A same-track dual-vehicle asynchronous photolithography system and method

Abstract

This invention provides a dual-carriage asynchronous lithography system and method for achieving laser direct-write imaging on uneven exposure surfaces, thereby improving the accuracy of laser direct-write imaging. The method includes: controlling a scanning carriage to run along a scanning guide rail at a preset low speed; recording the absolute coordinates and corresponding Z-axis height information in real time using a photoelectric displacement sensor to generate a three-dimensional topography raw dataset; calculating the Z-axis topography compensation value C(Xi): C(Xi) = Z_raw(Xi) - Z_ref; during the exposure stage, when the lithography carriage reaches the coordinate point Xi, a reverse adjustment instruction is given to the Z-axis actuator based on C(Xi), causing the ΔZ_rail(Xi) to algebraically cancel out in the physical bearing path and the algorithm compensation instruction.

Description

Technical Field

[0001] This invention relates to the field of laser direct-write imaging technology, and in particular to a dual-track asynchronous lithography system and method. Background Technology

[0002] Laser direct writing imaging devices in related technologies (such as the laser direct plate-making device for planar screen printing plates disclosed in application number: 201310084860.3) control the laser array to scan the photosensitive coating on the exposure surface back and forth in a preset horizontal direction in the plane containing the X and Y axes.

[0003] The applicant discovered that in the relevant technology, the distance between each laser in the laser array and the vertical direction of the exposure surface is fixed. If the exposure surface is uneven, or the exposure surface itself is uneven, the size of the light spot on the exposure surface will change due to the change in object distance, resulting in a loss of exposure accuracy. Alternatively, existing laser direct writing imaging equipment cannot be used for exposure imaging on uneven exposure surfaces at all. Summary of the Invention

[0004] This invention provides a dual-track asynchronous lithography system and method for achieving laser direct-write imaging on uneven exposure surfaces, thereby improving the accuracy of laser direct-write imaging.

[0005] The first aspect of this invention provides a dual-track asynchronous lithography system, which may include:

[0006] A scanning carriage is slidably mounted on a scanning guide rail and equipped with a laser displacement sensor for performing Z-axis terrain scanning on the substrate to obtain three-dimensional topographic data; the scanning guide rail is equipped with a photoelectric displacement sensor for detecting the position of the scanning carriage and the lithography carriage.

[0007] A lithography carriage is slidably mounted on the scanning guide rail and is used to carry a single-axis micro-displacement device array consisting of multiple arrayed single-axis micro-displacement device units; the single-axis micro-displacement device unit is used to adjust the position of the laser source in the Z-axis direction;

[0008] The host computer is electrically connected to the scanning carriage, the lithography carriage, and the photoelectric displacement sensor, respectively; the host computer is configured as follows:

[0009] Receive the absolute coordinate information of the X and Y planes fed back by the photoelectric displacement sensor;

[0010] The scanning carriage and the lithography carriage are controlled to run asynchronously along the scanning guide rail in a time-sharing manner.

[0011] Based on the three-dimensional topography data and absolute coordinate information obtained by the scanning carriage, a Z-axis adjustment command is generated and issued when the lithography carriage moves to the physical position corresponding to the absolute coordinate information, so as to adjust the position of the laser source in the Z-axis direction.

[0012] Optionally, as a possible implementation, in this embodiment of the invention, the original height data of the three-dimensional topography at the absolute coordinate point Xi is denoted as Z_raw(Xi), which satisfies the measurement model: Z_raw(Xi) = H_sub(Xi) + ΔZ_rail(Xi); H_sub(Xi) is the height of the actual surface micro-undulations of the substrate at the coordinate point Xi, and ΔZ_rail(Xi) is the static mechanical deformation of the precision guide rail at the coordinate point Xi; the host computer uses a preset ideal focal plane reference height Z_ref as a reference; the generation of Z-axis adjustment commands based on the three-dimensional topography data and the absolute coordinate information obtained by the scanning carriage includes:

[0013] Calculate the Z-axis shape compensation value C(Xi): C(Xi) = Z_raw(Xi) - Z_ref; During the exposure stage, when the lithography carriage moves to the coordinate point Xi, the Z-axis actuator is driven to make reverse adjustment based on the instruction of C(Xi), so that ΔZ_rail(Xi) is algebraically offset in the physical bearing path and the algorithm compensation instruction.

[0014] Optionally, as a possible implementation, in this embodiment of the invention, the generation of Z-axis adjustment commands based on the three-dimensional topography data acquired by the scanning carriage and the absolute coordinate information may further include:

[0015] The Z-axis topography compensation value C(Xi) is encapsulated into a lookup table for the lithography carriage to call in real time.

[0016] Optionally, as a possible implementation, in this embodiment of the invention, encapsulating the Z-axis topography compensation value C(Xi) into a lookup table includes:

[0017] The original three-dimensional topography data is spatially resampled according to the feedback step size of the photoelectric displacement sensor to obtain an equidistant height sequence; high-frequency noise is suppressed on the equidistant height sequence using a cubic spline interpolation algorithm or a Gaussian smoothing filter algorithm to generate a net topography data sequence; C(Xi) is calculated based on the net topography data sequence to match the resolution of the generated lookup table with the resolution of the grating ruler.

[0018] Optionally, as a possible implementation, in this embodiment of the invention, controlling the scanning carriage and the lithography carriage to operate asynchronously and in a time-division manner along the scanning guide rail includes:

[0019] During the mapping phase, the lithography carriage is controlled to be in a servo anti-vibration lock state, and the scanning carriage is controlled to run along the scanning guide rail at a preset low speed to complete the full-area Z-axis terrain scanning. After the scanning is completed, the scanning carriage is controlled to return to the safe position and lock.

[0020] During the exposure stage, the scanning carriage is kept in a locked state. After the host computer completes the topography data calculation and compensation surface generation, it controls the lithography carriage to unlock and start high-speed reciprocating scanning exposure.

[0021] Optionally, as a possible implementation, the parallel-track dual-car asynchronous lithography system in this embodiment of the invention may further include: a single gantry frame, the scanning guide rail being fixedly mounted on the single gantry frame, and the photoelectric displacement sensor being a grating ruler mounted on the parallel scanning guide rail.

[0022] A second aspect of this invention provides a method for asynchronous lithography using dual-track lithography, which may include:

[0023] The scanning carriage is controlled to run along the scanning guide at a preset low speed. The absolute coordinates and corresponding Z-axis height information are recorded in real time by the photoelectric displacement sensor to generate a raw dataset of three-dimensional morphology.

[0024] Calculate the Z-axis shape compensation value C(Xi): C(Xi) = Z_raw(Xi) - Z_ref; During the exposure stage, when the lithography carriage moves to the coordinate point Xi, the Z-axis actuator is driven to make reverse adjustment based on the instruction of C(Xi), so that ΔZ_rail(Xi) is algebraically offset in the physical bearing path and the algorithm compensation instruction.

[0025] Optionally, as a possible implementation, in this embodiment of the invention, the step of generating a Z-axis adjustment command based on the three-dimensional topography data acquired by the scanning carriage and the absolute coordinate information further includes:

[0026] The Z-axis topography compensation value C(Xi) is encapsulated into a lookup table for the lithography carriage to call in real time.

[0027] Optionally, as a possible implementation, in this embodiment of the invention, encapsulating the Z-axis topography compensation value C(Xi) into a lookup table includes:

[0028] The original three-dimensional topography data is spatially resampled according to the feedback step size of the photoelectric displacement sensor to obtain an equally spaced height sequence;

[0029] The equally spaced height sequence is subjected to high-frequency noise suppression using a cubic spline interpolation algorithm or a Gaussian smoothing filter algorithm to generate a net morphology data sequence.

[0030] The C(Xi) is calculated based on the net morphology data sequence and encapsulated as a C(Xi) lookup table.

[0031] Optionally, as a possible implementation, the asynchronous lithography method of dual-track lithography in this embodiment of the invention may further include: adjusting the feedback step size of the photoelectric displacement sensor and generating a C(Xi) lookup table with a resolution matching the feedback step size of the photoelectric displacement sensor.

[0032] As can be seen from the above technical solutions, the embodiments of the present invention have the following advantages:

[0033] In this embodiment of the invention, the scanning carriage acquires the 3D surface topography of the substrate surface of the exposure surface in advance. Then, based on the 3D topography data and the absolute coordinate information, a Z-axis adjustment command is generated. This Z-axis adjustment command is issued when the lithography carriage moves to the physical position corresponding to the absolute coordinate information. This allows for dynamic adaptation of the focal point (i.e., laser spot) position of the laser source array based on the 3D surface topography of the substrate surface of the exposure surface. This avoids the loss of exposure accuracy caused by changes in the spot size of the exposure surface due to changes in object distance, enabling exposure imaging on uneven exposure surfaces and expanding the application range of laser direct-write imaging. Furthermore, by utilizing the common-mode property of the consistent static mechanical deformation experienced by the scanning carriage and the lithography carriage when they pass the same position on the precision guide rail, the mechanical errors of the precision guide rail are offset in the compensation calculation, further improving the accuracy of laser direct-write imaging. Attached Figure Description

[0034] Figure 1 This is a schematic diagram of one embodiment of a dual-track asynchronous lithography system according to the present invention;

[0035] Figure 2 This is a schematic diagram of a specific application embodiment of a dual-track asynchronous lithography system according to an embodiment of the present invention;

[0036] Figure 3 This is a schematic diagram of an embodiment of the asynchronous photolithography method using dual-track lithography in this invention. Detailed Implementation

[0037] To enable those skilled in the art to better understand the present invention, the technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort should fall within the scope of protection of the present invention.

[0038] The terms "first," "second," "third," "fourth," etc., used in the specification, claims, and accompanying drawings of this invention are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments described herein can be implemented in orders other than those illustrated or described herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover a non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

[0039] In the description of this application, unless otherwise stated, "a plurality of" means two or more. Unless otherwise expressly specified and limited, the terms "installed," "connected," and "linked" shall be interpreted broadly, for example, as a fixed connection, a detachable connection, or an integral connection; as a mechanical connection or an electrical connection; as a direct connection or an indirect connection through an intermediate medium; or as a connection within two components.

[0040] In this application, the applicant considered that if a synchronous operating architecture is used on the same machine, the huge acceleration and deceleration inertia generated by the lithography actuator during high-speed folding scanning will cause micro-vibrations in the machine. This vibration will directly interfere with the optical path of the nanoscale laser displacement sensor on the scanning carriage through structural transmission, damaging the measurement accuracy and causing inaccurate dynamic focusing compensation. Therefore, this application proposes a design scheme for a dual-carriage asynchronous lithography system on the same track.

[0041] For ease of understanding, the specific processes in the embodiments of the present invention are described below. Please refer to [link / reference]. Figure 1 One embodiment of the co-track dual-vehicle asynchronous lithography system of the present invention may include:

[0042] The system comprises a scanning carriage 10, a lithography carriage 20, and a host computer 30. The scanning carriage 10 is slidably mounted on a scanning guide rail and carries a laser displacement sensor for performing Z-axis terrain scanning of the substrate to obtain three-dimensional topographic data. The scanning guide rail is equipped with photoelectric displacement sensors (such as optical grating rulers or magnetic grating rulers) for detecting the positions of the scanning carriage 10 and the lithography carriage 20. The lithography carriage 20, also slidably mounted on the scanning guide rail, carries a single-axis micro-displacement device array consisting of multiple arrayed single-axis micro-displacement device units. These single-axis micro-displacement device units are used to adjust the position of the laser source in the Z-axis direction.

[0043] The host computer 30 is electrically connected to the scanning carriage 10, the lithography carriage 20, and the photoelectric displacement sensor. The host computer is configured to: receive the absolute coordinate information of the X and Y planes fed back by the photoelectric displacement sensor; control the scanning carriage and the lithography carriage to run asynchronously along the scanning guide rail in a time-sharing manner; generate Z-axis adjustment commands based on the three-dimensional topography data and absolute coordinate information obtained by the scanning carriage, and issue Z-axis adjustment commands when the lithography carriage runs to the physical position corresponding to the absolute coordinate information, so as to adjust the position of the laser source in the Z-axis direction.

[0044] In some embodiments of this application, the host computer may be a central processing unit (CPU), controller, microcontroller, microprocessor, or other data processing chip, used to run program code stored in memory or process data, such as executing computer programs.

[0045] In the specific production process, during the mapping stage, the lithography carriage is controlled to be in a servo anti-vibration lock state, and the scanning carriage is controlled to run along the scanning guide at a preset low speed to complete the full-area Z-axis terrain scanning. After the scanning is completed, the scanning carriage is controlled to return to the safe position and lock. During the exposure stage, the scanning carriage is kept in a locked state. After the host computer completes the topography data calculation and compensation value generation, the lithography carriage is controlled to unlock and start high-speed reciprocating scanning exposure.

[0046] Taking the original height data of the original three-dimensional topography at the absolute coordinate point Xi as Z_raw(Xi) as an example, it satisfies the measurement model: Z_raw(Xi) = H_sub(Xi) + ΔZ_rail(Xi); H_sub(Xi) is the actual surface micro-undulation height of the substrate at coordinate point Xi, and ΔZ_rail(Xi) is the static mechanical deformation of the precision guide rail at coordinate point Xi; the host computer uses the preset ideal focal plane reference height Z_ref as a reference; based on the three-dimensional topography data and absolute coordinate information obtained by the scanning carriage, the Z-axis adjustment command is generated, which may include: calculating the Z-axis topography compensation value C(Xi): C(Xi) = Z_raw(Xi) - Z_ref; during the exposure stage, when the lithography carriage runs to coordinate point Xi, the command to send C(Xi) and drive the Z-axis actuator to perform reverse adjustment is generated, so that ΔZ_rail(Xi) is algebraically offset in the physical bearing path and the algorithm compensation command, realizing that the dynamic focusing trajectory of the laser source only follows H_sub(Xi) for real-time tracking.

[0047] After the host computer issues the Z-axis topography compensation value C(Xi), the Z-axis precision actuator performs reverse displacement adjustment starting from this actual reference plane. Since the compensation command C(Xi) fully internalizes the guide rail deformation ΔZ_rail(Xi) captured during the scanning carriage mapping, the two undergo algebraic subtraction in the dynamic focusing closed loop, precisely eliminating the mechanical error of the guide rail. Ultimately, the focal plane of the direct-write head adaptively adjusts only according to the actual microscopic undulations of the substrate, achieving self-cancellation of high-order instrument errors. The specific analysis is as follows:

[0048] When the lithography carriage moves to the same absolute coordinate Xi during the exposure stage, its laser light source array is also subject to the same physical constraints, and the mounting reference surface undergoes spatial displacement due to the deformation of the guide rail. At this time, the actual spatial position Z_focus(Xi) of the direct write head focal plane is jointly determined by the theoretical reference height Z_head_ideal(Xi), the static deformation ΔZ_rail(Xi) of the guide rail, and the compensation command C(Xi) issued by the host computer. Their kinematic relationship is as follows:

[0049] Z_focus(Xi) = Z_head_ideal(Xi) + ΔZ_rail(Xi) - C(Xi); Substituting C(Xi) = H_sub(Xi) + ΔZ_rail(Xi) - Z_ref into the above equation, we get: Z_focus(Xi) = Z_head_ideal(Xi) + ΔZ_rail(Xi) - [H_sub(Xi) + ΔZ_rail(Xi) - Z_ref] Z_focus(Xi) = Z_head_ideal(Xi) - H_sub(Xi) + Z_ref; During the system calibration stage, Z_head_ideal(Xi) and Z_ref have been aligned (i.e., Z_head_ideal(Xi) = Z_ref), so substituting them into the equation gives: Z_focus(Xi) = Z_ref - H_sub(Xi).

[0050] As can be seen from the above derivation, the static deformation ΔZ_rail(Xi) of the guide rail undergoes strict algebraic cancellation in the physical bearing path (+) and the algorithm compensation command (-). The final focal plane position is compensated only in reverse relative to the actual microscopic undulations H_sub(Xi) of the substrate, completely eliminating the influence of guide rail machining straightness and flatness errors on the lithography focusing accuracy. The negative sign only indicates that the compensation movement direction of the Z-axis actuator is opposite to the substrate undulation direction. Finally, the actual focal plane position can be calculated in real time based on the formula Z_focus(Xi) = Z_ref + Z_encoder(Xi) - C(Xi), where Z_encoder(Xi) is the real-time feedback displacement value of the linear encoder integrated into the Z-axis precision actuator, used to form a position closed-loop control system, which can be obtained based on real-time detection by the Z-axis actuator.

[0051] As can be seen from the above, in this embodiment of the invention, the scanning carriage obtains the 3D surface morphology of the substrate surface of the exposure surface in advance, and then generates a Z-axis adjustment command based on the 3D morphology data and absolute coordinate information. This Z-axis adjustment command is issued when the lithography carriage reaches the physical position corresponding to the absolute coordinate information. This allows for dynamic adaptation of the focal point (i.e., laser spot) position of the laser source array based on the 3D surface morphology of the substrate surface of the exposure surface, avoiding the loss of exposure accuracy caused by changes in the spot size of the exposure surface due to changes in object distance. This enables exposure imaging on uneven exposure surfaces, expanding the application range of laser direct-write imaging. Secondly, by utilizing the common-mode property of the consistent static mechanical deformation experienced by the scanning carriage and the lithography carriage when they pass the same position on the precision guide rail, the mechanical error of the precision guide rail is offset in the compensation calculation, further improving the accuracy of laser direct-write imaging.

[0052] In the above Figure 1 Based on the previous embodiments, in the asynchronous lithography system with dual carriages on the same track in this application embodiment, in order to further improve the efficiency of laser imaging, the Z-axis topography compensation value C(Xi) can be encapsulated into a lookup table for real-time retrieval by the lithography carriage. Optionally, in order to further improve the accuracy of the Z-axis topography compensation value C(Xi), the original three-dimensional topography data can be spatially resampled according to the feedback step size of the photoelectric displacement sensor to obtain an equidistant height sequence; a cubic spline interpolation algorithm or a Gaussian smoothing filtering algorithm is used to suppress high-frequency noise in the equidistant height sequence to generate a net topography data sequence; C(Xi) is calculated based on the net topography data sequence so that the resolution of the generated lookup table matches the feedback step size of the photoelectric displacement sensor (e.g., a grating ruler).

[0053] In the specific implementation, the host computer spatially resamples the discretely acquired Z_raw(Xi) according to the grating ruler feedback step size (e.g., 20μm), and uses cubic spline interpolation or Gaussian smoothing filtering algorithms to eliminate high-frequency environmental noise, generating a high-precision dynamic focus compensation amount C(Xi) high-speed lookup table with resolution matching. During the exposure stage, the lithography carriage motion controller reads the absolute coordinates of the grating ruler via hardware interrupt, retrieves C(Xi) from the table with a communication delay of ≤1ms, and outputs it to the Z-axis servo driver in real time. This process does not require the additional deployment of a laser interferometer or guide rail error compensation sensor. Relying on the physical premise of "same-track architecture + asynchronous timing + absolute coordinate anchoring", it realizes system-level blind compensation and high-order instrument error self-cancellation.

[0054] For example, such as Figure 2 As shown, in one possible implementation, in order to adjust the position of the X and Y axes of the laser light source array, the scanning guide is fixedly set on a single gantry frame, and the photoelectric displacement sensor is a grating ruler set parallel to the scanning guide.

[0055] The above will be discussed below. Figure 1 or Figure 2 The specific workflow of the co-track dual-vehicle asynchronous lithography system in the illustrated embodiments is described below, referring to the relevant optional implementations. Figure 3 One embodiment of the asynchronous lithography method using dual-track lithography in this application may include:

[0056] 301: Control the scanning carriage to run along the scanning guide at a preset low speed, and record the absolute coordinates and corresponding Z-axis height information in real time through photoelectric displacement sensors to generate a three-dimensional topography raw dataset;

[0057] During the mapping phase, the lithography carriage is controlled to be in a servo anti-vibration lock state, and the scanning carriage is controlled to run along the scanning guide at a preset low speed to complete the full-area Z-axis terrain scanning. After the scanning is completed, the scanning carriage is controlled to return to the safe position and lock, and a three-dimensional topography raw dataset is generated, including at least the raw height data Z_raw(Xi) at the absolute coordinate point Xi.

[0058] 302: Calculate the Z-axis topography compensation value C(Xi). During the exposure stage, when the lithography carriage moves to coordinate point Xi, the instruction to drive the Z-axis actuator to perform reverse adjustment based on C(Xi) is given.

[0059] Calculate the Z-axis topography compensation value C(Xi): C(Xi) = Z_raw(Xi) - Z_ref; During the exposure stage, when the lithography carriage moves to coordinate point Xi, a command is generated and issued to C(Xi) and drive the Z-axis actuator to perform reverse adjustment, so that ΔZ_rail(Xi) is algebraically offset between the physical bearing path and the algorithm compensation command. Here, Z_raw(Xi) is the original height data of the original 3D topography data acquired by the scanning carriage at the absolute coordinate point Xi, Z_ref is the preset ideal focal plane reference height, and ΔZ_rail(Xi) is the static mechanical deformation of the precision guide rail at coordinate point Xi.

[0060] During the exposure execution phase, the local motion controller of the lithography carriage uses the real-time coordinates of the high-precision linear grating ruler as an index to look up the preset Z-axis topography compensation value C(Xi) and drive the Z-axis precision actuator to generate the corresponding displacement. To monitor the focusing effect in real time, the system introduces the linear encoder feedback value Z_encoder(Xi) integrated into the Z-axis actuator. The actual focal plane spatial position Z_focus(Xi) satisfies the kinematic relationship: Z_focus(Xi) = Z_ref + Z_encoder(Xi) - C(Xi). Here, Z_encoder(Xi) is the real-time feedback displacement value of the linear encoder integrated into the Z-axis precision actuator, used to form the position closed-loop control in the system. During the factory calibration phase, mechanical zero-point calibration ensures that Z_head_ideal(Xi) is always equal to Z_ref; this alignment relationship is stored as a preset parameter in the host computer. In the position closed-loop control convergence state, Z_encoder(Xi) tracks C(Xi) in real time. Combined with the aforementioned common-mode cancellation mechanism, the guide rail deformation ΔZ_rail(Xi) strictly cancels out in the physical reference offset and algorithm compensation instructions, ultimately causing the focal plane position to converge to Z_ref - H_sub(Xi), achieving high-precision dynamic focusing only relative to the actual micro-undulations of the substrate. All parameters are measured signals that can be directly obtained by industrial sensors or pre-stored known quantities, eliminating the need for an additional independent guide rail deformation measurement module.

[0061] Optionally, as a possible implementation, in this embodiment of the application, the Z-axis topography compensation value C(Xi) can be encapsulated as a lookup table for real-time retrieval by the lithography carriage. Optionally, to further improve the accuracy of the Z-axis topography compensation value C(Xi), the original three-dimensional topography data can be spatially resampled according to the feedback step size of the photoelectric displacement sensor to obtain an equidistant height sequence; high-frequency noise suppression is performed on the equidistant height sequence using a cubic spline interpolation algorithm or a Gaussian smoothing filtering algorithm to generate a net topography data sequence; C(Xi) is calculated based on the net topography data sequence, so that the resolution of the generated lookup table matches the feedback step size of the photoelectric displacement sensor (e.g., a grating ruler).

[0062] It is understood that, in the various embodiments of this application, the order of the steps does not imply the order of execution. The execution order of each step should be determined by its function and internal logic, and should not constitute any limitation on the implementation process of the embodiments of this application.

[0063] In the embodiments provided in this application, it should be understood that the disclosed systems, modules, and units can be implemented in other ways. For example, the system embodiments described above are merely illustrative; for instance, the division of units is only a logical functional division, and in actual implementation, there may be other division methods. For example, multiple units or components may be combined or integrated into another system, or some features may be ignored or not executed. Furthermore, the coupling or direct coupling or communication connection shown or discussed may be an indirect coupling or communication connection through some interfaces, devices, or units, and may be electrical, mechanical, or other forms.

[0064] The units described as separate components may or may not be physically separate. The components shown as units may or may not be physical units; that is, they may be located in one place or distributed across multiple network units. Some or all of the units can be selected to achieve the purpose of this embodiment according to actual needs.

[0065] Furthermore, the functional units in the various embodiments of the present invention can be integrated into one processing unit, or each unit can exist physically separately, or two or more units can be integrated into one unit. The integrated unit can be implemented in hardware or as a software functional unit.

[0066] If the integrated unit is implemented as a software functional unit and sold or used as an independent product, it can be stored in a computer-readable storage medium. Based on this understanding, the technical solution of the present invention, in essence, or the part that contributes to the prior art, or all or part of the technical solution, can be embodied in the form of a software product. This computer software product is stored in a storage medium and includes several instructions to cause a computer device (which may be a personal computer, server, or network device, etc.) to execute all or part of the steps of the methods described in the various embodiments of the present invention. The aforementioned storage medium includes various media capable of storing program code, such as USB flash drives, portable hard drives, read-only memory (ROM), random access memory (RAM), magnetic disks, or optical disks.

[0067] The above-described embodiments are only used to illustrate the technical solutions of the present invention, and are not intended to limit it. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some of the technical features. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A dual-track asynchronous lithography system, characterized in that, include: A scanning carriage is slidably mounted on a scanning guide rail and equipped with a laser displacement sensor for performing Z-axis terrain scanning on the substrate to obtain three-dimensional topographic data; the scanning guide rail is equipped with a photoelectric displacement sensor for detecting the position of the scanning carriage and the lithography carriage. A lithography carriage is slidably mounted on the scanning guide rail and is used to carry a single-axis micro-displacement device array consisting of multiple arrayed single-axis micro-displacement device units; the single-axis micro-displacement device unit is used to adjust the position of the laser source in the Z-axis direction; The host computer is electrically connected to the scanning carriage, the lithography carriage, and the photoelectric displacement sensor, respectively; the host computer is configured as follows: Receive the absolute coordinate information of the X and Y planes fed back by the photoelectric displacement sensor; The scanning carriage and the lithography carriage are controlled to run asynchronously along the scanning guide rail in a time-sharing manner. Based on the three-dimensional topography data and absolute coordinate information obtained by the scanning carriage, a Z-axis adjustment command is generated and issued when the lithography carriage moves to the physical position corresponding to the absolute coordinate information, so as to adjust the position of the laser source in the Z-axis direction.

2. The system according to claim 1, characterized in that, The original height data of the three-dimensional topography at the absolute coordinate point Xi is denoted as Z_raw(Xi), which satisfies the measurement model: Z_raw(Xi) = H_sub(Xi) + ΔZ_rail(Xi); H_sub(Xi) is the height of the actual surface micro-undulations of the substrate at the coordinate point Xi, and ΔZ_rail(Xi) is the static mechanical deformation of the precision guide rail at the coordinate point Xi; the host computer uses the preset ideal focal plane reference height Z_ref as a reference; the generation of Z-axis adjustment commands based on the three-dimensional topography data and the absolute coordinate information obtained by the scanning carriage includes: Calculate the Z-axis shape compensation value C(Xi): C(Xi) = Z_raw(Xi) - Z_ref; During the exposure stage, when the lithography carriage moves to the coordinate point Xi, the Z-axis actuator is driven to make reverse adjustment based on the instruction of C(Xi), so that ΔZ_rail(Xi) is algebraically offset in the physical bearing path and the algorithm compensation instruction.

3. The system according to claim 2, characterized in that, The process of generating Z-axis adjustment commands based on the three-dimensional topography data acquired by the scanning carriage and the absolute coordinate information further includes: The Z-axis topography compensation value C(Xi) is encapsulated into a lookup table for the lithography carriage to call in real time.

4. The system according to claim 3, characterized in that, The step of encapsulating the Z-axis topography compensation value C(Xi) into a lookup table includes: The original three-dimensional topography data is spatially resampled according to the feedback step size of the photoelectric displacement sensor to obtain an equidistant height sequence; high-frequency noise is suppressed on the equidistant height sequence using a cubic spline interpolation algorithm or a Gaussian smoothing filter algorithm to generate a net topography data sequence; C(Xi) is calculated based on the net topography data sequence to match the resolution of the generated lookup table with the resolution of the grating ruler.

5. The system according to any one of claims 1 to 4, characterized in that, The control of the scanning carriage and the lithography carriage to run asynchronously along the scanning guide rail in a time-sharing manner includes: During the mapping phase, the lithography carriage is controlled to be in a servo anti-vibration lock state, and the scanning carriage is controlled to run along the scanning guide rail at a preset low speed to complete the full-area Z-axis terrain scanning. After the scanning is completed, the scanning carriage is controlled to return to the safe position and lock. During the exposure stage, the scanning carriage is kept in a locked state. After the host computer completes the topography data calculation and compensation surface generation, it controls the lithography carriage to unlock and start high-speed reciprocating scanning exposure.

6. The system according to any one of claims 1 to 4, characterized in that, The scanning guide rail is fixedly mounted on the single gantry frame, and the photoelectric displacement sensor is a grating ruler mounted on the parallel scanning guide rail.

7. A method for asynchronous photolithography using dual-track lithography, characterized in that, Applied to the co-track dual-vehicle asynchronous lithography system as described in any one of claims 1 to 6, the method comprises: The scanning carriage is controlled to run along the scanning guide at a preset low speed. The absolute coordinates and corresponding Z-axis height information are recorded in real time by the photoelectric displacement sensor to generate a raw dataset of three-dimensional morphology. Calculate the Z-axis shape compensation value C(Xi): C(Xi) = Z_raw(Xi) - Z_ref; During the exposure stage, when the lithography carriage moves to the coordinate point Xi, the Z-axis actuator is driven to make reverse adjustment based on the instruction of C(Xi), so that ΔZ_rail(Xi) is algebraically offset in the physical bearing path and the algorithm compensation instruction.

8. The method according to claim 7, characterized in that, The process of generating Z-axis adjustment commands based on the three-dimensional topography data acquired by the scanning carriage and the absolute coordinate information further includes: The Z-axis topography compensation value C(Xi) is encapsulated into a lookup table for the lithography carriage to call in real time.

9. The method according to claim 8, characterized in that, The step of encapsulating the Z-axis topography compensation value C(Xi) into a lookup table includes: The original three-dimensional topography data is spatially resampled according to the feedback step size of the photoelectric displacement sensor to obtain an equally spaced height sequence; The equally spaced height sequence is subjected to high-frequency noise suppression using a cubic spline interpolation algorithm or a Gaussian smoothing filter algorithm to generate a net morphology data sequence. The C(Xi) is calculated based on the net morphology data sequence and encapsulated as a C(Xi) lookup table.

10. The method according to claim 9, characterized in that, Also includes: Adjust the feedback step size of the photoelectric displacement sensor to generate a C(Xi) lookup table with a resolution matching the feedback step size of the photoelectric displacement sensor.

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