Display apparatus including light emitting device and pixel lens

Abstract

The present disclosure provides a display apparatus including a light emitting device and a pixel lens. The light emitting device may be covered by an optical insulating layer. A lens planarization layer may be disposed on the optical insulating layer. The pixel lens may be disposed between the optical insulating layer and the lens planarization layer. The pixel lens may be surrounded by a lens passivation layer. The lens passivation layer may block oxygen and moisture moving toward the pixel lens. Accordingly, in the display apparatus, deterioration of quality of an image provided to a user due to oxygen and / or moisture may be reduced or prevented.

Description

Technical Field

[0001] This disclosure relates to an apparatus, and more particularly to, for example, but not limited to, a display apparatus in which light-emitting devices and pixel lenses are stacked on each emitting region. Background Technology

[0002] Generally, a display device provides images to a user. For example, a display device may include light-emitting devices. Each light-emitting device may emit light that displays a specific color. For example, each light-emitting device may include a light-emitting unit disposed between a first electrode and a second electrode.

[0003] Light emitted from each light-emitting device can be focused by a pixel lens within the pixel lens. For example, each pixel lens can overlap with one light-emitting device. The pixel lens can be disposed between an optical insulating layer and a lens planarization layer, with the optical insulating layer disposed on the light-emitting device and the lens planarization layer disposed on the optical insulating layer. Therefore, in the display device, the optical path of light emitted from each light-emitting device can be sufficiently fixed by the optical insulating layer. Furthermore, in the display device, the lens planarization layer can reduce or prevent deformation of the pixel lens due to external impacts.

[0004] The descriptions provided in the background section should not be assumed to be prior art simply because they are mentioned in or associated with that section. The background section may include information describing one or more aspects of the subject matter art, and the descriptions in that section do not limit this disclosure. Summary of the Invention

[0005] Therefore, this disclosure relates to a display device that substantially eliminates one or more problems caused by the limitations and disadvantages of related technologies.

[0006] The purpose of this disclosure is to provide a display device capable of preventing or at least reducing the degradation of the quality of images provided to a user.

[0007] Another object of this disclosure is to provide a display device capable of preventing or at least reducing the deterioration of pixel lenses due to oxygen and / or moisture.

[0008] Additional advantages, objects, and features of this disclosure will be set forth in part in the description which follows, and in part will be apparent to those skilled in the art upon review of the following, or may be learned from practice of this disclosure. The objects and other advantages of this disclosure may be realized and obtained by means of the structures specifically pointed out in the specification, its claims, and the accompanying drawings.

[0009] To achieve these and other advantages and in accordance with the purposes of this disclosure, as embodied and broadly described herein, a display device is provided, comprising: a light-emitting device located on an emitting region of a device substrate; an optical insulating layer located on the light-emitting device, the optical insulating layer extending beyond the emitting region; a lens passivation layer including a lower passivation layer on the optical insulating layer and an upper passivation layer on the lower passivation layer; a pixel lens located between the lower and upper passivation layers of the lens passivation layer, the pixel lens overlapping the emitting region; and a lens planarization layer located on the upper passivation layer of the lens passivation layer, the lens planarization layer including a region overlapping the emitting region, wherein the oxygen transmittance (OTR) of the lens passivation layer is less than the OTR of the optical insulating layer and the OTR of the lens planarization layer.

[0010] In one embodiment, a display device includes: a first light-emitting device located on a first emitting region of a device substrate; a second light-emitting device located on a second emitting region of the device substrate; an optical insulating layer located on the first and second light-emitting devices; a first pixel lens located on the optical insulating layer, overlapping the first emitting region; a first lens passivation layer located on the optical insulating layer, surrounding the first pixel lens; a second pixel lens located on the optical insulating layer, overlapping the second emitting region; a second lens passivation layer located on the optical insulating layer, surrounding the second pixel lens; and a lens planarization layer located on the first and second lens passivation layers, overlapping the first and second emitting regions, wherein the water vapor transmission rate (WVTR) of the first and second lens passivation layers is less than the WVTR of the optical insulating layer and the WVTR of the lens planarization layer.

[0011] In one embodiment, a display device includes: a substrate including an emitting region; a thin-film transistor located on the substrate; a light-emitting device connected to the thin-film transistor and located in the emitting region; a first lens passivation layer located above the light-emitting device; a pixel lens located on the first lens passivation layer and overlapping the light-emitting device in the emitting region, the pixel lens having a curved upper surface; and a second lens passivation layer covering the curved upper surface of the pixel lens, the second lens passivation layer having an upper surface and a lower surface, each of the upper and lower surfaces having a curved shape corresponding to the curved upper surface of the pixel lens.

[0012] Other systems, methods, features, and advantages will be apparent or become apparent to those skilled in the art upon reading the following drawings and detailed description. It is intended that all such additional systems, methods, features, and advantages are included in this specification, fall within the scope of this disclosure, and are protected by the appended claims. Nothing in this section should be construed as limiting these claims. Further aspects and advantages will be discussed below in conjunction with embodiments of this disclosure. Attached Figure Description

[0013] The accompanying drawings are included to provide a further understanding of this disclosure and are incorporated in and constitute a part of this application. The drawings illustrate embodiments of the disclosure and, together with the description, serve to explain the principles of the disclosure. In the drawings:

[0014] Figure 1 This is a schematic view illustrating a display device according to an embodiment of the present disclosure;

[0015] Figure 2 This is a view showing the circuitry of a pixel region in a display device according to an embodiment of the present disclosure;

[0016] Figure 3 It is based on the embodiments of this disclosure. Figure 1 A magnified view of the K1 region;

[0017] Figure 4 This illustrates the implementation of embodiments according to this disclosure. Figure 3 A view of the section intercepted by line I-I'; and

[0018] Figures 5 to 14 This is a view of a display device illustrating another embodiment of the present disclosure.

[0019] Throughout the accompanying drawings and detailed embodiments, unless otherwise stated, the same reference numerals should be understood to refer to the same elements, features, and structures. For clarity, illustrative purposes, the relative dimensions and depictions of these elements may be exaggerated. Detailed Implementation

[0020] Reference will now be made in detail to embodiments of the present disclosure, examples of which are illustrated in the accompanying drawings. In the following description, detailed descriptions of well-known functions will be omitted or provided briefly where such detail would unnecessarily obscure the gist of the inventive concept. The described progression of processing steps and / or operations is exemplary; however, the order of steps and / or operations is not limited to the order set forth herein and can be varied as is known in the art, except where the steps and / or operations must occur in a specific order. The same reference numerals always denote the same elements. The names of the various elements used in the following description are chosen solely for convenience of writing the specification and may therefore differ from the names used in actual products.

[0021] In the following detailed description, with reference to the accompanying drawings illustrating some embodiments of this disclosure, the details relating to the above-described objectives, technical configurations, and operational effects of the embodiments of this disclosure will become clear. Embodiments of this disclosure are provided here to satisfactorily convey the technical ideas of this disclosure to those skilled in the art; therefore, this disclosure may be implemented in other forms and is not limited to the embodiments described below.

[0022] Furthermore, throughout the specification, identical or very similar elements may be represented by the same reference numerals, and in the drawings, for convenience, the length and thickness of layers and regions may be exaggerated. It will be understood that when a first element is referred to as being "on" a second element, although the first element may be disposed on the second element to contact the second element, a third element may be inserted between the first and second elements.

[0023] Here, terms such as “first” and “second” may be used to distinguish one element from another. However, without departing from the technical spirit of this disclosure, the first element and the second element may be named arbitrarily as is convenient for those skilled in the art.

[0024] The terminology used in this disclosure is for the purpose of describing particular embodiments only and is not intended to limit the scope of this disclosure. For example, unless the context clearly indicates otherwise, elements described in the singular are intended to include multiple elements. Furthermore, it will be further understood in this disclosure that the terms “comprising” and “including” indicate the presence of the stated features, integers, steps, operations, elements, components, and / or combinations thereof, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and / or combinations thereof.

[0025] Furthermore, unless “direct” is used, the terms “connection” and “linkage” can include two components being “connected” or “linked” through one or more other components located between the two components.

[0026] Unless otherwise defined, all terms used herein (including technical and scientific terms) shall have the same meaning as commonly understood by one of ordinary skill in the art to which the exemplary embodiments pertain. It will be further understood that terms such as those defined in common dictionaries shall be interpreted as having the meaning consistent with their meaning in the context of the relevant field and shall not be interpreted in an idealized or overly formal sense unless expressly defined herein.

[0027] Throughout this specification, unless otherwise expressly stated, each component may be singular or plural. Throughout the accompanying drawings and detailed description, unless otherwise stated, the same reference numerals should be understood to refer to the same elements, features, and structures. For clarity, illustrative purposes, and convenience, the relative sizes and depictions of these elements may be exaggerated.

[0028] Throughout this specification, unless otherwise stated, the term “A and / or B” means A, B, or both A and B, and unless otherwise stated, the term “C to D” means C or greater and D or less.

[0029] Any implementation described as an "example" in this document is not necessarily to be interpreted as preferred or advantageous over other implementations.

[0030] Furthermore, when referring to any size, relative size, etc., it should be assumed that even without a specific description, the numerical value or corresponding information (e.g., grade, range, etc.) of an element or feature includes the tolerance or error range that may be caused by various factors (e.g., process factors, internal or external influences, noise, etc.). In addition, the term "may" fully encompasses all the meanings of the term "can".

[0031] In the description of various embodiments of this disclosure, when describing positional relationships, for example, when the positional relationship between two parts is described as such as "above," "over," "below," and "beside," one or more other parts may be located between the two parts, unless more restrictive terms such as "just" or "directly" are used. For example, when one element or layer is arranged "on" another element or layer, a third element or layer may be inserted therebetween.

[0032] When describing temporal relationships, if the time sequence is described as such as "after", "following", "next", and "before", discontinuous situations may be included unless more restrictive terms such as "just", "immediately", or "directly" are used.

[0033] When describing quantitative or numerical relationships, terms like "equal" and "identical" generally mean "largely equal" and "largely the same," or "similar or equal" and "similar or identical." In other words, while two elements are equal or identical, a certain margin of error is allowed, such as one percent, five percent, ten percent, etc.

[0034] Those skilled in the art will recognize that various modifications and variations can be made to the embodiments of this disclosure without departing from the technical spirit or scope thereof. Therefore, this disclosure is intended to cover such modifications and variations as long as they fall within the scope of the appended claims and their equivalents.

[0035] Figure 1 This is a schematic view of a display device according to an embodiment of the present disclosure. Figure 2 This is a view showing the circuitry of a pixel region in a display device according to an embodiment of the present disclosure.

[0036] Reference Figure 1 and Figure 2 The display device according to embodiments of the present disclosure may include a display panel DP. The display panel DP can generate an image provided to a user. For example, the display panel DP may include pixel areas PA. Various signals may be applied in each pixel area PA by signal wiring GL, DL, and PL. The signal wiring GL, DL, and PL may include a gating line GL for applying a gating signal, a data line DL for applying a data signal, and a power supply line PL for supplying a power supply voltage.

[0037] The strobe line GL can be electrically connected to the strobe driver GD. The data line DL can be electrically connected to the data driver DD. The strobe driver GD and the data driver DD can be electrically connected to the timing controller TC. For example, the strobe driver GD and the data driver DD can be controlled by the timing controller TC. The power supply line PL can be electrically connected to the power supply unit PU.

[0038] The display panel DP may include a display area AA and a border area BZ disposed outside the display area AA. A pixel area PA may be disposed within the display area AA. For example, the pixel area PA may be surrounded by the border area BZ. A gating driver GD, a data driver DD, a timing controller TC, and a power supply unit PU may be disposed outside the display area AA. At least one of the gating driver GD, the data driver DD, the timing controller TC, and the power supply unit PU may be disposed on the border area BZ. For example, the display device according to an embodiment of this disclosure may be a GIP (Gating In-Panel) type display device, wherein the gating driver GD is formed on the border area BZ.

[0039] Each pixel region PA can achieve a specific color based on signals applied through signal wirings GL, DL, and PL. For example, a drive circuit DC electrically connected to the signal wirings GL, DL, and PL and a light-emitting device 300 electrically connected to the drive circuit DC can be provided in each pixel region PA.

[0040] The driving circuit DC can control the light-emitting device 300 based on the signals applied to the signal wirings GL, DL, and PL. For example, the driving circuit DC can apply a driving current corresponding to a data signal to the light-emitting device 300 using the power supply voltage based on a strobe signal. The driving current applied to the light-emitting device 300 by the driving circuit DC can be maintained for one frame. For example, the driving circuit DC may include a first thin-film transistor TR1, a second thin-film transistor TR2, and a storage capacitor Cst.

[0041] Figure 3 According to one implementation method Figure 1 A magnified view of region K in the image. Figure 4 This illustrates the approach according to one embodiment. Figure 3 A view of the section cut by line I-I'.

[0042] Reference Figures 2 to 4 The first thin-film transistor TR1 can transmit a data signal to the second thin-film transistor TR2 according to a gating signal. For example, the first thin-film transistor TR1 can be used as a switching thin-film transistor. The first thin-film transistor TR1 may include a first semiconductor pattern, a first gate electrode, a first drain electrode, and a first source electrode. For example, the first gate electrode may be electrically connected to the gating line GL, and the first drain electrode may be electrically connected to the data line DL.

[0043] The second thin-film transistor TR2 can generate a drive current corresponding to a data signal. For example, the second thin-film transistor TR2 can be used as a driving thin-film transistor. The second thin-film transistor TR2 may include a second semiconductor pattern 221, a second gate electrode 223, a second drain electrode 225, and a second source electrode 227. For example, the second gate electrode 223 may be electrically connected to the first source electrode, and the second drain electrode 225 may be electrically connected to the power supply voltage line PL.

[0044] The second semiconductor pattern 221 may include a semiconductor material. For example, the second semiconductor pattern 221 may include an oxide semiconductor, such as IGZO. The second semiconductor pattern 221 may include a drain region, a channel region, and a source region. The channel region may be disposed between the drain region and the source region. The conductivity of the drain region and the source region may be greater than the conductivity of the channel region. The resistance of the drain region and the resistance of the source region may be less than the resistance of the channel region. For example, the drain region and the source region may include conductive regions of the oxide semiconductor. The channel region may be a non-conductive region of the oxide semiconductor.

[0045] The second semiconductor pattern 221 may include the same material as the first semiconductor pattern. The second semiconductor pattern 221 may be disposed on the same layer as the first semiconductor pattern. The second semiconductor pattern 221 may be formed using the same process as the first semiconductor pattern. For example, the second semiconductor pattern 221 may be formed simultaneously with the first semiconductor pattern.

[0046] The second gate electrode 223 may be disposed on a portion of the second semiconductor pattern 221. For example, the second gate electrode 223 may overlap with the channel region of the second semiconductor pattern 221. The drain and source regions of the second semiconductor pattern 221 may be disposed outside the second gate electrode 223. The second gate electrode 223 may include a conductive material. For example, the second gate electrode 223 may include metals such as aluminum (Al), chromium (Cr), copper (Cu), molybdenum (Mo), titanium (Ti), and tungsten (W). The second gate electrode 223 may be spaced apart from the second semiconductor pattern 221. The second gate electrode 223 may be insulated from the second semiconductor pattern 221. For example, the channel region of the second semiconductor pattern 221 may have a conductivity corresponding to the voltage of the signal applied to the second gate electrode 223.

[0047] The second gate electrode 223 may comprise the same material as the first gate electrode. The second gate electrode 223 may be disposed on the same layer as the first gate electrode. The second gate electrode 223 may be formed using the same process as the first gate electrode. For example, the second gate electrode 223 may be formed simultaneously with the first gate electrode.

[0048] The second drain electrode 225 may include a conductive material. For example, the second drain electrode 225 may include metals such as aluminum (Al), chromium (Cr), copper (Cu), molybdenum (Mo), titanium (Ti), and tungsten (W). The second drain electrode 225 may be electrically connected to the drain region of the second semiconductor pattern 221. The second drain electrode 225 may be insulated from the second gate electrode 223. The second drain electrode 225 may include a material different from that of the second gate electrode 223. For example, the second drain electrode 225 may be disposed on a different layer from the second gate electrode 223.

[0049] The second drain electrode 225 may include the same material as the first drain electrode. The second drain electrode 225 may be disposed on the same layer as the first drain electrode. The second drain electrode 225 may be formed using the same process as the first drain electrode. For example, the second drain electrode 225 may be formed simultaneously with the first drain electrode.

[0050] The second source electrode 227 may include a conductive material. For example, the second source electrode 227 may include metals such as aluminum (Al), chromium (Cr), copper (Cu), molybdenum (Mo), titanium (Ti), and tungsten (W). The second source electrode 227 may be electrically connected to the source region of the second semiconductor pattern 221. The second source electrode 227 may be insulated from the second gate electrode 223. The second source electrode 227 may include a material different from that of the second gate electrode 223. For example, the second source electrode 227 may be disposed on a different layer from the second gate electrode 223.

[0051] The second source electrode 227 may be disposed on the same layer as the second drain electrode 225. The second source electrode 227 may comprise the same material as the second drain electrode 225. The second source electrode 227 may be formed using the same process as the second drain electrode 225. For example, the second source electrode 227 may be formed simultaneously with the second drain electrode 225. The second source electrode 227 may be spaced apart from the second drain electrode 225.

[0052] The second source electrode 227 may include the same material as the first source electrode. The second source electrode 227 may be disposed on the same layer as the first source electrode. The second source electrode 227 may be formed using the same process as the first source electrode. For example, the second source electrode 227 may be formed simultaneously with the first source electrode.

[0053] The storage capacitor Cst sustains the voltage of the signal applied to the second gate electrode 223 for one frame. For example, the storage capacitor Cst may be electrically connected to the second gate electrode 223 and the second source electrode 227. The storage capacitor Cst may have a stacked structure of capacitor electrodes. For example, the storage capacitor Cst may have a structure with a first capacitor electrode electrically connected to the second gate electrode 223 and a second capacitor electrode electrically connected to the second source electrode 227 stacked together. The storage capacitor Cst can be formed using the same process as that used to form the first thin-film transistor TR1 and the second thin-film transistor TR2. For example, the first capacitor electrode may be disposed on the same layer as the second gate electrode 223, and the second capacitor electrode may be disposed on the same layer as the second source electrode 227.

[0054] The driving circuit DC of each pixel region PA can be supported by the device substrate 100. The device substrate 100 may include an insulating material. For example, the device substrate 100 may include glass or plastic. At least one insulating layer 110, 120, 130, 140, and 150 for reducing or preventing unwanted electrical connections may be provided on the device substrate 100. For example, a buffer insulating layer 110, a gate insulating layer 120, an interlayer insulating layer 130, a device planarization layer 140, and a dam insulating layer 150 may be provided on the device substrate 100.

[0055] A buffer insulating layer 110 may be disposed on the device substrate 100. The buffer insulating layer 110 can prevent or at least reduce contamination caused by the device substrate 100 during the process of forming the drive circuit DC of each pixel region PA. For example, the upper surface of the device substrate 100 facing the drive circuit DC of each pixel region PA may be covered by the buffer insulating layer 110. A first thin-film transistor TR1, a second thin-film transistor TR2, and a storage capacitor Cst for each pixel region PA may be disposed on the buffer insulating layer 110. The buffer insulating layer 110 may include an insulating material. For example, the buffer insulating layer 110 may be an inorganic insulating layer made of an inorganic insulating material such as silicon oxide (SiOx) and silicon nitride (SiNx). The buffer insulating layer 110 may have a multilayer structure. For example, the buffer insulating layer 110 may have a structure in which inorganic insulating layers made of silicon oxide (SiOx) and inorganic insulating layers made of silicon nitride (SiNx) are stacked.

[0056] A gate insulating layer 120 may be disposed on a buffer insulating layer 110. The second gate electrode 223 of each pixel region PA can be insulated from the second semiconductor pattern 221 of the corresponding pixel region PA through the gate insulating layer 120. For example, the gate insulating layer 120 may cover the first semiconductor pattern and the second semiconductor pattern 221 of each pixel region PA. The first gate electrode and the second gate electrode 223 of each pixel region PA may be disposed on the gate insulating layer 120. The gate insulating layer 120 may include an insulating material. For example, the gate insulating layer 120 may be an inorganic insulating layer made of an inorganic insulating material such as silicon oxide (SiOx) and silicon nitride (SiNx).

[0057] An interlayer insulating layer 130 may be disposed on the gate insulating layer 120. The second drain electrode 225 and the second source electrode 227 of each pixel region PA can be insulated from the second gate electrode 223 of the corresponding pixel region PA through the interlayer insulating layer 130. For example, the interlayer insulating layer 130 may cover the first gate electrode and the second gate electrode 223 of each pixel region PA. The first drain electrode, the first source electrode, the second drain electrode 225, and the second source electrode 227 of each pixel region PA may be disposed on the interlayer insulating layer 130. The interlayer insulating layer 130 may include an insulating material. For example, the interlayer insulating layer 130 may be an inorganic insulating layer made of an inorganic insulating material.

[0058] The device planarization layer 140 can be disposed on the interlayer insulating layer 130. The thickness difference caused by the driving circuit DC of each pixel region PA can be removed by the device planarization layer 140. For example, the first drain electrode, first source electrode, second drain electrode 225, and second source electrode 227 of each pixel region PA can be covered by the device planarization layer 140. The device planarization layer 140 may include an insulating material. The device planarization layer 140 may include a material with relatively high fluidity. For example, the device planarization layer may be an organic insulating layer made of an organic insulating material. The upper surface of the device planarization layer 140 opposite to the device substrate 100 can be flat. For example, the upper surface of the device planarization layer 140 may be parallel to the upper surface of the device substrate 100.

[0059] A dam insulating layer 150 may be disposed on the device planarization layer 140. The dam insulating layer 150 may include an insulating material. For example, the dam insulating layer 150 may be an organic insulating layer made of an organic insulating material. The dam insulating layer 150 may include a material different from that of the device planarization layer 140. The dam insulating layer 150 may define an emission region EA in each pixel region PA. For example, a portion of the upper surface of the device planarization layer 140 overlapping with the emission region EA of each pixel region PA may be exposed through the dam insulating layer 150.

[0060] The light-emitting device 300 of each pixel region PA can emit light displaying a specific color. For example, the light-emitting device 300 of each pixel region PA may include a light-emitting unit 320 disposed between the first electrode 310 and the second electrode 330. The light-emitting device 300 of each pixel region PA may be disposed on the upper surface of the device planarization layer 140. The light-emitting device 300 of each pixel region PA may overlap with the emission region EA defined by the dam insulating layer 150 in the corresponding pixel region PA. For example, the first electrode 310, the light-emitting unit 320 and the second electrode 330 of each pixel region PA may be stacked sequentially on a portion of the device planarization layer 140 of the corresponding pixel region PA exposed through the dam insulating layer 150.

[0061] The first electrode 310 may be disposed close to the device planarization layer 140. The first electrode 310 may include a conductive material. The first electrode 310 may include a material having a relatively high reflectivity. For example, the first electrode 310 may include metals such as aluminum (Al) and silver (Ag). The first electrode 310 may have a multilayer structure. For example, the first electrode 310 may have a structure in which reflective electrodes made of metal are disposed between transparent electrodes made of transparent conductive materials (such as ITO and IZO).

[0062] The light-emitting unit 320 (e.g., a light-emitting layer) can generate light with a brightness corresponding to the voltage difference between the first electrode 310 and the second electrode 330. For example, the light-emitting unit 320 may include an emissive material layer (EML). The emissive material layer may include an organic emissive material, an inorganic emissive material, or a hybrid emissive material. For example, a display device according to an embodiment of the present disclosure may be an organic light-emitting display device including an organic emissive material.

[0063] The light-emitting unit 320 may have a multilayer structure. For example, the light-emitting unit 320 may include at least one of a hole injection layer (HIL), a hole transport layer (HTL), an electron transport layer (ETL), and an electron injection layer (EIL). Therefore, in the display device according to the embodiments of the present disclosure, the efficiency of the light-emitting unit 320 can be improved.

[0064] The second electrode 330 may include a conductive material. The second electrode 330 may include a material different from that of the first electrode 310. For example, the work function of the second electrode 330 may differ from that of the first electrode 310. The second electrode 330 may have a higher transmittance than the first electrode 310. For example, the second electrode 330 may be a transparent electrode made of a transparent conductive material such as ITO and IZO. Light generated by the light-emitting unit 320 can be emitted to the outside through the second electrode 330.

[0065] The signal applied to the second electrode 330 of each pixel region PA can be the same as the signal applied to the second electrode 330 of adjacent pixel regions PA. For example, the second electrode 330 of each pixel region PA can be electrically connected to the second electrode 330 of adjacent pixel regions PA. The second electrode 330 of each pixel region PA can comprise the same material as the second electrode 330 of adjacent pixel regions PA. The second electrode 330 of each pixel region PA can be formed using the same process as the second electrodes of adjacent pixel regions PA. For example, the second electrode 330 of each pixel region PA can be formed simultaneously with the second electrode 330 of adjacent pixel regions PA. The second electrode 330 of each pixel region PA can be in direct contact with the second electrode 330 of adjacent pixel regions PA. Therefore, in the display device according to the embodiments of the present disclosure, the process of forming the second electrode 330 in each pixel region PA can be simplified.

[0066] The light-emitting device 300 of each pixel region PA can be controlled independently of the light-emitting devices 300 of adjacent pixel regions PA. For example, the first electrode 310 of each pixel region PA can be spaced apart from the first electrodes 310 of adjacent pixel regions PA. The first electrode 310 of each pixel region PA can be insulated from the first electrodes 310 of adjacent pixel regions PA by a dike insulating layer 150. For example, the edge of the first electrode in each pixel region PA can be covered by the dike insulating layer 150.

[0067] The driving current generated by the driving circuit DC of each pixel region PA can be applied to the first electrode 310 of the corresponding pixel region PA. For example, the first electrode 310 of each pixel region PA can directly contact the second source electrode 227 of the corresponding pixel region PA through the device planarization layer 140. The connection point between the first electrode 310 and the second source electrode 227 in each pixel region PA can overlap with the embankment insulating layer 150. For example, a portion of the first electrode 310 overlapping with the emission region EA in each pixel region PA can directly contact the upper surface of the device planarization layer 140. Therefore, in the display device according to the embodiment of the present disclosure, the positional deviation of the first electrode 310 in the emission region EA of each pixel region PA can be reduced or minimized. Therefore, in the display device according to the embodiment of the present disclosure, the brightness deviation of the light emitted from the emission region EA of each pixel region PA due to the generation position can be reduced or prevented.

[0068] The emission region EA of each pixel region PA can be a different color than the emission region EA of adjacent pixel regions PA. For example, the emission region EA of each pixel region PA can be one of a blue emission region that emits blue light, a green emission region that emits green light, and a red emission region that emits red light. The light emitted from the light-emitting device 300 of each pixel region PA can display a different color than the light emitted from the light-emitting devices of adjacent pixel regions PA. For example, the light-emitting unit 320 of each pixel region PA can generate blue light, green light, or red light. The light-emitting unit 320 of each pixel region PA can be spaced apart from the light-emitting units 320 of adjacent pixel regions PA. For example, the light-emitting unit 320 of each pixel region PA may include an end disposed on the insulating layer 150.

[0069] An encapsulation structure 400 can be disposed on the light-emitting device 300 of each pixel region PA. The encapsulation structure 400 can reduce or prevent damage to the light-emitting device 300 in each pixel region PA due to external moisture and impact. The light-emitting device 300 of each pixel region PA can be covered by the encapsulation structure 400. For example, the area disposed between the emitting regions EA of the pixel region PA can be defined as a non-emitting region, and the encapsulation structure 400 can include regions overlapping with the emitting regions EA of each pixel region PA and regions overlapping with the non-emitting regions. The encapsulation structure 400 can have a multi-layer structure. For example, the encapsulation structure 400 can include a first encapsulation layer 410, a second encapsulation layer 420, and a third encapsulation layer 430 stacked sequentially. The first encapsulation layer 410, the second encapsulation layer 420, and the third encapsulation layer 430 can include insulating materials. The second encapsulation layer 420 can include materials different from those of the first encapsulation layer 410 and the third encapsulation layer 430. For example, the first encapsulation layer 410 and the third encapsulation layer 430 can be inorganic insulating layers made of inorganic insulating materials, and the second encapsulation layer 420 can be an organic insulating layer made of organic insulating materials. The thickness difference caused by the light-emitting device 300 in each pixel region PA can be eliminated by the second encapsulation layer 420. For example, the upper surface of the encapsulation structure 400 opposite to the device substrate 100 can be flat.

[0070] The barrier structure 500 can be disposed on the encapsulation structure 400. The barrier structure 500 can restrict the direction of light travel emitted from the light-emitting device 300 of each pixel region PA. The barrier structure 500 can have a multi-layer structure. For example, the barrier structure 500 can have a stacked structure of a lower barrier pattern 510 and an upper barrier pattern 520 spaced apart from the lower barrier pattern 510.

[0071] The lower barrier pattern 510 may be disposed on the package structure 400. For example, the lower surface of the lower barrier pattern 510 facing the device substrate 100 may be in direct contact with the upper surface of the package structure 400. The lower barrier pattern may include a material capable of blocking light. For example, the lower barrier pattern 510 may include a black dye, such as carbon black. The lower barrier pattern 510 may be disposed outside the emission region EA defined in each pixel region PA. For example, the lower barrier pattern 510 may be disposed in a non-emission region. The lower barrier pattern 510 may overlap with the dam insulating layer 150.

[0072] The upper barrier pattern 520 may be disposed on the lower barrier pattern 510. The upper barrier pattern 520 may be spaced apart from the lower barrier pattern 510. For example, an optical insulating layer 600 covering the lower barrier pattern 510 may be disposed on the package structure 400, and the upper barrier pattern 520 may be disposed on the upper surface of the optical insulating layer 600 opposite to the device substrate 100. Therefore, the optical insulating layer 600 is located between the lower barrier pattern 510 and the upper barrier pattern 520. The optical insulating layer 600 may include an insulating material. The optical insulating layer 600 may include a transparent material. For example, the optical insulating layer 600 may include organic insulating materials and / or inorganic insulating materials. The upper surface of the optical insulating layer 600 may be flat.

[0073] The optical insulating layer 600 can extend onto the emitting region EA of each pixel region PA. For example, the optical insulating layer 600 may include a region overlapping the emitting region EA of each pixel region PA and a region overlapping the non-emitting region. The lower barrier pattern 510 can be covered by the region of the optical insulating layer 600 that overlaps with the non-emitting region. Therefore, in the display device according to the embodiments of the present disclosure, light emitted from the light-emitting device 300 of each pixel region PA can be emitted through the optical insulating layer 600. That is, in the display device according to the embodiments of the present disclosure, the light emitted from the light-emitting device 300 of each pixel region PA can have an optical path length proportional to the thickness of the optical insulating layer 600. Therefore, in the display device according to the embodiments of the present disclosure, the optical path length of the light emitted from the light-emitting device 300 of each pixel region PA can be sufficiently ensured.

[0074] The upper barrier pattern 520 may include a material capable of blocking light. For example, the upper barrier pattern 520 may include a black dye, such as carbon black. The upper barrier pattern 520 may include the same material as the lower barrier pattern 510. The upper barrier pattern 520 may be disposed outside the emission region EA defined in each pixel region PA. For example, the upper barrier pattern 520 may be disposed in a non-emission region. The lower surface of the upper barrier pattern 520 facing the device substrate 100 may be in direct contact with the upper surface of the optical insulating layer 600. For example, the portion of the upper surface of the optical insulating layer 600 that overlaps with the emission region EA of each pixel region PA may be exposed through the upper barrier pattern 520. The upper barrier pattern 520 may overlap with the lower barrier pattern 510. For example, the upper barrier pattern 520 may have the same planar shape as the lower barrier pattern 510.

[0075] Pixel lenses 700 can be disposed on the portion of the upper surface of the optical insulating layer 600 exposed by the upper barrier pattern 520. Each pixel lens 700 can overlap with the emission region EA of one of the pixel regions PA. Light emitted from the light-emitting device 300 of each pixel region PA can be focused by one of the pixel lenses 700. For example, each pixel lens 700 can function as a convex lens. Each pixel lens 700 can be spaced apart from adjacent pixel lenses 700. The lower surface (e.g., a first surface) of each pixel lens 700 facing the optical insulating layer 600 can be flat, and the upper surface (e.g., a second surface) of each pixel lens 700 opposite the optical insulating layer 600 can have a convex shape. The pixel lens on each pixel region PA can have a size larger than the size of the emission region EA defined in the corresponding pixel region PA. For example, the edge of each pixel lens 700 can overlap with the upper barrier pattern 520. That is, the edge of each pixel lens 700 lies on the upper surface of the upper barrier pattern 520. Therefore, in the display device according to the embodiments of the present disclosure, the light extraction efficiency of each pixel region PA can be improved.

[0076] Pixel lens 700 may include a polymer material. For example, pixel lens 700 may include at least one of polyester resin, acrylic resin, polyurethane resin, melamine resin, polyvinyl alcohol resin, and oxazoline resin. Each pixel lens 700 may be formed simultaneously with adjacent pixel lenses 700. For example, the process of forming pixel lens 700 may include the steps of forming a lens material layer on upper barrier pattern 520 and optical insulating layer 600, forming a lens pattern by removing a portion of the lens material layer overlapping with the non-emitting region, and forming pixel lens 700 by reflowing the lens pattern overlapping with the emitting region EA.

[0077] The plane of the pixel lens 700 on each pixel region PA can have a shape corresponding to the plane of the emission region EA defined in the corresponding pixel region PA. For example, the emission region EA of each pixel region PA and the pixel lens 700 can have a circular plane. Therefore, in the display device according to the embodiments of the present disclosure, light emitted from the emission region EA of each pixel region PA can be uniformly focused.

[0078] A lens planarization layer 750 may be disposed on the pixel lens 700. The lens planarization layer 750 can prevent or at least reduce damage to the pixel lens 700 due to external impacts. Each pixel lens 700 may be completely covered by the lens planarization layer 750. For example, the lens planarization layer 750 may extend beyond the emission region EA defined in each pixel region PA. The lens planarization layer 750 may include an insulating material. The lens planarization layer 750 may include a transparent material. The refractive index of the lens planarization layer 750 may be less than the refractive index of each pixel lens 700. For example, the lens planarization layer 750 may include organic insulating materials and / or inorganic insulating materials. The upper surface of the lens planarization layer 750 opposite to the device substrate 100 may be flat.

[0079] Each pixel lens 700 may be surrounded by a lens passivation layer 800. For example, the lens passivation layer 800 may include a lower passivation layer 810 and an upper passivation layer 820 sequentially stacked between the optical insulating layer 600 and the lens planarization layer 750, and each pixel lens 700 may be disposed between the lower passivation layer 810 and the upper passivation layer 820. Thus, for example, the lower passivation layer 810 is disposed on the optical insulating layer 600, the pixel lens 700 is located on the lower passivation layer 810 and contacts the upper surface of the lower passivation layer, and the upper passivation layer 820 is located on the upper surface of the pixel lens 700 and contacts the upper surface of the pixel lens 700. In one embodiment, the lower passivation layer 810 is in direct contact with the lower surface of the pixel lens 700, and the upper passivation layer 820 is in direct contact with the curved upper surface of the pixel lens 700. The lower passivation layer 810 and the upper passivation layer 820 may have an OTR smaller than that of the optical insulating layer 600 and the lens planarization layer 750 (e.g., smaller). Therefore, in the display device according to an embodiment of the present disclosure, oxygen contained in the optical insulating layer 600 and / or the lens planarization layer 750 cannot pass through the lower passivation layer 810 and the upper passivation layer 820. Thus, in the display device according to an embodiment of the present disclosure, the lens passivation layer 800 can prevent or at least reduce external oxygen permeation into each pixel lens 700.

[0080] Furthermore, the lower passivation layer 810 and the upper passivation layer 820 can have moisture-proof properties that are higher than those of the optical insulating layer 600 and the lens planarization layer 750. For example, the lower passivation layer 810 and the upper passivation layer 820 can have a WVTR that is lower than that of the optical insulating layer 600 and the lens planarization layer 750. Therefore, in the display device according to the embodiments of the present disclosure, moisture contained in the optical insulating layer 600 and / or the lens planarization layer 750 cannot penetrate the lower passivation layer 810 and the upper passivation layer 820. Therefore, in the display device according to the embodiments of the present disclosure, the lens passivation layer 800 can reduce or prevent external moisture from penetrating into each pixel lens 700.

[0081] Generally, free radicals formed by the photolysis of polymer materials react with phenols and the like, and oxygen and / or moisture participate in the photolysis reaction of the polymer. For example, a pixel lens 700 made of polymer materials may degrade due to the penetration of external oxygen and / or external moisture. Therefore, in a display device according to an embodiment of the present disclosure, the lens passivation layer 800 can prevent or at least reduce the degradation of each pixel lens 700 due to oxygen and / or moisture.

[0082] The lower passivation layer 810 and the upper passivation layer 820 may include insulating materials. The lower passivation layer 810 and the upper passivation layer 820 may include materials capable of blocking or delaying the penetration of oxygen and moisture. For example, the lower passivation layer 810 and the upper passivation layer 820 may include silicon nitride (SiNx). The lower passivation layer 810 and the upper passivation layer 820 may have a thickness smaller than that of the optical insulating layer 600 and the lens planarization layer 750. For example, each of the lower passivation layer 810 and the upper passivation layer 820 may be a linear insulating layer with a constant thickness. The upper passivation layer 820 may include the same material as the lower passivation layer 810. For example, the thickness of the upper passivation layer 820 may be the same as the thickness of the lower passivation layer 810.

[0083] The lower surface of each pixel lens 700 can be in direct contact with the lower passivation layer 810. The lower passivation layer 810 can extend beyond each pixel lens 700. For example, the lower passivation layer 810 can extend along the upper surface of the upper barrier pattern 520 opposite to the device substrate 100 and the upper surface of the optical insulating layer 600. The upper surfaces of the upper barrier pattern 520 and the upper surfaces of the optical insulating layer 600 can be in direct contact with the lower passivation layer 810.

[0084] The convex-shaped surface of each pixel lens can be in direct contact with the upper passivation layer 820. The upper and lower surfaces of the portion of the upper passivation layer 820 that overlaps with the curved upper surface (e.g., convex shape) of the pixel lens 700 each have a shape corresponding to (e.g., matching) the curved upper surface of the pixel lens 700, such as a convex shape. The upper passivation layer 820 can extend beyond each pixel lens 700. For example, the upper passivation layer 820 can extend along the surface of each pixel lens having a convex shape. The surface of the lens planarization layer 750 facing the device substrate 100 can be in direct contact with the upper passivation layer 820.

[0085] The upper passivation layer 820 can be in direct contact with the lower passivation layer 810 on the outside of each pixel lens 700. For example, in locations where there is no pixel lens 700 between the lower passivation layer 810 and the upper passivation layer 820, the lower passivation layer 810 can be in direct contact with the upper barrier pattern 520 and the upper passivation layer 820. Therefore, in the display device according to embodiments of the present disclosure, oxygen and / or moisture contained in each pixel lens 700 cannot move to the optical insulating layer 600 and / or the lens planarization layer 750. Generally, the color perception of each pixel lens 700 made of polymer material can vary depending on the amount of oxygen and moisture contained in the corresponding pixel lens 700. For example, a pixel lens that has been altered due to the penetration of external oxygen and / or moisture can have a different color perception than a pixel lens that has not been altered due to external oxygen and moisture. In other words, in a display device according to an embodiment of the present disclosure, the lens passivation layer 800 can reduce or prevent deviations in color perception caused by differences in the content of oxygen and / or moisture included in each pixel lens 700.

[0086] The upper passivation layer 820 may have a refractive index less than or equal to that of each pixel lens 700. For example, the refractive index of the lens planarization layer 750 may be less than that of the upper passivation layer 820. Therefore, in the display device according to the embodiments of the present disclosure, light passing through each pixel lens 700 cannot be reflected toward the device substrate 100 at the boundary between the corresponding pixel lens 700 and the upper passivation layer 820 and / or the boundary between the upper passivation layer 820 and the lens planarization layer 750. That is, in the display device according to the embodiments of the present disclosure, light loss due to differences in refractive index can be reduced or prevented. Therefore, in the display device according to the embodiments of the present disclosure, light extraction efficiency can be improved.

[0087] Therefore, the display device according to the embodiments of the present disclosure may include an optical insulating layer 600 located on the light-emitting device 300, a pixel lens 700 located on the optical insulating layer 600, a lens planarization layer 750 located on the pixel lens 700, and a lens passivation layer 800 surrounding each pixel lens 700 located between the optical insulating layer 600 and the lens planarization layer 750, wherein the lens passivation layer 800 may have an OTR and WVTR smaller than those of the optical insulating layer 600 and the lens planarization layer 750. Therefore, in the display device according to the embodiments of the present disclosure, deformation of each pixel lens 700 due to the penetration of external oxygen and / or external moisture can be reduced or prevented. Furthermore, in the display device according to the embodiments of the present disclosure, deviations in color perception of each pixel lens 700 due to differences in oxygen and / or moisture content can be reduced or prevented. Therefore, in the display device according to the embodiments of the present disclosure, the degradation of image quality due to oxygen and moisture can be reduced or prevented.

[0088] The display device according to an embodiment of the present disclosure is described as having a driving circuit DC for each pixel region PA consisting of a first thin-film transistor TR1, a second thin-film transistor TR2, and a storage capacitor Cst. However, in another embodiment of the display device according to the present disclosure, the driving circuit DC for each pixel region PA may include a driving thin-film transistor and at least one switching thin-film transistor. For example, in another embodiment of the display device according to the present disclosure, the driving circuit DC for each pixel region PA may further include a third thin-film transistor to initialize the storage capacitor Cst of the corresponding pixel region PA according to a gating signal. The third thin-film transistor of each pixel region PA may include a third semiconductor pattern, a third gate electrode, a third drain electrode, and a third source electrode. The third semiconductor pattern of each pixel region PA may include a semiconductor pattern. The third gate electrode of each pixel region PA may be electrically connected to a gating line GL. The third drain electrode of each pixel region PA may be electrically connected to an initial line for applying an initial signal. The third source electrode of each pixel region PA may be electrically connected to the storage capacitor Cst of the corresponding pixel region PA. Therefore, in another embodiment of the display device according to the present disclosure, the degree of freedom in configuring the driving circuit DC in each pixel region PA can be improved.

[0089] In the display device according to embodiments of the present disclosure, the positions and electrical connections of the first drain electrode, first source electrode, second drain electrode 225, and second source electrode 227 in each driving circuit DC can vary depending on the configuration of the corresponding driving circuit DC and / or the types of the corresponding thin-film transistors TR1 and TR2. For example, in another embodiment of the display device according to the present disclosure, the second gate electrode 223 of each driving circuit DC can be electrically connected to the first drain electrode of the corresponding driving circuit DC. Therefore, in another embodiment of the display device according to the present disclosure, the degree of freedom in the configuration of each driving circuit DC and the type of each thin-film transistor TR1 and TR2 can be increased.

[0090] The display device according to embodiments of the present disclosure is described in which the lower passivation layer 810 and the upper passivation layer 820 surrounding each pixel lens 700 can be in direct contact with the lower passivation layer 810 and the upper passivation layer 820 surrounding adjacent pixel lenses 700. However, in a display device according to another embodiment of the present disclosure, a portion of the lower passivation layer 810 and a portion of the upper passivation layer 820 disposed outside each pixel lens 700 may be removed. For example, in a display device according to another embodiment of the present disclosure, the lens passivation layer 800 surrounding each pixel lens 700 may be spaced apart from the lens passivation layers 800 surrounding adjacent pixel lenses 700, such as... Figure 5 and Figure 6 As shown in the diagram. Therefore, in a display device according to another embodiment of the present disclosure, oxygen and / or moisture can be blocked from moving through the boundary between the lower passivation layer 810 and the upper passivation layer 820. Therefore, in a display device according to another embodiment of the present disclosure, color perception deviation of each pixel lens 700 due to differences in oxygen and / or moisture content can be effectively reduced or prevented.

[0091] The upper passivation layer 820, covering the surface of each pixel lens 700 having a convex shape, can cover the end of the lower passivation layer 810 that contacts the lower surface of the corresponding pixel lens 700. Therefore, in a display device according to another embodiment of the present disclosure, degradation of each pixel lens 700 due to oxygen and / or moisture penetration into the boundary between the lower passivation layer 810 and the upper passivation layer 820 can be reduced or prevented. Therefore, in a display device according to another embodiment of the present disclosure, image quality degradation due to oxygen and moisture can be effectively reduced or prevented.

[0092] The end of the lens passivation layer 800 surrounding each pixel lens 700 can be disposed on the upper surface of the upper barrier pattern 520. For example, the lens planarization layer 750 can be in direct contact with the upper surface of the upper barrier pattern 520 outside the upper passivation layer 820. Therefore, in a display device according to another embodiment of the present disclosure, the adhesive strength between the upper barrier pattern 520 and the lower passivation layer 810 can be supplemented by the lens planarization layer 750. Therefore, in a display device according to another embodiment of the present disclosure, the degree of freedom of the material of the lower passivation layer 810 can be improved. For example, in a display device according to another embodiment of the present disclosure, peeling of the lens passivation layer 800 due to low adhesive strength between the upper barrier pattern 520 and the lower passivation layer 810 can be reduced or prevented.

[0093] In a display device according to another embodiment of the present disclosure, the optical insulating layer 600 may be an organic insulating layer made of an organic insulating material. For example, in a display device according to another embodiment of the present disclosure, the process for forming the optical insulating layer 600 may include a curing process using ultraviolet light (UV). In a display device according to another embodiment of the present disclosure, a UV absorber 600p may be dispersed in the optical insulating layer 600. The content of the UV absorber 600p dispersed in the optical insulating layer 600 may vary in the thickness direction of the optical insulating layer 600. For example, in a display device according to another embodiment of the present disclosure, the optical insulating layer 600 may include a lower end portion 610 disposed near the encapsulation structure 400, a central portion 620 disposed on the lower end portion 610 and further away from the encapsulation structure 400 than the lower end portion 610, and a surface portion 630 disposed on the central portion 620, such that the central portion 620 is located between the surface portion 630 and the lower end portion 610. The content of UV absorber 600p dispersed in the lower end portion 610 of the optical insulating layer 600 can be greater than the content of UV absorber 600p dispersed in the central portion 620 of the optical insulating layer 600, and the content of UV absorber 600p dispersed in the surface portion 630 of the optical insulating layer 600, including the upper surface of the optical insulating layer 600, can be greater than the content of UV absorber 600p dispersed in the central portion 620 of the optical insulating layer 600, such as... Figure 7 As shown.

[0094] Generally, the intensity and amount of UV light irradiating the upper surface of the optical insulating layer 600 for the curing process can be reduced toward the device substrate 100. For example, the intensity and amount of UV light irradiating the lower end portion 610 of the optical insulating layer 600 can be less than the intensity and amount of UV light irradiating the central portion 620 of the optical insulating layer 600. Therefore, in a display device according to another embodiment of the present disclosure, the lower end portion 610 of the optical insulating layer 600 can be sufficiently cured by the difference in the content of UV absorber 600p between the lower end portion 610 and the central portion 620 of the optical insulating layer 600. The uncured area of ​​the organic insulating layer can have a lower adhesive strength than the cured area of ​​the organic insulating layer. That is, in a display device according to another embodiment of the present disclosure, the peeling of the optical insulating layer 600 from the encapsulation structure 400 due to unstable curing of the lower end portion 610 of the optical insulating layer 600 can be reduced or prevented. The transmittance of the uncured area of ​​the organic insulating layer can be different from the transmittance of the cured area of ​​the organic insulating layer. Therefore, in a display device according to another embodiment of the present disclosure, the difference in brightness of light emitted from the light-emitting device 300 of each pixel region PA due to unstable curing of the lower end 610 of the optical insulating layer 600 can be reduced or prevented.

[0095] In the process of curing an organic insulating layer using UV light irradiated onto its upper surface, a portion of the organic insulating layer near its upper surface may not cure due to interference from oxygen or the like. Therefore, in a display device according to another embodiment of this disclosure, the surface portion 630 of the optical insulating layer 600, which has a higher UV absorber 600p content compared to the central portion 620 of the optical insulating layer 600, can be stably cured. Furthermore, in a display device according to another embodiment of this disclosure, a decrease in the adhesive strength between the optical insulating layer 600 and the lens passivation layer 800 due to uncured portions of the surface portion 630 of the optical insulating layer 600 can be reduced or prevented. The uncured portions of the surface portion 630 of the optical insulating layer 600 can be removed by forming an upper barrier pattern 520. In other words, in a display device according to another embodiment of this disclosure, undercutting due to the removal of uncured portions of the surface portion 630 can be reduced or prevented. Therefore, in a display device according to another embodiment of the present disclosure, the reduction or prevention of image quality degradation due to partial peeling of the pixel lens 700 can be reduced or prevented.

[0096] In a display device according to another embodiment of the present disclosure, an antioxidant may be dispersed in the optical insulating layer 600 and the lens planarization layer 750. Therefore, in the display device according to another embodiment of the present disclosure, oxygen and moisture moving through the optical insulating layer 600 and / or the lens planarization layer 750 can react with the antioxidant. That is, in the display device according to another embodiment of the present disclosure, the amount of oxygen and / or moisture permeating each pixel lens 700 through the optical insulating layer 600 and the lens planarization layer 750 can be significantly reduced. Therefore, in the display device according to another embodiment of the present disclosure, degradation of each pixel lens 700 due to oxygen and moisture can be effectively reduced or prevented.

[0097] The display device according to an embodiment of the present disclosure is described as having an upper passivation layer 820 with a refractive index lower than that of each pixel lens 700. However, in another embodiment of the display device according to the present disclosure, each pixel lens 700 may have a refractive index greater than that of the lens planarization layer 750, the refractive index of the upper passivation layer 820 may be greater than that of each pixel lens 700, and the upper passivation layer 820 may have a relatively small thickness. For example, in another embodiment of the display device according to the present disclosure, the thickness t2 of the upper passivation layer 820 may be less than the thickness t1 of the lower passivation layer 810, such as... Figure 8 As shown in the figure. Therefore, in a display device according to another embodiment of the present disclosure, light loss due to the refractive index of the upper passivation layer 820 can be reduced.

[0098] The lower passivation layer 810 may comprise a material different from that of the upper passivation layer 820. For example, the refractive index of the lower passivation layer 810 may be between the refractive index of the optical insulating layer 600 and the refractive index of each pixel lens 700. Therefore, in a display device according to another embodiment of this disclosure, light loss due to differences in refractive index can be reduced or minimized.

[0099] The display device according to an embodiment of the present disclosure is described as having an upper barrier pattern 520 comprising the same material as the lower barrier pattern 510. However, in another embodiment of the display device according to the present disclosure, the upper barrier pattern 520 may comprise a material different from the material of the lower barrier pattern 510. For example, in another embodiment of the display device according to the present disclosure, a touch sensor TS for sensing the touch of a user or tool may be disposed between the optical insulating layer 600 and the lens planarization layer 750, such as... Figure 9 and Figure 10 As shown in the image.

[0100] The touch sensor TS may include touch electrodes 910 and bridge electrodes 920 connected between the touch electrodes 910. Touch electrodes 910 and bridge electrodes 920 may include conductive materials. Touch electrodes 910 and bridge electrodes 920 may include materials capable of blocking light. For example, touch electrodes 910 and bridge electrodes 920 may include metals. At least one bridge electrode of bridge electrodes 920 may include a material different from that of touch electrodes 910. For example, at least one bridge electrode of bridge electrodes 920 may be disposed on a different layer from touch electrodes 910.

[0101] The lower surface of each touch electrode 910 facing the device substrate 100 can directly contact the upper surface of the optical insulating layer 600. For example, the touch electrode 910 can be disposed between the optical insulating layer 600 and the lens passivation layer 800. The touch electrode 910 can be disposed outside the emission region EA defined in each pixel region PA. For example, the touch electrode 910 can be disposed in a non-emission region. The touch electrode 910 can overlap with the lower barrier pattern 510. The travel direction of light emitted from the emission region EA of each pixel region PA can be limited by the touch electrode 910. For example, in a display device according to another embodiment of the present disclosure, the touch electrode 910 can be used as an upper barrier pattern. That is, in a display device according to another embodiment of the present disclosure, the process of forming the upper barrier pattern can be omitted or can be simplified. Therefore, in a display device according to another embodiment of the present disclosure, process efficiency can be improved.

[0102] A display device according to another embodiment of the present disclosure may include a display panel DP installed inside a vehicle. For example, in a display device according to another embodiment of the present disclosure, the display panel DP may be disposed between the driver's seat DS and the passenger seat PS, such as... Figure 11 and Figure 12 As shown in the diagram. The image realized by the display panel DP can be shared by the driver sitting in the driver's seat DS and the passenger sitting in the passenger seat PS. The image realized by the display panel DP cannot be reflected by the vehicle's front windshield (FW). For example, the emission area EA of each pixel region PA and each pixel lens 700 can have the shape of a strip extending in a first direction X. Here, the first direction X is the direction from the driver's seat DS toward the passenger seat PS. The pixel region PA can be arranged side by side in the first direction X and a second direction Y perpendicular to the first direction X. For example, the vehicle's front windshield FW can be arranged side by side with the display panel DP. The third direction perpendicular to the first direction X and the second direction Y can be the direction from the display panel DP toward the driver and the passenger. Therefore, in a display device according to another embodiment of the present disclosure, the image realized by the emission area EA of each pixel region PA and each pixel lens 700 can have a wide viewing angle in the first direction X.

[0103] In a display device according to another embodiment of the present disclosure, optionally, the image displayed by the display panel DP cannot be recognized by the driver sitting in the driver's seat DS. For example, in a display device according to another embodiment of the present disclosure, the display panel DP mounted in front of the passenger seat PS of a vehicle can display one of a first image shared between the driver sitting in the driver's seat DS and the passenger sitting in the passenger seat PS, and a second image that is not recognized by the driver, such as... Figure 13 and Figure 14 As shown in the diagram. Therefore, in a display device according to another embodiment of the present disclosure, accidents caused by driver distraction can be reduced or prevented when the vehicle is being driven.

[0104] Multiple subpixels SP can be set within each pixel region PA. For example, a red subpixel R-SP to represent red, a green subpixel G-SP to represent green, and a blue subpixel B-SP to represent blue can be set within each pixel region PA. A first emission region EA1 and a second emission region EA2 can be defined within each subpixel SP. The number of second emission regions EA2 defined in each subpixel SP can differ from the number of first emission regions EA1 defined in the corresponding subpixel SP. For example, a single first emission region EA1 and two second emission regions EA2 can be defined in each subpixel SP.

[0105] The plane of the second emission region EA2 may differ from the plane of the first emission region EA1. For example, the first emission region EA1 may have a planar shape of a strip extending in the first direction, and the plane of the second emission region EA2 may have a circular shape. The pixel lens 700 overlapping the emission regions EA1 and EA2 of each sub-pixel SP may include a first pixel lens 700s having a planar shape corresponding to the first emission region EA1 of each sub-pixel SP and a second pixel lens 700p having a planar shape corresponding to the second emission region EA2 of each sub-pixel SP. Compared with the second emission region EA2 and the second pixel lens 700p of each sub-pixel SP, the first emission region EA1 and the first pixel lens 700s of each sub-pixel SP can realize an image with a wider viewing angle in the first direction X. Therefore, in a display device according to another embodiment of the present disclosure, one of a first image realized by the first emission region EA1 and the first pixel lens 700s of each sub-pixel SP and a second image realized by the second emission region EA2 and the second pixel lens 700p of each sub-pixel SP can be provided. In other words, in a display device according to another embodiment of the present disclosure, a first image having a relatively wide viewing angle and a second image having a relatively narrow viewing angle can be optionally implemented. Therefore, in a display device according to another embodiment of the present disclosure, the differences in color perception between images with various viewing angles can be reduced or minimized.

[0106] As a result, the display device according to embodiments of the present disclosure may include an optical insulating layer on a light-emitting device, a lens planarization layer on the optical insulating layer, a pixel lens between the optical insulating layer and the lens planarization layer, and a lens passivation layer surrounding the pixel lens. The pixel lens may overlap with the light-emitting device, and oxygen and / or moisture moving through the optical insulating layer and the lens planarization layer may be blocked or delayed by the lens passivation layer. Therefore, in the display device according to embodiments of the present disclosure, pixel lens degradation due to oxygen and / or moisture can be reduced or prevented. Therefore, in the display device according to embodiments of the present disclosure, degradation of the image quality provided to the user due to oxygen and moisture can be reduced or prevented. Furthermore, in the display device according to embodiments of the present disclosure, production energy can be reduced through process optimization.

[0107] In one embodiment, a display device includes: a light-emitting device located on an emitting region of a device substrate; an optical insulating layer located on the light-emitting device and extending beyond the emitting region; a lens passivation layer including a lower passivation layer on the optical insulating layer and an upper passivation layer on the lower passivation layer; a pixel lens located between the lower and upper passivation layers of the lens passivation layer and overlapping the emitting region; and a lens planarization layer located on the upper passivation layer of the lens passivation layer, the lens planarization layer including a region overlapping the emitting region, wherein the oxygen transmittance (OTR) of the lens passivation layer is less than the OTR of the optical insulating layer and the OTR of the lens planarization layer.

[0108] In one embodiment, the water vapor transmission rate (WVTR) of the lens passivation layer is less than that of the optical insulating layer and the lens planarization layer.

[0109] In one implementation, at a location where there is no pixel lens between the lower and upper passivation layers, a portion of the upper passivation layer contacts a portion of the lower passivation layer.

[0110] In one embodiment, the upper passivation layer comprises a material different from that of the lower passivation layer.

[0111] In one embodiment, the refractive index of the pixel lens is less than the refractive index of the upper passivation layer, wherein the refractive index of the lens planarization layer is less than the refractive index of the pixel lens, and wherein the thickness of the upper passivation layer is less than the thickness of the lens planarization layer.

[0112] In one implementation, the thickness of the upper passivation layer is smaller than the thickness of the lower passivation layer.

[0113] In one embodiment, the display device further includes an ultraviolet (UV) absorber dispersed in an optical insulating layer, wherein the optical insulating layer includes: a lower end portion disposed on a light-emitting device, a central portion disposed on the lower end portion and further away from the light-emitting device than the lower end portion, and a surface portion disposed on the central portion such that the central portion is located between the lower end portion and the surface portion, wherein the surface portion of the optical insulating layer includes an upper surface of the optical insulating layer facing the lens passivation layer, and wherein the content of UV absorber in the surface portion of the optical insulating layer is greater than the content of UV absorber in the central portion of the optical insulating layer.

[0114] In one embodiment, the UV absorber content in the lower end of the optical insulating layer is greater than the UV absorber content in the central portion of the optical insulating layer, and the thickness of the surface portion is less than the thickness of the lower end and the thickness of the central portion.

[0115] In one embodiment, a display device includes: a first light-emitting device located on a first emitting region of a device substrate; a second light-emitting device located on a second emitting region of the device substrate; an optical insulating layer located on the first and second light-emitting devices; a first pixel lens located on the optical insulating layer, overlapping the first emitting region; a first lens passivation layer located on the optical insulating layer, surrounding the first pixel lens; a second pixel lens located on the optical insulating layer, overlapping the second emitting region; a second lens passivation layer located on the optical insulating layer, surrounding the second pixel lens; and a lens planarization layer located on the first and second lens passivation layers, overlapping the first and second emitting regions, wherein the water vapor transmission rate (WVTR) of the first and second lens passivation layers is less than the WVTR of the optical insulating layer and the WVTR of the lens planarization layer.

[0116] In one embodiment, the second lens passivation layer has the same stacking structure as the first lens passivation layer.

[0117] In one embodiment, the second lens passivation layer is spaced apart from the first lens passivation layer at a location between the first emission region and the second emission region.

[0118] In one embodiment, each of the first lens passivation layer and the second lens passivation layer has a stacked structure including a lower passivation layer and an upper passivation layer located on the lower passivation layer, wherein the end of the lower passivation layer is covered by the upper passivation layer.

[0119] In one embodiment, the display device further includes an upper barrier pattern that does not overlap with the first emission region and the second emission region, the upper barrier pattern being located between an optical insulating layer and a lens planarization layer, wherein the ends of the first lens passivation layer and the ends of the second lens passivation layer overlap with the upper barrier pattern.

[0120] In one embodiment, the lens planarization layer contacts the upper barrier pattern at a location between the first lens passivation layer and the second lens passivation layer.

[0121] In one embodiment, the display device further includes an antioxidant dispersed in the optical insulating layer and the lens planarization layer.

[0122] In one embodiment, a display device includes: a substrate including an emitting region; a thin-film transistor located on the substrate; a light-emitting device connected to the thin-film transistor and located in the emitting region; a first lens passivation layer; a pixel lens located on the first lens passivation layer and overlapping the light-emitting device in the emitting region, the pixel lens having a curved upper surface; and a second lens passivation layer covering the curved upper surface of the pixel lens, the second lens passivation layer having an upper surface and a lower surface, each of the upper and lower surfaces having a curved shape corresponding to the curved upper surface of the pixel lens.

[0123] In one embodiment, the display device further includes: an optical insulating layer located between the light-emitting device and the first lens passivation layer, and a lens planarization layer located on the second lens passivation layer.

[0124] In one embodiment, the oxygen transmittance (OTR) of the first lens passivation layer and the second lens passivation layer is less than the OTR of the optical insulating layer and the OTR of the lens planarization layer.

[0125] In one embodiment, the water vapor transmission rate (WVTR) of the first lens passivation layer and the second lens passivation layer is less than the WVTR of the optical insulating layer and the WVTR of the lens planarization layer.

[0126] In one embodiment, the lower surface of the second lens passivation layer is in direct contact with the curved upper surface of the pixel lens.

[0127] In one embodiment, the first lens passivation layer is in direct contact with the lower surface of the pixel lens.

[0128] In one embodiment, the refractive index of the pixel lens is less than the refractive index of the second lens passivation layer, wherein the refractive index of the lens planarization layer is less than the refractive index of the pixel lens, and wherein the thickness of the second lens passivation layer is less than the thickness of the lens planarization layer.

[0129] In one embodiment, the thickness of the second lens passivation layer is less than the thickness of the first lens passivation layer.

[0130] Cross-references to related applications

[0131] This application claims priority to Korean Patent Application No. 10-2024-0160317, filed in Korea on November 12, 2024, the entire contents of which are expressly incorporated herein by reference as if fully set forth herein.

Claims

1. A display device, the display device comprising: A light-emitting device, wherein the light-emitting device is located on the emitting area of ​​the device substrate; An optical insulating layer located on the light-emitting device, the optical insulating layer extending beyond the emitting region; A lens passivation layer, the lens passivation layer comprising a lower passivation layer located on the optical insulating layer and an upper passivation layer located on the lower passivation layer; A pixel lens is located between the lower passivation layer and the upper passivation layer of the lens passivation layer, and the pixel lens overlaps with the emission region; as well as A lens planarization layer is located on the upper passivation layer of the lens passivation layer, and the lens planarization layer includes a region overlapping the emission region. The oxygen transmittance (OTR) of the lens passivation layer is less than that of the optical insulating layer and the lens planarization layer.

2. The display device according to claim 1, wherein, The water vapor transmission rate (WVTR) of the lens passivation layer is less than that of the optical insulating layer and the lens planarization layer.

3. The display device according to claim 1, wherein, At a location where there is no pixel lens between the lower passivation layer and the upper passivation layer, a portion of the upper passivation layer contacts a portion of the lower passivation layer.

4. The display device according to claim 1, wherein, The upper passivation layer comprises a material different from that of the lower passivation layer.

5. The display device according to claim 1, wherein, The refractive index of the pixel lens is less than the refractive index of the upper passivation layer. Wherein, the refractive index of the lens planarization layer is less than the refractive index of the pixel lens, and The thickness of the upper passivation layer is less than the thickness of the lens planarization layer.

6. The display device according to claim 5, wherein, The thickness of the upper passivation layer is less than the thickness of the lower passivation layer.

7. The display device according to claim 1, further comprising: Ultraviolet (UV) absorber, wherein the UV absorber is dispersed in the optical insulating layer. The optical insulating layer includes a lower end portion disposed on the light-emitting device, a central portion disposed on the lower end portion and further away from the light-emitting device than the lower end portion, and a surface portion located on the central portion, such that the central portion is located between the lower end portion and the surface portion. The surface portion of the optical insulating layer includes the upper surface of the optical insulating layer facing the lens passivation layer, and The UV absorber content in the surface portion of the optical insulating layer is greater than the UV absorber content in the central portion of the optical insulating layer.

8. The display device according to claim 7, wherein, The content of the UV absorber in the lower end portion of the optical insulating layer is greater than the content of the UV absorber in the central portion of the optical insulating layer, and The thickness of the surface layer is less than the thickness of the lower end portion and the thickness of the central portion.

9. A display device, the display device comprising: A first light-emitting device is located in a first emitting area on a device substrate; A second light-emitting device is located on a second emitting region of the device substrate; An optical insulating layer is located on the first light-emitting device and the second light-emitting device; A first pixel lens is located on the optical insulating layer, and the first pixel lens overlaps with the first emission region; A first lens passivation layer is located on the optical insulating layer, and the first lens passivation layer surrounds the first pixel lens; A second pixel lens is located on the optical insulating layer, and the second pixel lens overlaps with the second emission region; A second lens passivation layer is located on the optical insulating layer, and the second lens passivation layer surrounds the second pixel lens; as well as A lens planarization layer is located on the first lens passivation layer and the second lens passivation layer, and the lens planarization layer overlaps with the first emission region and the second emission region. The water vapor transmission rate (WVTR) of the first lens passivation layer and the second lens passivation layer is less than that of the optical insulating layer and the lens planarization layer.

10. The display device according to claim 9, wherein, The second lens passivation layer has the same stacking structure as the first lens passivation layer.

11. The display device according to claim 9, wherein, The second lens passivation layer is spaced apart from the first lens passivation layer at a position between the first emission region and the second emission region.

12. The display device according to claim 11, wherein, Each of the first lens passivation layer and the second lens passivation layer has a stacked structure including a lower passivation layer and an upper passivation layer located on the lower passivation layer, and The lower passivation layer is covered by the upper passivation layer at its end.

13. The display device according to claim 11, further comprising: An upper barrier pattern is provided, which does not overlap with the first emission region and the second emission region, and is located between the optical insulating layer and the lens planarization layer. The ends of the first lens passivation layer and the second lens passivation layer overlap with the upper barrier pattern.

14. The display device according to claim 13, wherein, The lens planarization layer contacts the upper barrier pattern at a position between the first lens passivation layer and the second lens passivation layer.

15. The display device according to claim 9, further comprising: An antioxidant, which is dispersed in the optical insulating layer and the lens planarization layer.

16. A display device, the display device comprising: A substrate, the substrate including an emission region; A thin-film transistor, the thin-film transistor being located on the substrate; A light-emitting device, the light-emitting device being connected to the thin-film transistor, the light-emitting device being located in the emitting region; A first lens passivation layer is located above the light-emitting device; A pixel lens, the pixel lens being located on the first lens passivation layer and overlapping with the light-emitting device in the emission region, the pixel lens having a curved upper surface; as well as A second lens passivation layer covers the curved upper surface of the pixel lens. The second lens passivation layer has an upper surface and a lower surface, each having a curved shape corresponding to the curved upper surface of the pixel lens. The movement of oxygen and / or moisture, including within the pixel lens surrounded by the first and second lens passivation layers, is blocked.

17. The display device according to claim 16, further comprising: An optical insulating layer is located between the light-emitting device and the first lens passivation layer; as well as A lens planarization layer, which is located on the second lens passivation layer. The oxygen transmittance (OTR) of the first lens passivation layer and the second lens passivation layer is less than that of the optical insulating layer and the lens planarization layer.

18. The display device according to claim 16, further comprising: An optical insulating layer is located between the light-emitting device and the first lens passivation layer; as well as A lens planarization layer, which is located on the second lens passivation layer. The water vapor transmission rate (WVTR) of the first lens passivation layer and the second lens passivation layer is less than that of the optical insulating layer and the lens planarization layer.

19. The display device according to claim 16, wherein, The lower surface of the second lens passivation layer is in direct contact with the curved upper surface of the pixel lens.

20. The display device according to claim 16, wherein, The first lens passivation layer is in direct contact with the lower surface of the pixel lens.

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