A photoresist collecting member, a photoresist coating apparatus, and a photoresist waste liquid cleaning method

By designing a photoresist collection device and coating equipment, and utilizing vacuum adsorption and a step-moving isolation sleeve to clean the photoresist, the problem of residual photoresist particle contamination in the coating chamber was solved, thereby improving photoresist coating efficiency and equipment reliability.

CN122131547APending Publication Date: 2026-06-02WEIFANG UNIV OF SCI & TECH +1
View PDF 0 Cites 0 Cited by

Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
WEIFANG UNIV OF SCI & TECH
Filing Date
2026-04-09
Publication Date
2026-06-02

AI Technical Summary

Technical Problem

After prolonged use, existing photoresist coating equipment suffers from an accumulation of dried photoresist particles in the coating chamber, leading to an increased wafer coating defect rate. Furthermore, frequent cleaning operations increase equipment costs and downtime.

Method used

Design a photoresist collection device, including a housing assembly and a flexible isolation sleeve, to achieve efficient cleaning of photoresist through vacuum adsorption and step-by-step movement, avoiding residual photoresist particles from contaminating the wafer.

Benefits of technology

This reduces the impact of dried photoresist particles on the wafer, improves photoresist coating efficiency, reduces downtime maintenance costs, and enables long-term continuous photoresist coating operations.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN122131547A_ABST
    Figure CN122131547A_ABST
Patent Text Reader

Abstract

This invention relates to the field of semiconductor manufacturing technology, specifically disclosing a photoresist collection device, a photoresist coating equipment, and a photoresist waste liquid cleaning method. The photoresist collection device includes a housing assembly and a cylindrical flexible isolation sleeve. The housing assembly consists of a conical guide ring, a middle connecting ring, and an end bending ring. The isolation sleeve is stacked along its own length on the first axial end side of the conical guide ring, and the stacked isolation sleeve is annular in shape. Several vacuum adsorption holes are opened on the inner circumference of the conical guide ring. This photoresist collection device reduces the impact of dried residual photoresist particles on the photoresist film on the wafer during the photoresist coating process. This photoresist coating equipment meets the needs of long-term continuous photoresist coating operations and reduces downtime maintenance costs. This photoresist waste liquid cleaning method can complete the cleaning of photoresist during the photoresist coating process on the wafer without interrupting the coating operation.
Need to check novelty before this filing date? Find Prior Art