Micro-nano flexible structure continuous transfer printing equipment and preparation method thereof

Abstract

The invention provides micro-nano flexible structure continuous transfer printing equipment and a preparation method thereof, a photoetching platform is used for placing photoresist, a developing box is used for containing developing liquid, a laser working unit comprises a first moving mechanism and a laser head, the first moving mechanism is arranged on a base and is in driving connection with the laser head, and the second moving mechanism is arranged on the base and is in driving connection with the developing box. The photoresist conveying unit comprises a second moving mechanism and a suction cup, the second moving mechanism is arranged on the base and is in driving connection with the suction cup, and the continuous transfer control unit is in control connection with the laser working unit and the photoresist conveying unit and controls the first moving mechanism to drive the laser head to selectively irradiate photoresist on the photoetching platform. And controlling the second moving mechanism to drive the suction cup to move so as to enable a photosensitizer in the photoresist to generate a photochemical reaction, and controlling the second moving mechanism to drive the suction cup to move, so that the photoresist is conveyed to the developing box, and patterns in the photoresist layer are displayed. The method solves the limitation of the photoetching technology on the manufacturing of a curved surface or a flexible substrate, has high efficiency and expandability, and is suitable for the manufacturing of a large-area flexible micro-nano structure.

Description

Technical Field

[0001] This invention relates to the field of micro-nano manufacturing technology, and in particular to a continuous transfer printing device for micro-nano flexible structures and its preparation method. Background Technology

[0002] Photolithography, as a superior micro-nano fabrication technology, possesses the capability for highly precise manufacturing of micron-scale structures. It is widely used in various fields such as integrated circuits, optical devices, display manufacturing, photovoltaic power generation, and biochips, playing a crucial role in advancing electronic technology and promoting the development of related industries. The basic principle of photolithography is to utilize the properties of light, transferring the desired pattern onto the substrate through a series of steps including a light source, a mask, photosensitive materials, and development. Light passes through the transparent area of ​​the mask and illuminates the photosensitive material, triggering chemical or physical changes. The unexposed photosensitive material is then removed through the development process, ultimately forming the desired pattern. However, photolithography is primarily suitable for planar processing; achieving precise fabrication of photolithographic patterns directly on curved or flexible substrates is relatively difficult. This is because factors such as refraction and reflection of light on curved surfaces prevent the light from being accurately focused on the target location. Therefore, the applicability of photolithography is somewhat limited in applications requiring the fabrication of micro-nano structures on curved or flexible substrates.

[0003] Transfer printing, as an advanced process, is widely used in the fabrication of micro and nano devices. It employs flexible stamps as an intermediary to systematically transfer functional structures pre-prepared on donor substrates to acceptor substrates, thereby assembling micro and nano devices. Transfer printing technology boasts excellent compatibility, enabling it to be combined with various processing techniques. Whether it's simple nanowires, two-dimensional structures, or complex three-dimensional multilayer structures, transfer printing can achieve highly precise structure transfer and assembly. Therefore, transfer printing technology has become a flexible and powerful tool, providing strong support for the functional expansion and application broadening of micro and nano devices.

[0004] However, the application of transfer printing technology in nanowires, two-dimensional and three-dimensional structures is still in the experimental stage. Meanwhile, although optical lithography can achieve micro- and nano-level precision in planar processing—for example, my country's lithography machines are relatively mature and can be applied to processes with precision of 28 nanometers or 22 nanometers or even smaller—a series of problems exist when performing lithography on curved or flexible substrates. Due to factors such as variations in the light source's focal point and uneven coating, conventional lithography techniques cannot achieve the fabrication of precise two-dimensional or three-dimensional structures on curved or flexible substrates. Summary of the Invention

[0005] To enable the application of precise two-dimensional or three-dimensional structures on curved or flexible substrates, this invention proposes a continuous transfer device for micro-nano flexible structures and its preparation method.

[0006] To achieve the above objectives, in a first aspect, the present invention provides a continuous transfer apparatus for micro / nano flexible structures, comprising a base; a photolithography platform disposed on one side of the base for placing photoresist during photolithography operations; a developing tank disposed in the middle of the base for holding developing solution; a laser working unit comprising a first moving mechanism and a laser head, the first moving mechanism being disposed on the base and drivenly connected to the laser head; a photoresist delivery unit comprising a second moving mechanism and a suction cup, the second moving mechanism being disposed on the base and drivenly connected to the suction cup; and a continuous transfer control unit, controlled and connected to the laser working unit and the photoresist delivery unit, configured to control the first moving mechanism to drive the laser head to selectively irradiate the photoresist on the photolithography platform, so that the photosensitizer in the photoresist undergoes a photochemical reaction, and control the second moving mechanism to drive the suction cup to move, delivering the photoresist on the photolithography platform to the developing tank for dissolution of the photochemical reaction area, thereby revealing the pattern in the photoresist layer.

[0007] Furthermore, the support column of the first moving mechanism is fixedly connected to the base and extends upward. The x-axis guide rail is fixedly connected to the upper end of the support column. The lead screw motor is fixed to one side of the x-axis guide rail. The nut that meshes with the x-axis lead screw is fixedly connected to the y-axis guide rail. The bottom groove of the y-axis guide rail forms a sliding fit with the x-axis guide rail. The y-axis lead screw motor is fixed to one side of the y-axis guide rail. The nut that meshes with the y-axis lead screw is fixedly connected to the moving block. The moving block forms a groove connection with the y-axis guide rail. The laser head is fixedly connected to the moving block. The laser head is driven by the first moving mechanism to move in the x-axis and y-axis directions of the plane to selectively irradiate the photoresist on the photolithography platform 1.

[0008] Furthermore, the laser head includes: an adjustable laser as the light source for the laser head, emitting laser light of a specific wavelength; a beam corrector for correcting the incident direction of the beam to make the laser beam as parallel as possible; an energy controller for controlling the energy ultimately irradiated onto the silicon wafer, as underexposure or overexposure will seriously affect the image quality; a beam shape setter for setting the beam into different shapes such as circular or annular, with different beam states having different optical characteristics; a light shield for setting the beam into different shapes such as circular or annular, with different beam states having different optical characteristics; an energy detector for detecting whether the final incident energy of the beam meets the exposure requirements and feeding back to the energy controller for adjustment; a mask including a glass plate engraved with a circular hole pattern to form an extremely fine light source image; and an objective lens to compensate for optical errors and proportionally reduce the circuit diagram.

[0009] Furthermore, the photomask is a submicron or nanometer-scale photolithographic photomask.

[0010] Furthermore, the crossbeam of the second moving mechanism is fixedly connected to the base, the crossbeam guide rail is set on the crossbeam, the stepper motor is connected to the crossbeam lead screw through a coupling, the two ends of the crossbeam lead screw are supported by bearings on both sides of the crossbeam, the stepper motor is fastened to one side of the crossbeam, the slider is threadedly engaged with the crossbeam lead screw, and the stepper motor drives the slider to move along the crossbeam guide rail; the electric push rod is fixedly connected to the slider and its movable end extends downward, the suction cup is connected to the movable end of the electric push rod, and the suction cup adsorbs and releases the photolithography by changing the vacuum degree.

[0011] Furthermore, the developing chamber is fixed on the base and has a top opening. The developing solution is placed inside the developing chamber. The first moving mechanism drives the photoresist after photolithography to be immersed in the developing solution through the top opening, so that the pattern in the photoresist layer can be revealed through the developing solution treatment.

[0012] Furthermore, the micro-nano flexible structure continuous transfer equipment also includes a photoresist collection unit, comprising a collection belt and a collection device. The collection belt is located on the side of the developing cassette away from the photolithography platform and is configured to receive the photoresist taken out of the developing cassette and transport it outward. The collection device is located at the output end of the collection belt and is configured to receive the photoresist output from the collection belt and collect the photoresist after development.

[0013] Furthermore, the support blocks of the collection device are fixed at intervals on the base, the rotating shaft is set between the two support blocks and supported by the bearings in the support blocks, the collection belt is wound around the rotating shaft, one end of the rotating shaft is fixedly connected to the pulley, the stepper motor is fixed on one side of the support block and driven by the pulley, the movement of the collection belt is driven by the stepper motor, and the collection belt is elastically supported by springs below. When the suction cup places the transfer product on the collection belt, the springs increase the toughness and stability of the collection belt.

[0014] To achieve the above objectives, a method for continuous transfer printing fabrication of micro / nano flexible structures is provided, using the aforementioned continuous transfer printing equipment for micro / nano flexible structures, comprising: S100. Import the model of the design parameters into the continuous operation control unit; S200. Place the photoresist on the photolithography platform and insert the mask of the set model into the laser head of the laser working unit to increase the accuracy of the laser. S300. Control the first moving mechanism to drive the laser head to move according to the set model, and selectively irradiate the photoresist on the photolithography platform, so that the photosensitive agent in the laser-irradiated part undergoes a photochemical reaction; S400. Control the second moving mechanism to drive the suction cup to move and transport the photoresist after photolithography to the developing tank. The photochemical reaction area on the photoresist reacts with the developing solution and dissolves, and the pattern in the photoresist layer can be revealed. S500. Control the second moving mechanism to drive the suction cup to move again, and transport the developed photoresist to the collection belt. The collection belt drives the photoresist to be transported to the collection device. S600. Repeat S200-S500 to perform photolithography, development, and collection of photoresist to achieve laser printing.

[0015] Furthermore, when the photoresist to be printed has a three-dimensional structure, the photoresist slices are processed to form photolithographic slices before continuous printing. Then, each photoresist slice is sequentially photolithographically etched, developed, and collected, and connected in the original order.

[0016] The technical advantages of the micro / nano flexible structure continuous transfer printing device and its preparation method provided by this invention are at least reflected in the following aspects: 1. Based on flexible photoresist materials and micro-nano fabrication technology, it is possible to achieve continuous and low-cost manufacturing of high-precision two-dimensional and three-dimensional multilayer flexible structures on curved or flexible substrates, which solves the limitations of photolithography technology in the manufacturing of curved or flexible substrates. At the same time, it has high efficiency and scalability, and is suitable for the manufacturing of large-area flexible micro-nano structures. 2. The laser head mask of the provided device is a photolithography mask with a precision of sub-micron and nanometer level. Compared with the shortcomings of existing digital micromirror devices (DMS) chips (DE) such as low resolution and high price, and the inability to meet the precision and size requirements for printing large parts, this invention uses mask imaging to replace DMD chip imaging, realizing large-area and cross-scale printing with scanning sizes from micro-nano to decimeter level. The precision can be easily achieved at the sub-micron or even nanometer level, which can better solve the row count problem. Moreover, it is low in price and easy to implement. Attached Figure Description

[0017] The accompanying drawings, which are included to provide a further understanding of the invention and form part of this application, illustrate exemplary embodiments of the invention and, together with their description, serve to explain the invention and do not constitute an undue limitation thereof. In the drawings: Figure 1 This is a schematic diagram of an embodiment of the provided micro-nano flexible structure continuous transfer printing equipment; Figure 2 This is a partial structural diagram of the crossbeam guide rail of the provided micro-nano flexible structure continuous transfer printing equipment. Figure 3 This is a schematic diagram of the laser head structure of the micro-nano flexible structure continuous transfer printing equipment provided. Figure 4 This is a flowchart of the continuous transfer fabrication method for micro / nano flexible structures.

[0018] Explanation of reference numerals in the attached diagram: 1-Lithography platform, 2-Slider, 3-Crossbeam, 4-Electric push rod, 5-Cheap, 6-Bearing, 7-Developer box, 8-Spring, 9-Collection belt, 10-Support block, 11-Synchronous belt, 12-Stepper motor, 13-Pulley, 14-Coupling, 15-Stepper motor, 16-Laser head, 161-Adjustable laser, 162-Beam corrector, 163-Energy controller, 164-Beam shape setter, 165-Shielder, 166-Energy detector, 167-Mask, 168-Objective lens, 17-Moving block, 18-Lead screw motor, 19-Lead screw, 20-Y-axis guide rail, 21-X-axis guide rail, 22-Support column, 23-Base, 24-Crossbeam guide rail, 25-Crossbeam lead screw.

[0019] It should be understood that the dimensions of the various parts shown in the accompanying drawings are not drawn to actual scale. Furthermore, the same or similar reference numerals denote the same or similar components. Detailed Implementation

[0020] Various exemplary embodiments of the present disclosure will now be described in detail with reference to the accompanying drawings. The descriptions of the exemplary embodiments are merely illustrative and are in no way intended to limit the present disclosure or its application or use. The present disclosure may be implemented in many different forms and is not limited to the embodiments described herein. These embodiments are provided so that this disclosure will be thorough and complete, and will fully express the scope of the disclosure to those skilled in the art. It should be noted that, unless otherwise specifically stated, the relative arrangement of components and steps and the composition of materials set forth in these embodiments are merely exemplary and not intended to be limiting.

[0021] like Figure 1 and Figure 2 As shown, the present invention provides a micro-nano flexible structure continuous transfer device, including a base 23, a photolithography platform 1, a developing box 7, a laser working unit, a photoresist delivery unit, and a continuous transfer control unit.

[0022] A photolithography platform 1 is positioned on one side of a base 23 and holds photoresist during the photolithography operation. A developing container 7 is positioned in the middle of the base 23 and contains developing solution. A laser working unit includes a first moving mechanism and a laser head 16. The first moving mechanism is positioned on the base and drivenly connected to the laser head 16. A photoresist delivery unit includes a second moving mechanism and a suction cup 5. The second moving mechanism is positioned on the base 23 and drivenly connected to the suction cup 5. A continuous transfer control unit is connected to the laser working unit and the photoresist delivery unit and is configured to control the first moving mechanism to drive the laser head 16 to selectively irradiate the photoresist on the photolithography platform 1, so that the photosensitizer in the photoresist undergoes a photochemical reaction. The control unit also controls the second moving mechanism to drive the suction cup 5 to move, delivering the photoresist on the photolithography platform 1 to the developing container 7 for dissolution of the photochemical reaction area, revealing the pattern in the photoresist layer.

[0023] Furthermore, based on the aforementioned continuous transfer printing equipment for micro / nano flexible structures, this invention provides a method for the continuous transfer printing fabrication of micro / nano flexible structures, such as... Figure 4 As shown, the steps include: S100. Import the model of the design parameters into the continuous operation control unit; S200. Place the photoresist on the photolithography platform 1, and place the mask of the set model into the laser head 16 of the laser working unit to increase the accuracy of the laser. S300. Control the first moving mechanism to drive the laser head 1 to move according to the set model, and selectively irradiate the photoresist on the photolithography platform 1. The photosensitive agent in the laser-irradiated part undergoes a photochemical reaction. S400. Control the second moving mechanism to drive the chuck 5 to move and transport the photoresist after photolithography to the developing tank 7. The photochemical reaction area on the photoresist reacts with the developing solution and dissolves, and the pattern in the photoresist layer can be revealed. S500. Control the second moving mechanism to drive the suction cup 5 to move again, and transport the developed photoresist to the collection belt 9. The collection belt 9 drives the photoresist to be transported to the collection device. S600. Repeat S200-S500 to perform photolithography, development and collection of photoresist to achieve laser printing.

[0024] If the photoresist to be printed has a three-dimensional structure, the photoresist slices are processed to form photolithographic slices before continuous printing. Then, each photoresist slice is sequentially photolithographically etched, developed, and collected, and connected in the original order.

[0025] The present invention provides a continuous transfer printing device and preparation method for micro-nano flexible structures. Based on flexible photoresist materials and micro-nano processing technology, it can realize the continuous and low-cost manufacturing of high-precision two-dimensional and three-dimensional multilayer flexible structures on curved or flexible substrates. It solves the limitations of photolithography technology in the manufacturing of curved or flexible substrates, and has high efficiency and scalability, making it suitable for the manufacturing of large-area flexible micro-nano structures.

[0026] Various exemplary embodiments of the present invention will now be described in detail with reference to the accompanying drawings. The descriptions of the exemplary embodiments are merely illustrative and are in no way intended to limit the invention or its application or use. The invention can be implemented in many different forms and is not limited to the embodiments described herein. The terms "first," "second," etc., used in the invention are for convenience of description and to distinguish different components with the same name, and do not indicate a sequential or primary / secondary relationship. In the present invention, when a specific device is described as being located between a first device and a second device, an intermediary device may or may not be present between the specific device and the first or second device.

[0027] like Figure 1 , Figure 2 The image shows an embodiment of a continuous transfer printing device for micro / nano flexible curved surface structures. The support column 22 is welded and fixed to the base 23. The x-axis guide rail 21 is fixedly connected to the support column 22. The lead screw motor 18 is fixed to one side of the x-axis guide rail 21. The lead screw is connected to the y-axis guide rail 20. The bottom groove of the y-axis guide rail 20 forms a sliding fit with the x-axis guide rail 21. The y-axis lead screw motor is fixed to one side of the y-axis guide rail 20. The lead screw 19 is fixedly connected to the moving block 17. The moving block 17 forms a sliding groove connection with the y-axis guide rail 20. The laser head 16 is fixedly connected to the moving block 17.

[0028] The stepper motor 15 is connected to the crossbeam lead screw 25 via the coupling 14. The two ends of the crossbeam lead screw 25 are supported by bearings 6 inside the side walls of the crossbeam 3. The stepper motor 15 is fastened to one side of the crossbeam 3 by screws. The slider 2 and the crossbeam lead screw 25 form a threaded engagement. The slider 2 moves along the crossbeam guide rail 24 by controlling the working state of the stepper motor 15.

[0029] The electric push rod 4 is fixedly connected to the slider 2, and the suction cup 5 is fixedly connected to the electric push rod 4. The electric push rod 4 can move up and down. The suction cup 5 uses vacuum to realize the "picking up" and "putting down" during the handling and migration process. The slider 2 is linked with the electric push rod 4 and the suction cup 5. The slider 2 moves along the x-axis, the electric push rod 4 moves up and down, and the suction cup 5 adsorbs, thereby realizing the handling of the photolithography product to complete the photolithography work.

[0030] The laser head 16 is driven by x-axis and y-axis lead screw motors. Lead screw motor 18 drives the lead screw to move the y-axis guide rail 20 along the x-axis direction, and y-axis lead screw motor 19 drives the moving block 17 to move along the y-axis direction. By controlling the working state of the x-axis and y-axis lead screw motors, the laser head 16 can move in the x-axis and y-axis directions of the plane. The laser head 16 selectively irradiates the photoresist on the photolithography platform 1. The photosensitizer in the photoresist undergoes a photochemical reaction, which changes the chemical composition of the irradiated area of ​​the photoresist. These areas with changed chemical composition can be dissolved in a specific developing solution in the next step.

[0031] The developing solution is inside the developing box 7, which is fixed on the base 23. After the laser head 16 completes one photolithography operation on the photolithography platform 1, the slider 2, electric push rod 4, and suction cup 5 work together to transport the photoresist into the developing box 7. After the developing solution processes it, the pattern in the photoresist layer can be revealed. Then the photoresist is transported to the collection belt 9 and placed there. The collection device collects the developed photoresist.

[0032] The support block 10 of the collection device is equipped with a bearing 6. The rotating shaft is between the two support blocks and supported by the bearing 6. The collection belt 9 is wound around the rotating shaft. One end of the rotating shaft is connected to the pulley 13. The synchronous belt 11 is connected between the two pulleys 13. The stepper motor 12 is driven by the pulley 13. The stepper motor 12 is fastened to one side of the support block 10 by screws. The spring 8 is fixed below the collection belt 9. The movement of the collection belt 9 is realized by controlling the working state of the stepper motor 12, thereby completing the collection task. The spring 8 has a supporting and stabilizing function. When the suction cup 5 places the transfer product on the collection belt 9, the spring 8 increases the toughness and stability of the collection belt 9.

[0033] The composition and working principle of the laser head are shown in Table 1 and Figure 3 As shown, the main functions of each part are as follows: Table 1. Components and Functions of the Laser Head name effect Tunable laser 161 The light source emits laser light of a specific wavelength (around 405nm). Beam corrector 162 Correct the incident direction of the laser beam to make the laser beam as parallel as possible. Energy Controller 163 Controlling the energy that is ultimately irradiated onto the silicon wafer is crucial; underexposure or overexposure can severely affect image quality. Beam Shape Setter 164 The beam can be set into different shapes such as circular or ring-shaped, and different beam states have different optical properties. 165 sunshade When exposure is not required, prevent the light beam from shining on the photoresist. Energy Detector 166 The system detects whether the final incident energy of the detection beam meets the exposure requirements and sends feedback to the energy controller for adjustment. Mask 167 A glass plate engraved with a pattern of circular holes forms an image of an extremely fine light source. Objective lens 168 Objective lenses are used to compensate for optical errors and to scale down circuit diagrams proportionally. The photomask is a photolithography photomask. Domestic photomasks can achieve submicron precision, while imported photomasks can achieve nanometer precision. The digital micro-mirror device (DMD) chip manufactured in the industry can achieve a precision of 5.4µm.

[0034] Due to the low resolution and high cost of digital micro-mirror devices (DMD) chips, this technology uses mask imaging to replace the DMD chip imaging currently proposed by scholars, further improving printing accuracy and enabling large-area and multi-scale printing with dimensions ranging from micro-nano to decimeter level. Since the size of DMD pixels is mostly 14μm×14μm or 16μm×16μm, further reducing it by a scaling mirror to improve printing accuracy results in a smaller printing area, making it impossible to meet the accuracy and size requirements for printing large parts. Mask technology is relatively mature, and the accuracy can easily reach sub-micron or even nanometer level, which can better overcome this defect.

[0035] The specific printing process using the provided micro-nano flexible curved surface structure continuous transfer printing equipment is as follows: A mask of a circular hole model is placed in the laser head 16 of the device to increase the accuracy of the laser. By driving the x and y axis lead screw motors, the laser head selectively irradiates the photoresist on the photolithography platform 1 according to the set model. The photosensitive agent in the laser-irradiated part of the photoresist undergoes a photochemical reaction, thereby changing the chemical composition of the irradiated area of ​​the photoresist. Then, the stepper motor 15 drives the slider 2 to move on the crossbeam 3, and with the help of the electric push rod 4 and the suction cup 5, the irradiated photoresist is transported to the developing tank 7. The developing solution reacts with the irradiated area of ​​the photoresist. The area with the changed chemical composition can dissolve in the specific developing solution, and the pattern in the photoresist layer can be revealed. The stepper motor 15 drives the slider to move on the crossbeam, and with the help of the electric push rod and the suction cup, the developed photoresist is transported to the collection belt 9. The stepper motor 12 drives the synchronous belt 11 to realize the operation of the collection belt to complete the collection of photoresist. Photolithography, development, and collection are repeated to achieve the formation of laser-printed micro and nano parts.

[0036] Import the pre-designed and sliced ​​3D model into the machine, select the desired model, and install the prepared photoresist on the lithography platform. Press start, and the X and Y axes of the laser head and the X and Z axes of the chuck return to the reference coordinate origin. The processor in the machine processes the model according to the settings. First, exposure is performed. The laser head emits light, selectively irradiating the photoresist. The photosensitizer in the photoresist undergoes a photochemical reaction, causing a change in the chemical composition of the irradiated area. The chuck transports the photoresist from the lithography platform to the developing solution for development. The areas with changed chemical composition dissolve in the developing solution, thus forming the lithographic pattern on the photoresist. Finally, after development, the chuck transports the photoresist to the collection belt, and a stepper motor collects the photoresist into a roll. It should be noted that the machine's reference coordinate origin is the coordinated position of the X, Y, and Z axes, ensuring that the laser head is positioned directly above the center of the lithography platform, and the chuck is positioned directly above the center of the developing tray.

[0037] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. However, these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A continuous transfer printing device for micro-nano flexible structures, characterized in that, include: Base (23); The photolithography platform (1) is set on one side of the base (23) and photoresist is placed in the photolithography operation; The developing chamber (7) is located in the middle of the base (23) and contains the developing solution; The laser working unit includes a first moving mechanism and a laser head (16). The first moving mechanism is mounted on a base and drivenly connected to the laser head (16). The photoresist delivery unit includes a second moving mechanism and a suction cup (5). The second moving mechanism is mounted on a base (23) and drivenly connected to the suction cup (5). as well as The continuous transfer control unit is connected to the laser working unit and the photoresist delivery unit. It is configured to control the first moving mechanism to drive the laser head (16) to selectively irradiate the photoresist on the photolithography platform (1) so that the photosensitizer in the photoresist undergoes a photochemical reaction. It also controls the second moving mechanism to drive the chuck 5 to move and deliver the photoresist on the photolithography platform (1) to the developing box (7) to dissolve the photochemical reaction area and reveal the pattern in the photoresist layer.

2. The micro-nano flexible structure continuous transfer printing equipment according to claim 1, characterized in that, The support column (22) of the first moving mechanism is fixedly connected to the base (23) and extends upward. The x-axis guide rail (21) is fixedly connected to the upper end of the support column (22). The lead screw motor (18) is fixed on one side of the x-axis guide rail (21). The nut that meshes with the x-axis lead screw is fixedly connected to the y-axis guide rail (20). The bottom groove of the y-axis guide rail (20) forms a sliding fit with the x-axis guide rail (21). The y-axis lead screw motor is fixed on one side of the y-axis guide rail (20). The nut that meshes with the y-axis lead screw (19) is fixedly connected to the moving block (17). The moving block (17) forms a groove connection with the y-axis guide rail (20). The laser head (16) is fixedly connected to the moving block (17). The laser head (16) is driven by the first moving mechanism to move in the x-axis and y-axis directions of the plane to selectively irradiate the photoresist on the photolithography platform (1).

3. The micro-nano flexible structure continuous transfer printing equipment according to claim 1 or 2, characterized in that, The laser head (16) includes: Tunable laser (161), the light source of the laser head, emits laser light of a specific wavelength; Beam corrector (162) corrects the incident direction of the beam to make the laser beam as parallel as possible; An energy controller (163) controls the energy that is ultimately irradiated onto the silicon wafer. Insufficient or excessive exposure will seriously affect the image quality. Beam shape setter (164) sets the beam to different shapes such as circular and annular, and different beam states have different optical characteristics; The light shield (165) is used to set the beam to different shapes such as circular and annular, and different beam states have different optical characteristics; The energy detector (166) detects whether the final incident energy of the beam meets the exposure requirements and feeds back to the energy controller for adjustment; Mask (167), comprising a glass plate engraved with a pattern of circular holes to form an image of an extremely fine light source; and Objective lens (168) is used to compensate for optical errors and scale down the circuit diagram proportionally.

4. The micro-nano flexible structure continuous transfer printing equipment according to claim 3, characterized in that, The photomask is a submicron or nanometer-scale photolithography photomask.

5. The micro-nano flexible structure continuous transfer printing equipment according to claim 1, characterized in that, The crossbeam (3) of the second moving mechanism is fixedly connected to the base (23). The crossbeam guide rail (24) is set on the crossbeam (3). The stepper motor (15) is connected to the crossbeam screw (25) through the coupling (14). The two ends of the crossbeam screw (25) are supported by the bearings (6) on both sides of the crossbeam (3). The stepper motor (15) is fastened to one side of the crossbeam (3). The slider (2) is threadedly engaged with the crossbeam screw (25). The stepper motor (15) drives the slider (2) to move along the crossbeam guide rail (24). The electric push rod (4) is fixedly connected to the slider (2) and its movable end extends downward. The suction cup (5) is connected to the movable end of the electric push rod (4). The suction cup (5) adsorbs and releases the photolithography by changing the vacuum degree.

6. The micro-nano flexible structure continuous transfer printing equipment according to claim 1, characterized in that, The developing box (7) is fixed on the base (23) and has an opening at the top. The developing solution is placed in the developing box (7). The first moving mechanism drives the photoresist after photolithography to be immersed in the developing solution through the opening at the top, so that the pattern in the photoresist layer can be revealed by the developing solution.

7. The micro-nano flexible structure continuous transfer printing equipment according to claim 1, characterized in that, The micro-nano flexible structure continuous transfer equipment also includes a photoresist collection unit, including a collection belt (9) and a collection device. The collection belt (9) is located on the side of the developing cassette (7) away from the photolithography platform (1) and is configured to receive the photoresist taken out of the developing cassette (7) and transport it outward. The collection device is located at the output end of the collection belt (9) and is configured to receive the photoresist output by the collection belt (9) and collect the photoresist after development.

8. The micro-nano flexible structure continuous transfer printing equipment according to claim 1, characterized in that, The support blocks (10) of the collection device are fixed at intervals on the base (23). The rotating shaft is set between the two support blocks and supported by the bearing (6) in the support block (10). The collection belt (9) is wound around the rotating shaft. One end of the rotating shaft is fixedly connected to the pulley (13). The stepper motor (12) is fixed on one side of the support block and driven by the pulley (13). The stepper motor (12) drives the movement of the collection belt (9). The collection belt (9) is elastically supported by the spring (8) below. When the suction cup (5) places the transfer product on the collection belt (9), the spring (8) increases the toughness and stability of the collection belt (9).

9. A method for continuous transfer printing fabrication of micro / nano flexible structures, using the aforementioned continuous transfer printing equipment for micro / nano flexible structures, characterized in that... include: S100. Import the model of the design parameters into the continuous operation control unit; S200. Place the photoresist on the photolithography platform (1) and put the mask of the set model into the laser head (16) of the laser working unit to increase the accuracy of the laser; S300. Control the first moving mechanism to drive the laser head (1) to move according to the set model, and selectively irradiate the photoresist on the photolithography platform (1), and the photosensitive part irradiated by the laser undergoes a photochemical reaction; S400. Control the second moving mechanism to drive the suction cup (5) to move the photoresist after photolithography to the developing tank (7). The photochemical reaction area on the photoresist reacts with the developing solution and dissolves, and the pattern in the photoresist layer can be displayed. S500. Control the second moving mechanism to drive the suction cup (5) to move again, and transport the developed photoresist to the collection belt (9). The collection belt (9) drives the photoresist to transport the photoresist to the collection device. S600. Repeat S200-S500 to perform photolithography, development and collection of photoresist to achieve laser printing.

10. The method for continuous transfer fabrication of micro / nano flexible structures according to claim 9, characterized in that, The photoresist to be printed has a three-dimensional structure. Before continuous printing, the photoresist slices are processed to form photolithographic slices. Then, each photoresist slice is sequentially photolithographically etched, developed, and collected, and then connected in the original order.

Images