A data processing analysis system for quantitative monitoring of overlay performance of a projection lithography machine

By installing an off-axis camera and calibration plate in a projection lithography machine, combined with a digital twin model, real-time monitoring and compensation of the workpiece stage position were achieved, solving the problem of difficult traceability of overlay deviation in existing technologies and improving the positioning accuracy and process stability of the lithography machine.

CN122151449APending Publication Date: 2026-06-05ZHIFENGQI (SUZHOU) OPTOELECTRONICS TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202610555469.4
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2026-04-24
Publication Date
2026-06-05

AI Technical Summary

Technical Problem

In existing projection lithography machines, the position monitoring of the workpiece stage relies on internal sensors and lacks independent third-party verification, making it difficult to trace and compensate for overlay deviations, resulting in insufficient system reliability.

Method used

An off-axis camera and calibration plate are installed on the workpiece stage to monitor the position and orientation of the workpiece stage in real time. The focal plane position in the Z direction is verified by visual imaging technology, and compensation parameters are generated. Data analysis and optimization are then performed in conjunction with a digital twin model.

Benefits of technology

It improves the positioning accuracy and process stability of the lithography machine, and can provide real-time warnings and automatic compensation for workpiece stage position drift, thereby improving overlay accuracy and product yield.

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Abstract

The application discloses a kind of for projection photolithography machine overlay performance quantitative monitoring data processing analysis system, belong to semiconductor photolithography equipment control technical field, comprising: perception module real-time acquisition position perception data;Compensation module is analyzed to position perception data, obtains position deviation data;According to position deviation data generation position compensation parameter and issue to photolithography machine motion control system;Data arrangement module is used for data arrangement analysis, obtains standard digital twin model;Standard digital twin model is adjusted based on the monitoring material data and field equipment information of user, obtains individual digital twin model;Data analysis module is used for monitoring material data analysis, and monitoring material data is simulated by individual digital twin model, and obtains optimization analysis data, and based on optimization analysis data, compensation module is optimized and adjusted;Through individual digital twin model, operation and maintenance simulation is carried out, and the best operation and maintenance scheme is obtained.
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