Cleaning system

Abstract

This disclosure provides a cleaning system. The cleaning system includes a cleaning device and a base station. The cleaning device includes a cleaning component for mopping surfaces to be cleaned. The cleaning device includes a clean water tank and a wastewater tank. The clean water tank has a replenishment port and a discharge port, and the clean water tank is connected to the wastewater tank through the discharge port. The wastewater tank is used to recycle wastewater generated by the cleaning component. The base station is used for maintaining the cleaning device and has a docking interface for connecting with the replenishment port. When the docking interface is connected to the replenishment port, the cleaning device includes at least a replenishment state and a discharge state. In the replenishment state, liquid supplied by the base station is injected into the clean water tank through the docking interface and the replenishment port; in the discharge state, fluid supplied by the base station is injected into the clean water tank through the docking interface and the replenishment port, and at least a portion of the fluid passes through the clean water tank and enters the wastewater tank through the discharge port to provide positive pressure to the wastewater tank, thereby discharging the wastewater in the wastewater tank to the outside of the wastewater tank.

Description

Technical Field

[0001] This disclosure relates to the field of cleaning technology, and more specifically, to a cleaning system. Background Technology

[0002] With the continuous development of life, cleaning equipment is increasingly used in people's lives and production. After completing a cleaning task, the cleaning equipment returns to the base station, where it performs maintenance tasks such as discharging wastewater, rinsing cleaning components, replenishing cleaning fluid, and charging. Currently, base stations typically have two interfaces: one connects to the clean water tank of the cleaning equipment to replenish the cleaning fluid, and the other connects to the wastewater tank to discharge the wastewater generated during the cleaning process. This dual-interface design undoubtedly increases the difficulty of connection. If the interface connecting to the clean water tank is not properly aligned, it will lead to insufficient replenishment of cleaning fluid or leakage, resulting in waste. If the interface connecting to the wastewater tank is not properly aligned, wastewater may not be discharged along the intended path or may leak into non-liquid-containing areas of the base station, requiring additional cleaning work. Summary of the Invention

[0003] This disclosure provides a cleaning system that at least addresses the problem of difficulty in connecting base stations and cleaning equipment.

[0004] This disclosure provides a cleaning system comprising a cleaning device and a base station. The cleaning device includes a cleaning component for mopping surfaces to be cleaned, and also includes a clean water tank and a wastewater tank. The clean water tank has a replenishment port and an overflow port, and is connected to the wastewater tank via the overflow port. The wastewater tank is used to collect wastewater generated by the cleaning component. The base station is used for maintaining the cleaning device and has a connection interface for connecting with the replenishment port. When the connection interface is connected to the replenishment port, the cleaning device includes at least a replenishment state and a wastewater discharge state. In the replenishment state, liquid provided by the base station is injected into the clean water tank through the connection interface and the replenishment port. In the wastewater discharge state, fluid provided by the base station is injected into the clean water tank through the connection interface and the replenishment port, with at least a portion of the fluid passing through the clean water tank and entering the wastewater tank via the overflow port to provide positive pressure to the wastewater tank, thereby discharging wastewater from the wastewater tank to the outside.

[0005] In some embodiments, the base station is provided with a liquid supply system for providing liquid and a gas supply system for providing gas; when the cleaning equipment is in the replenishment state, the liquid provided by the liquid supply system is injected into the clean water box through the docking port and the replenishment port; when the cleaning equipment is in the sewage discharge state, the liquid and / or gas provided by the gas supply system and / or the liquid supply system are injected into the clean water box through the docking port and the replenishment port, and at least a portion of the liquid and / or the gas passes through the clean water box and enters the sewage box through the overflow port, so that the sewage in the sewage box is discharged to the outside of the sewage box.

[0006] In some embodiments, there is one interface, and both the gas source system and the liquid supply system are connected to the same interface and are connected to the same liquid replenishment port through the same interface.

[0007] In some embodiments, the cleaning component is a tracked cleaning component or a roller cleaning component.

[0008] In some embodiments, the cleaning equipment is provided with a sewage discharge channel for discharging waste from the sewage box outside the sewage box; the sewage discharge channel is provided with a control structure for controlling the opening and closing of the sewage discharge channel, and when the cleaning equipment is in the sewage discharge state, the control structure opens to open the sewage discharge channel.

[0009] In some embodiments, the overflow outlet is located above the midline of the height of the water box and near the top of the water box.

[0010] In some embodiments, a control valve is provided on the communication passage between the clean water box and the wastewater box. The control valve is used to open when the cleaning equipment is in the wastewater discharge state to allow fluid in the clean water box to enter the wastewater box, and to close when the cleaning equipment is in the replenishment state to prevent fluid in the clean water box from entering the wastewater box.

[0011] In some embodiments, along the forward direction of the cleaning device, the cleaning device includes opposing front and rear sides; the cleaning device is also provided with casters or support wheels, the water tank and the casters, or the water tank and the support wheels are both located on the rear side of the cleaning device, and in the projection in a plane perpendicular to the forward direction of the cleaning device, the projection of the casters or the support wheels is located below the projection of the water tank; in the projection in a plane perpendicular to the height direction of the cleaning device, the geometric center of the projection of the casters or the support wheels is located within the projection of the water tank.

[0012] In some embodiments, the rear sidewall of the cleaning device is provided with an injection connector, the injection connector having an injection port that communicates with the replenishment port of the clean water box. The geometric center of the caster wheel or the support wheel is located on the centerline of the width direction of the cleaning device. Along the width direction of the cleaning device, the injection port on the injection connector is located on one side of the caster wheel or the support wheel and is spaced apart from the caster wheel or the support wheel.

[0013] In some embodiments, the injection connector is further provided with blind holes, which are symmetrically arranged on both sides of the caster wheel or the support wheel along the width direction of the cleaning device, along with the injection port.

[0014] In some embodiments, the wastewater box is connected to a power unit and a filter element. When the cleaning equipment is cleaning the surface to be cleaned, the power unit is in the on state and draws negative pressure into the wastewater box to provide the power to draw the wastewater on the cleaning element into the wastewater box. The filter element is used to prevent solid waste in the wastewater box from entering the power unit.

[0015] In some embodiments, when the interface is connected to the replenishment port, the cleaning device also includes a state for rinsing the wastewater box. In the state of rinsing the wastewater box, the liquid supplied by the liquid supply system is injected into the clean water box through the interface and the replenishment port, and the gas supplied by the gas source system is injected into the clean water box through the interface and the replenishment port. The liquid and the gas together form a bubble liquid to rinse the filter element in the wastewater box.

[0016] In some embodiments, the gas source system includes a gas extraction device and a control device. The gas extraction device is used to provide a gas source. The control device is connected to the gas extraction device via a gas supply pipe and to the docking port via a first pipeline assembly, and is used to control the on / off connection between the gas supply pipe and the first pipeline assembly; when the cleaning equipment is in the sewage discharge state, the control device controls the gas supply pipe and the first pipeline assembly to be connected, and the gas extraction device supplies gas to the clean water box through the gas supply pipe, the control device, the first pipeline assembly, the docking port, and the liquid replenishment port.

[0017] In some embodiments, the base station further includes a wastewater tank for storing liquid. The wastewater tank is connected to a liquid-containing area outside the wastewater tank via a suction pipe to draw in liquid and / or connected to the outside of the base station via a drain pipe to discharge liquid. The suction pipe passes through the control device, which also controls the on / off state of the suction pipe. After the cleaning equipment returns to the base station, the wastewater discharged from the wastewater box enters the liquid-containing area outside the wastewater tank. The control device is also connected to the wastewater tank via a second pipeline assembly and controls the on / off state between the gas supply pipe and the second pipeline assembly. When the cleaning equipment is in a sewage discharge state, the control device controls the base station to be in a sewage suction state. When the base station is in a sewage suction state, the control device controls the suction pipe to be open, and the gas supply pipe and the second pipeline assembly to be open. The suction pipe, the wastewater tank, the second pipeline assembly, the control device, and the gas extraction device together form a liquid suction passage. The gas extraction device provides negative pressure to the liquid suction passage so that the liquid in the liquid-containing area is drawn into the wastewater tank through the suction pipe.

[0018] In some embodiments, the liquid supply system includes a clean water channel connecting the interface and an internal clean water tank and / or an external liquid source of the base station for supplying clean water. The gas supply system includes an exhaust channel and a multi-port connector. The exhaust channel connects to a gas extraction device of the gas supply system and is used to discharge gas from the gas extraction device to the outside of the base station. The multi-port connector includes an output interface and at least two input interfaces. The output interface is connected to the interface, and the outlet of the clean water channel and the outlet of the exhaust channel are respectively connected to different input interfaces.

[0019] In some embodiments, the liquid supply system further includes a processing liquid container, a processing liquid channel, and the multi-port connector. The processing liquid container stores the processing liquid. The processing liquid channel connects the processing liquid container and at least one other input port of the multi-port connector. The multi-port connector includes a fluid buffer chamber, within which fluids input from different input ports of the multi-port connector can mix and then flow out through the output port.

[0020] In some embodiments, the liquid supply system further includes an adjustment device disposed on the clean water channel and / or the treatment liquid channel, for adjusting the properties of the liquid entering the interface so that the properties of the liquid output from the interface to the clean water box are preset properties, wherein the properties of the liquid include at least one of the following: the temperature of the liquid, the concentration of the liquid, and the composition of the liquid.

[0021] In some embodiments, the regulating device includes a first power unit disposed on the clean water channel and used to provide driving power for conveying clean water through the clean water channel to the multi-port connector. The amount of clean water conveyed to the multi-port connector is controlled by controlling the start-up time and / or the flow rate of the first power unit.

[0022] In some embodiments, the regulating device includes an electrolysis module disposed on the clear water channel and used to electrolyze the clear water in the clear water channel to convert the clear water in the clear water channel into electrolyzed water.

[0023] In some embodiments, the regulating device includes a heating module disposed on the clean water channel and used to heat the clean water in the clean water channel.

[0024] In some embodiments, the regulating device includes a second power unit disposed on the processing fluid channel and used to provide driving power for conveying the processing fluid through the processing fluid channel to the multi-port connector. The amount of processing fluid conveyed to the multi-port connector is controlled by controlling the start-up duration and / or the flow rate of the second power unit.

[0025] In some embodiments, the processing fluid channel includes a first processing fluid channel, and the processing fluid container includes a first processing fluid container. The first processing fluid channel includes a first port and a second port, which are respectively connected to the input interface of the multi-port connector. The first processing fluid container is connected between the first port and the second port. The first processing fluid channel includes a first usage state and a second usage state. In the first usage state, liquid in the first processing fluid container flows into the multi-port connector through the first port. In the second usage state, clean water in the clean water channel sequentially flows through the multi-port connector, the first port, and the second port to clean the first processing fluid channel. The liquid after cleaning the first processing fluid channel flows to the multi-port connector through the second port.

[0026] In some embodiments, the first treatment liquid container is used to contain a ground maintenance agent. When the first treatment liquid channel is in a first use state, the clean water in the clean water channel is controlled to be delivered to the multi-port connector so that the maintenance agent and the clean water are mixed in the multi-port connector.

[0027] In some embodiments, the processing fluid channel includes a second processing fluid channel, and the processing fluid container includes a second processing fluid container for containing cleaning agent.

[0028] In some embodiments, the cleaning device further includes a recovery component, which includes a scraping part and a dirt-receiving cavity. The scraping part is used to abut against the cleaning component to scrape dirt from the cleaning component into the dirt-receiving cavity. The wastewater box is provided with an inlet and a connecting port. The inlet communicates with the overflow port, and the connecting port communicates with the dirt-receiving cavity. The height of the inlet is higher than the height of the connecting port. When the cleaning device is in the wastewater discharge state, the fluid provided by the base station is injected into the clean water box through the interface and the replenishment port. At least a portion of the fluid passes through the clean water box and enters the wastewater box through the overflow port, so that the wastewater in the wastewater box flows out from the connecting port into the dirt-receiving cavity.

[0029] In some embodiments, the base station further includes a base, a wastewater tank, and a gas supply system. The base is used to receive wastewater discharged from the wastewater containing chamber. The wastewater tank is used to store liquid and is connected to the base via a liquid extraction pipe to draw in liquid and / or connected to the outside via a drain pipe to discharge liquid. The gas supply system includes a gas extraction device and a control device. The gas extraction device is used to provide a gas source. The control device is connected to the gas extraction device via a gas supply pipe and to the wastewater tank via a second pipeline assembly, and is used to control the on / off connection between the gas supply pipe and the second pipeline assembly. The liquid extraction pipe passes through the control device, which also controls the on / off connection of the liquid extraction pipe. The liquid extraction pipe, the wastewater tank, the second pipeline assembly, the control device, and the gas extraction device together form a liquid extraction path.

[0030] In some embodiments, the interface is directly connected to the replenishment port, and a one-way self-locking valve is provided at the interface or the replenishment port; or, the interface is indirectly connected to the replenishment port via a pipe, and a one-way self-locking valve is provided at the interface, the replenishment port, or inside the pipe. When the interface and the replenishment port are not connected and the one-way self-locking valve is closed, the interface and the replenishment port are not connected; when the interface and the replenishment port are connected and the one-way self-locking valve is open, the interface and the replenishment port are connected.

[0031] In some embodiments, the clean water box is further provided with a liquid outlet, and the overflow outlet is positioned at a higher height on the clean water box than the liquid outlet is positioned on the clean water box; the cleaning device further includes a first passage, the first passage being provided with a first inlet and a first outlet, the first inlet communicating with the overflow outlet, the first outlet being used to supply liquid to flow out of the first passage, and a first power device being provided on the first passage, the first power device being used to provide driving power to discharge the liquid in the clean water box from the first passage; before the base station supplies liquid to the clean water box through the liquid replenishment port to put the cleaning device into the liquid replenishment state, the first power device drives the liquid in the clean water box to be discharged out of the clean water box through the first passage.

[0032] The cleaning system of this disclosure allows the base station and the cleaning equipment to be connected only through an interface and a liquid replenishment port. This enables the base station to provide at least one of the following substances to the cleaning equipment: liquid, gas, or gas-liquid mixture. This puts the cleaning equipment into a sewage discharge state and / or a liquid replenishment state. Only one connection accuracy needs to be considered between the interface and the liquid replenishment port, which greatly reduces the difficulty of connection and ensures high connection accuracy. This avoids waste caused by improper connection and ensures sufficient liquid replenishment. At the same time, it also ensures that sewage can be discharged along a predetermined path and will not leak into the non-liquid-containing area of ​​the base station, thus avoiding additional cleaning work.

[0033] Additional aspects and advantages of this disclosure will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of this disclosure. Attached Figure Description

[0034] The above and / or additional aspects and advantages of this disclosure will become apparent and readily understood from the description of the embodiments taken in conjunction with the following drawings, in which:

[0035] Figure 1 This is a perspective view of a cleaning system according to certain embodiments of the present disclosure;

[0036] Figure 2 yes Figure 1 A schematic diagram of one embodiment of the cleaning system shown;

[0037] Figure 3 yes Figure 1 A schematic diagram of another embodiment of the cleaning system shown;

[0038] Figure 4 yes Figure 1 A schematic diagram of the planar structure of the cleaning equipment in the cleaning system shown;

[0039] Figure 5 yes Figure 4 A partial exploded view of the cleaning equipment shown;

[0040] Figure 6 yes Figure 4 A three-dimensional assembly diagram of a portion of the liquid circuit system in the cleaning equipment shown, from one perspective;

[0041] Figure 7 yes Figure 4 A three-dimensional assembly diagram of a portion of the liquid circuit system in the cleaning equipment shown from another perspective;

[0042] Figure 8 yes Figure 5 A three-dimensional assembly diagram of the cleaning module in the cleaning equipment shown from one perspective;

[0043] Figure 9 yes Figure 8 A partial exploded view of the cleaning module shown;

[0044] Figure 10 yes Figure 8 The diagram shows another part of the cleaning module in three-dimensional exploded view;

[0045] Figure 11 yes Figure 8 A schematic diagram showing the state of the cleaning module cleaning the surface to be cleaned.

[0046] Figure 12 yes Figure 8 A three-dimensional cross-sectional view of the cleaning module, showing the water jet flow channel;

[0047] Figure 13 yes Figure 12 An enlarged schematic diagram at point XIII;

[0048] Figure 14 yes Figure 8 A schematic diagram of the housing of the cleaning module from one perspective;

[0049] Figure 15 yes Figure 14 Enlarged schematic diagram of XV in the diagram;

[0050] Figure 16 yes Figure 1 A schematic diagram of another embodiment of the cleaning system shown;

[0051] Figure 17 yes Figure 1 A schematic diagram of another embodiment of the cleaning system shown;

[0052] Figure 18 yes Figure 1 The diagram shows a simplified state of the liquid circuit system of the cleaning system when the cleaning equipment is cleaning the surface to be cleaned.

[0053] Figure 19 yes Figure 1 The diagram shows a simplified state of the fluid system in the cleaning system when the cleaning equipment is cleaning the cleaning components.

[0054] Figure 20 yes Figure 9 A three-dimensional cross-sectional view of the cleaning module shown;

[0055] Figure 21 yes Figure 9 Another perspective cross-sectional view of the cleaning module shown;

[0056] Figure 22 yes Figure 21 Enlarged schematic diagram at point XXII;

[0057] Figure 23 yes Figure 9 A three-dimensional assembly diagram of the wastewater box and the first power unit in the cleaning module shown;

[0058] Figure 24 yes Figure 23 An exploded perspective view of the wastewater box and the first power unit in the cleaning module shown;

[0059] Figure 25 yes Figure 23 A three-dimensional schematic diagram of the wastewater box in the cleaning module shown;

[0060] Figure 26 yes Figure 24 A three-dimensional schematic diagram of the cover of the sewage box shown;

[0061] Figure 27 This is a partial perspective view of a cleaning system according to certain embodiments of the present disclosure;

[0062] Figure 28 yes Figure 27 A three-dimensional schematic diagram of the base station's base in the cleaning system shown;

[0063] Figure 29 yes Figure 27 A three-dimensional schematic diagram of a portion of the base station structure in the cleaning system shown;

[0064] Figure 30 yes Figure 27 A three-dimensional schematic diagram of a portion of the base station structure in the cleaning system shown from another perspective;

[0065] Figure 31 This is a working scenario diagram of the cleaning system provided in an embodiment of this disclosure.

[0066] Explanation of key component symbols:

[0067] Cleaning system 1000;

[0068] 100 cleaning equipment;

[0069] Body 10; Liquid system 30; Cleaning module 20; Housing 21; Cleaning component 22; Clean water box 23; Liquid replenishment port 231; Liquid outlet 233; Overflow port 235; First passage 31; First inlet 311; First outlet 313; First section pipe 315; Second section pipe 317; First power unit 32; Second passage 33; Second inlet 331; Second outlet 333; Connecting pipe 334; Third section pipe 335; Fourth section pipe 337; Wastewater box 24; Liquid inlet 241; Liquid outlet 242; Connecting port 243; Box body 248; Cover 249; Sealing structure 2480; First sealing structure 2481; Second sealing structure 2483; Fluid outlet 2485; Fluid inlet 2487; First chamber 244; First sub-chamber 2441; Second sub-chamber 2443; Second chamber 245; Third chamber 246; Third chamber inlet 2 461; Third chamber inlet 2463; Filter element 247; Recycling element 251; Scraper 2512; Sludge-holding chamber 25115; First sewage outlet 25116; Second sewage outlet 25117; Control structure 25183; Connecting pipe 255; Spurting strip 26; Control valve 27; Second power unit 34; Stirring device 35; Drive device 36; Anti-backflow device 37; Water full detection device 38; Guide column 381; Limiting part 3811; Floating element 383; Detection element 3831; Sensing element 385; Width direction of cleaning equipment, width direction of machine body, rotation axis direction, length direction of sludge-holding chamber X; Traveling direction of cleaning equipment Y; Forward direction of cleaning equipment Y1; Height direction of clean water box Z; Equipment control board 50; Casters 102; Support wheels 103; Injection connector 104; Injection port 1041; Blind hole 1043; One-way self-locking valve 105;

[0070] Base station 200; water outlet 201; base station body 60; base 61; top 64; side wall 65; opening 67; liquid holding area 611; interface 63; liquid supply system 70; clean water channel 71; clean water tank 711; external liquid source of base station 713; inlet of clean water channel 715; outlet of clean water channel 717; multi-port connector 72; input interface 721; output interface 723; fluid buffer chamber 725; processing liquid container 73; first processing liquid container 731; second processing liquid container 733; processing liquid channel 74; first processing liquid channel 741; first port 7411; second port 7413; second processing liquid channel 743; adjusting device 75; first power unit 751; electrolysis module 752; heating module 753; Second power unit 754; First check valve 755; Second check valve 756; First continuity detector 757; Second continuity detector 758; Gas source system 80; Sewage tank 81; Liquid extraction port 811; Flow port 813; Outlet port 815; Gas extraction device 82; Control device 83; Gas transmission pipe 831; Gas pipeline 833; Gas delivery pipe 84; Liquid extraction pipe 85; First opening 851; Second opening 853; Drain pipe 86; Drain inlet 861; Drain outlet 863; Pipeline assembly 87; First pipeline assembly 871; First pipeline 8711; Two-way 8713; Second pipeline assembly 873; Second pipeline 8731; Three-way 8733; Valve assembly 88; Exhaust channel 89; Base station control board 90. Detailed Implementation

[0071] To make the above-described objects, features, and advantages of this disclosure more apparent and understandable, specific embodiments of this disclosure will be described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a thorough understanding of this disclosure. However, this disclosure can be implemented in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of this disclosure. Therefore, this disclosure is not limited to the specific embodiments disclosed below.

[0072] In the description of this disclosure, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," and "circumferential" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this disclosure and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this disclosure.

[0073] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this disclosure, "a plurality of" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0074] In this disclosure, unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise expressly limited. Those skilled in the art can understand the specific meaning of the above terms in this disclosure according to the specific circumstances.

[0075] In this disclosure, unless otherwise expressly specified and limited, "above" or "below" the second feature can mean that the first and second features are in direct contact, or that the first and second features are in indirect contact through an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0076] It should be noted that when an element is referred to as being "fixed to" or "set on" another element, it can be directly on the other element or there may be an intervening element. When an element is considered to be "connected to" another element, it can be directly connected to the other element or there may be an intervening element. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and similar expressions used herein are for illustrative purposes only and do not represent the only possible implementation.

[0077] Currently, base stations typically have two interfaces: one interface connects to the clean water tank of the cleaning equipment to replenish the cleaning solution, and the other interface connects to the wastewater tank of the cleaning equipment to discharge wastewater generated during cleaning operations. This dual-interface design undoubtedly increases the difficulty of connection. If the interface connecting to the clean water tank is not properly aligned, it will lead to insufficient replenishment of the cleaning solution or leakage, resulting in waste. If the interface connecting to the wastewater tank is not properly aligned, the wastewater may not be discharged along the intended path or may leak into non-liquid-containing areas of the base station, increasing the need for additional cleaning work. To address this problem, this disclosure provides a cleaning system 1000 (… Figures 1 to 3 (As shown).

[0078] Please see Figure 1 The cleaning system 1000 of this disclosure includes a cleaning device 100 and a base station 200. Please refer to... Figure 2 and Figure 3 The cleaning device 100 includes a cleaning component 22 for mopping the surface to be cleaned. The cleaning device 100 also includes a clean water tank 23 and a wastewater tank 24. The clean water tank 23 has a replenishment port 231 and an overflow port 235. The clean water tank 23 is connected to the wastewater tank 24 through the overflow port 235. The wastewater tank 24 is used to recycle the wastewater generated by the cleaning component 22. A base station 200 is used for maintaining the cleaning device 100. The base station 200 has a connection interface 63 for connecting with the replenishment port 231. When the connection interface 63 is connected to the replenishment port 231, the cleaning device 100 includes at least a replenishment state and a wastewater discharge state. When the cleaning device 100 is in the replenishment state, the liquid provided by the base station 200 is injected into the clean water tank 23 through the connection interface 63 and the replenishment port 231. When the cleaning equipment 100 is in the sewage discharge state, the fluid provided by the base station 200 is injected into the clean water box 23 through the interface 63 and the liquid replenishment port 231. At least part of the fluid passes through the clean water box 23 and enters the sewage box 24 through the overflow port 235 to provide positive pressure to the sewage box 24, so that the sewage in the sewage box 24 is discharged to the outside of the sewage box 24.

[0079] The cleaning device 100 is a device used to clean the surface to be cleaned. For example, the cleaning device 100 may include a mopping robot and a sweeping and mopping robot. A mopping robot can be used to wipe and clean the surface to be cleaned, while a sweeping and mopping robot integrates the functions of both types of robots; that is, the sweeping and mopping robot can be used to sweep the surface to be cleaned, and it can also be used to wipe and clean the surface to be cleaned. The cleaning device 100 disclosed herein is described using a sweeping and mopping robot as an example. The surface to be cleaned may be, but is not limited to, a floor, marble surface, carpet, or glass surface. This disclosure uses a floor as an example of a surface to be cleaned.

[0080] Please see Figures 4 to 6The cleaning equipment 100 also includes a body 10, a cleaning module 20, and a liquid system 30 according to any of the following embodiments. The cleaning module 20 is disposed on the body 10. The liquid system 30 is also disposed on the body 10.

[0081] The body 10 is a component on the cleaning equipment 100 used to house other components besides the body 10. Components other than the body 10 in this document include, but are not limited to, the cleaning module 20 and the fluid system 30.

[0082] Cleaning module 20 is a module on cleaning device 100 that participates in cleaning the surface to be cleaned by providing dragging force. Please refer to... Figure 8 The cleaning module 20 includes a housing 21 and a cleaning component 22. The housing 21 is a component for mounting elements other than the housing 21 (e.g., the cleaning component 22) within the cleaning module 20. The cleaning component 22 is a component within the cleaning module 20 that specifically provides abrasive force to clean the surface to be cleaned. The cleaning component 22 is disposed on the body 10, specifically: the housing 21 is mounted to the body 10 in a detachable or non-detachable manner, and the cleaning component 22 is mounted to the housing 21 in a detachable or non-detachable manner, thereby indirectly disposing of the cleaning component 22 on the body 10. For example, the connection between the housing 21 and the body 10 can also be a movable connection; for instance, the housing 21 can be raised and lowered relative to the body 10 in the height direction Z, and the housing 21 can be moved relative to the body 10 in the width direction X, thereby enabling the cleaning module 20 to be raised and lowered relative to the body 10 in the height direction Z and moved relative to the body in the width direction X.

[0083] In some embodiments, the cleaning component 22 is a tracked cleaning component, in which case the cleaning device 100 is a tracked cleaning device. In other embodiments, the cleaning component 22 is a roller-type cleaning component, in which case the cleaning device 100 is a roller-type cleaning device. In still other embodiments, the cleaning component 22 can be a flatbed cleaning component or a rotating disc cleaning component, in which case the cleaning device 100 is a flatbed cleaning device or a rotating disc cleaning device. Regardless of the type of cleaning component 22, it is in contact with the surface to be cleaned when the cleaning module 20 cleans the surface to be cleaned. For rotating disc-type, tracked, or roller-type cleaning components, they all rotate relative to the surface to be cleaned when cleaning it. During the rotation of the cleaning component 22, it can roll away or wipe away the dirt on the surface to be cleaned, so as to keep the surface to be cleaned clean. The dirt here can include liquid dirt and solid dirt. The cleaning component 22 provided in the embodiments of this disclosure can be any of the above, as long as the cleaning component 22 can be supplied with liquid by the liquid circuit system 30 on the cleaning device 100. In addition, the cleaning component 22 includes, but is not limited to, disposable electrostatic mops, disposable wet mops, or reusable fabric mops.

[0084] In some embodiments, the rotation axis of the cleaning component 22 may be parallel to the surface to be cleaned. For example, both the tracked cleaning component 22 and the roller cleaning component 22 can clean the surface by rotating. Compared to cleaning equipment using traditional rotating disc or flatbed cleaning components, the traditional method of cleaning disc or flatbed cleaning components only achieves cleaning by the base station supplying water to the disc or flatbed cleaning component after the cleaning equipment returns to the base station. This design causes the cleaning component of the disc or flatbed cleaning component to become increasingly dirty while cleaning the surface, requiring the cleaning equipment to frequently return to the base station to clean its components, which can easily affect the cleaning effect and efficiency. Since the tracked and roller cleaning components roll on the surface to be cleaned, the cleaning equipment 100 is provided with a scraping part 2512 that abuts against the tracked or roller cleaning component. Figure 10 (As shown), the dirt on the tracked or roller-type cleaning components can be scraped into the cleaning equipment 100 for collection, and the cleaning components 22 will remain relatively clean. Therefore, the tracked and roller-type cleaning equipment has a better cleaning effect on the surface to be cleaned.

[0085] Please see Figure 2 , Figure 3 , Figure 6 and Figure 7 The liquid system 30 is a system on the cleaning device 100 that participates in cleaning the surface to be cleaned by providing liquid. In some embodiments of this disclosure, the liquid system 30 can provide liquid to the cleaning component 22 to wet the cleaning component 22 when it is mopping the surface to be cleaned, so that the cleaning component 22 maintains good mopping ability. In other embodiments of this disclosure, in addition to providing liquid for cleaning the surface to be cleaned, the liquid system 30 can also recycle wastewater generated by the cleaning component 22 when mopping the surface to be cleaned, thereby realizing the self-cleaning function of the cleaning component 22. In still other embodiments of this disclosure, in addition to providing liquid for cleaning the surface to be cleaned and recycling wastewater generated by the cleaning component 22 when mopping the surface to be cleaned, thereby realizing the self-cleaning function of the cleaning component 22, the liquid system 30 can also provide liquid for cleaning the cleaning component 22 after the cleaning device 100 reaches a preset position, wherein the preset position includes, but is not limited to, the base station 200 or an area with a drainage system, such as a toilet. It should be noted that the liquid circuit system 30 and the cleaning module 20 are both structures on the cleaning equipment 100 that participate in cleaning the surface to be cleaned. The components contained in each of them may not overlap at all or may overlap at least partially.

[0086] To enable the cleaning equipment 100 to connect with the base station 200, and to supply liquid to the clean water box 23 of the cleaning equipment 100 and clean the wastewater box 24 through the base station 200, the following embodiment provides a solution for connecting the liquid circuit of the base station 200 and the cleaning equipment 100 through an interface, which can effectively improve the reliability of the connection between the cleaning equipment 100 and the base station 200.

[0087] Specifically, please refer to Figure 2 , Figure 3 , Figure 6 and Figure 7 In some embodiments, the liquid system 30 includes a clean water tank 23 and a wastewater tank 24. The clean water tank 23 and the wastewater tank 24 are connected.

[0088] The water container 23 is a container on the liquid system 30 and / or cleaning module 20 used to load and / or store liquids. It should be noted that the name "water container 23" does not limit the type of liquid it contains; that is, the liquid in the water container 23 is not limited to storing only clean water, but can store liquids including clean water, mixtures of cleaning agent and clean water (hereinafter referred to as cleaning liquid), mixtures of maintenance agent and clean water (hereinafter referred to as maintenance liquid), etc., used for cleaning the cleaning components 22, and for cleaning and / or maintaining surfaces to be cleaned. Furthermore, "clean water" here is a relative concept; any water cleaner than what the user perceives as sewage is within the scope of protection. For example, clean water can be municipal tap water, clean river, lake, or sea water, etc. The water container 23 can be of any shape; for example, the shape of the cross-section of the water container 23 (in this text, "cross-section" refers to the plane intercepted by a plane perpendicular to the height direction Z of the water container 23) can be regular or irregular. In this article, "regular shapes" include, but are not limited to, rectangles, circles, ellipses, triangles, regular polygons, etc. Irregular shapes, such as... Figure 6 As shown, the irregular cross-sectional design can adapt to the structural layout of the cleaning equipment 100, making it convenient to arrange other components in a compact manner.

[0089] Specifically, please refer to Figure 6 and Figure 7 The clean water box 23 is provided with a replenishment port 231, a discharge port 233, and an overflow port 235. The clean water box 23 is connected to the wastewater box 24 through the overflow port 235. The location, height, shape, and size of the replenishment port 231 can be arbitrarily set, and this disclosure does not limit it. The shape and size of the discharge port 233 and the overflow port 235 can also be arbitrarily set, and this disclosure does not limit them.

[0090] In some embodiments, for example, the height of the outlet 233 on the water container 23 may be lower than the height of the overflow outlet 235 on the water container 23. For example, the outlet 233 may be located on the side wall of the water container 23, and the overflow outlet 235 may be located on the top wall of the water container 23. Alternatively, both the outlet 233 and the overflow outlet 235 may be located on the side wall of the water container 23, but the height of the outlet 233 may be lower than the height of the overflow outlet 235. Alternatively, the water container 23 may be irregularly shaped, and may include at least two top walls, with the outlet 233 and the overflow outlet 235 located on top walls at different heights. In summary, by setting the outlet 233 at a lower height than the overflow outlet 235 on the water tank 23, the liquid in the water tank 23 will not flow out of the overflow outlet 235 when the liquid level in the water tank 23 has not reached the height set by the overflow outlet 235. Only when the liquid level in the water tank 23 exceeds the overflow outlet 235 will the liquid flow out of the overflow outlet 235. It should be noted that "exceeding the overflow outlet 235" means that if the liquid level in the water tank 23 has reached the lowest point of the overflow outlet 235, and more liquid is added to the water tank 23, then the liquid in the water tank 23 will overflow from the overflow outlet 235 to the outside of the water tank 23. If the liquid level in the water tank 23 is higher than the lowest point of the overflow outlet 235, then it falls more precisely into the category of "exceeding the overflow outlet 235".

[0091] Specifically, the clear water tank 23 has a height dividing line (a line passing through the midpoint of the height and perpendicular to the height direction Z), with the outlet 233 located below the height dividing line and the overflow outlet 235 located above it. In one example, the outlet 233 is near the bottom of the clear water tank 23, and the overflow outlet 235 is near the top of the clear water tank 23. For an example, please refer to [link to example]. Figures 1 to 3 , Figures 5 to 7The cleaning device 100 is equipped with drive wheels 101 for driving the cleaning device 100 to move on the surface to be cleaned. Taking the direction of travel (forward / backward movement) Y of the cleaning device 100 as a reference, the cleaning module 20 provided in this embodiment can be located behind the drive wheels 101, and the water tank 23 can be located at the rear of the cleaning module 20. When the cleaning device 100 needs to enter the base station 200, the cleaning device 100 can enter the base station 200 in a backward posture. To adapt to the structural layout of the cleaning device 100 of this disclosure and facilitate the docking of the water tank 23 with the base station 200, enabling the base station 200 to replenish water to the water tank 23, the replenishment port 231 is located on the side of the water tank 23 facing the rear of the cleaning device 100, and the outlet port 233 and overflow port 235 can be located on the side of the water tank 23 facing the front of the cleaning device 100. The replenishment port 231 is an opening for connecting the inside of the clear water tank 23 with an external liquid source; that is, an external liquid source can enter the clear water tank 23 through the replenishment port 231. The outlet port 233 and overflow port 235 are openings for connecting the inside of the clear water tank 23 with an external pipeline; that is, liquid in the clear water tank 23 can flow out through the outlet port 233 and / or overflow port 235 to the external pipeline, and then flow to the target object through the external pipeline. Please refer to... Figure 10 In this disclosure, the cleaning module 20 and / or the liquid circuit system 30 further include a spray bar 26, the target of which may be the spray bar 26. The spray bar 26 may be disposed on one side of the cleaning module 20. For example, in an embodiment of this disclosure, the spray bar 26 may be disposed on the front side of the cleaning module 20 and fixed to the front part of the housing 21 of the cleaning module 20. The spray bar 26 has a plurality of spray nozzles 261, which are arranged at intervals along the rotation axis X of the cleaning component 22 and facing the cleaning component 22, so that the liquid sprayed from the spray bar 26 can flow to the cleaning component 22. It should be noted that the external liquid source in this disclosure is the liquid supply system 70 of the base station 200 mentioned below.

[0092] Wastewater container 24 is a container on the liquid system 30 and / or cleaning module 20 used for passing through, loading, and / or storing liquids. It should be noted that the name "wastewater container 24" does not limit the type of liquid it contains; that is, the liquid in wastewater container 24 is not limited to storing only wastewater, but can store clean water, wastewater, etc. In this disclosure, wastewater container 24 can be used to recycle wastewater generated by cleaning component 22 to achieve the self-cleaning function of the aforementioned cleaning component 22. Here, "clean water" is interpreted as before, while "wastewater" is a relative concept; any water that is dirtier than what the user perceives as clean (or a mixture of water and dirt) is within the scope of protection. Wastewater container 24 can be of any shape; for example, the cross-sectional shape of wastewater container 24 can be regular or irregular. In this document, the cross-sectional shape of wastewater container 24 is irregular. This irregular cross-sectional design can adapt to the structural layout of cleaning equipment 100, facilitating the compact arrangement of other components.

[0093] Please see Figures 1 to 3 Base station 200 is a device used for maintenance and upkeep of cleaning equipment 100. For example, base station 200 can clean cleaning equipment 100 and charge it. Furthermore, base station 200 may also have at least one of the following functions: replenishing water to cleaning equipment 100, draining water, and collecting dust. For example, when the power of cleaning equipment 100 is insufficient, it returns to base station 200 to recharge. When cleaning equipment 100 is fully charged, it can leave base station 200 and continue cleaning the surface to be cleaned. When cleaning equipment 100 needs to drain (dirt), it returns to base station 200 to discharge the wastewater, and then leaves base station 200 to continue cleaning the surface to be cleaned.

[0094] In this disclosure, the base station 200 is provided with a docking interface 63 for connecting with the replenishment port 231. When the docking interface 63 is connected with the replenishment port 231, the cleaning device 100 includes at least a replenishment state and a discharge state. In the replenishment state, the liquid provided by the base station 200 is injected into the clean water box 23 through the docking interface 63 and the replenishment port 231; in the discharge state, the fluid provided by the base station 200 is injected into the clean water box 23 through the docking interface 63 and the replenishment port 231, and at least a portion of the fluid passes through the clean water box 23 and enters the wastewater box 24 through the overflow port 235 to provide positive pressure to the wastewater box 24, thereby discharging the wastewater in the wastewater box 24 to the outside of the wastewater box 24.

[0095] In this disclosure, "fluid" includes at least one of the following: gas, liquid, and gas-liquid mixture (e.g., "bubble liquid" hereinafter). The properties of a fluid include at least one of the following: fluid composition, fluid temperature, and fluid concentration. Regarding "liquid," in terms of composition, the "liquid" mentioned herein includes, but is not limited to, water, a maintenance solution formed by mixing water and a maintenance agent, and a cleaning solution formed by mixing water and a cleaning agent. Water and cleaning solution can be used as cleaning solutions for cleaning surfaces to be cleaned, cleaning parts 22, or wastewater boxes 24, while maintenance solutions are used to maintain surfaces to be cleaned. In terms of temperature, "liquid" includes unheated liquids and heated liquids; in terms of concentration, "liquid" includes a maintenance solution formed by mixing water and a maintenance agent in a predetermined ratio, and a cleaning solution formed by mixing water and a cleaning agent in a preset ratio. The "gas" mentioned herein can be air, or, like the aforementioned "liquid," can have some adjustments in terms of composition, temperature, and concentration. Regarding the "gas-liquid mixture," since it is formed by the simultaneous mixing of gas and liquid supplied by the base station 200, the "liquid" and "gas" can be adjusted according to the aforementioned corresponding attributes to form the final "gas-liquid mixture." In this disclosure, when the cleaning device 100 is in a liquid replenishment state, the base station 200 provides liquid to the cleaning device 100; while when the cleaning device 100 is in a state of cleaning the wastewater box 24 (including the state of discharging wastewater and cleaning the wastewater box 24), the base station 200 can provide liquid, gas, or a gas-liquid mixture to the cleaning device 100. The following is in conjunction with... Figure 2 and Figure 3 The supply behavior of base station 200 is described in detail when cleaning equipment 100 is in liquid replenishment and sewage discharge states.

[0096] In one example, when the interface 63 of the base station 200 is connected to the replenishment port 231, and cleaning fluid is injected into the clean water box 23 through the interface 63 and the replenishment port 231, at least a portion of the cleaning fluid output from the base station 200 is stored in the clean water box 23 to replenish the cleaning equipment 100. At this time, the cleaning equipment 100 is in the replenishment state. When the liquid level in the clean water box 23 exceeds the overflow port 235, the portion of the cleaning fluid exceeding the overflow port 235 enters the sewage box 24 through the overflow port 235. At this time, the cleaning equipment 100 is in the sewage discharge state. Thus, the cleaning equipment 100 can replenish the liquid first and then discharge the sewage, and the two are performed in separate time periods.

[0097] In another example, the interface 63 of the base station 200 is connected to the liquid replenishment port 231. Gas is first injected into the clean water box 23 through the interface 63 and the liquid replenishment port 231. The gas enters the sewage box 24 through the overflow port 235, squeezing the sewage in the sewage box 24 outward and discharging it from the sewage box 24, thereby realizing the sewage discharge of the cleaning device 100. At this time, the cleaning device 100 is in the sewage discharge state. Then, the base station 200 injects liquid into the clean water box 23 through the interface 63 and the liquid replenishment port 231. The liquid is stored in the clean water box 23 to realize the liquid replenishment of the cleaning device 100. At this time, the cleaning device 100 is in the liquid replenishment state. Thus, the cleaning device 100 can discharge sewage first and then replenish liquid.

[0098] In another example, when the interface 63 of the base station 200 is connected to the liquid replenishment port 231, and gas and liquid are simultaneously injected into the clean water box 23 through the interface 63 and the liquid replenishment port 231, the gas and liquid mix to form a gas-liquid mixture. A portion of the gas-liquid mixture is stored in the clean water box 23 to replenish the cleaning equipment 100. At this time, the cleaning equipment 100 is in the replenishment state. At the same time, a portion of the gas-liquid mixture enters the sewage box 24 through the overflow port 235, squeezing the sewage in the sewage box 24 outward to discharge it from the sewage box 24, thereby achieving the sewage discharge of the cleaning equipment 100. At this time, the cleaning equipment 100 is also in the sewage discharge state. Thus, the replenishment and sewage discharge of the cleaning equipment 100 are carried out simultaneously.

[0099] In another example, the interface 63 of the base station 200 is connected to the liquid replenishment port 231. Gas is first injected into the clean water box 23 through the interface 63 and the liquid replenishment port 231. The gas enters the sewage box 24 through the overflow port 235, squeezing the sewage in the sewage box 24 outward to discharge it, thereby realizing the sewage discharge of the cleaning equipment 100. At this time, the cleaning equipment 100 is in the sewage discharge state. Then, the base station 200 simultaneously injects gas and liquid into the clean water box 23 through the interface 63 and the liquid replenishment port 231. After the gas and liquid mix, they form a gas-liquid mixture. Part of the gas-liquid mixture is stored in the clean water box 23 to replenish the liquid of the cleaning equipment 100, and part of the gas-liquid mixture enters the sewage box 24 through the overflow port 235, continuing to squeeze the sewage in the sewage box 24 outward to discharge it from the sewage box 24. Thus, the cleaning equipment 100 first discharges sewage and then replenishes liquid and discharges sewage simultaneously.

[0100] In some embodiments, interface 63 is directly connected to the replenishment port 231, and a one-way self-locking valve 105 is provided at interface 63 or replenishment port 231. In other embodiments, interface 63 and replenishment port 231 are indirectly connected via a pipe, and a one-way self-locking valve 105 is provided at interface 63, replenishment port 231, or inside the pipe. When interface 63 and replenishment port 231 are connected or not connected, and the one-way self-locking valve 105 is closed, interface 63 and replenishment port 231 are not connected; when interface 63 and replenishment port 231 are connected, and the one-way self-locking valve 105 is open, interface 63 and replenishment port 231 are connected, and the flow is unidirectional along the direction from base station 200 to cleaning equipment 100.

[0101] In the cleaning system 1000 disclosed herein, the base station 200 and the cleaning equipment 100 can be connected by only an interface 63 and a liquid replenishment port 231. This allows the base station 200 to provide at least one of liquid, gas, or gas-liquid mixture to the cleaning equipment 100, so that the cleaning equipment 100 is in a sewage discharge state and / or a liquid replenishment state. Only one connection accuracy needs to be considered between the interface 63 and the liquid replenishment port 231, which greatly reduces the connection difficulty and ensures high connection accuracy. This avoids waste caused by incomplete connection and ensures sufficient liquid replenishment. At the same time, it also ensures that the sewage can be discharged according to the predetermined path and will not leak into the non-liquid-containing area of ​​the base station 200, thus avoiding additional cleaning work.

[0102] The cleaning equipment 100 will now be described in detail with reference to the accompanying drawings.

[0103] Please see Figure 5 and Figure 6 Along the forward direction Y1 of the cleaning device 100, the cleaning device 100 includes opposing front and rear sides. In one embodiment, the body 10 of the cleaning device 100 is also provided with casters 102. The casters 102 are wheels on the body 10 that can rotate horizontally 360 degrees to drive the cleaning device 100 to flexibly turn. Both the water tank 23 and the casters 102 are located on the rear side of the cleaning device 100. In the projection in a plane perpendicular to the forward direction Y1 of the cleaning device 100, the projection of the casters 102 is located below the projection of the water tank 23. In the projection in a plane perpendicular to the height direction Z of the cleaning device 100, the geometric center of the projection of the casters 102 is located within the projection of the water tank 23. Since the water tank 23 is relatively heavy, the design of the positional relationship between the caster 102 and the water tank 23 is beneficial to support the heavier part of the cleaning equipment 100, making it more stable when the caster 102 drives the cleaning equipment 100 to turn, and preventing the liquid in the water tank 23 from sloshing and overflowing.

[0104] In another embodiment, the body 10 of the cleaning device 100 is also provided with support wheels 103. Support wheels 103 are wheels on the body 10 that support the weight and maintain stability, and their rotation axis is parallel to the width direction X of the body. Both the water tank 23 and the support wheels 103 are located on the rear side of the cleaning device 100. In the projection onto a plane perpendicular to the forward direction Y1 of the cleaning device 100, the projection of the support wheels 103 is located below the projection of the water tank 23. In the projection onto a plane perpendicular to the height direction Z of the cleaning device 100, the geometric center of the projection of the support wheels 103 is located within the projection of the water tank 23. Because the water tank 23 is relatively heavy, this positional relationship between the support wheels 103 and the water tank 23 is beneficial for supporting the heavier parts of the cleaning device 100, making the cleaning device 100 more stable when moving and preventing the liquid in the water tank 23 from sloshing and overflowing.

[0105] In some embodiments, the rear sidewall of the cleaning device 100 is provided with an injection connector 104, which has an injection port 1041 that communicates with the replenishment port 231 of the clean water box 23. The "injection connector 104" here can be the "pipe or adapter" used for indirect connection between the interface 63 and the replenishment port 231 mentioned above. The geometric center of the caster wheel 102 or support wheel 103 is located on the centerline of the width direction X of the cleaning device 100, thus stably supporting the body 10 and driving the body 10 to move stably. Along the width direction X of the cleaning device 100, the injection port 1041 on the injection connector 104 is located on one side of the caster wheel 102 or support wheel 103 and is spaced apart from the caster wheel 102 or support wheel 103. The injection connector 104 is also provided with a blind hole 1043, which is symmetrically arranged with the injection port 1041 along the width direction X of the cleaning device 100 on both sides of the caster wheel 102 or the support wheel 103. The injection port 1041 is used to mate with the docking port 63, so that the docking port 63 can communicate with the replenishment port 231 through the injection port 1041. The symmetrical arrangement of the blind hole 1043 and the injection port 1041 on both sides of the caster wheel 102 or the support wheel 103 makes the cleaning device 100 more aesthetically pleasing.

[0106] In some embodiments, the base station 200 is provided with a liquid supply system 70 for providing liquid and a gas supply system 80 for providing gas. When the cleaning equipment 100 is in a liquid replenishment state, the liquid provided by the liquid supply system 70 is injected into the clean water box 23 through the interface 63 and the liquid replenishment port 231. When the cleaning equipment 100 is in a sewage discharge state, the liquid and / or gas provided by the gas supply system 80 and / or the liquid supply system 70 are injected into the clean water box 23 through the interface 63 and the liquid replenishment port 231. At least a portion of the liquid and / or gas passes through the clean water box 23 and enters the sewage box 24 through the overflow port 235, so that the sewage in the sewage box 24 is discharged to the outside of the sewage box 24.

[0107] In some embodiments, the wastewater box 24 is connected to a power unit (hereinafter referred to as the second power unit) 34 and a filter element 247. When the cleaning device 100 is cleaning the surface to be cleaned, the power unit 34 is in the on state and draws negative pressure into the wastewater box 24 to provide power to draw wastewater from the cleaning element 22 into the wastewater box 24. The filter element 247 is used to prevent solid waste in the wastewater box 24 from entering the power unit 34. When the interface 63 is connected to the liquid replenishment port 231, the cleaning device 100 also includes a state of rinsing the wastewater box 24. When the cleaning device 100 is in the state of rinsing the wastewater box 24, the liquid provided by the liquid supply system 70 is injected into the clean water box 23 through the interface 63 and the liquid replenishment port 231, and the gas provided by the gas source system 80 is injected into the clean water box 23 through the interface 63 and the liquid replenishment port 231. The liquid and gas together form a bubble liquid to rinse the filter element 247 in the wastewater box 24.

[0108] Please refer to [link / reference] Figure 2 and Figure 3 The wastewater box 24 is provided with an inlet 241, which is an opening connecting the inside of the wastewater box 24 to the outside. The inlet 241 is connected to the overflow outlet 235. Specifically, the inlet 241 can be connected to the overflow outlet 235 through a connecting pipe 334. Corresponding to the arrangement of the second power device 34, the wastewater box 24 is also provided with a drain outlet 242, which is an opening connecting the inside of the wastewater box 24 to the external pipe. The drain outlet 242 is connected to the second power device 34. Specifically, the drain outlet 242 can be connected to the second power device 34 through a third section of pipe 335. The shape and size of the inlet 241 and the drain outlet 242 can be arbitrarily set, and this disclosure does not limit them.

[0109] The second power unit 34 is a device used to provide power to the hydraulic system 30 and / or the cleaning module 20. The second power unit 34 is connected to the drain port 242 and is used to provide the driving power to propel the wastewater on the cleaning component 22 into the wastewater box 24. That is, the second power unit 34 acts as an air pump, capable of drawing negative pressure into the wastewater box 24 to draw the wastewater scraped off the cleaning component 22 into the wastewater box 24. Further, the cleaning equipment 100 may also include an equipment control board 50, which is a device for controlling the operation of various functional modules in the cleaning equipment 100. The equipment control board 50 typically includes a circuit board and a controller or processor mounted on the circuit board. The equipment control board 50 is electrically connected to the second power unit 34 and can be used to control the opening, closing, drawing negative pressure, and discharging positive pressure of the second power unit 34. When the cleaning equipment 100 is cleaning the surface to be cleaned, the equipment control board 50 controls the second power unit 34 to open and draw negative pressure into the wastewater box 24.

[0110] Filter element 247 is a component used to filter large-sized substances from a liquid. In one example, filter element 247 is a filter screen with multiple holes. The size of the holes can be set as needed, only requiring that liquid can pass through while preventing larger-sized substances (solid waste) from passing through. On one hand, when the second power unit 34 draws negative pressure into the sewage box 24 to extract sewage into the sewage box 24, filter element 247 can prevent solid waste from entering the second power unit 34 and affecting its service life. On the other hand, when the cleaning equipment 100 is inverted, the sewage in the sewage box 24 will flow towards the second power unit 34, and filter element 247 can also prevent solid waste from entering the second power unit 34 and affecting its service life. Since the filter element 247 is used to prevent at least some solid waste in the sewage box 24 from entering the second power device 34, solid waste will inevitably accumulate on the filter element 247. Over time, the solid waste will clog the holes in the filter element 247. This clogging will prevent positive pressure from flowing into the sewage box 24, thus hindering the discharge of sewage from the sewage box 24. Simultaneously, the second power device 34 will also be unable to draw negative pressure into the sewage box 24, thus hindering the suction of sewage into the sewage box 24. In this embodiment, the base station 200 injects gas into the clean water box 23 while simultaneously injecting liquid. The liquid and gas together form a bubble liquid, which overflows from the overflow port 235 and enters the sewage box 24. This is equivalent to pressurizing the water. Compared to rinsing the filter element 247 only with liquid, the bubble liquid has a greater rinsing force on the filter element 247, preventing solid waste from clogging the holes in the filter element 247, thus ensuring the smooth discharge and suction of sewage by the cleaning equipment 100.

[0111] The cleaning equipment 100 is provided with a sewage discharge channel for discharging the waste in the sewage box 24 out of the sewage box 24; the sewage discharge channel is provided with a control structure 25183 for controlling the opening and closing of the sewage discharge channel. When the cleaning equipment 100 is in the sewage discharge state, the control structure 25183 opens the sewage discharge channel.

[0112] In some embodiments, the cleaning fluid provided by the base station 200 can be supplied to the clean water box 23 through the interface 63 and the replenishment port 231. By injecting the cleaning fluid into the clean water box 23, the cleaning fluid can overflow from the overflow port 235. The overflowed cleaning fluid can pass through the sewage box 24 and then be discharged to the cleaning component 22 to clean the cleaning component 22. Thus, the function of using the cleaning fluid overflowing from the clean water box 23 to clean the cleaning component 22 can also be realized.

[0113] Please see Figure 2 and Figure 3In some specific embodiments, the liquid circuit system 30 of the cleaning device 100 further includes a first passage 31, a first power unit 32, and a second passage 33. The first passage 31 is provided with a first inlet 311 and a first outlet 313. The first inlet 311 is connected to the outlet 233 of the clean water box 23, and the first outlet 313 is used for the liquid to flow out of the first passage 31. The first power unit 32 is provided on the first passage 31, and the first power unit 32 is used to provide driving power to discharge the liquid from the clean water box 23 into the first passage 31. The second passage 33 is provided with a second inlet 331 and a second outlet 333. The second inlet 331 is connected to the overflow outlet 235, and the second outlet 333 is used for the liquid to flow out of the second passage 33. The second passage 33 is provided with the aforementioned wastewater box 24 and the second power unit 34. The wastewater box 24 is connected to both the overflow outlet 245 and the second power unit 34. The second power unit 34 is also used to provide driving power to discharge the liquid from the clean water box 23 into the second passage 33.

[0114] The first passage 31 is a channel for fluid flow connecting the liquid outlet 233 and the spray bar 26. The first passage 31 includes a first inlet 311 and a first outlet 313 located at opposite ends. The first inlet 311 communicates with the liquid outlet 233, and the first outlet 313 communicates with the spray bar 26 and is used for fluid outflow from the first passage 31. Specifically, in some embodiments, the first passage 31 may at least include a pipe. In other embodiments, the first passage 31 may be a channel defined by the wall surface of a component of the cleaning device 100.

[0115] The second passage 33 is a channel for fluid flow connecting the overflow outlet 235 and the spray bar 26. The second passage 33 includes a second inlet 331 and a second outlet 333 located at opposite ends. The second inlet 331 communicates with the overflow outlet 235, and the second outlet 333 communicates with the spray bar 26, and is used for the outflow of liquid from the second passage 33. Specifically, in some embodiments, the second passage 33 may at least include a pipe. In other embodiments, the second passage 33 may be a channel defined by the wall surface of a component of the cleaning device 100.

[0116] The first power unit 32 is a device that provides the driving power to discharge liquid from the clean water tank 23 into the first passage 31. In some embodiments, the first power unit 32 includes a peristaltic pump. Generally, peristaltic pumps have a small flow rate and are suitable for applications requiring precise flow control. In this embodiment, the first power unit 32 is disposed in the first passage 31 and is used to drive the liquid in the clean water tank 23 to flow to the cleaning component 22 when the cleaning device 100 is cleaning the surface to be cleaned. This wets the cleaning component 22, allowing for better wiping of the surface to be cleaned. Therefore, in this scenario, the required flow rate of the first power unit 32 is small, allowing for more precise control of the amount of liquid supplied to the cleaning component 22 and preventing excessive water residue on the surface to be cleaned during wiping. Therefore, selecting a peristaltic pump with a small flow rate that allows for precise flow control as the first power unit 32 better meets the needs of the cleaning device 100 for wiping the surface to be cleaned. Of course, in other embodiments, the first power unit 32 can also be a water pump with a small flow rate, and this disclosure does not impose any particular limitation.

[0117] It should be noted that, since the amount of liquid applied to the cleaning component 22 when the cleaning device 100 mops the surface to be cleaned can be relatively small, that is, the flow rate of the first power device 32 is very small as described above. It is understood that the larger the cross-sectional size of the overflow port 235, the greater the flow rate of liquid overflowing from the clean water box 23 through the overflow port 235. To achieve the purpose of using a large flow rate of liquid to clean the cleaning component 22, those skilled in the art can adjust the cross-sectional size of the overflow port 235 as needed to achieve the purpose of cleaning the cleaning component 22 with a large flow rate.

[0118] Please combine Figure 6 and Figure 7 The inlet of the first power unit 32 is connected to the outlet 233 via the first section of pipe 315, and the outlet of the first power unit 32 is connected to the spray bar 26 via the second section of pipe 317. The opening where the first section of pipe 315 connects to the outlet 233 is the first inlet 311, and the opening where the second section of pipe 317 connects to the spray bar 26 is the first outlet 313. At this time, the first passage 31 includes the first section of pipe 315, the first power unit 32, and the second section of pipe 317. When the cleaning equipment 100 also includes an equipment control board 50, the equipment control board 50 is electrically connected to the first power unit 32 and is used to control the opening and closing of the first power unit 32.

[0119] Please refer to [link / reference] Figure 2 and Figure 3The wastewater box 24 is also provided with a connecting port 243. The inlet port 241 is connected to the second inlet 331, that is, the inlet port 241 and the overflow port 235 are connected through a connecting pipe 334, and the inlet of the connecting pipe 334 is the second inlet 331. The drain port 242 is connected to the second outlet 333. For example, the connecting port 243 is used to allow wastewater on the cleaning component 22 to enter the wastewater box 24, and to allow wastewater in the wastewater box 24 to be discharged to the outside of the wastewater box 24.

[0120] Specifically, please combine Figure 6 and Figure 7 The shape and size of the inlet 241, outlet 242, and connecting port 243 can be arbitrarily set, and this disclosure does not limit them. In some embodiments, the outlet 242 is set at a higher height on the wastewater box 24 than the connecting port 243. Specifically, the wastewater box 24 has a height dividing line (see above for explanation), with the inlet 241 and outlet 242 located above the height dividing line, and the connecting port 243 located below the height dividing line. In one example, the connecting port 243 is near the bottom of the wastewater box 24, and the inlet 241 and outlet 242 are near the top of the wastewater box 24. In other embodiments, the inlet 241 is set at a higher height than the connecting port 243. To accommodate the structural layout of the cleaning equipment 100 disclosed herein, the inlet 241 is located on the left side of the wastewater box 24 in the width direction X of the machine body, the outlet 242 is located on the right side of the wastewater box 24 in the width direction X of the machine body, and the connecting port 243 is located on the side of the clean water box 23 facing the rear of the cleaning equipment 100. Here, "left side" and "right side" refer to the perspective when the cleaning equipment 100 is moving forward. The inlet 241 is an opening for connecting the inside and outside of the wastewater box 24, specifically connecting to the second inlet 331 of the second passage 33. That is, liquid in the clean water box 23 can enter the second passage 33 through the second inlet 331, and then enter the inside of the wastewater box 24 through the inlet 241. The outlet 242 is an opening for connecting the inside and outside of the wastewater box 24, that is, liquid in the wastewater box 24 can flow out to the outside pipe through the outlet 242, and then flow to the target object—the spray bar 26—through the outside pipe.

[0121] Please see Figure 2 , Figure 3 , Figures 6 to 8The second power unit 34 also provides the driving power to discharge liquid from the clean water box 23 into the second passage 33. In some embodiments, the second power unit 34 includes a water-air pump, that is, the second power unit 34 is both a water pump for pumping or draining water and an air pump for creating negative or positive pressure. In one example, the inlet of the second power unit 34 is connected to the drain outlet 242 through the third section pipe 335, and the outlet of the second power unit 34 is connected to the spray bar 26 through the fourth section pipe 337. The opening of the fourth section pipe 337 connected to the spray bar 26 is the second outlet 333. In this case, the second passage 33 includes the connecting pipe 334, the wastewater box 24, the third section pipe 335, the second power unit 34, and the fourth section pipe 337. When the cleaning equipment 100 also includes an equipment control board 50, the equipment control board 50 is electrically connected to the second power unit 34 and is also used to control the opening and closing of the second power unit 34.

[0122] Please see Figures 8 to 10 In some embodiments, the liquid system 30 and / or cleaning module 20 may further include a recovery component 251, which is used to collect, load, and / or store wastewater generated by the cleaning component 22 during cleaning of the surface to be cleaned. A connecting port 243 is an opening for connecting the interior of the wastewater box 24 to the recovery component 251. Wastewater in the recovery component 251 can enter the wastewater box 24 for storage through the connecting port 243. Liquid (which may be clean water or wastewater) in the wastewater box 24 can also enter the recovery component 251 through the connecting port 243 and then be discharged from the recovery component 251 to the outside of the cleaning device 100. Specifically, the recovery component 251 includes a scraping part 2512 and a dirt-receiving cavity 25115. The scraping part 2512 is used to abut against the cleaning component 22 to scrape dirt from the cleaning component 22 into the dirt-receiving cavity 25115. The sewage box 24 has a connecting port 243 connected to the sewage chamber 25115. The connecting port 243 is used to allow sewage on the cleaning component 22 to enter the sewage box 24 through the sewage chamber 25115, and to allow sewage in the sewage box 24 to enter the sewage chamber 25115 for discharge to the outside of the cleaning equipment 100.

[0123] In some embodiments, the sludge-containing cavity 25115 extends along the rotation axis X of the cleaning component 22. One end of the sludge-containing cavity 25115 along its length X is provided with a first sewage outlet 25116, and the other end along its length X is provided with a second sewage outlet 25117. The first sewage outlet 25116 communicates with the sewage box 24, and the second sewage outlet 25117 may be provided with a control structure 25183 for opening or closing the second sewage outlet 25117. It is understood that in this embodiment, the first sewage outlet 25116, the sludge-containing cavity 25115, and the second sewage outlet 25117 together constitute the aforementioned sewage discharge channel. The control structure 25183 can be located at any position in the sewage discharge channel, for example, at the first sewage outlet 25116, or within the sludge-containing cavity 25115, or at the second sewage outlet 25117. In one example, the control structure 25183 can be a valve. Opening the valve allows access between the sewage channel and the outside, while closing it shuts off the connection. In another example, the control structure 25183 is a pipe that is deformable or movable, allowing its opening to face either a first or a second direction. When facing the first direction, the pipe opening is higher than when facing the second direction. For example, when the pipe opening faces the first direction, such as upwards, the control structure 25183 is closed, preventing sewage from flowing out of the sewage channel. When the pipe opening faces the second direction, such as horizontally or lower, the control structure 25183 opens the sewage channel, allowing sewage to flow out.

[0124] Please see Figure 5 , Figure 9 and Figure 11In some embodiments, the cleaning component 22 is a tracked cleaning component. In the traveling direction Y of the cleaning device 100, the spray nozzle 261 of the water spray bar 26 of the liquid system 30 is located on the front side of the cleaning component 22, and the recovery component 251 of the liquid system 30 is located on the rear side of the cleaning component 22. It should be noted that the above-mentioned "front side" and "rear side" are relative. In the embodiments of this disclosure, the tracked cleaning component typically includes a mounting bracket and a mop 223. The mounting bracket includes two rollers spaced apart, namely a front roller 221 and a rear roller 222. The two rollers are arranged relatively apart, and the mop 223 is arranged around the outside of the mounting bracket. The rotation of the two rollers can drive the mop 223 to rotate around the rotation axis X. The spray nozzle 261 of the water spraying strip 26 is located on the front side of the cleaning component 22, meaning that the spray nozzle 261 of the water spraying strip 26 is close to the front roller 221 of the cleaning component 22. The recovery component 251 is located on the rear side of the cleaning component 22, meaning that the recovery component 251 is located on the rear roller 222 of the cleaning component 22. The clean water on the front side wets the cleaning component 22, and after contacting the dirt on the cleaning component 22, it becomes wastewater and rotates with the cleaning component 22 to the rear side, where it can be scraped off and recovered by the recovery component 251. It is then drawn into the wastewater box 24 by the second power device 34 under negative pressure for storage. On the one hand, when the cleaning equipment 100 mops the surface to be cleaned, the liquid on the cleaning component 22 can remain in a relatively clean state, avoiding the accumulation of dirt that leads to incomplete mopping and improving the cleaning effect on the surface to be cleaned. On the other hand, the wastewater formed on the cleaning component 22 can be efficiently recovered by the recovery component 251 into the wastewater box 24, preventing it from overflowing onto the surface to be cleaned.

[0125] Furthermore, if the spray bar 26 is positioned directly above or near the rear of the cleaning component 22, the distance between the spray nozzle 261 and the retrieval component 251 is too close. The water sprayed from the nozzle 261 is not fully wetted before being scraped off by the scraping part 2512 and entering the dirt-holding chamber 25115, resulting in insufficient wetting of the mop 223 and ultimately affecting the cleaning effect of the cleaning component 22 on the surface to be cleaned. In this embodiment, since the spray nozzle 261 of the spray bar 26 is located on the front of the cleaning component 22 and the retrieval component 251 is located on the rear of the cleaning component 22, the distance between the spray nozzle 261 and the retrieval component 251 is relatively large. The water sprayed from the nozzle 261 takes a longer time to reach the scraping part 2512, and by this time, the water has fully wetted the mop 223, ensuring a better cleaning effect of the cleaning component 22 on the surface to be cleaned.

[0126] Furthermore, please combine Figures 12 to 15The spray bar 26 has a flow channel with two inlet ends. One inlet end communicates with the first outlet 313 to allow fluid from the first channel 31 to enter the flow channel, and the other inlet end communicates with the second outlet 333 to allow fluid from the second channel 33 to enter the flow channel. The flow channel also has multiple outlet ends 260, which protrude relative to the housing 21 toward the cleaning member 22 to press against it. Spray nozzles 261 are disposed on the sidewalls of the outlet ends 260. The flow channel can be meandering between the inlet and outlet ends 260, for example, including a main channel and multiple branch channels, each branch channel including at least two branches. Exemplarily, this disclosure... Figure 12 As shown, the flow channel of the spray bar 26 includes a main flow channel and four branch flow channels. Each branch flow channel includes branches flowing to both sides, and the outlet end 260 is the end of the fourth branch flow channel.

[0127] The outlet end 260 protrudes towards the cleaning component 22 relative to the housing 21 and presses against the cleaning component 22. Compared to a spaced-apart arrangement between the outlet end 260 and the cleaning component 22, the outlet end 260, the cleaning component 22, and the inner wall of the housing 21 of this disclosure are more easily filled with liquid, and the liquid stays in this area for a longer time, thus more fully wetting the cleaning component 22. In addition, the spray nozzle 261 is provided on the side wall of the outlet end 260, so that the direction S of the liquid sprayed from the spray nozzle 261 forms an angle with the rotation axis X of the cleaning component 22. Compared to placing the spray nozzle directly above the cleaning component 22 (where the direction of the liquid is perpendicular to the cleaning component 22), the spray nozzle 261 of this disclosure has a wider spray direction and a larger wetting area, thereby improving the wetting efficiency of the cleaning component 22. Furthermore, since the dust and debris in the sewage tend to move along the circumferential contour of the cleaning component 22 when the cleaning component 22 rotates carrying dirt, the water nozzle 261 is set on the side wall of the outlet end 260, so that the dust and debris in the sewage will not be thrown onto the water nozzle 261, making the water nozzle 261 less prone to clogging and improving the overall reliability of the machine.

[0128] Based on the above embodiments, the cleaning device 100 of this disclosure includes at least the following states: mopping the surface to be cleaned, cleaning the cleaning component 22, vacuuming, and rinsing the wastewater box 24. The following is in conjunction with... Figure 2 , Figure 3 , Figure 8 and Figure 10 These states will be explained in detail.

[0129] When the cleaning device 100 is in the state of mopping the surface to be cleaned, the device control board 50 controls the first power unit 32 to start. The first power unit 32 drives the liquid or gas-liquid mixture in the clean water box 23 to flow from the liquid outlet 233 into the first passage 31, and then out from the first outlet 313 to the spray bar 26. After passing through the spray bar 26, it is discharged to the cleaning component 22, and the moistened cleaning component 22 can then mop the surface to be cleaned. When the cleaning device 100 is in the state of mopping the surface to be cleaned, the cleaning device 100 is also in the state of suction. In other words, the cleaning device 100 performs self-cleaning of the cleaning component 22 while mopping the surface to be cleaned. Specifically, when the cleaning device 100 is in the state of mopping the surface to be cleaned, the cleaning component 22 rotates and mops the surface to be cleaned. The wastewater on the cleaning component 22 is scraped off by the scraping part 2512 and flows into the wastewater collection chamber 25115. The device control board 50 controls the second power unit 34 to turn on, the control structure 25183 to turn off, and the second power unit 34 to draw negative pressure into the wastewater box 24 to provide the power to suck the wastewater on the cleaning component 22 into the wastewater box 24. The wastewater in the wastewater collection chamber 25115 is sucked into the wastewater box 24 for storage through the first wastewater port 25116 and the connecting port 243.

[0130] When the cleaning equipment 100 is in the state of cleaning the cleaning component 22, and the external liquid source of the clean water box 23 supplies liquid to the clean water box 23 until the liquid level exceeds the overflow port 235, the equipment control board 50 controls the second power device 34 to open. The second power device 34 drives the liquid or gas-liquid mixture in the clean water box 23 to overflow from the overflow port 235 to the second passage 33, and then flows out through the inlet 241 of the sewage box 24, the cavity of the sewage box 24, the outlet 242, and the second outlet 333 to the spray bar 26, and then through the spray bar 26 to the cleaning component 22 to clean the cleaning component 22. At this time, the equipment control board 50 can control the first power device 32 to open or close. If the equipment control panel 50 controls the first power unit 32 to be turned off, only the liquid or gas-liquid mixture in the second passage 33 flows to the spray bar 26 to clean the cleaning component 22; if the equipment control panel 50 controls the first power unit 32 to be turned on, both the liquid or gas-liquid mixture in the first passage 31 and the second passage 33 flow to the spray bar 26, increasing the amount of liquid used to clean the cleaning component 22, which can effectively improve the cleaning efficiency and cleaning effect of the cleaning component 22.

[0131] It should be noted that when the cleaning module 20 is not equipped with the spray bar 26: when the cleaning device 100 is in the state of mopping the surface to be cleaned, the liquid or gas-liquid mixture flowing out from the first outlet 313 of the first passage 31 is supplied to the cleaning component 22. When the cleaning device 100 is in the state of cleaning the cleaning component 22, and the external liquid source of the clean water box 23 supplies liquid to the clean water box 23 until the liquid level exceeds the overflow port 235, the liquid or gas-liquid mixture flowing out from the second outlet 333 of the second passage 33 can be directly discharged to the cleaning component 22 to clean the cleaning component 22.

[0132] Based on the above-described embodiment with the first passage 31 and the second passage 33, in order to discharge the sewage in the sewage box 24 when the cleaning equipment 100 is in the sewage discharge state, one implementation method is as follows: the equipment control board 50 controls the second power device 34 to shut down, and the base station 200 provides positive pressure fluid (which can be gas, liquid, or a gas-liquid mixture) to the clean water box 23 through the interface 63 and the liquid replenishment port 231. The positive pressure fluid overflows from the overflow port 235 into the sewage box 24, squeezing the sewage in the sewage box 24 outward so that it is discharged into the sludge chamber 25115 through the connecting port 243 and the first sewage port 25116. Then, the equipment control board 50 controls the control structure 25183 to open to connect the second sewage port 25117 to the outside, and the sewage in the sludge chamber 25115 is then discharged to the base station 200 through the second sewage port 25117, thereby realizing the sewage discharge of the cleaning equipment 100. Another implementation is as follows: The equipment control board 50 controls the second power unit 34 to turn on and introduce positive pressure gas into the sewage box 24. The positive pressure gas forces the sewage in the sewage box 24 outward, causing it to be discharged into the sludge chamber 25115 through the connecting port 243 and the first sewage port 25116. Then, the equipment control board 50 controls the control structure 25183 to open to connect the second sewage port 25117 with the outside. The sewage in the sludge chamber 25115 is then discharged to the base station 200 through the second sewage port 25117, thereby realizing the sewage discharge of the cleaning equipment 100. The liquid circuit system 30 also includes a connecting pipe 255 for connecting the connecting port 243 and the first sewage port 25116. For example, when the cleaning equipment 100 is in the non-discharge state, the equipment control board 50 controls the control structure 25183 to close to block the connection between the sewage discharge channel and the outside.

[0133] In some embodiments, a control valve 27 may be provided between the clean water box 23 and the wastewater box 24. The equipment control board 50 is electrically connected to the control valve 27 and is used to control the opening or closing of the control valve 27. The control valve 27 is used to open when the cleaning equipment 100 is in the discharge state to allow fluid in the clean water box 23 to enter the wastewater box 24, and to close when the cleaning equipment 100 is in the replenishment state to prevent fluid in the clean water box 23 from entering the wastewater box 24. In one example, the control valve 27 may be a one-way valve. It is worth noting that in this embodiment, since the opening and closing of the communication path between the clean water box 23 and the wastewater box 24 can be controlled by the control valve 27, it is not necessary to strictly limit the setting height of the overflow port 235 to be higher than the setting height of the liquid outlet 233. Furthermore, the sewage discharge operation and the cleaning component 22 cleaning operation of the cleaning equipment 100 can be performed alternately. For example, after the cleaning equipment 100 returns to the base station 200, it can first perform the sewage discharge operation, discharging the sewage in the sewage box 24 into the sewage tank 81 of the base station 200, or discharging it into the base station 200 and then further discharging it into the drainage system outside the base station 200 through a floor drain. Next, the cleaning equipment 100 performs the cleaning component 22 cleaning operation, that is, the fluid on the first passage 31 and the second passage 33 flows to the spray bar 26, and the rotating cleaning component 22 is cleaned by the spray bar 26. When the cleaning component 22 is being cleaned, and the cleaning component 22 is rotating clockwise (the direction of rotation is the same as the direction of rotation when the cleaning device 100 is normally wiping the surface to be cleaned), the scraping part 2512 can scrape the wastewater on the cleaning component 22 into the wastewater collection chamber 25115 of the recycling component 251. During this process, the control structure 25183 can remain open, so that most of the wastewater on the rotating cleaning component 22 can enter the wastewater collection chamber 25115 and then be directly discharged into the base 61 of the base station 200 through the second wastewater outlet 25117, and collected into the wastewater tank 81 of the base station 200, or discharged into the drainage system outside the base station 200 through a floor drain. When the cleaning component 22 is being cleaned and the cleaning component 22 is reversed (the direction of rotation is opposite to the direction of rotation when the cleaning device 100 is normally wiping the surface to be cleaned), the scraping part 2512 can scrape the sewage on the cleaning component 22 directly onto the base station 200 base station 61 and collect it into the sewage tank 81 of the base station 200, or discharge it into the drainage system outside the base station 200 through the floor drain. During this process, since the sewage does not need to be discharged into the base station 200 through the sewage chamber 25115, the control structure 25183 can remain in the open or closed state.

[0134] When the cleaning device 100 is in the sewage discharge state, and the positive pressure fluid supplied by the base station 200 to the clean water box 23 through the interface 63 and the liquid replenishment port 231 contains liquid (which can be a liquid or a gas-liquid mixture), the positive pressure fluid overflows from the overflow port 235 into the sewage box 24, thereby cleaning at least a portion of the sewage box 24. During this process, the control structure 25183 can be in the open state, and the aforementioned positive pressure fluid squeezes the sewage in the sewage box 24 outward to discharge it. At this time, the cleaning device 100 of this disclosure recovers the sewage generated by the cleaning component 22 by setting the sewage box 24. The cleaning of the sewage box 24 does not require disassembling the sewage box 24 for manual cleaning. Instead, when the base station 200 is connected to the cleaning device 100 and supplies fluid to the clean water box 23, the fluid overflowing from the overflow port 235 of the clean water box 23 is used to rinse the sewage box 24, achieving automatic cleaning of the sewage box 24. This is efficient, convenient, time-saving, labor-saving, and avoids the growth of bacteria.

[0135] Since the cleaning equipment requires a smaller liquid supply when wiping the surface to be cleaned, but a larger liquid supply when cleaning the cleaning parts, related technologies use a flow-adjustable power device in the liquid circuit system to adjust the flow rate output to the cleaning parts, so as to meet the different needs of the cleaning parts when wiping the surface to be cleaned and when the cleaning parts are self-cleaning. However, the cost of using such a flow-adjustable power device is relatively high. The liquid circuit system 30, cleaning device 100, and cleaning system 1000 disclosed herein are provided with a first passage 31 and a second passage 33, both connected to the clean water tank 23. A first power device 32 is provided on the first passage 31, and a second power device 34 is provided on the second passage 33. When the cleaning device 100 is in the state of mopping the surface to be cleaned, the first power device 32 drives the liquid in the clean water tank 23 to be discharged through the first passage 31 to the cleaning component 22 to replenish the cleaning component 22 with liquid for mopping the surface to be cleaned. When the cleaning device 100 is in the state of cleaning the cleaning component 22, and the liquid level supplied to the clean water tank 23 by the external liquid source exceeds the overflow port 235, the second power device 34 drives the liquid in the clean water tank 23 to be discharged through the second passage 33 to the cleaning component 22. Alternatively, while the second power device 34 drives the liquid in the clean water tank 23 to be discharged through the second passage 33 to the cleaning component 22, the first power device 32 also drives the liquid in the clean water tank 23 to be discharged through the first passage 31 to the cleaning component 22. This ensures that the liquid supply of the cleaning equipment 100 is relatively small when wiping the surface to be cleaned, and relatively large when cleaning the cleaning component 22. Therefore, there is no need to use a flow-adjustable power device to regulate the flow rate output to the cleaning component 22, thus reducing the cost of the liquid circuit system 30.

[0136] In some embodiments, the flow rate of the second power unit 34 is greater than the flow rate of the first power unit 32. Therefore, the flow rate supplied to the cleaning component 22 by the first passage 31 is less than the flow rate supplied to the cleaning component 22 by the second passage 33.

[0137] In some embodiments, before the cleaning device 100 is in a replenishment state by the base station 200 supplying liquid to the water tank 23 through the replenishment port 231, the liquid in the water tank 23 can be discharged out of the water tank 23 through the first passage 31 by the first power device 32. As mentioned above, the "liquid" referred to herein includes, but is not limited to, clean water, maintenance liquid, and cleaning liquid. Clean water and cleaning liquid can be used as cleaning liquids for cleaning the surface to be cleaned, the cleaning component 22, or the wastewater tank 24, while maintenance liquid is used to maintain the surface to be cleaned. Different liquids have different effects on the surface to be cleaned. For example, if the surface to be cleaned is a wooden floor, the cleaning component 22 sprayed with clean water (through the spraying component 26) can clean wooden floors with a general level of dirt, the cleaning component 22 sprayed with cleaning liquid can clean oily wooden floors, and the cleaning component 22 sprayed with maintenance liquid can maintain the cleaned wooden floor. That is, the cleaning device 100 may use liquids with different properties to perform different tasks. Various liquids with different properties share a single clean water tank 23. If the liquid in the clean water tank 23 is not emptied first, the liquid remaining in the clean water tank 23 after the last task will mix with the liquid supplied by the base station 200 in the current task. Since it is impossible to determine the amount of liquid remaining in the clean water tank 23 after each task, it is also impossible to determine the properties of the liquid after mixing the liquid remaining in the clean water tank 23 from the previous task with the liquid supplied by the base station 200 in the current task. As a result, the properties (composition, concentration, temperature) of the liquid supplied to the cleaning component 22 from the clean water tank 23 in the current task are inconsistent with the properties of the liquid supplied by the base station 200 through the interface 63 and the replenishment port 231. In other words, it is impossible to determine the properties of the mixed liquid, thereby affecting the execution of the task as expected. For example, if the previous task was to mop the surface to be cleaned with clean water, then the clean water tank 23 contained clean water in the previous task. If the clean water in the clean water tank 23 is not emptied when the current task is to mop the surface with a mixed cleaning solution, the concentration of the input mixed cleaning solution will become diluted, failing to achieve the desired cleaning effect. Therefore, before the base station 200 supplies liquid to the clean water tank 23 through the replenishment port 231 to put the cleaning device 100 into a replenishment state, the first power unit 32 drives the liquid in the clean water tank 23 to be discharged outside the clean water tank 23 through the first passage 31. This ensures that the properties of the liquid stored in the clean water tank 23 during the current task are consistent with the properties of the liquid supplied to the clean water tank 23 by the base station 200 through the interface 63 and the replenishment port 231, thus ensuring that each task can be executed smoothly. It should be noted that in this embodiment, only the first passage 31 connected to the clean water tank 23 needs to be considered, and it does not depend on whether the clean water tank 23 is connected to a second passage 33.

[0138] In some embodiments, please refer to Figure 16 and Figure 17The wastewater box 24 includes a first chamber 244 and a second chamber 245, meaning that both the first chamber 244 and the second chamber 245 are formed within the wastewater box 24. The second passage 33 is provided with the first chamber 244, the second chamber 245, and a second power unit 34. The first chamber 244 has an inlet 241 and an outlet 242. The inlet 241 allows liquid from an external liquid source to enter the first chamber 244, and the outlet 242 allows liquid entering the first chamber 244 to be discharged to the cleaning component 22. The second chamber 245 is used to contain wastewater and has a connecting port 243 for allowing wastewater from the cleaning component 22 to enter the second chamber 245. The second chamber 245 is separated from the first chamber 244 but is fluidly connected through a through-hole O. The maximum permissible liquid level in the second chamber 245 is lower than the location of the through-hole O. The second chamber 245, which serves as the space for storing wastewater, can have a larger capacity, while the first chamber 244 can serve only as a water passage space, with a smaller capacity, or even be formed as a pipe, to save installation space for the entire cleaning equipment 100.

[0139] Please see Figure 16 In some embodiments, the first chamber 244 and the second chamber 245 can be arranged vertically. Specifically, in the height direction Z of the wastewater box 24, the first chamber 244 is located above the second chamber 245, and the first chamber 244 and the second chamber 245 are connected through a through hole O. Please refer to [link / reference]. Figure 17 In other embodiments, the first chamber 244 and the second chamber 245 can be arranged side by side. Specifically, in the plane perpendicular to the height direction Z of the sewage box 24, the first chamber 244 is located on one side of the second chamber 245, and the first chamber 244 and the second chamber 245 are connected through the through hole O.

[0140] When the cleaning device 100 is in the state of cleaning the cleaning component 22, and the liquid level supplied to the water box 23 by the external liquid source (e.g., base station 200) exceeds the overflow port 235, the second power device 34 drives the liquid in the water box 23 to overflow from the overflow port 235 to the second passage 33, and flows out of the second passage 33 in sequence through the inlet 241, the first chamber 244, the outlet 242, and the second outlet 333 to be discharged to the cleaning component 22; and / or, when the second power device 34 is off, and the liquid level supplied to the water box 23 by the external liquid source exceeds the overflow port 235, the liquid in the water box 23 overflows from the overflow port 235 to the first chamber 244, and is discharged into the second chamber 245 through the through hole O between the first chamber 244 and the second chamber 245.

[0141] The second power unit 34 is connected to the drain port 242 and is used to provide driving power to drive the wastewater on the cleaning component 22 into the second chamber 245, and to drive the liquid in the clean water box 23 out of the second passage 33. That is, the second power unit 34 takes into account both the wastewater generated by the cleaning component 22 during cleaning and the large flow rate of liquid required for cleaning the cleaning component 22.

[0142] As mentioned above, the second power unit 34 can be a dual-purpose water / air pump. The second power unit 34 can be in the start-up state in the following two operating conditions:

[0143] Please refer to the following: Figures 16 to 18 When the cleaning device 100 is cleaning the surface to be cleaned, the second power unit 34 is in the activated state. Since the second power unit 34 is connected to the drain port 242, that is, connected to the first chamber 244, and the first chamber 244 and the second chamber 245 are fluidly connected through the through hole O, when the second power unit 34 draws air, the air in the second chamber 245 flows through the through hole O through the first chamber 244 and is discharged from the drain port 242 along with the air in the first chamber 244. This allows the second power unit 34 to draw air from the first chamber 244 and the second chamber 245, creating a negative pressure in the second chamber 245. This drives the wastewater generated by the cleaning component 22 and entering the dirt-holding chamber 25115 of the recycling component 251 into the second chamber 245. Thus, the second power unit 34 enables the cleaning device 100 to collect the wastewater generated by the cleaning component 22 during cleaning of the surface to be cleaned.

[0144] Please refer to the following: Figure 16 , Figure 17 and Figure 19When the cleaning device 100 is in the state of cleaning the cleaning component 22, and the liquid level supplied by the external liquid source to the clean water box 23 exceeds the overflow port 235, the second power device 34 drives the liquid in the clean water box 23 to overflow from the overflow port 235 to the second passage 33, and then flows out of the second passage 33 through the inlet port 241, the first chamber 244, the outlet port 242, and the second outlet 333 to be discharged to the cleaning component 22. Since the cleaning device 100 is in the state of cleaning the cleaning component 22, for the first chamber 244, the external liquid (the liquid overflowing from the clean water box 23) enters the first chamber 244 through the inlet 241. Since the second power device 34 is connected to the drain 242 of the first chamber 244, the second power device 34 preferentially drives the liquid in the first chamber 244 to the cleaning component 22 through the drain 242. Specifically, it can drive the liquid to the spray bar 26 next to the cleaning component 22 and then discharge it to the cleaning component 22. During this process, since the maximum allowable liquid level in the second chamber 245 is lower than the location of the through hole O, the sewage in the second chamber 245 will not enter the first chamber 244. Furthermore, during the startup of the second power unit 34, the continuous flow of liquid in the first chamber 244 will block the through hole O and also prevent the second power unit 34 from driving the liquid in the second chamber 245 to the first chamber 244. Thus, the cleaning equipment 100 can meet the demand for high-flow-rate liquid supply while cleaning the cleaning component 22, without causing the sewage in the second chamber 245 to flow back into the cleaning component 22.

[0145] The liquid circuit system 30 provided in this embodiment, for the cleaning device 100 with self-cleaning function, in addition to the need for the first power device 32 connected to the clean water box 23 of the cleaning device 100 to realize the small flow of liquid supply to the cleaning component 22 for normal mopping of the cleaning device 100, also needs to be equipped with a power device on the cleaning device 100 to realize the function of pumping the sewage on the cleaning component 22 to the cleaning device 100 when cleaning the surface to be cleaned. The cleaning equipment 100 of this embodiment needs to meet the requirement of high-flow-rate cleaning of the cleaning components 22. Therefore, this embodiment utilizes the second power device 34 to perform both the functions of suction during normal cleaning and high-flow-rate liquid supply during cleaning of the cleaning equipment 100 and cleaning of the cleaning components 22. This effectively eliminates the need to set up another power device as the power source for high-flow-rate liquid supply to the cleaning components 22, or eliminates the need to set up a power device with adjustable flow rate (which is more expensive than a power device with non-adjustable flow rate) to meet the switching between low-flow-rate and high-flow-rate liquid supply to the cleaning components 22. This effectively reduces the overall cost of the cleaning equipment 100.

[0146] In the embodiments shown in this disclosure, both the first chamber 244 and the second chamber 245 are formed within the wastewater box 24. That is, the first chamber 244 and the second chamber 245 are two separate cavities formed within the same container (wastewater box 24), thereby making the structure of the liquid circuit system 30 more compact. The distance of the connecting pipe between the first chamber 244 and the second chamber 245 can be shorter, effectively saving overall space and reducing piping costs. In other embodiments of this disclosure, the first chamber 244 and the second chamber 245 can be formed by two independently arranged containers, and the through holes O therein can be connected by pipes or directly connected. In this case, the assembly of the two containers can be interpreted as the "wastewater box 24" of this disclosure.

[0147] Please see Figure 2 , Figure 3 , Figure 20 and Figure 21 In some embodiments, the filter element 247 mentioned in the foregoing embodiments may be specifically disposed at the through hole O between the first chamber 244 and the second chamber 245. The first chamber 244 and the second chamber 245 are in fluid communication through the holes in the filter element 247. The filter element 247 is used to prevent at least part of the solid waste in the second chamber 245 from entering the first chamber 244. Specifically, when the second power device 34 is turned off and the liquid level supplied to the water box 23 by the external liquid source (e.g., the base station 200) exceeds the overflow port 235, the liquid in the water box 23 overflows from the overflow port 235 into the first chamber 244, passes through the filter element 247, and then enters the second chamber 245.

[0148] As mentioned earlier, wastewater is typically stored in the second chamber 245, while the first chamber 244 contains no wastewater. The first chamber 244 is for the relatively clean liquid from the clean water box 23 to pass through, flowing out from the drain port 242 to the spray bar 26, and finally exiting from the spray bar 26 to the cleaning component 22 for cleaning. Therefore, when the cleaning equipment 100 is cleaning the cleaning component 22, the liquid passing through the first chamber 244 needs to be relatively clean and free from solid waste. Based on this, a filter 247 is installed between the second chamber 245 and the first chamber 244. This prevents the clean liquid flowing from the first chamber 244 into the spray bar 26 from being contaminated by solid waste in the second chamber 245, thus ensuring the cleaning effect on the cleaning component 22.

[0149] On the other hand, when the cleaning device 100 is in the state of cleaning the cleaning component 22, the liquid entering the first chamber 244 from the inlet 241 tends to flow into the second chamber 245. Although the second power device 34 can have the driving force to drive the fluid to the outlet 242, a certain amount of liquid will still enter the second chamber 245, thereby reducing the amount of liquid flowing to the spray bar 26 through the second passage 33 and reducing the cleaning effect of the cleaning component 22. In this embodiment, compared to the through hole O between the first chamber 244 and the second chamber 245, a filter element 247 is provided between the first chamber 244 and the second chamber 245. This allows the liquid entering the first chamber 244 from the inlet 241 to flow into the second chamber 245 less easily, but instead flows across the first chamber 244 and out of the outlet 242 to the spray bar 26. This ensures that the amount of liquid supplied to the cleaning component 22 when cleaning the cleaning component 22 is large, thus improving the cleaning effect of the cleaning component 22. When the cleaning equipment 100 is in the state of flushing the wastewater box 24, the equipment control board 50 controls the second power unit 34 to shut down, and the liquid level supplied to the clean water box 23 by the external liquid source (e.g., base station 200) exceeds the overflow port 235. The liquid in the clean water box 23 overflows from the overflow port 235 into the first chamber 244, and after passing through the filter element 247, enters the second chamber 245 to clean the filter element 247, flushing solid waste adhering to the filter element 247 into the second chamber 245, thereby cleaning at least a portion of the second chamber 245. Similarly, the cleaning equipment 100 usually performs a sewage discharge before flushing the wastewater box 24, as detailed above.

[0150] Furthermore, when the second power unit 34 applies negative pressure to the sewage box 24 to extract sewage from the recovery unit 251, the filter element 247 can also prevent solid waste from entering the first chamber 244 from the second chamber 245 and then from the first chamber 244 into the second power unit 34, thus affecting the service life of the second power unit 34. Simultaneously, when the cleaning equipment 100 is flipped and inverted, the sewage in the second chamber 245 will flow towards the first chamber 244, and the filter element 247 can also prevent solid waste from entering the second power unit 34 and affecting its service life.

[0151] Furthermore, when a filter element 247 is installed in the wastewater box 24, if the cleaning equipment 100 is in the state of rinsing the wastewater box 24, the base station 200 simultaneously injects liquid and gas into the clean water box 23 through the interface 63 and the liquid replenishment port 231. The liquid and gas together form a bubble liquid, which rinses the filter element 247.

[0152] As mentioned earlier, since the filter element 247 is a component used to prevent at least part of the solid waste in the second chamber 245 from entering the first chamber 244, solid waste will inevitably stick to the filter element 247. Over time, the solid waste will clog the holes on the filter element 247. The clogging of the holes will cause the clean liquid passing through the first chamber 244 to come into contact with the solid waste before reaching the spray bar 26, resulting in the liquid used to rinse the cleaning element 22 being dirty and the cleaning effect of the cleaning element 22 being poor. On the other hand, it will also prevent the second power device 34 or the base station 200 from supplying positive pressure to the sewage box 24, thereby obstructing the discharge of sewage from the sewage box 24. At the same time, the second power device 34 will also be unable to draw negative pressure into the sewage box 24, thereby obstructing the suction of sewage into the sewage box 24. In this embodiment, the base station 200 injects both liquid and gas into the clean water box 23. The liquid and gas together form a bubble liquid, which overflows from the overflow port 235 and enters the sewage box 24. This is equivalent to pressurizing the water. Compared with rinsing the filter element 247 by liquid alone, the bubble liquid has a greater rinsing force on the filter element 247, which can prevent solid waste from clogging the holes on the filter element 247. Thus, while ensuring that the liquid used to clean the cleaning element 22 is relatively clean, it can also ensure that the cleaning equipment 100 can discharge and suck up sewage smoothly.

[0153] Further, please refer to Figures 20 to 22 In some embodiments, to improve the cleaning effect on the sewage box 24, a stirring device 35 may be installed inside the sewage box 24. When the cleaning equipment 100 is in the sewage discharge state, the stirring device 35 stirs the sewage in the sewage box 24. Specifically, a drive device 36 is provided on the top wall of the sewage box 24, and the stirring device 35 is connected to the drive device 36, extending from the top wall of the sewage box 24 into the sewage box 24. The equipment control board 50 is electrically connected to the drive device 36 and is used to control the operation of the drive device 36.

[0154] The stirring device 35 is a device that generates stirring force through rotation to agitate the sewage in the sewage box 24. Typically, the stirring device 35 includes a rotating shaft and an impeller mounted on the rotating shaft. The drive device 36 is a drive structure for driving the rotation of the stirring device 35, typically including a motor and a transmission structure (including but not limited to gears, racks, belts, pulleys, etc.). The transmission structure is connected to both the motor and the rotating shaft, respectively. The motor drives the rotating shaft to rotate through the transmission structure, and the rotation of the rotating shaft drives the impeller to rotate, thereby agitating the sewage in the sewage box 24. Because the sewage box 24 stores sewage, large particles of debris accumulate or adhere to the walls during sedimentation. Please refer to... Figure 10When the cleaning equipment 100 is in the sewage discharge state (the second power unit 34 and / or the base station 200 provide positive pressure to the sewage box 24), the stirring device 35 stirs the sewage in the sewage box 24, which can break the accumulation and wall-hanging state of large particles of garbage. The large particles of garbage will float and disperse. The dispersed large particles of garbage are more likely to flow out from the connecting port 243, then enter the sewage holding chamber 25115 through the first sewage port 25116, and finally be discharged to the outside of the cleaning equipment 100 through the second sewage port 25117, thereby improving the sewage discharge efficiency and sewage discharge effect.

[0155] Please see Figure 2 or Figure 3 In some embodiments, an anti-backflow device 37 is provided inside the sewage box 24. In other embodiments, an anti-backflow device 37 is provided on the connecting pipe 334 connecting the clean water box 23 and the sewage box 24. In still other embodiments, an anti-backflow device 37 is provided inside the sewage box 24, and also on the pipe connecting the clean water box 23 and the sewage box 24. The anti-backflow device 37 is used to prevent sewage in the sewage box 24 from entering the clean water box 23 through the inlet 241.

[0156] Please see Figure 2 or Figure 3 In some embodiments, the wastewater box 24 is provided with a full water detection device 38, which is triggered when the liquid level in the wastewater box 24 reaches a set level.

[0157] Specifically, please combine Figure 22 The full-water detection device 38 includes a guide post 381, a floating element 383, and a sensing element 385. The floating element 383 is disposed within the wastewater tank 24, and the sensing element 3831 is mounted on the floating element 383. The guide post 381 is connected to the top wall of the wastewater tank 24, and the floating element 383 is sleeved on the outside of the guide post 381. A limiting part 3811 is provided at the end of the guide post 381 away from the top wall of the wastewater tank 24, which prevents the floating element 383 from detaching from the guide post 381. The sensing element 385 is disposed on the wall surface of the wastewater tank 24 and is used to sense the position of the sensing element 3831. When the liquid level in the wastewater box 24 reaches the set level, the detection element 3831 will rise to the predetermined height along with the floating element 383. The sensing element 385 can then sense that the detection element 3831 has reached the predetermined height, and the water full detection device 38 will be triggered. That is, the water full detection device 38 outputs a water full signal to the device controller 50. The device controller 50 can then control the cleaning device 100 to return to the preset position mentioned above for automatic sewage discharge, or issue a prompt signal to remind the user to manually control the sewage discharge. In this way, excessive sewage in the wastewater box 24 can be prevented from overflowing onto the surfaces that have not been mopped or have already been mopped, thus increasing the cleaning burden on the user.

[0158] Please see Figures 21 to 24In some embodiments, the wastewater container 24 may include a container body 248 and a cover 249. The cover 249 covers the top wall of the container body 248, and a through hole O is provided in the top wall of the container body 248. A second chamber 245 is formed in the container body 248, and a first chamber 244 is located in the space enclosed by the cover 249 and the container body 248. This is one way in which the first chamber 244 and the second chamber 245 are formed. Of course, the first chamber 244 and the second chamber 245 can also be formed in other ways. For example, the first chamber 244 is located in the cover 249, the through hole O is provided in the bottom wall of the cover 249, and the second chamber 245 is located in the space enclosed by the cover 249 and the container body 248. Another example: the first chamber 244 is located in the cover 249, the second chamber 245 is located in the container body 248, and the through hole O is located at the connection between the cover 249 and the container body 248.

[0159] Further, please refer to Figure 21 , Figures 24 to 26 In some embodiments, a sealing structure 2480 is provided between the cover 249 and the box 248. The sealing structure 2480 is at least used to form a first chamber 244 between the cover 249 and the box 248, and the through hole O is located in the area enclosed by the sealing structure 2480.

[0160] The sealing structure 2480 is a structure used to prevent liquid from flowing out. In this disclosure, the first chamber 244 is surrounded by the sealing structure 2480 so that the liquid in the first chamber 244 is blocked by the sealing structure 2480 and will not leak. The sealing structure 2480 can be a sealing soft rubber or other structure that performs a sealing function. The phrase "a sealing structure 2480 is provided between the cover 249 and the box 248" can be: The sealing structure 2480 is provided only on the cover 249; when the cover 249 and the box 248 are combined, the sealing structure 2480 and the top plate of the box 248 together form a first chamber 244. In this case, the sealing structure 2480 can be a sealing ring or a rib. Alternatively, the sealing structure 2480 is provided only on the box 248; when the cover 249 and the box 248 are combined, the sealing structure 2480 and the top plate of the box 248 together form the first chamber 244. In this case, the sealing structure 2480 can also be a sealing ring or a rib. Furthermore, the cover 249 is provided with a first sealing structure 2481, and the box 248 is provided with a second sealing structure 2483; the first sealing structure 2481 and the second sealing structure 2483 cooperate to form the first chamber 244, as disclosed in this disclosure. Figure 24 and Figure 26As shown, the first sealing structure 2481 can specifically be a raised rib, and the second sealing structure 2483 can specifically be a groove. The raised rib is inserted into the groove, and the raised rib and the groove are bonded together with an adhesive. Alternatively, the first sealing structure 2481 can specifically be a groove, and the second sealing structure 2483 can specifically be a raised rib. The raised rib is inserted into the groove, and the raised rib and the groove are bonded together with an adhesive. The through hole O is located within the area enclosed by the sealing structure 2480, that is, the through hole O is located within the area of ​​the first chamber 244, or the through hole O is located within the area enclosed by the raised rib and the groove. Therefore, when the sealing structure 2480 is completely sealed on all sides, the liquid in the first chamber 244 will only flow downwards and will not leak to the surroundings; when the sealing structure 2480 only has openings at specific locations (such as the fluid inlet 2485 or fluid outlet 2487 mentioned later), the liquid in the first chamber 244 has a tendency to flow downwards and also a tendency to flow out from the fluid inlet 2485 to the fluid outlet 2487, and there will be no liquid leakage in the area other than the openings.

[0161] Please see Figures 20 to 22 In some embodiments, the housing 248 is further provided with a third chamber 246, which is independent of the second chamber 245 and is connected to the second power device 34. The top wall of the housing 248 is provided with a third chamber inlet 2461 that communicates with the third chamber 246, and the third chamber inlet 2461 is located inside the first chamber 244. When the cleaning device 100 is in the state of cleaning the cleaning component 22, and the liquid level supplied to the clean water box 23 by the external liquid source exceeds the overflow port 235, the second power device 34 drives the liquid in the clean water box 23 to overflow from the overflow port 235 to the first chamber 244, and then flows to the cleaning component 22 through the third chamber inlet 2461, the third chamber 246, the drain port 242, and the second power device 34.

[0162] The phrase "the third chamber 246 and the second chamber 245 are independent of each other" means that the third chamber 246 and the second chamber 245 are not directly connected. Since the first chamber 244 and the second chamber 245 are connected, the third chamber 246 can be indirectly connected to the second chamber 245 through the first chamber 244. The phrase "the third chamber 246 is connected to the second power device 34" specifically means that the outlet 2463 of the third chamber is connected to the inlet of the second power device 34. Therefore, the "drain outlet 242" is the outlet 2463 of the third chamber, and the aforementioned "third section pipe 335" can be omitted. The outlet of the second power device 34 is connected to the spray bar 26 through the fourth section pipe 337. In this embodiment, the "fourth section pipe 337" is a channel within the sewage box 24, and its outlet is the second outlet 333 connected to the spray bar 26.

[0163] When the cleaning equipment 100 is in the state of cleaning the cleaning component 22, and the liquid level supplied to the clean water box 23 by the external liquid source exceeds the overflow port 235, the equipment control board 50 controls the second power unit 34 to start. The second power unit 34 drives the liquid in the clean water box 23 to overflow from the overflow port 235 into the first chamber 244. The liquid in the first chamber 244 enters the third chamber 246 through the third chamber inlet 2461, then enters the second power unit 34 from the third chamber outlet 2463, then passes through the fourth section pipe 337 and reaches the spray bar 26 from the second outlet 333. Finally, it is sprayed from the spray bar 26 onto the cleaning component 22 to clean it.

[0164] Furthermore, in some embodiments, the first chamber 244 is divided by a sealing structure 2480 to form a first sub-chamber 2441 and a second sub-chamber 2443. A through hole O is located in the first sub-chamber 2441, and a third chamber inlet 2461 is located in the second sub-chamber 2443. The sealing structure 2480 is provided with a fluid outlet 2485 communicating with the first sub-chamber 2441 and a fluid inlet 2487 communicating with the second sub-chamber 2443. The fluid outlet 2485 and the fluid inlet 2487 are spaced apart and in fluid communication.

[0165] The sealing structure 2480 has a cross-sectional outer contour comprising two closed (end-to-end) annular rings. The first annular ring corresponds to the first sub-chamber 2441, and the second annular ring corresponds to the second sub-chamber 2443. The "fluid outlet 2485" is an opening allowing liquid to flow into the first chamber 244, and the "fluid inlet 2487" is an opening allowing liquid from the first chamber 244 to enter the second sub-chamber 2443. "Fluid communication" means that liquid can flow between the fluid outlet 2485 and the fluid inlet 2487, typically from the fluid outlet 2485 to the fluid inlet 2487.

[0166] By using a sealing structure 2480 to divide the first chamber 244 into two independent sub-chambers (first sub-chamber 2441 and second sub-chamber 2443), and by setting a "fluid inlet 2487" and a "fluid outlet 2485" that are far apart, the fluid in the two first chambers 244 can only flow in the direction from the "fluid outlet 2485" to the "fluid inlet 2487". When it is necessary to flush the wastewater box 24, the second power unit 34 is turned off. Since the second power unit 34 is connected to the second sub-chamber 2443, when the second power unit 34 is turned off, the second power unit 34 will not generate suction force at the second sub-chamber 2443. The first sub-chamber 2441 and the second sub-chamber 2443 are mostly isolated from each other by the sealing structure 2480, and are only connected by the spaced "fluid inlet 2487" and "fluid outlet 2485". This makes it difficult for the liquid in the first sub-chamber 2441 to flow to the second sub-chamber 2443, thereby ensuring the amount of liquid flowing to the second chamber 245 when flushing the wastewater box 24.

[0167] When the second power unit 34 is activated, since the first sub-chamber 2441 and the second sub-chamber 2443 are mostly isolated from each other by the sealing structure 2480 and are only connected by the spaced "fluid inlet 2487" and "fluid outlet 2485", the cross-sectional area of ​​the channel flowing from the first sub-chamber 2441 to the second sub-chamber 2443 is small. For fluid, the smaller the cross-sectional area of ​​its flow channel, the greater the suction force generated, making it easier to draw the fluid in the first sub-chamber 2441 to the second sub-chamber 2443. This allows for a rapid response and provides a large flow of liquid to clean the cleaning component 22 when a large flow rate is required.

[0168] To enable the cleaning equipment 100 and the base station 100 to connect through a single interface, the base station 200 of this embodiment will be described in detail below with reference to the accompanying drawings.

[0169] In some embodiments, please refer to Figure 2 or Figure 3The base station 200 interfaces with the cleaning equipment 100 and is used for maintenance of the cleaning equipment 100. The base station 200 is equipped with a liquid supply system 70 for providing liquid and a gas supply system 80 for providing gas. Both the liquid supply system 70 and the gas supply system 80 are connected to an interface 63. In this disclosure, there is only one interface 63, and both the liquid supply system 70 and the gas supply system 80 are connected to the same interface 63 and are connected to the same replenishment port 231 on the clean water box 23 through the same interface 63. This allows the base station 200 to provide liquid, gas, or a gas-liquid mixture to the cleaning equipment 100, enabling the cleaning equipment 100 to be in at least one of the following states: sewage discharge, liquid replenishment, cleaning of the cleaning components 22, and rinsing of the wastewater box 23. Therefore, only one point of connection accuracy needs to be considered between the interface 63 and the replenishment port 231, greatly reducing the connection difficulty and achieving higher connection accuracy.

[0170] When the cleaning equipment 100 is in the replenishment state, the liquid supplied by the liquid supply system 70 is injected into the clean water box 23 through the interface 63 and the replenishment port 231; when the cleaning equipment 100 is in the sewage discharge state, the fluid liquid and / or gas supplied by the liquid supply system 70 and / or the gas source system 80 are injected into the clean water box 23 through the interface 63 and the replenishment port 231, and at least part of the liquid and / or gas passes through the clean water box 23 and enters the sewage box 24 through the overflow port 235, so that the sewage in the sewage box 24 is discharged to the outside of the sewage box 24.

[0171] In some embodiments, when the cleaning device 100 is in the state of cleaning the cleaning component 22, the liquid supplied by the liquid supply system 70 is injected into the clean water box 23 through the interface 63 and the replenishment port 231. When the cleaning device 100 is in the state of rinsing the wastewater box 24, the liquid supplied by the liquid supply system 70 is injected into the clean water box 23 through the interface 63 and the replenishment port 231. The liquid passes through the clean water box 23 and enters the wastewater box 24 through the overflow port 235 to rinse the wastewater box 24. Alternatively, the fluid supplied by the liquid supply system 70 and the gas source system 80 is injected into the clean water box 23 through the interface 63 and the replenishment port 231. The liquid and gas together form a bubble liquid. The bubble liquid passes through the clean water box 23 and enters the wastewater box 24 through the overflow port 235 to rinse the wastewater box 24 (especially the filter component 247). Please refer to the above description for details, which will not be repeated here.

[0172] Specifically, please refer to Figures 1 to 3 The base station 200 also includes a base station body 60 and a multi-channel connector 72, which is disposed on the base station body 60.

[0173] The base station body 60 is a component used to house other components on the base station 200 besides itself. The base station body 60 typically includes a base 61, a top 64, and a side wall 65. The base 61, top 64, and side wall 65 form a semi-enclosed structure, with an opening 67 for the cleaning equipment 100 to enter and exit. The base 61 can be used to receive contaminants from the dirt-containing cavity 25115 of the cleaning equipment 100. Figure 10 The wastewater discharged from the base station 200 (as shown) and the liquid generated by the base station 200 itself are included. Specifically, the base 61 is provided with a liquid-containing area 611, which can be a groove opened on the base 61, for at least containing the wastewater discharged from the cleaning equipment 100, the wastewater flowing in when the base station 200's liquid supply system 70 supplies liquid to the cleaning equipment 100 to clean the cleaning component 22, and the wastewater generated by the liquid supply system 70 during self-cleaning.

[0174] A multi-port connector 72 is also disposed on the base station body 60. It can be part of the liquid supply system 70, part of the gas supply system 80, or a component independent of the liquid supply system 70 and the gas supply system 80. Specifically, the multi-port connector 72 includes at least two input interfaces 721, an output interface 723, and a fluid buffer chamber 723. Both the at least two input interfaces 721 and the output interface 723 are connected to the fluid buffer chamber 723. The at least two input interfaces 721 are also connected to the liquid channels of the liquid supply system 70 and / or the gas channels of the gas supply system 80, and the output interface 723 is connected to the corresponding interface 63. In one example, the liquid supply system 70 and the gas supply system 80 are connected to the fluid buffer chamber 723 through different input interfaces 721 of the multi-port connector 72, and output from the same output interface 723 to connect with the same corresponding interface 63. Fluid input from the different input interfaces 721 of the multi-port connector 72 can be mixed in the fluid buffer chamber 723 and then flow out through the output interface 723. The liquid supply system 70 can supply liquid to the interface 63 through the multi-port connector 72, and the gas supply system 80 can also supply gas to the interface 63 through the multi-port connector 72. If the liquid supply system 70 supplies liquid to the interface 63 through the multi-port connector 72 at the same time, the gas supply system 80 supplies gas to the interface 63 through the multi-port connector 72, the gas and liquid will mix in the fluid buffer chamber 723 of the multi-port connector 72 to form the aforementioned bubble liquid. The bubble liquid then enters the clean water box 23 through the interface 63 and the liquid replenishment port 231 for use as flushing wastewater box 24, flushing filter element 247, and / or discharging wastewater from wastewater box 24.

[0175] The base station 200 also includes a base station control board 90, which is a device for controlling the operation of various functional modules in the base station 200. The base station control board 90 typically includes a circuit board and a controller or processor mounted on the circuit board.

[0176] The following is combined with Figure 2 and Figure 3The liquid supply system 70 of base station 200 is described in detail.

[0177] The liquid supply system 70 includes a clean water channel 71. The clean water channel 71 connects to the interface 63 and the clean water tank 711 inside the base station 200 or an external liquid source 713, such as municipal tap water. The clean water channel 71 is used to transport clean water. The clean water channel 71 includes an inlet 715 and an outlet 717 located at opposite ends. The inlet 715 of the clean water channel 71 connects to the clean water tank 711 or the external liquid source 713 of the base station, and the outlet 717 of the clean water channel 71 connects to an input interface 721 of a multi-port connector 72, thereby indirectly connecting to the interface 63 via the multi-port connector 72, so that the liquid supply system 70 can supply clean water to the clean water box 23 of the cleaning equipment 100. The explanation of the clean water tank 711 can be found in the previously mentioned "clean water box 23". In one example, the clean water tank 711 has one inlet and one outlet. The inlet of the clean water tank 711 is connected to the external liquid source 713, and the outlet of the clean water tank 711 is connected to the inlet 715 of the clean water channel 71. In another example, the clean water tank 711 has one inlet and one outlet. The inlet of the clean water tank 711 can be opened and closed for water replenishment, and the outlet of the clean water tank 711 is connected to the inlet 715 of the clean water channel 71. In this case, the base station 100 may not be connected to the external liquid source 713. The capacity of the clean water tank 711 is relatively large, and it can be replenished by the user periodically. Thus, the location of the base station 100 is not limited to being close to the external liquid source 713 and can be set up in any location. In other embodiments, the number of inlets and outlets of the clean water tank 711 can be set as needed and is not limited to this embodiment.

[0178] The liquid supply system 70 also includes a treatment liquid container 73 and a treatment liquid channel 74. The treatment liquid container 73 is used to store the treatment liquid. The treatment liquid is a liquid used in the field of cleaning technology to treat surfaces to be cleaned, including but not limited to cleaning solutions and conditioning solutions. The treatment liquid channel 74 connects the treatment liquid container 73 and at least one other input interface 721 of the multi-port connector 72 (an input interface 721 different from the input interface 721 connected to the clean water channel 711), thereby indirectly connecting to the interface 63 through the multi-port connector 72, so that the liquid supply system 70 can supply treatment liquid to the clean water box 23 of the cleaning equipment 100. For an explanation of the treatment liquid container 73, please refer to the "clean water box 23" mentioned above. Unlike the "clean water box 23", in this disclosure, the treatment liquid container 73 needs to have a separate filling port. Usually, the filling port is closed and is only opened for adding treatment liquid when it is used up (mostly manually, but it can also be automatic). The processing fluid container 73 may have one outlet connected to the processing fluid channel 74, in which case the processing fluid channel 74 is a unidirectional channel; alternatively, the processing fluid container 73 may have two openings, both of which are connected to the processing fluid channel 74, in which case the processing fluid channel 74 is a circulation channel. Alternatively, after the processing fluid in the processing fluid container 73 is used up, it can be replaced by a new processing fluid container 73 by the user.

[0179] Specifically, in some embodiments, the treatment fluid channel 74 includes a first treatment fluid channel 741, and the treatment fluid container 73 includes a first treatment fluid container 731. The first treatment fluid container 731 is used to contain a curing agent for maintaining the ground.

[0180] The first processing fluid channel 741 includes a first port 7411 and a second port 7413, which are connected to the input interface 721 of the multi-port connector 72. In one example, the first port 7411 and the second port 7413 are connected to the same input interface 721 of the multi-port connector 72. In another example, the first port 7411 and the second port 7413 are respectively connected to two different input interfaces 721 of the multi-port connector 72.

[0181] The first treatment fluid container 731 is connected between the first port 7411 and the second port 7413. The first treatment fluid channel 741 includes a first usage state and a second usage state. In the first usage state, the curing agent in the first treatment fluid container 731 flows into the multi-port connector 72 through the first port 7411, thereby indirectly connecting to the interface 63 through the multi-port connector 72, so that the liquid supply system 70 provides curing fluid to the clean water box 23 of the cleaning equipment 100. In the second usage state, the clean water in the clean water channel 71 sequentially flows through the multi-port connector 72, the first port 7411 and the second port 7413 to clean the first treatment fluid channel 741. The liquid after cleaning the first treatment fluid channel 741 flows through the second port 7413 to the multi-port connector 72 or is discharged to the liquid holding area 611 of the base 61.

[0182] Because the curing agent has high viscosity and poor fluidity, if the first treatment liquid channel 741 is left to stand for a period of time, the curing agent will accumulate inside, making it difficult to replenish the cleaning equipment 100 with curing liquid later. In this disclosure, the clean water in the clean water channel 71 can sequentially pass through the multi-port connector 72, the first port 7411, and the second port 7413 to clean the first treatment liquid channel 741. If the cleaning action of the first treatment liquid channel 741 is performed after each replenishment of the cleaning equipment 100 with curing liquid, the accumulation of curing agent in the first treatment liquid channel 741 can be avoided, ensuring that the curing liquid can still be supplied smoothly later. At this time, the liquid after cleaning the first treatment liquid channel 741 can be discharged from the second port 7413 into the liquid holding area 611 of the base 61. In addition, in some alternative embodiments, if the liquid after cleaning the first treatment liquid channel 741 flows to the multi-port connector 72 through the second port 7413, the liquid after cleaning the first treatment liquid channel 741 can be used as a maintenance liquid to replenish the cleaning equipment 100. Therefore, the action of cleaning the first treatment liquid channel 741 can be performed at the end of each time the maintenance liquid is replenished to the cleaning equipment 100, which not only improves the utilization rate of the maintenance agent and saves costs, but also saves the time of replenishing the maintenance liquid and improves the efficiency of replenishing the maintenance liquid.

[0183] Furthermore, when the first treatment liquid channel 741 is in its first operating state, the clean water in the clean water channel 71 can be controlled to be delivered to the multi-port connector 72, so that the curing agent and clean water can be mixed in the multi-port connector 72. The surface to be cleaned is not cured with pure curing agent, but requires a curing solution of a certain concentration. Therefore, when the first treatment liquid channel 741 is in its first operating state, the curing agent in the first treatment liquid container 731 flows into the multi-port connector 72 through the first port 7411. At the same time, the clean water in the clean water channel 71 is delivered to the multi-port connector 72, so that the curing agent and clean water can be mixed in the multi-port connector 72. Additionally, the required concentration of curing solution can be obtained by controlling the amount of clean water delivered to the multi-port connector 72.

[0184] In other embodiments, the treatment fluid channel 74 includes a second treatment fluid channel 743, and the treatment fluid container 73 includes a second treatment fluid container 733. The second treatment fluid container 733 is used to hold cleaning agent. The second treatment fluid container 733 has an outlet, which communicates with the inlet of the second treatment fluid channel 743. The outlet of the second treatment fluid channel 743 is connected to at least one other input interface 721 of the multi-port connector 72 (an input interface 721 that is different from the input interface 721 connected to the clean water channel 711 and the first treatment fluid channel 741), thereby indirectly connecting to the interface 63 through the multi-port connector 72, so that the liquid supply system 70 can supply cleaning fluid to the clean water box 23 of the cleaning device 100. It should be noted that the second treatment fluid channel 743 is not limited to the unidirectional channel in this embodiment, and can also adopt the same structure as the first treatment fluid channel 741. In this way, the cleaning agent can be prevented from accumulating in the second treatment fluid channel 743, ensuring that the cleaning fluid can still be supplied smoothly in the future.

[0185] It should be noted that in some embodiments, the processing liquid channel 74 may simultaneously include a first processing liquid channel 741 and a second processing liquid channel 743. Correspondingly, the processing liquid channel 74 may also simultaneously include a first processing liquid container 731 and a second processing liquid container 733. The specific structure and function are as described above.

[0186] Furthermore, the liquid supply system 70 also includes an adjustment device 75, which is disposed on the clean water channel 71 and / or the processed liquid channel 74. The adjustment device 75 is used to adjust the properties of the liquid entering the interface 63 so that the properties of the liquid output from the interface 63 to the clean water box 23 are preset properties. The liquid properties include at least one of the following: liquid temperature, liquid concentration, and liquid composition. The base station control board 90 can be electrically connected to the adjustment device 75 to control the operation of the adjustment device 75.

[0187] Specifically, in some embodiments, the regulating device 75 includes a first power unit 751. The first power unit 751 is disposed on the clean water channel 71 and is used to provide driving power for conveying clean water through the clean water channel 71 to the multi-connector 72. The base station control board 90 can control the first power unit 751 to turn on and off, and can also control the amount of clean water conveyed to the multi-connector 72 by controlling the start-up duration and / or flow rate of the first power unit 751. When the liquid supply system 70 conveys clean water to the multi-connector 72 through the clean water channel 71, the base station control board 90 controls the first power unit 751 to turn on; when the clean water channel 71 does not convey clean water to the multi-connector 72, the base station control board 90 controls the first power unit 751 to turn off. In one example, the first power unit 751 may be a water pump.

[0188] In some embodiments, the regulating device 75 may further include an electrolysis module 752, which is disposed on the clean water channel 71 and used to electrolyze the clean water in the clean water channel 71 to convert the clean water in the clean water channel 71 into electrolyzed water. Electrolysis of water can remove limescale. Specifically, water generates highly oxidizing hydroxide ions through electrolysis. These ions can decompose the minerals in the limescale, thereby achieving the effect of removing limescale. More specifically, during the electrolysis of the clean water in the clean water channel 71 by the electrolysis module 752, water molecules decompose into hydrogen ions and oxygen ions. Hydrogen ions accumulate at the cathode, and oxygen ions accumulate at the anode, ultimately generating hydrogen gas and oxygen gas. Hydrogen gas, as a reducing agent, can reduce metal ions, causing them to precipitate, thereby achieving a cleaning effect; oxygen gas, as an oxidizing agent, can oxidize organic matter into carbon dioxide and water, further achieving a cleaning effect. Because electrolysis of clean water can remove limescale, the clean water channel 71 will not be blocked by limescale and can always smoothly deliver clean water to the multi-port connector 72. The base station control board 90 can control the electrolysis module 752 to be turned on and off. When both the first power unit 751 and the electrolysis module 752 are turned on by the base station control board 90, the electrolysis module 752 electrolyzes clean water, and the liquid supply system 70 delivers the electrolyzed clean water to the multi-port connector 72 through the clean water channel 71; when the first power unit 751 is turned on by the base station control board 90 and the electrolysis module 752 is turned off, the liquid supply system 70 delivers unelectrolyzed clean water to the multi-port connector 72 through the clean water channel 71.

[0189] In some embodiments, the regulating device 75 may further include a heating module 753, which is disposed on the clean water channel 71 and used to heat the clean water in the clean water channel 71. In one example, the heating module 753 may be a heating coil, resistance wire, or heating film, etc. Since the dirt on the surface to be cleaned may be stubborn and difficult to clean, the heating module 753 is disposed on the clean water channel 71, and the liquid supply system 70 can provide hot water to the cleaning device 100 to wipe away stubborn dirt on the surface to be cleaned. The base station control board 90 can control the heating module 753 to be turned on and off. When the base station control board 90 controls both the first power unit 751 and the heating module 753 to be turned on, the heating module 753 heats the clean water, and the liquid supply system 70 delivers heated clean water to the multi-port connector 72 through the clean water channel 71; when the base station control board 90 controls the first power unit 751, the electrolysis module 752 and the heating module 753 to be turned on, the liquid supply system 70 delivers electrolyzed and heated clean water to the multi-port connector 72 through the clean water channel 71.

[0190] In some embodiments, the regulating device 75 may further include a second power unit 754 disposed on the processing fluid channel 74 and used to provide driving power for conveying the processing fluid through the processing fluid channel 74 to the multi-connector 72. The base station control board 90 can control the second power unit 754 to turn on and off, and can also control the amount of processing fluid conveyed to the multi-connector 72 by controlling the start-up duration and / or flow rate of the second power unit 754. In one example, the second power unit 754 may be a peristaltic pump. When the fluid supply system 70 conveys processing fluid to the multi-connector 72 through the processing fluid channel 74, the base station control board 90 controls the second power unit 754 to turn on; when the processing fluid channel 74 does not convey processing fluid to the multi-connector 72, the base station control board 90 controls the second power unit 754 to turn off. In one example, the number of second power units 754 is the same as the number of processing fluid channels 74. When the processing fluid channel 74 includes both a first processing fluid channel 741 and a second processing fluid channel 743, there are two second power units 754. One is disposed on the first processing fluid channel 741 to provide driving power for conveying the maintenance agent through the first processing fluid channel 741 to the multi-port connector 72, and the other is disposed on the second processing fluid channel 743 to provide driving power for conveying the cleaning agent through the second processing fluid channel 743 to the multi-port connector 72.

[0191] When the base station control board 90 controls the first power unit 751, the electrolysis module 752, and the second power unit 754 on the first processing liquid channel 741 to be turned on, the electrolysis module 752 electrolyzes the clean water, and the second power unit 754 drives the curing agent on the first processing liquid channel 741 to be delivered to the multi-port connector 72. Then the liquid supply system 70 delivers electrolyzed clean water to the multi-port connector 72 through the clean water channel 71 and delivers curing agent to the multi-port connector 72 through the first processing liquid channel 741. The curing agent and the electrolyzed clean water are mixed in the fluid buffer chamber 723 of the multi-port connector 72 and then enter the clean water box 23 through the interface 63 and the replenishment port 231 to complete the replenishment of curing liquid to the cleaning equipment 100.

[0192] When the base station control board 90 controls the first power unit 751, the electrolysis module 752, the heating module 753, and the second power unit 754 on the first processing liquid channel 741 to be turned on, the electrolysis module 752 electrolyzes the clean water, the heating module 753 heats the clean water, and the second power unit 754 drives the curing agent on the first processing liquid channel 741 to be delivered to the multi-port connector 72. Then the liquid supply system 70 delivers electrolyzed and heated clean water to the multi-port connector 72 through the clean water channel 71 and the curing agent to the multi-port connector 72 through the first processing liquid channel 741. The curing agent and the electrolyzed and heated clean water are mixed in the fluid buffer chamber 723 of the multi-port connector 72 and then enter the clean water box 23 through the interface 63 and the replenishment port 231 to complete the replenishment of curing liquid to the cleaning equipment 100.

[0193] When the base station control board 90 controls the first power unit 751, the electrolysis module 752, and the second power unit 754 on the second processing liquid channel 743 to be turned on, the electrolysis module 752 performs electrolysis on the clean water, and the second power unit 754 drives the cleaning liquid on the second processing liquid channel 743 to be delivered to the multi-port connector 72. Then the liquid supply system 70 delivers electrolyzed clean water to the multi-port connector 72 through the clean water channel 71 and delivers cleaning agent to the multi-port connector 72 through the second processing liquid channel 743. The cleaning agent and the electrolyzed clean water are mixed in the fluid buffer chamber 723 of the multi-port connector 72 and then enter the clean water box 23 through the interface 63 and the replenishment port 231 to complete the replenishment of cleaning liquid to the cleaning equipment 100.

[0194] When the base station control board 90 controls the first power unit 751, the electrolysis module 752, the heating module 753, and the second power unit 754 on the second processing liquid channel 743 to be turned on, the electrolysis module 752 electrolyzes the clean water, the heating module 753 heats the clean water, and the second power unit 754 drives the cleaning agent on the second processing liquid channel 743 to be delivered to the multi-port connector 72. Then the liquid supply system 70 delivers electrolyzed and heated clean water to the multi-port connector 72 through the clean water channel 71 and delivers cleaning agent to the multi-port connector 72 through the second processing liquid channel 743. The cleaning agent and the electrolyzed and heated clean water are mixed in the fluid buffer chamber 723 of the multi-port connector 72 and then enter the clean water box 23 through the interface 63 and the replenishment port 231 to complete the replenishment of cleaning liquid to the cleaning equipment 100.

[0195] Furthermore, in an embodiment with an electrolysis module 752, the liquid supply system 70 may further include a first one-way valve 755. The first one-way valve 755 is disposed on the clean water channel 71 and located between the electrolysis module 752 and the clean water tank 711, or between the electrolysis module 752 and the external liquid source 713 of the base station. The first one-way valve 755 is used to allow the liquid on the clean water channel 71 to flow in the direction of the multi-port connector 72 (flowing in the forward direction along the clean water channel 71), while not allowing the liquid on the clean water channel 71 to flow in the reverse direction. Therefore, the first one-way valve 755, located between the electrolysis module 752 and the clean water tank 711, can prevent the water electrolyzed by the electrolysis module 752 from flowing back to the clean water tank 711 or the external liquid source 713 of the base station, thus affecting the water quality of the clean water tank 711 or the external liquid source 713 of the base station.

[0196] Furthermore, in an embodiment having a first processing liquid channel 741 and a second port 7413 communicating with the liquid-containing area 611 of the base 61, the liquid supply system 70 may further include a second one-way valve 756. The second one-way valve 756 is disposed on the first processing liquid channel 741 and located between the first processing liquid container 731 and the second port 7413. The second one-way valve 756 is used to allow fluid on the first processing liquid channel 741 to flow in the forward direction from the first port 7411 to the second port 7413, but not to allow flow in the reverse direction from the second port 7413 to the first port 7411. Therefore, the second one-way valve 756, located between the first processing liquid container 731 and the second port 7413, can prevent fluid in the liquid-containing area 611 from flowing back into the first processing liquid container 731 and affecting the quality of the curing agent in the first processing liquid container 731.

[0197] Furthermore, in an embodiment with a first processing fluid channel 741, the fluid supply system 70 may further include a first continuity detector 757. The first continuity detector 757 is disposed on the first processing fluid channel 741 and is used to detect whether the first processing fluid channel 741 is conductive when the second power unit 754 on the first processing fluid channel 741 is turned on. As mentioned above, the curing agent has high viscosity and poor fluidity. Once the first processing fluid channel 741 is used up without cleaning, it is easy to become clogged. In this embodiment, a first continuity detector 757 is disposed on the first processing fluid channel 741 to detect whether the first processing fluid channel 741 is conductive. The base station control board 90 can be electrically connected to the first continuity detector 757 and obtain the detection result of the first continuity detector 757. When the detection result indicates that the flow rate in the first processing fluid channel 741 is less than a preset threshold, it is determined that the first processing fluid channel 741 is blocked. The base station control board 90 first controls the second power unit 754 on the first processing fluid channel 741 to shut down. At the same time, the base station control board 90 can issue a prompt signal to remind the user to clean it. Alternatively, the base station control board 90 controls the first power unit 751 to open so that the clean water channel 71 delivers clean water to the multi-connector 72, and controls the multi-connector 72 to deliver the clean water delivered from the clean water channel 71 to the first processing fluid channel 741 to clean the first processing fluid channel 741. When the detection result indicates that the flow rate in the first processing fluid channel 741 is greater than or equal to the preset threshold, it is determined that the first processing fluid channel 741 is not blocked. The base station control board 90 can control the second power unit 754 on the first processing fluid channel 741 to open so that the maintenance agent can be delivered to the multi-connector 72 through the first processing fluid channel 741.

[0198] Similarly, in an embodiment with a circulating second processing fluid channel 743, the fluid supply system 70 may further include a second continuity detector 758. The second continuity detector 758 is disposed on the second processing fluid channel 743 and is used to detect whether the second processing fluid channel 743 is open when the second power unit 754 is turned on. Because the cleaning agent has high viscosity and poor flowability, it is prone to blockage if the second processing fluid channel 743 is not cleaned after use. In this embodiment, a second continuity detector 758 is disposed on the second processing fluid channel 743 to detect whether the second processing fluid channel 743 is open. The base station control board 90 can be electrically connected to the second continuity detector 758 and obtain the detection result of the second continuity detector 758. When the detection result indicates that the flow rate in the second processing fluid channel 743 is less than a predetermined threshold, it is determined that the second processing fluid channel 743 is blocked. The base station control board 90 first controls the second power unit 754 on the second processing fluid channel 743 to shut down. At the same time, the base station control board 90 can issue a prompt signal to remind the user to clean it. Alternatively, the base station control board 90 controls the first power unit 751 to open so that the clean water channel 71 delivers clean water to the multi-connector 72, and controls the multi-connector 72 to deliver the clean water delivered from the clean water channel 71 to the second processing fluid channel 743 to clean the second processing fluid channel 743. When the detection result indicates that the flow rate in the second processing fluid channel 743 is greater than or equal to the predetermined threshold, it is determined that the second processing fluid channel 743 is not blocked. The base station control board 90 can control the second power unit 754 on the second processing fluid channel 743 to open so that cleaning fluid can be delivered to the multi-connector 72 through the second processing fluid channel 743.

[0199] The following is combined with Figures 1 to 3 , Figure 29 and Figure 30 The gas supply system 80 of base station 200 is described in detail.

[0200] The base station 200 also includes a wastewater tank 81. The wastewater tank 81 is disposed on the base station body 60 and is used to store liquid. The gas supply system 80 is also disposed on the base station body 60 and may include the wastewater tank 81, a liquid extraction pipe 85, and a liquid discharge pipe 86. The wastewater tank 81 is connected to the liquid-containing area 611 of the base 61 through the liquid extraction pipe 85 to draw in liquid and / or connected to the outside through the liquid discharge pipe 86 to discharge liquid.

[0201] Wastewater tank 81 is a container in base station 200 used for loading and / or storing liquids. It should be noted that the name "wastewater tank 81" does not limit the type of liquid it contains; that is, the liquid in wastewater tank 81 is not limited to storing only wastewater, but can store liquids with various properties, such as clean water and wastewater. In this disclosure, wastewater tank 81 can be used to recycle and store wastewater in liquid storage area 611. The interpretation of "wastewater" here is the same as before. Wastewater tank 81 can be of any shape; for example, the cross-sectional shape of wastewater tank 81 can be regular or irregular. In this paper, the cross-sectional shape of wastewater tank 81 is irregular. This irregular cross-sectional design can adapt to the structural layout of cleaning equipment 100, facilitating the compact arrangement of other components.

[0202] The wastewater tank 81 is provided with a suction port 811, a flow port 813, and an outlet 815. The shape and size of the suction port 811, flow port 813, and outlet 815 can be arbitrarily set, and this disclosure does not limit them. In some embodiments, the outlet 815 is positioned at a lower height on the wastewater tank 81 than the suction port 811, and the suction port 811 is positioned at a lower height than the flow port 813. Specifically, the wastewater tank 81 has a height midline (see above for explanation), with the suction port 811 and flow port 813 located above the height midline, and the outlet 815 located below the height midline. In one example, the outlet 815 is located at or near the bottom of the wastewater tank 81, and the suction port 811 and flow port 813 are located at or near the top of the wastewater tank 81.

[0203] The liquid extraction pipe 85 is a pipe that connects the liquid-containing area 611 of the base 61 with the sewage tank 81. Specifically, the liquid extraction pipe 85 includes a first opening 851 and a second opening 853 located at opposite ends. The first opening 851 is connected to the liquid-containing area 611, and the second opening 853 is connected to the liquid extraction port 811 of the sewage tank 81.

[0204] The drain pipe 86 is a conduit connecting the sewage tank 81 and the outlet 201 of the base station 200. Specifically, the drain pipe 86 includes an inlet 861 and an outlet 863 located at opposite ends. The outlet 201 of the base station 200 is used to connect to a floor drain, the inlet 861 is connected to the outlet 815 of the sewage tank 81, and the outlet 863 is connected to the outlet 201 of the base station 200, thereby connecting to the floor drain.

[0205] The base station 200 has at least a liquid pumping state and a liquid draining state. When the base station 200 is in the liquid pumping state, the sewage tank 81 is connected to the base 61 through the liquid pumping pipe 85 to pump the liquid (mostly sewage) into the liquid storage area 611 for storage. When the base station 200 is in the liquid draining state, the sewage tank 81 discharges the liquid in the sewage tank 81 to the outside of the base station 200 through the liquid draining pipe 86, for example, to the floor drain.

[0206] Specifically, in some embodiments, the gas source system 80 further includes a gas extraction device 82, a control device 83, a gas supply pipe 84, a pipeline assembly 87, and a valve assembly 88. The gas extraction device 82 provides a gas source. The valve assembly 88 is located between the outlet 815 of the wastewater tank 81 and the outlet 863 of the drain pipe 86, and opening or closing the valve assembly 88 controls the connection and disconnection between the outlet 815 and the outlet 863. The control device 83 is connected to the gas extraction device 82 via the gas supply pipe 84, to the valve assembly 88 via the pipeline assembly 87, to the wastewater tank 81 via the pipeline assembly 87, to the outside atmosphere via the pipeline assembly 87, and to the clean water box 23 of the cleaning equipment 100 via the pipeline assembly 87. The liquid extraction pipe 85 passes through the control device 83, which controls the connection and disconnection of the liquid extraction pipe 85, as well as the connection and disconnection between the gas supply pipe 84 and the pipeline assembly 87.

[0207] More specifically, the gas extraction device 82 is a device for providing a gas source, including but not limited to an air pump. In this embodiment, the gas extraction device 82 can provide positive pressure gas, that is, exhaust gas outward. The gas extraction device 82 can provide negative pressure, that is, draw gas inward. When providing positive pressure gas and drawing negative pressure gas, the airflow direction of the gas extraction device 82 is opposite.

[0208] In some embodiments, the control device 83 includes a gas transmission pipe 831, a gas passage pipe 833, and a control switch assembly 835. The gas transmission pipe 831 is connected to a gas delivery pipe 84, and the control device 83 is connected to a gas extraction device 82 via the gas delivery pipe 84. The gas passage pipe 833 is connected to a pipeline assembly 87, enabling communication with a valve assembly 88, a wastewater tank 81, the outside atmosphere, and the clean water box 23 of the cleaning equipment 100. Both the gas passage pipe 833 and the liquid extraction pipe 85 pass through the control switch assembly 835. The control switch assembly 835 is a device for controlling the opening and closing of the fluid passage. Specifically, the control switch assembly 835 controls the opening and closing of the gas passage pipe 833 to control the connection and disconnection between the gas delivery pipe 84 and the pipeline assembly 87. The control switch assembly 835 is also used to control the opening and closing of the liquid extraction pipe 85, so as to control the opening and closing of the sewage tank 81 and the liquid storage area 611.

[0209] The gas supply pipe 84 is a conduit used to connect the gas transmission pipe 831 of the control device 83 and the gas extraction device 82. In one example, the gas supply pipe 84 is a multi-port pipe, which allows the positive pressure gas provided by the gas extraction device 82 and the negative pressure gas to be connected to the control device 83 through different paths, ensuring that the positive pressure gas and the negative pressure gas do not interfere with or affect each other.

[0210] Piping assembly 87 is a piping assembly used to connect control device 83 with valve assembly 88, control device 83 with wastewater tank 81, control device 83 with the outside atmosphere, and control device 83 with clean water box 23 of cleaning equipment 100. Thus, gas extraction device 82 can be connected sequentially to valve assembly 88, wastewater tank 81, outside atmosphere, and clean water box 23 via gas delivery pipe 84, control device 83, and piping assembly 87.

[0211] The gas supply system 80 also includes an exhaust channel 89, which is connected to the gas extraction device 82 of the gas supply system 80 and is used to discharge the gas from the gas extraction device 82 to the outside of the base station 200. The outlet 717 of the clean water channel 71 and the outlet of the exhaust channel 89 are respectively connected to different input interfaces 721.

[0212] In some embodiments, the piping assembly 87 includes a first piping assembly 871. The control device 83 communicates with the interface 63 via the first piping assembly 871 and is used to control the connection / disconnection between the gas supply pipe 84 and the first piping assembly 871. The gas supply pipe 84, the control device 83, and the first piping assembly 871 together form an exhaust passage 89. The first piping assembly 871 includes a first pipe 8711 and a two-way connector 8713. One end of the two-way connector 8713 is connected to the gas passage pipe 833, and the other end is connected to one end of the first pipe 8711. The other end of the first pipe 8711 is connected to the input interface 721. Figure 1 or Figure 2 (As shown), or directly connected to the interface 63. When the cleaning equipment 100 is in the sewage discharge state, the base station control board 90 inputs a control signal to the control switch assembly 835. The control switch assembly 835 controls the gas pipe 833 connected to the first pipeline assembly 871 to be open, so as to connect the gas transmission pipe 831 and the first pipeline assembly 871, thereby opening the gas extraction device 82 and the exhaust passage 89. The gas extraction device 82 can then provide positive pressure gas to the multi-port connector 72 or the interface 63 through the exhaust passage 89. The positive pressure gas can supply gas to the clean water box 23 through the interface 63 and the liquid replenishment port 231. The gas enters the second chamber 245 in the sewage box 24 through the overflow port 235 of the clean water box 23, so that the sewage in the second chamber 245 is discharged.

[0213] In other embodiments, the piping assembly 87 includes a second piping assembly 873. A control device 83 is connected to the wastewater tank 81 via the second piping assembly 873 and is used to control the connection and disconnection between the gas supply pipe 84 and the second piping assembly 873. A liquid extraction pipe 85 passes through the control device 83, which also controls the connection and disconnection of the liquid extraction pipe 85. The liquid extraction pipe 85, wastewater tank 81, second piping assembly 873, control device 83, gas supply pipe 84, and gas extraction device 82 together form a liquid extraction passage. The second piping assembly 873 includes a second pipe 8731 and a tee 8733. One end of the tee 8733 is connected to the gas supply pipe 833, and the other end is connected to one end of the second pipe 8731. The other end of the second pipe 8731 is connected to the wastewater tank 81. The base station 200 has at least a liquid extraction state. When the base station 200 is in the liquid extraction state, the base station control board 90 inputs a control signal to the control switch assembly 835. The control switch assembly 835 controls the liquid extraction pipe 85 to be turned on, and also controls the gas pipe 833 connected to the second pipeline assembly 873 to be turned on, so as to connect the gas transmission pipe 831 and the second pipeline assembly 873, thereby turning on the gas extraction device 82 and the liquid extraction passage. The gas extraction device 82 can then draw negative pressure into the sewage tank 81 through the liquid extraction passage, and the liquid in the liquid holding area 611 is drawn into the sewage tank 81.

[0214] The above embodiments will be described below with reference to some specific application scenarios.

[0215] Please see Figure 2 , Figure 3 and Figure 31 The user starts the sweeping and mopping machine (cleaning equipment 100) on the drive wheel 101 ( Figure 5 Driven by the motion shown, the robot vacuum and mop moves across the living room floor. During this movement, the built-in water tank 23 provides water to the tracked cleaning component 22, wetting it. The tracked cleaning component 22 then contacts and rolls against the floor, wiping away dust. As the robot vacuum and mop moves, the tracked cleaning component 22 cleans the floor to a set area, such as 20 square meters. 2When the area is insufficient or the liquid in the clean water tank 23 is low, the sweeper and mop can navigate to the positioning point of the base station 200 and rotate until the replenishment port 231 of the clean water tank 23 faces the entrance of the base station 200. The sweeper and mop then retreats into the base station 200. During this process, the replenishment port 231 of the clean water tank 23 of the sweeper and mop connects with the interface 63 of the base station 200, and the base station 200's liquid supply system 70 replenishes the clean water tank 23 of the sweeper and mop. As the base station 200 continuously replenishes the clean water tank 23, the water level in the clean water tank 23 continuously rises until the liquid level exceeds the overflow port 235 of the clean water tank 23. A large volume of liquid overflows from the overflow port 235 of the clean water tank 23 and flows onto the tracked cleaning component 22. During this process, the tracked cleaning component 22 can continuously rotate forward or alternate between forward and reverse rotation to achieve high-flow self-cleaning of the tracked cleaning component 22. After the cleaning unit 22 has finished its task, the sweeper and mop can return to the floor to clean other uncleaned areas.

[0216] Alternatively, the robot vacuum and mop used in the user's home may have a dirt detection sensor that can detect the degree of dirt on the cleaning component 22 or the dirt level of the wastewater scraped off the cleaning component 22. If the user is away from home for an extended period, resulting in a lot of dust on the living room floor, the user can start the robot vacuum and mop (cleaning device 100). Driven by the drive wheels 101, the robot vacuum and mop moves across the floor. During this movement, the built-in water tank 23 provides water to the tracked cleaning component 22 to wet it. The tracked cleaning component 22 then contacts and rolls against the floor, wiping away the dust. As the robot vacuum and mop moves, the dirt sensor detects that the tracked cleaning component 22 is very dirty. If it is not deeply cleaned at this point, it will affect the subsequent cleaning effect on the floor. At this time, the robot vacuum and mop can navigate to the positioning point of the base station 200 to clean the cleaning component 22. However, the user's previous base station had two interfaces: one for connecting to the clean water tank to replenish the cleaning solution, and the other for connecting to the wastewater tank to discharge clean water into the wastewater tank 24 for cleaning. The user was frustrated that each time the previous robot vacuum returned to the base station, one of the clean water or wastewater tanks would misalign with the base station's interface, sometimes even resulting in leaks. If the user uses the robot vacuum and base station 200 of this application, the robot vacuum will rotate so that the replenishment port 231 of its clean water tank 23 faces the entrance of the base station 200. The robot vacuum will then retract into the base station 200. During this process, one replenishment port 231 of the clean water tank 23 of the robot vacuum will connect with one interface 63 of the base station 200. Only one point of connection accuracy is required, greatly improving the connection accuracy and virtually eliminating misalignment issues. At this point, the base station 200's liquid supply system 70 can be used to replenish the clean water tank 23 of the robot vacuum. As the base station 200 continuously replenishes the clean water tank 23, the liquid level in the clean water tank 23 rises continuously until it exceeds the overflow port 2835 of the clean water tank 23. A large volume of liquid overflows from the overflow port 2835 and flows onto the tracked cleaning component 22. During this process, the tracked cleaning component 22 can continuously rotate forward or alternately in both directions, achieving high-flow self-cleaning of the tracked cleaning component 22, thereby thoroughly cleaning the dirt attached to the tracked cleaning component 22. Furthermore, the base station 200 begins supplying liquid, and within a short time, the clean water tank 23 is filled to the target water level, the cleaning component 22 is cleaned, and even the dirt in the wastewater tank 24 is cleaned. Compared to previous solutions, the base station 200 disclosed in this invention has a higher overall efficiency in maintaining the sweeper and mop combo. After completing the task of cleaning the cleaning component 22, the sweeper and mop combo returns to the ground to clean other uncleaned areas. This back-and-forth motion cleans most of the dusty areas on the living room floor.

[0217] The technical features of the embodiments described above can be combined arbitrarily. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as the combination of these technical features does not contradict each other, it should be considered within the scope of this specification. Furthermore, other implementation methods can be derived from the above embodiments, allowing for structural and logical substitutions and changes without departing from the scope of this disclosure.

[0218] The embodiments described above are merely illustrative of several implementations of this disclosure, and while the descriptions are specific and detailed, they should not be construed as limiting the scope of the patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of this disclosure, and these all fall within the scope of protection of this disclosure. Therefore, the scope of protection of this patent should be determined by the appended claims.

Claims

1. A cleaning system, characterized in that, include: A cleaning device includes a cleaning component for mopping a surface to be cleaned. The cleaning device also includes a clean water tank and a wastewater tank. The clean water tank has a replenishment port and an overflow port, and the clean water tank is connected to the wastewater tank through the overflow port. The wastewater tank is used to collect wastewater generated by the cleaning component. A base station for maintaining the cleaning equipment, the base station being provided with an interface for connecting and communicating with the replenishment port; Wherein, when the interface is connected to the replenishment port, the cleaning equipment includes at least a replenishment state and a discharge state; when the cleaning equipment is in the replenishment state, the liquid provided by the base station is injected into the clean water box through the interface and the replenishment port; when the cleaning equipment is in the discharge state, the fluid provided by the base station is injected into the clean water box through the interface and the replenishment port, and at least a portion of the fluid passes through the clean water box and enters the wastewater box through the overflow port to provide positive pressure to the wastewater box, thereby discharging the wastewater in the wastewater box to the outside of the wastewater box.

2. The cleaning system according to claim 1, characterized in that, The base station is equipped with a liquid supply system for providing liquid and a gas supply system for providing gas; When the cleaning equipment is in the replenishment state, the liquid supplied by the liquid supply system is injected into the clean water box through the docking port and the replenishment port. When the cleaning equipment is in the sewage discharge state, the liquid and / or the gas supplied by the gas source system and / or the liquid supply system are injected into the clean water box through the docking port and the replenishment port. At least a portion of the liquid and / or the gas passes through the clean water box and enters the sewage box through the overflow port, so that the sewage in the sewage box is discharged to the outside of the sewage box.

3. The cleaning system according to claim 2, characterized in that, There is one interface, and both the gas source system and the liquid supply system are connected to the same interface and are connected to the same liquid replenishment port through the same interface. And / or, the cleaning component is a tracked cleaning component or a roller cleaning component.

4. The cleaning system according to claim 2, characterized in that, The cleaning equipment is provided with a sewage discharge channel for discharging waste from the sewage box. The sewage discharge channel is provided with a control structure for controlling the opening and closing of the sewage discharge channel. When the cleaning equipment is in the sewage discharge state, the control structure opens the sewage discharge channel.

5. The cleaning system according to claim 2, characterized in that, The overflow outlet is located above the midline of the height of the water tank and near the top of the water tank; and / or, A control valve is provided on the communication passage between the clean water box and the wastewater box. The control valve is used to open when the cleaning equipment is in the sewage discharge state to allow the fluid in the clean water box to enter the wastewater box, and to close when the cleaning equipment is in the liquid replenishment state to prevent the fluid in the clean water box from entering the wastewater box.

6. The cleaning system according to claim 2, characterized in that, Along the forward direction of the cleaning device, the cleaning device includes opposing front and rear sides; The cleaning device is also equipped with casters or support wheels. The water tank and the casters, or the water tank and the support wheels, are both located on the rear side of the cleaning device. In the projection in a plane perpendicular to the forward direction of the cleaning device, the projection of the casters or the support wheels is located below the projection of the water tank. In the projection in a plane perpendicular to the height direction of the cleaning device, the geometric center of the projection of the casters or the support wheels is located within the projection of the water tank.

7. The cleaning system according to claim 6, characterized in that, The cleaning device is provided with an injection connector on the rear side wall, and the injection connector is provided with an injection port, which is connected to the liquid replenishment port of the clean water box; The geometric center of the caster wheel or the support wheel is located on the center line of the width direction of the cleaning equipment. Along the width direction of the cleaning equipment, the injection port on the injection connector is located on one side of the caster wheel or the support wheel and is spaced apart from the caster wheel or the support wheel.

8. The cleaning system according to claim 7, characterized in that, The injection connector is also provided with blind holes, which are symmetrically arranged on both sides of the caster wheel or the support wheel along the width direction of the cleaning equipment, along with the injection port.

9. The cleaning system according to claim 2, characterized in that, The wastewater box is connected to a power unit and a filter element. When the cleaning equipment is cleaning the surface to be cleaned, the power unit is in the on state and draws negative pressure into the wastewater box to provide the power to draw the wastewater on the cleaning element into the wastewater box. The filter element is used to prevent solid waste in the wastewater box from entering the power unit. When the interface is connected to the replenishment port, the cleaning equipment also includes a state for rinsing the wastewater box. When the cleaning equipment is in the state of rinsing the wastewater box, the liquid provided by the liquid supply system is injected into the clean water box through the interface and the replenishment port, and the gas provided by the gas source system is injected into the clean water box through the interface and the replenishment port. The liquid and the gas together form a bubble liquid to rinse the filter element in the wastewater box.

10. The cleaning system according to any one of claims 2-9, characterized in that, The gas supply system includes: The control device is connected to the gas extraction device through the gas supply pipe and to the docking interface through the first pipeline assembly, and is used to control the on / off connection between the gas supply pipe and the first pipeline assembly. When the cleaning equipment is in the sewage discharge state, the control device controls the air supply pipe and the first pipeline assembly to be connected, and the gas extraction device supplies gas to the clean water box through the air supply pipe, the control device, the first pipeline assembly, the docking port and the liquid replenishment port.

11. The cleaning system according to claim 10, characterized in that, The base station also includes: A wastewater tank is used to store liquid and is connected to a liquid-containing area outside the wastewater tank via a liquid-drawing pipe to draw in liquid and / or connected to the outside of the base station via a liquid-draining pipe to discharge liquid. The liquid-drawing pipe passes through the control device, which is also used to control the opening and closing of the liquid-drawing pipe. After the cleaning equipment returns to the base station, the wastewater discharged from the wastewater box enters the liquid-containing area outside the wastewater tank. The control device is also connected to the wastewater tank via a second pipeline assembly and is used to control the opening and closing between the gas supply pipe and the second pipeline assembly. When the cleaning equipment is in the sewage discharge state, the control device controls the base station to be in the sewage pumping state. When the base station is in the sewage pumping state, the control device controls the liquid pumping pipe to be open, and the gas supply pipe and the second pipeline assembly to be open. The liquid pumping pipe, the sewage tank, the second pipeline assembly, the control device, and the gas pumping device together form a liquid pumping passage. The gas pumping device provides negative pressure to the liquid pumping passage so that the liquid in the liquid-containing area is pumped into the sewage tank through the liquid pumping pipe.

12. The cleaning system according to any one of claims 2 to 9, characterized in that, The liquid supply system includes: A clean water channel, connecting the interface and the clean water tank inside the base station and / or an external liquid source of the base station, is used to transport clean water; the gas source system includes: An exhaust channel, connected to the gas extraction device of the gas source system, is used to discharge gas from the gas extraction device to the outside of the base station; and A multi-port connector includes an output interface and at least two input interfaces, wherein the output interface is connected to the output interface, and the outlet of the clean water channel and the outlet of the exhaust channel are respectively connected to different input interfaces.

13. The cleaning system according to claim 12, characterized in that, The liquid supply system also includes: Processing fluid container, used to store processing fluid; The processing fluid channel connects the processing fluid container and at least one other input interface of the multi-port connector; and The multi-port connector includes a fluid buffer chamber, through which fluids input from different input ports of the multi-port connector can be mixed and then flow out through the output port.

14. The cleaning system according to claim 13, characterized in that, The liquid supply system further includes an adjustment device, which is disposed on the clean water channel and / or the treatment liquid channel, for adjusting the properties of the liquid entering the interface so that the properties of the liquid output from the interface to the clean water box are preset properties, wherein the properties of the liquid include at least one of the following: the temperature of the liquid, the concentration of the liquid, and the composition of the liquid.

15. The cleaning system according to claim 14, characterized in that, The regulating device includes: A first power unit is disposed on the clean water channel and is used to provide driving power for conveying clean water through the clean water channel to the multi-port connector. The amount of clean water conveyed to the multi-port connector is controlled by controlling the start-up duration and / or the flow rate of the first power unit; and / or, The regulating device includes: an electrolysis module disposed on the clear water channel and used to electrolyze the clear water in the clear water channel to convert the clear water in the clear water channel into electrolyzed water; and / or, The regulating device includes a heating module, which is disposed on the clean water channel and is used to heat the clean water in the clean water channel.

16. The cleaning system according to claim 14, characterized in that, The regulating device includes: The second power unit is disposed on the processing fluid channel and is used to provide driving power to transport the processing fluid through the processing fluid channel to the multi-port connector. The amount of processing fluid transported to the multi-port connector is controlled by controlling the start-up time and / or the flow rate of the second power unit.

17. The cleaning system according to claim 13, characterized in that, The processing fluid channel includes a first processing fluid channel, and the processing fluid container includes a first processing fluid container; The first processing fluid channel includes a first port and a second port, which are respectively connected to the input interface of the multi-port connector; The first processing liquid container is connected between the first port and the second port. The first processing liquid channel includes a first usage state and a second usage state. In the first usage state, the liquid in the first processing liquid container flows into the multi-port connector through the first port. In the second usage state, the clean water in the clean water channel flows sequentially through the multi-port connector, the first port and the second port to clean the first processing liquid channel. The liquid after cleaning the first processing liquid channel flows to the multi-port connector through the second port.

18. The cleaning system according to claim 17, characterized in that, The first treatment liquid container is used to hold the ground maintenance agent. When the first treatment liquid channel is in the first use state, the clean water in the clean water channel is controlled to be delivered to the multi-port connector so that the maintenance agent and the clean water are mixed in the multi-port connector.

19. The cleaning system according to claim 13, characterized in that, The treatment fluid channel includes a second treatment fluid channel, and the treatment fluid container includes a second treatment fluid container, which is used to contain cleaning agent.

20. The cleaning system according to claim 1, characterized in that, The cleaning equipment further includes a recovery component, which comprises a scraping part and a dirt-receiving cavity. The scraping part is used to abut against the cleaning component to scrape dirt from the cleaning component into the dirt-receiving cavity. The wastewater box is provided with: The inlet is connected to the overflow outlet; and A connecting port is connected to the dirt-containing cavity, and the liquid inlet is set at a height higher than the connecting port. When the cleaning equipment is in the sewage discharge state, the fluid provided by the base station is injected into the clean water box through the interface and the replenishment port. At least part of the fluid passes through the clean water box and enters the sewage box through the overflow port, so that the sewage in the sewage box flows out from the communication port into the sewage holding chamber.

21. The cleaning system according to claim 20, characterized in that, The base station also includes: A base for receiving wastewater discharged from the sludge chamber; A wastewater tank for storing liquid, connected to the base via a suction pipe for drawing in liquid and / or connected to the outside via a drain pipe for discharging liquid; and Gas source system, the gas source system includes: Gas extraction device, used to provide a gas source; The control device is connected to the gas extraction device via a gas supply pipe and to the sewage tank via a second pipeline assembly. It is used to control the on / off connection between the gas supply pipe and the second pipeline assembly. The liquid extraction pipe passes through the control device, which also controls the on / off connection of the liquid extraction pipe. The liquid extraction pipe, the sewage tank, the second pipeline assembly, the control device, and the gas extraction device together form a liquid extraction passage.

22. The cleaning system according to claim 1, characterized in that, The interface is directly connected to the replenishment port, and a one-way self-locking valve is provided at the interface or the replenishment port; or... The interface and the replenishment port are indirectly connected via a pipe, and a one-way self-locking valve is provided at the interface, the replenishment port or inside the pipe; When the interface and the replenishment port are not connected and the one-way self-locking valve is closed, the interface and the replenishment port are not in communication. When the interface is connected to the replenishment port and the one-way self-locking valve is open, the interface is connected to the replenishment port.

23. The cleaning system according to claim 1, characterized in that, The water box is also provided with a liquid outlet, and the overflow outlet is set at a higher height on the water box than the liquid outlet is set at a higher height on the water box. The cleaning equipment also includes: The first passage is provided with a first inlet and a first outlet. The first inlet is connected to the liquid outlet, and the first outlet is used to supply liquid to flow out of the first passage. The first passage is provided with a first power device, which is used to provide driving power to discharge the liquid in the clear water box from the first passage. Before the cleaning equipment is in the replenishment state by the base station supplying liquid to the water box through the replenishment port, the first power unit drives the liquid in the water box to be discharged out of the water box through the first passage.

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