A layout processing method, device and equipment and computer readable storage medium
By dividing the layout into edge segments and performing initial movements based on geometric features, the problem of long OPC correction time is solved, thus accelerating and improving the efficiency of the OPC process.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- HUAXINCHENG (HANGZHOU) TECH CO LTD
- Filing Date
- 2026-03-11
- Publication Date
- 2026-06-12
Smart Images
Figure CN122197791A_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of integrated circuit manufacturing, and in particular to a layout processing method, apparatus, device, and computer-readable storage medium. Background Technology
[0002] In semiconductor manufacturing, OPC (Optical Proximity Correction) correction verification, which compares the differences between the simulated profile and the target pattern, is an essential step. The current conventional approach is to start from the original pattern of the target layer, cut the edge of the pattern into line segments (i.e., edge segments), and then move each edge segment step by step to minimize the overall edge placement error (EPE) of the moved pattern. This is a gradual convergence process that requires multiple adjustments and iterations.
[0003] However, the current OPC process is time-consuming. The fundamental reason is that the principle of OPC is that after each adjustment of the position of each line segment on the pattern, a simulation is required to determine the photolithographic projection. Multiple adjustment-simulation cycles are repeated, which greatly increases the time consumption of OPC.
[0004] Therefore, how to reduce the number of adjustments to edge segments in OPC correction, thereby shortening the OPC correction time and improving OPC efficiency, is a problem that urgently needs to be solved by those skilled in the art. Summary of the Invention
[0005] The purpose of this invention is to provide a layout processing method, apparatus, device, and computer-readable storage medium to solve the problems of excessively long processing time and low efficiency in existing OPC correction techniques.
[0006] To solve the above-mentioned technical problems, the present invention provides a layout processing method, comprising:
[0007] Receive the layout to be processed;
[0008] The pattern in the layout to be processed is divided into multiple edge segments to be processed;
[0009] Obtain the geometric features of each of the edge segments to be processed;
[0010] Based on the geometric features, determine the initial movement amount of the corresponding edge segment to be processed;
[0011] The corresponding edge segment to be processed is moved according to the initial movement amount to obtain the preprocessed layout;
[0012] The preprocessed layout is subjected to OPC processing to obtain a corrected layout; the edge segment to be processed in the preprocessed layout is closer to the corresponding edge segment in the corrected layout than the edge segment to be processed in the original layout.
[0013] Optionally, in the layout processing method, before determining the initial movement amount of the corresponding edge segment to be processed based on the geometric features, the method further includes:
[0014] The geometric features are subjected to dimensionality reduction processing to obtain a first number of representative features of different categories;
[0015] Accordingly, based on the geometric features, the initial movement amount of the corresponding edge segment to be processed is determined, including:
[0016] Based on the representative features, the initial movement amount of the corresponding edge segment to be processed is determined.
[0017] Optionally, in the layout processing method, the geometric features are subjected to dimensionality reduction processing to obtain a first number of representative features of different categories, including:
[0018] The geometric features are subjected to PCA dimensionality reduction to obtain a first number of representative features of different categories.
[0019] Optionally, in the layout processing method, the geometric features include at least one of the following: length, width, endpoint type, adjacent edge length, adjacent edge endpoint type, and pattern line width at the corresponding position of the edge segment to be processed.
[0020] Optionally, in the layout processing method, the first quantity is less than or equal to 10.
[0021] A layout processing apparatus, comprising:
[0022] The receiving module is used to receive the layout to be processed;
[0023] The segmentation module is used to divide the pattern in the layout to be processed into multiple edge segments to be processed;
[0024] The feature acquisition module is used to acquire the geometric features of each of the edge segments to be processed;
[0025] The movement module is used to determine the initial movement amount of the corresponding edge segment to be processed based on the geometric features.
[0026] The preprocessing module is used to move the corresponding edge segment to be processed according to the initial movement amount to obtain the preprocessed layout.
[0027] The OPC module is used to perform OPC processing on the preprocessed layout to obtain a corrected layout; the edge segment to be processed in the preprocessed layout is closer to the corresponding edge segment in the corrected layout than the edge segment to be processed in the original layout.
[0028] Optionally, in the layout processing apparatus, the movement module further includes:
[0029] A representative unit is used to perform dimensionality reduction processing on the geometric features to obtain a first number of representative features of different categories.
[0030] Accordingly, including:
[0031] A representative feature movement unit is used to determine the initial movement amount of the corresponding edge segment to be processed based on the representative feature.
[0032] Optionally, in the layout processing apparatus, the movement module includes:
[0033] PCA unit is used to perform PCA dimensionality reduction on the geometric features to obtain a first number of representative features of different categories.
[0034] A layout processing apparatus, comprising:
[0035] Memory, used to store computer programs;
[0036] A processor, configured to implement the steps of any of the above-described layout processing methods when executing the computer program.
[0037] A computer-readable storage medium storing a computer program that, when executed by a processor, implements the steps of any of the layout processing methods described above.
[0038] The layout processing method provided by this invention involves receiving a layout to be processed; dividing the pattern in the layout to be processed into multiple edge segments to be processed; acquiring the geometric features of each edge segment to be processed; determining the initial movement amount of the corresponding edge segment based on the geometric features; moving the corresponding edge segment to be processed according to the initial movement amount to obtain a preprocessed layout; and performing OPC processing on the preprocessed layout to obtain a corrected layout. The edge segments to be processed in the preprocessed layout are closer to the corresponding edge segments in the corrected layout than the edge segments to be processed in the original layout. This invention preprocesses the pattern in the layout to be processed before performing OPC processing, moving each edge segment to a more reasonable position based on its corresponding geometric features. This significantly reduces the number of simulation rounds required for convergence in OPC processing, thereby accelerating OPC speed and improving OPC efficiency. This invention also provides a layout processing apparatus, device, and computer-readable storage medium with the above-mentioned beneficial effects. Attached Figure Description
[0039] To more clearly illustrate the technical solutions of the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0040] Figure 1 A flowchart illustrating a specific embodiment of the layout processing method provided by the present invention;
[0041] Figure 2 A flowchart illustrating another specific embodiment of the layout processing method provided by the present invention;
[0042] Figure 3 This is a flowchart illustrating a specific embodiment of the layout processing apparatus provided by the present invention.
[0043] Figure label:
[0044] 100 - Receiver module; 200 - Segmentation module; 300 - Feature acquisition module; 400 - Motion quantity module; 500 - Preprocessing module. Detailed Implementation
[0045] To enable those skilled in the art to better understand the present invention, the invention will be further described in detail below with reference to the accompanying drawings and specific embodiments. Obviously, the described embodiments are merely some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.
[0046] The core of this invention is to provide a layout processing method, the flowchart of one specific implementation of which is shown below. Figure 1 As shown, this is referred to as Specific Implementation Method One, which includes:
[0047] S101: Receive the layout to be processed.
[0048] The layout to be processed is the layout that needs to be modified by OPC.
[0049] S102: Divide the pattern in the layout to be processed into multiple edge segments to be processed.
[0050] This step is a necessary step before OPC processing. In subsequent OPC processing, the edge segment to be processed in this step will be the smallest edge adjustment unit.
[0051] S103: Obtain the geometric features of each of the edge segments to be processed.
[0052] The geometric features include at least one of the following: length, width, endpoint type, adjacent edge length, adjacent edge endpoint type, and pattern line width at the corresponding position of the edge segment to be processed.
[0053] It should be noted that the length refers to the length of the edge segment to be processed; the width refers to the width of the edge segment to be processed; the endpoint type refers to whether the two endpoints of the edge segment to be processed are corners of the pattern (including convex and concave angles) or located on the straight edge of the pattern; the pattern linewidth at the corresponding position refers to the distance of the edge segment to be processed extending into the image in a direction perpendicular to it to the edge on the other side. Of course, the geometric features may also include other features besides those given above, which are not limited here.
[0054] S104: Determine the initial movement amount of the corresponding edge segment to be processed based on the geometric features.
[0055] S105: Move the corresponding edge segment to be processed according to the initial movement amount to obtain the preprocessed layout.
[0056] The edge segment to be processed that has been moved according to the initial movement amount should be closer to the state of the corrected layout after OPC correction. Of course, the determination of the initial movement amount can be based on theoretical calculations or statistical patterns obtained from a large amount of historical data. The specific determination method is not limited in this invention.
[0057] S106: Perform OPC processing on the preprocessed layout to obtain a corrected layout; the edge segment to be processed in the preprocessed layout is closer to the corresponding edge segment in the corrected layout than the edge segment to be processed in the original layout.
[0058] The position of the edge segment to be processed after moving using the initial movement amount has been preliminarily optimized, and the number of iterations required to reach the ideal position in OPC processing has been greatly reduced, thereby shortening the OPC time. Of course, specific OPC schemes can be referred to relevant technologies, which will not be elaborated here.
[0059] The layout processing method provided by this invention involves receiving a layout to be processed; dividing the pattern in the layout to be processed into multiple edge segments to be processed; acquiring the geometric features of each edge segment to be processed; determining the initial movement amount of the corresponding edge segment based on the geometric features; moving the corresponding edge segment to be processed according to the initial movement amount to obtain a preprocessed layout; and performing OPC processing on the preprocessed layout to obtain a corrected layout. The edge segments to be processed in the preprocessed layout are closer to the corresponding edge segments in the corrected layout than the edge segments to be processed in the original layout. This invention preprocesses the pattern in the layout to be processed before performing OPC processing, moving each edge segment to a more reasonable position based on its corresponding geometric features. This significantly reduces the number of simulation rounds required for convergence in OPC processing, thereby accelerating OPC speed and improving OPC efficiency.
[0060] Based on Implementation Method 1, the method for determining the initial movement amount is further specified to obtain Implementation Method 2, the corresponding flowchart of which is shown below. Figure 2 As shown, it includes:
[0061] S201: Receive layout to be processed.
[0062] S202: Divide the pattern in the layout to be processed into multiple edge segments to be processed.
[0063] S203: Obtain the geometric features of each of the edge segments to be processed.
[0064] S204: Perform dimensionality reduction processing on the geometric features to obtain a first number of representative features of different categories.
[0065] Specifically, the first quantity is less than or equal to 10. Limiting the number of representative feature types involved in the calculation to 10 or less can further improve the computational efficiency of OPC while ensuring computational effectiveness, achieving a balance between low computational time and high computational accuracy.
[0066] S205: Determine the initial movement amount of the corresponding edge segment to be processed based on the representative features.
[0067] S206: Move the corresponding edge segment to be processed according to the initial movement amount to obtain the preprocessed layout.
[0068] S207: Perform OPC processing on the preprocessed layout to obtain a corrected layout; the edge segment to be processed in the preprocessed layout is closer to the corresponding edge segment in the corrected layout than the edge segment to be processed in the original layout.
[0069] The difference between this specific implementation and the above specific implementation is that, after obtaining all types of geometric features, this specific implementation further filters out the representative features. The subsequent initial movement calculation only uses the representative features, and the remaining steps are the same as those in the above specific implementation, and will not be elaborated here.
[0070] In this specific embodiment, after obtaining the various geometric features of the edge segment to be processed, the initial movement amount is not calculated directly using all types of geometric features. Instead, the most important geometric features are selected as representative features through dimensionality reduction. In subsequent calculations, only the representative features are considered, and not all geometric features, thereby further improving the efficiency of the initial calculation.
[0071] Furthermore, the geometric features are subjected to dimensionality reduction processing to obtain a first number of representative features of various categories, including:
[0072] The geometric features are subjected to PCA dimensionality reduction to obtain a first number of representative features of different categories.
[0073] In this preferred embodiment, the PCA (Principal Component Analysis) algorithm is used for dimensionality reduction. With minimal information loss, the geometric feature data of multiple dimensions are compressed to a low dimension. At the same time, correlation and noise reduction are performed, and finally only the most representative features are retained. Of course, other dimensionality reduction algorithms can also be used, and this invention does not limit them.
[0074] The layout processing apparatus provided in the embodiments of the present invention will be described below. The apparatus described below and the layout processing method described above can be referred to in correspondence.
[0075] Figure 3 This is a structural block diagram of the layout processing apparatus provided in an embodiment of the present invention, with reference to... Figure 3 The layout processing apparatus may include:
[0076] Receiver module 100 is used to receive the layout to be processed;
[0077] The segmentation module 200 is used to segment the pattern in the layout to be processed into multiple edge segments to be processed;
[0078] The feature acquisition module 300 is used to acquire the geometric features of each of the edge segments to be processed;
[0079] The movement module 400 is used to determine the initial movement amount of the corresponding edge segment to be processed based on the geometric features.
[0080] The preprocessing module 500 is used to move the corresponding edge segment to be processed according to the initial movement amount to obtain a preprocessed layout.
[0081] OPC module 600 is used to perform OPC processing on the preprocessed layout to obtain a corrected layout; the edge segment to be processed in the preprocessed layout is closer to the corresponding edge segment in the corrected layout than the edge segment to be processed in the original layout.
[0082] In one specific implementation, the movement measurement module 400 further includes:
[0083] A representative unit is used to perform dimensionality reduction processing on the geometric features to obtain a first number of representative features of different categories.
[0084] Accordingly, including:
[0085] A representative feature movement unit is used to determine the initial movement amount of the corresponding edge segment to be processed based on the representative feature.
[0086] In one specific implementation, the movement measurement module 400 includes:
[0087] PCA unit is used to perform PCA dimensionality reduction on the geometric features to obtain a first number of representative features of different categories.
[0088] The layout processing apparatus provided by this invention includes a receiving module 100 for receiving a layout to be processed; a segmentation module 200 for segmenting the pattern in the layout to be processed into multiple edge segments to be processed; a feature acquisition module 300 for acquiring the geometric features of each edge segment to be processed; a movement module 400 for determining the initial movement amount of the corresponding edge segment to be processed based on the geometric features; a preprocessing module 500 for moving the corresponding edge segment to be processed according to the initial movement amount to obtain a preprocessed layout; and an OPC module 600 for performing OPC processing on the preprocessed layout to obtain a corrected layout. The edge segments to be processed in the preprocessed layout are closer to the corresponding edge segments in the corrected layout than the edge segments to be processed in the original layout. This invention preprocesses the pattern in the layout to be processed before performing OPC processing, moving each edge segment to a more reasonable position based on its corresponding geometric features. This significantly reduces the number of simulation rounds required for convergence in OPC processing, thereby accelerating OPC speed and improving OPC efficiency.
[0089] The layout processing apparatus of this embodiment is used to implement the aforementioned layout processing method. Therefore, the specific implementation of the layout processing apparatus can be found in the embodiment section of the layout processing method above. For example, the receiving module 100, the segmentation module 200, the feature acquisition module 300, the movement module 400, the preprocessing module 500, and the OPC module 600 are respectively used to implement steps S101, S102, S103, S104, S105, and S106 in the above-mentioned layout processing method. Therefore, its specific implementation can be referred to the description of the corresponding embodiments, which will not be repeated here.
[0090] The present invention also provides a layout processing apparatus, comprising:
[0091] Memory, used to store computer programs;
[0092] A processor is configured to implement the steps of any of the above-described layout processing methods when executing the computer program. The layout processing method provided by this invention involves receiving a layout to be processed; dividing the pattern in the layout to be processed into multiple edge segments to be processed; acquiring the geometric features of each edge segment to be processed; determining the initial movement amount of the corresponding edge segment based on the geometric features; moving the corresponding edge segment to be processed according to the initial movement amount to obtain a preprocessed layout; and performing OPC processing on the preprocessed layout to obtain a corrected layout. The edge segments to be processed in the preprocessed layout are closer to the corresponding edge segments in the corrected layout than the edge segments to be processed in the original layout. This invention preprocesses the pattern in the layout to be processed before performing OPC processing, moving each edge segment to a more reasonable position based on its corresponding geometric features. This significantly reduces the number of simulation rounds required for convergence in OPC processing, thereby accelerating OPC speed and improving OPC efficiency.
[0093] This invention also provides a computer-readable storage medium storing a computer program, which, when executed by a processor, implements the steps of any of the above-described layout processing methods. The layout processing method provided by this invention involves receiving a layout to be processed; dividing the pattern in the layout to be processed into multiple edge segments to be processed; acquiring the geometric features of each edge segment to be processed; determining an initial movement amount for the corresponding edge segment based on the geometric features; moving the corresponding edge segment to be processed according to the initial movement amount to obtain a preprocessed layout; and performing OPC processing on the preprocessed layout to obtain a corrected layout. The edge segments to be processed in the preprocessed layout are closer to the corresponding edge segments in the corrected layout than the edge segments to be processed in the original layout. This invention preprocesses the pattern in the layout to be processed before performing OPC processing, moving each edge segment to a more reasonable position based on its corresponding geometric features. This significantly reduces the number of simulation rounds required for convergence in OPC processing, thereby accelerating OPC speed and improving OPC efficiency.
[0094] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on its differences from other embodiments. Similar or identical parts between embodiments can be referred to interchangeably. For the apparatus disclosed in the embodiments, since it corresponds to the method disclosed in the embodiments, the description is relatively simple; relevant parts can be referred to in the method section.
[0095] It should be noted that, in this specification, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.
[0096] Those skilled in the art will further recognize that the units and algorithm steps of the various examples described in conjunction with the embodiments disclosed herein can be implemented in electronic hardware, computer software, or a combination of both. To clearly illustrate the interchangeability of hardware and software, the components and steps of the various examples have been generally described in terms of functionality in the foregoing description. Whether these functions are implemented in hardware or software depends on the specific application and design constraints of the technical solution. Those skilled in the art can use different methods to implement the described functions for each specific application, but such implementations should not be considered beyond the scope of this invention.
[0097] The steps of the methods or algorithms described in conjunction with the embodiments disclosed herein can be implemented directly by hardware, a software module executed by a processor, or a combination of both. The software module can be located in random access memory (RAM), main memory, read-only memory (ROM), electrically programmable ROM, electrically erasable programmable ROM, registers, hard disk, removable disk, CD-ROM, or any other form of storage medium known in the art.
[0098] The layout processing method, apparatus, device, and computer-readable storage medium provided by the present invention have been described in detail above. Specific examples have been used to illustrate the principles and implementation methods of the present invention. The descriptions of the embodiments above are merely for the purpose of helping to understand the method and core ideas of the present invention. It should be noted that those skilled in the art can make various improvements and modifications to the present invention without departing from its principles, and these improvements and modifications also fall within the protection scope of the present invention.
Claims
1. A layout processing method, characterized in that, include: Receive the layout to be processed; The pattern in the layout to be processed is divided into multiple edge segments to be processed; Obtain the geometric features of each of the edge segments to be processed; Based on the geometric features, determine the initial movement amount of the corresponding edge segment to be processed; The corresponding edge segment to be processed is moved according to the initial movement amount to obtain the preprocessed layout; The preprocessed layout is subjected to OPC processing to obtain a corrected layout; The edge segment to be processed in the preprocessed layout is closer to the corresponding edge segment in the corrected layout than the edge segment to be processed in the original layout.
2. The layout processing method as described in claim 1, characterized in that, Before determining the initial movement amount of the corresponding edge segment to be processed based on the geometric features, the method further includes: The geometric features are subjected to dimensionality reduction processing to obtain a first number of representative features of different categories; Accordingly, based on the geometric features, the initial movement amount of the corresponding edge segment to be processed is determined, including: Based on the representative features, the initial movement amount of the corresponding edge segment to be processed is determined.
3. The layout processing method as described in claim 2, characterized in that, The geometric features are subjected to dimensionality reduction processing to obtain a first number of representative features of different categories, including: The geometric features are subjected to PCA dimensionality reduction to obtain a first number of representative features of different categories.
4. The layout processing method as described in claim 2, characterized in that, The first quantity is less than or equal to 10.
5. The layout processing method as described in claim 1, characterized in that, The geometric features include at least one of the following: length, width, endpoint type, adjacent edge length, adjacent edge endpoint type, and pattern line width at the corresponding position of the edge segment to be processed.
6. A layout processing apparatus, characterized in that, include: The receiving module is used to receive the layout to be processed; The segmentation module is used to divide the pattern in the layout to be processed into multiple edge segments to be processed; The feature acquisition module is used to acquire the geometric features of each of the edge segments to be processed; The movement module is used to determine the initial movement amount of the corresponding edge segment to be processed based on the geometric features. The preprocessing module is used to move the corresponding edge segment to be processed according to the initial movement amount to obtain the preprocessed layout. The OPC module is used to perform OPC processing on the preprocessed layout to obtain a corrected layout; The edge segment to be processed in the preprocessed layout is closer to the corresponding edge segment in the corrected layout than the edge segment to be processed in the original layout.
7. The layout processing apparatus as described in claim 6, characterized in that, The movement measurement module also includes: A representative unit is used to perform dimensionality reduction processing on the geometric features to obtain a first number of representative features of different categories. Accordingly, including: A representative feature movement unit is used to determine the initial movement amount of the corresponding edge segment to be processed based on the representative feature.
8. The layout processing apparatus as described in claim 7, characterized in that, The mobility measurement module includes: PCA unit is used to perform PCA dimensionality reduction on the geometric features to obtain a first number of representative features of different categories.
9. A layout processing device, characterized in that, include: Memory, used to store computer programs; A processor, configured to implement the steps of the layout processing method as described in any one of claims 1 to 5 when executing the computer program.
10. A computer-readable storage medium, characterized in that, The computer-readable storage medium stores a computer program that, when executed by a processor, implements the steps of the layout processing method as described in any one of claims 1 to 5.