A graphene pore metalization pretreatment whole pore device
By designing a pretreatment device for graphene hole metallization, the problems of synchronous belt/gear contamination in the hole-forming liquid and complex sealing structure were solved. This achieved zero leakage and zero wear of the drive shaft, accurate liquid level detection, adaptability to various PCB specifications, and improved hole-forming consistency and graphene coverage.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- YIYANG MINGZHENGHONG ELECTRONICS CO LTD
- Filing Date
- 2025-12-15
- Publication Date
- 2026-07-21
AI Technical Summary
In existing PCB substrate hole-forming devices, the long-term immersion of moving parts such as synchronous belts/gears in the hole-forming liquid causes plasticizer precipitation, rubber swelling and shedding, resulting in secondary adsorption and contamination of the PCB. In addition, the sealing structure is complex, costly, and prone to corrosion and leakage.
A pretreatment device for metallizing graphene holes is designed, which adopts a horizontal feeding mechanism, a liquid circulation mechanism, a limiting mechanism and an ultrasonic array. The synchronous pulley-synchronous belt group is externally mounted. Liquid leakage is prevented by a liquid baffle and a liquid level detection component. The ultrasonic and oblique liquid spray work together. The limiting mechanism is adapted to PCBs of different specifications.
It achieves zero leakage and zero wear in the drive shaft, uniform adsorption of the hole-forming agent, accurate liquid level detection, adaptability to various PCB specifications, avoids pollution and corrosion, improves hole-forming consistency, and provides a good foundation for graphene coverage.
Smart Images

Figure CN121645718B_ABST