A kind of LBO crystal ultra-smooth polishing device and polishing method

Abstract

The application relates to the technical field of polishing devices, and discloses an LBO crystal super-smooth polishing device and a polishing method, which comprise a bottom plate, the top of the bottom plate is fixedly connected with a polishing box, the top of the polishing box is detachably connected with a cover plate, the middle of the polishing box is rotationally connected with a polishing disc, the top of the polishing disc is movably connected with a plurality of sanding strips, the plurality of sanding strips are arranged in a ring shape on the polishing disc, the plurality of sanding strips are divided into groups, each group of sanding strips presents an arc shape, and the length of each group of sanding strips gradually decreases between the outer ring edge and the shaft center of the polishing disc. When the crystal is processed, the centrifugal force generated by the polishing disc can move the chemical polishing agent to the edge of the polishing disc, wherein the chemical polishing agent moves along the material moving area, then part of the chemical polishing agent is dispersed to the edge of the polishing disc through the material moving area, and the other part of the chemical polishing agent may be left in the material storage area and cooperate with the sanding strips to polish, so that the polishing effect of the sanding strips is improved.

Description

Technical Field

[0001] This invention relates to the field of polishing equipment technology, specifically to an LBO crystal ultra-smooth polishing device and polishing method. Background Technology

[0002] Lithium triborate crystal (LiB3O5, abbreviated as LBO) is a nonlinear optical crystal independently developed by the Fujian Institute of Research on the Structure of Matter, Chinese Academy of Sciences in the 1980s. It belongs to the orthorhombic crystal system. This crystal has a wide transmission band of 160-2600nm, a frequency doubling conversion efficiency three times higher than that of KDP crystal, and a high laser damage threshold on the order of 10GW / cm². It is suitable for harmonic generation in devices such as Nd:YAG lasers and optical parametric oscillators. After production, the crystal needs to be polished to enable its application in scientific research and industrial fields. Existing polishing equipment uses a polishing disc and a chemical abrasive. The chemical abrasive prevents the crystal from directly contacting the polishing disc, thus protecting the crystal. The entire equipment mainly consists of a rotating polishing component and a fixing component for fixing the crystal. Such polishing devices can only polish one crystal at a time, resulting in low efficiency. Furthermore, during the polishing process, the crystal can only contact a small portion of the polishing component, leading to low utilization of the polishing disc. Moreover, prolonged use of only a small portion for polishing can cause crystal debris to adhere to that area, which can easily reduce the polishing effect. Therefore, it is necessary to propose an improvement. To this end, we propose an LBO crystal ultra-smooth polishing device and polishing method. Summary of the Invention

[0003] The purpose of this invention is to provide an LBO crystal ultra-smooth polishing device and polishing method to solve the problems mentioned in the background art.

[0004] To achieve the above objectives, the present invention provides the following technical solution: an LBO crystal ultra-smooth polishing device, comprising a base plate, a polishing box fixedly connected to the top of the base plate, a cover plate detachably connected to the top of the polishing box, a polishing disc rotatably connected to the middle of the polishing box, and multiple abrasive strips movably connected to the top of the polishing disc. The multiple abrasive strips are arranged in a ring on the polishing disc, and the multiple abrasive strips are divided into multiple groups. Each group of abrasive strips has an arc shape, and the length of each group of abrasive strips gradually decreases from the outer edge of the polishing disc to the axis. A storage area for chemical abrasive is formed between two adjacent abrasive strips in each group, and a material feeding area for the polishing disc to generate centrifugal force to discharge the material is formed between two adjacent groups of abrasive strips. A guide rail is fixedly connected to one side of the top of the base plate, and a lifting arm is slidably connected to the guide rail. A material holding plate is suspended at one end of the lifting arm. The material holding plate has multiple protruding cavities for placing material. Multiple threaded bolts are threadedly connected to the material holding plate.

[0005] Preferably, a second motor is fixedly installed on one side inside the polishing box, a first helical gear is sleeved on the output shaft of the second motor, a connecting shaft is fixedly connected to the bottom of the polishing disc, a second helical gear is fixedly connected to the bottom of the connecting shaft, the connecting shaft and the polishing box are rotatably connected, and the first helical gear and the second helical gear mesh and drive each other.

[0006] Preferably, a reciprocating lead screw is rotatably connected to the guide rail, a spring is sleeved on the reciprocating lead screw, a first motor is fixedly connected to one end of the guide rail, the output shaft of the first motor is connected to the reciprocating lead screw, a cylinder is slidably connected to the top of one end of the guide rail, the top of the cylinder is fixedly connected to the lifting arm, and the reciprocating lead screw and the lifting arm are threadedly connected.

[0007] Preferably, an installation plate is fixedly installed on the other side of the top of the base plate, an air pump is fixedly connected to the top of the installation plate, a guide rod is fixedly connected to one end of the air pump, a pair of air pipes are fixedly connected to one end of the guide rod, a pair of air holes are opened at one end of the guide rod, the air pipes and air holes are connected, and a cleaning brush is rotatably connected to the bottom of one end of the guide rod.

[0008] Preferably, a guide rod is fixedly connected to the top of the solid material tray, a drainage hose is fixedly connected to the top of the guide rod, a replenishment tank is fixedly connected to the middle of one side of the bottom plate, and one end of the drainage hose is fixed to the replenishment tank.

[0009] Preferably, a compression block is fixedly connected to the top of the polishing box, the inner ring of the compression block is fixedly connected to the bottom connecting shaft of the polishing disc, the top of the polishing box has multiple hopper holes in a ring shape, the inner ring of the cover plate has multiple discharge holes, and a receiving tray is fixedly connected inside the polishing box, the receiving tray is located at the bottom of the multiple hopper holes.

[0010] Preferably, a fixed plate is fixedly installed at the top center of the polishing box. Multiple distribution rails are provided on the fixed plate. The multiple distribution rails are arranged in a ring on the fixed plate. The multiple distribution rails are divided into multiple groups. Each group of distribution rails is arc-shaped. Each abrasive strip corresponds to each distribution rail vertically. One end of the abrasive strip is made of metal.

[0011] Preferably, each distribution rail is slidably connected to a slider, the slider is threadedly connected to a magnet, the bottom of the magnet is fitted with a washer, and the slider is fixed together with the fixed plate after rotating and rising through the magnet and contacting the washer.

[0012] Preferably, the polishing box, the fixing plate, and the cover are all made of aluminum alloy.

[0013] The polishing method required for LBO crystal ultra-smooth polishing equipment includes the following operating steps: a. Installation preparation procedures: First, the LBO crystals are manually selected. Then, the selected LBO crystals are placed into the protruding cavity inside the solid material tray. Next, each threaded bolt is manually placed into the solid material tray and then the threaded bolt is tightened so that the bottom of the threaded bolt presses against the LBO crystal, so that the bottom of the LBO crystal is exposed to the bottom of the solid material tray, ensuring that the polished surface is fully exposed. Then, it is fixed to the lifting arm with positioning screws. b. Calibration and positioning process: The second motor is started to rotate, causing the polishing disc to rotate at a low speed. The contact feedback between the compression block and the polishing disc is used to adjust the pressure of the solid material disc in real time, so that the LBO crystal can maintain axial stability on the protrusion cavity. c. Dynamic polishing process: The second motor is turned on at high speed to drive the polishing disc to rotate at a constant speed. Then, the cylinder is driven to descend, causing the lifting arm to extend and descend. At the same time, the first motor is turned on to rotate, causing the reciprocating screw to rotate and move the lifting arm on the guide rail. This allows the LBO crystal to contact the polishing disc in different areas. During this process, the chemical polishing agent inside the replenishment tank is delivered to the inner ring of the solid material disc through the drainage hose and then drained onto the polishing disc. The chemical polishing agent, the polishing disc, and the abrasive strip interact with each other to achieve nanoscale surface roughness control. d, Polishing process for linear variants: When the LBO crystal comes into contact with the abrasive strip, the abrasive strip is rotated along with the polishing disc, and the sweeping range of the arc motion generated by the abrasive strip is changed. This allows the abrasive strip to maintain contact with the LBO crystal for as long as possible during the change, and the polishing angle of the abrasive strip is changed to increase the contact area between the LBO crystal surface and the abrasive strip, making the LBO crystal smoother overall. e, a randomized variation of the polishing process: When multiple magnets are manually installed on the fixed plate, the magnets are tightened and squeeze the pads, causing the slider to be relatively fixed on the distribution rail. The metal sheet at one end of the abrasive strip is attracted by the magnet and changes its angle temporarily, so that one end of the abrasive strip and the magnet are softly fixed together. Then, multiple magnets are randomly distributed in different positions on the distribution rail to obtain a higher precision polishing effect. f. Subsequent cleaning procedures: When the polishing disc rotates, it generates centrifugal force, causing the chemical polishing agent to flow into the receiving tray after passing through the discharge hole. After being repeatedly drawn and filtered by the replenishment tank, it is reused. At the same time, the air pump injects gas into the guide rod during this process. The gas then acts on the surface of the polishing disc through the air hole, blowing the chemical polishing agent in the bottom area of ​​the guide rod and prolonging the contact time of some of the chemical polishing agent on the polishing disc.

[0014] Compared with the prior art, the beneficial effects of the present invention are: 1. In the invention, when processing crystals, the centrifugal force generated by the polishing disc causes the chemical polishing agent to move towards the edge of the polishing disc. When the chemical polishing agent moves, it will move along the material feeding area. Then, part of it will be dispersed to the edge of the polishing disc through the material feeding area, and another part may remain in the storage area due to the rotation of the polishing disc to work with the abrasive strip for polishing, thereby improving the polishing effect of the abrasive strip, increasing the utilization rate of the polishing disc, and preventing fine powder residue, thus improving the polishing effect of the equipment. 2. In this invention, each magnet is positioned at a different location on the distribution rail, allowing the magnet to attract the abrasive strip in motion. The metal sheet at one end of the abrasive strip is attracted by the magnet, causing a temporary change in angle, which in turn softly fixes the abrasive strip to the magnet. This ensures that the angle change of the abrasive strip as it rotates with the polishing disc is limited by the magnet, allowing the abrasive strip to maintain contact with the LBO crystal for as long as possible during the change, thereby obtaining a higher precision polishing effect by acquiring different positions of the abrasive strip. Attached Figure Description

[0015] Figure 1 This is a schematic diagram of the overall structure of the present invention; Figure 2 This is a schematic diagram of the solid material tray structure of the present invention; Figure 3 This is a schematic diagram of the drainage rod structure of the present invention; Figure 4 This is a top view of the entire invention; Figure 5 For the present invention Figure 4 Enlarged structural diagram at point A; Figure 6 This is a schematic diagram of the internal structure of the polishing box of the present invention; Figure 7 This is a cross-sectional view of the polishing disc of the present invention. Figure 8 This is a schematic diagram of the magnet and slider structure of the present invention; Figure 9 For the present invention Figure 6 Enlarged structural diagram at point B; Figure 10 This is a schematic diagram of the polishing disc and fixing disc structure of the present invention; Figure 11 This is a schematic diagram of the disassembled structure of the polishing disc and connecting shaft of the present invention; Figure 12 For the present invention Figure 11 A magnified structural diagram at point C.

[0016] In the diagram: 1-Base plate; 2-Polishing box; 201-Cover plate; 202-Discharge hole; 203-Connecting shaft; 3-Mounting plate; 4-Air pump; 5-Drainage rod; 501-Air pipe; 502-Air hole; 503-Cleaning brush; 6-Guide rail; 7-Lifting arm; 8-Replenishment tank; 9-Drainage hose; 10-Solid plate; 11-Polishing disc; 12-Guide rod; 13-Threaded bolt block; 14-Protruding material cavity; 15-First motor; 16-Reciprocating screw; 17-Spring; 18-Cylinder; 19-Grinding strip; 20-Storage area; 21-Material conveying area; 22-Second motor; 23-First helical gear; 24-Second helical gear; 25-Hopper hole; 26-Compression block; 27-Fixing plate; 28-Distribution rail; 29-Magnet; 30-Receiving plate; 31-Shim; 32-Slider. Detailed Implementation

[0017] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0018] Please see Figure 1-12This invention provides a technical solution: an LBO crystal ultra-smooth polishing device, including a base plate 1, a polishing box 2 fixedly connected to the top of the base plate 1, a cover plate 201 detachably connected to the top of the polishing box 2, a polishing disc 11 rotatably connected to the middle of the polishing box 2, and multiple abrasive strips 19 movably connected to the top of the polishing disc 11. The multiple abrasive strips 19 are arranged in a ring on the polishing disc 11, and are divided into multiple groups. Each group of abrasive strips 19 has an arc shape, and the length of each group of abrasive strips 19 gradually decreases from the outer edge of the polishing disc 11 to the axis. A space is formed between adjacent abrasive strips 19 in each group to allow chemical abrasive to penetrate. The material storage area 20 is used for material storage. A material feeding area 21 is formed between two adjacent sets of abrasive strips 19, where the polishing disc 11 generates centrifugal force for material discharge. Multiple threaded bolts 13 are rotatably connected to the fixed material tray 10. A guide rail 6 is fixedly connected to one side of the top of the base plate 1, and a lifting arm 7 is slidably connected to the guide rail 6. The fixed material tray 10 is suspended at one end of the lifting arm 7. Multiple protruding cavities 14 for placing materials are opened on the fixed material tray 10. First, the polishing disc 11 is installed on the polishing box 2. Then, the cover plate 201 is placed on top of the polishing box 2. The LBO crystals are then manually selected, and the selected LBO crystals are placed into the polishing box. On the protruding cavity 14 inside the solid material tray 10, each threaded bolt 13 is then manually placed onto the solid material tray 10 and tightened so that the bottom of the threaded bolt 13 presses against the LBO crystal, exposing the bottom of the LBO crystal to the bottom of the solid material tray 10, ensuring that the polishing surface is fully exposed. It is then fixed to the lifting arm 7 with positioning screws. The polishing tray 11 is then rotated to polish the flat surface of the bottom of the LBO crystal. During polishing, the lifting arm 7 is driven to move on the guide rail 6, increasing the contact area between the LBO crystal and the polishing tray 11. The enlarged size of the polishing disc 11 allows for rapid and effective polishing of the crystal. During crystal processing, the centrifugal force generated by the polishing disc 11 causes the chemical polishing agent to move towards the edge of the polishing disc 11. As the chemical polishing agent moves, it travels along the feed area 21. Part of it is dispersed to the edge of the polishing disc 11 through the feed area 21, while the other part remains in the storage area 20 due to the rotation of the polishing disc 11. This part works in conjunction with the abrasive strip 19 to polish the crystal, improving the polishing effect of the abrasive strip 19. This also increases the utilization rate of the polishing disc 11 and prevents chemical polishing agent residue, thus improving the polishing effect of the equipment. It is worth mentioning that one end of the abrasive strip 19 is rotatably connected to the polishing disc 11, and the connection structure between the abrasive strip 19 and the polishing disc 11 adopts a torsion spring (not shown in the figure, but can be referenced). Figure 5 When the crystal contacts the frosting strip 19, the frosting strip 19 shifts at a certain angle, as detailed below: Furthermore, a second motor 22 is fixedly installed on one side inside the polishing box 2. A first helical gear 23 is sleeved on the output shaft of the second motor 22. A connecting shaft 203 is fixedly connected to the bottom of the polishing disc 11. The connecting shaft 203 is rotatably connected to the polishing box 2. A second helical gear 24 is fixedly connected to the bottom of the connecting shaft 203. The first helical gear 23 and the second helical gear 24 mesh and drive each other. The connecting shaft 203 is segmented. One segment is located at the bottom of the polishing disc 11, and the other segment is connected to the second helical gear 24. Initially, the two segments of the connecting shaft 203 are separated. When the solid material disc 10 presses down on the polishing disc 11, the polishing disc 11 moves downward, thereby driving the two segments of the connecting shaft 203 to connect together. When the polishing disc 11 needs to rotate, it can be rotated by the second motor 22, which in turn causes the first helical gear 23 to rotate. The first helical gear 23 causes the second helical gear 24 to rotate, ultimately causing the polishing disc 11 to rotate.

[0019] Furthermore, a reciprocating screw 16 is rotatably connected to the guide rail 6, and a spring 17 is sleeved on the reciprocating screw 16. A first motor 15 is fixedly connected to one end of the guide rail 6, and the output shaft of the first motor 15 is connected to the reciprocating screw 16. A cylinder 18 is slidably connected to the top of one end of the guide rail 6, and the top of the cylinder 18 is fixedly connected to the lifting arm 7. The reciprocating screw 16 and the lifting arm 7 are threadedly connected, and the lifting arm 7 is slidably connected on the guide rail 6. The lifting arm 7 is a sleeve type. When the cylinder 18 selects to descend, it stops descending when the solid material plate 10 contacts the polishing plate 11. When it is necessary to change the polishing position of the crystal on the polishing plate 11, the first motor 15 is turned on to rotate, so that the reciprocating screw 16 drives the lifting arm 7 to move back and forth, thereby allowing the lifting arm 7 to drive the solid material plate 10 to move synchronously and increase the polishing range of the crystal.

[0020] Furthermore, a mounting plate 3 is fixedly installed on the other side of the top of the base plate 1. An air pump 4 is fixedly connected to the top of the mounting plate 3. A guide rod 5 is fixedly connected to one end of the air pump 4. The guide rod 5 is fixed to the mounting plate 3. A pair of air pipes 501 are fixedly connected to one end of the guide rod 5. A pair of air holes 502 are opened at one end of the guide rod 5. The air pipes 501 and the air holes 502 are connected. A cleaning brush 503 is rotatably connected to the bottom of one end of the guide rod 5. Multiple threaded bolts 13 are threadedly connected to the solid material tray 10. A guide rod 12 is fixedly connected to the top of the solid material tray 10. A guide hose 9 is fixedly connected to the top of the guide rod 12. A replenishment tank 8 is fixedly connected to the middle of one side of the base plate 1. One end of the guide hose 9 is fixed to the replenishment tank 8. Polishing box 2 A compression block 26 is fixedly connected to the top of the inner part of the polishing box 2. The compression block 26 is telescopic. The inner ring of the compression block 26 is fixedly connected to the connecting shaft 203 at the bottom of the polishing disc 11. The top of the polishing box 2 has multiple hopper holes 25 in a ring shape. The inner ring of the cover plate 201 has multiple discharge holes 202. A receiving tray 30 is fixedly connected inside the polishing box 2. The other end of the replenishing tank 8 is inserted into the receiving tray 30 through a connecting pipe. The receiving tray 30 is located at the bottom of the multiple hopper holes 25. A pressure sensor (not shown) is installed between the compression block 26 and the connecting shaft 203 at the bottom of the polishing disc 11. When the solid material tray 10 contacts the polishing disc 11, the polishing disc 11 descends, and the compression block 26 compresses. The pressure information is fed back, which can then adjust the pressure of the solid material tray 10. The replenishment tank 8 contains a large amount of chemical polishing agent, which is delivered to the drainage hose 9 by its own pump. Then, it flows into the polishing disc 11 through the inner ring of the solid material tray 10, transferring the chemical polishing agent to the inner ring of the cover plate 201. When the polishing disc 11 rotates, it will inevitably generate centrifugal force, transferring the chemical polishing agent to the outer ring of the cover plate 201. This allows the chemical polishing agent to flow into the receiving tray 30 after passing through the discharge hole 202 (the discharge hole 202 corresponds to the hopper hole 25. The chemical polishing agent is centrifuged by the rotation of the polishing disc 11 to the edge of the polishing disc 11, and then overflows into the hopper hole 25 through the edge of the polishing disc 11). After repeated suction and filtration by the replenishment tank 8, the solution is reused. Meanwhile, during this process, the air pump 4 introduces gas through two air pipes 501 into the air hole 502. The gas then acts on the surface of the polishing disc 11 through the air hole 502, blowing the chemical polishing agent in the bottom area of ​​the guide rod 5 and extending the action time of some of the chemical polishing agent on the polishing disc 11. During this process, the drive device (motor) on one side of the guide rod 5 is turned on, thereby driving the cleaning brush 503 to rotate. When the cleaning brush 503 rotates, it quickly cleans the chemical polishing agent stuck around the abrasive strip 19, moves the position of the chemical polishing agent, and expands the application area of ​​the chemical polishing agent.

[0021] Furthermore, a fixed plate 27 is fixedly installed at the top center of the polishing box 2. Multiple distribution rails 28 are provided on the fixed plate 27, arranged in a ring on the fixed plate 27. These distribution rails are divided into multiple groups, each group of which has an arc shape. Each abrasive strip 19 corresponds vertically to each distribution rail 28. One end of each abrasive strip 19 is made of metal. A slider 32 is slidably connected to each distribution rail 28. A magnet 29 is threaded onto the slider 32, and a washer 31 is fitted onto the bottom of the magnet 29. The slider 32 rises as it rotates via the magnet 29. After the magnet 29 contacts the washer 31, the washer 31 locks into the fixed plate 27, and the top of the slider 32 contacts the bottom of the washer 31, thus locking the slider 32 in place. On the distribution rail 28, the slider 32 is fixed together with the fixed plate 27 via the distribution rail 28; the polishing box 2, the fixed plate 27, and the cover plate 201 are all made of aluminum alloy; each magnet 29 is selected at a different position on the distribution rail 28 so that the magnet 29 can attract the abrasive strip 19 in motion. The metal sheet at one end of the abrasive strip 19 changes its temporary angle due to the attraction of the magnet 29, so that one end of the abrasive strip 19 and the magnet 29 are softly fixed together. In this way, the angle change of the abrasive strip 19 when it rotates with the polishing plate 11 is limited by the magnet 29, so that the abrasive strip 19 can maintain contact with the LBO crystal for as long as possible during the change, and obtain different positions of the abrasive strip 19 to obtain a higher precision polishing effect.

[0022] The polishing method required for LBO crystal ultra-smooth polishing equipment includes the following operating steps: a. Installation preparation procedures: First, the LBO crystals are manually selected. Then, the selected LBO crystals are placed into the protruding cavity 14 inside the solid material tray 10. Next, each threaded bolt 13 is manually placed into the solid material tray 10. Then, the threaded bolt 13 is tightened so that the bottom of the threaded bolt 13 presses against the LBO crystal, so that the bottom of the LBO crystal is exposed to the bottom of the solid material tray 10, ensuring that the polished surface is fully exposed. Then, it is fixed to the lifting arm 7 with positioning screws. b. Calibration and positioning process: The second motor 22 is started to rotate, causing the polishing disk 11 to rotate at a low speed. The contact feedback between the compression block 26 and the polishing disk 11 is used to adjust the downward pressure of the solid material disk 10 in real time, so that the LBO crystal remains axially stable on the protrusion cavity 14. c. Dynamic polishing process: The second motor 22 is turned on to drive the polishing disc 11 to rotate at a high speed. Then, the cylinder 18 is driven to descend, causing the lifting arm 7 to descend. During the descent of the lifting arm 7, the LBO crystal and the surface of the polishing disc 11 come into contact and the descent stops. At the same time, the first motor 15 is turned on to rotate, causing the reciprocating screw 16 to rotate and move the lifting arm 7 on the guide rail 6, so that the LBO crystal can contact different areas of the polishing disc 11. During this process, the chemical polishing agent inside the liquid tank 8 is delivered to the inner ring of the solid material disc 10 through the drainage hose 9 and then drained onto the polishing disc 11. The chemical polishing agent, the polishing disc 11 and the abrasive strip 19 interact with each other to achieve nanoscale surface roughness control. d, Polishing process for linear variants: When the LBO crystal comes into contact with the abrasive strip 19, the abrasive strip 19 is slightly rotated on the polishing disk 11. This causes the abrasive strip 19 to rotate with the polishing disk 11, thus changing the sweeping range of the arc motion generated by the abrasive strip 19. This allows the abrasive strip 19 to maintain contact with the LBO crystal for as long as possible during the change, and the polishing angle of the abrasive strip 19 is changed, increasing the contact area between the LBO crystal surface and the abrasive strip 19, making the LBO crystal smoother overall. e, a randomized variation of the polishing process: When multiple magnets 29 are manually installed on the fixed plate 27, the magnets 29, after being tightened, squeeze the pad 31, causing the slider 32 to be relatively fixed on the distribution rail 28. Each magnet 29 is positioned at a different location on the distribution rail 28, allowing the magnet 29 to attract the abrasive strip 19 in motion. The metal sheet at one end of the abrasive strip 19 changes its angle temporarily due to the attraction of the magnet 29, so that one end of the abrasive strip 19 and the magnet 29 are softly fixed together. In this way, the angle change of the abrasive strip 19 when it rotates with the polishing plate 11 is limited by the magnet 29. Then, multiple magnets 29 are randomly assigned to different positions on the distribution rail 28 to obtain a higher precision polishing effect. f. Subsequent cleaning procedures: When the polishing disc 11 rotates, it generates centrifugal force, which transfers the chemical polishing agent to the inner ring of the cover plate 201. The chemical polishing agent flows into the receiving tray 30 after passing through the discharge hole 202. It is then repeatedly drawn and filtered by the replenishment tank 8 and reused. At the same time, the air pump 4 acts on the surface of the polishing disc 11 through the air hole 502 via the pipeline, blowing the chemical polishing agent in the bottom area of ​​the guide rod 5, thus extending the contact time of some of the chemical polishing agent on the polishing disc 11.

[0023] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.

[0024] Although embodiments of the invention have been shown and described, it will be understood by those skilled in the art that various changes, modifications, substitutions and alterations can be made to these embodiments without departing from the principles and spirit of the invention, the scope of which is defined by the appended claims and their equivalents.

Claims

1. An LBO crystal ultra-smooth polishing device, comprising a base plate (1), characterized in that: A polishing box (2) is fixedly connected to the top of the base plate (1). A cover plate (201) is detachably connected to the top of the polishing box (2). A polishing disc (11) is rotatably connected to the middle of the polishing box (2). Multiple abrasive strips (19) are movably connected to the top of the polishing disc (11). The multiple abrasive strips (19) are arranged in a ring on the polishing disc (11). The multiple abrasive strips (19) are divided into multiple groups. Each group of abrasive strips (19) has an arc shape. The length of each group of abrasive strips (19) gradually decreases from the outer edge of the polishing disc (11) to the axis. A storage area (20) is formed between two adjacent abrasive strips (19) in each group to allow the chemical abrasive to be retained. A material feeding area (21) is formed between two adjacent groups of abrasive strips (19) for the polishing disc (11) to generate centrifugal force for material discharge. Multiple threaded bolts (13) are threadedly connected to the solid material disc (10). A guide rail (6) is fixedly connected to one side of the top of the base plate (1). A lifting arm (7) is slidably connected to the guide rail (6). A material tray (10) is suspended at one end of the lifting arm (7). Multiple protruding material cavities (14) are opened on the material tray (10) for placing materials.

2. The LBO crystal ultra-smooth polishing device according to claim 1, characterized in that: A second motor (22) is fixedly installed on one side inside the polishing box (2). A first helical gear (23) is sleeved on the output shaft of the second motor (22). A connecting shaft (203) is fixedly connected to the bottom of the polishing disc (11). The connecting shaft (203) and the polishing box 2 are rotatably connected. A second helical gear (24) is fixedly connected to the bottom of the connecting shaft (203). The first helical gear (23) and the second helical gear (24) mesh and drive each other.

3. The LBO crystal ultra-smooth polishing device according to claim 2, characterized in that: A reciprocating screw (16) is rotatably connected to the guide rail (6), and a spring (17) is sleeved on the reciprocating screw (16). A first motor (15) is fixedly connected to one end of the guide rail (6). The output shaft of the first motor (15) is connected to the reciprocating screw (16). A cylinder (18) is slidably connected to the top of one end of the guide rail (6). The top of the cylinder (18) is fixedly connected to the lifting arm (7). The reciprocating screw (16) and the lifting arm (7) are threadedly connected.

4. The LBO crystal ultra-smooth polishing device according to claim 3, characterized in that: An installation plate (3) is fixedly installed on the other side of the top of the base plate (1). An air pump (4) is fixedly connected to the top of the installation plate (3). A guide rod (5) is fixedly connected to one end of the air pump (4). A pair of air pipes (501) are fixedly connected to one end of the guide rod (5). A pair of air holes (502) are opened at one end of the guide rod (5). The air pipes (501) and the air holes (502) are connected. A cleaning brush (503) is rotatably connected to the bottom of one end of the guide rod (5).

5. The LBO crystal ultra-smooth polishing device according to claim 4, characterized in that: The top of the solid material tray (10) is fixedly connected to a guide rod (12), the top of the guide rod (12) is fixedly connected to a drainage hose (9), the middle of one side of the base plate (1) is fixedly connected to a replenishment tank (8), and one end of the drainage hose (9) is fixed to the replenishment tank (8).

6. The LBO crystal ultra-smooth polishing device according to claim 5, characterized in that: A compression block (26) is fixedly connected to the top of the polishing box (2). The inner ring of the compression block (26) is fixedly connected to the bottom connecting shaft (203) of the polishing disc (11). The top of the polishing box (2) is provided with multiple hopper holes (25) in a ring shape. The inner ring of the cover plate (201) is provided with multiple discharge holes (202). A receiving plate (30) is fixedly connected inside the polishing box (2). The receiving plate (30) is located at the bottom of the multiple hopper holes (25).

7. The LBO crystal ultra-smooth polishing device according to claim 6, characterized in that: A fixed plate (27) is fixedly installed at the top center of the polishing box (2). Multiple distribution rails (28) are provided on the fixed plate (27). The multiple distribution rails (28) are arranged in a ring on the fixed plate (27). The multiple distribution rails (28) are divided into multiple groups. Each group of distribution rails (28) is arc-shaped. Each abrasive strip (19) corresponds to each distribution rail (28) vertically. One end of the abrasive strip (19) is made of metal.

8. The LBO crystal ultra-smooth polishing device according to claim 7, characterized in that: Each of the distribution rails (28) is slidably connected to a slider (32), and a magnet (29) is threaded onto the slider (32). A pad (31) is fitted onto the bottom of the magnet (29). After the slider (32) rotates and rises by the magnet (29) and contacts the pad (31), it is fixed together with the fixed plate (27).

9. The LBO crystal ultra-smooth polishing device according to claim 8, characterized in that: The polishing box (2), the fixing plate (27), and the cover plate (201) are all made of aluminum alloy.

10. The polishing method required for polishing using the LBO crystal ultra-smooth polishing apparatus according to any one of claims 1-9, characterized in that: The following steps are included: a. Installation preparation procedures: First, the LBO crystals are manually selected. Then, the selected LBO crystals are placed into the protruding cavity (14) inside the solid material tray (10). Next, each threaded bolt (13) is manually placed into the solid material tray (10). Then, the threaded bolt (13) is tightened so that the bottom of the threaded bolt (13) presses against the LBO crystal, so that the bottom of the LBO crystal is exposed to the bottom of the solid material tray (10), ensuring that the polished surface is fully exposed. Then, it is fixed to the lifting arm (7) with positioning screws. b. Calibration and positioning process: The second motor (22) is started to rotate, so that the polishing disk (11) rotates at a low speed. The pressure of the solid disk (10) is adjusted in real time by the contact feedback between the compression block (26) and the polishing disk (11), so that the LBO crystal remains axially stable on the protrusion cavity (14). c. Dynamic polishing process: The second motor (22) is turned on to drive the polishing disc (11) to rotate at a high speed. Then the cylinder (18) is driven to descend, causing the lifting arm (7) to extend and descend. At the same time, the first motor (15) is turned on to rotate, causing the reciprocating screw (16) to rotate and move the lifting arm (7) on the guide rail (6), so that the LBO crystal can contact the polishing disc (11) in different areas. During this process, the chemical polishing agent inside the liquid tank (8) is transported to the inner ring of the solid material plate (10) by the drainage hose (9) and then drained to the polishing disc (11). The chemical polishing agent, the polishing disc (11), and the abrasive strip (19) interact with each other. d, Polishing process for linear variants: After the LBO crystal comes into contact with the abrasive strip (19), the abrasive strip (19) is rotated with the polishing disc (11), and the sweeping range of the arc motion generated by the abrasive strip (19) is changed, so that the abrasive strip (19) can maintain contact with the LBO crystal for as long as possible during the change, and the polishing angle of the abrasive strip (19) is changed. e, a randomized variation of the polishing process: When multiple magnets (29) are manually installed on the fixed plate (27), the magnets (29) squeeze the pad (31) after being tightened, so that the slider (32) is relatively fixed on the distribution rail (28). The metal sheet at one end of the abrasive strip (19) is attracted by the magnet (29) and changes its temporary angle, so that one end of the abrasive strip (19) and the magnet (29) are softly fixed together. Then, multiple magnets (29) are randomly distributed to different positions on the distribution rail (28). f. Subsequent cleaning procedures: When the polishing disc (11) rotates, it generates centrifugal force, causing the chemical polishing agent to flow into the receiving disc (30) after passing through the discharge hole (202). After being repeatedly drawn and filtered by the replenishment tank (8), it is reused. At the same time, the air pump (4) sprays gas into the inside of the guide rod (5) during this process. The gas then passes through the air hole (502) and acts on the surface of the polishing disc (11), blowing the chemical polishing agent in the bottom area of ​​the guide rod (5).

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