Display device and manufacturing method thereof

Abstract

A display device and a method of manufacturing the same are disclosed. A display device includes a repair area extending across active lines in a row direction, wherein the active lines extend in a column direction. The repairing area comprises a cutting area which is vertically overlapped with the active line; and a groove region that does not vertically overlap the active line and has a groove defined therein. Compared with the active line to be cut, the structure does not need the allowance of the light shielding layer in the row direction. Accordingly, a cut repair of a specific pixel can be performed in a high PPI pixel or a DRD pixel without causing a short circuit between patterns.

Description

TECHNICAL FIELD

[0001] The disclosure relates to a device, and particularly, for example, but not limited to, a display device, and more particularly, to a display device capable of cut repair and a manufacturing method thereof. BACKGROUND

[0002] An organic light emitting display device is a self-emissive display device. Unlike a liquid crystal display device, a separate light source is not required in an organic light emitting display device. Therefore, the organic light emitting display device can be manufactured in a lightweight and thin manner. In addition, the organic light emitting display device has an advantage in power consumption due to low voltage operation, and is excellent in color gamut, fast in response speed, large in viewing angle, and high in contrast ratio (CR), and thus is studied as a next-generation display.

[0003] The description provided in the discussion of the background section should not be considered as an admission that the subject matter described in the section is prior art merely because of its inclusion in the section. The discussion of the background section can include information describing one or more aspects of the subject technology, and the description in the section is not limiting of the disclosure. SUMMARY

[0004] The inventors of the disclosure have recognized that, as the resolution increases, the frequency of occurrence of defective pixels due to electrical connectivity of components provided in the pixels or defects of the elements themselves increases. When a defective pixel is generated, a repair scheme of cutting and connecting the defective pixel to a normal pixel is performed.

[0005] In a high PPI (pixels per inch) pixel, particularly a double rate drive (DRD) type pixel, lines of an active layer are concentrated in an opening area, such that a gap between the lines is set to a minimum distance in which the lines can be patterned. In order to secure a high PPI aperture ratio, a light shield (LS) floating metal is used to improve a structure of a cut area for repair.

[0006] However, in a DRD pixel, an area in which the floating metal is to be interposed is narrow, such that only the gap between the lines is inevitably small, which inevitably causes a short between patterns. For this reason, an improvement scheme is required to overcome this problem. Accordingly, the inventors of the present invention have invented a display device in which cut repair can be performed in a high PPI pixel or a DRD type pixel without a short between patterns, and a manufacturing method thereof.

[0007] An object to be achieved according to an embodiment of the disclosure is to provide a display device in which cut repair can be performed in a high PPI pixel or a DRD type pixel without causing a short between patterns, and a manufacturing method thereof.

[0008] The objects according to the present disclosure are not limited to the above-mentioned objects. Other objects and advantages according to the present disclosure which are not mentioned above can be understood based on the following description, and can be more clearly understood based on embodiments according to the present disclosure. Furthermore, it will be easily understood that the objects and advantages according to the present disclosure can be achieved using the apparatus shown in the claims or combinations thereof.

[0009] A display device according to an embodiment of the present disclosure is provided. The display device includes a repair area extending across first and second active lines in a row direction, wherein the repair area includes a cut area vertically overlapping the first and second active lines, and a recess area not vertically overlapping the first and second active lines and having a recess defined therein.

[0010] According to some embodiments, the cut area includes a light-blocking layer formed on a substrate, a buffer layer formed on the light-blocking layer, and an active layer formed on the buffer layer. According to some embodiments, in the recess area, the recess is formed by removing the light-blocking layer and the buffer layer on the substrate.

[0011] According to some embodiments, the display device further includes a marker area disposed on each of two opposite sides in the row direction of the repair area, wherein the marker area includes a light-blocking layer formed on a substrate, a buffer layer formed on the light-blocking layer, and a gate insulating layer formed on the buffer layer.

[0012] A method for manufacturing a display device according to an embodiment of the present disclosure is provided. The method of manufacturing a display device includes the steps of defining a repair area in a manner that first and second active lines extend in a row direction, dividing the repair area into a cut area and a recess area, and etching a gate insulating layer in the repair area and etching a buffer layer in the recess area.

[0013] According to some embodiments, the method further includes the steps of defining a marker area on each of two opposite sides in the row direction of the repair area, depositing a gate layer in the repair area and the marker area, and patterning the gate layer. The step of patterning the gate layer includes removing the gate layer in the repair area and the marker area, and removing a light-blocking layer in the recess area.

[0014] According to an embodiment of the present disclosure, a repair structure included in a display panel includes a repair area extending across first and second active lines in a row direction. The repair area includes a cut area corresponding to (vertically overlapping) the first and second active lines and a recess area not corresponding to (vertically not overlapping) the first and second active lines, and a recess is defined in the recess area. Cut repair can be performed in a high PPI pixel or a DRD pixel without causing a short between patterns during cut repair of a specific pixel.

[0015] In addition, the repair structure included in the display panel has a structure in which a groove area of the repair area is formed by removing the light-shielding layer and the buffer layer on the substrate to form a groove. Accordingly, in a pixel having a structure in which a margin is insufficient due to a large number of lines in an opening area due to high resolution, cutting repair can be performed without causing short-circuiting between patterns.

[0016] In addition, the repair structure provided in the display panel further provides a marker area on each of opposite sides of the repair area, so that the repair area can be identified based on the pattern of the marker area, and cutting repair can be accurately performed at a desired position by irradiating laser light onto an extension line passing through the two marker areas in the row direction.

[0017] In addition, the groove area of the repair area has a structure in which the light-shielding layer and the gate layer are removed from the groove area, compared to a general contact hole patterning and gate layer-light-shielding layer contact structure. Since the process of forming the pattern of the groove area is the same as the process of forming the contact hole through which the light-shielding layer-active layer-gate layer contact each other, no additional process occurs.

[0018] In addition, when the active line is made of transparent IGZO, the light-shielding layer provided under the active line can be visible to the user to identify the cutting area.

[0019] In addition, even in the case where the active line is not a transparent line, the cutting area can be identified by a shadow generated due to a step formed at each of the two opposite sides of the cutting area.

[0020] In addition, the active line passing through the light-shielding layer has an incomplete contact area such as a wrinkle and a pore. Accordingly, when laser light is applied thereto, a crack is generated at this point, so that cutting occurs.

[0021] In addition, the overlap margin of the light-shielding layer in the row direction is unnecessary compared to the active line to be cut. Accordingly, even in a pixel structure in which a margin is insufficient due to a large number of lines in an opening area in a high PPI pixel, desired cutting repair can be performed without short-circuiting between the active lines.

[0022] Effects of the present disclosure are not limited to the above-mentioned effects, and other effects not mentioned will be clearly understood by those skilled in the art from the description as follows.

[0023] In addition to the above effects, while describing specific details for implementing the present disclosure, specific effects of the present disclosure are described.

[0024] It should be understood that the general description above and the following detailed description are exemplary and illustrative and are intended to provide further explanation of the claimed inventive concepts. BRIEF DESCRIPTION OF DRAWINGS

[0025] The accompanying drawings illustrate embodiments of the present disclosure and together with the description, function to explain the principles of the present disclosure. The drawings are included to provide a further understanding of the present disclosure and are incorporated into and constitute a part of this application. In the drawings:

[0026] Figure 1 is a block diagram illustrating an organic light emitting display apparatus according to an embodiment of the present disclosure.

[0027] Figure 2 is a circuit diagram of a pixel included in an organic light emitting display apparatus according to an embodiment of the present disclosure.

[0028] Figure 3 is a plan view of a pixel included in an organic light emitting display apparatus according to an embodiment of the present disclosure.

[0029] Figure 4 is a plan view of a repair structure included in an organic light emitting display apparatus according to an embodiment of the present disclosure.

[0030] Figure 5 is a cross-sectional view taken along line I-I' in a repair structure included in an organic light emitting display apparatus according to an embodiment of the present disclosure.

[0031] Figure 6 is a cross-sectional view taken along line II-II' in a repair structure included in an organic light emitting display apparatus according to an embodiment of the present disclosure.

[0032] Figure 7A and Figure 7B are cross-sectional views sequentially illustrating a manufacturing process of an organic light emitting display apparatus according to an embodiment of the present disclosure. DETAILED DESCRIPTION

[0033] Advantages and features of the present disclosure and methods of achieving the same will become apparent by referring to the embodiments described below in detail. However, the present disclosure is not limited to the embodiments disclosed below, but can be implemented in various different forms. Therefore, the embodiments are presented only to make the present disclosure complete and to fully convey the scope of the present disclosure to those skilled in the art to which the present disclosure pertains, and the present disclosure is defined only by the scope of the claims.

[0034] The elements in the drawings are not necessarily drawn to scale for the sake of simplicity and clarity. Like reference numbers in different drawings represent the same or similar elements and therefore like functionality is performed by these elements. Furthermore, the description often uses terms like "comprising", "containing", "carrying", and "including" to mean "including but not limited to". Moreover, the terms "first", "second", "third", "fourth", etc. are used herein to denote different units and, thus, do not imply a particular order or sequence. The use of these terms in the description is simply intended to more clearly describe the examples of various implementations. It will be further understood that the terms "comprises", "comprising", "includes" and "including" specify the presence of stated features, integers, operations, elements, and / or components, but do not preclude the presence or addition of one or more other features, integers, operations, elements, components, and / or groups thereof. As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items. Expressions such as "at least one of", when preceding the list of two or more members, can modify the entire list of members and can not modify the list of members individually.

[0035] The shapes, sizes, proportions, angles, numbers, and the like disclosed in the drawings for illustrating the embodiments of the present disclosure are illustrative, and the present disclosure is not limited thereto. The terms used herein are for the purpose of describing specific embodiments only and are not intended to limit the present disclosure. As used herein, the singular forms "a", "an" and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms "comprises", "comprising", "includes" and "including" specify the presence of stated features, integers, operations, elements, and / or components, but do not preclude the presence or addition of one or more other features, integers, operations, elements, components, and / or groups thereof. As used herein, the term "and / or" includes any and all combinations of one or more of the associated listed items. Expressions such as "at least one of", when preceding the list of two or more members, can modify the entire list of members and can not modify the list of members individually.

[0036] In the interpretation of numerical values, errors or tolerances can occur even if not explicitly described.

[0037] Furthermore, it should also be understood that when a first element or layer is referred to as being "on" a second element or layer, the first element can be directly on the second element or intervening elements or layers can also be present. In addition, it should also be understood that when an element or layer is referred to as being "between" two elements or layers, the element or layer can be the only element or layer between the two elements or layers or one or more intervening elements or layers can also be present.

[0038] Further, as used herein, when a layer, film, region, plate, etc. is referred to as being "on" or "above" another layer, film, region, plate, etc., the former can be directly on the latter or a further layer, film, region, plate, etc. can be disposed between the former and the latter. As used herein, when a layer, film, region, plate, etc. is referred to as being "directly on" or "directly above" another layer, film, region, plate, etc., the former is directly on the latter, without a further layer, film, region, plate, etc. disposed between the former and the latter. Further, as used herein, when a layer, film, region, plate, etc. is referred to as being "under" or "below" another layer, film, region, plate, etc., the former can be directly on the latter or a further layer, film, region, plate, etc. can be disposed between the former and the latter. As used herein, when a layer, film, region, plate, etc. is referred to as being "directly under" or "directly below" another layer, film, region, plate, etc., the former is directly on the latter, without a further layer, film, region, plate, etc. disposed between the former and the latter.

[0039] In the description of the temporal relationship, for example, the time priority relationship between two events, such as "after", "then", "before", etc., unless it is indicated that "immediately after", "immediately after" or "immediately before", another event can occur between them. When the embodiments can be implemented differently, the functions or operations specified in a specific block can occur in a different order from that specified in the flowchart. For example, according to the functions or operations involved, two consecutive blocks can actually be executed substantially simultaneously, or the two blocks can be executed in reverse order.

[0040] It should be understood that although the terms "first", "second", "third", etc. can be used herein to describe various elements, components, regions, layers and / or time periods, these elements, components, regions, layers and / or time periods should not be limited by these terms. These terms are used to distinguish one element, component, region, layer or section from another. Therefore, the first element, first component, first region, first layer or first section as described below can be referred to as a second element, second component, second region, second layer or second section without departing from the technical concept and scope of the disclosure.

[0041] When the embodiments can be implemented differently, the functions or operations specified in a specific block can be executed in a different order from that specified in the flowchart. For example, two consecutive blocks can actually be executed substantially simultaneously, or can be executed in reverse order according to the relevant functions or operations.

[0042] The features of various embodiments of the present disclosure can be partially or completely combined with each other, and can be technically associated with each other or operate with each other. Embodiments can be implemented independently of each other and can be implemented together in an associated relationship.

[0043] In explaining numerical values, unless separately and explicitly described, the value is interpreted to include an error range. Unless otherwise defined, all terms used herein, including technical and scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art to which the inventive concept belongs. It will be further understood that terms such as those defined in commonly used dictionaries should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.

[0044] As used herein, "implementation", "example", "aspect", and the like are not to be construed as meaning that any aspect or design described is preferred or preferred over other aspects or designs. Also, the term "or" means "inclusive or" rather than "exclusive or". That is, unless otherwise stated or clear from context, the expression "x uses a or b" means one of the naturally inclusive arrangements.

[0045] The terms used in the following description have been selected as being generally and commonly used in the relevant art. However, there can be other terms in addition to the terms according to the development and / or change of technology, custom, preference of the skilled person, etc. Therefore, the terms used in the following description should not be construed as limiting the technical idea, but should be construed as an example of the terms for explaining the implementation. Also, in a specific case, the terms can be arbitrarily selected by the applicant, in which case the detailed meaning thereof will be described in the corresponding description period. Therefore, the terms used in the following description should be understood not only based on the name of the terms, but also based on the meaning and content of the terms throughout the detailed description.

[0046] In the description of signal flow, for example, when a signal is delivered from node A to node B, this can include a case where the signal is transmitted from node A to node B via another node, unless the phrase "immediate transmission" or "direct transmission" is used. Throughout the present disclosure, unless otherwise stated, "A and / or B" means A, B, or A and B, and "C to D" means a range including C and D, unless otherwise stated.

[0047] As used herein, the first direction, the second direction, and the third direction or the X-axis direction, the Y-axis direction, and the Z-axis direction should not be interpreted only as having a geometric relationship in which the first direction, the second direction, and the third direction are perpendicular to each other or the X-axis direction, the Y-axis direction, and the Z-axis direction are perpendicular to each other, but can be interpreted as having a geometric relationship in which the first direction, the second direction, and the third direction are intersected with each other at an angle other than 90 degrees or the X-axis direction, the Y-axis direction, and the Z-axis direction are intersected with each other at an angle other than 90 degrees.

[0048] Hereinafter, various embodiments of the present disclosure will be described in detail with reference to the accompanying drawings.

[0049] In a plan view of the display device, a direction of extension of a component such as a line is defined using a column direction and a row direction that cross each other.

[0050] Figure 1 is a block diagram illustrating an organic light emitting display device according to an embodiment of the present disclosure.

[0051] Referring to Figure 1 The display device 10 includes a display panel 100 having a plurality of pixels P, a controller 200, a gate driver 300 configured to provide a scan signal SC to the plurality of pixels P, a data driver 400 configured to provide a data voltage Vdata to the plurality of pixels P, and a power supply 500 configured to provide voltages required to drive the plurality of pixels P.

[0052] In the display panel 100, a plurality of scan lines SCL and a plurality of data lines DL cross each other, and each of the plurality of pixels P is connected with the scan line SCL and the data line DL. Specifically, one pixel P receives a scan signal SC through the scan line SCL, receives a data voltage Vdata through the data line DL, and receives a reference voltage Vref, a high potential driving voltage ELVDD, and a low potential driving voltage ELVSS from the power supply 500.

[0053] The scan line SCL provides the scan signal SC and a sensing signal to the pixel P, and the data line DL provides the data voltage Vdata to the pixel P. In addition, according to various embodiments, a sensing line for providing the sensing signal can be separately connected to the pixel P.

[0054] In addition, the plurality of pixels P can receive the high potential driving voltage ELVDD and the low potential driving voltage ELVSS via a power supply line, and can receive the reference voltage Vref via a reference voltage line RL.

[0055] In addition, each of the pixels P includes a light emitting element and a pixel circuit for controlling driving of the light emitting element. The pixel circuit includes a plurality of switching elements, a driving element, and a capacitor. In this regard, each of the switching elements and the driving element can be implemented as a thin film transistor. In the pixel circuit, the driving element controls an amount of current supplied to the light emitting element according to the data voltage, to adjust an amount of light emitted from the light emitting element. In addition, the plurality of switching elements receive the scan signal SC provided through the plurality of scan lines SCL and the reference voltage Vref provided through the reference voltage line RL, and operate the pixel circuit based on the received scan signal and the received reference voltage.

[0056] The display panel 100 can be implemented as a non-transmissive display panel or a transmissive display panel. The transmissive display panel can be applied to a transparent display device in which an image is displayed on a screen and a real object in the background is visible to a viewer in front of the display device. The display panel 100 can be manufactured as a flexible display panel. The flexible display panel can be implemented as an OLED panel using a plastic substrate.

[0057] The pixel P can include a red pixel, a green pixel, and a blue pixel. Each pixel P can further include a white pixel.

[0058] The touch sensor TS can be disposed on the display panel 100. A touch input can be sensed using a separate touch sensor or can be sensed via the pixel P. The touch sensor can be implemented as an on-cell type touch sensor or an add-on type touch sensor in which the touch sensor is disposed on a screen of the display panel, or as an in-cell type touch sensor in which the touch sensor is embedded in the display panel 100.

[0059] The controller 200 processes image data RGB input from a host system to be suitable for a size and resolution of the display panel 100, and provides the processed image data RGB to the data driver 400. The controller 200 generates a gate control signal GCS and a data control signal DCS using a synchronization signal, such as a clock signal CLK, a data enable signal DE, a horizontal synchronization signal Hsync, and a vertical synchronization signal Vsync, input from an external source. The gate control signal GCS and the data control signal DCS are provided to the gate driver 300 and the data driver 400, respectively, to control the gate driver 300 and the data driver 400.

[0060] A voltage level of the gate control signal GCS output from the controller 200 can be converted into a gate-on voltage and a gate-off voltage by a level shifter, and can be provided to the gate driver 300. The level shifter converts a low-level voltage of the gate control signal GCS into a gate low voltage VGL and converts a high-level voltage of the gate control signal GCS into a gate high voltage VGH. The gate control signal GCS includes a start pulse and a shift clock.

[0061] The gate driver 300 provides a scan signal SC to the scan line SCL according to the gate control signal GCS. The gate driver 300 can be disposed on each of one side or two opposite sides of the display panel 100 in a gate-in-panel (GIP) manner.

[0062] The gate driver 300 sequentially outputs a scan signal SC to a plurality of scan lines SCL. The gate driver 300 can sequentially provide the scan signal SC to the scan lines SCL by shifting the scan signal SC using a shift register. The scan signal SC can include a scan pulse that swings between a gate low voltage VGL and a gate high voltage VGH. Also, according to various embodiments, the gate driver 300 sequentially outputs a sensing signal to a plurality of sensing lines SL. The sensing signal can include a scan pulse that swings between the gate low voltage VGL and the gate high voltage VGH.

[0063] The gate driver 300 outputs a scan pulse SCP in response to a start pulse and a shift clock from the controller 200, and sequentially shifts the scan pulse according to the shift clock.

[0064] The data driver 400 converts the image data RGB into a data voltage Vdata according to a data control signal DCS, and provides the converted data voltage Vdata to the pixels P through data lines DL.

[0065] Although Figure 1 The data driver 400 is shown to be provided in a single manner on one side of the display panel 100, but the number and the provided position of the data driver 400 are not limited thereto. That is, the data driver 400 can be composed of a plurality of integrated circuits (ICs) which can be provided on one side of the display panel 100.

[0066] The power supply 500 generates DC power required to drive the pixel array, the gate driver 300, and the data driver 400 of the display panel 100. The power supply 500 can include a charge pump, a regulator, a step-down converter, a step-up converter, etc.

[0067] The power supply 500 can receive an input voltage from a host system, and can generate DC voltages such as the gate high voltage VGH, the gate low voltage VGL, a high potential driving voltage ELVDD, a low potential driving voltage ELVSS, and a reference voltage Vref. The gate low voltage VGL and the gate high voltage VGH can be provided to the gate driver 300, and the high potential driving voltage ELVDD, the low potential driving voltage ELVSS, and the reference voltage Vref can be provided to the pixels P.

[0068] Figure 2 is a circuit diagram of a pixel included in an organic light emitting display apparatus according to an embodiment of the disclosure. Figure 3 is a plan view of a pixel included in an organic light emitting display apparatus according to an embodiment of the disclosure.

[0069] Referring to Figure 2 and Figure 3A pixel PX is defined by a scan line SCL, a data line DL, a power line, and a reference voltage line RL. A scan transistor SCT, a drive transistor DT, a light emitting element OLED, a sensing transistor SENT, and a storage capacitor Cst are provided in one pixel.

[0070] The scan transistor SCT functions to select a pixel to be driven by applying a data voltage Vdata to the drive transistor DT. The scan transistor SCT is provided in an area where the scan line SCL and the data line DL cross each other. The scan transistor SCT includes a gate, a source, and a drain. The gate is connected to the scan line SCL. The source is connected to the data line DL, and the drain is connected to the drive transistor DT.

[0071] The drive transistor DT functions to drive the light emitting element OLED of the pixel selected by the scan transistor SCT. The drive transistor DT includes a gate, a source, and a drain. The gate is connected to the drain SD of the scan transistor SCT, the source is connected to the power line to which a high potential drive voltage ELVDD is applied, and the drain is connected to the anode of the light emitting element OLED.

[0072] The storage capacitor Cst functions to sample the data voltage Vdata. The storage capacitor Cst includes one electrode and another electrode. One electrode of the storage capacitor Cst is connected to a node between the drain of the scan transistor SCT and the gate of the drive transistor DT, and the other electrode of the storage capacitor Cst is connected to a node between the drain of the drive transistor DT and the anode of the light emitting element OLED.

[0073] The light emitting element OLED is configured to emit light by itself, and the light emission intensity of light emitted therefrom is adjusted according to the amount of current flowing therein. For example, the light emitting element OLED can be implemented as an organic light emitting diode. The light emitting element OLED includes an anode, a light emitting layer, and a cathode. The anode of the light emitting element OLED is connected to the drain of the drive transistor DT and the other electrode of the storage capacitor Cst, the cathode of the light emitting element OLED is connected to the power line to which a low potential drive voltage ELVSS is applied, and the light emitting layer is disposed between the anode and the cathode.

[0074] The sensing transistor SENT functions to initialize the anode of the light emitting element OLED and the other electrode of the storage capacitor Cst or to sense a pixel characteristic with a reference voltage Vref. The sensing transistor includes a gate, a source, and a drain. The gate of the sensing transistor SENT is connected to the scan line SCL, and the drain of the sensing transistor SENT is connected to the anode of the light emitting element OLED, the drain of the drive transistor DT, and the other electrode of the storage capacitor Cst. The source of the sensing transistor SENT is connected to the reference voltage line RL. According to various embodiments, the gate of the sensing transistor SENT can be connected to a sensing line that provides a separate sensing signal.

[0075] The drive transistor DT adjusts the amount of current flowing through the light emitting element OLED based on the size of the data voltage Vdata.

[0076] Further, according to some embodiments, at least one of the transistors of the pixel circuit can be formed as a P-type thin film transistor or an N-type thin film transistor. Each transistor including the drive transistor can be made of, for example, LTPS, oxide, single-silicon, or organic material. The light emitting element OLED can be implemented as a self-emitting diode such as an organic light emitting element or a micro LED. The substrate on which the pixel PX is formed can be implemented as a glass substrate, a plastic substrate, a flexible plastic substrate, a wafer, or the like.

[0077] Reference Figure 3 In the pixel PX, a first branch line DL1 branches from the data line DL, and a second branch line RL1 branches from the reference voltage line RL. The first branch line DL1 and the second branch line RL1 extend in the column direction and are disposed in the row direction.

[0078] The first branch line DL1 supplies the data voltage Vdata to the sub-pixel SP, and the second branch line RL1 supplies the reference voltage Vref to the sub-pixel SP. In Figure 3 In the above, ANO denotes the area of the anode, and EA denotes the light emitting area. The anode ANO can be disposed to partially overlap with the data line DL, the reference voltage line RL, and the scan line SCL.

[0079] The pixel PX includes a repair area RA. The repair area RA extends in the row direction across the first branch line DL1 and the second branch line RL1, and can be defined as an area for cutting the repair first branch line DL1 and the second branch line RL1.

[0080] The repair area RA can be divided into a cut area corresponding to the first branch line DL1 and the second branch line RL1, and a recess area not corresponding to the first branch line DL1 and the second branch line RL1. The cut area CA can also be defined as an area in which the first branch line DL1 and the second branch line RL1 are cut in the repair process. The recess area HR can be defined as an area in which a recess is formed in the repair area RA in an area not corresponding to the first branch line DL1 and the second branch line RL1.

[0081] Hereinafter, a repair structure including the repair area RA is explained in detail.

[0082] Figure 4 is a plan view illustrating a repair structure included in an organic light emitting display device according to an embodiment of the disclosure. Figure 5 is a cross-sectional view taken along line I-I' in a repair structure included in an organic light emitting display device according to an embodiment of the disclosure. Figure 6is a cross-sectional view taken along line II-II' in a repair structure included in an organic light emitting display device according to an embodiment of the disclosure.

[0083] Referring to Figures 4 to 6 , a first branch line DL1 is branched from a data line DL and extends in a column direction, and a second branch line RL1 is branched from a reference voltage line RL and disposed in the column direction. The first branch line DL1 can be a first active line, and the second branch line RL1 can be a second active line.

[0084] The repair structure includes a repair area RA and a marker area A3.

[0085] The repair area RA extends across the first active line DL1 and the second active line RL1 in a row direction. When cut repair is performed due to a pixel defect, the first active line DL1 and the second active line RL1 are cut in the repair area RA.

[0086] The repair area RA includes a cut area A1 corresponding to (vertically overlapping) the first active line DL1 and the second active line RL1 and a groove area A2 not corresponding to (not vertically overlapping) the first active line DL1 and the second active line RL1. The cut area A1 is an area in which the first active line DL1 and the second active line RL1 are cut, and the groove area A2 is an area in which a groove is formed in the repair area RA.

[0087] The cut area A1 includes a light-blocking layer 120 formed on a substrate 110, a buffer layer 130 formed on the light-blocking layer 120, and an active layer ACT formed on the buffer layer 130. Referring to a cross-sectional structure cut along line II-II', in the cut area A1, the stack of the light-blocking layer 120, the buffer layer 130, and the active layer ACT has two opposite side surfaces.

[0088] The cut area A1 further includes a protection layer 150 formed on the active layer ACT, planarization layers 160 and 170 formed on the protection layer 150, an anode layer 180 formed on the planarization layers 160 and 170, and a cathode layer 190 formed on the anode layer 180.

[0089] The groove area A2 has a structure in which a groove is formed by removing the light-blocking layer 120 and the buffer layer 130 on the substrate 110. The groove area A2 includes the protection layer 150 formed on the substrate 110, the planarization layers 160 and 170 formed on the protection layer 150, the anode layer 180 formed on the planarization layers 160 and 170, and the cathode layer 190 formed on the anode layer 180.

[0090] The marker area A3 is an area formed on each side of the opposite sides in the row direction of the repair area RA, and can also be defined as an area for a marker with respect to the repair area RA when repair cutting is performed.

[0091] The mark area A3 includes the light-blocking layer 120 formed on the substrate 110, the buffer layer 130 formed on the light-blocking layer 120, and the gate insulating layer 140 formed on the buffer layer 130. The width in the column direction of the mark area A3 can be smaller than the width in the column direction of the repair area RA. The mark area A3 further includes the protective layer 150 formed on the gate insulating layer 140, the planarization layers 160 and 170 formed on the protective layer 150, the anode layer 180 formed on the planarization layers 160 and 170, and the cathode layer 190 formed on the anode layer 180.

[0092] Each of the first active line DL1 and the second active line RL1 can be at least one signal line requiring cutting when cut repair is performed due to a pixel defect in the display panel. For example, the first active line DL1 can be a first branch line connecting the data line DL and the sub-pixel SP to each other, and the second active line RL1 can be a second branch line connecting the reference voltage line RL and the sub-pixel SP to each other.

[0093] As described above, the repair structure included in the display panel includes the repair area RA extending across the first active line DL1 and the second active line RL1 in the row direction. The repair area RA includes the cut area A1 corresponding to (vertically overlapping) the first active line DL1 and the second active line RL1 and the groove area A2 not corresponding to (not vertically overlapping) the first active line DL1 and the second active line RL1, and the groove is defined in the groove area A2. The cut repair can be performed in a high PPI pixel or a DRD pixel without causing a short between patterns during the cut repair of a specific pixel.

[0094] Further, the repair structure included in the display panel has a structure in which the groove area A2 of the repair area RA is formed by removing the light-blocking layer 120 and the buffer layer 130 on the substrate 110 to form a groove. Accordingly, in a pixel having a structure in which a margin is insufficient due to a large number of lines in an opening area due to high resolution, the cut repair can be performed without causing a short between patterns.

[0095] In addition, the repair structure provided in the display panel further provides the mark area A3 on each of opposite sides of the repair area RA, and thus the repair area RA can be identified based on the pattern of the mark area A3, and the cut repair can be accurately performed at a desired position by irradiating laser light on an extension line of two mark areas in the row direction.

[0096] Figure 7A and Figure 7B are cross-sectional views sequentially illustrating a manufacturing process of an organic light emitting display device according to an embodiment of the disclosure.

[0097] Reference Figure 7A and Figure 7B The method for manufacturing the organic light emitting display device includes a step (a) of depositing and patterning the light shielding layer 120 on the substrate 110, and a step (b) of depositing the buffer layer 130 on the substrate 110 and the light shielding layer 120. In particular, the step (a) of patterning the light shielding layer 120 includes a process of patterning the light shielding layer 120 to extend across the first active line DL1 and the second active line RL1 in the row direction.

[0098] Further, the method for manufacturing the organic light emitting display device further includes a step (c) of depositing the active layer ACT on the buffer layer 130 and patterning the active layer into the first active line DL1 and the second active line RL1, and a step (d) of depositing the gate insulating layer 140 on the buffer layer 130 and the first active line DL1 and the second active line RL1.

[0099] Further, the method for manufacturing the organic light emitting display device further includes a step (e) of defining a repair area RA extending across the first active line DL1 and the second active line RL1 in the row direction, dividing the repair area RA into a cutting area A1 and a recess area A2, etching the gate insulating layer 140 in the repair area RA, and etching the buffer layer 130 in the recess area A2. The cutting area A1 is an area in which the active layer ACT is to be cut, and the recess area A2 is an area defined in consideration of an overlap allowance.

[0100] In the step (e), the gate insulating layer 140 is etched using a gate insulating layer hole mask. In this case, the cutting area A1 is self-aligned based on the first active line DL1 and the second active line RL1. That is, the gate insulating layer 140 is removed from the cutting area A1 and the recess area A2. In this regard, the cutting area A1 can be self-aligned with the active layer ACT to be cut by laser and have the same or similar line width.

[0101] In addition, the method for manufacturing the organic light emitting display device can further include a step of defining a marker area A3 on opposite sides of the repair area RA in the row direction. Further, the method can include a step (f) of depositing the gate layer 142 in the repair area RA and the marker area A3, and a step (g) of patterning the gate layer 142.

[0102] The patterning step (g) of the gate layer 142 can include a step of removing the gate layer 142 in the repair region RA and the mark region A3 and removing the light-blocking layer 120 in the recess region A2. That is, in the subsequent process, the repair structure is not covered by the gate layer 142 or is not covered by the metal layer. As described above, the recess region A2 of the repair region RA has a structure in which the light-blocking layer and the gate layer are removed from the recess region A2, compared to the usual hole patterning and the gate layer-light-blocking layer contact structure. Since the process of forming the pattern of the recess region A2 is the same as the process of forming the contact hole through which the light-blocking layer-active layer-gate layer are in contact with each other, no additional process occurs.

[0103] Further, the method for manufacturing an organic light emitting display device can further include the steps of forming a protective layer 150 in the repair region RA and the mark region A3, forming planarization layers 160 and 170 on the protective layer 150, forming an anode layer 180 on the planarization layers 160 and 170, and forming a cathode layer 190 on the anode layer 180.

[0104] When the active line is made of transparent IGZO, the light-blocking layer 120 disposed thereunder can be visible to a user to identify the cutting region CA. In addition, even in the case where the active line is not a transparent line, the cutting region CA can be identified by a shadow produced by a step formed at each of two opposite sides of the cutting region CA. The active line passing through the light-blocking layer 120 has an incomplete contact region, such as a wrinkle and a pore. Thus, when laser is applied thereto, a crack is generated thereat, which in turn implements cutting.

[0105] According to the embodiment, an overlap allowance of the light-blocking layer 120 in the row direction is unnecessary compared to the active line to be cut. Thus, even in a pixel structure in which the allowance is insufficient due to a large number of lines in the opening region in a high PPI pixel, the desired cutting repair can be performed without short-circuiting between the active lines.

[0106] The display device and the method for manufacturing the display device according to aspects and embodiments of the present disclosure as described above can be described as follows.

[0107] A first aspect of the present disclosure provides a display device including: first and second active lines disposed in a row direction and extending in a column direction; and a repair region extending across the first and second active lines in the row direction, wherein the repair region includes: a cutting region perpendicularly overlapping the first and second active lines; and a recess region not perpendicularly overlapping the first and second active lines and having a recess defined therein.

[0108] According to some embodiments of the first aspect, the cutting region includes: a light-blocking layer formed on the substrate; a buffer layer formed on the light-blocking layer; and an active layer formed on the buffer layer.

[0109] According to some embodiments of the first aspect, in the cutting region, the recess is formed by removing the light-blocking layer and the buffer layer on the substrate.

[0110] According to some embodiments of the first aspect, the cutting region further includes: a protective layer formed on the active layer; a planarization layer formed on the protective layer; an anode layer formed on the planarization layer; and a cathode layer formed on the anode layer, wherein the recess region further includes: the protective layer formed on the substrate, the planarization layer formed on the protective layer, the anode layer formed on the planarization layer, and the cathode layer formed on the anode layer.

[0111] According to some embodiments of the first aspect, in the cutting region, the stack of the light-blocking layer, the buffer layer, and the active layer has two opposite side surfaces in the column direction.

[0112] According to some embodiments of the first aspect, the display device further includes a marking region disposed on each of two opposite sides of the repair region in the row direction, wherein the marking region includes: a light-blocking layer formed on the substrate, a buffer layer formed on the light-blocking layer, and a gate insulating layer formed on the buffer layer.

[0113] According to some embodiments of the first aspect, a width of the marking region in the column direction is less than a width of the repair region in the column direction.

[0114] According to some embodiments of the first aspect, the marking region further includes: a protective layer formed on the gate insulating layer; a planarization layer formed on the protective layer; an anode layer formed on the planarization layer; and a cathode layer formed on the anode layer.

[0115] According to some embodiments of the first aspect, the first active line is a first branch line connecting the data line to the sub-pixel, and the second active line is a second branch line connecting the reference voltage line to the sub-pixel.

[0116] A second aspect of the disclosure provides a display device including: a plurality of subpixels; a data line for supplying a data voltage to the plurality of subpixels; a reference voltage line for supplying a reference voltage to the plurality of subpixels; a first branch line connecting the data line to one of the plurality of subpixels; a second branch line connecting the reference voltage line to one of the plurality of subpixels, wherein the second branch line and the first branch line are disposed in a row direction and extend in a column direction in a manner parallel to each other; and a repair area extending across the first branch line and the second branch line in the row direction, wherein the repair area includes: a cut area vertically overlapping the first branch line and the second branch line; and a recess area not vertically overlapping the first branch line and the second branch line, and the recess area having a recess formed therein.

[0117] According to some embodiments of the second aspect, the cut area includes: a light-blocking layer formed on the substrate; a buffer layer formed on the light-blocking layer; and an active layer formed on the buffer layer.

[0118] According to some embodiments of the second aspect, in the recess area, the recess is formed by removing the light-blocking layer and the buffer layer on the substrate.

[0119] According to some embodiments of the second aspect, the cut area further includes: a protection layer formed on the active layer; a planarization layer formed on the protection layer; an anode layer formed on the planarization layer; and a cathode layer formed on the anode layer, wherein the recess area further includes: the protection layer formed on the substrate, the planarization layer formed on the protection layer, the anode layer formed on the planarization layer, and the cathode layer formed on the anode layer.

[0120] According to some embodiments of the second aspect, in the cut area, the stack of the light-blocking layer, the buffer layer, and the active layer has two opposite side surfaces in the column direction.

[0121] According to some embodiments of the second aspect, the display device further includes a marker area disposed on each of two opposite sides of the row direction of the repair area, wherein the marker area includes a light-blocking layer formed on the substrate, a buffer layer formed on the light-blocking layer, and a gate insulating layer formed on the buffer layer.

[0122] According to some embodiments of the second aspect, a width of the marker area in the column direction is less than a width of the repair area in the column direction.

[0123] According to some embodiments of the second aspect, the marker area further includes: a protection layer formed on the gate insulating layer; a planarization layer formed on the protection layer; an anode layer formed on the planarization layer; and a cathode layer formed on the anode layer.

[0124] A third aspect of the present disclosure provides a method for manufacturing a display device, the method comprising the steps of: depositing and patterning a light-shielding layer on a substrate; depositing a buffer layer on the substrate and the light-shielding layer; depositing an active layer on the buffer layer and patterning the active layer into a first active line and a second active line; depositing a gate insulating layer on the buffer layer, the first active line and the second active line; and defining a repair area so as to extend the first active line and the second active line in a row direction, dividing the repair area into a cut area and a recess area, and etching the gate insulating layer in the repair area and etching the buffer layer in the recess area.

[0125] According to some embodiments of the third aspect, the method further comprises the steps of: defining a marker area on each of two opposite sides of the repair area in the row direction; depositing a gate layer in the repair area and the marker area; and patterning the gate layer, wherein the patterning of the gate layer comprises removing the gate layer in the repair area and the marker area, and removing the light-shielding layer in the recess area.

[0126] According to some embodiments of the third aspect, the method further comprises the steps of: forming a protection layer in the repair area and the marker area; forming a planarization layer on the protection layer; forming an anode layer on the planarization layer; and forming a cathode layer on the anode layer.

[0127] Although some embodiments of the present disclosure have been described above with reference to the accompanying drawings, the present disclosure can not be limited to some embodiments, and can be implemented in various different forms. It will be understood by those of ordinary skill in the art to which the present disclosure belongs that the present disclosure can be implemented in other specific forms without changing the technical idea or essential characteristics of the present disclosure. Therefore, it should be understood that some embodiments as described above are illustrative in all aspects and are not limiting.

Claims

1. A display device, the display device comprising: A first active line and a second active line, wherein the first active line and the second active line are arranged in the row direction and extend in the column direction; as well as The repair region extends across the first active line and the second active line in the row direction. The repair area includes: A cutting region, the cutting region being perpendicularly overlapped with the first active line and the second active line; and The groove region does not overlap perpendicularly with the first active line and the second active line, and the groove region includes at least one groove.

2. The display device according to claim 1, wherein, The cutting area includes: a light-shielding layer disposed on the substrate; a buffer layer disposed on the light-shielding layer; and an active layer disposed on the buffer layer.

3. The display device according to claim 2, wherein, The at least one groove is based on a hole or recess in the light-shielding layer and the buffer layer.

4. The display device according to claim 3, wherein, The cutting area further includes: a protective layer disposed on the active layer; a planarization layer disposed on the protective layer; an anode layer disposed on the planarization layer; and a cathode layer disposed on the anode layer. The groove region further includes: a portion of the protective layer disposed on the substrate, a portion of the planarization layer disposed on the protective layer, a portion of the anode layer disposed on the planarization layer, and a portion of the cathode layer disposed on the anode layer.

5. The display device according to claim 2, wherein, The stack of the light-shielding layer, the buffer layer, and the active layer is located in the cutting area, and The stack has two opposing side surfaces in the column direction.

6. The display device according to claim 1, wherein, The display device further includes a marking area disposed on the opposite side of the repair area, and The marking area includes a light-shielding layer disposed on the substrate, a buffer layer disposed on the light-shielding layer, and a gate insulating layer disposed on the buffer layer.

7. The display device according to claim 6, wherein, The width of the marked area in the column direction is smaller than the width of the repair area in the column direction.

8. The display device according to claim 6, wherein, The marking area further includes: a protective layer disposed on the gate insulating layer; a planarization layer disposed on the protective layer; an anode layer disposed on the planarization layer; and a cathode layer disposed on the anode layer.

9. The display device according to claim 1, wherein, The first active line is the first branch that connects the data line to the sub-pixel, and The second active line is a second branch that connects the reference voltage line to the sub-pixel.

10. A display device, the display device comprising: Multiple sub-pixels; A data line configured to provide a data voltage to the plurality of sub-pixels; A reference voltage line, configured to provide a reference voltage to the plurality of sub-pixels; The first branch connects the data line to one of the plurality of sub-pixels; A second branch line connects the reference voltage line to one of the plurality of sub-pixels, wherein the second branch line and the first branch line are arranged in the row direction and extend parallel to each other in the column direction; and The repair area extends across the first branch and the second branch in the row direction. The repair area includes: A cutting region, which intersects perpendicularly with the first branch and the second branch; and A groove region that does not perpendicularly overlap with the first branch and the second branch, the groove region comprising at least one groove.

11. The display device according to claim 10, wherein, The cutting area includes: a light-shielding layer disposed on the substrate; a buffer layer disposed on the light-shielding layer; and an active layer disposed on the buffer layer.

12. The display device according to claim 11, wherein, The at least one groove includes a hole or recess in the light-shielding layer and the buffer layer.

13. The display device according to claim 12, wherein, The cutting area further includes: a protective layer disposed on the active layer; a planarization layer disposed on the protective layer; an anode layer disposed on the planarization layer; and a cathode layer disposed on the anode layer. The groove region further includes: a protective layer disposed on the substrate, a planarization layer disposed on the protective layer, an anode layer disposed on the planarization layer, and a cathode layer disposed on the anode layer.

14. The display device according to claim 11, wherein, The cutting area includes a stack of the light-shielding layer and the buffer layer, and The opposite side surfaces of the active layer are disposed in the column direction.

15. The display device according to claim 10, wherein, The display device further includes a marking area disposed on the opposite side of the repair area, and The marking area includes a light-shielding layer disposed on the substrate, a buffer layer disposed on the light-shielding layer, and a gate insulating layer disposed on the buffer layer.

16. The display device according to claim 15, wherein, The width of the marked area in the column direction is smaller than the width of the repair area in the column direction.

17. The display device according to claim 16, wherein, The marking area further includes: a protective layer disposed on the gate insulating layer; a planarization layer disposed on the protective layer; an anode layer disposed on the planarization layer; and a cathode layer disposed on the anode layer.

18. A method for manufacturing a display device, the method comprising the following steps: Deposit and pattern a light-shielding layer on a substrate; A buffer layer is deposited on the substrate and the light-shielding layer; An active layer is deposited on the buffer layer, and the active layer is patterned into a first active line and a second active line; A gate insulating layer is deposited on the buffer layer, the first active line, and the second active line; as well as The repair area is defined as extending across the first active line and the second active line in the row direction, the repair area is divided into a cut area and a groove area, and the gate insulating layer in the repair area and the buffer layer in the groove area are etched.

19. The method for manufacturing a display device according to claim 18, wherein, The method further includes the following steps: A marking area is defined on the opposite side of the repair area in the row direction; Deposit a gate layer in the repair region and the marking region; and The gate layer is patterned. The patterning step of the gate layer includes: removing a portion of the gate layer in the repair region and the marking region, and removing a portion of the light-shielding layer in the groove region.

20. The method for manufacturing a display device according to claim 19, wherein, The method further includes the following steps: A protective layer is formed in the repair area and the marked area; A planarization layer is formed on the protective layer; An anode layer is formed on the planarization layer; and A cathode layer is formed on the anode layer.

21. A display device, the display device comprising: Multiple sub-pixels; A data line configured to provide a data voltage to the plurality of sub-pixels; A reference voltage line, configured to provide a reference voltage to the plurality of sub-pixels; The first branch connects the data line to one of the plurality of sub-pixels; A second branch line connects the reference voltage line to one of the plurality of sub-pixels, and the second branch line extends parallel to the first branch line. as well as The repair area extends across the first branch and the second branch. The repair area includes: The first groove is located between the first branch and the second branch, and The second groove and the third groove, wherein the first branch and the second branch are located between the second groove and the third groove.

22. The display device according to claim 21, wherein, The repaired area also includes: A light-shielding layer disposed on the substrate; A buffer layer is provided on the light-shielding layer. The first groove includes a first hole that extends through both the light-shielding layer and the buffer layer. The second groove includes a second hole that extends through both the light-shielding layer and the buffer layer. The third groove includes a third hole that extends through both the light-shielding layer and the buffer layer.

23. The display device according to claim 21, wherein, The repaired area also includes: The marking area includes a first extension protruding from the reference voltage line on a first side of the repair area and a second extension protruding from the data line on a second side of the repair area.

24. The display device according to claim 21, wherein, The first groove, the second groove, and the third groove are configured to capture or contain conductive debris generated during a cut repair process that cuts through the first branch and the second branch.

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