A chemical solution preparation system for cleaning a semiconductor wafer

Abstract

The application discloses a chemical liquid preparation system for semiconductor wafer cleaning and relates to the technical field of chemical experimental supplies. The chemical liquid preparation system comprises an original liquid storage area, a proportioning and stirring area and a chemical liquid storage tank area. Nitrogen is communicated with the original liquid storage area and the chemical liquid storage tank area through nitrogen pipelines. The original liquid storage area is connected with the proportioning and stirring area through a quantitative peristaltic pump. The proportioning and stirring area is connected with ultrapure water through a water inlet pipeline. The proportioning and stirring area is connected with the chemical liquid storage tank area through a chemical liquid pipeline. The chemical liquid storage tank area is connected with a nitrogen unloading valve through a nitrogen pipeline. The application can store chemical high-concentration original liquid with different proportions in advance by using nitrogen sealing method, realizes rapid preparation of small batches of chemical liquid, adjusts the temperature in the storage tank to the required temperature, and takes the chemical liquid as required during production.

Description

Technical Field

[0001] This invention relates to the field of chemical laboratory supplies technology, specifically to a chemical solution preparation system for semiconductor wafer cleaning. Background Technology

[0002] Semiconductor wafer manufacturing plants require a variety of chemicals for different processes. These chemicals are formulated into specific solutions in certain proportions and then applied in the production process.

[0003] Currently, the commonly used method for preparing chemical solutions is manual. Different quantities of various chemicals are measured using measuring tools, placed sequentially into clean containers of a specific volume, and then water is added according to a specific ratio. The mixture is then stirred and set aside. However, each chemical solution preparation requires measuring multiple different chemicals, leading to variations in operation between different employees. Even a single operational error can affect the quality of the processed wafers. Furthermore, the composition of the prepared chemical solution changes over time, limiting the batch size that can be prepared. Current manual chemical solution preparation consumes significant manpower and carries the risk of skin injury from corrosive chemicals splashing. Moreover, specific temperature requirements exist for the chemical solutions during production. After being added to the production station, the solutions need to be heated or cooled before use, a slow process that reduces production efficiency. Therefore, there is an urgent need for a chemical solution preparation system for semiconductor wafer cleaning to address these issues. Summary of the Invention

[0004] In view of this, the present invention provides a chemical solution preparation system for semiconductor wafer cleaning, which can store pre-prepared high-concentration stock solutions of chemicals in different proportions using a nitrogen-sealing method to achieve rapid preparation of small batches of chemical solutions, and adjust the temperature in the storage tank to the required operating temperature, so that the solutions can be taken out as needed during production.

[0005] To achieve the above objectives, the present invention adopts the following technical solution: A chemical solution preparation system for semiconductor wafer cleaning includes: a stock solution storage area, a mixing and stirring area, and a chemical solution storage tank area. Both the stock solution storage area and the chemical solution storage tank area are connected to nitrogen gas through nitrogen pipelines. The stock solution storage area is connected to the mixing and stirring area through a metering peristaltic pump. The mixing and stirring area is connected to ultrapure water through a water inlet pipeline. The mixing and stirring area is connected to the chemical solution storage tank area through a chemical solution pipeline. The chemical solution storage tank area is connected to a nitrogen discharge valve through a nitrogen pipeline.

[0006] Furthermore, the stock solution storage area includes multiple stock solution storage tanks, each with an inlet at the top. All stock solution storage tanks are connected to nitrogen gas via nitrogen pipelines, and each stock solution storage tank is connected to a metering peristaltic pump via a drug solution pipeline. The metering peristaltic pump is connected to a mixing zone pipeline, and a valve is installed on the nitrogen pipeline.

[0007] Furthermore, the mixing zone includes a mixing tank and a mixing device. The mixing tank is equipped with a mixing device. The top of the mixing tank has a water inlet connected to an inlet pipe. The bottom of the mixing tank has a liquid outlet. The mixing tank is connected to a metering peristaltic pump through a pipe. The liquid outlet is connected to the drug storage tank area through a drug pipe.

[0008] Furthermore, valves are installed on both the water inlet pipe and the liquid outlet pipe.

[0009] Furthermore, the liquid medicine storage tank area includes a storage tank and a temperature control device. The storage tank is equipped with a temperature control device inside. The top of the storage tank is provided with a nitrogen inlet and a nitrogen outlet, and the bottom of the storage tank is provided with a liquid medicine outlet. The nitrogen inlet is connected to nitrogen through a nitrogen pipeline, the nitrogen outlet is connected to a nitrogen unloading valve through a nitrogen pipeline, and the liquid medicine outlet is connected to a liquid medicine pipeline.

[0010] Furthermore, a valve is installed on the liquid outlet pipeline, a valve is installed on the nitrogen inlet pipeline, and a valve is installed on the nitrogen outlet pipeline.

[0011] Furthermore, the temperature control device uses a Teflon coil, which is coiled inside the storage tank. One end of the Teflon coil is a cold water inlet, and the other end is a cold water outlet. Valves are installed at both the cold water inlet and the cold water outlet.

[0012] The beneficial effects of this invention are as follows: 1. Prepare a high-concentration stock solution in advance and verify it through chemical analysis to ensure the correct ratio, instead of adding multiple chemicals according to the ratio during the preparation process. This reduces the probability and chance of errors in the chemical solution preparation ratio, which can improve product quality to a certain extent.

[0013] 2. The preparation of chemical solutions is simple, reducing labor costs and the temperature adjustment time after the chemical solutions enter the production line, thus improving production efficiency. Attached Figure Description

[0014] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the provided drawings without creative effort.

[0015] Figure 1 This is a schematic diagram of the overall structure of the present invention; In the figure: 1-Stock solution storage tank; 2-Quantitative peristaltic pump; 3-Ultrapure water; 4-Nitrogen; 5-Stirring device; 6-Preparation tank; 7-Nitrogen inlet; 8-Nitrogen outlet; 9-Drug solution outlet; 10-Cold water inlet; 11-Cold water outlet; 12-Storage tank; 13-Teflon coil. Detailed Implementation

[0016] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0017] Please see the appendix Figure 1 This invention provides a chemical solution preparation system for semiconductor wafer cleaning, comprising: a stock solution storage area, a mixing and stirring area, and a chemical solution storage tank area. Both the stock solution storage area and the chemical solution storage tank area are connected to nitrogen gas 4 via nitrogen pipelines. The stock solution storage area is connected to the mixing and stirring area via a metering peristaltic pump 2. The mixing and stirring area is connected to ultrapure water 3 via a water inlet pipeline. The mixing and stirring area is connected to the chemical solution storage tank area via a chemical solution pipeline. The chemical solution storage tank area is connected to a nitrogen discharge valve via a nitrogen pipeline. The metering peristaltic pump 2 is a multi-head peristaltic pump with a volume resolution of 0.01 ml, designed for precise control of the chemical dosage.

[0018] Preferably, the stock solution storage area includes multiple stock solution storage tanks 1, each with an inlet at its top. All tanks 1 are connected to nitrogen gas 4 via nitrogen pipelines, and each tank 1 is connected to a metering peristaltic pump 2 via a drug solution pipeline. The metering peristaltic pump 2 is connected to a mixing zone pipeline, and a valve is installed on the nitrogen pipeline. The stock solution storage tanks 1 are made of glass or quartz, with a capacity of 20L-50L, and are sealed to isolate them from the outside air. The nitrogen gas 4 connected via the nitrogen pipelines can control the nitrogen gas 4 pressure within the stock solution storage tanks 1 to be 800Pa-1200Pa.

[0019] Preferably, the mixing zone includes a mixing tank 6 and a mixing device 5. The mixing tank 6 is equipped with the mixing device 5. The top of the mixing tank 6 has a water inlet connected to a water inlet pipe. The bottom of the mixing tank 6 has a liquid outlet. The mixing tank 6 is connected to the metering peristaltic pump 2 through a pipe. The liquid outlet is connected to the drug storage tank area through a drug pipeline.

[0020] Preferably, valves are installed on both the water inlet pipe and the liquid outlet pipe.

[0021] Preferably, the liquid medicine storage tank area includes a storage tank 12 and a temperature control device. The storage tank 12 is equipped with a temperature control device. The top of the storage tank 12 is provided with a nitrogen inlet 7 and a nitrogen outlet 8. The bottom of the storage tank 12 is provided with a liquid medicine outlet 9. The nitrogen inlet 7 is connected to nitrogen 4 through a nitrogen pipeline. The nitrogen outlet 8 is connected to a nitrogen unloading valve through a nitrogen pipeline. The liquid medicine outlet 9 is connected to a liquid medicine pipeline.

[0022] Preferably, a valve is installed on the liquid outlet 9, the nitrogen inlet 7, and the nitrogen outlet 8. This allows the nitrogen 4 pressure in the storage tank 12 to be controlled between 800 Pa and 1200 Pa. When the pressure in the storage tank 12 exceeds 1200 Pa, the nitrogen release valve opens, allowing excess nitrogen 4 to be released.

[0023] Preferably, the temperature control device uses a Teflon coil 13, which is coiled inside the storage tank 12. One end of the Teflon coil 13 is a cold water inlet 10, and the other end is a cold water outlet 11. Valves are installed at both the cold water inlet 10 and the cold water outlet 11. Cold water at 6-7 degrees Celsius flows through the Teflon coil 13 to cool the chemical solution in the storage tank 12. The flow rate of the cold water in the Teflon coil 13 is adjusted by a temperature controller according to the temperature of the chemical solution in the storage tank 12, thereby adjusting the temperature of the chemical solution in the storage tank to the target temperature.

[0024] All pipelines in this invention are made of Teflon tubing.

[0025] First, the pre-prepared high-concentration stock solution is placed into the stock solution storage tank 1. To prevent errors in the preparation of the stock solution, chemical analysis and other measures can be taken to check and verify the prepared stock solution.

[0026] Secondly, when chemical solutions are needed, the raw solution is pumped from the raw solution storage tank 1 to the preparation tank 6 using a quantitative peristaltic pump 2 according to the dosage. Then, a certain amount of ultrapure water 3 is injected into the preparation tank according to the ratio. The chemical solution, which is stirred evenly by the stirring device 5, flows into the storage tank 12. The temperature of the solution in the storage tank 12 is adjusted by the coil heat exchange method. Once the target temperature is reached, it can be used.

[0027] To prevent the raw material storage tank 1 and the prepared chemical solution from evaporating or oxidizing during prolonged storage in storage tank 12, thus causing changes in composition, both raw material storage tank 1 and storage tank 12 are nitrogen-sealed. When the pressure inside storage tank 12 exceeds 1200 Pa, excess nitrogen gas 4 can be released by opening the nitrogen release valve.

[0028] This invention has been used in production and meets production requirements. It has been verified that it can save 180 man-hours per month, and by reducing the waiting time for adjusting the liquid temperature on the production line, it can increase production efficiency by 10.4%.

[0029] The above embodiments are only used to illustrate the technical solutions of the present invention, and are not intended to limit the scope of protection of the invention. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on these embodiments, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention. Although the present invention has been described in detail with reference to the above embodiments, those skilled in the art can still combine, add, delete, or otherwise adjust the features of the various embodiments of the present invention according to the circumstances without conflict or creative effort, thereby obtaining different technical solutions that do not fundamentally depart from the concept of the present invention. These technical solutions also fall within the scope of protection of the present invention.

Claims

1. A chemical solution preparation system for cleaning semiconductor wafers, characterized in that, include: The system includes a raw material storage area, a mixing and stirring area, and a drug storage tank area. Both the raw material storage area and the drug storage tank area are connected to nitrogen gas via nitrogen pipelines (4). The raw material storage area is connected to the mixing and stirring area via a metering peristaltic pump (2). The mixing and stirring area is connected to ultrapure water via a water inlet pipeline (3). The mixing and stirring area is connected to the drug storage tank area via a drug pipeline. The drug storage tank area is connected to a nitrogen unloading valve via a nitrogen pipeline.

2. The chemical solution preparation system for semiconductor wafer cleaning according to claim 1, characterized in that, The raw material storage area includes multiple raw material storage tanks (1). Each raw material storage tank (1) has a liquid inlet at its top. Each raw material storage tank (1) is connected to nitrogen gas (4) through a nitrogen pipeline. Each raw material storage tank (1) is connected to a quantitative peristaltic pump (2) through a drug liquid pipeline. The quantitative peristaltic pump (2) is connected to a mixing zone pipeline. A valve is installed on the nitrogen pipeline.

3. The chemical solution preparation system for semiconductor wafer cleaning according to claim 1, characterized in that, The mixing zone includes a mixing tank (6) and a mixing device (5). The mixing tank (6) is equipped with a mixing device (5). The top of the mixing tank (6) has a water inlet connected to a water inlet pipe. The bottom of the mixing tank (6) has a liquid outlet. The mixing tank (6) is connected to a quantitative peristaltic pump (2) through a pipe. The liquid outlet is connected to the liquid storage tank area through a liquid pipe.

4. The chemical solution preparation system for semiconductor wafer cleaning according to claim 3, characterized in that, Valves are installed on both the inlet pipe and the outlet pipe.

5. The chemical solution preparation system for semiconductor wafer cleaning according to claim 1, characterized in that, The liquid medicine storage tank area includes a storage tank (12) and a temperature control device. The storage tank (12) is equipped with a temperature control device. The top of the storage tank (12) is provided with a nitrogen inlet (7) and a nitrogen outlet (8). The bottom of the storage tank (12) is provided with a liquid medicine outlet (9). The nitrogen inlet (7) is connected to nitrogen (4) through a nitrogen pipeline. The nitrogen outlet (8) is connected to a nitrogen unloading valve through a nitrogen pipeline. The liquid medicine outlet (9) is connected to a liquid medicine pipeline.

6. The chemical solution preparation system for semiconductor wafer cleaning according to claim 5, characterized in that, A valve is installed on the liquid outlet (9) of the liquid, a valve is installed on the nitrogen inlet (7) of the nitrogen, and a valve is installed on the nitrogen outlet (8) of the nitrogen.

7. The chemical solution preparation system for semiconductor wafer cleaning according to claim 5, characterized in that, The temperature control device uses a Teflon coil (13), which is coiled inside the storage tank (12). One end of the Teflon coil (13) is a cold water inlet (10), and the other end is a cold water outlet (11). Valves are provided at both the cold water inlet (10) and the cold water outlet (11).

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