High-performance double-sided high-reflection coated glass and method for manufacturing the same

Abstract

The present application relates to a kind of double-sided high-reflection coated glass with excellent performance and its preparation method, it is characterized in that: in the air surface of glass substrate, using magnetron sputtering method, from below to above, first dielectric layer with thickness of 10-20nm is sputtered, second dielectric layer with thickness of 40-60nm is sputtered, third dielectric layer with thickness of 60-80nm is sputtered, metal absorption layer with thickness of 30-40nm is sputtered, fourth dielectric layer with thickness of 60-80nm is sputtered, fifth dielectric layer with thickness of 20-40nm is sputtered, interface strengthening layer with thickness of 10-20nm is sputtered.The present application has the advantages: based on gradient oxygen pressure sputtering MoO3+ Nb2O5 / MgO-MoFe-MgO / MoO3+ Nb2O5 Symmetrical packaging system, outer ZrO2 Interface strengthening layer provides mechanical protection directly, replace the necessary organic paint layer of aluminum mirror, reduce 30% energy consumption and eliminate VOC emissions;More through high melting point MoFe alloy layer and optimized oxygen barrier structure, realize 650 DEG C tempering without melting deformation, so that the adhesion of finished product reaches CLASS 0 level;Directly adapt to magnetron sputtering deposition, shorten 50% in whole line process, meet the safety glass mass production demand.

Description

Technical Field

[0001] This invention belongs to the field of magnetron sputtering coated glass, and relates to a high-performance double-sided high-reflectivity coated glass and its preparation method. Background Technology

[0002] Traditional double-sided high-reflection coated glass primarily uses aluminum mirror technology, but its manufacturing process has significant limitations. Aluminum mirrors require multiple post-production protective processes, such as coating and drying, making the process complex and energy-intensive. More importantly, aluminum itself has a melting point of 660℃, making it unable to withstand the high temperatures required for heat strengthening treatment (typically reaching 650℃). This characteristic severely limits its application in the field of safety glass. Furthermore, aluminum mirrors must rely on organic paint layers for mechanical protection, which not only increases the complexity of the manufacturing process but also introduces environmental problems such as VOC (volatile organic compound) emissions.

[0003] With the increasing demand for safety glass from industries such as construction and automotive, the market urgently needs a coated glass product that maintains high reflectivity while possessing excellent abrasion resistance and thermal strengthening compatibility. An ideal product should be directly compatible with magnetron sputtering deposition processes, enabling efficient mass production, while also meeting environmental protection requirements. Summary of the Invention

[0004] The purpose of this invention is to overcome the shortcomings of existing double-sided high-reflection coated glass and to provide a high-performance double-sided high-reflection coated glass and its preparation method.

[0005] To achieve the above objectives, the technical solution adopted by the present invention is as follows: A high-performance double-sided high-reflection coated glass includes a glass substrate, characterized in that: on the air surface of the glass substrate, a first dielectric layer, a second dielectric layer, a third dielectric layer, a metal absorption layer, a fourth dielectric layer, a fifth dielectric layer and an interface strengthening layer are sequentially disposed from bottom to top.

[0006] Furthermore, the glass substrate is ultra-white soda-lime glass with a thickness of 4-12 mm.

[0007] Furthermore, the first dielectric layer is a silicon oxide layer with a thickness of 10-20 nm.

[0008] Furthermore, the second dielectric layer is a niobium molybdenum oxide layer with a thickness of 40-60 nm.

[0009] Furthermore, the third dielectric layer is a magnesium oxide layer with a thickness of 60-80 nm.

[0010] Furthermore, the metal absorption layer is a molybdenum-iron alloy layer with a thickness of 30-40 nm.

[0011] Furthermore, the fourth dielectric layer is a magnesium oxide layer with a thickness of 60-80 nm.

[0012] Furthermore, the fifth dielectric layer is a niobium molybdenum oxide layer with a thickness of 20-40 nm.

[0013] Furthermore, the interface strengthening layer is a zirconium oxide layer with a thickness of 10-20 nm.

[0014] A method for preparing high-performance double-sided high-reflectivity coated glass, characterized by comprising the following steps: (1) On the air surface of the glass substrate, a first dielectric layer with a thickness of 10-20 nm is obtained by magnetron sputtering using a pure silicon target with a medium frequency power supply. The gas used is argon and oxygen, the deposition pressure is 0.004-0.006 mbar, and the volume ratio of Ar:O2 is 3:2. (2) On the air surface of the glass substrate, a second dielectric layer with a thickness of 40-60 nm is obtained by magnetron sputtering using a pure silicon target with a medium frequency power supply. The gas used is argon and oxygen, the deposition pressure is 0.004-0.006 mbar, and the volume ratio of Ar:O2 is 3:2. (3) On the air surface of the glass substrate, a third dielectric layer with a thickness of 60-80 nm is sputtered from a magnesium oxide target using a medium frequency power supply by magnetron sputtering. The gas used is argon, and the deposition pressure is 0.004-0.006 mbar. (4) On the air surface of the glass substrate, a metal absorption layer with a thickness of 30-40 nm is sputtered from a molybdenum-iron alloy target using a DC power supply by magnetron sputtering. The molybdenum content in the molybdenum-iron alloy target is 55-75%, the iron content is 25-45%, the gas used is argon, and the deposition pressure is 0.003-0.005 mbar. (5) On the air surface of the glass substrate, a fourth dielectric layer with a thickness of 60-80 nm is sputtered by a rotating magnesium oxide target using a medium frequency power supply. The gas used is argon, and the deposition pressure is 0.004-0.006 mbar. (6) On the air surface of the glass substrate, a fifth dielectric layer with a thickness of 20-40 nm is sputtered from a niobium-doped molybdenum oxide target using a medium-frequency power supply by magnetron sputtering. The niobium-doped molybdenum oxide target contains 60-80% MoO3 and 20-40% Nb2O5. The gas used is argon, and the deposition pressure is 0.004-0.006 mbar. (7) On the air surface of the glass substrate, a 10-20 nm thick interface reinforcement layer is obtained by magnetron sputtering with a zirconia target using a medium frequency power supply. The gas used is argon and oxygen, the deposition pressure is 0.002-0.004 mbar, and the volume ratio of Ar:O2 is 25:1.

[0015] Advantages of this invention: This invention utilizes an integrated film layer design on an ultra-white glass substrate, eliminating the need for post-treatment protective processes such as coating and drying compared to traditional aluminum mirrors. It also overcomes the technical barrier of aluminum mirrors' inability to be thermally strengthened. Based on gradient oxygen pressure sputtering, a symmetrical encapsulation system of MoO3+Nb2O5 / MgO-MoFe-MgO / MoO3+Nb2O5 (total thickness 230–300 nm) is constructed. An outer 10–20 nm ZrO2 interface layer (hardness ≥9H) directly provides mechanical protection, replacing the organic paint layer required for aluminum mirrors, reducing energy consumption by 30% and eliminating VOC emissions. Furthermore, through a high-melting-point MoFe alloy layer (30–40 nm) and an optimized oxygen barrier structure, it achieves tempering at 650℃ without melting deformation (aluminum fails at 660℃), resulting in a finished product with CLASS 0 adhesion (GB / T 9286). It is directly compatible with magnetron sputtering deposition, shortening the entire process by 50% and meeting the mass production requirements of safety glass. Attached Figure Description

[0016] Figure 1 This is a schematic diagram of a high-performance double-sided high-reflectivity coated glass. In the figure, 11-glass substrate, 21-first dielectric layer, 22-second dielectric layer, 23-third dielectric layer, 24-metal absorption layer, 25-fourth dielectric layer, 26-fifth dielectric layer, 27-interface reinforcement layer. Detailed Implementation Example 1

[0017] A high-performance double-sided high-reflection coated glass includes an ultra-white soda-lime glass substrate with a thickness of 5 mm. On the ultra-white soda-lime glass substrate, from bottom to top, there are: a silicon oxide layer, a niobium-molybdenum oxide layer, a magnesium oxide layer, a molybdenum-iron alloy layer, a magnesium oxide layer, a niobium-molybdenum oxide layer, and a zirconium oxide layer.

[0018] The manufacturing process parameters for a high-performance double-sided high-reflectivity coated glass are shown in Table 1 below, and the optical parameters of the product glass are shown in Table 2. This embodiment is a preferred embodiment of this film system structure. The prepared product exhibits excellent double-sided high reflectivity, high repeatability of various optical parameters, good surface wear resistance of the film layer, and good processability. It can meet normal production requirements.

[0019]

[0020]

Claims

1. A high-performance double-sided high-reflectivity coated glass, comprising a glass substrate, characterized in that: On the air surface of the glass substrate, from bottom to top, a first dielectric layer, a second dielectric layer, a third dielectric layer, a metal absorption layer, a fourth dielectric layer, a fifth dielectric layer, and an interface strengthening layer are sequentially provided.

2. The high-performance double-sided high-reflection coated glass according to claim 1, characterized in that: The glass substrate is ultra-white soda-lime glass with a thickness of 4-12mm.

3. The high-performance double-sided high-reflection coated glass according to claim 1, characterized in that: The first dielectric layer is a silicon oxide layer with a thickness of 10-20 nm.

4. The high-performance double-sided high-reflection coated glass according to claim 1, characterized in that: The second dielectric layer is a niobium molybdenum oxide layer with a thickness of 40-60 nm.

5. The high-performance double-sided high-reflection coated glass according to claim 1, characterized in that: The third dielectric layer is a magnesium oxide layer with a thickness of 60-80 nm.

6. The high-performance double-sided high-reflection coated glass according to claim 1, characterized in that: The metal absorption layer is a molybdenum-iron alloy layer with a thickness of 30-40 nm.

7. The high-performance double-sided high-reflection coated glass according to claim 1, characterized in that: The fourth dielectric layer is a magnesium oxide layer with a thickness of 60-80 nm.

8. The high-performance double-sided high-reflection coated glass according to claim 1, characterized in that: The fifth dielectric layer is a niobium molybdenum oxide layer with a thickness of 20-40 nm.

9. The high-performance double-sided high-reflection coated glass according to claim 1, characterized in that: The interface strengthening layer is a zirconium oxide layer with a thickness of 10-20 nm.

10. A method for preparing a high-performance double-sided high-reflectivity coated glass according to any one of claims 1-9, characterized in that... Includes the following steps: (1) On the air surface of the glass substrate, a first dielectric layer with a thickness of 10-20 nm is obtained by magnetron sputtering using a pure silicon target with a medium frequency power supply. The gas used is argon and oxygen, the deposition pressure is 0.004-0.006 mbar, and the volume ratio of Ar:O2 is 3:

2. (2) On the air surface of the glass substrate, a second dielectric layer with a thickness of 40-60 nm is obtained by magnetron sputtering using a pure silicon target with a medium frequency power supply. The gas used is argon and oxygen, the deposition pressure is 0.004-0.006 mbar, and the volume ratio of Ar:O2 is 3:

2. (3) On the air surface of the glass substrate, a third dielectric layer with a thickness of 60-80 nm is sputtered from a magnesium oxide target using a medium frequency power supply by magnetron sputtering. The gas used is argon, and the deposition pressure is 0.004-0.006 mbar. (4) On the air surface of the glass substrate, a metal absorption layer with a thickness of 30-40 nm is sputtered from a molybdenum-iron alloy target using a DC power supply by magnetron sputtering. The molybdenum content in the molybdenum-iron alloy target is 55-75%, the iron content is 25-45%, the gas used is argon, and the deposition pressure is 0.003-0.005 mbar. (5) On the air surface of the glass substrate, a fourth dielectric layer with a thickness of 60-80 nm is sputtered by a rotating magnesium oxide target using a medium frequency power supply. The gas used is argon, and the deposition pressure is 0.004-0.006 mbar. (6) On the air surface of the glass substrate, a fifth dielectric layer with a thickness of 20-40 nm is sputtered from a niobium-doped molybdenum oxide target using a medium-frequency power supply by magnetron sputtering. The niobium-doped molybdenum oxide target contains 60-80% MoO3 and 20-40% Nb2O5. The gas used is argon, and the deposition pressure is 0.004-0.006 mbar. (7) On the air surface of the glass substrate, a 10-20 nm thick interface reinforcement layer is obtained by magnetron sputtering with a zirconia target using a medium frequency power supply. The gas used is argon and oxygen, the deposition pressure is 0.002-0.004 mbar, and the volume ratio of Ar:O2 is 25:1.

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