A quartz cavity piece coated with silicon carbide with a gas distribution structure and process

Abstract

The application belongs to the technical field of plating and discloses a quartz cavity part silicon carbide plating equipment and process with a gas distribution structure, which comprises a sealed cavity assembly and a quartz cavity part. The sealed cavity assembly is internally and sealingly rotatably provided with a carbon plating turntable assembly which is displaced between multiple stations. The carbon plating turntable assembly is internally and fixedly provided with a carbon plating heating and carbon plating ring gas supply gas distribution disc assembly. The gas distribution disc assembly is peripherally provided with multiple sets of claw assemblies. The carbon plating turntable assembly is provided with multiple station grooves. Each station groove corresponds to a different carbon plating processing procedure. Each process station is independent and separated, and is closed. Through this structure, integrated process treatment of multiple process stations is realized, secondary pollution is avoided, and the integrated equipment reduces process circulation time. The multiple sets of claw assemblies alternately and multi-pointly clamp the quartz cavity part, so that the quartz cavity part forms a carbon plating structure without leakage points in the carbon plating turntable assembly, avoiding shielding and resulting in carbon plating leakage due to continuous contact at the same position.

Description

Technical Field

[0001] This invention belongs to the field of coating technology, specifically relating to a silicon carbide coating equipment and process for a quartz cavity component with a gas distribution structure. Background Technology

[0002] Quartz cavity components occupy a core position in semiconductor coating equipment, photovoltaic cell annealing furnace tubes, and high-precision optical instrument cavities due to their excellent optical transmittance, high-temperature deformation resistance, and low coefficient of expansion. However, under high-density plasma bombardment containing active groups such as fluorine and chlorine groups or thermal cycling at thousands of degrees Celsius, the silicon-oxygen network structure on the quartz surface is prone to bond breakage and rearrangement, leading to surface roughening and even the initiation of microcracks. This not only pollutes the process environment but also significantly shortens the service life of the components. Silicon carbide thin films, due to their similar coefficient of thermal expansion to quartz as well as their extremely high hardness and chemical inertness, have become the preferred material for surface protection and modification of quartz components.

[0003] An examination of existing silicon carbide coating equipment for quartz-based components reveals the following technical shortcomings in terms of structural design and process execution:

[0004] On the one hand, the fragmentation of the process path is a prominent problem. The preparation of a complete silicon carbide coating requires multiple physical and chemical processes in series, such as substrate pretreatment, transition layer deposition, main layer growth and passivation cooling. Existing solutions mostly use discrete single-cavity equipment, and the workpiece needs to be repeatedly loaded, unloaded and transferred between different functional chambers. During this process, the highly active surface is exposed to an uncontrolled environment, which easily adsorbs water, oxygen and particulate pollutants in the environment, forming a weak interface layer, which leads to a decrease in the adhesion of subsequent coatings or the generation of pinhole defects.

[0005] On the other hand, the spatial distribution control capability of the reaction precursor is insufficient. Quartz cavity components usually have geometric features of being open at one end and hollow inside. The deposition conditions on their inner and outer surfaces are significantly different. Currently, most equipment has a relatively crude gas feeding method and lacks differentiated airflow organization design for the inner and outer walls of the workpiece. After the reaction gas enters the chamber, it tends to be preferentially enriched in the outer space of the workpiece, while the inner wall of the deep cavity is in a state of reactant scarcity due to the long gas transport path and slow renewal rate. This "concentrated outside and dilute inside" concentration field distribution directly leads to insufficient coating thickness and poor crystal quality on the inner wall, which cannot form an effective protective barrier and restricts the improvement of the overall coating quality.

[0006] In addition, the shielding effect introduced by the existing workpiece fixing method cannot be ignored. In order to maintain the workpiece posture, conventional fixtures usually need to continuously contact specific areas of the workpiece. These contact points are mechanically blocked, making it impossible to achieve film deposition, forming through-coating defects, which become channels for the preferential invasion of corrosive media.

[0007] In summary, developing an integrated equipment and supporting process for silicon carbide plating of quartz cavity components that can achieve seamless multi-process integration, has the ability to distribute gas evenly on the inner and outer walls, and can eliminate clamping and shielding defects, is of great engineering value for improving the durability of quartz core components. Summary of the Invention

[0008] To address the problems mentioned in the background section, this invention provides a silicon carbide plating equipment and process for quartz cavity components with a gas distribution structure, featuring a fully closed-loop process.

[0009] To achieve the above objectives, the present invention provides the following technical solution: a silicon carbide plating device for a quartz cavity component with a gas distribution structure, comprising a sealed cavity assembly and a quartz cavity component. The sealed cavity assembly contains a rotating silicon carbide plating turntable assembly that can be repositioned between multiple workstations. The turntable assembly contains a fixed gas distribution plate assembly for silicon carbide plating heating and gas supply. The gas distribution plate assembly has multiple sets of claw assemblies around its edge, which clamp and fix the quartz cavity component at multiple points. A cam drive assembly is located between the multiple sets of claw assemblies. When the cam drive assembly rotates, it synchronously abuts against multiple sets of jaw assemblies, causing the multiple sets of jaw assemblies to alternately clamp and fix the quartz cavity component at multiple points. Through the alternating multi-point clamping of the quartz cavity component by the multiple sets of jaw assemblies, the quartz cavity component forms a leak-free carbon-plated structure within the carbon-plated turntable assembly. The cam drive assembly is internally equipped with an unlocking mechanism assembly. Through the outward expansion compensation of the concave wheel body at the edge of the cam drive assembly by the unlocking mechanism assembly, the multiple sets of jaw assemblies form a synchronous release and release ring clamping structure for the quartz cavity component.

[0010] In a preferred embodiment of a silicon carbide plating device for a quartz cavity component with a gas distribution structure, the sealing cavity assembly includes a sealing cavity, the top of which has a loading and unloading port, and an L-shaped bracket is fixedly mounted on one side of the sealing cavity. A stepper motor is fixedly mounted on the top of the L-shaped bracket, a dial is mounted on the output shaft of the stepper motor, a lever arm is fixedly mounted on the dial, and a pin is fixedly mounted on the lever arm.

[0011] In a preferred embodiment of a silicon carbide plating device for a quartz cavity component with a gas distribution structure, the silicon carbide plating turntable assembly includes a turntable shaft rotatably mounted on a sealed cavity. One end of the turntable shaft is fixedly mounted with a circular turntable rotating within the sealed cavity, and the other end of the turntable shaft is fixedly mounted with an indexing wheel rotating on one side of a dial. The indexing wheel has straight guide grooves and arc guide grooves. The circular turntable has multiple workstation grooves for silicon carbide plating. Sealing grooves are formed on both sides of each workstation groove. A sealing turntable is rotatably mounted within the sealing turntable. A plasma generator is fixedly mounted within the sealing turntable. A first drive motor is fixedly mounted at the end of the circular turntable away from the indexing wheel to drive the sealing turntable to rotate within the sealing groove.

[0012] In a preferred embodiment of a silicon carbide plating equipment for a quartz cavity component with a gas distribution structure, the gas distribution plate assembly includes an isolation plate fixedly disposed in the middle of the inner wall of the work station slot. The isolation plate is provided with multiple gas distribution pipes, a first gas distribution pipe, and a heating element. The gas distribution pipes are provided with jet nozzles for supplying gas into the work station slot. An air inlet connector that penetrates a circular turntable is fixedly disposed at the bottom of the gas distribution pipe. One end of the first gas distribution pipe also penetrates the outer side of the circular turntable. A second drive motor is fixedly disposed at the bottom of the isolation plate, and a drive gear is disposed on the output shaft of the second drive motor.

[0013] Multiple air distribution pipes are arranged around the edge of the isolation plate, and an air distribution pipe is also provided in the center of the isolation plate.

[0014] In a preferred embodiment of a silicon carbide plating device for a quartz cavity component with a gas distribution structure, the jaw assembly includes a jaw base. A first jaw gear and a second jaw gear, meshing with each other, are rotatably mounted on the top of the bottom of the jaw base. Jaw arms are fixedly mounted on both the first and second jaw gears, and clamping heads are fixedly mounted at the ends of both jaw arms. A guide groove is provided at the front end of the jaw base. A horizontal push rod is slidably mounted through the bottom of the jaw base. A roller and a push plate are fixedly mounted on the horizontal push rod. A return spring, sleeved outside the horizontal push rod, is fixedly mounted on one side of the push plate. A transmission gear meshing with the second jaw gear is fixedly mounted on the top of the push plate. The push plate is pushed by the return spring, causing the transmission gear to drive the second jaw gear to rotate counterclockwise. At this time, the two clamping heads on the first and second jaw gears are in a structure that clamps the protruding edge of the quartz cavity component.

[0015] In a preferred embodiment of a silicon carbide plating apparatus for a quartz cavity with a gas distribution structure, the cam drive assembly includes a camshaft rotatably mounted on an isolation disk, a driven gear fixedly mounted on the camshaft to mesh with a driving gear, a cam disk fixedly mounted on the top of the camshaft to abut against a roller, a cam groove formed on the edge of the cam disk, a cam slide groove formed within the cam groove, a top cover fixedly mounted on the top of the cam disk, a push rack linearly slidably mounted inside the top cover, a compression spring and a magnet fixedly mounted at both ends of the push rack, and an electromagnetic coil facing the magnet fixedly mounted on the inner wall of the top cover. The iron, through the push of the compression spring against the rack, the magnet moves closer to the electromagnet, through the push of the push plate by the return spring, the roller abuts against the edge wheel of the cam disk, through the rotation of the cam disk, in conjunction with the roller rolling against the cam groove and the edge wheel of the cam disk, so that the transmission gear slides laterally back and forth at the bottom of the chuck seat. At this time, the two clamping heads on the second chuck gear and the first chuck gear are in the structure of clamping and releasing the quartz cavity component. Multiple sets of the chuck assembly fixing rings are set around the cam drive assembly. At this time, the bottom of the chuck seat is fixedly connected to the bottom of the isolation disk.

[0016] In a preferred embodiment of a silicon carbide plating apparatus for a quartz cavity with a gas distribution structure, the unlocking mechanism assembly includes an unlocking shaft rotatably disposed inside a cam disk. An unlocking cam is fixedly disposed on the unlocking shaft, and an unlocking gear meshing with a push rack is fixedly disposed at the top of the unlocking shaft. The unlocking cam has multiple arc-shaped guide grooves, and a lever is inserted into each arc-shaped guide groove. An unlocking slider that slides linearly within the cam disk is disposed at the bottom of the lever. A T-shaped guide rail is disposed at the bottom of the unlocking slider, and a groove matching the T-shaped guide rail is disposed at the bottom of the cam disk. When the unlocking mechanism assembly rotates within the cam drive assembly, the unlocking slider slides linearly within the cam groove via the cam slide groove. The unlocking cam moves multiple unlocking sliders via multiple arc-shaped guide grooves and multiple levers, causing the multiple unlocking sliders to simultaneously extend outward within the multiple cam slide grooves and fill the grooves of the cam grooves. When the multiple unlocking sliders simultaneously fill the cam grooves at the edge of the cam disk, the unlocking sliders push the horizontal push rod backward via rollers. At this time, the two clamping heads on the multiple sets of claw assemblies are simultaneously in a structure that releases the clamping of the quartz cavity component.

[0017] In a preferred embodiment of a silicon carbide plating equipment for quartz cavity components with a gas distribution structure, the dial drives the circular turntable at a fixed angle through a pin on the dial arm and a straight guide groove. The closed rotation of the circular turntable within the sealed cavity ensures that multiple workstations on the turntable are in a closed carbon plating state. The carbon plating processes in these workstations are different. Different gas sources for each carbon plating process are delivered to each workstation through the air inlet connector and air distribution pipe. The workstation directly opposite the loading / unloading port is the loading / unloading station for the quartz cavity component. As the circular turntable rotates within the sealed cavity, the other workstations on the turntable are in a closed, non-interfering state. The functions of these multiple workstations are: an argon plasma cleaning station for the surface of the quartz cavity component, an oxygen plasma surface activation station, a first carbon plating deposition station, a second carbon plating deposition station, and an inert gas cooling station.

[0018] In a preferred embodiment of a silicon carbide plating apparatus for a quartz cavity component with a gas distribution structure, the rotation of the cam drive assembly drives two clamping heads on multiple sets of jaw assemblies to alternately clamp and fix the bottom of the quartz cavity component at multiple points. The alternating multi-point clamping avoids incomplete plating caused by shielding when the two clamping heads clamp the quartz cavity component.

[0019] A process for depositing silicon carbide onto a quartz cavity component with a gas distribution structure includes the following steps:

[0020] S1. The quartz cavity component is placed in the work station slot through the loading and unloading port. The quartz cavity component is fixed in the work station slot by multiple sets of claw assemblies. The circular turntable rotates in the sealed cavity with a sealed and fixed angle gap, so that the work station slot is sealed and gap-changing between the argon plasma cleaning work station, the oxygen plasma surface activation work station, the first carbon deposition work station, the second carbon deposition work station and the inert gas cooling work station.

[0021] S2. When the workstation changes position, different gases from outside each workstation are sent into the corresponding workstation slot through the air inlet connector. After the quartz cavity component is placed in place, multiple air distribution pipes form a ring-shaped gas distribution structure around the quartz cavity component. The air distribution pipe in the center of the isolation plate is inserted into the quartz cavity component, forming an inner wall gas distribution structure inside the quartz cavity component. Through the above structure, there is sufficient gas distribution on both the outer and inner walls of the quartz cavity component, avoiding differences in plating quality between the inner and outer walls of the quartz cavity component during plating.

[0022] S3, the argon plasma cleaning station performs pre-treatment cleaning of the quartz cavity component surface, the oxygen plasma surface activation station performs activation of the quartz cavity component surface, the first carbon deposition station and the second carbon deposition station perform carbon deposition processing at different temperatures, and the inert gas cooling station performs cooling of the quartz cavity component after carbon deposition.

[0023] Compared with the prior art, the beneficial effects of the present invention are:

[0024] 1. The sealing cavity assembly of the present invention is internally sealed and rotatably equipped with a carbon plating turntable assembly that can be moved between multiple workstations. The carbon plating turntable assembly has multiple workstation slots, each workstation slot corresponding to a different carbon plating process. Each process workstation is independent and separate, and is also sealed. Through this structure, integrated process processing of multiple process workstations can be achieved, avoiding secondary pollution. At the same time, the integrated equipment reduces process flow time and lowers production costs.

[0025] 2. This invention rotates the side of the sealed turntable with the plasma generator to the inner side of the sealed turntable groove, thereby achieving airtight protection of the plasma generator and greatly ensuring the safety of the plasma generator during use.

[0026] 3. This invention uses a claw assembly to clamp and fix the quartz cavity component at multiple points. A cam drive assembly is provided in the middle of the multiple claw assemblies. When the cam drive assembly rotates, it synchronously abuts against the multiple claw assemblies, so that the multiple claw assemblies alternately clamp and fix the quartz cavity component at multiple points. Through the alternating multi-point clamping of the quartz cavity component by the multiple claw assemblies, the quartz cavity component forms a carbon plating structure without leaks in the carbon plating turntable assembly, avoiding the blockage caused by continuous contact at the same position, which would lead to incomplete plating.

[0027] 4. The cam drive assembly of the present invention is internally equipped with an unlocking mechanism assembly. The unlocking mechanism assembly compensates for the outward expansion of the concave wheel body at the edge of the cam drive assembly, so that multiple sets of claw assemblies form a synchronous release ring clamping structure for the quartz cavity component. When multiple unlocking sliders synchronously fill the cam groove at the edge of the cam disk, the unlocking slider pushes the horizontal push rod backward through the roller. At this time, the two clamping heads on the multiple sets of claw assemblies are synchronously in a release clamping structure for the quartz cavity component, realizing the compensation change of the clamping state of the multiple sets of claw assemblies for the quartz cavity component, thereby facilitating the loading or unloading of the quartz cavity component during carbon plating. Attached Figure Description

[0028] Figure 1 This is a perspective view of the present invention;

[0029] Figure 2 This is a perspective view of the internal components of the sealing cavity assembly of the present invention;

[0030] Figure 3 This is a perspective view of the claw assembly, cam drive assembly, and unlocking mechanism assembly of the present invention;

[0031] Figure 4 This is a perspective view of the sealing cavity assembly of the present invention;

[0032] Figure 5 This is a perspective view of the carbon-plated turntable assembly of the present invention;

[0033] Figure 6 This is a perspective view of the air distribution plate assembly of the present invention;

[0034] Figure 7 This is a cross-sectional view of the claw assembly of the present invention;

[0035] Figure 8 This is a cross-sectional view of the cam drive assembly of the present invention;

[0036] Figure 9 This is a perspective view of the unlocking mechanism components of the present invention.

[0037] Explanation of reference numerals in the attached drawings: 100, Sealing cavity assembly; 101, Sealing cavity body; 102, Dial; 103, Stepper motor; 104, Dial arm; 105, Dial pin; 106, L-shaped bracket; 107, Loading / unloading port; 200, Carbon-plated turntable assembly; 201, Turntable shaft; 202, Indexing wheel; 203, Straight guide groove; 204, Arc guide groove; 205, Circular turntable; 206, Station slot; 207, First drive motor; 208, Sealing rotary groove; 209, Sealing turntable; 210, Plasma generator; 300, Gas distribution plate assembly; 301, Isolation plate; 302, Second drive motor; 303, Drive gear; 304, Air inlet connector; 305, Gas distribution pipe one; 306, Heating element; 307, Jet nozzle; 308, Gas distribution pipe; 400, Claw assembly; 401. Claw seat; 402. First claw gear; 403. Guide groove; 404. Second claw gear; 405. Claw arm; 406. Grip head; 407. Roller; 408. Horizontal push rod; 409. Push plate; 410. Return spring; 411. Transmission gear; 500. Cam drive assembly; 501. Cam plate; 502. Cam groove; 503. Cam slide; 504. Top cover; 505. Electromagnet; 506. Magnet; 507. Push rack; 508. Compression spring; 509. Camshaft; 510. Driven gear; 600. Unlocking mechanism assembly; 601. Unlocking cam; 602. Arc-shaped guide groove; 603. Lever; 604. Unlocking slider; 605. T-shaped guide rail; 606. Unlocking shaft; 607. Unlocking gear; 700. Quartz cavity component. Detailed Implementation

[0038] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0039] Please see Figures 1-9 As shown, the present invention provides a silicon carbide plating device for a quartz cavity component with a gas distribution structure, including a sealed cavity assembly 100 and a quartz cavity component 700. The sealed cavity assembly 100 has a rotatably sealed silicon carbide plating turntable assembly 200 that can be moved between multiple workstations. The turntable assembly 200 has a fixedly installed gas distribution plate assembly 300 for silicon carbide plating heating and gas supply. The gas distribution plate assembly 300 has multiple sets of claw assemblies 400 around its edge, which clamp and fix the quartz cavity component 700 at multiple points. A cam drive assembly 500 is located between the multiple sets of claw assemblies 400, which... When the cam drive assembly 500 rotates, the synchronous contact of the multiple sets of claw assemblies 400 causes the multiple sets of claw assemblies 400 to alternately clamp and fix the quartz cavity component 700 at multiple points. Through the alternating multi-point clamping of the quartz cavity component 700 by the multiple sets of claw assemblies 400, the quartz cavity component 700 forms a leak-free carbon plating structure within the carbon plating turntable assembly 200. The cam drive assembly 500 is internally equipped with an unlocking mechanism assembly 600. Through the outward expansion compensation of the concave wheel body at the edge of the cam drive assembly 500 by the unlocking mechanism assembly 600, the multiple sets of claw assemblies 400 form a synchronous release and release ring clamping structure for the quartz cavity component 700.

[0040] In a preferred embodiment, please refer to Figure 4 The sealing cavity assembly 100 includes a sealing cavity 101. The top of the sealing cavity 101 is provided with a loading and unloading port 107. An L-shaped bracket 106 is fixedly provided on one side of the sealing cavity 101. A stepper motor 103 is fixedly provided on the top of the L-shaped bracket 106. A dial 102 is provided on the output shaft of the stepper motor 103. A lever arm 104 is fixedly provided on the dial 102. A pin 105 is fixedly provided on the lever arm 104.

[0041] In this embodiment, the dial 102 drives the circular turntable 205 at a fixed angle through the pin 105 on the lever arm 104 and the straight guide groove 203.

[0042] In a preferred embodiment, please refer to Figure 5The carbon plating turntable assembly 200 includes a turntable shaft 201 rotatably mounted on a sealed cavity 101. One end of the turntable shaft 201 is fixedly mounted with a circular turntable 205 that rotates within the sealed cavity 101, and the other end of the turntable shaft 201 is fixedly mounted with an indexing wheel 202 that rotates on one side of a dial 102. The indexing wheel 202 has a straight guide groove 203 and an arc guide groove 204. The circular turntable 205 has multiple work station grooves 206 for carbon plating processing. Both sides of the work station grooves 206 have sealing rotating grooves 208. A sealing turntable 209 is rotatably mounted within the sealing rotating groove 208. A plasma generator 210 is fixedly mounted within the sealing turntable 209. A first drive motor 207 is fixedly mounted at the end of the circular turntable 205 away from the indexing wheel 202 to drive the sealing turntable 209 to rotate within the sealing rotating groove 208.

[0043] In this embodiment, a groove for accommodating a plasma generator 210 is provided on one side of the sealed turntable 209.

[0044] In this embodiment, the circular turntable 205 rotates in a sealed cavity 101, so that the multiple work station slots 206 on the circular turntable 205 are in a carbon-plated sealed state.

[0045] In this embodiment, the carbon plating processes in the multiple workstations 206 on the circular turntable 205 are all different.

[0046] In this embodiment, different gas sources for each carbon plating process are delivered into each work station tank 206 through the air inlet connector 304 and the air distribution pipe 308.

[0047] In this embodiment, the work station 206 facing the loading and unloading port 107 is the loading and unloading work station for the quartz cavity component 700.

[0048] In this embodiment, as the circular turntable 205 rotates within the sealed cavity 101, the other workstation slots 206 on the circular turntable 205 are in a closed state where they do not interfere with each other. At this time, the functions of the multiple workstation slots 206 are argon plasma cleaning workstation, oxygen plasma surface activation workstation, first carbon deposition workstation, second carbon deposition workstation, and inert gas cooling workstation on the surface of the quartz cavity component 700.

[0049] In a preferred embodiment, please refer to Figure 6 The air distribution plate assembly 300 includes an isolation plate 301 fixedly disposed in the middle of the inner wall of the work station slot 206. The isolation plate 301 is provided with multiple air distribution pipes 308, air distribution pipe 305 and heating element 306. A second drive motor 302 is fixedly disposed at the bottom of the isolation plate 301. A drive gear 303 is disposed on the output shaft of the second drive motor 302.

[0050] In this embodiment, the air distribution pipe 308 is provided with an air nozzle 307 for supplying air into the work station slot 206.

[0051] In this embodiment, an air inlet connector 304 that penetrates the circular turntable 205 is fixedly provided at the bottom of the air distribution pipe 308.

[0052] In this embodiment, one end of the air distribution pipe 305 also extends through the outer side of the circular turntable 205.

[0053] In this embodiment, the station tank 206 is heated by the heating element 306 during the carbon plating process.

[0054] In this embodiment, multiple gas distribution pipes 308 are arranged around the edge of the isolation disk 301, and a gas distribution pipe 308 is also provided in the center of the isolation disk 301. After the quartz cavity component 700 is placed in place, the multiple gas distribution pipes 308 form a ring-shaped gas distribution structure around the periphery of the quartz cavity component 700. The gas distribution pipe 308 in the center of the isolation disk 301 is inserted into the quartz cavity component 700, forming an inner wall gas distribution structure inside the quartz cavity component 700. Through the above structure, there is sufficient gas distribution on both the periphery and the inner wall of the quartz cavity component 700, avoiding differences in plating quality between the inner and outer walls of the quartz cavity component 700 during plating.

[0055] In a preferred embodiment, please refer to Figure 7 The chuck assembly 400 includes a chuck base 401. A first chuck gear 402 and a second chuck gear 404 are rotatably mounted on the top of the bottom of the chuck base 401 and mesh with each other. A chuck arm 405 is fixedly mounted on both the first chuck gear 402 and the second chuck gear 404. A gripping head 406 is fixedly mounted at the end of each of the two gripping arms 405. A guide groove 403 is provided at the front end of the chuck base 401. A horizontal push rod 408 is slidably mounted through the bottom end of the bottom of the chuck base 401. A roller 407 and a push plate 409 are fixedly mounted on the horizontal push rod 408. A return spring 410 is fixedly mounted on one side of the push plate 409 and sleeved outside the horizontal push rod 408. A transmission gear 411 that meshes with the second chuck gear 404 is fixedly mounted on the top of the push plate 409.

[0056] In this embodiment, the push of the push plate 409 by the return spring 410 causes the transmission gear 411 to drive the second gripper gear 404 to rotate counterclockwise.

[0057] In this embodiment, the two clamping heads 406 on the first clamping gear 402 and the second clamping gear 404 are in a structure that clamps the protruding edge of the quartz cavity component 700.

[0058] In a preferred embodiment, please refer to Figure 8The cam drive assembly 500 includes a camshaft 509 rotatably mounted on an isolation disk 301. A driven gear 510 meshing with a drive gear 303 is fixedly mounted on the camshaft 509. A cam disk 501 that abuts against a roller 407 is fixedly mounted on the top of the camshaft 509. A cam groove 502 is formed on the edge of the cam disk 501. A cam slide groove 503 is formed in the cam groove 502. A top cover 504 is fixedly mounted on the top of the cam disk 501. A push rack 507 is linearly slidably mounted inside the top cover 504. A compression spring 508 and a magnet 506 are fixedly mounted at both ends of the push rack 507, respectively. An electromagnet 505 facing the magnet 506 is fixedly mounted on the inner wall of the top cover 504. The magnet 506 moves closer to the electromagnet 505 by the push of the push rack 507 by the compression spring 508.

[0059] In this embodiment, the roller 407 abuts against the edge wheel of the cam disk 501 by the push of the pusher plate 409 by the return spring 410.

[0060] In this embodiment, the rotation of the cam disk 501, combined with the rolling of the roller 407 against the cam groove 502 and the edge wheel of the cam disk 501, causes the transmission gear 411 to slide laterally back and forth at the bottom of the chuck seat 401. At this time, the two clamping heads 406 on the second chuck gear 404 and the first chuck gear 402 are in a structure for clamping and releasing the quartz cavity component 700.

[0061] In this embodiment, multiple sets of claw assemblies 400 are fixed around the cam drive assembly 500.

[0062] In this embodiment, the bottom of the claw seat 401 is fixedly connected to the bottom of the isolation disk 301.

[0063] In this embodiment, the rotation of the cam drive assembly 500 drives the two clamping heads 406 on the multiple sets of claw assemblies 400 to alternately clamp and fix the bottom of the quartz cavity component 700 at multiple points.

[0064] In this embodiment, alternating multi-point ring clamps are used to avoid plating defects caused by shielding when the two clamping heads 406 clamp the quartz cavity component 700.

[0065] In a preferred embodiment, please refer to Figure 9The unlocking mechanism assembly 600 includes an unlocking shaft 606 rotatably disposed inside a cam disk 501. An unlocking cam 601 is fixedly disposed on the unlocking shaft 606, and an unlocking gear 607 that meshes with a push rack 507 is fixedly disposed on the top of the unlocking shaft 606. Multiple arc-shaped guide grooves 602 are provided on the unlocking cam 601, and a lever 603 is inserted into the arc-shaped guide grooves 602. An unlocking slider 604 that slides linearly inside the cam disk 501 is provided at the bottom of the lever 603. A T-shaped guide rail 605 is provided at the bottom of the unlocking slider 604, and a groove matching the T-shaped guide rail 605 is provided at the bottom of the cam disk 501.

[0066] In this embodiment, when the unlocking mechanism assembly 600 rotates within the cam drive assembly 500, the unlocking slider 604 slides linearly within the cam groove 502 via the cam groove 503.

[0067] In this embodiment, the unlocking cam 601 moves multiple unlocking sliders 604 through multiple arc-shaped guide grooves 602 and multiple levers 603, so that the multiple unlocking sliders 604 extend outward synchronously in multiple cam grooves 503 and fill the grooves of the cam grooves 502.

[0068] In this embodiment, when multiple unlocking sliders 604 simultaneously fill the cam groove 502 on the edge of the cam disk 501, the unlocking sliders 604 push the horizontal push rod 408 backward through the roller 407. At this time, the two clamping heads 406 on the multiple sets of claw assemblies 400 are simultaneously in the unclamping structure of the quartz cavity component 700.

[0069] A process for depositing silicon carbide onto a quartz cavity component with a gas distribution structure includes the following steps:

[0070] S1. The quartz cavity component 700 is placed in the work station slot 206 through the loading and unloading port 107. The quartz cavity component 700 is fixed in the work station slot 206 by multiple sets of claw assemblies 400. The circular turntable 205 rotates in the sealed cavity 101 with a sealed and fixed angle gap, so that the work station slot 206 is sealed and gap-changing between the argon plasma cleaning work station, the oxygen plasma surface activation work station, the first carbon deposition work station, the second carbon deposition work station and the inert gas cooling work station.

[0071] S2. When the workstation changes position, different gases from outside each workstation are sent into the corresponding workstation slot 206 through the air inlet connector 304. After the quartz cavity component 700 is placed in place, multiple air distribution pipes 308 form a ring-shaped gas distribution structure around the quartz cavity component 700. The air distribution pipe 308 in the center of the isolation plate 301 is inserted into the quartz cavity component 700, forming an inner wall gas distribution structure inside the quartz cavity component 700. Through the above structure, there is sufficient gas distribution on both the outer and inner walls of the quartz cavity component 700, avoiding differences in plating quality between the inner and outer walls of the quartz cavity component 700 during plating.

[0072] S3, the argon plasma cleaning station performs pre-treatment cleaning of the surface of the quartz cavity component 700, the oxygen plasma surface activation station performs activation of the surface of the quartz cavity component 700, the first carbon deposition station and the second carbon deposition station perform carbon deposition processing at different temperatures, and the inert gas cooling station performs cooling of the quartz cavity component 700 after carbon deposition.

[0073] The working principle of this invention is as follows: To solve the problem of secondary contamination of quartz cavity components caused by the separation of various processes during carbon plating, which affects the coating quality, the sealed cavity assembly 100 of this invention is internally sealed and rotatably equipped with a carbon plating turntable assembly 200 that can be moved between multiple workstations. The carbon plating turntable assembly 200 has multiple workstation slots 206, each workstation slot 206 corresponding to a different carbon plating process. Specifically, when the circular turntable 205 rotates within the sealed cavity 101, it ensures that each workstation slot 206 on the circular turntable 205 rotates within the sealed cavity 101. The multiple workstations 206 are designed to be airtight, and each workstation handles a different process. The functions of the multiple workstations 206 are divided into an argon plasma cleaning process station for processing the quartz cavity component 700, an oxygen plasma surface activation process station, a first carbon deposition process station, a second carbon deposition process station, and an inert gas cooling process station. Each process station is independent and separate, and is also airtight. Through this structure, the integrated process processing of multiple workstations is achieved, avoiding secondary pollution. At the same time, the integrated equipment reduces process flow time and lowers production costs.

[0074] Based on the above, when the carbon plating turntable assembly 200 rotates, different gas sources from each carbon plating process are delivered into each station tank 206 through the air inlet connector 304 and the air distribution pipe 308. The argon plasma cleaning station delivers argon gas through the air inlet connector 304 into the corresponding sealed station tank 206, thus performing pre-treatment cleaning on the surface of the quartz cavity component 700. Similarly, the oxygen plasma surface activation station delivers oxygen through the air inlet connector 304 into the corresponding sealed station tank 206, thus activating the surface of the quartz cavity component 700, increasing hydroxyl groups, and enhancing... At the bonding sites with the silicon carbide coating, the first carbon deposition station needs to send the first silicon carbide gas source into the corresponding sealed station tank 206 through the gas inlet connector 304, and the second carbon deposition station needs to send the second silicon carbide gas source into the corresponding sealed station tank 206 through the gas inlet connector 304. At this time, the first carbon deposition station and the second carbon deposition station achieve carbon deposition processing at different temperatures. The inert gas cooling station needs to send nitrogen gas into the corresponding sealed station tank 206 through the gas inlet connector 304. At this time, the inert gas cooling station achieves cooling of the quartz cavity part 700 after carbon deposition, avoiding the internal stress of the subsequent coating due to excessive temperature difference.

[0075] Based on the above, in order to ensure the safety of the plasma generator 210 during use, sealing grooves 208 are provided on both sides of the work station slot 206. A sealing turntable 209 is rotatably arranged in the sealing groove 208, and the plasma generator 210 is fixedly arranged in the sealing turntable 209. The sealing turntable 209 drives the plasma generator 210 to rotate inward to the sealing groove 208, so that the plasma generator 210 is in a sealed space formed between the sealing turntable 209 and the sealing groove 208 when not in use. In this way, when the plasma generator 210 is not in use or when high temperature avoidance protection is required, the above structure can be used to simply rotate the side of the sealing turntable 209 with the plasma generator 210 to the inner side of the sealing groove 208 by the first drive motor 207, so as to achieve the sealed avoidance protection of the plasma generator 210, which greatly ensures the safety of the plasma generator 210 during use.

[0076] Based on the above, in order to solve the fastening problem during carbon plating of the quartz cavity component 700, and at the same time to solve the problem of shielding and incomplete plating during carbon plating of the quartz cavity component 700, this invention uses a return spring 410 to push the push plate 409, causing the push plate 409 to drive the transmission gear 411 to move inward. At this time, the two clamping heads 406 on the second clamping gear 404 and the first clamping gear 402 are in a point clamping structure. At the same time, through the push of the push plate 409 by the return spring 410, the roller 407 abuts against the edge of the cam plate 501, and the edge of the cam plate 501 has a cam groove 502. When the cam plate 501 rotates, the roller 407 moves back and forth in the edge of the cam plate 501 and in the cam groove 502. At this time, the push plate 407... 09 drives the transmission gear 411 to move back and forth. At this time, the two gripping heads 406 on the second gripper gear 404 and the first gripper gear 402 are in a structure of gripping and releasing the quartz cavity component 700. Since multiple sets of gripper assemblies 400 are provided around the quartz cavity component 700, when some gripper assemblies 400 are in a gripping position, other gripper assemblies 400 are in a structure of releasing the gripping position. At this time, the multiple points of contact between the multiple gripping heads 406 and the quartz cavity component 700 are in an alternating contact and non-contact structure. In this way, while ensuring the gripping of the quartz cavity component 700, the alternating gripping of multiple points is achieved, avoiding the incomplete plating caused by continuous contact at the same position.

[0077] Based on the above, the alternating clamping method solves the problem of shielding and incomplete plating of the quartz cavity component 700. However, if the alternating clamping is continuously performed, it will prevent the quartz cavity component 700 from being removed when it needs to be loaded or unloaded. Therefore, it is necessary to change the alternating clamping of the multiple sets of claw assemblies 400 to a completely unclamped state. To overcome the above problem and achieve the change of the carbon plating clamping state, the cam drive assembly 500 of this invention is internally equipped with an unlocking mechanism assembly 600. Through the outward expansion compensation of the concave wheel body at the edge of the cam drive assembly 500 by the unlocking mechanism assembly 600, the multiple sets of claw assemblies 400 form a synchronous release ring clamping structure for the quartz cavity component 700. Specifically, by energizing the electromagnet 505, the magnetic force of the electromagnet 505 overcomes the thrust of the compression spring 508 and pushes the rack 507 to move inward. 7. The unlocking gear 607 drives the unlocking cam 601 to rotate clockwise within the cam disk 501. When the cam disk 501 rotates clockwise, the unlocking cam 601 moves multiple unlocking sliders 604 through multiple arc-shaped guide grooves 602 and multiple levers 603, causing the multiple unlocking sliders 604 to simultaneously extend outward within multiple cam grooves 503 and fill the grooves of the cam grooves 502. When the multiple unlocking sliders 604 simultaneously fill the cam grooves 502 at the edge of the cam disk 501, the unlocking sliders 604 push the horizontal push rod 408 backward through the roller 407. At this time, the two clamping heads 406 on the multiple sets of claw assemblies 400 are simultaneously in a structure that releases the clamping of the quartz cavity component 700. Through the above structure, the clamping state of the multiple sets of claw assemblies 400 on the quartz cavity component 700 is compensated and changed, thereby facilitating the loading or unloading of the quartz cavity component 700 during carbon plating.

[0078] Although embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the appended scope of protection and its equivalents.

Claims

1. A silicon carbide plating apparatus for a quartz cavity component with a gas distribution structure, comprising a sealed cavity assembly (100) and a quartz cavity component (700), characterized in that: The sealed cavity assembly (100) is internally sealed and rotatably equipped with a carbon plating turntable assembly (200) that can be displaced between multiple workstations. The carbon plating turntable assembly (200) is internally fixed with a carbon plating heating and carbon plating ring air supply gas distribution plate assembly (300). The edge ring of the gas distribution plate assembly (300) is provided with multiple sets of claw assemblies (400), which clamp and fix the quartz cavity component (700) at multiple points. A cam drive assembly (500) is provided between the multiple sets of claw assemblies (400). The cam drive assembly (500) rotates and synchronously abuts against the multiple sets of claw assemblies (400), causing the multiple sets of claw assemblies to... The claw assembly (400) alternately clamps the quartz cavity component (700) at multiple points. Through the alternating multi-point clamping of the quartz cavity component (700) by multiple sets of the claw assembly (400), the quartz cavity component (700) forms a carbon-plated structure without leaks in the carbon-plated turntable assembly (200). The cam drive assembly (500) is rotatably provided with an unlocking mechanism assembly (600). Through the outward expansion compensation of the concave wheel body at the edge of the cam drive assembly (500) by the unlocking mechanism assembly (600), the multiple sets of the claw assembly (400) form a synchronous release ring clamping structure for the quartz cavity component (700).

2. The silicon carbide plating equipment for a quartz cavity component with a gas distribution structure according to claim 1, characterized in that: The sealing cavity assembly (100) includes a sealing cavity (101), the top of which is provided with a loading and unloading port (107), and an L-shaped bracket (106) is fixedly provided on one side of the sealing cavity (101). A stepper motor (103) is fixedly provided on the top of the L-shaped bracket (106), a dial (102) is provided on the output shaft of the stepper motor (103), a lever arm (104) is fixedly provided on the dial (102), and a pin (105) is fixedly provided on the lever arm (104).

3. The silicon carbide plating equipment for a quartz cavity component with a gas distribution structure according to claim 2, characterized in that: The carbon plating turntable assembly (200) includes a turntable shaft (201) rotatably mounted on a sealed cavity (101). One end of the turntable shaft (201) is fixedly mounted with a circular turntable (205) that rotates within the sealed cavity (101), and the other end of the turntable shaft (201) is fixedly mounted with an indexing wheel (202) that rotates on one side of a dial (102). The indexing wheel (202) has a straight guide groove (203) and an arc guide groove (204). The circular turntable (205) has... Multiple workstations (206) for carbon plating are provided. Sealing rotating grooves (208) are provided on both sides of each workstation (206). A sealing turntable (209) is rotatably arranged in the sealing rotating groove (208). A plasma generator (210) is fixedly arranged in the sealing turntable (209). A first drive motor (207) is fixedly arranged at the end of the circular turntable (205) away from the indexing wheel (202) to drive the sealing turntable (209) to rotate in the sealing rotating groove (208).

4. The silicon carbide plating equipment for a quartz cavity component with a gas distribution structure according to claim 3, characterized in that: The air distribution plate assembly (300) includes an isolation plate (301) fixedly disposed in the middle of the inner wall of the work station slot (206). The isolation plate (301) is provided with a plurality of air distribution pipes (308), an air distribution pipe (305) and a heating element (306). The air distribution pipes (308) are provided with jet nozzles (307) for supplying air into the work station slot (206). The bottom of the air distribution pipes (308) is fixedly provided with an air inlet connector (304) that penetrates through the circular turntable (205). One end of the air distribution pipe (305) also penetrates through the outside of the circular turntable (205). The bottom of the isolation plate (301) is fixedly provided with a second drive motor (302), and the output shaft of the second drive motor (302) is provided with a drive gear (303). Multiple air distribution pipes (308) are arranged around the edge of the isolation plate (301), and an air distribution pipe (308) is also provided at the center of the isolation plate (301).

5. The silicon carbide plating equipment for a quartz cavity component with a gas distribution structure according to claim 4, characterized in that: The jaw assembly (400) includes a jaw base (401). A first jaw gear (402) and a second jaw gear (404) are rotatably mounted on the top of the bottom of the jaw base (401). A jaw arm (405) is fixedly mounted on both the first jaw gear (402) and the second jaw gear (404). A clamping head (406) is fixedly mounted at the end of each of the two jaw arms (405). A guide groove (403) is provided at the front end of the jaw base (401). A horizontal push rod (408) is slidably mounted through the bottom end of the jaw base (401). A roller (4) is fixedly mounted on the horizontal push rod (408). 07) and push plate (409), a return spring (410) is fixedly provided on one side of the push plate (409) and sleeved on the outside of the horizontal push rod (408). A transmission gear (411) that meshes with the second claw gear (404) is fixedly provided on the top of the push plate (409). The push plate (409) is pushed by the return spring (410), so that the transmission gear (411) drives the second claw gear (404) to rotate counterclockwise. At this time, the two clamping heads (406) on the first claw gear (402) and the second claw gear (404) are in a structure that clamps the protruding part of the edge of the quartz cavity part (700).

6. The silicon carbide plating equipment for a quartz cavity component with a gas distribution structure according to claim 5, characterized in that: The cam drive assembly (500) includes a camshaft (509) rotatably mounted on an isolation disk (301). A driven gear (510) meshing with a drive gear (303) is fixedly mounted on the camshaft (509). A cam disk (501) abutting against a roller (407) is fixedly mounted on the top of the camshaft (509). A cam groove (502) is formed on the edge of the cam disk (501). A cam slide groove (503) is formed in the cam groove (502). A top cover (504) is fixedly mounted on the top of the cam disk (501). A push rack (507) is linearly slidably mounted inside the top cover (504). A compression spring (508) and a magnet (506) are fixedly mounted at both ends of the push rack (507). An electromagnet (505) facing the magnet (506) is fixedly mounted on the inner wall of the top cover (504). The compression spring (508) drives the electromagnet to drive the drive. When the rack (507) is pushed, the magnet (506) moves closer to the electromagnet (505). The pusher (409) is pushed by the return spring (410), and the roller (407) abuts against the edge wheel of the cam disk (501). The rotation of the cam disk (501) and the roller (407) rolling against the cam groove (502) and the edge wheel of the cam disk (501) cause the transmission gear (411) to slide laterally back and forth at the bottom of the chuck seat (401). At this time, the two clamping heads (406) on the second chuck gear (404) and the first chuck gear (402) are in a structure for clamping and releasing the quartz cavity component (700). Multiple sets of chuck assembly (400) fixing rings are set around the cam drive assembly (500). At this time, the bottom of the chuck seat (401) is fixedly connected to the bottom of the isolation disk (301).

7. The silicon carbide plating equipment for a quartz cavity component with a gas distribution structure according to claim 6, characterized in that: The unlocking mechanism assembly (600) includes an unlocking shaft (606) rotatably disposed inside a cam disk (501). An unlocking cam (601) is fixedly disposed on the unlocking shaft (606), and an unlocking gear (607) meshing with a push rack (507) is fixedly disposed on the top of the unlocking shaft (606). Multiple arc-shaped guide grooves (602) are provided on the unlocking cam (601), and a lever (603) is inserted into the arc-shaped guide grooves (602). An unlocking slider (604) that slides linearly within the cam disk (501) is provided at the bottom of the lever (603). A T-shaped guide rail (605) is provided at the bottom of the unlocking slider (604), and a groove matching the T-shaped guide rail (605) is provided at the bottom of the cam disk (501). The unlocking mechanism assembly (600) is located within the cam drive assembly. When the unlocking slider (604) rotates within the cam groove (502), the unlocking slider (604) slides linearly within the cam groove (502) via the cam groove (503). The unlocking cam (601) moves the unlocking sliders (604) through multiple arc-shaped guide grooves (602) and multiple levers (603), causing the unlocking sliders (604) to expand outward synchronously within the multiple cam grooves (503) and fill the groove of the cam groove (502). When the unlocking sliders (604) synchronously fill the cam groove (502) at the edge of the cam disk (501), the unlocking sliders (604) push the horizontal push rod (408) backward via the roller (407). At this time, the two clamping heads (406) on the multiple sets of claw assemblies (400) are simultaneously in a structure that releases the clamping of the quartz cavity component (700).

8. The silicon carbide plating equipment for a quartz cavity component with a gas distribution structure according to claim 7, characterized in that: The dial (102) drives the circular turntable (205) at a fixed angle via the pin (105) on the lever arm (104) and the straight guide groove (203). At this time, the circular turntable (205) rotates in a sealed cavity (101), so that the multiple work slots (206) on the circular turntable (205) are in a carbon plating sealed state. At this time, the carbon plating processes in the multiple work slots (206) on the circular turntable (205) are different. Different gas sources in each carbon plating process are sent to each work slot through the air inlet connector (304) and the air distribution pipe (308). Within each workstation slot (206), the workstation slot (206) directly opposite the loading / unloading port (107) is the loading / unloading workstation for the quartz cavity component (700). As the circular turntable (205) rotates within the sealed cavity (101), the other workstation slots (206) on the circular turntable (205) are in a closed state where they do not interfere with each other. At this time, the functions of the multiple workstation slots (206) are: argon plasma cleaning workstation, oxygen plasma surface activation workstation, first carbon deposition workstation, second carbon deposition workstation, and inert gas cooling workstation for the surface of the quartz cavity component (700).

9. The silicon carbide plating equipment for a quartz cavity component with a gas distribution structure according to claim 7, characterized in that: The rotation of the cam drive assembly (500) drives the two clamping heads (406) on the multiple sets of claw assemblies (400) to alternately clamp the bottom of the quartz cavity component (700) at multiple points. The alternating multi-point clamping avoids the incomplete plating caused by the two clamping heads (406) clamping the quartz cavity component (700) when they are shielded.

10. A process for depositing silicon carbide onto a quartz cavity component with a gas distribution structure, comprising using a silicon carbide depositing equipment for a quartz cavity component with a gas distribution structure as described in any one of claims 7-9, characterized in that: Includes the following steps: S1. Place the quartz cavity component (700) into the work station slot (206) through the loading and unloading port (107). Fix the quartz cavity component (700) in the work station slot (206) by multiple sets of claw assemblies (400). Rotate the circular turntable (205) in the sealed cavity (101) with a sealed and fixed angle gap, so that the work station slot (206) is sealed and gap-changing between the argon plasma cleaning work station, the oxygen plasma surface activation work station, the first carbon deposition work station, the second carbon deposition work station and the inert gas cooling work station. S2. When the workstation changes position, different gases from outside each workstation are sent into the corresponding workstation slot (206) through the air inlet connector (304). After the quartz cavity component (700) is placed in place, multiple air distribution pipes (308) form a ring-shaped gas distribution structure around the quartz cavity component (700). The air distribution pipe (308) in the center of the isolation plate (301) is inserted into the quartz cavity component (700) to form an inner wall gas distribution structure inside the quartz cavity component (700). Through the above structure, there is sufficient gas distribution on both the outer periphery and inner wall of the quartz cavity component (700), avoiding the difference in plating quality between the inner and outer walls of the quartz cavity component (700) during plating. S3, the argon plasma cleaning station realizes the cleaning and pretreatment of the surface of the quartz cavity component (700), the oxygen plasma surface activation station realizes the activation of the surface of the quartz cavity component (700), the first carbon deposition station and the second carbon deposition station realize carbon deposition processing at different temperatures, and the inert gas cooling station realizes the cooling of the quartz cavity component (700) after carbon deposition.

Images