High resolution pattern design method for mlcc fabrication
By employing a high-resolution pattern design method, independently designing halftone dots, and combining hexagonal structures with their diagonal angle control, the problems of halftone dot breakage and halftone wall adhesion in the MLCC printing process were solved, achieving high-precision printing and improving the consistency and reliability of MLCC electrodes.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- GUANGDONG ZHONGXIN ELECTRONIC TECHNOLOGY CO LTD
- Filing Date
- 2026-03-10
- Publication Date
- 2026-06-05
AI Technical Summary
In the current technology for MLCC manufacturing, gravure printing is prone to problems such as pattern end breakage, inconsistent dot size, and unstable screen wall structure, which can lead to defects such as smudging and missing prints during the printing process.
Employing a high-resolution pattern design method, the method involves independently designing halftone dots and arranging them spatially at intervals on a planar basis. By combining hexagonal structures and controlling their diagonal angles, the first, second, and third halftone dots are designed to form dividing halftone walls. Resolutions of up to 6400 dpi and 3200 dpi are achieved using vector or pixel methods.
It improves printing resolution, enhances printing leveling, reduces printing defects, improves the consistency and reliability of internal electrodes in MLCCs, and significantly improves product quality.
Smart Images
Figure CN122156382A_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of multilayer ceramic capacitor (MLCC) manufacturing technology, and more specifically, to a high-resolution pattern design method for designing internal electrode patterns in MLCCs. This method improves printing resolution by optimizing the structural layout of dots in the pattern, thereby effectively avoiding defects such as ink bleeding and missing prints during the printing process. Background Technology
[0002] Multilayer ceramic capacitors (MLCCs) are fundamental components widely used in electronic devices, and their performance is closely related to the precision of their internal electrodes. In the MLCC manufacturing process, the internal electrodes are typically formed into a conductive paste film on a ceramic green sheet using gravure printing, requiring the pattern to have extremely high resolution and edge sharpness.
[0003] With the development of printed electronics technology, gravure printing is widely used for the preparation of high-precision electrode patterns. Its basic principle is to utilize the cell structure on the surface of the gravure roller to carry electronic ink, and then transfer the pattern onto the substrate via an impression roller. The pattern precision of the gravure roller directly determines the printing quality.
[0004] The traditional process for creating gravure roller patterns typically involves: obtaining pattern data from CAD drawings, exposing the pattern using a laser exposure machine in conjunction with a raster image processor (RIP), and then etching and chrome plating to form the final pattern. However, traditional methods are prone to problems such as pattern end breakage, inconsistent dot size, and unstable halftone wall structure when processing CAD data. These problems are particularly prominent in high-viscosity electronic ink printing, easily leading to defects such as smudging and missed printing during the printing process.
[0005] Therefore, improving the structural accuracy of halftone dots and halftone walls during the pattern design stage is key to improving the printing quality of MLCCs. Summary of the Invention
[0006] The purpose of this invention is to provide a high-resolution pattern design method for MLCC manufacturing, so as to solve the problems mentioned in the background art.
[0007] To achieve the above objectives, the present invention provides the following technical solution:
[0008] A high-resolution pattern design method for MLCC manufacturing includes the following steps:
[0009] S10: Convert the pattern drawing to an image file format;
[0010] S20: Load the converted image file into the design program and design the multiple dots that make up the pattern;
[0011] In step S20, the grid points are designed independently on a planar basis and are spatially spaced apart from adjacent grid points to form a dividing grid wall.
[0012] As a further aspect of the present invention: in step S20, the design of the dots adopts either a vector method or a pixel method.
[0013] As a further aspect of the present invention: step S20 includes:
[0014] S21: The first dot design stage for the pattern border area;
[0015] S22: The second dot design stage for the inner area of the pattern border;
[0016] The second dot has a planar hexagonal shape.
[0017] As a further aspect of the present invention, the tilt angle of the two diagonals of the second dot is controlled within the range of 25° to 35°.
[0018] As a further aspect of the present invention: the shape and size of the first halftone dot are different from those of the second halftone dot, and are adaptively adjusted according to the outline of the pattern border, including but not limited to polygonal structures such as triangular and quadrilateral shapes, to enhance the smoothness of the pattern edges.
[0019] As a further aspect of the present invention, it also includes the step of designing a third dot between the first dot and the second dot, wherein the shape and size of the third dot are set according to the space between the first dot and the second dot.
[0020] As a further aspect of the present invention: the resolution of the vector method design can reach 6400 dpi or higher, and the resolution of the pixel method design can reach 3200 dpi or higher.
[0021] As a further aspect of the present invention: the pattern drawing is a dwg format file, and the image file is in tiff or bmp format.
[0022] Compared with the prior art, the beneficial effects of the present invention are:
[0023] 1. Improve resolution: By designing the dots independently on a plane and combining the hexagonal structure and its diagonal angle control, high-resolution designs of 12800dpi in the L direction, 6400dpi in the W direction, and 12800dpi in the diagonal direction can be achieved.
[0024] 2. Improved printing leveling: The refined mesh wall structure effectively prevents the adhesion between dots and improves the uniform spreading performance of ink during the printing process;
[0025] 3. Reduce printing defects: Eliminate problems such as dot breakage and screen adhesion from the design stage, significantly reducing defects such as smudging and missing prints during the printing process;
[0026] 4. Improve product reliability: Through high-precision pattern design, the consistency and reliability of the internal electrodes of MLCC are ultimately improved, thereby enhancing the overall product quality. Attached Figure Description
[0027] Figure 1 This is a flowchart of the high-resolution pattern design method in an embodiment of the present invention.
[0028] Figure 2 This is a detailed flowchart of the site design process in an embodiment of the present invention.
[0029] Figure 3 This is a schematic diagram of the pattern structure composed of dots and dividing grid walls in an embodiment of the present invention.
[0030] Figure 4 This is a schematic diagram of the hexagonal grid dots and the tilt angles of their two diagonals in an embodiment of the present invention.
[0031] Figure 5 This is a schematic diagram of the network structure layout in different areas according to an embodiment of the present invention.
[0032] Figure 6 This is a schematic diagram of the optimized diagonal lines between grid points and the grid wall structure in an embodiment of the present invention.
[0033] Figure 7 This is a schematic diagram showing the state of the printed pattern without smudging at the end in an embodiment of the present invention.
[0034] Figure 8 This is a schematic diagram of the dot pattern designed using a vector method in an embodiment of the present invention.
[0035] Figure 9 This is a schematic diagram of halftone dots designed using a pixel-based method in an embodiment of the present invention.
[0036] Figure 10 This is a diagram illustrating the diagonal lines of halftone dots and the adhesion of halftone walls during printing of traditional graphic designs.
[0037] Figure 11 This is a diagram illustrating the blurring effect that occurs at the ends of traditional graphic designs during printing.
[0038] In the diagram: 10, pattern; 100, halftone dot; 101, first halftone dot; 102, second halftone dot; 103, third halftone dot; 200, dividing the halftone wall. Detailed Implementation
[0039] The technical solution of this application will be further described in detail below with reference to specific embodiments.
[0040] The embodiments of this application are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain this application, and should not be construed as limiting this application.
[0041] Please see Figure 1 In one embodiment of the present invention, a high-resolution pattern design method for MLCC manufacturing includes the following steps:
[0042] S10. Convert the pattern drawing into an image file format;
[0043] S20. Load the converted image file into the design program and design the multiple dots 100 that make up the pattern 10 on the image.
[0044] In step S10, the following process can be performed: using a drawing processing program, the pattern drawings in formats such as dwg files (CAD programs) provided by the customer are converted into image file formats.
[0045] Next, in step S20, the format-converted image file can be loaded into the design program, and multiple dots 100 constituting the pattern 10 on the image can be designed.
[0046] At this point, the design program can be either Illustrator or Photoshop. If using Illustrator, the halftone dots 100 can be designed using vector graphics; if using Photoshop, the halftone dots 100 can be designed using pixels.
[0047] like Figure 9 As shown, a pixel-based dot matrix design of 100 pixels can typically achieve a resolution of up to 3200 dpi; while... Figure 8 As shown, the vector-based design can achieve a resolution of up to 6400 dpi.
[0048] Bitmap (pixel) method designs pattern 10 by dividing regions into quadrilaterals of specific shapes rather than lines. Therefore, when pattern 10 is implemented on a gravure roller, its shape is prone to becoming uneven and the resolution is relatively low. In contrast, vector method designs halftone dots that can ensure constant resolution by forming the outline of halftone dots 100 with lines, thereby completing the pattern design. Therefore, it can achieve the high precision required by printed electronics.
[0049] However, the vector method described above creates the boundary between 100 dots by thickening the outline of the lines, thus forming a wall. For example... Figure 11 As shown, this practice will reduce the resolution of the 100-dot boundary area, ultimately resulting in... Figure 10 As shown, this will cause printing problems such as ink bleeding and partial missing prints in pattern 10.
[0050] According to the design method of the present invention, the feature is that in the above step S20, the above-mentioned grid points 100 are designed independently on a plane and arranged spatially at intervals with adjacent grid points 100, thereby forming a dividing grid wall 200.
[0051] In other words, the present invention does not first design multiple dots 100 of pattern 10 using lines and then thicken the boundaries between dots; instead, it designs multiple dots 100 independently in planar units and disperses these dots in space to form dividing walls 200.
[0052] Therefore, compared with conventional vector methods, the resolution can be further improved, enabling more precise designs. At the same time, the spacing of the etched mesh walls can be made narrower than in a 6400 dpi design, thus helping to improve leveling during printing.
[0053] On the other hand, such as Figure 2 As shown, step S20 above may include:
[0054] S21, Design of the first dot in the border area of pattern 10
[0055] S22. Design the second halftone dot in the inner area of the border of the above pattern 10.
[0056] First, the first dot design step S21 is used for the border area of pattern 10, while the second dot design step S22 is used for the inner border area of pattern 10. At this time, the first dot 101, which is the border area of pattern 10, and the second dot 102, which is the inner border area, can be designed to have different shapes and sizes.
[0057] Compared to the second halftone dot 102, which is designed with a uniform shape, the first halftone dot 101, designed in the border area, adopts a variety of shapes and sizes. This allows for the creation of smooth outlines when designing diagonals, circles, curves, etc., without any staggered effect even when viewed under magnification, thereby improving printability.
[0058] In traditional design methods, the halftone dots (cells) in the border area and the inner border area use the same structural design, and the halftone dots in the border area are often cut along the outline. In contrast, the method of this invention establishes a significant difference in print quality.
[0059] For example, the first halftone dot 101 and the second halftone dot 102 can be arranged at different angles. That is, compared to the uniformly shaped second halftone dot 102, the first halftone dot 101 can be designed into various shapes according to factors such as the shape of the pattern 10. Figure 5 As shown, by designing it as a triangular or quadrilateral shape, the stepped effect in the border area can be effectively suppressed, thereby promoting the improvement of print quality.
[0060] Furthermore, the first halftone dot 101 and the second halftone dot 102 may have polygonal structures. In this case, the polygonal structures of the first halftone dot 101 and the second halftone dot 102 may be implemented as different polygonal structures.
[0061] In this case, the second halftone dots 102 are arranged in a uniform polygonal structure, while the first halftone dots 101, which serve as the border area, are designed with a different polygonal structure, thereby improving the leveling of the printed pattern.
[0062] A preferred embodiment is that the first halftone dot 101 and the second halftone dot 102 can adopt various polygonal structures such as quadrilaterals and hexagons. The most preferred embodiment is that the second halftone dot 102 is evenly arranged in a hexagonal shape, while the first halftone dot 101 on the border area of the outline is configured as a densely arranged quadrilateral or triangular shape smaller than the size of the second halftone dot 102, thereby further improving the printing quality.
[0063] Furthermore, the design method of the present invention may further include a third dot design step of designing a third dot 103 between the first dot 101 and the second dot 102. The third dot 103 may adopt a different shape and size than the first dot 101 and the second dot 102.
[0064] like Figure 5 As shown, the third halftone dot 103 is arranged between the second halftone dot 102, which is evenly arranged in the inner region, and the first halftone dot 101, which belongs to the border region and has a different shape and size from the second halftone dot 102. Since the shapes and sizes of these halftone dots are different and there is no fixed pattern between them, by controlling the halftone dot spacing, in other words, the first halftone dot 101 and the second halftone dot 102 can be naturally connected with a uniform interval, eliminating the sense of discontinuity. Thus, as in the aforementioned embodiment, it helps to improve the printing quality.
[0065] As mentioned above, the third dot 103 is designed to fill the space between the first dot 101 and the second dot 102. It can be constructed in various shapes and sizes according to the specific space between the first dot 101 and the second dot 102, and its arrangement can be different from the first and second dots, allowing for irregular arrangements.
[0066] On the other hand, in the design method of the present invention, the second dot 102 described above can have a planar hexagonal shape as described above. In this case, by means of... Figure 4 As shown, by designing the tilt angle (θ) of the diagonals on both sides of the second dot 102 within the range of 25° to 35°, the resolution in the L direction can be improved in the printing process, and precise micro-patterns can be achieved.
[0067] This means that the resolution can be designed to 12800 dpi between 100 dots and along the diagonal direction. In other words, it can achieve high-resolution operations of 12800 dpi in the L direction, 6400 dpi in the W direction, and 12800 dpi in the diagonal direction. Therefore, it is possible to... Figure 6 As shown, the gaps between units are designed to be narrower than those in the traditional 6400*6400dpi scheme, thereby improving leveling during printing.
[0068] Therefore, because it enables a more precise design than the traditional 6400 dpi vector method, it not only allows for narrower spacing of the mesh walls 200 after subsequent etching processes compared to the 6400 dpi design, but also... Figure 5 and Figure 7 As shown, by improving the problem of adhesion between the diagonals and dividing walls 200 of the dots 100 formed by the pattern 10, the printing quality of the MLCC electrode pattern can be greatly improved, and the defect rate such as printing smudging and local unprinted areas can be minimized during the production process, ultimately significantly improving the quality and reliability of MLCC.
[0069] On the other hand, after the pattern design process is completed and the image file is output according to the design method of the present invention, the laser exposure machine will output a pattern image file that is completely consistent with the screen design through RIP, thereby exposing the outer peripheral surface of the gravure roller.
[0070] After the exposure process is completed using a laser exposure machine, etching (corrosion) is performed to form the pattern. Once the pattern is in a semi-finished state, a chromium layer is formed on the surface of the gravure roller using a chromium plating process to prevent its surface from being corroded.
[0071] At this point, an article with a copper foil plate attached is placed on the surface of the aforementioned intaglio roller, and a pattern is formed by etching the surface of this copper foil plate.
[0072] This high-resolution pattern design method for MLCC manufacturing designs the dots 100 constituting the pattern 10 on a planar basis, spatially spacing each dot 100 to form dividing walls. By limiting the tilt angle of the diagonals of the planar hexagonal dots 100, the resolution of the dots 100 can be significantly improved. This high-resolution design not only improves leveling during printing but also effectively solves the problem of diagonal adhesion between dots and dividing walls, thus greatly improving the printing quality of the MLCC electrode pattern. Simultaneously, it minimizes printing smudging and unprinted areas during production, ultimately significantly improving the quality and reliability of MLCCs.
[0073] The above are merely preferred embodiments of the present invention. It should be noted that those skilled in the art can make several modifications and improvements without departing from the concept of the present invention, and these should also be considered within the scope of protection of the present invention. These will not affect the effectiveness of the implementation of the present invention or the practicality of the patent.
Claims
1. A high-resolution pattern design method for MLCC manufacturing, characterized in that, Includes the following steps: S10: Convert the pattern drawing to an image file format; S20: Load the converted image file into the design program and design the multiple dots that make up the pattern; In step S20, the grid points are designed independently on a planar basis and are spatially spaced apart from adjacent grid points to form a dividing grid wall.
2. The method according to claim 1, characterized in that, In step S20, the design of the dots can be done using either a vector method or a pixel method.
3. The method according to claim 1, characterized in that, Step S20 includes: S21: The first dot design stage for the pattern border area; S22: The second dot design stage for the inner area of the pattern border; The second dot has a planar hexagonal shape.
4. The method according to claim 3, characterized in that, The tilt angle of the two diagonals of the second dot is controlled within the range of 25° to 35°.
5. The method according to claim 3, characterized in that, The shape and size of the first halftone dot are different from those of the second halftone dot, and are adaptively adjusted according to the outline of the pattern border.
6. The method according to claim 3, characterized in that, It also includes the step of designing a third dot between the first dot and the second dot, wherein the shape and size of the third dot are set according to the space between the first dot and the second dot.
7. The method according to claim 2, characterized in that, The resolution designed using the vector method can reach over 6400 dpi, while the resolution designed using the pixel method can reach over 3200 dpi.
8. The method according to claim 1, characterized in that, The pattern drawing is in dwg format, and the image file is in tiff or bmp format.