Polishing liquid treatment filtration device and circulating treatment system

Abstract

The present application relates to the field of separation filtering device for filtering solid impurities from liquid, and discloses a polishing liquid treatment filtering device and a circulating treatment system. The polishing liquid treatment filtering device comprises a machine body and a conical filtering rotary drum arranged on the machine body. The conical filtering rotary drum is arranged in the horizontal direction, and the bottom end of the cone is of open structure. The rotary drum comprises a filtering section with a filter screen on the side wall and a residue discharging section on one side of the cone bottom. The machine body is provided with a liquid inlet structure and a liquid collecting structure. The polishing liquid enters from the top end of the cone, forms a wall-adhering liquid film under the action of the rotary drum, and flows in the direction from the top end to the bottom end of the cone, so as to realize solid-liquid separation. The separated liquid is collected and discharged through the liquid collecting structure. The impurities are collected in the residue discharging section and continuously discharged through the impurity removing assembly extending into the residue discharging section. The present application also discloses a circulating treatment system. The device and the system can realize continuous filtering and continuous residue discharging of the polishing liquid, avoid shutdown cleaning, and improve the treatment efficiency and the operation stability.

Description

Technical Field

[0001] This invention relates to the technical field of separation and filtration devices for filtering solid impurities from liquids, and more specifically, to a polishing fluid treatment and filtration device and a circulation system. Background Technology

[0002] Polishing slurries are widely used in metal processing, optical processing, and semiconductor processing. They are typically solid-liquid mixtures formed by combining a base fluid with abrasive particles. During the polishing process, the polishing slurry not only removes minute amounts of material from the surface but also serves to cool, lubricate, and carry away machining debris.

[0003] As polishing continues, the composition of the polishing slurry gradually changes. On one hand, material removed from the surface of the workpiece enters the slurry, increasing the content of solid impurities. On the other hand, larger particles or agglomerates may be generated during polishing. These particles, mixed with the original abrasive, disrupt the particle size distribution of the slurry, thus affecting polishing accuracy and surface quality. When the impurity content or particle size distribution in the polishing slurry exceeds the allowable range, the slurry can no longer be used stably.

[0004] Therefore, in actual production, waste polishing slurry usually needs to be recycled. Impurities are removed through filtration and other methods, and the concentration of the treated liquid is adjusted for reuse. In some large-scale polishing scenarios, such as production lines with multiple workstations or multiple devices operating in parallel, waste polishing slurry is continuously and in large quantities, placing high demands on the continuous operation capability and processing efficiency of the processing equipment.

[0005] In the prior art, common polishing fluid filtration methods include using rotary filtration devices for solid-liquid separation. For example, the inventor's prior patent CN115837638B uses a rotary filter cylinder with a filter screen structure. During rotation, centrifugal force forces the liquid and fine particles through the filter screen and discharge them, while larger particles are retained inside the filter cylinder. This type of device has a relatively simple structure and can achieve a certain degree of continuous filtration.

[0006] However, the aforementioned existing technologies still have the following shortcomings:

[0007] First, impurities trapped during the filtration process gradually accumulate inside the filter cartridge, typically appearing as a muddy substance with decreasing water content, adhering to or accumulating on the inner wall of the filter cartridge. Over time, these impurities easily clog the filter mesh, leading to decreased filtration efficiency and even affecting the normal operation of the equipment.

[0008] Secondly, to restore filtration performance, the impurities accumulated inside the filter cartridge need to be cleaned. However, since most existing filtration devices are closed structures, the filtration process usually needs to be stopped during cleaning, resulting in the equipment being unable to operate continuously. Under continuous production conditions, waste polishing fluid is continuously generated; if the filtration device stops, the processing capacity will be insufficient, thus affecting overall production efficiency. To address this, some solutions involve setting up multiple filtration devices to work alternately to maintain continuous operation, but this method significantly increases the number of devices and system complexity.

[0009] Furthermore, existing technologies lack effective structural designs for the transport and discharge of impurities during the filtration process. Especially when the moisture content of impurities decreases and their flowability reduces, impurities tend to remain inside the equipment, further exacerbating clogging. Simultaneously, the filter screen is easily clogged by larger particles during use, and its cleaning typically relies on manual labor or backwashing during shutdown, making continuous online maintenance difficult.

[0010] In summary, existing polishing fluid filtration technology still has shortcomings in terms of continuous operation capability, impurity removal efficiency, and filtration stability, and needs further improvement. Summary of the Invention

[0011] To address the problems of easy clogging of the filter screen, difficulty in timely discharge of impurities, and the need for shutdown for cleaning in existing polishing slurry treatment and filtration devices, which make continuous operation difficult, this invention provides a polishing slurry treatment and filtration device and a circulation treatment system to achieve continuous filtration of polishing slurry and continuous discharge of impurities, thereby improving filtration efficiency and reducing the frequency of equipment operation interruptions.

[0012] To achieve the above objectives, the present invention provides a polishing fluid treatment and filtration device, comprising a body and a rotating filtration assembly disposed on the body, the rotating filtration assembly comprising a conical filtration drum with its axis arranged in a horizontal direction; the conical filtration drum is rotatably mounted on the body and driven to rotate around its axis by a drive device; the conical bottom end of the conical filtration drum has an open structure.

[0013] The machine body is equipped with:

[0014] The liquid inlet structure is used to introduce the polishing liquid to be treated from the top of the cone into the conical filter drum;

[0015] A liquid collection structure is used to collect liquids that are thrown out or seep out of the filtration section.

[0016] The conical filter drum includes:

[0017] The filtration section has its sidewalls at least partially composed of filter screens;

[0018] The slag discharge section is located on one side of the cone bottom of the filter section and is connected to the filter section. The sidewall of the slag discharge section is a non-filtration structure.

[0019] The slag discharge section is equipped with a cleaning component, which includes a suction port that extends into the slag discharge section through the open structure at the bottom of the cone, and a guide structure for guiding impurities to the suction port. The suction port faces the inner wall of the slag discharge section.

[0020] In some embodiments, the cone-shaped filter drum has a support structure at its top and bottom for supporting the rotation of the cone-shaped filter drum, so that the cone-shaped filter drum can rotate around its axis.

[0021] In some embodiments, the guiding structure includes a collecting scraper located upstream of the suction port along the direction of rotation. During the rotation of the conical filter drum, mud-like impurities deposited in the slag discharge section are transported to the collecting scraper under the circumferential conveying action. After being loosened and guided by the collecting scraper, they enter the suction port and are discharged, thereby achieving continuous slag discharge.

[0022] A gap of 2mm to 10mm is provided between the collecting scraper and the inner wall of the slag discharge section, and the collecting scraper is inclined relative to the rotation direction of the slag discharge section to guide impurities to gather towards the suction port.

[0023] In some embodiments, a backwashing device is also included, which includes nozzles arranged along a generatrix on the outside of the filter section to perform circumferential backwashing on the filter screen during the rotation of the conical filter drum.

[0024] The backwashing device is provided with multiple spraying units along the direction of the busbar. The spraying units at different axial positions have different spraying parameters, so that the backwashing intensity gradually increases from the top of the cone to the bottom of the cone.

[0025] The nozzle's spray direction has a radial component relative to the filter screen surface and an axial component pointing towards the bottom of the cone.

[0026] In some embodiments, the filter section is provided with a spiral conveying scraper that extends spirally along its inner wall. The spiral conveying scraper extends into the conical filter drum through a rotating shaft and is connected to a drive device to guide impurities deposited on the inner wall of the filter section to the slag discharge section.

[0027] The spiral conveying scraper is connected to the drive device or independent servo motor via a rotating shaft. There is a 1% to 10% speed difference between the rotation speed of the spiral conveying scraper and the rotation speed of the conical filter drum, and the two rotate in the same direction.

[0028] The pitch of the spiral conveying scraper is 0.3 to 1.0 times the diameter of the corresponding position of the filter section;

[0029] A gap of 1mm to 5mm is provided between the spiral conveying scraper and the inner wall of the filter section.

[0030] In some embodiments, the semi-cone angle of the conical filter drum is 8° to 20°.

[0031] In some embodiments, the liquid inlet structure sprays along the tangential direction of the conical filter drum, causing the incoming liquid to flow along the inner wall of the filter section.

[0032] The injection direction of the liquid inlet structure is tangentially arranged along the circumferential direction of the filter drum and inclined towards the bottom of the cone, with an inclination angle of 5° to 30°, thus having an axial component pointing towards the bottom of the cone;

[0033] The liquid inlet structure sprays in the same direction as the rotation of the conical filter drum.

[0034] In some embodiments, the liquid collection structure includes a cover that covers the rotating filter assembly, and the cover has a partition structure that divides the interior of the cover into a liquid collection space for a corresponding filtration section and a protective space for a corresponding slag discharge section.

[0035] The partition structure is provided with a through hole for the conical filter drum to pass through, and a gap is provided between the through hole and the conical filter drum.

[0036] In some embodiments, a cover plate is also included, which is detachably mounted on the body and covers the open structure at the bottom of the conical filter drum to prevent liquid splashing.

[0037] The shaft of the spiral conveyor scraper and the piping of the cleaning assembly pass through the cover plate.

[0038] Furthermore, the present invention also provides a cyclic processing system, comprising:

[0039] The filtration device provided by the present invention is used for solid-liquid separation of waste polishing liquid;

[0040] A liquid supply tank is used to store the liquid filtered by the filtration device; the liquid collection structure of the filtration device guides the separated liquid into the liquid supply tank.

[0041] A clean water tank is used to replenish the liquid supply tank with clean water.

[0042] A concentrate tank is used to replenish the concentrate polishing slurry to the supply tank.

[0043] A stirrer is installed inside the liquid supply tank to mix the liquid in the tank.

[0044] A concentration detection device is used to detect the concentration of polishing fluid in the supply tank;

[0045] The control unit is used to control the amount of water and / or concentrate tank supplied to the supply tank based on the detection results of the concentration detection device.

[0046] Output pump, used to deliver the prepared polishing slurry to the equipment using the slurry;

[0047] The impurity treatment unit is connected to the output end of the impurity removal component of the filter device and is used to collect the discharged mud-like impurities and further dehydrate them.

[0048] The polishing fluid treatment and filtration device of the present invention, which applies the above-mentioned technical solution, has the following effects:

[0049] In existing technologies, closed filter drum structures are used. During the filtration process, impurities gradually accumulate inside the filter drum, requiring periodic shutdowns for cleaning. This means that filtration and cleaning cannot be performed simultaneously, making it difficult to meet the continuous processing requirements in large-scale polishing scenarios. This invention addresses this by making the bottom of the conical filter drum open and incorporating a cleaning component consisting of suction ports within the slag discharge section. As the drum rotates, impurities are continuously transported to the suction ports and discharged, achieving simultaneous filtration and slag discharge without requiring shutdowns for cleaning. This significantly improves the equipment's continuous operation capability and overall processing efficiency.

[0050] Existing technologies for online cleaning typically require movable or rotating cleaning mechanisms, resulting in complex structures and sealing difficulties. This invention employs a fixed suction port, utilizing the rotation of the drum itself to achieve circumferential transport of impurities. Scraping and suction are performed only in localized areas, eliminating the need for a suction mechanism that moves with the rotating components. This avoids rotational sealing issues, resulting in a simpler, more reliable structure that is easier to maintain.

[0051] In existing technologies, impurities accumulate continuously within a closed filter drum, easily clogging the filter screen and leading to decreased filtration efficiency or even failure. In this invention, during the rotation of the conical filter drum, under centrifugal force, the polishing liquid entering the drum forms a continuous liquid film along the inner wall of the filtration section. Under the combined action of gravity and the conical structure, the film flows from the apex to the base of the cone. During this flow, the liquid gradually seeps out or is thrown out through the filter screen, causing the liquid content in the film to gradually decrease. Ultimately, impurities accumulate near the slag discharge section and enter it. Simultaneously, the liquid film continuously scours the inner surface of the filter screen during axial (generic) flow, dynamically cleaning impurities adhering to the inner side of the filter screen and reducing their retention and accumulation. Through the aforementioned liquid film formation and axial flow mechanism, this invention achieves solid-liquid separation while utilizing the fluid's own movement to self-clean the filtration structure, effectively reducing the risk of filter screen clogging and further improving the stability and continuous operation capability of the filtration process.

[0052] In this invention, the filtration section and the slag discharge section are connected, and impurities are continuously guided to the slag discharge section and discharged in a timely manner during the rotation of the drum, avoiding long-term retention and accumulation of impurities in the filtration section, thereby reducing the risk of filter screen clogging and ensuring long-term stable operation of the filtration process.

[0053] This invention employs a horizontally arranged conical filter drum. During rotation, impurities naturally tend to move towards the bottom of the cone under the influence of centrifugal force and the constraint of the conical surface, enabling them to migrate from the filtration section to the slag discharge section. This allows a basic slag discharge path to be formed without the need for additional complex conveying structures, thereby simplifying the structure and improving operational reliability.

[0054] Other features and advantages of the present invention will be described in detail in the following detailed description section. Attached Figure Description

[0055] Figure 1 This is a front view of the cyclic processing system of the present invention;

[0056] Figure 2 This is a side view of the cyclic processing system of the present invention;

[0057] Figure 3 yes Figure 2 A cross-sectional view of the polishing slurry treatment and filtration device in the AA direction, which is a schematic diagram of the internal structure of the polishing slurry treatment and filtration device.

[0058] Explanation of reference numerals in the attached figures

[0059] 1-The body;

[0060] 2- Conical filter drum, 2a- Filtration section, 2b- Slag discharge section;

[0061] 3-Liquid inlet structure;

[0062] 4-Liquid collection structure, 4a-Cover body, 4b-Separation structure;

[0063] 5-Spiral conveyor scraper;

[0064] 6-Spindle;

[0065] 7-Clean-up components;

[0066] 8-Backwashing device, 8a-Sprayer head;

[0067] 9-Cover plate;

[0068] 10-Liquid supply tank. Detailed Implementation

[0069] The technical solution of the present invention will be further described in detail below with reference to specific embodiments thereof. Those skilled in the art should understand that adjustments or equivalent substitutions can be made to the specific structural form without departing from the spirit of the present invention. In the present invention, unless otherwise stated, directional terms such as "inner" and "outer" refer to the inner and outer relationships relative to the outline of each component itself.

[0070] Polishing fluid treatment filtration device (reference) Figure 3 )

[0071] This invention provides a filtration device for the recycling of polishing fluid, which is mainly used to separate solids and liquids in the waste polishing fluid generated during the polishing process and to continuously discharge impurities, thereby ensuring that the polishing fluid can be continuously recycled.

[0072] The filtration device comprises a body 1 and a rotating filter assembly mounted on the body 1. The rotating filter assembly is the core functional unit of the device.

[0073] The rotary filter assembly includes a conical filter drum 2 arranged horizontally, with one end being the cone tip and the other end being the cone bottom, wherein the cone bottom is an open structure. The conical filter drum 2 is rotatably mounted on the body 1 by support structures respectively provided at the cone tip and cone bottom, and is driven by a drive device to rotate around its axis.

[0074] The conical filter drum 2 includes a filter section 2a and a slag discharge section 2b connected sequentially along the axial direction. The filter section 2a is located near the top of the cone, and its sidewall is at least partially composed of a filter screen, which is used to separate liquid from solid particles. The slag discharge section 2b is located near the bottom of the cone, and its sidewall is a non-filtering structure, which is used to receive the mud-like impurities formed after separation.

[0075] The body 1 is provided with a liquid inlet structure 3 and a liquid collection structure 4. The liquid inlet structure 3 is used to introduce the waste polishing liquid to be treated into the conical filter drum 2 from the top of the cone. The liquid collection structure 4 is located on the outside of the conical filter drum 2 and is used to collect the liquid thrown out or seeped out from the filter section 2a and export it to the subsequent processing or storage unit.

[0076] A cleaning component 7 is installed inside the slag discharge section 2b. The cleaning component 7 includes a suction port that extends into the slag discharge section 2b through an open structure at the bottom of the cone, and a guide structure for guiding impurities to the suction port. During the operation of the device, the muddy impurities entering the slag discharge section 2b undergo circumferential movement under the rotation of the conical filter drum 2, and converge towards the suction port under the action of the guide structure, and are finally continuously discharged through the suction port.

[0077] Preferably, the filtration device may further include a backwashing device 8 disposed outside the filtration section 2a for backwashing the filter screen to reduce filter screen clogging; and a conveying structure disposed inside the filtration section 2a for promoting the migration of impurities axially toward the slag discharge section 2b.

[0078] Preferably, the filter section 2a is further provided with a conveying structure to promote the axial migration of impurities from the filter section 2a to the slag discharge section 2b. In a preferred embodiment, the conveying structure includes a spiral conveying scraper 5 extending spirally along the inner wall of the filter section 2a. The spiral conveying scraper 5 extends into the conical filter drum 2 through a shaft 6 with an open structure at the bottom of the cone and is connected to a drive device. During the rotation of the conical filter drum 2, the spiral conveying scraper 5 moves relative to the inner wall of the drum, thereby guiding and conveying the impurities deposited on the inner wall of the filter section 2a, causing them to gradually move towards the slag discharge section 2b, thereby improving the axial migration efficiency of impurities and reducing their retention in the filter section 2a.

[0079] In addition, the liquid collection structure 4 may include a cover 4a covering the rotating filter assembly, the cover 4a being used to constrain and collect the splashed liquid and to protect the rotating components; a detachable cover plate 9 may also be provided at the open structure at the bottom of the cone, the cover plate 9 being installed on the body 1 to reduce liquid splashing.

[0080] During operation, the waste polishing liquid enters the conical filter drum 2 and forms a flowing liquid layer along the inner wall under the action of the drum rotation. During the flow, solid-liquid separation is gradually achieved. The separated liquid is collected by the liquid collection structure 4, while solid impurities are gradually enriched and migrate to the slag discharge section 2b. Finally, they are continuously discharged through the impurity removal component 7, thereby realizing continuous filtration of polishing liquid and continuous removal of impurities.

[0081] Filtration mechanism

[0082] In this embodiment, the filtration process of the polishing fluid mainly relies on the centrifugal force generated by the rotation of the conical filter drum 2 and the axial flow guided by the conical structure.

[0083] When the device is running, the drive unit rotates the conical filter drum 2 around its axis. The waste polishing liquid that enters the drum is rapidly thrown out towards the inner wall of the filter section 2a under the action of centrifugal force, forming a continuously distributed liquid film along the inner surface of the filter section 2a. Because the liquid is under stable centrifugal constraint in the rotating state, the liquid film can adhere to the inner wall of the filter section 2a and maintain a relatively uniform thickness distribution, thereby forming a stable filtration interface.

[0084] After the liquid film is formed, the liquid phase components in the polishing liquid seep out through the filter screen or are thrown out to the outside of the filter section 2a under the action of centrifugal force and are collected by the liquid collection structure 4; while solid particles are trapped inside the filter section 2a due to their large particle size or the blocking effect of the filter screen and participate in the subsequent migration process.

[0085] Furthermore, since the conical filter drum 2 has a geometric structure that gradually expands from the apex to the bottom, and the liquid inlet structure 3 is located at the apex, the liquid film, under the combined action of centrifugal force and fluid inertia, will generate axial flow along the generatrix of the cone from the apex to the bottom. This axial flow causes the polishing liquid to form a continuous flow path from the inlet to the outlet within the filter section 2a.

[0086] As the liquid film flows axially, it is continuously separated and discharged through the filter screen, causing the liquid phase content in the liquid film to gradually decrease while the concentration of solid particles gradually increases. This results in the liquid film exhibiting a distribution pattern of gradually changing concentration from low to high along the cone apex to the cone trough. Ultimately, mud-like impurities with low water content and poor fluidity are formed near the slag discharge section 2b.

[0087] Meanwhile, the liquid film continuously scours the inner surface of the filter screen during its axial flow. This scouring action effectively weakens the adhesion tendency of solid particles to the inside of the filter screen and reduces the probability of particle deposition on the filter screen surface, thus providing a dynamic cleaning effect. Compared with structures that rely solely on filtration and separation, this scour mechanism formed by the fluid itself can suppress filter screen clogging without adding additional cleaning structures.

[0088] Cleaning component 7 and slag removal principle

[0089] In this embodiment, after the polishing slurry undergoes solid-liquid separation in the filtration section 2a, the remaining solid particles gradually accumulate during the liquid film flow, forming mud-like impurities with low water content near the slag discharge section 2b. These mud-like impurities are continuously discharged after entering the slag discharge section 2b through the synergistic effect of rotational motion and the cleaning component 7.

[0090] Specifically, as the conical filter drum 2 continues to rotate, the muddy impurities entering the slag discharge section 2b adhere to the inner wall of the slag discharge section 2b under centrifugal force and move circumferentially with the drum, thus forming a stable circumferential conveying process. This circumferential conveying is equivalent to continuously transporting the impurities on the inner wall of the slag discharge section 2b to a fixed position, creating conditions for subsequent fixed-point discharge.

[0091] The impurity removal component 7 is located inside the slag discharge section 2b. It extends into the drum through an open structure at the bottom of the cone and includes a suction port and a guide structure for guiding impurities to the suction port. The suction port is connected to an external suction device, creating a negative pressure environment during operation, thereby enabling the suction and discharge of muddy impurities.

[0092] During the circumferential conveying process, when muddy impurities rotate with the drum to the area where the guide structure is located, their movement path is changed under the action of the guide structure, causing the impurities to gather towards the area where the suction port is located, thus forming an impurity enrichment zone near the suction port. At this time, under the action of negative pressure, the suction port preferentially sucks up the high concentration of muddy impurities in this enrichment zone, achieving effective discharge of impurities.

[0093] Preferably, the guiding structure can be in the form of a collecting scraper, positioned upstream of the suction port along the rotation direction of the drum. During drum rotation, muddy impurities first come into contact with the collecting scraper, accumulating and loosening under its blocking and guiding action, and are guided towards the suction port, thereby improving the impurity collection efficiency. By positioning the collecting scraper upstream, impurities can be fully organized before entering the suction area, preventing them from being affected by a loose structure when directly entering the suction port, thus improving the suction effect.

[0094] Furthermore, a certain gap is preferably maintained between the aggregate scraper and the inner wall of the slag discharge section 2b to avoid wear caused by rigid contact, while allowing mud-like impurities to be compacted and guided to move in the gap; the aggregate scraper is inclined relative to the direction of rotation to enhance the guiding effect on impurities and make them more easily concentrated towards the suction port.

[0095] In addition, the suction port is preferably positioned facing the inner wall of the slag discharge section 2b and close to the bottom area, so that it can preferentially act on the high concentration of muddy impurities deposited on the inner wall surface, reduce the suction of the liquid above, thereby improving the slag discharge efficiency and reducing energy consumption.

[0096] Screw conveyor structure

[0097] To further improve the efficiency of conveying impurities from the filter section 2a to the slag discharge section 2b and to avoid local accumulation on the inner wall of the filter section 2a, a spiral conveying structure is installed inside the filter section 2a.

[0098] Specifically, the inner wall of the filter section 2a is provided with a spiral conveying scraper 5 extending spirally along the generatrix of the cone. The rotating shaft 6 of the spiral conveying scraper 5 extends into the interior of the conical filter drum 2 through an open structure at the bottom of the cone and is connected to the drive device. The rotating shaft 6 is preferably coaxially arranged with the conical filter drum 2.

[0099] During operation, the spiral conveying scraper 5 and the conical filter drum 2 rotate in the same direction, but there is a certain speed difference between them. This speed difference causes the spiral conveying scraper 5 to form a slow relative motion with respect to the inner wall of the filter section 2a, thereby generating a continuous scraping and guiding effect on the impurities attached to the inner wall of the filter section 2a.

[0100] It should be noted that if the spiral conveying scraper 5 is completely stationary relative to the filter drum, the spiral conveying scraper 5 will have a significant disturbance effect on the incoming polishing liquid due to the high rotation speed of the filter drum, similar to a stirring or propulsion structure. This may cause the liquid to be driven towards the slag discharge section 2b before it has been fully filtered, thus affecting the filtration effect.

[0101] In this embodiment, by controlling the speed difference between the spiral conveying scraper 5 and the conical filter drum 2, they generate only a small relative speed while rotating synchronously with the drum. This allows the spiral conveying scraper 5 to primarily target high-concentration impurities already adhering to the inner wall without significantly disturbing the flow of the main liquid. The spiral conveying scraper 5 and the conical filter drum 2 can be connected to the same drive device, and the speed difference between them can be created through transmission mechanisms such as a gearbox, reducer, and speed regulating gear. Alternatively, the spiral conveying scraper 5 can be connected to an independent servo motor via a rotating shaft 6. The servo motor actively controls its own speed through an electronic control system, maintaining a fixed speed ratio between itself and the conical filter drum 2.

[0102] Under the action of this structure, the impurities on the inner wall of the filter section 2a, after being formed into a wall-adhering state by centrifugal force, are guided by the axial force of the spiral conveying scraper 5 and can gradually migrate to the slag discharge section 2b along the spiral path, thereby avoiding the long-term retention of impurities in the middle or local area of ​​the filter section 2a.

[0103] Preferably, the difference between the rotational speed of the spiral conveying scraper 5 and the rotational speed of the conical filter drum 2 is controlled within a small range, for example, 1% to 10% of the drum rotational speed, so as to ensure the conveying effect while avoiding significant interference with the liquid flow. The rotational speed of the spiral conveying scraper 5 can be faster or slower than that of the conical filter drum 2, depending on the spiral direction of the spiral conveying scraper 5. In short, the speed difference creates rotation of the spiral conveying scraper 5 relative to the conical filter drum 2, and this relative rotation allows the spiral conveying scraper 5 to gradually migrate impurities towards the slag discharge section 2b.

[0104] Furthermore, the pitch of the spiral conveying scraper 5 can be matched and set according to the diameter of the filter section 2a, for example, it is 0.3 to 1.0 times the diameter of the corresponding position.

[0105] In addition, a certain gap is preferably provided between the spiral conveying scraper 5 and the inner wall of the filter section 2a, for example, 1mm to 5mm, so as to avoid wear caused by rigid contact, while allowing mud-like impurities to be compacted in the gap and move along the spiral direction.

[0106] With the above structural design, the spiral conveying scraper 5 provides additional axial conveying capacity for impurities in the filtration section 2a without compromising the stability of the liquid film, enabling the impurities to migrate to the slag discharge section 2b more stably and efficiently, thereby further improving the continuous operation performance and filtration stability of the device.

[0107] Backwash

[0108] In this embodiment, to further prevent the filter screen of the filter section 2a from becoming clogged, a backwashing device 8 is provided on the outside of the conical filter drum 2 to backwash the filter screen, thereby keeping the filter channel unobstructed.

[0109] Specifically, the backwashing device 8 includes nozzles 8a arranged along a generatrix on the outer side of the filter section 2a, and the nozzles 8a are fixed relative to the body 1. During the rotation of the conical filter drum 2, each area of ​​the filter section 2a passes through the position of the nozzles 8a in sequence, thereby achieving full coverage rinsing of the entire filter screen surface during one rotation of the drum.

[0110] Preferably, the backwashing device 8 is provided with multiple spray units along the axial direction of the conical filter drum 2. The spray units at different axial positions have different spray parameters to adapt to the flow state and impurity deposition at different positions of the filter section 2a. Specifically, the spray intensity is relatively low near the cone apex and relatively high near the cone trough to compensate for the low liquid content and poor impurity flowability in this area, thereby maintaining the flowability of impurities and avoiding local accumulation.

[0111] Furthermore, the spray direction of the nozzle 8a has not only a radial component relative to the filter screen surface, but also an axial component pointing towards the bottom of the cone. By setting this axial component, while backwashing the filter screen to clear the mesh, it can also exert a pushing force on the impurities inside the filter section 2a along the cone apex to cone bottom, making it easier for the impurities to migrate to the slag discharge section 2b, thereby enhancing the continuity of the overall slag discharge process.

[0112] In addition, the liquid used for backwashing can be a treated polishing fluid or external clean water. By properly controlling the spray pressure and flow rate, the rinsing effect can be ensured while avoiding excessive disturbance to the filtration process.

[0113] With the above-mentioned structural design, the backwashing device 8 can not only effectively clear the filter screen mesh and prevent large particles of impurities from clogging the filter channel, but also further improve the flow state of impurities in the filter section 2a by adjusting the local moisture content and applying axial driving force. It works synergistically with the liquid film flow and the spiral conveying structure to improve the overall filtration and slag discharge performance.

[0114] Liquid inlet structure 3

[0115] In order to enable the polishing liquid entering the conical filter drum 2 to quickly form a stable wall-adhering liquid film and flow in the expected direction, the liquid inlet structure 3 is set at the top of the cone of the conical filter drum 2 and the spray direction is oriented.

[0116] Specifically, the injection direction of the liquid inlet structure 3 is tangentially arranged along the circumferential direction of the conical filter drum 2, and the injection is performed in the direction of rotation of the conical filter drum 2. This arrangement ensures that the polishing liquid entering the drum has a velocity component consistent with the drum's rotation from the initial stage, thereby reducing the relative velocity difference between the liquid and the drum and preventing violent impact or disorderly splashing after the liquid enters.

[0117] Based on this, the injection direction of the liquid inlet structure 3 is further inclined towards the bottom of the cone, so that the jet flow has an axial component pointing towards the bottom of the cone relative to the axis of the drum. Through this axial component, the incoming liquid, after forming a wall-adhering state, has an initial flow tendency along the direction from the top of the cone to the bottom of the cone, which is conducive to the rapid establishment of the liquid film and the formation of axial flow.

[0118] By using the above-mentioned inclined spraying method that combines the tangential and axial components, the polishing liquid entering the conical filter drum 2 can adhere to the inner wall of the filter section 2a in a short time and form a continuous liquid film, thus avoiding the free splashing or local accumulation of liquid inside the drum and improving the stability of the filtration process.

[0119] Furthermore, since the liquid inlet jet extends along the inner wall of the filter section 2a, it can also scour the inner wall surface near the cone apex in the inlet area, thereby reducing the deposition of impurities in the inlet area. Accordingly, in this embodiment, the spiral conveying scraper 5 preferably does not extend to the area near the cone apex, so that this area mainly relies on the liquid inlet jet for self-cleaning, thereby avoiding structural interference and simplifying the internal layout.

[0120] Furthermore, the angle between the spray direction and the circumferential tangential direction, as well as the tilt angle relative to the axis direction, can be matched and set according to the drum rotation speed and liquid flow rate. Preferably, the tilt angle between the spray direction and the circumferential tangential direction of the conical filter drum 2 is 5° to 30° (i.e., the angle between the spray direction and the generatrix of the spray position of the conical filter drum 2 is 60° to 85°) to provide appropriate axial pushing force while ensuring the wall adhesion effect.

[0121] By setting up the above-mentioned liquid inlet structure 3, the polishing liquid can quickly form a stable flow state after entering the conical filter drum 2, and form a continuous connection with the subsequent liquid film flow, filtration separation and impurity transportation process, thereby providing good initial conditions for the entire filtration and slag discharge process.

[0122] Liquid collection structure 4

[0123] In order to effectively collect and discharge the liquid ejected or seeping out of the filtration section 2a, the filtration device is provided with a liquid collection structure 4, which is preferably arranged on the outside of the conical filter drum 2.

[0124] Specifically, the liquid collection structure 4 includes a cover 4a that covers at least the filtration section 2a region of the rotating filter assembly, used to constrain and collect the liquid ejected from the filtration section 2a. During the rotation of the conical filter drum 2, the liquid separated by the filter screen is ejected to the outside of the filtration section 2a under centrifugal force, and impacts or adheres to the inner wall of the cover 4a. Subsequently, under the action of gravity, it gathers along the inner wall of the cover 4a and flows to a preset guide area, and is finally discharged to a subsequent storage or processing unit.

[0125] By setting up the cover 4a, the disorderly splashing of liquid outward under high-speed rotation conditions can be effectively avoided, thereby improving the liquid recovery efficiency and improving the working environment around the equipment.

[0126] Preferably, the cover 4a covers the entire conical filter drum 2, including the filtration section 2a and the slag discharge section 2b, to simultaneously achieve liquid collection and safety protection for the rotating components. Furthermore, the cover 4a is internally provided with a partition structure 4b, dividing the interior of the cover 4a into two spaces corresponding to the filtration section 2a and the slag discharge section 2b, respectively.

[0127] The side closer to the filter section 2a is a liquid collection space, used to collect the liquid ejected from the filter section 2a; the side closer to the slag discharge section 2b is a protective space, used to accommodate the slag discharge section 2b and related structures, thereby preventing this area from affecting the outside world.

[0128] The partition structure 4b is provided with a through hole for the conical filter drum 2 to pass through. A gap is reserved between the through hole and the drum to avoid rotational interference. Through this partition structure 4b, the liquid thrown out by the filter section 2a can be effectively prevented from entering the corresponding space of the slag discharge section 2b, thereby reducing the disorderly flow of liquid inside the cover 4a.

[0129] In addition, a flow channel can be provided at an appropriate position in the partition structure 4b so that a small amount of liquid entering the protective space can flow back to the liquid collection space, thereby further improving the liquid recovery rate.

[0130] Furthermore, a removable cover plate 9 can be installed at the open structure at the bottom of the conical filter drum 2 to cover the opening area and reduce liquid splashing. The cover plate 9 is fixed on the body 1 and does not rotate with the conical filter drum 2. The cover plate 9 can be provided with through holes for the pipes of the cleaning assembly 7 and the shaft 6 of the spiral conveying scraper 5 to pass through, thereby maintaining overall sealing while ensuring functionality.

[0131] By setting up the liquid collection structure 4, the liquid separated during the filtration process can be efficiently collected and discharged under controlled conditions, while avoiding liquid splashing and internal flow turbulence, and providing necessary protection for rotating parts, thereby improving the overall stability and safety of the device.

[0132] Work process

[0133] When the device is started, the drive unit drives the conical filter drum 2 to rotate around its axis. The waste polishing liquid to be treated enters the conical filter drum 2 from the top of the cone in a direction that is tangential to the circumference and inclined towards the bottom of the cone under the action of the liquid inlet structure 3, and quickly adheres to the inner wall of the filter section 2a after entering.

[0134] Under centrifugal force, the polishing fluid forms a continuously distributed liquid film along the inner wall of the filter section 2a and flows from the top to the bottom of the cone along the generatrix of the cone. During this flow, the liquid phase components in the liquid seep out through the filter screen or are thrown out to the outside of the filter section 2a and are collected and discharged by the liquid collection structure 4; while solid particles are trapped by the filter screen and gradually enriched in the liquid film, causing the liquid film to show a trend of gradually decreasing water content along the axial direction.

[0135] As the liquid film continues to flow towards the bottom of the cone, solid particles gradually form high-concentration mud-like impurities, which then enter the slag discharge section 2b. Under the rotation of the conical filter drum 2, the mud-like impurities adhere to the inner wall of the slag discharge section 2b and move circumferentially with the drum.

[0136] When muddy impurities move to the area where the cleaning component 7 is located, they are guided to the suction port by the guide structure and continuously extracted under the negative pressure formed by the suction port, thus achieving uninterrupted discharge of impurities.

[0137] During the above process, the liquid film flows axially along the inner wall of the filter section 2a, continuously scouring the inner surface of the filter screen, thereby inhibiting the adhesion and accumulation of impurities on the filter screen surface. At the same time, the backwashing device 8 performs periodic reverse scouring of the filter screen to further clear the filter screen mesh and improve the local flow state. When the spiral conveying scraper 5 is provided, the spiral conveying scraper 5 assists in conveying the impurities on the inner wall of the filter section 2a under the condition of a speed difference with the drum, so that they migrate more stably to the slag discharge section 2b.

[0138] Circular processing system (reference) Figure 1 and Figure 2 )

[0139] The aforementioned polishing fluid treatment and filtration device is applied in a circulating treatment system to treat and recycle waste polishing fluid generated during the polishing process online.

[0140] The circulating treatment system includes a filter, a liquid supply tank 10, a clean water tank, a concentrated liquid tank, a stirrer, a concentration detection device, a control unit, an output pump, and an impurity treatment unit.

[0141] The filtration device is used to perform solid-liquid separation on the waste polishing liquid from the polishing equipment, separating the liquid from the solid impurities; the liquid obtained after filtration is collected by the liquid collection structure 4 and introduced into the liquid supply tank 10.

[0142] The supply tank 10 stores the filtered polishing liquid and serves as a buffer unit for the circulating supply. The liquid collection structure 4 of the filtration device guides the separated liquid into the supply tank 10. A stirrer is installed inside the supply tank 10 to mix the liquid within, ensuring a uniform concentration of the polishing liquid. The clear water tank and concentrated liquid tank are used to replenish the supply tank 10 with clear water and concentrated polishing liquid, respectively, to adjust the concentration of the polishing liquid within the supply tank 10. The concentration detection device monitors the concentration of the polishing liquid in the supply tank 10 in real time and transmits the detection results to the control unit.

[0143] The control unit controls the amount of water and / or concentrate supplied from the clear water tank and / or concentrated liquid tank to the supply tank 10 based on the concentration detection results, thereby maintaining the concentration of polishing liquid in the supply tank 10 within a preset range.

[0144] The output pump is connected to the liquid supply tank 10 and is used to deliver the prepared polishing liquid to the polishing equipment to realize the recycling of the polishing liquid.

[0145] In addition, the output end of the cleaning component 7 of the filter device is connected to the impurity treatment unit for collecting and further processing the discharged muddy impurities, such as dehydration, to reduce the volume of waste or facilitate subsequent disposal.

[0146] During system operation, the waste polishing liquid generated by the polishing equipment is transported to the filtration device. After solid-liquid separation is completed in the filtration device, the liquid enters the supply tank 10, and after concentration adjustment, it is transported back to the polishing equipment for use, thus forming a closed loop. At the same time, the separated solid impurities are continuously discharged and enter the impurity treatment unit.

[0147] Through the above system setup, continuous filtration, concentration adjustment, and recycling of polishing fluid are achieved, reducing the consumption of polishing fluid and lowering waste liquid discharge. At the same time, combined with the continuous slag discharge capability of the filtration device, the entire system can maintain stable processing performance during long-term operation.

[0148] The preferred embodiments of the present invention have been described in detail above. However, the present invention is not limited to the specific details in the above embodiments. Within the scope of the technical concept of the present invention, various simple modifications can be made to the technical solution of the present invention, and these simple modifications all fall within the protection scope of the present invention.

[0149] It should also be noted that the various specific technical features described in the above embodiments can be combined in any suitable manner without contradiction. To avoid unnecessary repetition, the present invention will not describe the various possible combinations separately.

[0150] Furthermore, various different embodiments of the present invention can be combined in any way, as long as they do not violate the spirit of the present invention, they should also be regarded as the content disclosed by the present invention.

Claims

1. A polishing fluid treatment and filtration device, characterized in that, The device includes a body (1) and a rotary filter assembly disposed on the body (1). The rotary filter assembly includes a conical filter drum (2) disposed in the horizontal direction of its axis. The conical filter drum (2) is rotatably mounted on the body (1) and is driven by a drive device to rotate around its axis. The cone bottom of the cone-shaped filter drum (2) is an open structure; The conical filter drum (2) includes: The filter section (2a) has its sidewalls at least partially composed of a filter screen; The slag discharge section (2b) is located on one side of the cone bottom of the filter section (2a) and is connected to the filter section (2a). The sidewall of the slag discharge section (2b) is a non-filtration structure. The body (1) is provided with: The liquid inlet structure (3) is used to introduce the polishing liquid to be treated from the top of the cone into the conical filter drum (2); Liquid collection structure (4) is used to collect liquids that are thrown out or seep out in the filter section (2a); The slag discharge section (2b) is provided with a cleaning component (7). The cleaning component (7) includes a suction port that extends into the interior of the slag discharge section (2b) through the open structure at the bottom of the cone, and a guide structure for guiding impurities to the suction port. The suction port faces the inner wall of the slag discharge section (2b). The guiding structure includes a material collection scraper located upstream of the suction port along the rotation direction. During the rotation of the conical filter drum (2), the mud-like impurities deposited in the slag discharge section (2b) are transported to the material collection scraper under the circumferential conveying action as the drum rotates. After being loosened and guided by the material collection scraper, they enter the suction port and are discharged, thereby achieving continuous slag discharge. A gap of 2mm to 10mm is provided between the collecting scraper and the inner wall of the slag discharge section (2b), and the collecting scraper is inclined relative to the rotation direction of the slag discharge section (2b) to guide impurities to gather towards the suction port. It also includes a backwashing device (8), which includes a nozzle (8a) arranged along a generatrix on the outside of the filter section (2a) to perform circumferential backwashing on the filter screen during the rotation of the conical filter drum (2). The backwashing device (8) is provided with multiple spraying units along the direction of the busbar. The spraying units at different axial positions have different spraying parameters, so that the backwashing intensity gradually increases from the top of the cone to the bottom of the cone. The spray direction of the nozzle (8a) has a radial component relative to the filter screen surface and an axial component pointing towards the bottom of the cone.

2. The polishing liquid treatment filtration device according to claim 1, wherein The cone-shaped filter drum (2) has a support structure at the top and bottom of the cone for supporting the rotation of the cone-shaped filter drum (2), so that the cone-shaped filter drum (2) can rotate around its axis.

3. The polishing liquid treatment filter apparatus according to claim 1, wherein The filter section (2a) is provided with a spiral conveying scraper (5) extending spirally along its inner wall. The spiral conveying scraper (5) extends into the conical filter drum (2) through a rotating shaft (6) and is connected to the drive device to guide the impurities deposited on the inner wall of the filter section (2a) to the slag discharge section (2b). The spiral conveying scraper (5) is connected to the drive device or independent servo motor through the rotating shaft (6). There is a 1% to 10% speed difference between the rotation speed of the spiral conveying scraper (5) and the rotation speed of the conical filter drum (2), and the two rotate in the same direction. The pitch of the spiral conveying scraper (5) is 0.3 to 1.0 times the diameter of the corresponding position of the filter section (2a); A gap of 1 mm to 5 mm is provided between the spiral conveying scraper (5) and the inner wall of the filter section (2a).

4. The polishing slurry treatment and filtration device according to claim 1, characterized in that, The semi-cone angle of the conical filter drum (2) is 8° to 20°.

5. The polishing slurry treatment and filtration device according to claim 1, characterized in that, The liquid inlet structure (3) sprays along the tangential direction of the conical filter drum (2), causing the incoming liquid to flow along the inner wall of the filter section (2a). The injection direction of the liquid inlet structure (3) is set tangentially along the circumferential direction of the conical filter drum and inclined towards the bottom of the cone, with an inclination angle of 5° to 30°, thus having an axial component pointing towards the bottom of the cone. The liquid inlet structure (3) sprays in the same direction as the rotation of the conical filter drum (2).

6. The polishing slurry treatment and filtration device according to claim 1, characterized in that, The liquid collection structure (4) includes a cover (4a) that covers the rotating filter assembly, and a partition structure (4b) is provided inside the cover (4a) to divide the inside of the cover (4a) into a liquid collection space corresponding to the filter section (2a) and a protective space corresponding to the slag discharge section (2b). The partition structure (4b) is provided with a through hole for the conical filter drum (2) to pass through, and there is a gap between the through hole and the conical filter drum (2).

7. The polishing slurry treatment and filtration device according to claim 3, characterized in that, It also includes a cover plate (9), which is detachably mounted on the body (1) and covers the open structure at the bottom of the cone-shaped filter drum (2) to prevent liquid splashing; The shaft (6) of the spiral conveying scraper (5) and the pipeline of the cleaning assembly (7) pass through the cover plate (9).

8. A cyclic processing system, characterized in that, include: The polishing fluid treatment and filtration device according to any one of claims 1-7 is used for solid-liquid separation of waste polishing fluid; The liquid supply tank (10) is used to store the liquid filtered by the filter device; the liquid collection structure (4) of the filter device introduces the separated liquid into the liquid supply tank (10). A clean water tank is used to replenish clean water to the liquid supply tank (10); A concentrate tank is used to replenish the concentrate polishing fluid to the supply tank (10); A stirrer is installed inside the liquid supply tank (10) for mixing the liquid in the liquid supply tank (10); A concentration detection device is used to detect the concentration of polishing liquid in the supply tank (10); The control unit is used to control the amount of water tank and / or concentrate tank to supply tank (10) according to the detection result of the concentration detection device; Output pump, used to deliver the prepared polishing slurry to the equipment using the slurry; The impurity treatment unit is connected to the output end of the impurity removal component (7) of the filter device and is used to collect the discharged mud-like impurities and further dehydrate them.

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