding with the inner walls of the device. The positive voltage of the electron detector grid generates an attractive electric field pointing towards the detector. Under the combined effect of repulsive and attractive forces, the trajectory of the signal electrons is deflected, changing from a 360-degree divergent distribution to a convergence towards the detector. For example, electrons initially emitted towards the detector change direction under the repulsive force of the electrodes and are then drawn towards the detector by the attractive force of the grid (e.g., electrons emitted towards the detector). Figure 4 (As shown).

[0044] In this scenario, signal electrons from all directions can be detected by the electron detector, which significantly increases the signal quantity at the system front end, greatly improves the signal-to-noise ratio, and makes the sample morphology images output by the scanning electron microscope clearer. It can distinguish nanoscale microstructures and improve the accuracy and reliability of scanning electron microscope analysis.

[0045] In some embodiments, where the target detection direction is in-lens detection, the objective lens electrodes are configured to be simultaneously subjected to a first negative voltage, which, in conjunction with a second negative voltage on the electron detector, regulates the movement of signal electrons along the entire circumferential direction into the objective lens body. That is, in the case of an in-lens detector, a negative voltage (e.g., -50V) is simultaneously applied to the objective lens electrodes, and a negative voltage (-200V) is also applied to the grid of the electron detector to precisely guide the movement of signal electrons in all directions towards the in-lens electron detector.

[0046] Specifically, after the electron beam interacts with the sample, the excited signal electrons still exhibit a uniform 360-degree cosine distribution (Lambertian distribution). Since the detector inside the microscope tube can only capture signal electrons entering the tube, and under normal circumstances only high-angle signal electrons can enter the tube, these high-angle signal electrons have a large angle with the sample surface normal and move towards the tube. This portion of electrons constitutes a very small percentage, resulting in insufficient detection signal. When the negative voltages of the objective electrode and the electron detector grid together form a global radial suppression electric field, the radial velocity of the signal electrons (i.e., the velocity component parallel to the sample surface) is significantly suppressed. In other words, the electric field force resists the radial velocity, preventing electrons from diffusing outwards and effectively avoiding signal electrons from colliding with the objective wall or escaping.

[0047] The axial velocity of the signal electrons (i.e., the velocity component perpendicular to the sample surface and pointing towards the inside of the microscope tube) is unaffected by the radial electric field, thus retaining its dominant direction of motion. The signal electrons, originally distributed at low angles, are "compressed" axially, forming a convergent motion trajectory, overcoming the limitation that only high-angle electrons can enter the microscope tube (e.g., ...). Figure 5 (As shown).

[0048] In this scenario, signal electrons from all directions are "squeezed" into the microscope tube under the influence of the electric field, resulting in a significant increase in the number of signal electrons entering the tube. The signal intensity captured by the in-tube detector is significantly enhanced, enabling more precise analysis of sample composition distribution. This is particularly suitable for trace element detection and material structure analysis, effectively solving the core problem of insufficient signal quantity from the in-tube detector.

[0049] Figure 4 This is an exemplary schematic diagram illustrating external detection according to an embodiment of this application; Figure 5 This is an exemplary schematic diagram illustrating intrascopic detection according to an embodiment of this application. Figure 4As shown, in this scenario, when a negative voltage is simultaneously applied to the objective electrode 202 and a positive voltage is applied to the electron detector 401, the signal electrons 402 in each direction move toward the electron detector 401 under the combined action of repulsive and attractive forces.

[0050] like Figure 5 As shown, in this scenario, when a negative voltage is simultaneously applied to the objective electrode 202 and the electronic detector 401, the signal electrons 402 in each direction are "squeezed" into the electronic detector inside the objective body 201 under the formed global radial suppression electric field.

[0051] In some embodiments, this application also provides an electron beam system, such as Figure 6 As shown. Figure 6 This is an exemplary structural block diagram illustrating an electron beam system 600 according to an embodiment of this application.

[0052] like Figure 6 As shown, the electron beam system 600 may include an objective lens assembly 200 and an electron detector 401. As previously described, the objective lens assembly 200 may include an objective lens body 201 and at least two objective lenses 202. The electron detector 401 may be arranged outside the objective lens pole piece of the objective lens body in the objective lens assembly, and uniformly distributed in a circumferential array with the objective lenses in the objective lens assembly. In some implementations, the electron beam system 600 may also include an in-tube detector, the receiving end of which may be located inside the tube near the upper end of the objective lens to ensure that axially moving signal electrons can be accurately incident.

[0053] Furthermore, this system is compatible with existing electron beam systems or other components of scanning electron microscopes (such as electron guns, deflection coils, and sample stages) without requiring large-scale modifications to the equipment. Upgrading existing equipment is achieved simply by installing the objective electrodes via an insulated connecting frame and by adding modules for voltage regulation and parameter switching between two detection modes, thus lowering the application threshold. Simultaneously, the system can flexibly adjust the voltage excitation according to the usage scenario to adapt to different detection requirements.

[0054] Figure 7 This is an exemplary schematic diagram illustrating an electron beam system according to an embodiment of this application. Figure 7 Figures (a) and (b) exemplarily illustrate a front view and a bottom view of an electron beam system, respectively. The figures show that the electron beam system may include at least an objective lens body 201 and three objective electrodes 202, wherein the three objective electrodes 202 are arranged around the outer periphery of the objective pole piece of the objective lens body, uniformly distributed in a circumferential array with respect to the electron detector 401 in the electron beam system. Each objective electrode 202 is secured via a corresponding insulating bracket 301. For further details, please refer to the above. Figure 2 , Figure 3The content described herein will not be repeated here.

[0055] In some embodiments, the target detection direction of the electron beam system is external detection, a first negative voltage is synchronously applied to the objective lens electrode, and a second positive voltage is applied to the electron detector, which cooperate to control the movement of signal electrons in the entire circumferential direction towards the electron detector.

[0056] In some embodiments, the target detection direction of the electron beam system is in-mirror detection. A first negative voltage is synchronously applied to the objective lens electrodes, and a second negative voltage is applied to the electron detector. These components work together to control the movement of signal electrons along the entire circumferential direction into the objective lens body. For further details, please refer to the above. Figure 4 , Figure 5 The descriptions made will not be repeated here.

[0057] As described above, this application, through its embodiments, establishes objective electrodes arranged in a circumferential array with the electron detector on the outer side of the objective lens pole piece. These electrodes are stably fixed and electrically isolated via an insulating connecting frame, and differentiated voltage regulation is employed. Specifically, during external detection, the negative voltage of the electrodes and the positive voltage of the detector form a repulsive and attractive electric field, guiding the distributed signal electrons omnidirectionally and preventing dissipation. During internal detection, the dual negative voltages form a radial suppression electric field, guiding low-angle electrons to converge towards the lens barrel, increasing the signal source. The electrode shape is adapted to the objective lens and does not obstruct the electron beam, exhibiting strong compatibility with existing equipment and allowing for flexible switching of detection scenarios. Ultimately, this improves the efficiency of signal electron detection, increases the system signal quantity, optimizes imaging clarity and analysis reliability, and solves the core problems of limited capture range and insufficient signal quantity in existing technologies.

[0058] It should be understood that when the terms "first," "second," "third," and "fourth," etc., are used in the claims, specification, and drawings of this application, they are used only to distinguish different objects and not to describe a specific order. The terms "comprising" and "including" as used in the specification and claims of this application indicate the presence of the described features, integrals, steps, operations, elements, and / or components, but do not exclude the presence or addition of one or more other features, integrals, steps, operations, elements, components, and / or collections thereof.

[0059] It should also be understood that the terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the application. As used in this specification and claims, the singular forms “a,” “an,” and “the” are intended to include the plural forms unless the context clearly indicates otherwise. It should also be understood that the term “and / or” as used in this specification and claims refers to any combination and all possible combinations of one or more of the associated listed items, and includes such combinations.

[0060] Although the embodiments of this application are described above, the content is merely an example adopted for the purpose of facilitating understanding of this application and is not intended to limit the scope and application scenarios of this application. Any person skilled in the art described in this application may make any modifications and changes in the form and details of the implementation without departing from the spirit and scope disclosed in this application, but the scope of patent protection of this application shall still be determined by the scope defined in the appended claims.

Claims

1. An objective lens device for an electron beam system, comprising: Objective lens body, At least two objective electrodes are arranged around the outer edge of the objective pole piece of the objective body, and are uniformly distributed in a circular array with the electron detector in the electron beam system. They are configured to, when a first voltage is applied synchronously, cooperate with a second voltage of the electron detector to control the movement of signal electrons in the entire circumferential direction toward the target detection direction.

2. The objective lens apparatus of claim 1, wherein each of the objective electrodes is fixed around the outer side of the objective pole shoe of the objective body via a corresponding insulating connector.

3. The objective lens device according to claim 2, wherein the insulating connecting frame includes a first connecting member and a second connecting member, the first connecting member being fixed to the outer wall of the objective lens body, one end of the second connecting member being connected to the first connecting member, and the other end of the second connecting member being connected to the objective lens electrode, so as to fix the objective lens electrode around the outer side of the objective lens pole shoe of the objective lens body.

4. The objective lens device according to claim 3, wherein the fixing method of the first connector and the connection method of the second connector both include one or more of screws, adhesive, or slots.

5. The objective lens apparatus according to any one of claims 1-3, wherein the shape of the objective electrode is adapted to the outer contour of the objective lens body or is rectangular, and the position height of the objective electrode does not exceed the lower end face of the objective lens body.

6. The objective lens device according to claim 1, wherein the target detection direction is external detection, and the objective lens electrode is configured to be synchronously applied a first negative voltage, which, in conjunction with the second positive voltage of the electronic detector, controls the movement of signal electrons in the entire circumferential direction toward the electronic detector.

7. The objective lens device according to claim 1, wherein the target detection direction is in-lens detection, and the objective lens electrode is configured to be synchronously applied a first negative voltage, which, in conjunction with the second negative voltage of the electronic detector, regulates the movement of signal electrons in the entire circumferential direction into the objective lens body.

8. The objective lens apparatus according to claim 1, wherein the first voltage has a voltage range of -200V to 0V, and the second voltage has a voltage range of -200V to 500V.

9. An electron beam system, comprising at least: The objective lens apparatus according to any one of claims 1-8; An electronic detector is arranged on the outside of the objective pole piece of the objective lens body in the objective lens device, and is uniformly distributed in a circumferential array with the objective electrodes in the objective lens device.

10. The electron beam system according to claim 9, wherein the target detection direction of the electron beam system is external detection, the objective lens electrode is synchronously applied a first negative voltage, and the electron detector is applied a second positive voltage, which cooperate to control the movement of signal electrons in the entire circumferential direction toward the electron detector.

11. The electron beam system according to claim 9, wherein the target detection direction of the electron beam system is in-lens detection, the objective lens electrode is synchronously applied a first negative voltage, and the electron detector is applied a second negative voltage, which cooperate to control the movement of signal electrons in the entire circumferential direction into the objective lens body.

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