Angle-adjustable tool for FIB-EBSD

Abstract

The invention belongs to the technical field of instrument manufacturing and electron microscope analysis, and discloses an angle-adjustable tool for FIB-EBSD, the angle-adjustable tool comprises a base, a sample loading table and an angle adjusting piece, and a connecting hole of the base is provided with an angle identification structure in a surrounding manner; the sample loading platform comprises a pedestal and a bearing part, the pedestal is connected with the base and the bearing part, and the bearing part is used for bearing a sample; the angle adjusting piece comprises a rotating shaft and an elastic piece, the rotating shaft is rotationally connected to the pedestal and the base, and when the rotating shaft rotates, the protrusion can selectively correspond to one angle identification structure; the elastic piece is connected to the rotating shaft in a sleeving mode and abuts against the position between the base and the protrusion, the elastic piece has a first deformation state and a second deformation state, and the compression deformation amount of the elastic piece in the first deformation state is smaller than that of the elastic piece in the second deformation state. By means of the tool, angle switching of the sample can be rapidly completed, reliability is high, errors caused by visual inspection of an operator and other modes are avoided, operation is simpler, consumed time is shorter, and the efficient experiment efficiency is guaranteed.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of instrument manufacturing and electron microscopy analysis and testing, and particularly relates to an angle-adjustable tool for FIB-EBSD. BACKGROUND

[0002] In contemporary material science research, the combination of focused ion beam (FIB) and electron backscatter diffraction (EBSD) technology has become the gold standard for realizing in-situ processing and crystallographic characterization in the same micro area.

[0003] The core bottleneck of the combination of FIB and EBSD technology lies in the strict and completely different requirements of the two technologies for the sample tilt angle. According to the design of mainstream FIB-SEM equipment, FIB processing requires the ion beam (which has an optical path at an angle of about 52° with the electron beam optical path) to be nearly perpendicular to the sample surface in order to obtain high etching efficiency and precision, which means that the sample stage needs to be tilted at about 52°. In contrast, EBSD analysis requires the sample surface to be at a large angle of about 70° with the horizontal plane in order to obtain high-quality, high-signal-to-noise diffraction patterns (i.e., Kikuchi patterns), to maximize the diffraction signal and ensure that it can be effectively received by the detector.

[0004] However, this angle contradiction of 52° and 70° directly leads to the limitation and difficulty of angle switching of the traditional sample stage in FIB-EBSD combined experiments: the tilt range (such as -10° to 60°) of the standard electron microscope sample stage is often insufficient to meet the needs of FIB processing and EBSD analysis. The current solution is usually to use a pre-tilt stage with a fixed angle, but this requires breaking the vacuum, removing the sample, replacing the sample stage, and re-evacuating and positioning when switching between the two modes, which is extremely cumbersome and time-consuming, and seriously reduces the experimental efficiency. SUMMARY

[0005] The purpose of the present application is to provide an angle-adjustable tool for FIB-EBSD, which facilitates angle switching of the sample in FIB processing and EBSD analysis under two working conditions, is simple to operate, saves time, and ensures high experimental efficiency.

[0006] To achieve this purpose, the present application adopts the following technical solutions:

[0007] The angle-adjustable tool for FIB-EBSD comprises a base fixedly arranged, the base having a connecting hole, a plurality of angle identification structures being circumferentially arranged on the connecting hole, and the angle identification structures being used for indicating the included angle between the angle identification structures and the horizontal plane; a sample mounting table comprising a table base and a carrier, the table base being rotatably connected to the base, and the carrier being mounted on the table base and being used for carrying and fixing a sample; an angle adjusting member comprising a rotating shaft and an elastic member, the rotating shaft being rotatably penetrated through the connecting hole and being connected to the table base, and a protrusion being arranged on the rotating shaft, the protrusion being selectively connected to one of the angle identification structures when the rotating shaft rotates; the elastic member being sleeved on the rotating shaft and being abutted between the base and the protrusion, the elastic member comprising a first deformation state and a second deformation state, and the compression deformation amount of the elastic member in the first deformation state being less than the compression deformation amount of the elastic member in the second deformation state; when the elastic member is transformed from the second deformation state to the first deformation state, the protrusion can be limitedly connected to the corresponding angle identification structure, and when the elastic member is transformed from the first deformation state to the second deformation state, the protrusion can be released from the limited connection with the corresponding angle identification structure, so that the table base can rotate relative to the base along with the rotating shaft.

[0008] Preferably, a plurality of first grooves are circumferentially arranged on the connecting hole, one side of the first grooves being in communication with the connecting hole, and the first grooves being used as the angle identification structures.

[0009] When the elastic member is transformed between the first deformation state and the second deformation state, the protrusion can be switched between the limited insertion and the released limited insertion with the angle identification structure.

[0010] Preferably, the base comprises a first support plate, a first side wall plate and a second side wall plate being oppositely arranged on one side of the first support plate, the first support plate being fixedly arranged, the first side wall plate having the connecting hole, and the second side wall plate having a first adapter hole.

[0011] The table base comprises a third side wall plate, the third side wall plate being arranged between the first side wall plate and the second side wall plate, the elastic member being abutted between the protrusion and the third side wall plate, the third side wall plate having a second adapter hole, a second groove being extendedly arranged on the second adapter hole, one end of the rotating shaft being penetrated through the connecting hole, the first adapter hole and the second adapter hole, the protrusion being penetrated through the angle identification structure and the second groove and being connected to the elastic member.

[0012] When the elastic element changes from the first deformation state to the second deformation state, the protrusion can be inserted into the second groove for limiting. When the elastic element changes from the second deformation state to the first deformation state, the protrusion can be inserted into both the second groove and the angle marking structure for limiting.

[0013] Preferably, the pedestal further includes a second support plate and a fourth side wall plate. The second support plate is used to fix the bearing member. The third side wall plate and the fourth side wall plate are disposed opposite to each other on one side of the second support plate. The fourth side wall plate has a third transition hole. The third transition hole is coaxially arranged with the first transition hole and the second transition hole. One end of the rotating shaft passes through the connecting hole, the first transition hole, the second transition hole and the third transition hole simultaneously.

[0014] Preferably, one end of the rotating shaft is also provided with a first magnetic attraction part;

[0015] The third adapter hole is provided with a second magnetic attraction part. When the rotating shaft passes through the third adapter hole, the first magnetic attraction part and the second magnetic attraction part are magnetically attracted to each other.

[0016] Preferably, a buffer pad is also connected to the rotating shaft, and the buffer pad abuts between the elastic member and the second side wall plate;

[0017] And / or, the other end of the shaft is provided with a rotating handle.

[0018] Preferably, the carrier includes a carrier plate with a carrier groove for embedding a substrate. The shape of the substrate matches the shape of the carrier groove, and the substrate is used to connect and fix the sample.

[0019] Preferably, the support further includes a pressure plate detachably connected to the opening edge of the support groove, the pressure plate being used to apply pressure to the sample in the direction toward the substrate.

[0020] Preferably, the support member further includes a fixing plate, the top surface of which is vertically connected to the support plate, and the bottom surface of which is connected to the base.

[0021] Preferably, the bottom surface of the fixing plate is provided with a first nail post protruding outwards, the first nail post is connected to a third magnetic attraction part, the base has a countersunk hole, a fourth magnetic attraction part is provided in the countersunk hole, the first nail post is inserted into the countersunk hole, and the third magnetic attraction part and the fourth magnetic attraction part are magnetically attracted to each other.

[0022] Alternatively, the bottom surface of the fixed disk is provided with a threaded post, the base has a threaded mounting hole, and the threaded post is threadedly connected to the threaded mounting hole;

[0023] And / or, the carrier further includes threaded fasteners, the bottom surface of the fixed disk is recessed with a plurality of threaded holes, the base has mounting through holes, and the threaded fasteners are threadedly connected to the threaded holes through the mounting through holes.

[0024] The beneficial effects of this invention are as follows: The adjustable angle fixture for FIB-EBSD provided in this embodiment enables angle switching between FIB processing and EBSD analysis. After loading the sample onto the carrier, when switching between FIB processing and EBSD analysis modes, the operator only needs to press the rotating shaft to disengage the protrusion on the shaft from the original corresponding angle marking structure. Then, by rotating the shaft to the target angle, the operator simply releases the shaft, allowing the protrusion to engage with the new corresponding angle marking structure, thus quickly locking the sample at the target angle. This eliminates the need to break the vacuum, remove the sample, replace the sample stage, and re-vacuum and reposition. Moreover, this locking method is more reliable, ensuring high consistency and stability of the angle for each switch, completely avoiding errors caused by operator visual inspection. The operation is simpler, less time-consuming, and ensures high experimental efficiency. Attached Figure Description

[0025] Figure 1 This is a schematic diagram of the structure of the angle-adjustable tooling for FIB-EBSD provided in an embodiment of the present invention;

[0026] Figure 2 This is a side view of the base provided in an embodiment of the present invention;

[0027] Figure 3 This is a cross-sectional view of the elastic element in the angle-adjustable tooling for FIB-EBSD provided in the embodiment of the present invention when it is in the first deformation state;

[0028] Figure 4 This is a cross-sectional view of the elastic element in the angle-adjustable tooling for FIB-EBSD provided in the embodiment of the present invention when it is in the second deformation state;

[0029] Figure 5 This is a schematic diagram of the structure of the base provided in an embodiment of the present invention;

[0030] Figure 6 This is a schematic diagram of the structure of the pedestal provided in an embodiment of the present invention;

[0031] Figure 7 This is a schematic diagram of the structure of the support member provided in an embodiment of the present invention;

[0032] Figure 8 This is a front view of the carrier provided in an embodiment of the present invention;

[0033] Figure 9 This is a schematic diagram of the connection between the carrier and the fixed disk provided in an embodiment of the present invention;

[0034] Figure 10 This is a structural schematic diagram of the angle adjustment component provided in an embodiment of the present invention.

[0035] In the picture:

[0036] 100. Weight reduction hole;

[0037] 1. Base; 101. Connecting hole; 11. Angle marking structure; 12. First support plate; 13. First side wall plate; 14. Second side wall plate; 141. First adapter hole; 15. Second nail post;

[0038] 2. Sample mounting table; 21. Base; 211. Third side panel; 2111. Second adapter hole; 2112. Second groove; 212. Second support plate; 2121. Countersunk hole; 2122. Mounting through hole; 213. Fourth side panel; 2131. Third adapter hole; 22. Bearing component; 221. Bearing plate; 2211. Bearing groove; 222. Fixing plate; 2221. Threaded hole; 223. First nail post; 224. Third magnetic suction part; 225. Threaded fastener;

[0039] 3. Angle adjustment component; 31. Rotating shaft; 311. Protrusion; 312. Limiting flange; 32. Elastic component; 33. First magnetic suction part; 34. Buffer pad; 35. Rotating handle. Detailed Implementation

[0040] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, the accompanying drawings show only the parts relevant to the present invention, and not all of the structures.

[0041] In the description of this invention, unless otherwise explicitly specified and limited, the terms "connected," "linked," and "fixed" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0042] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0043] In the description of this embodiment, the terms "upper," "lower," "right," and "left," etc., refer to the orientation or positional relationship shown in the accompanying drawings. They are used only for ease of description and simplification of operation, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the present invention. In addition, the terms "first" and "second" are used only for distinction in description and have no special meaning.

[0044] The technical solution provided by the present invention will be described below with reference to the accompanying drawings and specific embodiments.

[0045] This invention provides an angle-adjustable fixture for FIB-EBSD. Combined with... Figures 1 to 10 As shown, in this embodiment, the fixture includes a base 1, a sample loading platform 2, and an angle adjustment component 3. The base 1 is fixedly installed and has a connecting hole 101. Multiple angle marking structures 11 are circumferentially arranged on the connecting hole 101, indicating the angle between the marking structure and the horizontal plane. The sample loading platform 2 includes a base 21 and a support member 22. The base 21 is rotatably connected to the base 1, and the support member 22 is mounted on the base 21 and used to support and fix the sample. The angle adjustment component 3 includes a rotating shaft 31 and an elastic member 32. The rotating shaft 31 rotatably passes through the connecting hole 101 and is connected to the base 21. The rotating shaft 31 has a protrusion 311; when the rotating shaft 31 rotates, the protrusion 311 can selectively engage with one of the angle markings. The elastic element 32 is sleeved on the rotating shaft 31 and abuts between the base 1 and the protrusion 311. The elastic element 32 includes a first deformation state and a second deformation state, and the amount of compression deformation of the elastic element 32 in the first deformation state is less than the amount of compression deformation in the second deformation state. When the elastic element 32 changes from the second deformation state to the first deformation state, the protrusion 311 is limited to the corresponding angle marking structure 11. When the elastic element 32 changes from the first deformation state to the second deformation state, the protrusion 311 can be released from the limited connection with the corresponding angle marking structure 11 so that the platform 21 can rotate relative to the base 1 with respect to the rotating shaft 31.

[0046] Specifically, refer toFigure 1 As shown, this embodiment, by setting an angle adjustment component 3 between the platform 21 and the base 1, and by setting an angle marking structure 11 on the platform 21, allows the sample on the carrier 22 to be accurately positioned at the required tilt angle. In specific use, when the sample is in both FIB processing and EBSD analysis scenarios, the elastic component 32 is in a first deformation state, and the protrusion 311 can be limited and connected to the corresponding angle marking structure 11. The angle marking structure 11 restricts the rotation of the protrusion 311 relative to the base 1, thereby restricting the rotation of the platform 21 and the carrier 22 relative to the base 1. This allows the sample on the carrier 22 to undergo FIB processing and EBSD analysis at a certain tilt angle relative to the horizontal plane. Furthermore, since FIB processing and EBSD analysis require the sample to be performed at different tilt angles, the sample needs to be adjusted to the tilt angle required for EBSD analysis after FIB processing. When changing the sample tilt angle, an axial force is first applied to the rotating shaft 31. At this time, the protrusion 311 on the rotating shaft 31 can drive the elastic element 32 to compress and deform along the central axis of the rotating shaft 31, so that the elastic element 32 changes from the first deformation state to the second deformation state. During the change, the protrusion 311 can release the limiting connection with the original corresponding angle mark structure 11. By rotating the rotating shaft 31, the protrusion 311 can drive the platform 21 to rotate together with the rotating shaft 31. When the protrusion 311 rotates to correspond to the angle mark structure 11 indicating the required tilt angle, it indicates that the sample has rotated to the correct position. Then, the axial force on the rotating shaft 31 is released, so that the pressure of the protrusion 311 on the elastic element 32 disappears. The elastic element 32 then changes from the second deformation state to the first deformation state, and the compression amount decreases. The protrusion 311 moves in the direction of the corresponding angle mark structure 11 and is limited and connected, so that the platform 21 is stationary relative to the base 1 again, completing the fixation after the sample angle change, thus facilitating subsequent EBSD analysis.

[0047] The angle-adjustable fixture for FIB-EBSD provided in this embodiment enables angle switching between FIB processing and EBSD analysis. After loading the sample onto the carrier 22, when switching between the two modes, the operator only needs to press the rotating shaft 31 to disengage the protrusion 311 on the shaft from the original corresponding angle marking structure 11. Then, when rotating the shaft 31 to the target angle, the operator only needs to release the shaft 31 to allow the protrusion 311 to be locked into the new corresponding angle marking structure 11, thus quickly locking the sample at the target angle. This eliminates the need to break the vacuum, remove the sample, replace the sample stage, and re-vacuum and reposition. Moreover, this purely mechanical "aperture-type" locking method has higher reliability, ensuring that the angle is highly consistent and stable with each switch, completely avoiding errors caused by visual inspection by the operator. The operation is simpler, less time-consuming, and ensures high experimental efficiency.

[0048] Specifically, in this embodiment, reference is made to... Figure 2 As shown, five angle marker structures 11 are circumferentially arranged around the connecting hole 101. These five angle marker structures 11 are evenly spaced, with the central one positioned at a 90° angle to the horizontal plane. The other four angle marker structures 11 are symmetrically arranged at angles of -52°, -70°, 52°, and 70° to the horizontal plane, respectively. The central angle marker structure 11 serves as a reference point for quickly locating and calibrating the positions of the other four angle marker structures 11. The operator can quickly find the corresponding angles of the other four angle marker structures 11 using the central one, without needing to measure them individually.

[0049] With the above settings, for example, in FIB processing mode with stage 21 locked at 52°, the angle between the sample surface and the horizontal plane is 52°. In most FIB-SEM systems, the angle between the ion beam tube and the electron beam tube (used to emit the incident electron beam to the sample) is exactly 52°. Therefore, in FIB processing mode, the ion beam can be incident on the sample surface at an angle close to 90° (vertical), achieving the ideal geometry for the most efficient and precise etching, minimizing the curtain effect and non-uniform processing of the ion beam. In EBSD analysis mode with stage 21 locked at 70°, the angle between the sample surface and the horizontal plane is 70°. According to the physical principles of EBSD, this angle is the optimal geometry for obtaining high-quality Kikuchi diffraction patterns. It ensures both a sufficiently strong backscattered electron signal and that the diffracted electrons are directed at the EBSD detector at a suitable angle, thus obtaining the highest signal-to-noise ratio and clearest diffraction pattern.

[0050] It should be further explained that, in FIB processing mode, the basis for locking the stage 21 at 52° or -52° is mainly to observe the orientation relationship between the ion beam tube and the stage 21, and to determine whether the stage 21 rotates clockwise or counterclockwise based on the direction of the ion beam emission; similarly, in EBSD analysis mode, the basis for locking the stage 21 at 70° or -70° is mainly to observe the orientation relationship between the EBSD detector and the stage 21, and to determine whether the stage 21 rotates clockwise or counterclockwise based on the direction in which the diffracted electrons are emitted towards the EBSD detector.

[0051] Furthermore, it is understood that this embodiment does not limit the angles of the first and second rotations of the stage 21. That is, after the first rotation, the stage 21 can stop at the angle marker structure 11 corresponding to 52°, and after the second rotation, it can stop at the angle marker structure 11 corresponding to 70° or -70°. The specific rotation angle is still determined by the direction of the ion beam and the direction in which the diffracted electrons are directed toward the EBSD detector.

[0052] Furthermore, in this embodiment, a plurality of first grooves are circumferentially formed on the connecting hole 101, one side of the first groove is connected to the connecting hole 101, and the first groove serves as the aforementioned angle marking structure 11; when the elastic member 32 changes between the first deformation state and the second deformation state, the protrusion 311 can switch between two states: limited insertion with the angle marking structure 11 and unlimited insertion. Figure 2 , Figure 3 and Figure 4 As shown, when the elastic element 32 changes from the first deformation state to the second deformation state, the protrusion 311 can disengage from the previously corresponding angle marking structure 11, releasing the limiting relationship between the protrusion 311 and the previously corresponding angle marking structure 11. When the elastic element 32 changes from the second deformation state to the first deformation state, the protrusion 311 can be inserted into the newly corresponding angle marking structure 11, achieving insertion with the newly corresponding angle marking structure 11, so that the angle marking structure 11 can hold the protrusion 311 in place and prevent the protrusion 311 from rotating. By designing the angle marking structure 11 as a groove-shaped structure and connecting it to the connecting hole 101, the protrusion 311 can achieve a limiting connection with the angle marking structure 11 through insertion. This strengthens the limiting effect on the angle rotation of the protrusion 311, and makes the locking state of the sample more stable.

[0053] Furthermore, in this embodiment, reference is made to... Figure 5 As shown, the base 1 includes a first support plate 12, and a first side wall plate 13 and a second side wall plate 14 disposed opposite to each other on one side of the first support plate 12. The first support plate 12 is fixedly disposed, the first side wall plate 13 has the aforementioned connecting hole 101, and the second side wall plate 14 has a first adapter hole 141. (Reference) Figure 6As shown, the pedestal 21 includes a third side wall plate 211, which is disposed between the first side wall plate 13 and the second side wall plate 14. An elastic member 32 abuts against the protrusion 311 and the third side wall plate 211. The third side wall plate 211 has a second transition hole 2111, and a second groove 2112 extends from the second transition hole 2111. One end of the rotating shaft 31 passes through the connecting hole 101, the first transition hole 141, and the second transition hole 2111. The protrusion 311 passes through the angle marking structure 11 and the second groove 2112 and is connected to the elastic member 32. When the elastic member 32 changes from the first deformation state to the second deformation state, the protrusion 311 can be limited and inserted into the second groove 2112. When the elastic member 32 changes from the second deformation state to the first deformation state, the protrusion 311 can be limited and inserted into both the second groove 2112 and the first groove.

[0054] By setting the first support plate 12, the first side wall plate 13, and the second side wall plate 14, the base 1 can be designed with a U-shaped structure. After the base 1 is fixedly set, the overall structure is more stable. Furthermore, the connection between the first side wall plate 13 and the second side wall plate 14 and the rotating shaft 31 at both ends allows for more balanced support of the rotating shaft 31, effectively reducing wobbling and skew during rotation and ensuring that the rotating shaft 31 always rotates around a fixed axis, meeting the high rotational accuracy requirement of the platform 21 in this embodiment. Simultaneously, the first side wall plate 13 and the second side wall plate 14 can share the force on the rotating shaft 31, thereby extending the service life of the rotating shaft 31. In addition, combined with… Figures 3 to 6 As shown, by setting the second groove 2112, when the elastic element 32 changes from the first deformation state to the second deformation state, the protrusion 311 can only be inserted into the second groove 2112 and apply a rotational driving force to the stage 21, thereby reducing the pressure on the rotating shaft 31 to drive the stage 21 to rotate and making the controllability of the rotation angle of the stage 21 stronger. When the elastic element 32 changes from the second deformation state to the first deformation state, the protrusion 311 can be inserted into the first groove and the second groove 2112 at the same time. The first groove and the second groove 2112 can jointly limit the protrusion 311, ensuring that the sample will not drift or vibrate even at a large angle of 70°. This provides a stable and reliable foundation for long-term, high-precision EBSD surface scanning and ensures image quality and data stability.

[0055] In this embodiment, a second post 15 protrudes from the bottom of the base 1. The second post 15 is cylindrical, ensuring plug-and-play compatibility with the sample stages of mainstream FIB-SEM equipment such as Thermo Fisher (FEl), Zeiss, and JEOL. Furthermore, the second post 15 is interference-fitted to the sample stage, ensuring good installation stability of the base 1.

[0056] In this embodiment, the pedestal 21 further includes a second support plate 212 and a fourth side wall plate 213. The second support plate 212 is used to fix the bearing member 22. The third side wall plate 211 and the fourth side wall plate 213 are disposed opposite to each other on one side of the second support plate 212. The fourth side wall plate 213 has a third transition hole 2131. The third transition hole 2131 is coaxially disposed with the first transition hole 141 and the second transition hole 2111. One end of the rotating shaft 31 passes through the connecting hole 101, the first transition hole 141, the second transition hole 2111 and the third transition hole 2131.

[0057] By setting the second support plate 212, the third side wall plate 211, and the fourth side wall plate 213, the overall structure of the pedestal 21 is similar to that of the base 1 and both are U-shaped structures. After the pedestal 21 and the base 1 are rotatably connected by the rotating shaft 31, the pedestal 21 is supported on the rotating shaft 31 by the third side wall plate 211 and the fourth side wall plate 213, which enhances the connection stability between the pedestal 21 and the rotating shaft 31. This ensures that the pedestal 21 remains parallel to the horizontal plane in all directions except for the tilt angle with the horizontal plane in the specified direction, thereby ensuring the accuracy of FIB machining and EBSD analysis modes.

[0058] Preferably, the first support plate 12, the first side wall plate 13, and the second side wall plate 14 are integrally formed, and the second support plate 212, the third side wall plate 211, and the fourth side wall plate 213 are integrally formed, in order to improve the forming efficiency of the base 1 and the platform 21, and improve the forming accuracy of the connecting hole 101, the first groove, the second groove 2112, the first transition hole 141, the second transition hole 2111, and the third transition hole 2131, thereby saving processing costs.

[0059] In a further preferred embodiment, both the first support plate 12 and the second support plate 212 are provided with a plurality of weight-reducing holes 100 to reduce the weight of the overall tooling and facilitate safe fixing on the sample stage. In addition, by providing weight-reducing holes 100 on the second support plate 212, the weight of the base 21 can be reduced, making it easier for the rotating shaft 31 to rotate the base 21, and making the angle adjustment faster and more accurate.

[0060] In this embodiment, the carrier 22 includes a carrier plate 221, on which a carrier groove 2211 is provided. The carrier groove 2211 is used to embed a substrate. The shape of the substrate is adapted to the shape of the carrier groove 2211, and the substrate is used to connect and fix the sample.

[0061] Specifically, refer to Figure 7As shown, the support groove 2211 is square in shape (e.g., 5mm × 5mm, 0.5mm deep), and multiple support grooves 2211 are arranged side by side on the support plate 221, allowing the support plate 221 to hold multiple samples at once and process and / or analyze multiple samples simultaneously. The substrate (not shown in the figure) is a silicon wafer. Small-sized bulk samples or powder samples are pre-fixed onto a clean, disposable silicon wafer using conductive adhesive or conductive silver paste. After being firmly fixed, the entire silicon wafer is embedded into the corresponding support groove 2211. Because the silicon wafer surface is very flat and has good conductivity, it does not generate interference signals in EBSD analysis. By setting up support grooves 2211 for embedding the substrate, the substrate can be discarded after use. This sample carrier method perfectly avoids sample cross-contamination and the hassle of repeatedly cleaning the support plate 221, thereby greatly improving experimental efficiency. At the same time, it can also cope with the diverse sample morphology scenarios in materials science research, so that the support plate 221 can simultaneously support samples of different morphologies (such as bulk and powder), making the support 22 more flexible and adaptable.

[0062] Furthermore, in this embodiment, the support member 22 may also include a pressure plate (not shown in the figure), which is detachably connected to the opening edge of the support groove 2211. The pressure plate is used to apply pressure to the sample in the direction toward the substrate. Exemplarily, in one embodiment of this invention, the pressure plate has a through hole, and the opening edge of the support groove 2211 is provided with a plurality of standard threaded holes 2221 (such as M1.6). Threaded connectors (such as screws) are threadedly connected to the threaded holes 2221 through the through holes, so that the pressure plate can be firmly connected to the support plate 221. The sample being pressed by the pressure plate may be an irregularly shaped sample. The pressure plate can firmly press the irregularly shaped sample onto the substrate, thereby further enriching the types of samples that the tooling can detect.

[0063] In this embodiment, the support 22 also includes a fixing disk 222. The top surface of the fixing disk 222 is vertically connected to the support plate 221, and the bottom surface of the fixing disk 222 is connected to the stage 21, so that the sample can be vertically placed on the stage 21. Specifically, in FIB processing mode, the fixture is fixed to the electron microscope stage by the base 1. An ion beam tube is provided on the electron microscope stage. When the protrusion 311 drives the stage 21 from the 90° angle marking structure 11 to the 52° angle marking structure 11, the sample surface can also change from a 90° angle with the horizontal plane to a 52° angle, which can just meet the requirement that the ion beam tube can incident the ion beam on the sample surface at an angle of nearly 90°. However, if the sample is placed horizontally on the stage 21, in order to meet the requirement that the ion beam tube emits an ion beam on the sample surface under the spatial geometry of 52°, the stage 21 needs to be rotated 128° relative to the base 1, which obviously increases the difficulty of debugging. Therefore, the solution provided in this embodiment facilitates the adjustment of the sample angle and reduces the difficulty of debugging and experimental operation.

[0064] In this embodiment, the connection method between the fixed disk 222 and the base 21 is not limited. For example, refer to... Figure 6 , Figure 8 As shown, in a preferred embodiment, the bottom surface of the fixing plate 222 is provided with a first nail post 223 protruding from it. The first nail post 223 is connected to a third magnetic suction part 224. The base 21 has a countersunk hole 2121, and a fourth magnetic suction part is provided inside the countersunk hole 2121. When the first nail post 223 is inserted into the countersunk hole 2121, the third magnetic suction part 224 can magnetically attract the fourth magnetic suction part, so that the fixing plate 222 and the base 21 are magnetically fixed together. This facilitates the insertion and removal of the carrier 22 and the base 21, and makes it easier to rework and maintain the carrier groove 2211 on the carrier 22, ensuring that the inner wall of the carrier groove 2211 is flat and the substrate is stably embedded. Specifically, the third magnetic suction part 224 is a magnetic ring, and the fourth magnetic suction part is a magnetic ring or magnetic block embedded in the inner wall of the countersunk hole 2121, ensuring the simplicity of the structure of the third magnetic suction part 224 and the fourth magnetic suction part, and facilitating installation.

[0065] Furthermore, in other alternative embodiments of this example, the bottom surface of the fixed disk 222 may also have a protruding threaded post, and a threaded mounting hole may be opened at a corresponding position on the base 21, so that the threaded post is threaded into the threaded mounting hole to fix the carrier 22 to the base 21. This connection method is safe and reliable, and easy to assemble and disassemble. Therefore, those skilled in the art can select the fixing connection method between the base 21 and the base 1 according to the actual working conditions, and the present invention is not limited in this regard.

[0066] In this embodiment, the support member 22 further includes a threaded fastener 225. The bottom surface of the fixed disk 222 is recessed and has several threaded holes 2221. The base 21 has a mounting through hole 2122. The threaded fastener 225 is threadedly connected to the threaded hole 2221 through the mounting through hole 2122 to further enhance the connection strength between the base 21 and the support member 22. Specifically, refer to... Figure 6 , Figure 9 As shown, around the central axis of the countersunk hole 2121, two mounting through holes 2122 are evenly arranged on the surface of the base 21 facing the fixed plate 222. Correspondingly, two threaded holes 2221 are evenly arranged on the surface of the fixed plate 222 facing the base 21. The threaded fasteners 225 are preferably bolts. The symmetrical bolt fastening can significantly enhance the installation stability of the bearing component 22. Of course, more mounting through holes 2122 and threaded holes 2221 can be provided to meet the high stability requirements under actual working conditions.

[0067] It should be further noted that in this embodiment, the base 1, platform 21, disk, and support plate 221 can all be precision-machined from one or more of the following materials: high-strength aluminum alloy (such as 6061, 7075), stainless steel (such as SUS304, SUS316L), titanium alloy, or oxygen-free copper. These materials possess high mechanical strength and stability, ensuring no deformation under repeated rotation and locking operations, providing stable support for large-angle tilting. Simultaneously, these materials also possess excellent conductivity, effectively reducing the charging effect generated during electron and ion beam bombardment, ensuring imaging quality and processing accuracy. Furthermore, they exhibit high vacuum compatibility, with low gas escaping rate in ultra-high vacuum environments, preventing contamination of the electron microscope's vacuum chamber; they are non-magnetic, avoiding interference with the deflection of electron and ion beams, ensuring the accuracy of the beam path; and they are easy to precision-machine, meeting micron-level processing tolerance requirements, ensuring precise fit between components.

[0068] In this embodiment, the rotating shaft 31 is made of polyetheretherketone material, which makes the rotating shaft 31 lightweight while ensuring excellent structural strength, making the rotating shaft 31 safe and reliable to use, and also easy to rotate, greatly reducing the operating pressure.

[0069] In this embodiment, reference Figure 10As shown, a limiting flange 312 is provided circumferentially on the outer surface of the rotating shaft 31. One side of the limiting flange 312 abuts against the third side wall plate 211, and the other side of the limiting flange 312 fits against one end of the elastic member 32. The elastic member 32 is preferably a spring. The protrusion 311 passes through the second groove 2112 and connects to one side of the limiting flange 312. The two can be fixedly connected by integral molding to ensure high connection stability. Through the above arrangement, one end of the elastic member 32 can always maintain a stable fit with the limiting flange 312. The protrusion 311 can indirectly transmit the axial force to the elastic member 32 through the limiting flange 312, so that the elastic member 32 can generate stable axial deformation and rebound force, providing continuous buffering, reset or pre-tightening function for the rotating shaft 31.

[0070] In this embodiment, a first magnetic attraction part 33 is provided at one end of the rotating shaft 31; a second magnetic attraction part is provided at the third adapter hole 2131. When the rotating shaft 31 passes through the third adapter hole 2131, the first magnetic attraction part 33 and the second magnetic attraction part are magnetically attracted.

[0071] By providing a first magnetic attraction part 33 at one end of the rotating shaft 31, the first magnetic attraction part 33 is a magnetic block fixedly connected to one end of the rotating shaft 31, and a second magnetic attraction part is provided at the third adapter hole 2131. The second magnetic attraction part is a magnetic ring or a magnetic block. The rotating shaft 31 passes through the magnetic block in the third adapter hole 2131, and the magnetic block is magnetically attracted to the second magnetic attraction part, so that the rotating shaft 31 and the fourth side wall plate 213 form a detachable and stable connection, which also has the functions of positioning and quick assembly.

[0072] In this embodiment, a buffer pad 34 is also connected to the rotating shaft 31. The buffer pad 34 abuts against the elastic member 32 and the second side wall plate 14. Specifically, refer to Figure 10 As shown, the buffer pad 34 is preferably made of non-metallic material, such as rubber or silicone. By sandwiching the buffer pad 34 between the elastic member 32 and the second side wall plate 14, the gap friction between it and the second side wall plate 14 can be enhanced, thereby further improving the structural stability of the angle adjustment member 3.

[0073] Optionally, in this embodiment, reference continues to be made to Figure 10 As shown, a rotating handle 35 is also provided at the other end of the rotating shaft 31. The rotating handle 35 is vertically connected to the other end of the rotating shaft 31. Its function is to provide a convenient point for manual operation of the rotating shaft 31, so that the operator can easily drive the rotating shaft 31 to rotate by rotating the handle 35. At the same time, the operating feel and safety can be optimized by rotating the handle 35.

[0074] The standard operating procedure for the angle-adjustable fixture for FIB-EBSD provided in this embodiment of the invention is as follows:

[0075] (1) Sample mounting: For block / powder / metal wire samples, at least one of the sample forms is fixed on a 5mm×5mm silicon wafer with conductive adhesive, and the silicon wafer is embedded in the support groove 2211 of the support plate 221;

[0076] (2) Tooling insertion: Align the first pin 223 at the bottom of the fixing plate 222 with and insert it vertically into the countersunk hole 2121 of the base 21; press and control the rotating handle 35 to rotate and adjust the angle of the base 21 with the sample installed to 52°; then align the entire tooling with the second pin 15 at the bottom of the base 1 and insert it vertically onto the sample stage of the FIB-SEM.

[0077] (3) FIB processing: In the electron microscope software, the tilt angle of the FIB-SEM sample stage is zeroed, and then the FIB-SEM sample stage is moved through the electron microscope sample stage so that the sample on the FIB-SEM sample stage can be moved to the intersection of the electron beam and the ion beam to perform FIB micro-nano processing operations (such as etching, deposition, etc.).

[0078] (4) EBSD analysis: After completing the FIB processing, remove the fixture by breaking the vacuum, press and control the rotating handle 35 to rotate, smoothly rotate the stage 21 with the sample installed to the 70° position and release the rotating shaft 31 to lock the stage 21. Then place the entire fixture on the worktable for EBSD analysis, and face the stage 21 and the carrier 22 toward the EBSD detector. After inserting the EBSD detector into the preset working position on the worktable, collect and scan the diffraction pattern of the FIB processing area.

[0079] (5) End of experiment and sample removal: Remove the EBSD detector, turn off the electron beam, and shut down the electron microscope or exhaust according to the procedure. Then remove the entire fixture from the worktable and directly remove the carrier 22 to easily replace the new sample and prepare for the next experiment.

[0080] In the description of this specification, references to terms such as "some embodiments," "other embodiments," etc., indicate that a specific feature, structure, material, or characteristic described in connection with that embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples.

[0081] Obviously, the above embodiments of the present invention are merely examples for clearly illustrating the present invention, and are not intended to limit the implementation of the present invention. Those skilled in the art will be able to make various obvious changes, readjustments, and substitutions without departing from the scope of protection of the present invention. It is neither necessary nor possible to exhaustively describe all embodiments here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention should be included within the scope of protection of the claims of the present invention.

Claims

1. An angle-adjustable tooling for FIB-EBSD, characterized in that, The utility model relates to a sample angle adjustable device, including: A base (1) is fixedly arranged, and the base (1) has a connecting hole (101), a plurality of angle identification structures (11) are arranged on the connecting hole (101) along the circumference, and the angle identification structures (11) are used to indicate the included angle between them and the horizontal plane; A sample loading platform (2) includes a pedestal (21) and a carrier (22), the pedestal (21) is rotatably connected to the base (1), and the carrier (22) is installed on the pedestal (21) and is used to carry and fix a sample; An angle adjusting part (3) includes a rotating shaft (31) and an elastic part (32), the rotating shaft (31) is rotatably arranged in the connecting hole (101) and is connected with the pedestal (21), the rotating shaft (31) is provided with a protrusion (311), when the rotating shaft (31) rotates, the protrusion (311) can be selectively connected with one of the corresponding angle identification structures (11), the elastic part (32) is sleeved on the rotating shaft (31) and abuts between the base (1) and the protrusion (311), the elastic part (32) includes a first deformation state and a second deformation state, and the compression deformation amount of the elastic part (32) in the first deformation state is less than that in the second deformation state; When the elastic part (32) changes from the second deformation state to the first deformation state, the protrusion (311) can be limitedly connected with the corresponding angle identification structure (11), and when the elastic part (32) changes from the first deformation state to the second deformation state, the protrusion (311) can be disconnected with the corresponding angle identification structure (11), so that the pedestal (21) can rotate relative to the base (1) along with the rotating shaft (31).

2. The angle-adjustable tooling for FIB-EBSD of claim 1, wherein, A plurality of first grooves are arranged on the connecting hole (101) along the circumference, one side of the first groove is in communication with the connecting hole (101), and the first groove is used as the angle identification structure (11); When the elastic part (32) changes between the first deformation state and the second deformation state, the protrusion (311) can be switched between the limited insertion and the disconnection of the angle identification structure (11).

3. The angle-adjustable tooling for FIB-EBSD of claim 2, wherein, The base (1) includes a first support plate (12), a first side wall plate (13) and a second side wall plate (14) oppositely arranged on one side of the first support plate (12), the first support plate (12) is fixedly arranged, the first side wall plate (13) is provided with the connecting hole (101), and the second side wall plate (14) is provided with a first adapter hole (141). The pedestal (21) comprises a third side wall plate (211) arranged between the first side wall plate (13) and the second side wall plate (14), the elastic member (32) is abutted between the protrusion (311) and the third side wall plate (211), the third side wall plate (211) has a second adapter hole (2111), a second groove (2112) is arranged on the second adapter hole (2111) in extension, one end of the rotating shaft (31) is simultaneously arranged in the connecting hole (101), the first adapter hole (141) and the second adapter hole (2111), and the protrusion (311) is arranged in the angle identification structure (11) and the second groove (2112) and connected with the elastic member (32). When the elastic member (32) changes from the first deformation state to the second deformation state, the protrusion (311) can be limitedly inserted into the second groove (2112), and when the elastic member (32) changes from the second deformation state to the first deformation state, the protrusion (311) can be simultaneously limitedly inserted into the second groove (2112) and the angle identification structure (11).

4. The angle-adjustable tooling for FIB-EBSD of claim 3, wherein, The pedestal (21) further comprises a second support plate (212) and a fourth side wall plate (213), the second support plate (212) is used for fixing the bearing member (22), the third side wall plate (211) and the fourth side wall plate (213) are oppositely arranged on one side of the second support plate (212), the fourth side wall plate (213) has a third adapter hole (2131), the third adapter hole (2131) is coaxially arranged with the first adapter hole (141) and the second adapter hole (2111), and one end of the rotating shaft (31) is simultaneously arranged in the connecting hole (101), the first adapter hole (141), the second adapter hole (2111) and the third adapter hole (2131).

5. The angle adjustable tooling for FIB-EBSD of claim 4, wherein, One end of the rotating shaft (31) is further provided with a first magnetic attraction part (33). The third adapter hole (2131) is provided with a second magnetic attraction part, and when the rotating shaft (31) is arranged in the third adapter hole (2131), the first magnetic attraction part (33) and the second magnetic attraction part are magnetically adsorbed.

6. The angle adjustable tooling for FIB-EBSD of claim 3, wherein, The rotating shaft (31) is further connected with a buffer gasket (34), and the buffer gasket (34) is abutted between the elastic member (32) and the second side wall plate (14). And / or, the other end of the rotating shaft (31) is provided with a rotating handle (35).

7. The angle adjustable tooling for FIB-EBSD according to any one of claims 1-6, wherein, The bearing member (22) comprises a bearing plate (221), the bearing plate (221) is provided with a bearing groove (2211), the bearing groove (2211) is used for embedding a base sheet, the shape of the base sheet is matched with the shape of the bearing groove (2211), and the base sheet is used for connecting and fixing the sample.

8. The angle adjustable tooling for FIB-EBSD of claim 7, wherein, The carrier (22) further comprises a pressing plate which is detachably connected to the opening edge of the carrier groove (2211), and the pressing plate is used for applying pressure to the sample in the direction towards the substrate sheet.

9. The angle adjustable tooling for FIB-EBSD of claim 7, wherein, The carrier (22) further comprises a fixing disc (222), the top surface of the fixing disc (222) is vertically connected to the carrier plate (221), and the bottom surface of the fixing disc (222) is connected to the pedestal (21).

10. The angle adjustable tooling for FIB-EBSD of claim 9, wherein, The bottom surface of the fixing disc (222) is protrusively provided with a first peg column (223), the first peg column (223) is connected with a third magnetic attraction part (224), the pedestal (21) has a counterbore (2121), the counterbore (2121) is provided with a fourth magnetic attraction part, the first peg column (223) is inserted into the counterbore (2121), and the third magnetic attraction part (224) is magnetically adsorbed with the fourth magnetic attraction part; Alternatively, the bottom surface of the fixing disc (222) is protrusively provided with a threaded column, the pedestal (21) has a threaded mounting hole, and the threaded column is threadedly connected into the threaded mounting hole; And / or, the carrier (22) further comprises a threaded fastener (225), the bottom surface of the fixing disc (222) is recessively provided with a plurality of threaded holes (2221), the pedestal (21) has a mounting through hole (2122), and the threaded fastener (225) is threadedly connected to the threaded holes (2221) through the mounting through hole (2122).

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