Display panel and display device

Abstract

The invention relates to a display panel and a display device. The display panel comprises a display area and a first non-display area, and the display area is arranged around the first non-display area; the first non-display area comprises a substrate; the first metal layer is arranged on one side of the substrate; the first metal layer comprises a first signal line; the planarization layer is arranged on one side, far away from the substrate, of the first metal layer; at least part of the functional film layer is arranged on the side, away from the substrate, of the planarization layer; a first exhaust hole is formed in the functional film layer; the blocking layer is arranged on the side, close to the first exhaust hole, of the first signal line; the orthographic projection of the barrier layer on the substrate covers at least part of the orthographic projection of the first exhaust hole on the substrate, or the orthographic projection of the barrier layer on the substrate covers at least part of the orthographic projection of the first signal line on the substrate. The display panel is beneficial to improving the problem of poor display.

Description

Technical Field

[0001] This application relates to the field of display technology, and in particular to a display panel and display device. Background Technology

[0002] Organic Light Emitting Diode (OLED) display technology is considered the most promising next-generation flat panel display technology. Compared to liquid crystal displays, OLED technology has advantages such as low energy consumption, low cost, self-emissiveness, wide viewing angle, and fast response speed. However, current OLED display panels still suffer from display defects. Summary of the Invention

[0003] Therefore, it is necessary to provide a display panel and display device that can improve display defects.

[0004] In a first aspect, embodiments of this application provide a display panel, including a display area and a first non-display area, wherein the display area is disposed around the first non-display area, and the first non-display area includes:

[0005] substrate;

[0006] A first metal layer is disposed on one side of the substrate; the first metal layer includes a first signal line;

[0007] A planarization layer is disposed on the side of the first metal layer away from the substrate;

[0008] A functional film layer, at least a portion of which is disposed on the side of the planarization layer away from the substrate; the functional film layer is provided with a first vent hole;

[0009] A barrier layer is disposed on the side of the first signal line near the first vent hole; the orthographic projection of the barrier layer on the substrate covers at least a portion of the orthographic projection of the first vent hole on the substrate, or the orthographic projection of the barrier layer on the substrate covers at least a portion of the orthographic projection of the first signal line on the substrate.

[0010] The display panel provided in this application embodiment has a barrier layer provided on the side of the first signal line near the first vent hole. In this way, during the manufacturing process of the display panel, it can prevent corrosive elements (etching solution) from diffusing from the first vent hole towards the first signal line, thereby avoiding corrosion of the first signal line, ensuring the structural stability of the first signal line, and improving the problems of poor display and short service life caused by corrosion of the first signal line.

[0011] In one embodiment, the barrier layer is disposed on the side of the planarization layer away from the substrate, and at least a portion of the barrier layer is disposed within the first vent hole;

[0012] Optionally, a portion of the barrier layer is disposed on the side of the functional film layer away from the substrate.

[0013] In one embodiment, both the substrate and the planarization layer extend from the first non-display area to the display area;

[0014] The display area also includes an isolation structure disposed on the side of the planarization layer away from the substrate, and the barrier layer and the isolation structure are disposed in the same layer and made of the same material;

[0015] Optionally, the display area further includes a plurality of light-emitting elements, the isolation structure enclosing a plurality of isolation openings, and the plurality of light-emitting elements being correspondingly disposed within the plurality of isolation openings;

[0016] Optionally, the light-emitting element includes a first electrode, a light-emitting functional part, and a second electrode stacked along a direction away from the substrate, wherein the second electrode is electrically connected to the isolation structure;

[0017] Optionally, the isolation structure includes a conductive portion and a blocking portion stacked along a direction away from the substrate, wherein the outer contour of the orthographic projection of the blocking portion on the substrate is located outside the outer contour of the orthographic projection of the conductive portion on the substrate; the second electrode is electrically connected to the conductive portion;

[0018] Optionally, the barrier layer includes a first sub-layer and a second sub-layer stacked along a direction away from the substrate, wherein the first sub-layer is disposed in the same layer and with the same material as the conductive portion, and the second sub-layer is disposed in the same layer and with the same material as the blocking portion;

[0019] Optionally, the isolation structure further includes a base disposed between the conductive portion and the substrate, and the barrier layer further includes a third sub-layer disposed between the first sub-layer and the substrate, wherein the base and the third sub-layer are disposed in the same layer and made of the same material;

[0020] Optionally, the conductive part may be made of aluminum;

[0021] Optionally, the material of the blocking part includes at least one of titanium and molybdenum;

[0022] Optionally, the base may be made of at least one of titanium and molybdenum.

[0023] In one embodiment, the display area further includes a pixel defining layer disposed between the planarization layer and the isolation structure, the pixel defining layer enclosing a plurality of pixel openings, and the plurality of light-emitting elements being disposed correspondingly within the plurality of pixel openings;

[0024] Optionally, the pixel defining layer and the functional film layer are disposed in the same layer and made of the same material.

[0025] In one embodiment, the barrier layer is disposed between the first signal line and the planarization layer;

[0026] Optionally, the barrier layer covers the surface of the first signal line away from the substrate and the surfaces on both sides of the first signal line along its width direction; the width direction of the first signal line is perpendicular to the thickness direction of the substrate and the extension direction of the first signal line.

[0027] Optionally, the barrier layer may be made of inorganic non-metallic materials;

[0028] Optionally, the barrier layer may be made of at least one of silicon nitride and silicon oxide.

[0029] In one embodiment, the first metal layer extends from the first non-display area to the display area;

[0030] The display area further includes a first insulating layer and a second metal layer disposed between the first metal layer and the planarization layer; the first insulating layer is used to insulate the first metal layer and the second metal layer.

[0031] The barrier layer is made of the same material as the first insulating layer.

[0032] In one embodiment, the barrier layer is made of inorganic materials;

[0033] Optionally, the material of the barrier layer includes at least one of metal, nitride, and oxide;

[0034] Optionally, the barrier layer is made of at least one of titanium, aluminum, and molybdenum, or the barrier layer is made of at least one of silicon nitride and silicon oxide.

[0035] In one embodiment, the first non-display area includes a punch-hole area and a transition area, wherein the transition area is disposed between the display area and the punch-hole area;

[0036] Both the first signal line and the first exhaust port are located in the transition region;

[0037] Optionally, the transition area surrounds the periphery of the cutout area, and the display area surrounds the periphery of the transition area.

[0038] In one embodiment, the first signal line surrounds a portion of the outer periphery of the cut-out area;

[0039] Optionally, the first metal layer extends from the first non-display area to the display area; the first metal layer further includes a second signal line, at least a portion of which is located in the display area; both ends of the first signal line are connected to the second signal line.

[0040] Optionally, the first signal line transmits data signals.

[0041] In one embodiment, the first non-display area further includes a dam disposed in the transition area, the dam surrounding the periphery of the cutout area and located on the side of the first signal line closer to the cutout area;

[0042] Optionally, the planarization layer is spaced apart from the dam; the functional membrane layer also extends onto the dam.

[0043] Secondly, embodiments of this application provide a display panel, including:

[0044] substrate;

[0045] A first metal layer is disposed on one side of the substrate; the first metal layer includes a first signal line;

[0046] A planarization layer is disposed on the side of the first metal layer away from the substrate;

[0047] A functional film layer, at least a portion of which is disposed on the side of the planarization layer away from the substrate; the functional film layer is provided with vent holes, and the orthographic projection of the vent holes on the substrate does not overlap with the orthographic projection of the first signal line on the substrate.

[0048] The display panel provided in this application embodiment ensures that the orthographic projection of the vent hole on the substrate does not overlap with the orthographic projection of the first signal line on the substrate. In this way, during the manufacturing process of the display panel, it increases the difficulty for the etching element (etching solution) to diffuse from the first vent hole to the first signal line, thereby reducing the corrosion of the first signal line by the etching element. This helps to ensure the structural stability of the first signal line and thus helps to improve the problems of poor display and short service life caused by the corrosion of the first signal line.

[0049] In one embodiment, the display panel includes a display area and a first non-display area, the display area being disposed around the first non-display area, the first non-display area including a punch-hole area and a transition area, the transition area being disposed between the display area and the punch-hole area;

[0050] The first signal line is located in the transition area, and the exhaust port is located in the display area;

[0051] Optionally, the transition area surrounds the periphery of the cutout area, and the display area surrounds the periphery of the transition area.

[0052] In one embodiment, the first signal line surrounds a portion of the outer periphery of the cut-out area;

[0053] Optionally, the first metal layer further includes a second signal line, at least a portion of which is located in the display area; both ends of the first signal line are connected to the second signal line.

[0054] Optionally, the first signal line transmits data signals.

[0055] In one embodiment, the display panel further includes a dam disposed in the transition area, the dam surrounding the periphery of the cutout area and located on the side of the first signal line closer to the cutout area;

[0056] Optionally, the planarization layer is spaced apart from the dam; the functional membrane layer also extends onto the dam.

[0057] In one embodiment, the display panel further includes an isolation structure and a plurality of light-emitting elements disposed on the side of the planarization layer away from the substrate, and the isolation structure and the plurality of light-emitting elements are both located in the display area; the isolation structure encloses to form a plurality of isolation openings, and the plurality of light-emitting elements are correspondingly disposed within the plurality of isolation openings;

[0058] Optionally, the light-emitting element includes a first electrode, a light-emitting functional part, and a second electrode stacked along a direction away from the substrate, wherein the second electrode is electrically connected to the isolation structure;

[0059] Optionally, the isolation structure includes a conductive portion and a blocking portion stacked along a direction away from the substrate, wherein the outer contour of the orthographic projection of the blocking portion on the substrate is located outside the outer contour of the orthographic projection of the conductive portion on the substrate; the second electrode is electrically connected to the conductive portion; the second electrode is electrically connected to the conductive portion;

[0060] Optionally, the isolation structure further includes a base disposed between the conductive portion and the substrate;

[0061] Optionally, the conductive part may be made of aluminum;

[0062] Optionally, the material of the blocking part includes at least one of titanium and molybdenum;

[0063] Optionally, the base may be made of at least one of titanium and molybdenum.

[0064] Thirdly, embodiments of this application provide a display device, including the display panel from either the first or second aspect of the embodiment. The display device provided by embodiments of this application can improve the problems of poor display and short service life caused by corrosion of the first signal line. Attached Figure Description

[0065] To more clearly illustrate the technical solutions in the embodiments or exemplary embodiments of this application, the drawings used in the description of the embodiments or exemplary embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0066] Figure 1 This is a plan view of a display panel provided in one embodiment of this application.

[0067] Figure 2 for Figure 1 A schematic diagram of a cross-sectional structure of the transition area of ​​the display panel shown.

[0068] Figure 3 for Figure 1 A schematic diagram of a cross-sectional structure of the display area of ​​the display panel shown.

[0069] Figure 4 for Figure 2 The diagram shows a cross-sectional structure of the barrier layer.

[0070] Figure 5 for Figure 1 This is a schematic diagram of another cross-sectional structure of the transition area of ​​the display panel.

[0071] Figure 6 for Figure 1 This is another cross-sectional structural diagram of the transition area of ​​the display panel shown.

[0072] Figure 7 This application provides a plan view of another display panel according to an embodiment of the present application.

[0073] Figure 8 This is a schematic diagram of the structure of a display device provided in an embodiment of this application.

[0074] Explanation of reference numerals in the attached figures:

[0075] 1. Display device; 10. Display panel; 10a. Display area; 10b. First non-display area; 10b1. Transition area; 10b2. Hole area; 11. Array substrate; 111. Substrate; 112. First metal layer; 1121. First signal line; 1122. Second signal line; 1123. Third signal line; 113. Planarization layer; 114. Second metal layer; 115. First insulating layer; 116. Semiconductor layer; 117. Second insulating layer; 118. Third metal layer; 119. Third insulating layer; 111 0. Fourth metal layer; 1111. Fourth insulating layer; 12. Functional film layer; 12a. Vent hole; 12a1. First vent hole; 13. Barrier layer; 131. First sub-layer; 132. Second sub-layer; 14. Isolation structure; 14a. Isolation opening; 141. Conductive part; 142. Blocking part; 15. Light-emitting element; 151. First electrode; 152. Light-emitting functional part; 153. Second electrode; 16. Encapsulation part; 17. Pixel limiting layer; 18. First encapsulation layer; 19. Second encapsulation layer; 110. Dam. Detailed Implementation

[0076] To facilitate understanding of this application, a more complete description will be provided below with reference to the accompanying drawings. Preferred embodiments of this application are shown in the drawings. However, this application can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided to provide a thorough and complete understanding of the disclosure of this application.

[0077] It should be understood that although the terms “first,” “second,” etc., may be used herein to describe various elements, this does not indicate any order, quantity, or importance, but is merely used to distinguish different components. These terms are used only to distinguish one element from another. For example, without departing from the scope of this application, a first element may be referred to as a second element, and similarly, a second element may be referred to as a first element. Words such as “comprising” or “including” mean that the element or object preceding the word covers the element or object listed following the word and its equivalents, without excluding other elements or objects.

[0078] With the increasing demand for high screen-to-body ratios, full-screen displays and narrow bezels have become mainstream design trends. One related technology is the under-display camera (UDC) technology, where the camera is placed under the screen. UDC technology eliminates the need to place the camera on the bezel of smartphones and other devices, thus enabling full-screen devices. Specifically, the display panel has a punch-hole area, a transition area, and a display area, with the transition area surrounding the punch-hole area and the display area surrounding the transition area. The under-display camera is located in the punch-hole area. The display area has red, green, and blue sub-pixels. These red, green, and blue sub-pixels are sequentially fabricated using a patterned process. However, this type of display panel suffers from display defects.

[0079] The inventors discovered through research that the display defects were caused by the corrosion of the signal lines in the transition area. Furthermore, since the transition area has vent holes, during the process of fabricating sub-pixels using patterning technology, the etching solution can easily penetrate from the vent holes into the signal lines, causing corrosion to the signal lines.

[0080] To address the aforementioned problems, this application provides a display panel and a display device, and the embodiments will be described below with reference to the accompanying drawings.

[0081] The composition and preparation of the isolation structure mentioned below are specified in patents CN118251982A, 202410864269.8, PCT / CN2024 / 098407, PCT / CN2024 / 102783, PCT / CN2024 / 098217, PCT / CN2024 / 099419, and PCT / CN2024 / 099072. Further descriptions are provided in CN117979755A, CN117998900A, CN117062489A, CN117580403A, CN116583155A, CN116669477A, ​​CN117396039A, CN116669480A, CN116600606A, and CN117500332A for reference.

[0082] Firstly, referring to Figure 1 and Figure 2 As shown, this application embodiment provides a display panel 10, which may be an organic light-emitting diode display panel 10 (OLED) or a quantum dot light-emitting diode display panel 10 (QLED).

[0083] The display panel 10 includes a display area 10a and a first non-display area 10b, with the display area 10a surrounding the first non-display area 10b. The first non-display area 10b includes a substrate 111, a first metal layer 112, a planarization layer 113, a functional film layer 12, and a barrier layer 13. The first metal layer 112 is disposed on one side of the substrate 111. The first metal layer 112 includes a first signal line 1121. The planarization layer 113 is disposed on the side of the first metal layer 112 away from the substrate 111. At least a portion of the functional film layer 12 is disposed on the side of the planarization layer 113 away from the substrate 111; the functional film layer 12 has a first vent hole 12a1. The barrier layer 13 is disposed on the side of the first signal line 1121 near the first vent hole 12a1. The orthographic projection of the barrier layer 13 on the substrate 111 covers at least a portion of the orthographic projection of the first vent hole 12a1 on the substrate 111, or the orthographic projection of the barrier layer 13 on the substrate 111 covers at least the orthographic projection of the first vent hole 12a1 on the substrate 111. The barrier layer 13 is used to prevent corrosive elements from diffusing from the first vent hole 12a1 toward the first signal line 1121.

[0084] It is understood that the display panel 10 may include an array substrate 11, which includes a substrate 111, a first metal layer 112, and a planarization layer 113. The display panel 10 may also include a second non-display area (not shown), which is disposed around the display area 10a.

[0085] It should be noted that during the manufacturing process of the display panel 10, the planarization layer 113 absorbs moisture, and the first vent 12a1 is used to release the moisture in the planarization layer 113. The functional film layer 12 can be used to block external moisture from diffusing towards the first metal layer 112. The barrier layer 13 refers to a film layer that can block the diffusion of corrosive elements (such as etching solutions).

[0086] The display panel 10 provided in this embodiment of the application has a barrier layer 13 provided on the side of the first signal line 1121 near the first vent 12a1. In this way, during the manufacturing process of the display panel 10, the corrosive elements (etching solution) can be prevented from diffusing from the first vent 12a1 towards the first signal line 1121, thereby avoiding corrosion of the first signal line 1121 by the corrosive elements (etching solution), ensuring the structural stability of the first signal line 1121, preventing the first signal line 1121 from breaking, and improving the problems of poor display and short service life caused by corrosion of the first signal line 1121.

[0087] It should be noted that the substrate 111 can be a flexible substrate 111, such as a polyimide (PI) substrate 111, a polyethylene terephthalate (PET) substrate 111, or a polymethyl methacrylate (PMMA) substrate 111. The substrate 111 can also be a rigid substrate 111, such as glass.

[0088] In one embodiment, such as Figure 1 As shown, the first non-display area 10b includes a cutout area 10b2 and a transition area 10b1, with the transition area 10b1 located between the display area 10a and the cutout area 10b2. The first signal line 1121 and the first vent hole 12a1 are both located in the transition area 10b1. It is understood that at least part of the barrier layer 13 is also located in the transition area 10b1.

[0089] Thus, during the fabrication of the light-emitting element 15 (sub-pixel) using a patterning process, the barrier layer 13 can prevent the etching solution from diffusing from the first vent hole 12a1 to the first signal line 1121, ensuring the structural stability of the first signal line 1121, preventing the first signal line 1121 from breaking, and improving the problems of poor display and short service life caused by the corrosion of the first signal line 1121.

[0090] In one embodiment, the orthographic projection of the first vent 12a1 on the substrate 111 overlaps with the orthographic projection of the first signal line 1121 on the substrate 111. This facilitates the arrangement of the first vent 12a1 and the first signal line 1121 within a limited space.

[0091] In one embodiment, the transition area 10b1 surrounds the periphery of the cutout area 10b2, and the display area 10a surrounds the periphery of the transition area 10b1.

[0092] For example, the projection shape of the transition region 10b1 onto the substrate 111 can be a circle, a rectangle, a triangle, etc.

[0093] In one embodiment, such as Figure 1 As shown, the first signal line 1121 surrounds a portion of the outer periphery of the punched area 10b2. This allows the first signal line 1121 to bypass the punched area 10b2. Exemplarily, the orthographic projection of the first signal line 1121 onto the substrate 111 can be arc-shaped or quasi-arc-shaped.

[0094] In one embodiment, such as Figure 1As shown, the first metal layer 112 also includes a second signal line 1122, at least a portion of which is located in the display area 10a. Both ends of the first signal line 1121 are connected to the second signal line 1122; that is, one end of the first signal line 1121 is connected to a second signal line 1122, and the other end of the first signal line 1121 is also connected to a second signal line 1122.

[0095] Specifically, the second signal line 1122 extends along the first direction X, and both ends of the first signal line 1121 along the first direction X are connected to the second signal line 1122. It can be considered that one first signal line 1121 and two second signal lines 1122 together constitute a complete signal line.

[0096] It should be noted that the transition area 10b1 is provided with multiple first signal lines 1121. A portion of these first signal lines 1121 are located on one side of the perforated area 10b2 along the second direction Y, while another portion is located on the other side of the perforated area 10b2 along the second direction Y. It can be understood that the first metal layer 112 also includes multiple third signal lines 1123 located in the display area 10a. These third signal lines 1123 are arranged at intervals along the second direction Y, and each third signal line 1123 extends along the first direction X. The third signal lines 1123, first signal lines 1121, and second signal lines 1122 transmit the same signals. The extension length of the third signal line 1123 in the first direction X is the same as the sum of the extension lengths of the first signal lines 1121 and second signal lines 1122 in the first direction.

[0097] In one embodiment, the first signal line 1121 transmits a data signal.

[0098] In one embodiment, the barrier layer 13 is made of an inorganic material. This allows the barrier layer 13 to have a better barrier function.

[0099] In one embodiment, the barrier layer 13 is made of at least one of metal, nitride, and oxide.

[0100] Optionally, the barrier layer 13 may be made of at least one of titanium, aluminum, and molybdenum. Exemplarily, the barrier layer 13 may be a stacked structure composed of titanium / aluminum / titanium, a stacked structure composed of molybdenum / aluminum / molybdenum, or a stacked structure composed of molybdenum / aluminum / titanium.

[0101] Optionally, the barrier layer 13 may be made of at least one of silicon nitride and silicon oxide.

[0102] In one embodiment, reference Figure 2As shown, the barrier layer 13 is disposed on the side of the planarization layer 113 away from the substrate 111, and at least a portion of the barrier layer 13 is disposed within the first vent hole 12a1. This effectively seals the first vent hole 12a1 through the barrier layer 13, preventing the etching solution from entering the planarization layer 113 from the first vent hole 12a1, thereby avoiding corrosion of the first signal line 1121 by the etching solution. Furthermore, the barrier layer 13 also protects the planarization layer 113, preventing damage to the planarization layer 113 caused by the dry etching process.

[0103] It is understandable that the barrier layer 13 can completely block the first exhaust port 12a1, or block most of the pores of the first exhaust port 12a1.

[0104] In one embodiment, the orthographic projection of the barrier layer 13 onto the substrate 111 covers the entire orthographic projection of the first vent hole 12a1 onto the substrate 111. This ensures that the barrier layer 13 completely seals the first vent hole 12a1, thereby completely preventing the etching solution from entering the planarization layer 113 from the first vent hole 12a1.

[0105] In one embodiment, a portion of the barrier layer 13 is disposed on the side of the functional film layer 12 away from the substrate 111. Specifically, the barrier layer 13 not only covers the first vent 12a1, but also covers a portion of the functional film layer 12 surrounding the first vent 12a1. In this way, the adhesion area of ​​the barrier layer 13 can be increased, and the connection stability of the barrier layer 13 can be improved.

[0106] In one embodiment, both the substrate 111 and the planarization layer 113 extend from the first non-display area 10b to the display area 10a. (Refer to...) Figure 3 As shown, the display area 10a includes an isolation structure 14 disposed on the side of the planarization layer 113 away from the substrate 111. The barrier layer 13 and the isolation structure 14 are disposed on the same layer and made of the same material. In this way, the barrier layer 13 and the isolation structure 14 can be fabricated simultaneously in the same process, which helps to reduce manufacturing costs.

[0107] Optionally, the isolation structure 14 includes a conductive portion 141 and a blocking portion 142 stacked along a direction away from the substrate 111. The outer contour of the orthographic projection of the blocking portion 142 on the substrate 111 is located outside the outer contour of the orthographic projection of the conductive portion 141 on the substrate 111.

[0108] Optionally, the conductive part 141 may be made of aluminum.

[0109] Optionally, the material of the blocking part 142 includes at least one of titanium and molybdenum.

[0110] Optionally, the isolation structure 14 further includes a base (not shown), which is disposed between the conductive portion 141 and the substrate 111. The base is made of at least one of titanium and molybdenum.

[0111] Optionally, the isolation structure 14 is electrically connected to a fixed potential.

[0112] Optionally, the display area 10a further includes a plurality of light-emitting elements 15, and the isolation structure 14 encloses and forms a plurality of isolation openings 14a, with the plurality of light-emitting elements 15 correspondingly disposed within the plurality of isolation openings 14a. In this way, when the light-emitting material of the light-emitting element 15 is deposited, the isolation structure 14 can isolate the light-emitting material of the light-emitting element 15.

[0113] It should be noted that the correspondence between the light-emitting element 15 and the isolation opening 14a can be "many to one" or "one to one".

[0114] Optionally, refer to Figure 4 As shown, the barrier layer 13 includes a first sub-layer 131 and a second sub-layer 132 stacked along the direction away from the substrate 111. The first sub-layer 131 is disposed in the same layer and with the same material as the conductive portion 141, and the second sub-layer 132 is disposed in the same layer and with the same material as the blocking portion 142.

[0115] Optionally, the barrier layer 13 further includes a third sublayer (not shown) disposed between the first sublayer 131 and the substrate 111. The base and the third sublayer are made of the same material.

[0116] In one embodiment, the light-emitting element 15 includes a first electrode 151, a light-emitting functional part 152, and a second electrode 153 stacked along a direction away from the substrate 111, and the second electrode 153 is electrically connected to the isolation structure 14.

[0117] It should be noted that the first electrode 151 can be an anode, the second electrode 153 can be a cathode, and the light-emitting functional unit 152 includes at least an emission layer (EML). In addition, it may include one or more of the following: a hole injection layer (HIL), a hole transport layer (HTL), an electron injection layer (EIL), an electron transport layer (ETL), a hole block layer (HBL), and an electron block layer (EBL). Alternatively, the light-emitting functional unit 152 may also be a stacked light-emitting structure, that is, it includes at least two emission layers and a charge generation layer (CGL) located between adjacent emission layers.

[0118] In one embodiment, the display area 10a further includes a pixel defining layer 17 disposed between the planarization layer 113 and the isolation structure 14. The pixel defining layer 17 encloses a plurality of pixel openings, and a plurality of light-emitting elements 15 are correspondingly disposed within the plurality of pixel openings. Exemplarily, the light-emitting elements 15 are disposed one-to-one with the pixel openings.

[0119] In one embodiment, the pixel defining layer 17 and the functional film layer 12 are disposed in the same layer and made of the same material. In this way, the pixel defining layer 17 and the functional film layer 12 can be fabricated simultaneously in the same process, thereby reducing manufacturing costs.

[0120] In one embodiment, the pixel defining layer 17 is provided with a second vent 12a (not shown in the figure), which is used to release water vapor in the planarization layer 113 below the pixel defining layer 17.

[0121] In one example, during the fabrication of the light-emitting element 15 using a patterning process, a protective film layer (such as photoresist) is usually covered on the second vent hole 12a, so that the etching solution will not enter the planarization layer 113 from the second vent hole 12a.

[0122] In one embodiment, reference Figure 5 As shown, the first non-display area 10b also includes a dam 110 disposed in the transition area 10b1. The dam 110 surrounds the periphery of the perforated area 10b2 and is located on the side of the first signal line 1121 near the perforated area 10b2. By providing the dam 110, the overflow of organic materials can be prevented. It is understood that the dam 110 can be one or more rings, and the number of dams 110 is not limited in this embodiment.

[0123] In one embodiment, the planarization layer 113 is spaced apart from the dam 110. The functional film layer 12 also extends onto the dam 110. Thus, the functional film layer 12 can wrap around the side of the planarization layer 113 near the dam 110, improving encapsulation performance.

[0124] In one embodiment, reference Figure 6 As shown, the barrier layer 13 is disposed between the first signal line 1121 and the planarization layer 113.

[0125] Furthermore, the orthographic projection of the barrier layer 13 on the substrate 111 covers the entire orthographic projection of the first signal line 1121 on the substrate 111.

[0126] Thus, during the fabrication of the light-emitting element 15 (sub-pixel) using a patterning process, the etching solution can enter the planarization layer 113 along the first vent hole 12a1, but cannot diffuse from the planarization layer 113 to the first signal line 1121, thereby preventing the etching solution from corroding the first signal line 1121.

[0127] In one embodiment, the barrier layer 13 covers the surface of the first signal line 1121 away from the substrate 111 and the surfaces on both sides of the first signal line 1121 along its width direction; the width direction of the first signal line 1121 is perpendicular to the thickness direction of the substrate 111 and the extension direction of the first signal line 1121. Figure 6 In this design, the width direction of the first signal line 1121 is horizontal. The surface of the first signal line 1121 away from the substrate 111 is the top surface, and the surfaces on both sides of the first signal line 1121 along its width direction are the side surfaces. Generally, the top and side surfaces of the first signal line 1121 are most susceptible to corrosion. This design protects the most easily corroded surfaces of the first signal line 1121, thereby maximizing the prevention of corrosion of the first signal line 1121 by the etching solution.

[0128] Optionally, the barrier layer 13 may be made of inorganic non-metallic materials. In this way, the barrier layer 13 can have a good blocking function, and the barrier layer 13 can avoid electrical signal interference to the first signal line 1121.

[0129] Optionally, the barrier layer 13 may be made of at least one of silicon nitride and silicon oxide.

[0130] In one embodiment, the first metal layer 112 extends from the first non-display area 10b to the display area 10a. (See also...) Figure 3 As shown, the display area 10a also includes a first insulating layer 115 and a second metal layer 114 disposed between the first metal layer 112 and the planarization layer 113. The first insulating layer 115 is used to insulate the first metal layer 112 and the second metal layer 114. The barrier layer 13 is disposed in the same layer and with the same material as the first insulating layer 115. In this way, the barrier layer 13 and the first insulating layer 115 can be fabricated simultaneously in the same process, which helps to reduce manufacturing costs. It is understood that the first insulating layer 115 and the second metal layer 114 are part of the array substrate 11.

[0131] In one embodiment, the second metal layer 114 may include power signal lines.

[0132] In one embodiment, reference Figure 3As shown, the array substrate 11 further includes a semiconductor layer 116, a second insulating layer 117, a third metal layer 118, a third insulating layer 119, a fourth metal layer 1110, and a fourth insulating layer 1111 stacked on the substrate 111. The driving circuit of the display panel 10 can be disposed in each film layer of the array substrate 11.

[0133] In one embodiment, such as Figure 3 As shown, the display area 10a further includes an encapsulation portion 16, which is disposed on the side of the light-emitting element 15 away from the substrate 111, and encapsulates the light-emitting element 15. Further, the display area 10a also includes a first encapsulation layer 18 and a second encapsulation layer 19 stacked on the side of the encapsulation portion 16 away from the substrate 111. The first encapsulation layer 18 is an organic encapsulation layer, and the second encapsulation layer 19 is an inorganic encapsulation layer.

[0134] It should be noted that, in the accompanying drawings provided in the embodiments of this application, Figure 2 , Figure 5 and Figure 6 This is just a simplified illustration of the cross-sectional structure of the display panel 10; other film layers between the substrate 111 and the first metal layer 112 (or planarization layer 113) are not shown.

[0135] Secondly, referring to Figure 7 As shown, this application embodiment provides a display panel 10, which includes a substrate 111, a first metal layer 112, a planarization layer 113, and a functional film layer 12. The first metal layer 112 is disposed on one side of the substrate 111; the first metal layer 112 includes a first signal line 1121. The planarization layer 113 is disposed on the side of the first metal layer 112 away from the substrate 111; at least a portion of the functional film layer 12 is disposed on the side of the planarization layer 113 away from the substrate 111; the functional film layer 12 is provided with an exhaust hole 12a, and the orthographic projection of the exhaust hole 12a on the substrate 111 does not overlap with the orthographic projection of the first signal line 1121 on the substrate 111.

[0136] For example, the functional film layer 12 may be an encapsulation film layer used to block external moisture from diffusing into the first metal layer 112. Alternatively, the functional film layer 12 may be a pixel defining layer, with pixel openings on the functional film layer 12 for defining the light-emitting area of ​​the light-emitting element 15.

[0137] The display panel 10 provided in this application embodiment ensures that the orthographic projection of the vent hole 12a on the substrate 111 does not overlap with the orthographic projection of the first signal line 1121 on the substrate 111. In this way, during the manufacturing process of the display panel 10, the difficulty of the etching element (etching solution) diffusing from the first vent hole 12a1 to the first signal line 1121 is increased, thereby reducing the corrosion of the first signal line 1121 by the etching element (etching solution). This helps to ensure the structural stability of the first signal line 1121, and further helps to improve the problems of poor display and short service life caused by the corrosion of the first signal line 1121.

[0138] It is understood that the display panel 10 may include an array substrate 11, which includes a substrate 111, a first metal layer 112, and a planarization layer 113. The display panel 10 may also include a second non-display area (not shown), which is disposed around the display area 10a.

[0139] In one embodiment, such as Figure 7 As shown, the display panel 10 includes a display area 10a and a first non-display area 10b. The first non-display area 10b includes a cutout area 10b2 and a transition area 10b1, with the transition area 10b1 located between the display area 10a and the cutout area 10b2. A first signal line 1121 is located in the transition area 10b1, and an vent 12a is located in the display area 10a. This is equivalent to having an vent 12a in the display area 10a but not in the transition area 10b1. This prevents etching solution from seeping into the planarization layer 113 from the transition area 10b1, thereby avoiding corrosion of the first signal line 1121 by the etching solution.

[0140] In one embodiment, the transition region 10b1 surrounds the periphery of the perforated region 10b2, and the display region 10a surrounds the periphery of the transition region 10b1. Exemplarily, the projection shape of the transition region 10b1 on the substrate 111 can be a circle, a rectangle, a triangle, etc.

[0141] In one embodiment, the first signal line 1121 surrounds a portion of the outer periphery of the punched area 10b2. This allows the first signal line 1121 to bypass the punched area 10b2. Exemplarily, the orthographic projection of the first signal line 1121 onto the substrate 111 can be arc-shaped or quasi-arc-shaped.

[0142] In one embodiment, the first metal layer 112 further includes a second signal line 1122, at least a portion of which is located in the display area 10a; both ends of the first signal line 1121 are connected to the second signal line 1122.

[0143] Specifically, the second signal line 1122 extends along the first direction X, and both ends of the first signal line 1121 along the first direction X are connected to the second signal line 1122. It can be considered that one first signal line 1121 and two second signal lines 1122 together constitute a complete signal line.

[0144] It should be noted that the transition area 10b1 is provided with multiple first signal lines 1121. A portion of these first signal lines 1121 are located on one side of the perforated area 10b2 along the second direction Y, while another portion is located on the other side of the perforated area 10b2 along the second direction Y. It can be understood that the first metal layer 112 also includes multiple third signal lines 1123 located in the display area 10a. These third signal lines 1123 are arranged at intervals along the second direction Y, and each third signal line 1123 extends along the first direction X. The third signal lines 1123, first signal lines 1121, and second signal lines 1122 transmit the same signals. The extension length of the third signal line 1123 in the first direction X is the same as the sum of the extension lengths of the first signal lines 1121 and second signal lines 1122 in the first direction.

[0145] In one example, the orthographic projection of the vent hole 12a on the substrate 111 and the orthographic projection of the third signal line 1123 on the substrate 111 can overlap. During the fabrication of the light-emitting element 15 using a patterning process, the display area 10a is usually covered with a protective film layer (such as photoresist), and the vent hole 12a is blocked, so the etching solution will not enter the planarization layer 113 from the vent hole 12a.

[0146] In one embodiment, the first signal line 1121 transmits a data signal.

[0147] In one embodiment, the display panel 10 may further include a dam 110 disposed in the transition area 10b1, the dam 110 surrounding the periphery of the perforated area 10b2 and located on the side of the first signal line 1121 near the perforated area 10b2. By providing the dam 110, the overflow of organic materials can be prevented. It is understood that the dam 110 may be one or more rings, and the number of dams 110 is not limited in this embodiment.

[0148] In one embodiment, the planarization layer 113 is spaced apart from the dam 110; the functional film layer 12 also extends onto the dam 110. Thus, the functional film layer 12 can wrap around the side of the planarization layer 113 near the dam 110, improving encapsulation performance.

[0149] In one embodiment, the display panel 10 further includes an isolation structure 14 and a plurality of light-emitting elements 15 disposed on the side of the planarization layer 113 away from the substrate 111, both located in the display area 10a. The isolation structure 14 encloses a plurality of isolation openings 14a, and the plurality of light-emitting elements 15 are correspondingly disposed within the plurality of isolation openings 14a. Thus, when the light-emitting material of the light-emitting elements 15 is deposited, the isolation structure 14 can isolate the light-emitting material of the light-emitting elements 15.

[0150] It should be noted that the correspondence between the light-emitting element 15 and the isolation opening 14a can be "many to one" or "one to one".

[0151] It is understood that the structure of the isolation structure 14 in the second aspect embodiment may be the same as that of the isolation structure 14 in the first aspect embodiment, and will not be described again here.

[0152] In one embodiment, the light-emitting element 15 includes a first electrode 151, a light-emitting functional part 152, and a second electrode 153 stacked along a direction away from the substrate 111, and the second electrode 153 is electrically connected to the isolation structure 14.

[0153] It should be noted that the first electrode 151 can be an anode, the second electrode 153 can be a cathode, and the light-emitting functional unit 152 includes at least an emission layer (EML). In addition, it may include one or more of the following: a hole injection layer (HIL), a hole transport layer (HTL), an electron injection layer (EIL), an electron transport layer (ETL), a hole block layer (HBL), and an electron block layer (EBL). Alternatively, the light-emitting functional unit 152 may also be a stacked light-emitting structure, that is, it includes at least two emission layers and a charge generation layer (CGL) located between adjacent emission layers.

[0154] Thirdly, referring to Figure 8 As shown, this application provides a display device 1, including a display panel 10 as described in either the first or second aspect embodiment.

[0155] The display device 1 can be a laptop computer, mobile phone, wireless device, personal digital assistant (PDA), handheld or portable computer, GPS receiver / navigator, camera, MP4 video player, camcorder, game console, watch, clock, calculator, TV monitor, flat panel display, computer monitor, car display (e.g., odometer display, etc.), navigator, cockpit controller and / or display, camera view display (e.g., display of a rearview camera in a vehicle), electronic photograph, electronic billboard or sign, projector, etc.

[0156] The embodiments described above are merely illustrative of several implementation methods of this application, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this application, and these all fall within the protection scope of this application. Therefore, the protection scope of this patent application should be determined by the appended claims.

Claims

1. A display panel, comprising a display area and a first non-display area, wherein the display area is disposed around the first non-display area, characterized in that, The first non-display area includes: substrate; A first metal layer is disposed on one side of the substrate; the first metal layer includes a first signal line; A planarization layer is disposed on the side of the first metal layer away from the substrate; A functional film layer, at least a portion of which is disposed on the side of the planarization layer away from the substrate; the functional film layer is provided with a first vent hole; A barrier layer is disposed on the side of the first signal line near the first vent hole; the orthographic projection of the barrier layer on the substrate covers at least a portion of the orthographic projection of the first vent hole on the substrate, or the orthographic projection of the barrier layer on the substrate covers at least a portion of the orthographic projection of the first signal line on the substrate.

2. The display panel according to claim 1, characterized in that, The barrier layer is disposed on the side of the planarization layer away from the substrate, and at least a portion of the barrier layer is disposed within the first vent hole; Optionally, a portion of the barrier layer is disposed on the side of the functional film layer away from the substrate; Optionally, the orthographic projection of the barrier layer on the substrate covers the entire orthographic projection of the first vent hole on the substrate.

3. The display panel according to claim 2, characterized in that, Both the substrate and the planarization layer extend from the first non-display area to the display area; The display area includes an isolation structure disposed on the side of the planarization layer away from the substrate, and the barrier layer is at least partially disposed in the same layer and material as the isolation structure; Optionally, the display area further includes a plurality of light-emitting elements, the isolation structure enclosing a plurality of isolation openings, and the plurality of light-emitting elements being correspondingly disposed within the plurality of isolation openings; Optionally, the light-emitting element includes a first electrode, a light-emitting functional part, and a second electrode stacked along a direction away from the substrate, wherein the second electrode is electrically connected to the isolation structure; Optionally, the isolation structure includes a conductive portion and a blocking portion stacked along a direction away from the substrate, wherein the outer contour of the orthographic projection of the blocking portion on the substrate is located outside the outer contour of the orthographic projection of the conductive portion on the substrate; The second electrode is electrically connected to the conductive part; Optionally, the barrier layer includes a first sub-layer and a second sub-layer stacked along a direction away from the substrate, wherein the first sub-layer is disposed in the same layer and with the same material as the conductive portion, and the second sub-layer is disposed in the same layer and with the same material as the blocking portion; Optionally, the isolation structure further includes a base disposed between the conductive portion and the substrate, and the barrier layer further includes a third sub-layer disposed between the first sub-layer and the substrate, wherein the base and the third sub-layer are disposed in the same layer and made of the same material; Optionally, the conductive part may be made of aluminum; Optionally, the material of the blocking part includes at least one of titanium and molybdenum; Optionally, the base may be made of at least one of titanium and molybdenum.

4. The display panel according to claim 3, characterized in that, The display area further includes a pixel defining layer disposed between the planarization layer and the isolation structure, the pixel defining layer enclosing a plurality of pixel openings, and the plurality of light-emitting elements being disposed correspondingly within the plurality of pixel openings; Optionally, the pixel defining layer and the functional film layer are disposed in the same layer and made of the same material.

5. The display panel according to claim 1, characterized in that, The barrier layer is disposed between the first signal line and the planarization layer; Optionally, the orthographic projection of the barrier layer on the substrate covers the entire orthographic projection of the first signal line on the substrate; Optionally, the barrier layer covers the surface of the first signal line away from the substrate and the surfaces on both sides of the first signal line along its width direction; the width direction of the first signal line is perpendicular to the thickness direction of the substrate and the extension direction of the first signal line. Optionally, the barrier layer may be made of inorganic non-metallic materials; Optionally, the barrier layer may be made of at least one of silicon nitride and silicon oxide.

6. The display panel according to claim 5, characterized in that, The first metal layer extends from the first non-display area to the display area; The display area further includes a first insulating layer and a second metal layer disposed between the first metal layer and the planarization layer; the first insulating layer is used to insulate the first metal layer and the second metal layer. The barrier layer is made of the same material as the first insulating layer.

7. The display panel according to claim 1, characterized in that, The barrier layer is made of inorganic materials; Optionally, the material of the barrier layer includes at least one of metal, nitride, and oxide; Optionally, the barrier layer is made of at least one of titanium, aluminum, and molybdenum, or the barrier layer is made of at least one of silicon nitride and silicon oxide.

8. The display panel according to claim 1, characterized in that, The first non-display area includes a punch-hole area and a transition area, wherein the transition area is located between the display area and the punch-hole area; Both the first signal line and the first exhaust port are located in the transition region; Optionally, the orthographic projection of the first vent hole on the substrate and the orthographic projection of the first signal line on the substrate have an overlapping area; Optionally, the transition area surrounds the periphery of the cutout area, and the display area surrounds the periphery of the transition area.

9. The display panel according to claim 8, characterized in that, The first signal line surrounds a portion of the outer periphery of the drilled area; Optionally, the first metal layer extends from the first non-display area to the display area; the first metal layer further includes a second signal line, at least a portion of which is located in the display area; both ends of the first signal line are connected to the second signal line. Optionally, the first signal line transmits data signals.

10. The display panel according to claim 8, characterized in that, The first non-display area also includes a dam located in the transition area, the dam surrounding the periphery of the cut-out area and located on the side of the first signal line closer to the cut-out area; Optionally, the planarization layer is spaced apart from the dam; the functional membrane layer also extends onto the dam.

11. A display panel, characterized in that, include: substrate; A first metal layer is disposed on one side of the substrate; the first metal layer includes a first signal line; A planarization layer is disposed on the side of the first metal layer away from the substrate; A functional film layer, at least a portion of which is disposed on the side of the planarization layer away from the substrate; the functional film layer is provided with vent holes, and the orthographic projection of the vent holes on the substrate does not overlap with the orthographic projection of the first signal line on the substrate.

12. The display panel according to claim 11, characterized in that, The display panel includes a display area and a first non-display area, the display area being disposed around the first non-display area, the first non-display area including a punch-hole area and a transition area, the transition area being disposed between the display area and the punch-hole area; The first signal line is located in the transition area, and the exhaust port is located in the display area; Optionally, the transition area surrounds the periphery of the cutout area, and the display area surrounds the periphery of the transition area.

13. The display panel according to claim 12, characterized in that, The first signal line surrounds a portion of the outer periphery of the drilled area; Optionally, the first metal layer further includes a second signal line, at least a portion of which is located in the display area; both ends of the first signal line are connected to the second signal line. Optionally, the first signal line transmits data signals.

14. The display panel according to claim 12, characterized in that, The display panel also includes a dam disposed in the transition area, the dam surrounding the periphery of the cut-out area and located on the side of the first signal line closer to the cut-out area; Optionally, the planarization layer is spaced apart from the dam; the functional membrane layer also extends onto the dam.

15. The display panel according to claim 12, characterized in that, The display panel further includes an isolation structure and a plurality of light-emitting elements disposed on the side of the planarization layer away from the substrate, and the isolation structure and the plurality of light-emitting elements are all located in the display area; The isolation structure encloses and forms multiple isolation openings, and the multiple light-emitting elements are correspondingly disposed within the multiple isolation openings; Optionally, the light-emitting element includes a first electrode, a light-emitting functional part, and a second electrode stacked along a direction away from the substrate, wherein the second electrode is electrically connected to the isolation structure; Optionally, the isolation structure includes a conductive portion and a blocking portion stacked along a direction away from the substrate, wherein the outer contour of the orthographic projection of the blocking portion on the substrate is located outside the outer contour of the orthographic projection of the conductive portion on the substrate; the second electrode is electrically connected to the conductive portion; Optionally, the isolation structure further includes a base disposed between the conductive portion and the substrate; Optionally, the conductive part may be made of aluminum; Optionally, the material of the blocking part includes at least one of titanium and molybdenum; Optionally, the base may be made of at least one of titanium and molybdenum.

16. A display device, characterized in that, Includes the display panel as described in any one of claims 1-15.

Images