Radiation resistant target dissolution device
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- DALIAN INSTITUTE OF CHEMICAL PHYSICS CHINESE ACADEMY OF SCIENCES
- Filing Date
- 2024-12-09
- Publication Date
- 2026-06-09
AI Technical Summary
In the prior art, during the use of solvent dissolution devices, due to continuous innovation in the dissolution effect of the target material, the damage of radiation particles generated by the target material during the dissolution process to surrounding components has been overlooked. This results in the components being affected by radiation, affecting their normal use.
The tank, made of radiation-resistant material, is designed with a tank support and heating base. Through a combination of heat-conducting metal strips and heat-conducting plates, it isolates external radiation and ensures uniform heating inside the tank. The tank, made of PEEK material, is also designed with a base, tank support, and heating base.
This achieves radiation resistance for the tank while ensuring uniform heating inside the tank, preventing damage to components due to radiation, and improving the radiation resistance and dissolution efficiency of the target melting device.
Smart Images

Figure CN122177537A_ABST