Post-treatment method and device of zeolite molecular sieve membrane, and preparation method of electronic-grade solvent
By employing a multi-stage cleaning and polishing process, the problem of impurity and cation leaching during the dehydration of zeolite molecular sieve membranes was solved, achieving ultra-low ion leaching, reducing equipment costs and environmental impact, and making it suitable for the preparation of electronic-grade solvents.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- HYMATER CO LTD
- Filing Date
- 2024-11-21
- Publication Date
- 2026-05-22
AI Technical Summary
In existing technologies, zeolite molecular sieve membranes suffer from the problem of amorphous impurities and the dissolution of supersaturated cations during the dehydration process, resulting in excessive ion levels. This increases the frequency of replacement of downstream adsorption resins and the cost of equipment use, while also impacting the environment.
A multi-stage cleaning and polishing process is employed, including water washing, organic cleaning, ion exchange, and polishing. Cations such as K+, Ce3+, and La3+ are used for anchoring and filling to reduce impurities and lattice gaps on the zeolite molecular sieve membrane surface. Polishing is then performed to reduce surface defects, and finally, a third-stage cleaning is performed to remove residual impurities.
It significantly reduces the ion dissolution of zeolite molecular sieve membranes to below 1 ppb, thereby reducing equipment costs and environmental impact, and is suitable for the preparation of electronic-grade solvents.
Smart Images
Figure CN122070973A_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of zeolite molecular sieve membrane technology, and more specifically, to a post-processing method and apparatus for zeolite molecular sieve membranes, and a method for preparing electronic-grade solvents. Background Technology
[0002] Molecular sieve membrane separation technology has significant advantages such as low operating energy consumption and high single-pass separation degree. It will play an important role in the transformation of traditional separation processes and the intensification of modern process industries. It is of great significance for improving the quality and efficiency of industries such as energy, chemical, pharmaceutical and electronics, as well as solving the current energy shortage problem and alleviating the increasingly severe environmental pressure.
[0003] High-end electronic-grade solvents are among the key basic chemical materials in the production of ultra-large-scale integrated circuits and new energy electric vehicles. Their purity and cleanliness have a significant impact on the yield, performance, and reliability of related products. European and American countries almost completely monopolize the global production of electronic-grade solvents, strictly controlling access to related core production materials. Only a few domestic manufacturers have obtained foreign technology licenses and fully adopt foreign production materials and related processes.
[0004] Our company currently uses a zeolite molecular sieve membrane dehydration tandem ion exchange resin process to prepare electronic-grade solvents from industrial-grade organic solvents. However, the surface of the zeolite molecular sieve membrane mainly contains Si, Al, and Na elements, which dissolve during the dehydration process. Amorphous impurities and supersaturated cations are the most easily dissolved, causing reagent ion levels to exceed limits. Although ion adsorption resins can remove the dissolved ions, high-end electronic-grade reagent adsorption resins are for single use only. If too many ions dissolve from the zeolite molecular sieve membrane, it will increase the frequency of replacement of subsequent adsorption resins, ultimately increasing the operating cost of the entire equipment and generating more resin waste, which impacts the environment. Therefore, it is urgent to reduce impurities on the surface of the zeolite molecular sieve membrane while inhibiting the dissolution of crystalline zeolite. Summary of the Invention
[0005] The purpose of this invention is to overcome the above-mentioned defects in the prior art and provide a post-processing method and apparatus for zeolite molecular sieve membranes, as well as a method for preparing electronic-grade solvents, thereby reducing the amount of dissolved ions on the surface of zeolite molecular sieve membranes to prepare electronic-grade solvents.
[0006] To achieve the above objectives, the technical solution of the present invention is as follows:
[0007] A post-processing method for zeolite molecular sieve membranes includes the following steps:
[0008] The zeolite molecular sieve membrane was first-stage cleaned with a cleaning solution to obtain the first-stage cleaned zeolite molecular sieve membrane.
[0009] The zeolite molecular sieve membrane after primary cleaning is subjected to secondary cleaning with the cleaning solution, and cations are added to the cleaning solution to obtain a zeolite molecular sieve membrane after secondary cleaning.
[0010] The zeolite molecular sieve membrane after the secondary cleaning is polished to obtain a polished zeolite molecular sieve membrane.
[0011] The polished zeolite molecular sieve membrane is subjected to a third-stage cleaning with the cleaning solution to obtain the ultra-low leaching zeolite molecular sieve membrane.
[0012] The present invention also discloses a post-treatment device for zeolite molecular sieve membranes, including a container, a circulation pipeline and a circulation pump. The container is used to contain cleaning liquid. The inlet and outlet of the circulation pipeline are respectively connected to the container. The circulation pump is installed on the circulation pipeline and drives the cleaning liquid to circulate through the circulation pipeline.
[0013] This invention also discloses a method for preparing an electronic-grade solvent, comprising the following steps:
[0014] The zeolite molecular sieve membrane, prepared by the post-treatment method of the zeolite molecular sieve membrane as described above, is dehydrated and then subjected to ion adsorption treatment with a series ion adsorption resin to obtain the electronic-grade solvent.
[0015] Implementing the embodiments of the present invention will have the following beneficial effects:
[0016] In this embodiment of the invention, a first-stage cleaning is performed using a cleaning solution to remove impurities and supersaturated cations from the surface of the zeolite molecular sieve membrane. Then, a cationic curing agent is used to anchor and fill the lattice gaps on the surface of the zeolite molecular sieve membrane caused by the first-stage cleaning, preventing ions inside the zeolite molecular sieve membrane from dissolving out of the lattice gaps. After that, a polishing process is performed to reduce surface defects, thereby avoiding surface cracking of the zeolite molecular sieve membrane during use and increasing ion dissolution. Finally, a third-stage cleaning is performed to remove residual cationic curing agent and polishing agent and other impurities from the membrane surface, resulting in an ultra-low dissolution zeolite molecular sieve membrane.
[0017] This invention proposes a method to reduce ion dissolution from zeolite molecular sieve membranes by addressing surface impurities, membrane ions, and the support structure. This method can reduce ion dissolution from zeolite molecular sieve membranes to below 1 ppb, significantly reducing the amount of ion dissolution and making it applicable to the preparation of electronic-grade reagents. Attached Figure Description
[0018] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0019] in:
[0020] Figure 1 This is a schematic diagram of the post-processing device for zeolite molecular sieve membranes according to a specific embodiment of the present invention. Detailed Implementation
[0021] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.
[0022] This invention discloses a post-processing method for zeolite molecular sieve membranes, comprising the following steps:
[0023] 1) The zeolite molecular sieve membrane is first-stage cleaned with a cleaning solution to remove impurities and supersaturated cations from the surface of the zeolite molecular sieve membrane, resulting in a first-stage cleaned zeolite molecular sieve membrane.
[0024] In this step, the impurities removed mainly refer to amorphous impurities formed on the membrane surface. Amorphous impurities are usually silicon and aluminum oxide precipitates in the sol caused by solvent evaporation when the zeolite membrane is taken out of the solution. They are usually present on the crystal surface and at the grain boundaries. The first-stage cleaning is performed at least once.
[0025] Preferably, in one embodiment, during the first-stage cleaning process, the zeolite molecular sieve membrane is first washed with pure water, and then organically cleaned with a cleaning solution containing organic solvents to obtain the zeolite molecular sieve membrane after the first-stage cleaning.
[0026] In the above embodiment, most of the water-soluble impurities and some supersaturated cations are first removed by water washing, and then organic cleaning is used to further enhance the removal of supersaturated cations and organic impurities at the lattice interface. This embodiment can not only fully remove impurities and supersaturated cations from the membrane surface, but also has a low water washing cost.
[0027] Preferably, the organic cleaning uses a cleaning solution containing organic polar solvents, which can better remove amorphous impurities and supersaturated cations from the membrane surface.
[0028] In the above embodiments, specifically, the organic solvent may include organic polar solvents and organic nonpolar solvents. The organic polar solvent may include one or more of ethanol, isopropanol and acetonitrile, and the organic nonpolar solvent may include one or more of carbon tetrachloride, dichloroethane, diethyl ether and dimethyl ether.
[0029] In the above embodiments, the number of water washings is at least 1, and the number of organic cleanings is at least 1.
[0030] Besides the easy dissolution of cations on the surface and grain boundaries of zeolite film crystals, the dissolution of cations within the zeolite lattice is also a significant issue. More preferably, the temperature for the first-stage cleaning is 35°C–45°C, and the pH is 5–7. In this embodiment, by controlling the acidity and temperature, cations corresponding to aluminum sites within the lattice can be further dissolved, providing lattice vacancies for cation anchoring and filling in step 2).
[0031] When the first stage of cleaning is water washing, the water washing temperature should be 35℃~45℃, with 40℃ being optimal, which can remove more ions and result in relatively high selectivity of the zeolite membrane; the water washing pH should be 5~7, with 5 being optimal. If the pH is too low, it will easily reduce the selectivity of the zeolite membrane; the water washing time should be 3h~9h, with 6h being optimal; and the number of water washings should be 1 to 3 times, with 2 times being optimal.
[0032] When the first stage of cleaning is organic cleaning, the temperature of organic cleaning is 35℃~45℃, with an optimal temperature of 40℃; the time of organic cleaning is 3h~9h, with an optimal time of 6h; the pH of organic cleaning is 5~7, with an optimal pH of 7; and the number of organic cleaning cycles is 1 to 3, with an optimal number of cycles of 3.
[0033] 2) The zeolite molecular sieve membrane after primary cleaning is subjected to secondary cleaning with a cleaning solution containing cations to obtain a zeolite molecular sieve membrane after secondary cleaning.
[0034] This step uses ion exchange to anchor and fill lattice defects inside the lattice, at grain boundaries, or on the lattice surface caused by the first-stage cleaning with more strongly binding cations, thereby improving the stability of the zeolite lattice and preventing further dissolution of cations inside the zeolite lattice.
[0035] In one specific embodiment, the cation may include K + NH4 + Ca 2+ Mg 2+ Zn 2+ Ce 3+ and La 3+ One or more of the following. Preferably, the cation includes K. + Ce 3+ and La 3+One or more of them, wherein K + It easily anchors at the zeolite lattice interface, effectively sealing lattice cracks or gaps and preventing the dissolution of ions from within the zeolite. (Ce) 3+ and La 3+ It is a high-valence cation, which has a higher binding strength than the ions in zeolite itself, thus improving the stability of zeolite.
[0036] The second-stage cleaning should preferably be performed 1 to 3 times, with 3 times being optimal.
[0037] Preferably, the temperature for the second-stage cleaning is 35℃~45℃, and the pH is 5~7.
[0038] 3) Polish the zeolite molecular sieve membrane after secondary cleaning to obtain a polished zeolite molecular sieve membrane.
[0039] This step mainly focuses on the support of the zeolite molecular sieve membrane, polishing the membrane to increase its surface smoothness and reduce surface defects, thereby preventing surface cracking and increased ion leaching during use.
[0040] In a preferred embodiment, the polishing agent used in the polishing process is a solid salt of the aforementioned cation, and the loss of the cation fixative is minimized during polishing.
[0041] In one specific embodiment, the solid salt of the above-mentioned cation may include one or more of the chloride salt, sulfate salt, nitrate salt, etc. of the above-mentioned cation.
[0042] In one specific embodiment, the polishing temperature is preferably 40℃~60℃, the polishing speed is preferably 60rpm~120rpm, the polishing time is preferably 0.2h~1h, and most preferably 0.5h, and the number of polishing processes is preferably 1 to 3 times, and most preferably 3 times.
[0043] 4) The polished zeolite molecular sieve membrane is subjected to a third-stage cleaning with a cleaning solution to obtain an ultra-low leaching zeolite molecular sieve membrane.
[0044] This step is mainly used to clean and remove impurities such as residual cationic curing agents and polishing agents from the surface, resulting in an ultra-low leaching zeolite molecular sieve membrane. The cleaning solution in this step can be the same as or different from the cleaning solution in step 1) or step 2).
[0045] refer to Figure 1 The present invention also discloses a post-processing device for zeolite molecular sieve membranes, including a container 1, a circulation pipeline and a circulation pump 4. The container 1 is used to contain the cleaning liquid. The inlet and outlet of the circulation pipeline are respectively connected to the container 1. The circulation pump 4 is installed on the circulation pipeline and drives the cleaning liquid to circulate through the circulation pipeline.
[0046] Preferably, container 1 includes a temperature adjustment unit for adjusting the temperature of the cleaning solution inside the container.
[0047] Preferably, the post-processing device for the zeolite molecular sieve membrane further includes a zeolite molecular sieve membrane loading device 2 for loading the zeolite molecular sieve membrane 3. In this specific embodiment, the zeolite molecular sieve membrane loading device 2 is a cage.
[0048] This invention also discloses a method for preparing an electronic-grade solvent, comprising the following steps:
[0049] The zeolite molecular sieve membrane prepared by the above-mentioned post-treatment method of industrial-grade organic solvent is dehydrated and then subjected to ion adsorption treatment with ion adsorption resin in series to obtain electronic-grade solvent.
[0050] The following are specific examples.
[0051] Example 1
[0052] A post-treatment method for zeolite molecular sieve membranes, employing... Figure 1 The apparatus shown performs the following steps:
[0053] 1) Cut the zeolite molecular sieve membrane into multiple 15cm long segments. Prepare 500mL of purified aqueous solution for each segment according to Table 1. The pH is adjusted using a weak acid HAc and a weak base NH3. Place the zeolite molecular sieve membrane in the corresponding aqueous solution and fix it in a cage. Circulate and stir to ensure full contact between the solution and the zeolite membrane. Set the temperature according to Table 1 and remove the membrane after cleaning for the specified time. Rinse the inside and outside of the zeolite membrane with electronic grade ethanol. Then, immerse the zeolite membrane in G3 grade ethanol for 24 hours. Finally, remove the zeolite membrane and perform a pervaporation test to confirm whether the cleaning process affected the membrane. Use ICP-MS to test the ion content of the remaining ethanol solution to confirm the dissolution of the zeolite membrane. Blank membrane tube 1 is prepared by directly immersing the membrane tube in electronic ethanol for 24 hours, followed by pervaporation and ion dissolution tests. Blank membrane tube 2 is prepared by directly performing a pervaporation test without any treatment.
[0054] Table 1
[0055]
[0056]
[0057] As shown in Table 1, with the increase of cleaning temperature, the ion dissolution of zeolite membrane gradually decreases, while the selectivity drops sharply after treatment at 50 degrees Celsius; with the increase of treatment time, the ion dissolution of zeolite membrane first decreases and then remains unchanged, while the selectivity decreases with the increase of treatment time; with the increase of pH, the ion dissolution gradually increases, while the selectivity first increases and then decreases; with the increase of the number of cleaning cycles, the ion dissolution first decreases and then remains unchanged, while the selectivity gradually decreases with the increase of the number of treatment cycles.
[0058] Therefore, water washing reduces zeolite film dissolution, but selectivity will decrease. The optimal conditions for water washing are: treatment temperature of 40 degrees Celsius; pH of 5; treatment time of 6 hours; and treatment frequency of 2 times.
[0059] 2) The zeolite membrane obtained in the optimal embodiment of step 1) was cleaned with ethanol solvent. 500 mL of ethanol was prepared according to Table 2, with the pH adjusted using a weak acid HAc and a weak base NH3. The zeolite membrane was placed in the corresponding ethanol solution and fixed in a cage. The solution and zeolite membrane were brought into full contact through circulation and stirring. The temperature was set according to Table 2. After cleaning for a specific time, the membrane was removed and rinsed thoroughly inside and out with electronic-grade ethanol. Then, the zeolite membrane was immersed in G3-grade ethanol for 24 hours. Finally, the zeolite membrane was removed and subjected to a pervaporation test to confirm whether the cleaning process affected the membrane. The remaining ethanol solution was analyzed for ion content using ICP-MS to confirm zeolite membrane dissolution. Blank membrane tube 1 was directly immersed in electronic ethanol for 24 hours, followed by pervaporation and ion dissolution tests. Blank membrane tube 2 was subjected to a pervaporation test without any treatment.
[0060] Table 2
[0061]
[0062]
[0063] As shown in Table 2, with the increase of cleaning temperature, the ion dissolution of zeolite membrane gradually decreases, while the selectivity remains basically unchanged; with the increase of treatment time, the ion dissolution of zeolite membrane first decreases and then remains unchanged, while the selectivity does not change significantly with the increase of treatment time; with the increase of pH, the ion dissolution gradually decreases and then increases, while the selectivity gradually increases and then remains unchanged; with the increase of the number of cleaning cycles, the ion dissolution first decreases and then remains unchanged, while the selectivity remains unchanged with the increase of the number of treatment cycles.
[0064] Therefore, ethanol cleaning significantly reduces zeolite film dissolution while maintaining almost no selectivity. The optimal conditions for ethanol cleaning are: a treatment temperature of 40 degrees Celsius, a pH of 7, a treatment duration of 6 hours, and 3 treatments.
[0065] 3) The zeolite membranes obtained in the optimal embodiment of step 2) were cleaned with the organic solvents listed in Table 3. 500 ml of the corresponding organic solvent was prepared according to Table 3. The zeolite membranes were placed in the corresponding solutions and fixed in cages. The solution and zeolite membranes were thoroughly contacted through circulation and stirring. The temperature was set according to Table 3. After cleaning for a specific time, the membranes were removed and rinsed thoroughly inside and out with electronic-grade ethanol. Then, the zeolite membranes were immersed in G3-grade ethanol for 24 hours. Finally, the zeolite membranes were removed and subjected to a pervaporation test to confirm whether the cleaning process affected the membranes. The remaining ethanol solution was analyzed using ICP-MS to determine the ion content and confirm the dissolution of the zeolite membranes. Blank membrane tube 1 was directly immersed in electronic ethanol for 24 hours, followed by pervaporation and ion dissolution tests. Blank membrane tube 2 was subjected to a pervaporation test without any treatment.
[0066] Table 3
[0067]
[0068]
[0069] As shown in Table 3, with the increase of cleaning temperature, the ion dissolution of zeolite membrane gradually decreases, while the selectivity remains unchanged; with the increase of treatment time, the ion dissolution of zeolite membrane first decreases and then remains unchanged, while the selectivity does not change significantly with the increase of treatment time; with the increase of pH, the ion dissolution gradually decreases and then increases, while the selectivity gradually increases and then remains unchanged; with the increase of the number of cleaning cycles, the ion dissolution first decreases and then remains unchanged, while the selectivity remains unchanged with the increase of the number of treatment cycles.
[0070] Therefore, isopropanol washing significantly reduces zeolite film dissolution, while the selectivity remains almost unchanged.
[0071] 4) The zeolite membranes obtained in the optimal embodiment of step 3) were cleaned with the solvents listed in Table 4. 500 ml of 0.1 M / L Mx + Clx isopropanol solution was prepared according to Table 4. The zeolite membranes were placed in the corresponding solutions and fixed in cages. The solution and zeolite membranes were thoroughly contacted by circulating and stirring. The temperature was set according to the table. After cleaning for a specific time, the membranes were removed and rinsed thoroughly inside and out with electronic-grade isopropanol. The membranes were then rinsed three times in 500 ml of 40°C electronic-grade isopropanol, each time for 6 hours. The membranes were then rinsed thoroughly again with electronic-grade isopropanol and then soaked in G3-grade ethanol for 24 hours. Finally, the zeolite membranes were removed and subjected to a pervaporation test to confirm whether the cleaning process affected the membranes. The remaining ethanol solution was tested for ion content using ICP-MS to confirm the dissolution of the zeolite membrane. Blank membrane tube 1 is prepared by directly immersing the membrane tube in electronic ethanol for 24 hours, followed by pervaporation and ion dissolution tests; blank membrane tube 2 is prepared by directly performing pervaporation tests on the membrane tube without any treatment.
[0072] Table 4
[0073]
[0074]
[0075] As can be seen from Table 4, with the increase of the valence state of the cleaning cations, the ion dissolution of the zeolite membrane first gradually increases and then decreases, while the selectivity remains basically unchanged. Compared with Table 3, the effect of cleaning alone is better.
[0076] Therefore, ion exchange combined with solvent cleaning can significantly reduce ion dissolution, with high-valence metal ion exchange having a better dissolution inhibition effect.
[0077] 5) Use Ce in step 4) 3+ The zeolite membranes obtained from the auxiliary cleaning were polished using the parameters in Table 5. First, cerium chloride powder was dried at 120℃, then adjusted to the target temperature. Motors were connected to both ends of the membrane tube, and solid-phase ion exchange was performed in the cerium chloride powder at a certain rotation speed, with polishing occurring under the action of cerium chloride. After a period of time, the zeolite membrane was rinsed clean inside and out with electronic-grade isopropanol. Then, the zeolite membrane was rinsed three times in 500 mL of 40℃ electronic-grade isopropanol, each time for 6 hours. Next, the zeolite membrane was rinsed clean inside and out with electronic-grade isopropanol, then soaked in G3 grade ethanol for 24 hours. Finally, the zeolite membrane was removed and subjected to a pervaporation test to confirm whether the cleaning process affected the membrane. The remaining ethanol solution was analyzed for ion content using ICP-MS to confirm zeolite membrane dissolution. Blank membrane tube 1 was directly soaked in electronic ethanol for 24 hours, followed by pervaporation and ion dissolution tests. Blank membrane tube 2 was subjected to a pervaporation test without any treatment.
[0078] Table 5
[0079]
[0080]
[0081] As can be seen from Table 5, with the increase of polishing temperature, the ion dissolution of the zeolite film gradually decreases, and the selectivity also decreases slightly; with the increase or decrease of rotation speed, the ion dissolution first decreases and then remains unchanged, while the selectivity gradually decreases with the increase of rotation speed; with the increase of the number of treatments, the ion dissolution first decreases and then remains unchanged, while the selectivity of the zeolite film gradually decreases.
[0082] Therefore, CeCl3 polishing can significantly reduce the dissolution of ions from zeolite films.
[0083] The embodiments described above are merely illustrative of several implementations of the present invention, and while the descriptions are specific and detailed, they should not be construed as limiting the scope of the patent application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the scope of protection of the present invention. Therefore, the scope of protection of this patent should be determined by the appended claims.
Claims
1. A post-processing method for zeolite molecular sieve membranes, characterized in that, Includes the following processes: The zeolite molecular sieve membrane was first-stage cleaned with a cleaning solution to obtain the first-stage cleaned zeolite molecular sieve membrane. The zeolite molecular sieve membrane after primary cleaning is subjected to secondary cleaning with the cleaning solution, and cations are added to the cleaning solution to obtain a zeolite molecular sieve membrane after secondary cleaning. The zeolite molecular sieve membrane after the secondary cleaning is polished to obtain a polished zeolite molecular sieve membrane. The polished zeolite molecular sieve membrane is subjected to a third-stage cleaning with the cleaning solution to obtain an ultra-low leaching zeolite molecular sieve membrane.
2. The post-processing method for zeolite molecular sieve membranes according to claim 1, characterized in that, The temperature of the first-stage cleaning is 35℃~45℃, and the pH is 5~7; The temperature for the second-stage cleaning is 35℃~45℃, and the pH is 5~7.
3. The post-processing method for zeolite molecular sieve membranes according to claim 1 or 2, characterized in that, In the first-stage cleaning process, the zeolite molecular sieve membrane is first washed with pure water, and then organically cleaned with a cleaning solution containing organic solvents to obtain the zeolite molecular sieve membrane after the first-stage cleaning.
4. The post-processing method for the zeolite molecular sieve membrane according to claim 3, characterized in that, The organic solvent includes one or more of ethanol, isopropanol, acetonitrile, carbon tetrachloride, dichloroethane, diethyl ether, and dimethyl ether.
5. The post-processing method for the zeolite molecular sieve membrane according to claim 3, characterized in that, The water washing temperature is 35℃~45℃, the water washing pH is 5~7, the water washing time is 3h~9h, and the water washing is repeated 1 to 3 times. The temperature of the organic cleaning is 35℃~45℃, the time of the organic cleaning is 3h~9h, the pH of the organic cleaning is 5~7, and the number of organic cleaning cycles is 1 to 3.
6. The post-processing method for the zeolite molecular sieve membrane according to claim 1, characterized in that, The cation includes K + NH4 + Ca 2+ Mg 2+ Zn 2+ Ce 3+ and La 3+ One or more of them.
7. The post-processing method for zeolite molecular sieve membranes according to claim 1, characterized in that, The polishing agent used in the polishing process is a solid salt of the cation.
8. The post-treatment method for zeolite molecular sieve membranes according to claim 1 or 7, characterized in that, The polishing temperature is 40℃~60℃, the polishing speed is 60rpm~120rpm, the polishing time is 0.2h~1h, and the polishing is performed 1 to 3 times.
9. A post-processing device for zeolite molecular sieve membranes, characterized in that, The device includes a container, a circulation pipeline, and a circulation pump. The container is used to hold cleaning fluid. The inlet and outlet of the circulation pipeline are respectively connected to the container. The circulation pump is installed on the circulation pipeline and drives the cleaning fluid to circulate through the circulation pipeline.
10. A method for preparing an electronic-grade solvent, characterized in that, Includes the following processes: The zeolite molecular sieve membrane prepared by the post-treatment method of the zeolite molecular sieve membrane as described in any one of claims 1 to 8 is dehydrated and then subjected to ion adsorption treatment with a series ion adsorption resin to obtain the electronic grade solvent.