High-temperature-resistant glass imprinting template as well as preparation method and application thereof

Abstract

The invention belongs to the technical field of glass, and discloses a high-temperature-resistant glass imprinting template as well as a preparation method and application thereof. The high-temperature-resistant glass imprinting template disclosed by the invention is made of a high-temperature-resistant material; one side of the high-temperature-resistant glass imprinting template is in a mirror surface state, and the other side is not specially treated; a micro-nano structure is arranged on one side of the mirror surface state, and the micro-nano structure comprises a groove and a blind hole; in a unit defined by the groove, the sum of the projection area of the groove and the projection area of the blind hole accounts for less than or equal to 30% of the total area of the unit. According to the high-temperature-resistant glass imprinting template provided by the invention, through the optimally designed composite structure of the grooves and the blind holes and the area ratio of the grooves and the blind holes, the imprinted glass surface can simultaneously obtain excellent super-hydrophobicity (high contact angle and low rolling angle) and high light transmission; the selected high-temperature-resistant material and the preparation process ensure the dimensional stability and long service life of the template in a high-temperature imprinting environment.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of glass, in particular to a high-temperature-resistant glass imprinting template and a preparation method and application thereof. BACKGROUND

[0002] Super-hydrophobic glass has important application value in many fields such as building, automobile, electronics and optics due to its excellent properties such as self-cleaning, anti-fogging and anti-icing, and the market demand continues to grow. The key to realizing the super-hydrophobic performance of glass is to build the synergistic effect of specific micro-nano rough structure and low surface energy modification. The template imprinting method has become one of the mainstream technical paths for preparing super-hydrophobic glass due to its advantages such as simple process, controllable cost and scalable production. The key of this method is to design and prepare a stable and precise imprinting template, and then transfer the micro-nano structure on the surface of the template to the glass surface through the imprinting process, so as to endow the glass with super-hydrophobic function.

[0003] However, the existing technology generally faces the core problem of being difficult to balance super-hydrophobicity and light transmittance when preparing super-hydrophobic glass by using the template imprinting method. In order to obtain ideal super-hydrophobic effect, micro-nano structures with sufficient roughness need to be formed on the surface of the glass, but such structures often scatter and refract light, resulting in a significant decrease in the light transmittance of the glass; if the micro-nano structure design is simplified to ensure light transmittance, the basic requirements of super-hydrophobic performance cannot be met. For example, a high-transparent, super-hydrophobic and rainbow-free quartz disordered nano structure and its preparation method proposed in patent CN115849295A, through the use of a disordered nano-pore imprinting template to prepare a quartz disordered nano-pillar structure, although a high light transmittance of 95.1% is achieved, the template is a disordered structure, which is difficult to precisely control the roughness distribution on the surface of the glass, and the applicable scenarios are limited. The preparation method of a self-cleaning film mentioned in patent CN104445054A uses a micro-nano composite structure template to imprint a thermoplastic polymer film, which can realize super-hydrophobic function, but the specific structure design of the template does not consider the precise control of the light transmittance of the glass after imprinting, which cannot meet the use requirements of high light transmittance scenarios.

[0004] Meanwhile, the high-temperature imprinting process puts strict requirements on the material properties and structural stability of the template. The existing imprinting templates are commonly made of conventional metal materials such as stainless steel, which has insufficient high-temperature resistance and is prone to deformation and oxidation during high-temperature imprinting, affecting the structural replication precision and the service life of the template. For example, Dingwei G, Jiangyou L, Dafa J, et al. Robust and Stable Transparent Superhydrophobic Polydimethylsiloxane Films by Duplicating via a Femtosecond Laser-Ablated Template. [J]. ACS applied materials & interfaces, 2016, 8(27): 17511-8. DOI: 10.1021 / acsami.6b03424, the template material in this prior art is stainless steel, and the imprinting object is polydimethylsiloxane (PDMS), not glass, which cannot meet the process requirements of glass high-temperature imprinting. The metal mold for imprinting super-hydrophobic micro-nano surface and its laser preparation method mentioned in patent CN103521929A uses ultra-short pulse laser to prepare a symmetric negative structure mold with lotus micro-nano structure, which has high-temperature resistance and high-pressure resistance. However, the mold structure is a combination of micron-level pits and nano-level sub-structures, and the balance between super-hydrophobicity and light transmission has not been solved.

[0005] In addition, in the prior art, some schemes involve reverse transfer printing or template preparation of super-hydrophobic structures, but do not disclose specific structural designs that can simultaneously satisfy super-hydrophobicity and high light transmittance. For example, Pan R, Zhong M L. Ultrafast laser preparation of super-hydrophobic super-hydrophilic surface and mechanical durability of super-hydrophobic surface [J]. Bulletin of Science, 2019, 64(12): 1268-1289. This prior art only gives a technical inspiration for reverse structure transfer printing, without specific parameters of the reverse structure; Jiang D, Fan P, Gong D, et al. High-temperature imprinting and super-hydrophobicity of micro / nano surface structures on metals using molds fabricated by ultrafast laser ablation [J]. Journal of Materials Processing Tech., 2016, 23656-63. DOI: 10.1016 / j.jmatprotec.2016.05.009. This prior art uses a tungsten mold to imprint micro / nano structures on a copper surface, but the mold is a "nanometer corrugated array superimposed on a micro convex array", and does not involve application on glass materials. Yi L, Jinpeng H, Mingyong C, et al. Durable and robust transparent super-hydrophobic glass surfaces fabricated by a femtosecond laser with exceptional water repellency and thermostability [J]. Journal of Materials Chemistry A, 2018, 6(19): 9049-9056. DOI: 10.1039 / c8ta01965g. This prior art directly processes the glass surface with a laser to obtain a super-hydrophobic surface, which has the defects of complex process and difficulty in large-scale production.

[0006] In summary, the prior art still has deficiencies in the material selection, micro / nano structure design, balance between super-hydrophobicity and light transmittance of the super-hydrophobic glass imprinting template.

[0007] Therefore, it is of great significance to research a high-temperature-resistant glass imprinting template with excellent high-temperature-resistant performance, reasonable structure design, and the ability to make the glass have good super-hydrophobicity and high light transmittance after imprinting, and a preparation method thereof. SUMMARY

[0008] The application aims to provide a high-temperature-resistant glass imprinting template and a preparation method and application thereof, so as to solve the problems of the prior art, such as difficulty in balancing super-hydrophobicity and light transmittance, insufficient high-temperature resistance, and poor structural stability.

[0009] In order to achieve the above-mentioned application purposes, the application provides the following technical solutions. The application provides a high-temperature-resistant glass imprinting template, which is made of a high-temperature-resistant material. One side of the high-temperature-resistant glass imprinting template is in a mirror state, and the other side is not specially treated. The side in the mirror state is provided with a micro-nano structure, and the micro-nano structure comprises a micro-groove and a blind hole. In a unit surrounded by the grooves, the sum of the projected area of the grooves and the projected area of the blind holes accounts for ≤30% of the total area of the unit.

[0010] Preferably, the thickness of the high-temperature-resistant glass imprinting template is 1-500 mm, and the area is 100 mm 2 ~10 m 2 ; The high-temperature-resistant material comprises one or more of platinum-rhodium alloy, silicon carbide, silicon nitride, boron carbide, boron nitride, aluminum oxide, diamond, tungsten, tungsten carbide, molybdenum alloy, and nickel-based high-temperature alloy. The roughness Sa of the side in the mirror state is <1.0 μm.

[0011] Preferably, the inner surface of the groove is provided with corrugations and / or particle substructures. The cross-sectional shape of the groove comprises one or more of a rectangle, a trapezoid, a triangle, a cone, a U shape, a V shape, and a deformation of the above shapes. A blocking structure is left on the groove of each side of the unit, so as to divide the groove into two sections, and the length of the blocking structure is equal to the depth of the groove.

[0012] Preferably, the depth of the groove is 10-500 μm, and the width of the groove is 10-500 μm.

[0013] Preferably, the blind holes are uniformly distributed on the unit surrounded by the grooves. The diameter of the blind hole is 10-200 μm, the depth of the blind hole is 10-600 μm, and the depth of the blind hole is ≥ the depth of the groove.

[0014] The application further provides a preparation method of the high-temperature-resistant glass imprinting template, which comprises the following steps. 1) High-temperature-resistant material as a base material, sequentially grinding, polishing on one side of the base material to obtain a mirror surface on one side of the base material, then sequentially washing in anhydrous ethanol, anhydrous acetone, taking out and drying with nitrogen gas flow to obtain a pretreated base material; 2) Selective patterning ablation of the mirror surface side of the pretreated base material by laser, then sequentially washing in anhydrous ethanol, anhydrous acetone, taking out and drying with nitrogen gas flow to obtain a groove structure; 3) Blind holes are prepared in the unit surrounded by the groove through laser precise punching process, then washed with anhydrous ethanol, taken out and dried with nitrogen gas flow to obtain a high-temperature-resistant glass stamping die.

[0015] Preferably, in steps 1) to 3), the washing is ultrasonic washing, the power of the ultrasonic washing is independently 10-300W, and the time of the ultrasonic washing is independently 1-30min; In the drying process, the purity of nitrogen is ≥99.99%, and the drying time is independently 1s-5min.

[0016] Preferably, in step 2), the wavelength of the laser is 300-1064nm, the pulse width is 10fs-1000ns, the pulse energy of the laser is 1μJ-1mJ, and the scanning speed is 1μm / s-10m / s.

[0017] The application also provides an application of the high-temperature-resistant glass stamping die in preparing super-hydrophobic glass.

[0018] The beneficial effects of the application are as follows: The high-temperature-resistant glass stamping die provided by the application can form a special micro-nano structure on the surface of the glass after stamping the glass in a molten state through the optimized groove and blind hole composite microstructure, thereby obtaining excellent super-hydrophobicity (high contact angle and low rolling angle), and through the microstructure layout and area ratio control, the glass stamping die has high light transmittance; the selected high-temperature-resistant material and preparation process ensure the dimensional stability and long service life of the stamping die in a high-temperature stamping environment. BRIEF DESCRIPTION OF DRAWINGS

[0019] In order to more clearly illustrate the technical solutions in the embodiments of the application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments or the prior art description. Obviously, the drawings in the following description are only embodiments of the application, and other drawings can be obtained by those skilled in the art without creative labor on the basis of the provided drawings.

[0020] Figure 1 A 3D front view of the high-temperature-resistant glass stamping die obtained in Example 1; Figure 2This is a 3D back view of the high-temperature resistant glass imprinting template obtained in Example 1; Figure 3 This is a three-dimensional surface morphology view of the front of the high-temperature resistant glass imprinting template obtained in Example 1; Figure 4 This is a three-dimensional surface morphology image of the reverse side of the high-temperature resistant glass imprinting template obtained in Example 1; Figure 5 This is a 3D front view of the high-temperature resistant glass imprinting template obtained in Example 2; Figure 6 This is a 3D back view of the high-temperature resistant glass imprinting template obtained in Example 2; Figure 7 This is a three-dimensional surface morphology view of the front of the high-temperature resistant glass imprinting template obtained in Example 2; Figure 8 This is a three-dimensional surface morphology diagram of the reverse side of the high-temperature resistant glass imprinting template obtained in Example 2. Detailed Implementation

[0021] This invention provides a high-temperature resistant glass imprinting template, which is made of a high-temperature resistant material; One side of the high-temperature resistant glass imprinting template is mirror-like, while the other side is not specially treated. The mirror-like side is provided with micro-nano structures, which include micron-scale trenches and blind holes; In the unit enclosed by the trench, the sum of the projected area of ​​the trench and the projected area of ​​the blind hole accounts for ≤30% of the total area of ​​the unit.

[0022] In this invention, the sum of the projected area of ​​the groove and the projected area of ​​the blind hole accounts for 2-26% of the total area of ​​the unit, more preferably 5-20%, and even more preferably 10-15%.

[0023] In this invention, the thickness of the high-temperature resistant glass imprinting template is preferably 1-500 mm, more preferably 50-400 mm, and even more preferably 100-200 mm, and the area is preferably 100 mm². 2 ~10m 2 Further preferred is 600mm 2 ~6m 2 More preferably 60cm 2 ~2m 2 ; The high-temperature resistant material preferably includes one or more of the following: platinum-rhodium alloy, silicon carbide, silicon nitride, boron carbide, boron nitride, alumina, diamond, tungsten, tungsten carbide, molybdenum alloy, and nickel-based high-temperature alloy. The roughness Sa on the mirror-like side is preferably <1.0 μm, more preferably <0.8 μm, and even more preferably <0.4 μm.

[0024] In this invention, the inner surface of the trench is preferably provided with corrugations and / or granular substructures; The cross-sectional shape of the trench preferably includes one or more of the following: rectangular, trapezoidal, triangular, conical, U-shaped, V-shaped, and variations thereof; A blocking structure is left on the groove on each side of the unit, dividing the groove into two sections. The length of the blocking structure is equal to the depth of the groove.

[0025] In this invention, the blocking structure serves to improve the stability of the superhydrophobic glass structure after imprinting, and at the same time, to expel gas or excess material during the imprinting process, thereby improving the integrity and accuracy of the structure transfer.

[0026] In this invention, the depth of the trench is preferably 10~500μm, more preferably 50~400μm, and even more preferably 100~200μm; the width of the trench is preferably 10~500μm, more preferably 50~400μm, and even more preferably 100~200μm. When the unit enclosed by the groove is square, the side length of the unit is preferably 50~1000μm, more preferably 200~800μm, and even more preferably 300~500μm.

[0027] In this invention, the blind holes are preferably evenly distributed on the unit enclosed by the trench; The diameter of the blind hole is preferably 10~200μm, more preferably 50~150μm, and even more preferably 80~100μm. The depth of the blind hole is preferably 10~600μm, more preferably 100~500μm, and even more preferably 200~300μm. The depth of the blind hole is greater than or equal to the depth of the trench.

[0028] In this invention, the blind hole preferably includes a blind conical hole and a blind cylindrical hole.

[0029] This invention also provides a method for preparing a high-temperature resistant glass imprinting template, comprising the following steps: 1) Using high-temperature resistant material as the substrate, one side of the substrate is successively ground and polished to obtain a substrate with a mirror finish on one side. Then, it is cleaned in anhydrous ethanol and anhydrous acetone in sequence. After being taken out, it is dried with nitrogen gas flow to obtain the pretreated substrate. 2) Selective patterning ablation of the mirror side of the pretreated substrate is performed using a laser, followed by cleaning in anhydrous ethanol and anhydrous acetone in sequence. After removal, it is dried with nitrogen gas flow to obtain the groove structure. 3) Blind holes are prepared in the unit enclosed by the groove using laser precision drilling technology, then cleaned with anhydrous ethanol, and dried with nitrogen gas flow to obtain a high-temperature resistant glass imprinting template.

[0030] In this invention, in steps 1) to 3), the cleaning is preferably ultrasonic cleaning, the ultrasonic cleaning power is preferably 10~300W, more preferably 60~210W, more preferably 120~160W, and the ultrasonic cleaning time is preferably 1~30min, more preferably 5~25min, more preferably 10~20min. During the drying process, the purity of nitrogen is preferably ≥99.99%, and the drying time is preferably 1s to 5min, more preferably 30s to 4min, and even more preferably 2 to 3min.

[0031] In this invention, in step 1), the grinding sample is preferably a gradient grinding sample, and the grit of the sandpaper used for grinding the sample is 400 grit, 800 grit, 1200 grit and 2000 grit respectively.

[0032] In this invention, in step 2), the wavelength of the laser is preferably 300~1064nm, more preferably 343nm, 532nm, 1030nm or 1064nm, more preferably 1030nm or 1064nm, the pulse width is preferably 10fs~1000ns, more preferably 300fs~300ns, more preferably 300~800fs, the pulse energy of the laser is preferably 1μJ~1mJ, more preferably 10~500μJ, more preferably 50~300μJ, and the scanning speed is preferably 1μm / s~10m / s, more preferably 1mm / s~5m / s, more preferably 10mm / s~1m / s.

[0033] This invention also provides an application of a high-temperature resistant glass imprinting template in the preparation of superhydrophobic glass.

[0034] The technical solutions provided by the present invention will be described in detail below with reference to the embodiments, but they should not be construed as limiting the scope of protection of the present invention.

[0035] Example 1

[0036] High-temperature resistant glass imprinting template parameters: Tungsten is used as the high-temperature resistant substrate, the template thickness is 5mm, and the area is 1m². 2 ; The roughness Sa on one side of the mirror is 0.2μm. The mirror side is provided with a micro-nano structure composed of grooves and blind cone holes. The unit enclosed by the grooves is square. The cross-sectional shape of the groove is "V". The side length of the unit is 320μm. The groove depth is 60μm and the width is 40μm. The inner surface of the groove is provided with corrugations and granular substructures. Each side of the unit has a blocking structure, which divides each side of the unit into two segments. The blocking structure is located at the midpoint of each side of the unit. The length of the blocking structure is equal to the depth of the groove. Blind cone holes are evenly distributed on the unit enclosed by the trench, specifically on the line connecting the center point of the unit and each corner to the center point, i.e., there are 5 blind cone holes in each unit. Among them, the blind cone holes on the line connecting each corner to the center point are distributed symmetrically with respect to the center point of the unit. The diameter of the blind cone holes is 40μm and the depth is 65μm. In the unit enclosed by the trench, the sum of the projected areas of the trench and the blind cone holes accounts for 8% of the total area of ​​the unit.

[0037] Preparation method: Using tungsten as the substrate, one side of the substrate was sequentially subjected to gradient grinding (using sandpaper with grits of 400, 800, 1200, and 2000 grits) and polishing. Subsequently, it was ultrasonically cleaned in anhydrous ethanol and anhydrous acetone at a power of 200W for 17 minutes per step. After removal, it was dried by blowing with nitrogen gas with a purity of ≥99.99% for 4 minutes to obtain the pretreated substrate. Selective patterning ablation was performed on the mirror side of the pretreated substrate using a femtosecond laser with a wavelength of 1064 nm, a pulse width of 500 fs, a single pulse energy of 100 μJ, and a scanning speed of 100 mm / s. After ablation, the substrate was ultrasonically cleaned in anhydrous ethanol and anhydrous acetone in sequence with an ultrasonic power of 200 W and a cleaning time of 17 min for each step. After removal, the substrate was dried by blowing with nitrogen gas with a purity of ≥99.99% for 4 min to obtain the groove structure. Blind cone holes are prepared in the unit enclosed by the groove using laser precision drilling technology. Then, the plate is ultrasonically cleaned with anhydrous ethanol at a power of 200W for 17 minutes. After removal, it is dried by blowing with nitrogen gas with a purity of ≥99.99% for 4 minutes to obtain the high temperature resistant glass imprinting template.

[0038] Example 2

[0039] High-temperature resistant glass imprinting template parameters: A platinum-rhodium alloy is used as the high-temperature resistant substrate; the template thickness is 8mm and the area is 1.5m². 2 ; The roughness Sa on one side of the mirror is 0.15μm. The mirror side is provided with a micro-nano structure consisting of grooves and blind cylindrical holes. The unit enclosed by the grooves is hexagonal, and the cross-sectional shape of the groove is "V". The groove depth is 70μm and the width is 50μm. The inner surface of the groove is provided with corrugations and granular substructures. Each side of the unit has a blocking structure, which divides each side of the unit into two segments. The blocking structure is located at the midpoint of each side of the unit, and the length of the blocking structure is equal to the depth of the groove. Blind cylindrical holes are evenly distributed on the unit enclosed by the grooves, specifically at the center point of the unit and the trisection points of the line connecting each corner to the center point. That is, each unit has a total of 13 blind cylindrical holes with a diameter of 30μm and a depth of 75μm. In the unit enclosed by the grooves, the sum of the projected areas of the grooves and the blind cylindrical holes accounts for 3% of the total area of ​​the unit.

[0040] Preparation method: Using a platinum-rhodium alloy as the substrate, one side of the substrate was sequentially subjected to gradient grinding (using sandpaper with grits of 400, 800, 1200, and 2000 grits) and polishing. Subsequently, it was ultrasonically cleaned in anhydrous ethanol and anhydrous acetone at a power of 190W for 16 minutes per step. After removal, it was dried by blowing with nitrogen gas with a purity of ≥99.99% for 3 minutes to obtain the pretreated substrate. Selective patterning ablation was performed on the mirror side of the pretreated substrate using a femtosecond laser with a wavelength of 1030 nm, a pulse width of 800 fs, a single pulse energy of 200 μJ, and a scanning speed of 200 mm / s. After ablation, the substrate was ultrasonically cleaned in anhydrous ethanol and anhydrous acetone in sequence with an ultrasonic power of 190 W and a cleaning time of 16 min for each step. After removal, the substrate was dried by blowing with nitrogen gas with a purity of ≥99.99% for 3 min to obtain the groove structure. Blind cylindrical holes are prepared in the unit enclosed by the groove using laser precision drilling technology. Then, the holes are ultrasonically cleaned with anhydrous ethanol at a power of 190W for 16 minutes. After cleaning, the holes are dried by blowing with nitrogen gas with a purity of ≥99.99% for 3 minutes to obtain the high-temperature resistant glass imprinting template.

[0041] Comparative Example 1

[0042] The percentage of the sum of the projected areas of the groove and the blind cone hole to the total area of ​​the unit is set to 35%, and the other steps are the same as in Example 1, to obtain the glass imprint template.

[0043] Comparative Example 2

[0044] The mirror side is provided with only a groove structure and no blind cone hole is provided. The other steps are the same as in Example 1 to obtain the glass imprint template.

[0045] Comparative Example 3

[0046] Using conventional stainless steel as the substrate, and following the same steps as in Example 1, a glass imprinting template is obtained.

[0047] Comparative Example 4

[0048] The blind cone holes are of different sizes and their positions are randomly distributed. The other steps are the same as in Example 1 to obtain a glass imprint template.

[0049] The following performance tests were conducted on the high-temperature resistant glass imprinting templates obtained in Examples 1-2 and the glass imprinting templates obtained in Comparative Examples 1-4: High temperature resistance test: The templates of each embodiment and comparative example were placed in the common temperature environment (600℃) for glass high-temperature imprinting for 2 hours and then naturally cooled to room temperature. The key dimensions (length, width, groove depth, and blind hole depth) of the templates before and after heat preservation were measured using a laser rangefinder, and the deformation was calculated. The surface morphology of the templates was observed by scanning electron microscopy to determine the degree of oxidation (the thickness of the surface oxide layer was used as the criterion; if it exceeded this, the oxidation was considered unqualified). The test results are shown in Table 1.

[0050] Table 1. Test results of the high-temperature resistance of the high-temperature resistant glass imprinting templates obtained in Examples 1-2 and Comparative Examples 1-4

[0051] Verification of superhydrophobic glass performance after embossing: Superhydrophobic glass sample preparation: The glass imprinting templates of each embodiment and comparative example were used in the high-temperature glass imprinting process. The imprinting parameters were: temperature 600℃, pressure 5MPa, and holding time 30min, to obtain the corresponding superhydrophobic glass samples. test: Static contact angle and roll-off angle: Using a contact angle measuring instrument, 5 μL of water droplets were dropped onto different positions on the surface of the glass sample (5 test points were selected), and the contact angle values ​​were recorded; then the sample stage was tilted, and the tilt angle (roll-off angle) when the water droplet started to roll was recorded. The average value of the 5 test points was taken as the final result; among them, a static contact angle ≥150° and a roll-off angle ≤10° were considered to be qualified for superhydrophobicity. The test results are shown in Table 2. Transmittance: The transmittance of the glass sample in the visible light band (400~760nm) was tested using a UV-Vis spectrophotometer. The average value was taken as the final result. A transmittance of ≥80% is considered to be high transmittance and qualified. The test results are shown in Table 2.

[0052] Table 2. Results of superhydrophobic glass performance after imprinting using the high-temperature resistant glass imprinting templates obtained in Examples 1-2 and Comparative Examples 1-4.

[0053] Template lifespan test: The templates of each embodiment and comparative example were repeatedly used in the high-temperature glass imprinting process. After each imprint, the superhydrophobicity and light transmittance of the glass sample were tested, and the number of imprints at which the first performance change occurred was recorded. The performance test results are shown in Table 3.

[0054] Table 3. Service life test results of the high-temperature resistant glass imprinting templates obtained in Examples 1-2 and Comparative Examples 1-4

[0055] As shown in Tables 1-3, the templates of Examples 1-2 all possess excellent high-temperature resistance. The glass samples after imprinting simultaneously meet the requirements of superhydrophobicity (static contact angle ≥150°, roll-off angle ≤10°) and high light transmittance (transmittance ≥80%). Furthermore, the templates have a long service life (stable imprinting more than 500 times), which fully demonstrates that the high-temperature resistant glass imprinting template of the present invention has a reasonable structural design and appropriate material selection, and can effectively solve the problem of difficulty in balancing superhydrophobicity and light transmittance in the prior art.

[0056] Comparative Example 1, due to its structural proportions exceeding the limits of this invention, exhibited excellent superhydrophobic properties but a significantly reduced light transmittance (only 82.3%). This demonstrates that the ≤30% projected area ratio specified in this invention is crucial for achieving a balance between superhydrophobicity and light transmittance. Exceeding this ratio disrupts the synergistic effect of both, failing to meet the core requirements of this invention. Comparative Example 2, lacking a blind conical hole structure, suffered from insufficient superhydrophobic properties (static contact angle 142°, roll-off angle 18.7°), proving that the combination of blind holes and grooves is the core for ensuring superhydrophobic performance. Comparative Example 3, using conventional stainless steel as its substrate, showed a significant decrease in high-temperature resistance, post-imprint glass performance, and template lifespan, highlighting the necessity of the high-temperature resistant material specified in this invention. Comparative Example 4, due to its disordered structure, resulted in poor batch stability and a short lifespan, failing to meet the demands of large-scale production.

[0057] The above description is only a preferred embodiment of the present invention. It should be noted that for those skilled in the art, several improvements and modifications can be made without departing from the principle of the present invention, and these improvements and modifications should also be considered within the scope of protection of the present invention.

Claims

1. A high-temperature resistant glass imprinting template, characterized in that, The high-temperature resistant glass imprinting template is made of high-temperature resistant material; One side of the high-temperature resistant glass imprinting template is mirror-like, while the other side is not specially treated. The mirror-like side is provided with micro-nano structures, which include micron-scale trenches and blind holes; In the unit enclosed by the trench, the sum of the projected area of ​​the trench and the projected area of ​​the blind hole accounts for ≤30% of the total area of ​​the unit.

2. The high-temperature resistant glass imprinting template according to claim 1, characterized in that, The high-temperature resistant glass imprinting template has a thickness of 1~500mm and an area of ​​100mm². 2 ~10m 2 ; The high-temperature resistant material includes one or more of the following: platinum-rhodium alloy, silicon carbide, silicon nitride, boron carbide, boron nitride, alumina, diamond, tungsten, tungsten carbide, molybdenum alloy, and nickel-based high-temperature alloy; The roughness Sa on the mirror-like side is less than 1.0 μm.

3. The high-temperature resistant glass imprinting template according to claim 2, characterized in that, The inner surface of the trench is provided with corrugations and / or granular substructures; The cross-sectional shape of the trench includes one or more of the following: rectangular, trapezoidal, triangular, conical, U-shaped, V-shaped, and variations thereof. A blocking structure is left on the groove on each side of the unit, dividing the groove into two sections. The length of the blocking structure is equal to the depth of the groove.

4. The high-temperature resistant glass imprinting template according to claim 3, characterized in that, The depth of the trench is 10~500μm and the width of the trench is 10~500μm.

5. A high-temperature resistant glass imprinting template according to claim 1 or 4, characterized in that, The blind holes are evenly distributed on the unit enclosed by the trench; The diameter of the blind hole is 10~200μm, the depth of the blind hole is 10~600μm, and the depth of the blind hole is greater than or equal to the depth of the trench.

6. A method for preparing a high-temperature resistant glass imprinting template according to any one of claims 1 to 5, characterized in that, Includes the following steps: 1) Using high-temperature resistant material as the substrate, one side of the substrate is successively ground and polished to obtain a substrate with a mirror finish on one side. Then, it is cleaned in anhydrous ethanol and anhydrous acetone in sequence. After being taken out, it is dried with nitrogen gas flow to obtain the pretreated substrate. 2) Selective patterning ablation of the mirror side of the pretreated substrate is performed using a laser, followed by cleaning in anhydrous ethanol and anhydrous acetone in sequence. After removal, it is dried with nitrogen gas flow to obtain the groove structure. 3) Blind holes are prepared in the unit enclosed by the groove using laser precision drilling technology, then cleaned with anhydrous ethanol, and dried with nitrogen gas flow to obtain a high-temperature resistant glass imprinting template.

7. The method for preparing a high-temperature resistant glass imprinting template according to claim 6, characterized in that, In steps 1) to 3), the cleaning is ultrasonic cleaning, with an independent ultrasonic cleaning power of 10~300W and an independent ultrasonic cleaning time of 1~30min. During the drying process, the purity of nitrogen gas is ≥99.99%, and the drying time is 1 second to 5 minutes.

8. A method for preparing a high-temperature resistant glass imprinting template according to claim 6 or 7, characterized in that, In step 2), the wavelength of the laser is 300~1064nm, the pulse width is 10fs~1000ns, the pulse energy of the laser is 1μJ~1mJ, and the scanning speed is 1μm / s~10m / s.

9. The application of the high-temperature resistant glass imprinting template according to any one of claims 1 to 5 in the preparation of superhydrophobic glass.

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