Laminated structure and electronic equipment

Abstract

The invention provides a laminated structure and electronic equipment, the laminated structure can be an optical laminated layer, and the laminated structure is arranged on the light emitting side of a display module, for example. The laminated structure comprises an anti-fingerprint layer, an antireflection layer, a connecting layer, a hardened layer and a base film which are laminated from top to bottom, the antireflection layer comprises a second low refraction layer, a second high refraction layer, a first low refraction layer and a first high refraction layer which are stacked from top to bottom, and the first high refraction layer is connected with the connecting layer; wherein the first low-refraction layer and the second low-refraction layer are made of the same material, the first high-refraction layer is made of a low-modulus material, and the second high-refraction layer is made of a high-modulus material. According to the laminated structure, the first high-refraction layer close to the hardened layer is made of a low-modulus material and is good in bending resistance, and the second high-refraction layer is close to the surface and is made of a high-modulus material and is good in wear resistance. Therefore, the wear resistance and the bending resistance of the laminated structure can be considered.

Description

Technical Field

[0001] This application relates to the field of display technology, and more particularly to a stacked structure and an electronic device. Background Technology

[0002] With the continuous development of display technology, foldable display terminals are gradually becoming a development trend for future mobile electronic products. When unfolded, foldable display terminals offer a larger display area, enhancing the viewing experience. When folded, they achieve a smaller size, making them easy for users to carry.

[0003] Currently, protective films for foldable screen phones include a base film, a hardening layer, an anti-reflective layer, and an anti-fingerprint layer, which are stacked together. The anti-reflective layer includes multiple layers of high-refractive-index layers and multiple layers of low-refractive-index layers, with high-refractive-index layers and low-refractive-index layers being stacked alternately. The modulus of the multiple high-refractive-index layers is the same, making it difficult to simultaneously achieve both wear resistance and bending resistance. Summary of the Invention

[0004] This application provides a laminated structure and an electronic device that solves the problem that antireflective layers cannot simultaneously achieve both wear resistance and bending resistance.

[0005] To achieve the above objectives, this application adopts the following technical solution:

[0006] A first aspect of this application provides a stacked structure disposed on a display module. The stacked structure includes: an anti-fingerprint layer, an anti-reflective layer, a connecting layer, a hardening layer, and a base film stacked together. The anti-reflective layer includes: a second low-refractive-index layer, a second high-refractive-index layer, a first low-refractive-index layer, and a first high-refractive-index layer stacked together, with the first high-refractive-index layer connected to the connecting layer. The first low-refractive-index layer and the second low-refractive-index layer are made of the same material, the first high-refractive-index layer is made of a low-modulus material, and the second high-refractive-index layer is made of a high-modulus material. In the stacked structure provided by this application, the first high-refractive-index layer near the hardening layer is made of a low-modulus material, which has good bending resistance. The second high-refractive-index layer, disposed near the surface, is made of a high-modulus material, which has good wear resistance and can support the second low-refractive-index layer, thus improving the wear resistance of the anti-reflective layer. In this way, both wear resistance and bending resistance of the stacked structure can be achieved.

[0007] In one optional implementation, the antireflective layer further includes a third high-refractive-index layer and a third low-refractive-index layer stacked together, wherein the third high-refractive-index layer is connected to the first low-refractive-index layer, and the third low-refractive-index layer is connected to the second high-refractive-index layer. Thus, by incorporating the third high-refractive-index layer and the third low-refractive-index layer, a transition can be achieved between the high-modulus and low-modulus materials, resulting in a smoother modulus change. This improves the bonding strength between the layers and reduces delamination caused by excessive modulus changes.

[0008] In one alternative implementation, the third high-refractive-index layer is made of the high-modulus material. This results in a greater number of high-modulus, high-refractive-index layers in the antireflective layer, further improving its wear resistance.

[0009] In one alternative implementation, the third high-refractive-index layer is made of the low-modulus material. This results in a greater number of low-modulus, high-refractive-index layers in the antireflective layer, further improving its bending resistance.

[0010] In one alternative implementation, the third high-refractive-index layer is made of a composite material with a modulus higher than that of the low-modulus material and a modulus lower than that of the high-modulus material. Therefore, by placing a third high-refractive-index layer with an intermediate modulus between the high-modulus second high-refractive-index layer and the low-modulus first high-refractive-index layer, a uniform transition from low-modulus to medium-modulus to high-modulus can be achieved, resulting in a smoother modulus change. This improves the bonding strength between the layers and reduces the likelihood of delamination caused by excessive modulus changes.

[0011] In one alternative implementation, the composite material is formed by combining the high-modulus material and the low-modulus material. Thus, by combining the high-modulus material and the low-modulus material, the modulus of the composite material can be between the modulus of the high-modulus material and the low-modulus material; that is, the modulus of the third high-refractive-index layer can be between the modulus of the first high-refractive-index layer and the second high-refractive-index layer, achieving a uniform transition in modulus.

[0012] In one optional implementation, the composite material includes: a first sub-part and a second sub-part stacked together, the first sub-part and the second sub-part being connected, the first sub-part being connected to the first low-refractive-index layer, and the second sub-part being connected to the third low-refractive-index layer. The first sub-part is made of the low-modulus material, and the second sub-part is made of the high-modulus material. Thus, by combining the stacks of high-modulus and low-modulus materials into a composite material, the modulus of the composite material can be made to be between the modulus of the high-modulus material and the modulus of the low-modulus material. That is, the modulus of the third high-refractive-index layer can be made to be between the modulus of the first high-refractive-index layer and the modulus of the second high-refractive-index layer, achieving a uniform transition of modulus.

[0013] In one optional implementation, the composite material further includes a third sub-part disposed between the first sub-part and the second sub-part, the third sub-part being formed by combining the high-modulus material and the low-modulus material. Thus, by providing a composite material with an intermediate modulus between the high-modulus and low-modulus layers, the modulus of the third sub-part can be made to fall between the modulus of the first and second sub-parts, further achieving a uniform transition of modulus.

[0014] In one optional implementation, the low-modulus material includes at least one of niobium trioxide (Nb₂O₃), titanium dioxide (TiO₂), tantalum pentoxide (Ta₂O₅), and aluminum oxide (Al₂O₃); the high-modulus material includes at least one of silicon nitride (Si₃N₄), silicon oxynitride (SiON), and a silicon-aluminum-oxygen-nitrogen compound (SiAlON). Thus, both the low-modulus material and the high-modulus material can be used in the first high-refractive-index layer, and both can be used in the second high-refractive-index layer, such that the modulus of the first high-refractive-index layer is lower than that of the second high-refractive-index layer.

[0015] In one alternative implementation, the antireflective layer is formed using a magnetron sputtering deposition process. This reduces the complexity of the process by requiring only the target material to be changed when fabricating high-refractive layers made of different materials.

[0016] In one alternative implementation, the thickness of the first high-refractive-index layer ranges from 5 to 150 nm, and the thickness of the first low-refractive-index layer ranges from 10 to 200 nm. Thus, the relatively low thickness of the high-refractive-index and low-refractive-index layers improves the bending performance of the laminated structure.

[0017] In one alternative implementation, the first low-refractive-index layer is made of silicon oxide (SiO2). This allows chemical bonds to form between the first low-refractive-index layer and the first high-refractive-index layer, enhancing the bonding strength between the layers.

[0018] In one optional implementation, the first low-refractive-index layer is doped with at least one of titanium (Ti), zirconium (Zr), copper (Cu), and aluminum (Al); the first high-refractive-index layer is doped with at least one of yttrium oxide (Y₂O₃), aluminum oxide (Al₂O₃), cerium oxide (CeO₂), calcium oxide (CaO), and magnesium oxide (MgO). Thus, by doping the low-refractive-index layer with metallic materials, the hardness of the low-refractive-index layer can be increased, improving the wear resistance of the laminated structure. By doping the high-refractive-index layer with toughening materials, the toughness of the high-refractive-index layer can be increased, improving the bending performance of the laminated structure. In this way, both the wear resistance and bending performance of the laminated structure can be further balanced.

[0019] In one optional implementation, the hardening layer includes a first hardening layer and a second hardening layer stacked together, the first hardening layer being connected to the connecting layer, and the first hardening layer being doped with reinforcing particles. Thus, the first hardening layer is closer to the first high-refractive-index layer than the second hardening layer. By incorporating reinforcing particles into the first hardening layer, the modulus of the first hardening layer can be increased, which helps to reduce the modulus difference between the first hardening layer and the first high-refractive-index layer, thereby enhancing the bending resistance of the laminated structure.

[0020] In one alternative implementation, the hardened layer is doped with reinforcing particles, the volume fraction of which gradually increases towards the connecting layer. This allows the modulus of the hardened layer to gradually increase towards the connecting layer, achieving a more uniform and gradual change in modulus. This improves the bonding strength between the layers and further enhances the bending resistance of the laminated structure.

[0021] In one alternative implementation, the reinforcing particles are made of at least one of the following: silicon dioxide (SiO2), zirconium oxide (ZrO2), aluminum oxide (Al2O3), titanium dioxide (TiO2), and silicon nitride (SiN). Therefore, by doping the second hardened layer with reinforcing particles, the stiffness of the hardened layer can be enhanced, and the bending performance of the laminated structure can be improved.

[0022] A second aspect of this application provides an electronic device including a display module and a stacked structure as described in any of the preceding claims, the stacked structure being disposed on the light-emitting side of the display module. Thus, the electronic device employing the aforementioned stacked structure can achieve a balance between bending performance and wear resistance.

[0023] This application provides a stacked structure and an electronic device. The stacked structure can be an optical stack, for example, disposed on the light-emitting side of a display module. The stacked structure includes, from top to bottom, an anti-fingerprint layer, an anti-reflection layer, a connecting layer, a hardening layer, and a base film. The anti-reflection layer includes, from top to bottom, a second low-refractive-index layer, a second high-refractive-index layer, a first low-refractive-index layer, and a first high-refractive-index layer, which are connected to the connecting layer. The first low-refractive-index layer and the second low-refractive-index layer are made of the same material, the first high-refractive-index layer is made of a low-modulus material, and the second high-refractive-index layer is made of a high-modulus material. In this stacked structure, the first high-refractive-index layer near the hardening layer is made of a low-modulus material, which provides good bending resistance. The second high-refractive-index layer, disposed near the surface, is made of a high-modulus material, which provides good wear resistance and can support the second low-refractive-index layer, thus improving the wear resistance of the anti-reflection layer. In this way, both wear resistance and bending resistance of the stacked structure can be achieved.

[0024] In some embodiments, the antireflective layer comprises N high-refractive-index layers and N low-refractive-index layers, spaced apart, where N is an integer greater than or equal to 2. A first high-refractive-index layer is disposed near the hardened layer, a second high-refractive-index layer is disposed near the surface, and N-2 high-refractive-index layers are disposed between the first and second high-refractive-index layers. These N-2 high-refractive-index layers may all be made of a low-modulus material. Alternatively, they may all be made of a high-modulus material. Alternatively, they may include alternating low-modulus and high-modulus refractive-index layers. Alternatively, some of the high-refractive-index layers in the N-2 layers may be made of a composite material, which may be formed by combining high-modulus and low-modulus materials. The composite material may be formed by mixing the high-modulus and low-modulus materials. The composite material can also be a combination of a high-modulus material stack and a low-modulus material stack, so that the modulus of the composite material is between the modulus of the high-modulus material and the modulus of the low-modulus material. That is, the modulus of the N-2 high-refractive layer can be between the modulus of the first high-refractive layer and the modulus of the second high-refractive layer, so as to achieve a uniform transition of modulus. Attached Figure Description

[0025] Figure 1 A schematic diagram of the disassembly structure of an electronic device provided in an embodiment of this application;

[0026] Figure 2 This is a schematic diagram of the structure of an electronic device provided in an embodiment of this application;

[0027] Figure 3 This is a schematic diagram of the structure of another electronic device provided in an embodiment of this application;

[0028] Figure 4 This is a schematic diagram of a layered structure;

[0029] Figure 5 This is a schematic diagram of a layered structure;

[0030] Figure 6 This is a schematic diagram of a stacked structure provided in an embodiment of this application;

[0031] Figure 7 This is a schematic diagram of another stacked structure provided in an embodiment of this application;

[0032] Figure 8 This is a schematic diagram of another stacked structure provided in an embodiment of this application;

[0033] Figure 9 This is a schematic diagram of another stacked structure provided in an embodiment of this application;

[0034] Figure 10 This is a schematic diagram of another stacked structure provided in an embodiment of this application;

[0035] Figure 11 This is a schematic diagram of another stacked structure provided in an embodiment of this application;

[0036] Figure 12 This is a schematic diagram of another stacked structure provided in an embodiment of this application;

[0037] Figure 13 This is a schematic diagram of another stacked structure provided in an embodiment of this application. Detailed Implementation

[0038] To make the objectives, technical solutions, and advantages of this application clearer, the application will now be described in further detail with reference to the accompanying drawings.

[0039] In the following description, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first," "second," etc., may explicitly or implicitly include one or more of that feature. In the description of this application, unless otherwise stated, "a plurality of" means two or more.

[0040] Furthermore, in this application, directional terms such as "upper" and "lower" are defined relative to the orientation of the components shown in the accompanying drawings. It should be understood that these directional terms are relative concepts, used for relative description and clarification, and can change accordingly depending on the orientation of the components in the accompanying drawings.

[0041] This application provides an electronic device. This electronic device can be a tablet computer, mobile phone, e-reader, remote control, personal computer (PC), laptop computer, personal digital assistant (PDA), in-vehicle device, smart TV, wearable device, television set, or other products with a display interface, as well as smart display wearable products such as smartwatches and smart bracelets. This application does not impose any special limitations on the form of the above-mentioned electronic device. For ease of explanation, the following embodiments all use a mobile phone as an example for illustration.

[0042] like Figure 1 As shown, the electronic device 1 includes a display module 13, a mid-frame 11, and a housing (or rear shell) 12. The mid-frame 11 is located between the display module 13 and the housing 12.

[0043] Display module 13 is used to display images.

[0044] The display module 13, the middle frame 11, and the housing 12 can be disposed on different layers in the thickness direction of the electronic device. These layers can be parallel to each other, and the plane in which each layer is located can be called the XY plane, and the direction perpendicular to the XY plane can be called the Z direction. For example, the display module 13, the middle frame 11, and the housing 12 can be distributed in layers in the Z direction.

[0045] Display module 13 can be used as follows Figure 1 The flexible printed circuit (FPC) shown passes through the middle frame 11 and is electrically connected to the PCB disposed on the middle frame 11. This allows the PCB to transmit display data to the display module 13 to control the display module 13 to display images.

[0046] The mid-frame 11 is located between the display module 13 and the housing 12. The surface of the mid-frame 11 away from the display module 13 is used to mount internal components such as batteries, printed circuit boards (PCBs), cameras, and antennas. After the housing 12 is closed with the mid-frame 11, the aforementioned internal components are located between the housing 12 and the mid-frame 11.

[0047] The housing 12 is connected to the middle frame 11 to form a cavity for accommodating the aforementioned electronic components such as the PCB, camera, and battery. This prevents external moisture and dust from entering the cavity and affecting the performance of the electronic components.

[0048] This application does not limit the structure of the mobile phone in its embodiments. In some embodiments of this application, such as... Figure 2 , Figure 3 As shown, the phone can be a foldable screen phone, and the foldable screen display module 13 is foldable.

[0049] This application does not limit the type of foldable screen phone in its embodiments. In some embodiments, such as... Figure 2 As shown, the foldable screen phone adopts an outward folding design. When the foldable screen phone is in the folded state, the display module 13 is located on the outside of the device.

[0050] In other embodiments, such as Figure 3 As shown, the foldable screen phone adopts an inward folding design. When the foldable screen phone is in the folded state, the display module 13 is located inside the device.

[0051] Display module 13 can be an active matrix organic light-emitting diode (AMOLED) display.

[0052] As a self-emissive display, AMOLED displays do not require a backlight module (BLM). Therefore, when the substrate of an AMOLED display is made of a flexible resin material, such as polyimide (PI) or polyethylene terephthalate (PET), the AMOLED display can be bent.

[0053] In some embodiments, in order to improve the reading experience of the screen under sunlight or strong light, an anti-reflection (AR) film may be provided on the light-emitting surface of the display module 13.

[0054] For example, such as Figure 4 As shown, a stacked structure 10 is provided on the light-emitting surface of the display module 13. The stacked structure can be an optical stack, which includes, for example, an anti-reflection layer. The stacked structure can improve the readability of the display module under strong light.

[0055] Figure 5 This is a schematic diagram of a layered structure. For example... Figure 5 As shown, the stacked structure 10 includes: from top to bottom (along...) Figure 5 The anti-fingerprint layer 101, anti-reflection layer 100, connecting layer 1001, hardening layer 104 and base film 105 are stacked in the z direction shown; the hardening layer 104 is disposed on the upper surface of the base film 105.

[0056] The anti-reflection layer 100 includes a first low-refractive layer 102 and a first high-refractive layer 103 stacked together, wherein the first low-refractive layer 102 is connected to the first high-refractive layer 103, and the first low-refractive layer 102 is connected to the anti-fingerprint layer 101.

[0057] In this application embodiment, the number of low-refractive-index and high-refractive-index layers is not limited; it is sufficient that the low-refractive-index and high-refractive-index layers are alternately arranged. In some embodiments, the antireflective layer includes two low-refractive-index layers and two high-refractive-index layers, which are alternately arranged. The high-refractive-index material includes metal oxides such as niobium pentoxide and zirconium oxide, and the low-refractive-index material includes materials such as silicon oxide.

[0058] This application does not limit the fabrication process of the antireflection layer. In some embodiments, the antireflection layer can be formed using a coating process (also known as a "wet AR film").

[0059] The coating process refers to applying resin materials containing high-refractive-index and low-refractive-index particles onto the substrate surface using methods such as slot coating or micro-recessed coating, thereby forming high-refractive-index and low-refractive-index material films respectively. The high-refractive-index material films are filled with metal oxide nanoparticles such as alumina, zirconium oxide, and tin oxide, while the low-refractive-index layers are filled with hollow silica nanoparticles.

[0060] In some embodiments, during the process of forming an antireflective layer by coating, the substrate can be surface treated, a hardening layer can be coated on the surface of the substrate, a high refractive layer can be coated on the surface of the hardening layer, and the high refractive layer can be cured. Then, a low refractive layer can be formed on the surface of the cured high refractive layer, and the low refractive layer can be cured.

[0061] However, antireflective layers formed by wet processing have excessively high reflectivity and poor wear resistance. During use, friction from the protective film can easily cause scratches or peeling of the antireflective layer, resulting in discoloration and a poor user experience.

[0062] In some embodiments, the stacked structure can be deposited using a magnetron sputtering deposition process (also known as "dry AR film").

[0063] In some embodiments, during the formation of the antireflection layer 100 by magnetron sputtering deposition, a hardened layer 104 can be formed on the base film 105. Prior to forming the hardened layer 104 on the base film 105, the base film 105 may undergo surface treatment. Forming the hardened layer 104 on the base film 105 can be achieved by coating the surface of the base film 105 with the hardened layer 104 and then allowing it to cure.

[0064] Magnetron sputtering coating process refers to applying a DC voltage between the coating target and the substrate under vacuum conditions. The voltage causes the gas to decompose into argon ions (Ar+) and electrons, which accelerate the positively charged ions and collide with the coating target, transferring momentum to the atoms of the coating target.

[0065] For example, the surface of the coating target can be vaporized into gaseous atoms, molecules, or partially ionized into ions and electrons using electrodes. A magnetic field is introduced onto the surface of the coating target. Under the influence of the electric field, electrons collide with argon atoms as they fly towards the substrate, causing them to ionize and produce Ar+ and new electrons. The new electrons fly towards the substrate, while the Ar+ atoms are accelerated by the electric field and fly towards the cathode coating target, bombarding the surface of the coating target with high energy, causing sputtering. In the sputtered particles, neutral target atoms or molecules are deposited on the substrate to form a thin film.

[0066] Next, the side of the hardened layer 104 facing away from the base film can be surface treated.

[0067] Among them, after the hardened layer 104 is cured, the side of the hardened layer 104 that is away from the base film can be subjected to surface activation treatment.

[0068] In this embodiment, surface activation treatment of the hardened layer 104 can be performed by high-energy ion beam etching on the surface of the hardened layer 104 away from the base film, so that the hardened layer 104 on the side away from the base film will have broken bonds.

[0069] After surface treatment of the hardened layer 104, a connecting layer 1001 can also be formed on the hardened layer 104.

[0070] A connecting layer 1001 can be formed on the surface of the hardened layer 104 by chemical vapor deposition or physical vapor deposition. The connecting layer 1001 forms a chemical bond with the broken bond of the hardened layer 104.

[0071] After the connecting layer is formed, an anti-reflection layer can also be formed on the connecting layer 1001.

[0072] The antireflection layer can be formed on the surface of the bonding layer 1001 by magnetron sputtering. In some embodiments, the antireflection layer includes a high-refractive-index layer and a low-refractive-index layer stacked together.

[0073] When forming the antireflection layer, a high-refractive-index layer can be formed on the surface of the connecting layer 1001, and a low-refractive-index layer can be formed on the surface of the high-refractive-index layer, forming a stacked structure design of low-refractive-index layer and high-refractive-index layer.

[0074] In this embodiment, the connecting layer 1001, the high-refractive-index layer, and the low-refractive-index layer are all formed by magnetron sputtering coating process, for example.

[0075] After the anti-reflective layer is formed, an anti-fingerprint layer can also be formed on the anti-reflective layer.

[0076] An anti-fingerprint layer can be formed on the surface of the aforementioned low-refractive layer using an AF coating process. This anti-fingerprint layer can be formed by coating, spraying, or vapor deposition. In some embodiments, the low-refractive layer resin contains this anti-fingerprint layer.

[0077] In this application, the anti-fingerprint layer is formed by AF coating process, which can be achieved by spraying or vapor deposition of AF solution. The AF solution contains fluorosilane, a hydrophobic and oleophobic polymer. The AF solution forms a film on the glass surface (Si-O chemical bonds create a chemical link), and this invisible film is invisible to the naked eye, thus not affecting the screen's visual effect.

[0078] AF solution is a surface treatment agent used to waterproof and oil-resistant touchscreens, reducing dust and fingerprints on the surface. AF solution is suitable for various substrates, including touchscreen glass panels (mobile phones, monitors, etc.), glass products, plastics, and metal products. AF solution offers excellent waterproof and stain-resistant properties, effectively preventing surface scratches.

[0079] However, while the antireflective layer formed by the dry process has a reduced reflectivity, it is difficult to balance wear resistance and bending resistance.

[0080] Therefore, embodiments of this application provide an antireflective layer that can balance abrasion resistance and bending resistance. This antireflective layer is formed, for example, by a dry process.

[0081] Figure 6 This is a schematic diagram of a stacked structure provided in an embodiment of this application. Figure 6 As shown, the stacked structure 10 includes: from top to bottom (along...) Figure 5 The anti-fingerprint layer 101, anti-reflection layer 100, connecting layer 1001, hardening layer 104 and base film 105 are stacked in the z direction shown; the hardening layer 104 is disposed on the upper surface of the base film 105.

[0082] The anti-reflection layer 100 includes a second low-refractive layer 106, a second high-refractive layer 107, a first low-refractive layer 102, and a first high-refractive layer 103 stacked together, wherein the second low-refractive layer 106 is connected to the anti-fingerprint layer 101, and the first high-refractive layer 103 is connected to the connecting layer 1001.

[0083] In some embodiments, the second low-refractive-index layer 106 and the first low-refractive-index layer 102 are made of the same material. The first high-refractive-index layer 103 is made of a low-modulus material, and the second high-refractive-index layer 107 is made of a high-modulus material, such that the modulus of the first high-refractive-index layer 103 is less than the modulus of the second high-refractive-index layer 107.

[0084] The laminated structure provided in this application embodiment has a first high-refractive-index layer 103 near the hardened layer made of a low-modulus material, which has good bending resistance. The second high-refractive-index layer 107 is disposed near the surface and is made of a high-modulus material, which has good wear resistance. It can be used to support the second low-refractive-index layer (made of a SiO2 layer with a lower modulus), thereby improving the wear resistance of the anti-reflective layer. In this way, both wear resistance and bending resistance of the laminated structure can be taken into account.

[0085] In the fabrication of this stacked structure, the first high-refractive-index layer 103, the first low-refractive-index layer 102, the second high-refractive-index layer 107, and the second low-refractive-index layer 106 can be sequentially formed on the connecting layer by magnetron sputtering. A low-modulus material can be used as the target material for the first high-refractive-index layer 103, and a high-modulus material can be used as the target material for the second high-refractive-index layer 107. The first low-refractive-index layer 102 and the second low-refractive-index layer 106 can use the same target material.

[0086] This application does not limit the material of the low-refractive layer. In some embodiments, the material of the first low-refractive layer 102 includes silicon oxide (SiO2). The second low-refractive layer 106 may be made of the same material as the first low-refractive layer 102.

[0087] This application does not limit the material and modulus of the high-modulus and low-modulus materials. In some embodiments, the modulus of the low-modulus material is, for example, between 70-240 GPa, and the low-modulus material may include at least one of: niobium trioxide (Nb₂O₃), titanium dioxide (TiO₂), tantalum pentoxide (Ta₂O₅), and aluminum oxide (Al₂O₃). The modulus of the high-modulus material is, for example, between 240-500 GPa, and the high-modulus material may include at least one of: silicon nitride (Si₃N₄), silicon oxynitride (SiON), and silicon aluminum oxynitride (SiAlON) compounds.

[0088] This application does not limit the thickness of the high-refractive-index layer and the low-refractive-index layer in its embodiments. In some embodiments, the thickness of the first high-refractive-index layer 103 is the same as the thickness of the second high-refractive-index layer 107, and the thickness of the first low-refractive-index layer 102 is the same as the thickness of the second low-refractive-index layer 106. The thickness of the first high-refractive-index layer 103 ranges from 5 to 150 nm, and the thickness of the first low-refractive-index layer 102 ranges from 10 to 200 nm.

[0089] This application does not limit the number of antireflection layers in its embodiments. In some embodiments, the antireflection layer includes N high-refractive-index layers and N low-refractive-index layers, which are spaced apart, where N is an integer greater than or equal to 2. The first high-refractive-index layer is located near the hardened layer, the second high-refractive-index layer is located near the surface, and N-2 high-refractive-index layers and N-2 low-refractive-index layers are disposed between the first and second high-refractive-index layers.

[0090] Therefore, by setting N-2 high-refractive-index layers and N-2 low-refractive-index layers, a transition can be achieved between high-modulus and low-modulus materials, making the modulus change more gradual, which can improve the bonding force between the layers and reduce delamination caused by excessive modulus change.

[0091] In some embodiments, the N-2 high-refractive-index layers can all be made of low-modulus materials. This results in a greater number of low-modulus high-refractive-index layers in the antireflective layer, further improving its bending resistance.

[0092] In some embodiments, the N-2 high-refractive-index layers can all be made of high-modulus materials. This results in a greater number of high-modulus, high-refractive-index layers in the antireflective layer, further improving its wear resistance.

[0093] In some embodiments, the N-2 high-refractive-index layer may comprise alternating low-modulus high-refractive-index layers and high-modulus high-refractive-index layers. This balances the antireflective layer's bending resistance and abrasion resistance.

[0094] In some embodiments, the N-2 high-refractive-index layers are all made of a composite material, which is formed by combining the high-modulus material and the low-modulus material. Thus, by placing an intermediate-modulus high-refractive-index layer between the high-modulus second high-refractive-index layer and the low-modulus first high-refractive-index layer, a uniform transition from low-modulus to medium-modulus to high-modulus can be achieved, resulting in a smoother modulus change. This improves the bonding strength between the layers and reduces the possibility of delamination caused by excessive modulus changes.

[0095] This application does not limit the structure and modulus of the composite material. In some embodiments, the composite material is formed by combining the high-modulus material and the low-modulus material. The modulus of the composite material is, for example, between 150-400 GPa. Thus, by combining the high-modulus material and the low-modulus material, the modulus of the composite material can be made to be between the modulus of the high-modulus material and the low-modulus material. That is, the modulus of the intermediate high-refractive layer can be made to be between the modulus of the first high-refractive layer and the modulus of the second high-refractive layer, achieving a uniform transition of modulus.

[0096] In other embodiments, the composite material includes: a first sub-part and a second sub-part stacked together, the first sub-part and the second sub-part being connected, the first sub-part being connected to the first low-refractive-index layer, and the second sub-part being connected to the third low-refractive-index layer. The first sub-part is made of the low-modulus material, and the second sub-part is made of the high-modulus material. Thus, by combining the stacks of high-modulus and low-modulus materials into a composite material, the modulus of the composite material can be made to be between the modulus of the high-modulus material and the modulus of the low-modulus material. That is, the modulus of the N-2 high-refractive-index layers can be made to be between the modulus of the first high-refractive-index layer and the modulus of the second high-refractive-index layer, achieving a uniform transition of modulus.

[0097] In other embodiments, the composite material further includes a third sub-part disposed between the first sub-part and the second sub-part, the third sub-part being formed by combining the high-modulus material and the low-modulus material. Thus, by providing a composite material with an intermediate modulus between the high-modulus and low-modulus layers, the modulus of the third sub-part can be made to fall between the modulus of the first and second sub-parts, further achieving a uniform transition of modulus.

[0098] The following description uses an antireflective layer comprising three high-refractive-index layers and three low-refractive-index layers as an example. In some embodiments, such as Figure 7 As shown, the antireflective layer consists of three high-refractive-index layers and three low-refractive-index layers.

[0099] See Figure 7 The anti-reflective layer 100 includes: a second low-refractive layer 106, a second high-refractive layer 107, a third low-refractive layer 108, a third high-refractive layer 109, a first low-refractive layer 102, and a first high-refractive layer 103 stacked together, wherein the second low-refractive layer 106 is connected to the anti-fingerprint layer 101, and the first high-refractive layer is connected to the connecting layer 1001.

[0100] The third low-refractive layer 108 can be made of the same material as the first low-refractive layer 102.

[0101] The material of the third high-refractive-index layer 109 is not limited in this application embodiment. In some embodiments, such as Figure 7 As shown, the third high-refractive-index layer 109 is made of the aforementioned high-modulus material. This results in a greater number of high-modulus, high-refractive-index layers in the antireflective layer, further improving its wear resistance.

[0102] In some embodiments, such as Figure 8 As shown, the third high-refractive-index layer 109 is made of the low-modulus material. This results in a greater number of low-modulus, high-refractive-index layers in the antireflective layer, further improving its bending resistance.

[0103] In some embodiments, such as Figure 9 , Figure 10 , Figure 11 As shown, the third high-refractive-index layer 109 is made of a composite material. The modulus of the composite material is higher than that of the low-modulus material, and the modulus of the composite material is lower than that of the high-modulus material. Thus, by setting a third high-refractive-index layer with an intermediate modulus between the high-modulus second high-refractive-index layer and the low-modulus first high-refractive-index layer, a uniform transition from low modulus to medium modulus to high modulus can be achieved, resulting in a smoother modulus change. This improves the bonding strength between the layers and reduces the possibility of delamination caused by excessive modulus changes.

[0104] In some examples of this embodiment, such as Figure 9 As shown, the composite material used in the third high-refractive-index layer 109 can be formed by combining the high-modulus material and the low-modulus material. Thus, by combining the high-modulus material and the low-modulus material, the modulus of the composite material can be between the modulus of the high-modulus material and the low-modulus material; that is, the modulus of the third high-refractive-index layer can be between the modulus of the first high-refractive-index layer and the second high-refractive-index layer, achieving a uniform transition in modulus. In some embodiments, the modulus of the composite material is, for example, between 150-400 GPa.

[0105] In the process of preparing the composite material, the composite material formed by the mixture of the high modulus material and the low modulus material can be used as the coating target of the third high refractive layer.

[0106] In some embodiments, such as Figure 10 As shown, the composite material used in the third high-refractive-index layer 109 can be a layered structure, which can be referred to as a layered composite material. For example, the third high-refractive-index layer 109 includes: a first sub-part 1091 and a second sub-part 1092 stacked together. The first sub-part 1091 is connected to the first low-refractive-index layer, and the second sub-part 1092 is connected to the third low-refractive-index layer. The first sub-part 1091 is made of the low-modulus material, and the second sub-part 1092 is made of the high-modulus material. Thus, by combining the stacks of high-modulus and low-modulus materials as a composite material, the modulus of the composite material can be between the modulus of the high-modulus material and the modulus of the low-modulus material. That is, the modulus of the third high-refractive-index layer can be between the modulus of the first high-refractive-index layer and the modulus of the second high-refractive-index layer, achieving a uniform transition of modulus. In some embodiments, the modulus of this layered composite material is, for example, between 150-400 GPa.

[0107] In the process of preparing the composite material, the first sub-part 1091 and the second sub-part 1092 can be formed sequentially by magnetron sputtering. The target material of the first sub-part 1091 can be a low-modulus material, and the target material of the second sub-part 1092 can be a high-modulus material.

[0108] In some embodiments, such as Figure 11As shown, the composite material used in the third high-refractive-index layer 109 includes: a composite material layer formed by mixing the high-modulus material and the low-modulus material, and a layered high-modulus material layer and / or low-modulus material layer. For example, the third high-refractive-index layer 109 includes: a first sub-part 1091, a third sub-part 1093, and a second sub-part 1092 stacked together. The first sub-part 1091 is connected to the first low-refractive-index layer, the second sub-part 1092 is connected to the third low-refractive-index layer, and the third sub-part 1093 is disposed between the first sub-part 1091 and the second sub-part 1092. The first sub-part 1091 is made of the low-modulus material, the second sub-part 1092 is made of the high-modulus material, and the third sub-part 1093 is formed by combining the high-modulus material and the low-modulus material. Thus, by setting an intermediate modulus composite material between the high modulus stack and the low modulus stack, the modulus of the third sub-part can be between the modulus of the first sub-part and the modulus of the second sub-part, thereby achieving a more uniform transition of modulus.

[0109] In the process of preparing the composite material, the first sub-part 1091, the third sub-part 1093, and the second sub-part 1092 can be formed sequentially by magnetron sputtering. The target material of the first sub-part 1091 can be a low-modulus material, the target material of the second sub-part 1092 can be a high-modulus material, and the target material of the third sub-part 1093 can be a composite material formed by mixing the high-modulus material and the low-modulus material.

[0110] This application does not limit the connection method between the high refractive layer 103 and the low refractive layer 102. In some embodiments, the low refractive layer 102 can be formed on the upper surface of the high refractive layer 103 by magnetron sputtering coating process.

[0111] In some embodiments, the low-refractive layer 102 is doped with at least one of the following metallic elements: titanium (Ti), zirconium (Zr), copper (Cu), and aluminum (Al).

[0112] The antireflection layer provided in this embodiment increases the hardness of the low-refractive layer by doping it with metallic materials.

[0113] The high-refractive-index layer 103 is doped with at least one of the following: yttrium oxide (Y2O3), aluminum oxide (Al2O3), cerium oxide (CeO2), calcium oxide (CaO), and magnesium oxide (MgO).

[0114] The antireflection layer provided in this embodiment can increase the toughness of the high-refractive layer by doping it with toughening materials.

[0115] The embodiments of this application do not limit the structure of the hardened layer 104. In some embodiments, the hardened layer 104 is a single-layer structure. The material of the hardened layer 104 includes at least one of acrylic resin and epoxy resin.

[0116] In other embodiments, such as Figure 12 As shown, the hardened layer 104 includes a first hardened layer 1041 and a second hardened layer 1042 stacked together. The first hardened layer 1041 is connected to the connecting layer 1001. The second hardened layer 1042 can be pure resin without added particles, which helps reduce surface roughness, enhances the connection stability with the connecting layer 1001, and improves the wear resistance of the laminated structure. The first hardened layer 1041 can be made of particle-reinforced resin. For example, reinforcing particles 1000 are added to the first hardened layer 1041. The material of the reinforcing particles 1000 includes at least one of silicon oxide (SiO2), zirconium oxide (ZrO2), aluminum oxide (Al2O3), titanium oxide (TiO2), and silicon nitride (SiN), which is beneficial to the overall stiffness of the hardened layer 104 and enhances the support effect. At the same time, the first hardened layer 1041 is close to the first high-refractive-index layer. Adding reinforcing particles 1000 to the first hardened layer 1041 helps to increase the modulus of the first hardened layer 1041, which can reduce the modulus difference between the hardened layer and the first high-refractive-index layer and enhance the bending resistance of the laminated structure.

[0117] In other embodiments, such as Figure 13 As shown, the hardening layer 104 can be made of particle-reinforced resin. For example, the hardening layer 104 contains the aforementioned reinforcing particles 1000, and the volume fraction of these reinforcing particles 1000 gradually increases along the direction closer to the connecting layer. This is beneficial to the overall stiffness of the hardening layer 104 and enhances its supporting effect. Simultaneously, the closer to the first high-refractive-index layer, the more reinforcing particles 1000 are present in the hardening layer. This helps to increase the modulus of the hardening layer near the first high-refractive-index layer, reducing the modulus difference between the hardening layer and the first high-refractive-index layer, and enhancing the bending resistance of the laminated structure.

[0118] The hardened layer 104 provided in this embodiment adopts a double-layer structure, which can take into account both wear resistance and support performance.

[0119] In this application, the bending performance and wear resistance of the laminated structure are related to the molding process of the laminated structure and the material and thickness of the laminate.

[0120] The embodiments of this application can perform bending reliability tests and wear resistance tests on laminated structures with different structures, and measure the bending performance and wear resistance of laminated structures with different structures.

[0121] The bending test involves bending the laminated structure to obtain the ultimate bending radius of a single unit. The smaller the ultimate bending radius of a single unit of the laminated structure, the better its bending performance.

[0122] Abrasion resistance testing can be performed by rubbing the surface of the laminated structure with steel wool to obtain the number of times the laminated structure can withstand steel wool friction. The more times it can withstand steel wool friction, the better its abrasion resistance.

[0123] In some embodiments, the antireflective layer includes two high-refractive-index layers and two low-refractive-index layers. The antireflective layer includes a second low-refractive-index layer 106, a second high-refractive-index layer 107, a first low-refractive-index layer 102, and a first high-refractive-index layer 103. The second low-refractive-index layer 106 is connected to the anti-fingerprint layer 101, and the first high-refractive-index layer 103 is connected to the connecting layer 1001. The first low-refractive-index layer 102 and the second low-refractive-index layer 106 are made of the same material, the first high-refractive-index layer 103 is made of a low-modulus material, and the second high-refractive-index layer 107 is made of a high-modulus material. For example, the first high-refractive-index layer 103 is made of niobium trioxide (Nb₂O₃), and the second high-refractive-index layer 107 is made of silicon oxynitride (SiON). After being rubbed with steel wool ≥3000 times, the coating (antireflective layer) shows no obvious scratches, the unit bending limit radius R of the stacked structure is less than or equal to 0.4 mm, and the coating is free of cracks.

[0124] The laminated structure of this embodiment is formed by dry process, and the first high refractive layer 103 near the hardened layer in the antireflection layer is made of low modulus material, which has good bending resistance. The second high refractive layer 107 near the surface is made of high modulus material, which has better wear resistance. The antireflection layer has both good wear resistance and bending performance, and can take into account both wear resistance and bending performance.

[0125] In some embodiments, the antireflective layer includes three high-refractive-index layers and three low-refractive-index layers. The antireflective layer 100 includes a second low-refractive-index layer 106, a second high-refractive-index layer 107, a third low-refractive-index layer 108, a third high-refractive-index layer 109, a first low-refractive-index layer 102, and a first high-refractive-index layer 103, all stacked together. The second low-refractive-index layer 106 is connected to the anti-fingerprint layer 101, and the first high-refractive-index layer 103 is connected to the connecting layer 1001. The third high-refractive-index layer 109 is made of the aforementioned low-modulus material. For example, the first high-refractive-index layer 103 is made of niobium trioxide (Nb₂O₃), the second high-refractive-index layer 107 is made of silicon oxynitride (SiON), and the third high-refractive-index layer 109 is made of niobium trioxide (Nb₂O₃). After being rubbed with steel wool ≥4000 times, the coating (antireflective layer) shows no obvious scratches, the unit bending limit radius R of the stacked structure is less than or equal to 0.5 mm, and the coating is free of cracks.

[0126] The laminated structure of this embodiment is formed by dry process, and the first high refractive layer 103 near the hardened layer in the antireflection layer is made of low modulus material, which has good bending resistance. The second high refractive layer 107 near the surface is made of high modulus material, which has better wear resistance. The antireflection layer has both good wear resistance and bending performance, and can take into account both wear resistance and bending performance.

[0127] In some embodiments, the antireflective layer includes three high-refractive-index layers and three low-refractive-index layers. The antireflective layer 100 includes a second low-refractive-index layer 106, a second high-refractive-index layer 107, a third low-refractive-index layer 108, a third high-refractive-index layer 109, a first low-refractive-index layer 102, and a first high-refractive-index layer 103, all stacked together. The second low-refractive-index layer 106 is connected to the anti-fingerprint layer 101, and the first high-refractive-index layer 103 is connected to the connecting layer 1001. The third high-refractive-index layer 109 is made of the aforementioned low-modulus material. For example, the first high-refractive-index layer 103 is made of niobium trioxide (Nb₂O₃), the second high-refractive-index layer 107 is made of silicon oxynitride (SiON), and the third high-refractive-index layer 109 is made of silicon oxynitride (SiON). After being rubbed with steel wool ≥ 5000 times, the coating (antireflective layer) shows no obvious scratches, the unit bending limit radius R of the stacked structure is less than or equal to 0.5 mm, and the coating is free of cracks.

[0128] The laminated structure of this embodiment is formed by dry process, and the first high refractive layer 103 near the hardened layer in the antireflection layer is made of low modulus material, which has good bending resistance. The second high refractive layer 107 near the surface is made of high modulus material, which has better wear resistance. The antireflection layer has both good wear resistance and bending performance, and can take into account both wear resistance and bending performance.

[0129] This application provides a stacked structure and an electronic device. The stacked structure can be an optical stack, for example, disposed on the light-emitting side of a display module. The stacked structure includes, from top to bottom, an anti-fingerprint layer, an anti-reflection layer, a connecting layer, a hardening layer, and a base film. The anti-reflection layer includes, from top to bottom, a second low-refractive-index layer, a second high-refractive-index layer, a first low-refractive-index layer, and a first high-refractive-index layer, which are connected to the connecting layer. The first low-refractive-index layer and the second low-refractive-index layer are made of the same material, the first high-refractive-index layer is made of a low-modulus material, and the second high-refractive-index layer is made of a high-modulus material. In this stacked structure, the first high-refractive-index layer near the hardening layer is made of a low-modulus material, which provides good bending resistance. The second high-refractive-index layer, disposed near the surface, is made of a high-modulus material, which provides good wear resistance and can support the second low-refractive-index layer, thus improving the wear resistance of the anti-reflection layer. In this way, both wear resistance and bending resistance of the stacked structure can be achieved.

[0130] In some embodiments, the antireflective layer comprises N high-refractive-index layers and N low-refractive-index layers, spaced apart, where N is an integer greater than or equal to 2. A first high-refractive-index layer is disposed near the hardened layer, a second high-refractive-index layer is disposed near the surface, and N-2 high-refractive-index layers are disposed between the first and second high-refractive-index layers. These N-2 high-refractive-index layers may all be made of a low-modulus material. Alternatively, they may all be made of a high-modulus material. Alternatively, they may include alternating low-modulus and high-modulus refractive-index layers. Alternatively, some of the high-refractive-index layers in the N-2 layers may be made of a composite material, which may be formed by combining high-modulus and low-modulus materials. The composite material may be formed by mixing the high-modulus and low-modulus materials. The composite material can also be a combination of a high-modulus material stack and a low-modulus material stack, so that the modulus of the composite material is between the modulus of the high-modulus material and the modulus of the low-modulus material. That is, the modulus of the N-2 high-refractive layer can be between the modulus of the first high-refractive layer and the modulus of the second high-refractive layer, so as to achieve a uniform transition of modulus.

[0131] The above description is merely a specific embodiment of this application, but the scope of protection of this application is not limited thereto. Any changes or substitutions within the technical scope disclosed in this application should be included within the scope of protection of this application. Therefore, the scope of protection of this application should be determined by the scope of the claims.

Claims

1. A layered structure, characterized in that, The stacked structure is disposed on the display module, and the stacked structure includes: an anti-fingerprint layer, an anti-reflection layer, a connecting layer, a hardening layer, and a base film stacked together; The antireflection layer includes: a second low-refractive layer, a second high-refractive layer, a first low-refractive layer, and a first high-refractive layer stacked together, wherein the first high-refractive layer and the connecting layer are connected; The first low-refractive layer and the second low-refractive layer are made of the same material, the first high-refractive layer is made of a low-modulus material, and the second high-refractive layer is made of a high-modulus material.

2. The stacked structure according to claim 1, characterized in that, The antireflection layer further includes a third high-refractive-index layer and a third low-refractive-index layer stacked together, wherein the third high-refractive-index layer is connected to the first low-refractive-index layer, and the third low-refractive-index layer is connected to the second high-refractive-index layer.

3. The stacked structure according to claim 2, characterized in that, The third high-refractive-index layer is made of the high-modulus material.

4. The stacked structure according to claim 2, characterized in that, The third high-refractive-index layer is made of the low-modulus material.

5. The stacked structure according to claim 2, characterized in that, The third high-refractive-index layer is made of a composite material, the modulus of which is higher than that of the low-modulus material and lower than that of the high-modulus material.

6. The stacked structure according to claim 5, characterized in that, The composite material is formed by combining the high-modulus material and the low-modulus material.

7. The stacked structure according to claim 5, characterized in that, The composite material includes: a first sub-part and a second sub-part stacked together, the first sub-part and the second sub-part being connected, the first sub-part being connected to the first low-refractive layer, and the second sub-part being connected to the third low-refractive layer, the first sub-part being made of the low-modulus material, and the second sub-part being made of the high-modulus material.

8. The stacked structure according to claim 7, characterized in that, The composite material further includes a third sub-part disposed between the first sub-part and the second sub-part, the third sub-part being formed by combining the high-modulus material and the low-modulus material.

9. The laminated structure according to any one of claims 1-8, characterized in that, The low-modulus material includes at least one of niobium trioxide (Nb₂O₃), titanium oxide (TiO₂), tantalum pentoxide (Ta₂O₅), and aluminum oxide (Al₂O₃); the high-modulus material includes at least one of silicon nitride (Si₃N₄), silicon oxynitride (SiON), and silicon aluminum oxynitride (SiAlON) compounds.

10. The laminated structure according to any one of claims 1-9, characterized in that, The antireflection layer is formed by magnetron sputtering coating process.

11. The laminated structure according to any one of claims 1-10, characterized in that, The thickness of the first high-refractive-index layer ranges from 5 to 150 nm; the thickness of the first low-refractive-index layer ranges from 10 to 200 nm.

12. The laminated structure according to any one of claims 1-11, characterized in that, The material of the first low-refractive layer includes silicon oxide (SiO2).

13. The laminated structure according to any one of claims 1-12, characterized in that, The first low-refractive-index layer is doped with at least one of titanium (Ti), zirconium (Zr), copper (Cu), and aluminum (Al); the first high-refractive-index layer is doped with at least one of yttrium oxide (Y2O3), aluminum oxide (Al2O3), cerium oxide (CeO2), calcium oxide (CaO), and magnesium oxide (MgO).

14. The laminated structure according to any one of claims 1-13, characterized in that, The hardening layer includes: a first hardening layer and a second hardening layer stacked together, the first hardening layer being connected to the connecting layer, and the first hardening layer being doped with reinforcing particles.

15. The laminated structure according to any one of claims 1-13, characterized in that, The hardened layer is doped with reinforcing particles, and the volume fraction of the reinforcing particles gradually increases along the direction close to the connecting layer.

16. The stacked structure according to claim 14 or 15, characterized in that, The reinforcing particles are made of at least one of the following materials: silicon oxide (SiO2), zirconium oxide (ZrO2), aluminum oxide (Al2O3), titanium oxide (TiO2), and silicon nitride (SiN).

17. An electronic device, characterized in that, It includes a display module and a stacked structure as described in any one of claims 1-16, wherein the stacked structure is disposed on the light-emitting side of the display module.

Images