Optical element exposure apparatus and exposure method

Abstract

The application provides an optical element exposure device and an exposure method, and relates to the field of optical elements. The optical element exposure device comprises a light source assembly and a light path structure. The light source assembly is used for emitting a combined light beam. The light path structure comprises a modulator and a filter. The modulator receives the combined light beam from the light source assembly and is used for loading a hologram. The hologram has a corresponding specific light wave. The light inlet side of the filter faces the modulator, the light outlet side of the filter is used for facing a holographic material, and the filter can transmit the specific light wave according to the hologram. The application can make the exposure process of the holographic material simpler and easier to control.

Description

Technical Field

[0001] This application relates to the field of optical elements, and more particularly to optical element exposure apparatus and exposure methods. Background Technology

[0002] Volume holographic gratings (VHGs) are common optical components used in color holographic waveguide display systems. The fabrication of a VHG typically involves illuminating the holographic material with a light source to expose it. However, the exposure process for holographic materials is complex and difficult to control. Summary of the Invention

[0003] This application provides an optical element exposure apparatus and method to solve the problems of complex exposure process and difficulty in controlling the exposure process of holographic materials.

[0004] The optical element exposure apparatus provided in this application includes a light source assembly and an optical path structure;

[0005] The light source assembly is at least used to emit a combined light beam;

[0006] The optical path structure includes a modulator and a filter; the modulator receives a combined beam of light from the light source assembly and is used at least to load a hologram having a corresponding specific light wave.

[0007] The light-incident side of the filter faces the modulator, and the light-outcident side of the filter faces the holographic material. The filter can transmit the specific light wave according to the hologram.

[0008] By adopting the above technical solution, the optical exposure device includes a light source component and an optical path structure. The light source component is used to emit a combined light beam, and the optical path structure includes a modulator and a filter. The modulator can receive the combined light beam from the light source component, the light-incident side of the filter faces the modulator, and the light-outcident side of the filter is used to face the holographic material.

[0009] When holographic materials are exposed using an optical element exposure device, the light source assembly can emit a combined light beam to the modulator. The modulator can receive the combined light beam from the light source assembly and load a hologram, so that the hologram has a specific light wave for exposing the holographic element. The filter can transmit the specific light wave according to the hologram, thereby enabling the holographic material to be exposed by the specific light wave.

[0010] Compared to the exposure methods for holographic materials in related technologies, the filter in the optical element exposure apparatus of this application can transmit specific light waves according to the hologram, thus eliminating the need to repeatedly construct the exposure optical path when exposing different holographic materials, making the exposure process of holographic materials simpler. Furthermore, the filter's ability to transmit specific light waves according to the hologram also makes the exposure process of holographic materials easier to control.

[0011] In some possible implementations, the combined light beam comprises multiple light rays of different wavelengths;

[0012] The modulator can form a hologram with multiple light waves based on multiple light waves of different wavelengths, and the filter can transmit a specific light wave among the multiple light waves according to the hologram.

[0013] In some possible implementations, the filter is a dynamically refreshed filter.

[0014] In some possible implementations, the dynamic refresh filter is configured as a liquid crystal switch or a transmissive amplitude-type spatial light modulator.

[0015] In some possible implementations, the optical path structure includes a lens and an objective lens;

[0016] The light-incident side of the lens faces the modulator, and the light-exiting side of the lens faces the filter; the light-incident side of the objective lens faces the light-exiting side of the filter, and the light-exiting side of the objective lens is at least used to face the holographic material.

[0017] In some possible implementations, the light source assembly includes at least one light source, which is used to emit light toward the modulator at least once.

[0018] In some possible implementations, the light source assembly includes a plurality of light sources and a light combining element, wherein the plurality of light sources emit light of different wavelengths;

[0019] The light combining element is used to acquire light from multiple light sources and combine the light to form the combined light beam, with the light-emitting side of the light combining element facing the modulator.

[0020] In some possible implementations, the plurality of light sources includes a first light source, a second light source, and a third light source with different emission wavelengths;

[0021] The first light source is used to emit light of at least a first wavelength, the second light source is used to emit light of at least a second wavelength, and the third light source is used to emit light of at least a third wavelength.

[0022] In some possible implementations, the number of optical path structures is set to multiple, and the multiple optical path structures include a first optical path structure and a second optical path structure;

[0023] The first optical path structure and the second optical path structure are respectively used to face both sides of the holographic material. The first optical path structure includes a first modulator and a first filter that cooperate with each other, and the second optical path structure includes a second modulator and a second filter that cooperate with each other.

[0024] In some possible implementations, the first modulator and the second modulator satisfy the following:

[0025]

[0026] in, The phase distribution of the first modulator, The phase distribution of the second modulator, This represents the phase distribution of the plane containing the holographic material.

[0027] In some possible implementations, the optical element exposure apparatus further includes a beam splitter with its incident light side facing the light source assembly and its exit light side facing the first modulator and the second modulator.

[0028] The beam splitter is at least used to propagate a first portion of the combined beam toward the first modulator and a second portion of the combined beam toward the second modulator.

[0029] This application provides an optical element exposure method, characterized in that it includes:

[0030] The light source assembly is controlled to emit a combined light beam toward the modulator;

[0031] The modulator is controlled to receive the combined light beam and load a hologram, the hologram having a corresponding specific light wave;

[0032] The control filter transmits a specific light wave according to the hologram and exposes the holographic material with the specific light wave.

[0033] In some possible implementations, the combined light beam comprises multiple light rays of different wavelengths, and the method includes:

[0034] The modulator forms the hologram based on multiple light rays of different wavelengths, and the hologram has multiple light waves including specific light waves;

[0035] The filter is dynamically refreshed so that it transmits a specific light wave from the plurality of light waves according to the hologram. Attached Figure Description

[0036] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with this application and, together with the description, serve to explain the principles of this application.

[0037] Figure 1 This is a schematic diagram of the structure of the optical element exposure apparatus provided in the embodiments of this application;

[0038] Figure 2 This is a schematic diagram of the structure of the light source assembly provided in the embodiments of this application;

[0039] Figure 3 This is a schematic diagram of the optical path structure provided in the embodiments of this application;

[0040] Figure 4 This is a schematic diagram of the first optical path structure and the second optical path structure provided in the embodiments of this application;

[0041] Figure 5 A schematic diagram of the structure of an optical element exposure apparatus according to another embodiment of this application;

[0042] Figure 6 This is a schematic flowchart of the optical element exposure method provided in the embodiments of this application.

[0043] Explanation of reference numerals in the attached figures:

[0044] 10. Optical path structure;

[0045] 11. Modulator; 12. Filter; 13. Lens; 14. Objective lens;

[0046] 100. Light source assembly;

[0047] 110. First light source; 111. First collimator; 120. Second light source; 121. Second collimator; 130. Third light source; 131. Third collimator; 140. Light combining element; 141. Mirror; 142. First dichroic mirror; 143. Second dichroic mirror;

[0048] 200. Spectroscopic element;

[0049] 300. First optical path structure;

[0050] 310. First modulator; 320. First filter; 330. First lens; 340. First objective lens;

[0051] 400. Second optical path structure;

[0052] 410. Second modulator; 420. Second filter; 430. Second lens; 440. Second objective lens;

[0053] 500. Holographic materials.

[0054] The accompanying drawings illustrate specific embodiments of this application, which will be described in more detail below. These drawings and descriptions are not intended to limit the scope of the concept in any way, but rather to illustrate the concept of this application to those skilled in the art through reference to particular embodiments. Detailed Implementation

[0055] As described in the background section, the fabrication of a volume holographic grating typically involves irradiating the holographic material with a light source to expose it. During this exposure, an exposure optical path must be constructed, and the arrangement of various components within the path is adjusted according to the requirements of the holographic material and the volume holographic grating. For example, in related technologies, the exposure optical path typically includes a light source, modulator, filter elements, and adjustment elements such as lenses and objectives.

[0056] When exposing holographic materials through the constructed exposure optical path, the light source can emit a beam of light to the modulator. The modulator can form a hologram according to the parameters of the holographic material and the volume holographic grating. The hologram has a specific light wave that can be used to expose the holographic material. Then, the type and number of filtering elements and adjustment elements can be selected according to the specific light wave to allow the specific light wave to pass through the filtering elements and filter out other light waves, thereby enabling the exposure process of the holographic material through the specific light wave.

[0057] The type and number of filtering and adjustment elements need to be determined based on the specific light wave, which makes the construction of the exposure optical path cumbersome, thus complicating the exposure process of holographic materials. Furthermore, when exposing holographic materials through the constructed exposure optical path, the position and material of the filtering elements also need to be adjusted, resulting in low exposure efficiency for holographic materials.

[0058] To ensure the accuracy of the exposure process, the exposure optical path is usually equipped with control devices such as shutters. These control devices regulate the exposure sequence of the holographic material, ensuring the accuracy of the exposure process. For example, after each monochromatic exposure of the holographic material is completed, the corresponding control device can be turned off, and the next control device can be turned on to achieve the next monochromatic exposure.

[0059] However, after each monochromatic exposure of the holographic material, the corresponding control device is turned off, and the holographic material undergoes a dark reaction time. The opening and closing of the control device also affects the stability of the exposure optical path, thus impacting the next exposure process. This makes the exposure process of holographic materials generally difficult to control, resulting in poor exposure effects.

[0060] Furthermore, when the vectors of the holographic material or volume holographic grating change, it is usually necessary to modify the exposure optical path or add a motion control device to the exposure optical path. However, the motion accuracy and speed of the motion control device are limited, making it difficult to achieve the exposure multiplexing process of high frame rate volume holographic gratings. For example, the motion control device usually cannot expose multiple sets of holographic materials with different color components in a short period of time. These factors can all affect the efficiency, accuracy, and repeatability of the exposure.

[0061] To address the aforementioned technical problems, this application provides an optical element exposure apparatus, including a light source assembly and an optical path structure. The light source assembly is at least used to emit a combined light beam, and the optical path structure includes a modulator and a filter. The modulator can receive the combined light beam from the light source assembly, the light-incident side of the filter faces the modulator, and the light-outcident side of the filter is used to face the holographic material.

[0062] When holographic materials are exposed using an optical element exposure device, the light source assembly can emit a combined light beam to the modulator. The modulator can receive the combined light beam from the light source assembly and load a hologram, so that the hologram has a specific light wave for exposing the holographic element. The filter can transmit the specific light wave according to the hologram, thereby enabling the holographic material to be exposed by the specific light wave.

[0063] Compared to the exposure methods for holographic materials in related technologies, the filter in the optical element exposure apparatus of this application can transmit specific light waves according to the hologram, thus eliminating the need to repeatedly construct the exposure optical path when exposing different holographic materials, making the exposure process of holographic materials simpler. Furthermore, the filter's ability to transmit specific light waves according to the hologram also makes the exposure process of holographic materials easier to control.

[0064] Exemplary embodiments will now be described in detail, examples of which are illustrated in the accompanying drawings. When the following description relates to the drawings, unless otherwise indicated, the same numbers in different drawings denote the same or similar elements. The embodiments described in the following exemplary embodiments do not represent all embodiments consistent with this application. Rather, they are merely examples of apparatuses and methods consistent with some aspects of this application as detailed in the appended claims.

[0065] The technical solution of this application and how the technical solution of this application solves the above-mentioned technical problems are described in detail below with specific embodiments. These specific embodiments can be combined with each other, and the same or similar concepts or processes may not be described again in some embodiments. The embodiments of this application will now be described with reference to the accompanying drawings.

[0066] Reference Figures 1-3The optical element exposure apparatus provided in this application includes a light source assembly 100 and an optical path structure 10. The light source assembly 100 is at least used to emit a combined light beam, so that the combined light beam can propagate toward the optical path structure 10.

[0067] The optical path structure 10 may include a modulator 11 and a filter 12. The modulator 11 may receive a combined light beam from the light source assembly 100 and may be used at least to load a hologram. The hologram may have multiple light waves, among which there is a specific light wave that can be used to expose the holographic material 500.

[0068] The light-incident side of the filter 12 can face the modulator 11, and the light-outcident side of the filter 12 can face the holographic material 500. The filter 12 can transmit a specific light wave according to the hologram and filter out the remaining light waves in multiple light waves, thereby enabling the holographic material 500 to be exposed by the specific light wave transmitted through the filter 12.

[0069] When the holographic material 500 is exposed by the optical element exposure device, the light source assembly 100 can emit a combined light beam to the modulator 11. The modulator 11 can receive the combined light beam from the light source assembly 100 and load a hologram, so that the hologram can have a specific light wave for exposing the holographic element. The filter 12 can transmit the specific light wave according to the hologram, so that the holographic material 500 can be exposed by the specific light wave.

[0070] Reference Figures 1-3 In some possible implementations, the light source assembly 100 may include at least one light source, which may be used to emit light toward the modulator 11.

[0071] For example, when the holographic material 500 can be exposed with monochromatic light, the number of light sources can be set to one. When the holographic material 500 needs to be exposed with light of multiple colors, the number of light sources can be set to multiple, and multiple light sources can be used to emit light of different wavelengths.

[0072] Multiple light sources may include a first light source 110, a second light source 120, and a third light source 130, each emitting light with a different wavelength. The first light source 110 may emit light of a first wavelength, the second light source 120 may emit light of a second wavelength, and the third light source 130 may emit light of a third wavelength.

[0073] The first light source 110 can be set to a red light source, and the first wavelength of light can be set to red light. The second light source 120 can be set to a green light source, and the second wavelength of light can be set to green light. The third light source 130 can be set to a blue light source, and the third wavelength of light can be set to blue light. The blue, red, and green light can be used to form a combined light beam.

[0074] The light source can be configured as an inorganic light-emitting diode (LED) type light source structure. For example, the light source can be one or more of solid-state lasers, gas lasers, and semiconductor lasers.

[0075] For example, the light source assembly 100 may include a collimator. The collimator may be disposed on the light-emitting side of the light source, so that the light emitted by the light source can propagate through the collimator.

[0076] The number of collimators can be set to multiple, and multiple collimators can be set one-to-one with multiple light sources. The collimators can acquire light from the corresponding light source, making the propagation process of light more accurate.

[0077] The collimator can be set to one or more of the following: compound parabolic concentrator (CPC), collimating lens, and total internal reflection lens (TIR).

[0078] For example, the collimator can be set as a collimating lens to reduce the collimator volume, so that the collimator can be used in exposure devices for optical elements of different sizes. It can also make the light spot formed from the light source and through the collimator more uniform, and improve the light emission effect of the light source assembly 100.

[0079] For example, the light source assembly 100 may include a light combining element 140. The light combining element 140 can be used to acquire light from multiple light sources and combine the light to form a combined light beam. The light emitting side of the light combining element 140 faces the modulator 11, so that the combined light beam can propagate toward the optical path structure 10.

[0080] The light combining element 140 may include at least one dichroic mirror. The number and position of the dichroic mirrors can be determined according to the positions of multiple light sources. The light combining element 140 can be used to adjust and change the propagation direction of light, so that the light from multiple light sources can propagate in the same direction and the light from multiple light sources can be combined to form a combined light beam.

[0081] The light combining element 140 may also include a reflector 141, which can be used to change the direction of light propagation. The reflector 141 can be used in conjunction with a dichroic mirror, thereby enabling the light combining process of multiple light rays through the combined dichroic mirror and the reflector 141.

[0082] For example, multiple light sources may include a first light source 110, a second light source 120, and a third light source 130 with different emission wavelengths. The first light source 110, the second light source 120, and the third light source 130 are arranged sequentially in the vertical direction, and the propagation directions of the first wavelength light, the second wavelength light, and the third wavelength light can be arranged in parallel.

[0083] For example, the number of collimators is set to multiple, including a first collimator 111, a second collimator 121 and a third collimator 131.

[0084] The first collimator 111 can be configured to correspond to the first light source 110, and the first collimator 111 is used to transmit light of the first wavelength from the first light source 110.

[0085] The second collimator 121 can be set in correspondence with the second light source 120. The second collimator 121 is used to transmit the second wavelength light from the second light source 120.

[0086] The third collimator 131 can be set in correspondence with the third light source 130. The third collimator 131 is used to transmit light of the third wavelength from the third light source 130.

[0087] For example, the light combining element 140 may include a first dichroic mirror 142, a second dichroic mirror 143, and a reflector 141.

[0088] The reflector 141 can be disposed opposite to the first light source 110. The reflector 141 can be disposed at an angle. The reflector 141 can be used to reflect the first wavelength light from the first light source 110, so that the first wavelength light can propagate downward in the vertical direction after being reflected by the reflector 141.

[0089] The first dichroic mirror 142 can be set in correspondence with the second light source 120. The first dichroic mirror 142 can be set at an angle. The first dichroic mirror 142 can be used to reflect the second wavelength light from the second light source 120, so that the second wavelength light can propagate downward in the vertical direction after being reflected by the first dichroic mirror 142.

[0090] The first dichroic mirror 142 can be used to transmit a first wavelength of light, so that the first wavelength of light can pass through the first dichroic mirror 142 and propagate downward in the vertical direction, thereby enabling the combination process of the first wavelength of light and the second wavelength of light to be realized through the first dichroic mirror 142.

[0091] The second dichroic mirror 143 can be set in correspondence with the third light source 130. The second dichroic mirror 143 can be set at an angle. The second dichroic mirror 143 can be used to reflect the third wavelength light from the third light source 130, so that the third wavelength light can propagate downward in the vertical direction after being reflected by the second dichroic mirror 143.

[0092] The second dichroic mirror 143 can be used to transmit the first wavelength light and the second wavelength light, so that the first wavelength light and the second wavelength light can propagate downward in the vertical direction through the second dichroic mirror 143, thereby realizing the light combining process of the first wavelength light, the second wavelength light and the third wavelength light through the second dichroic mirror 143, so that the first wavelength light, the second wavelength light and the third wavelength light form a combined light beam.

[0093] It is easy to understand that the light source component 100 can also be configured with other structures, as long as it can ensure that the combined light beam is emitted to the light path structure 10. This application embodiment does not further limit this.

[0094] Reference Figures 2-4 In some possible implementations, the number of optical path structures 10 can be set to multiple. The multiple optical path structures 10 may include a first optical path structure 300 and a second optical path structure 400.

[0095] For example, the first optical path structure 300 and the second optical path structure 400 are respectively used to face the two sides of the holographic material 500. The light-emitting side of the first optical path structure 300 can be used to face the first surface of the holographic material 500, and the light-emitting side of the second optical path structure 400 can be used to face the second surface of the holographic material 500, so that the exposure process of the holographic material 500 can be realized through the cooperating first optical path structure 300 and second optical path structure 400.

[0096] The first optical path structure 300 may include a first modulator 310 and a first filter 320 that cooperate with each other, and the second optical path structure 400 may include a second modulator 410 and a second filter 420 that cooperate with each other, so that the first optical path structure 300 and the second optical path structure 400 can expose the holographic material 500.

[0097] The first optical path structure 300 and the second optical path structure 400 are used to form two optical paths, wherein the first optical path structure 300 can form an object path and the second optical path structure 400 can form a reference path.

[0098] For example, the optical element exposure apparatus may also include a beam splitter 200, with the light-incident side of the beam splitter 200 facing the light source assembly 100 and the light-outceasing side of the beam splitter 200 facing the first modulator 310 and the second modulator 410.

[0099] The beam splitter 200 is at least used to propagate a first portion of the combined beam toward the first modulator 310 and a second portion of the combined beam toward the second modulator 410, thereby enabling the combined beam from the light source assembly 100 to propagate toward the holographic material 500 through the first optical path structure 300 and the second optical path structure 400 via the beam splitter 200.

[0100] It is easy to understand that in the first and second combined beams formed by the beam splitting of the beams by the beam splitting element 200, the first combined beam can be set as the target beam, which can propagate along the target path. The second combined beam can be set as the reference beam, which can propagate along the reference path.

[0101] The energy of the object beam and the energy of the reference beam can be the same or approximately the same. The object beam can be irradiated on the first surface of the holographic material 500 through the first modulator 310 and the first filter 320, and the reference beam can be irradiated on the second surface of the holographic material 500 through the second modulator 410 and the second filter 420.

[0102] In some possible implementations, in the optical path structure, modulator 11 can be configured as a reflective spatial light modulator (SLM). Modulator 11 can be used to refresh a computer-generated hologram (CGH) so that filter 12 can transmit specific light waves according to the hologram. For example, modulator 11 receives a combined beam (e.g., an object beam or a reference beam) from beam splitter 200 and forms a hologram, thereby performing phase modulation on the combined beam so that the combined beam can form multiple light wave distributions on the front surface of filter 12, among which a specific beam can be used to expose holographic material 500.

[0103] The filter 12 can transmit a specific light wave from multiple light waves according to the hologram and filter out the remaining light waves from the multiple light waves, so as to expose the holographic material 500 through the specific light wave.

[0104] For example, filter 12 can be configured as a dynamically refreshed filter. For instance, a dynamically refreshed filter can be configured as a liquid crystal switch or a transmissive amplitude-type spatial light modulator.

[0105] The filter 12 can independently modulate the phase and amplitude of the light wave, thereby synchronously adjusting the transmittance and phase distribution of the light wave during the exposure process to achieve higher precision exposure control of the holographic material.

[0106] Filter 12 is a dynamic refresh filter that can independently modulate the phase and amplitude of light waves. It selectively transmits specific light waves according to the hologram and adjusts their phase distribution to meet the exposure requirements of the holographic material. Thus, different specific light waves can be transmitted through the dynamic refresh filter, thereby forming different volume holographic gratings in a short time.

[0107] It is easy to understand that the filter 12 is set as a dynamically refreshed filter, so that the filtering process of the filter 12 can be adjusted according to the hologram. The filter 12 can be dynamically adjusted according to the hologram refreshed by the modulator 11, so that the filter 12 can accurately control the exposure time of different specific light waves on the holographic material 500. Thus, the refractive index modulation of the volume holographic grating can be controlled by the matching modulator 11 and filter 12, making the control of the exposure process of the holographic material 500 more accurate.

[0108] When the holographic material 500 is exposed by the optical element exposure device, both the modulator 11 and the filter 12 have high refresh rates, and the filter 12 can work synchronously with the modulator 11, enabling the optical element exposure device to achieve a high frame rate exposure process. Multiple exposures can be completed in a short time, and there is no need to rebuild the exposure optical path, making the exposure process of the holographic material 500 simpler.

[0109] Reference Figure 4 and Figure 5 The following description uses an example of a light source assembly 100 including multiple light sources and multiple optical path structures 10 including a first optical path structure 300 and a second optical path structure 400 to illustrate the exposure process of an optical element exposure device.

[0110] Multiple light sources may include a first light source 110, a second light source 120, and a third light source 130 with different emission wavelengths. The first light source 110 can emit light of a first wavelength (e.g., red light, abbreviated as R), the second light source 120 can emit light of a second wavelength (e.g., green light, abbreviated as G), and the third light source 130 can emit light of a third wavelength (e.g., blue light, abbreviated as B).

[0111] When the first wavelength light, the second wavelength light, and the third wavelength light simultaneously enter the modulator 11, the modulator 11 can refresh the hologram loaded with R, G, and B color components, i.e., CGH. 1R CGH 1G CGH 1B This results in nine different light wave distributions forming on the front surface of filter 12, as shown in the table below.

[0112]

[0113] in, It can be used to represent a specific light wave of the red component of the holographic grating of the exposed body. It can be used to represent a specific light wave of the green component of the holographic grating of the exposed volume. It can be used to represent a specific light wave of the blue component of the holographic grating of the exposed body.

[0114] It is easy to understand that, since multiple light sources are in a state of continuous emission, the front surface of the filter 12 will form a variety of different light wave distributions. The filter 12 needs to determine one or more of the light waves as specific light waves based on the hologram and enable the specific light waves to pass through the filter 12, while the filter 12 filters out the rest of the unnecessary light waves.

[0115] For example, when it is necessary to expose the red component of a volumetric holographic grating, the light wave formed by the loaded hologram must include at least the following components: and (i.e., the first column in the table), where a specific light wave is set to... The filter 12 can filter out the remaining light waves from the modulator 11 according to the hologram, thereby allowing specific light waves to pass through. 500 holographic materials were exposed.

[0116] When it is necessary to expose the green component of the volumetric holographic grating, the light wave generated by the loaded hologram must include at least the following components: and (i.e., the second column in the table), where a specific light wave is set to... The filter 12 can filter out the remaining light waves from the modulator 11 according to the hologram, thereby allowing specific light waves to pass through. 500 holographic materials were exposed.

[0117] When it is necessary to expose the blue component of the volumetric holographic grating, the light wave generated by the loaded hologram must include at least the following components: and (i.e., the third column in the table), where a specific light wave is set to... The filter 12 can filter out the remaining light waves from the modulator 11 according to the hologram, thereby allowing specific light waves to pass through. 500 holographic materials were exposed.

[0118] For example, the refractive index modulation of the red, green, and blue components of a volume holographic grating can be changed by controlling the refresh rate of the hologram with R, G, and B color components in modulator 11.

[0119] For example, the light intensities of the first wavelength light, the second wavelength light, and the third wavelength light at modulator 11 are respectively I... R I G I B The holograms of the first wavelength light, the second wavelength light, and the third wavelength light are alternately refreshed on the modulator 11. The refresh time of the hologram is Ms and the refresh number is N times.

[0120] The exposure amounts of the three colors R, G, and B on the holographic material 500 are respectively I... R *M*N,I G *M*N,IB *M*N yields the desired refractive index modulation for the three gratings R, G, and B. It's important to note that the refractive index modulation of holographic material 500 is a crucial parameter for evaluating its performance. Refractive index modulation refers to the degree of change in the refractive index of holographic material 500 during exposure. A higher refractive index modulation results in higher holographic quality and diffraction efficiency.

[0121] When the holographic material 500 is exposed by the optical element exposure device, multiple light sources in the light source assembly can emit multiple light rays toward the light combining element. The light combining element combines the multiple light rays from the multiple light sources to form a combined beam. The modulator 11 receives the combined beam from the beam splitter and forms a hologram, thereby performing phase modulation on the combined beam so that the combined beam can form multiple light wave distributions on the front surface of the filter 12 through the lens 13.

[0122] The filter 12 can transmit a specific light wave from multiple light waves according to the hologram and filter out the other light waves. The filter 12 can be dynamically refreshed according to the change of the hologram, so that the filter 12 can be adapted to the modulator 11, thereby enabling the specific light wave to pass through the objective lens 14 and illuminate the holographic material 500 to realize the exposure process of the holographic material 500.

[0123] Reference Figure 1 , Figure 4 and Figure 5 In some possible implementations, the optical path structure 10 may include a lens 13. The lens 13 may be disposed between the modulator 11 and the filter 12, with the light-incident side of the lens 13 facing the modulator 11 and the light-outceasing side of the lens 13 facing the filter 12.

[0124] For example, the optical path structure 10 may include an objective lens 14.

[0125] Objective lens 14 can be disposed on the light-emitting side of filter 12, and the light-incident side of objective lens 14 can face the light-emitting side of filter 12. The light-emitting side of objective lens 14 is at least used to face the holographic material 500 so that a specific light wave from filter 12 is irradiated on the holographic material 500 by objective lens 14.

[0126] In the first optical path structure 300, the first optical path structure 300 includes a first lens 330. The first lens 330 can be disposed between the first modulator 310 and the first filter 320, the light-incident side of the first lens 330 can face the first modulator 310, and the light-outceasing side of the first lens 330 can face the first filter 320.

[0127] In the second optical path structure 400, the second optical path structure 400 includes a second lens 430. The second lens 430 can be disposed between the second modulator 410 and the second filter 420, with the light-incident side of the second lens 430 facing the second modulator 410 and the light-outceasing side of the second lens 430 facing the second filter 420.

[0128] In the first optical path structure 300, the first optical path structure 300 includes a first objective lens 340. The first objective lens 340 is disposed on the light-emitting side of the first filter 320, and the light-incident side of the first objective lens 340 can face the light-emitting side of the first filter 320. The light-emitting side of the first objective lens 340 is at least used to face the first surface of the holographic material 500.

[0129] In the second optical path structure 400, the second optical path structure 400 includes a second objective lens 440. The second objective lens 440 is disposed on the light-emitting side of the second filter 420, and the light-incident side of the second objective lens 440 can face the light-emitting side of the second filter 420. The light-emitting side of the second objective lens 440 is at least used to face the second surface of the holographic material 500.

[0130] In some possible implementations, in the first optical path structure 300 and the second optical path structure 400, the first modulator 310 and the second modulator 410 satisfy the following:

[0131]

[0132] in, The phase distribution of the first modulator, The phase distribution of the second modulator, This represents the phase distribution of the plane containing the holographic material 500.

[0133] In other words, the phase distribution of the 500 plane of the holographic material This is equal to the subtraction of the phase distributions of the two first modulators and the second modulator, so that the two optical path structures 10 can expose the holographic material 500.

[0134] In summary, the optical element exposure apparatus includes a light source assembly 100 and an optical path structure 10. The light source assembly 100 is used to emit a combined light beam, and the optical path structure 10 includes a modulator 11 and a filter 12. The modulator 11 can receive the combined light beam from the light source assembly 100, the light-incident side of the filter 12 faces the modulator 11, and the light-outceasing side of the filter 12 is used to face the holographic material 500.

[0135] When the holographic material 500 is exposed by the optical element exposure device, the light source assembly 100 can emit a combined light beam to the modulator 11. The modulator 11 can receive the combined light beam from the light source assembly 100 and load a hologram, so that the hologram can have a specific light wave for exposing the holographic element. The filter 12 can transmit the specific light wave according to the hologram, so that the holographic material 500 can be exposed by the specific light wave.

[0136] Compared to the exposure methods of holographic material 500 in related technologies, the filter 12 in the optical element exposure apparatus of this application embodiment can transmit specific light waves according to the hologram, thereby eliminating the need to repeatedly build the exposure optical path when exposing different holographic materials 500, making the exposure process of holographic material 500 simpler. Furthermore, the filter 12's ability to transmit specific light waves according to the hologram also makes the exposure process of holographic material 500 easier to control.

[0137] This application provides an optical element exposure method, which can be implemented by the aforementioned optical element exposure device. The exposure method can be executed by a controller, which can be set inside the optical element exposure device, or the controller can be set independently.

[0138] Specifically, the executing entity may be a hardware device of the controller, or a software application in the controller that implements the following embodiments, or a computer-readable storage medium on which the software application implementing the following embodiments is installed, or code that implements the software application implementing the following embodiments.

[0139] Reference Figure 4 The exposure method includes: S101, controlling the light source assembly to emit a combined light beam toward the modulator. The number of light sources can be set to multiple, and multiple light sources can be used to emit light of different wavelengths.

[0140] Multiple light sources may include a first light source 110, a second light source 120, and a third light source 130, each emitting light with a different wavelength. The first light source 110 may emit light of a first wavelength, the second light source 120 may emit light of a second wavelength, and the third light source 130 may emit light of a third wavelength.

[0141] The first wavelength light, the second wavelength light, and the third wavelength light can be combined into a combined light beam through a structure such as the light combining element 140, so that the light source assembly 100 can emit a combined light beam with multiple different wavelengths toward the modulator 11.

[0142] After the control light source assembly 100 emits a combined light beam toward the modulator 11, the method further includes: S102, controlling the modulator to receive the combined light beam and load a hologram, the hologram having a corresponding specific light wave.

[0143] In some possible implementations, the number of optical path structures 10 can be set to multiple. The multiple optical path structures 10 may include a first optical path structure 300 and a second optical path structure 400.

[0144] For example, the first optical path structure 300 and the second optical path structure 400 are respectively used to face the two sides of the holographic material 500. The light-emitting side of the first optical path structure 300 can be used to face the first surface of the holographic material 500, and the light-emitting side of the second optical path structure 400 can be used to face the second surface of the holographic material 500, so that the exposure process of the holographic material 500 can be realized through the cooperating first optical path structure 300 and second optical path structure 400.

[0145] The first optical path structure 300 may include a first modulator 310 and a first filter 320 that cooperate with each other, and the second optical path structure 400 may include a second modulator 410 and a second filter 420 that cooperate with each other, so that the first optical path structure 300 and the second optical path structure 400 can expose the holographic material 500.

[0146] The first optical path structure 300 and the second optical path structure 400 are used to form two optical paths, wherein the first optical path structure 300 can form an object path and the second optical path structure 400 can form a reference path.

[0147] Phase distribution of holographic material in a 500-plane This is equivalent to subtracting the phase distributions of the two first modulators and the second modulator, so that the two optical path structures can expose the holographic material 500°.

[0148] The modulator 11 receives the combined beam (e.g., the target beam or the reference beam) from the beam splitter and forms a hologram, thereby performing phase modulation on the combined beam so that the combined beam can form multiple light wave distributions on the front surface of the filter 12. Among the multiple light waves, there are specific beams that can be used to expose the holographic material 500. The specific setting of the multiple light wave distributions can be referred to above, and will not be repeated here.

[0149] In some possible implementations, after the modulator 11 receives the combined light beam and loads the hologram, the method further includes: S103, controlling the filter to transmit a specific light wave according to the hologram, and exposing the specific light wave to the holographic material.

[0150] For example, filter 12 is configured as a dynamically refreshed filter, allowing the filtering process of filter 12 to be adjusted according to the hologram. The filter can be dynamically refreshed so that it transmits a specific light wave from multiple light waves according to the hologram.

[0151] For example, the light wave distribution of the modulator 11 on the front surface of the filter 12 can be calculated based on the hologram function to obtain the transmittance function of various light waves of the filter 12, so that the filter 12 can transmit specific light waves according to the transmittance function of the light waves and filter out other light waves.

[0152] In some possible implementations, when it is necessary to expose the red component of the volumetric holographic grating, the light wave formed by the loaded hologram includes at least... and Among them, a specific light wave is set as The filter 12 can filter out the remaining light waves from the modulator 11 according to the hologram, thereby allowing specific light waves to pass through. 500 holographic materials were exposed.

[0153] For example, in filter 12, the transmittance function corresponding to the red component can be set to... The transmittance function corresponding to the green component can be set as follows: The transmittance function corresponding to the blue component can be set as follows:

[0154] When it is necessary to expose the red component of the volumetric holographic grating This can be used to represent the light wave distribution on the surface of the filter 12 after the first wavelength of light passes through the modulator 11 loaded with the hologram. It can be used to represent specific light waves.

[0155] This can be used to represent the light wave distribution on the surface of the filter 12 after the second wavelength of light passes through the modulator 11 loaded with a hologram. This can be used to represent the light wave distribution on the surface of filter 12 after the third wavelength light passes through the modulator 11 loaded with a hologram. The light wave distribution after filtering by filter 12 is as follows:

[0156]

[0157] In other words, in the above three light wave distributions In the middle, filter 12 can filter out Two light wave distributions, and through A specific light wave is used so that it can pass through filter 12 and illuminate the holographic material 500.

[0158] In the description of this invention, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0159] In the description of this invention, it should be understood that the terms “comprising” and “having” as used herein, and any variations thereof, are intended to cover non-exclusive inclusion, for example, a process, method, system, product, or device that includes a series of steps or units is not necessarily limited to those steps or units that are explicitly listed, but may include other steps or units that are not explicitly listed or that are inherent to such process, method, product, or device.

[0160] Unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can be a direct connection or an indirect connection through an intermediate medium; they can refer to the internal connection of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features.

[0161] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them; although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. An optical element exposure apparatus, characterized in that, Including light source components and optical path structure; The light source assembly is at least used to emit a combined light beam; The optical path structure includes a modulator and a filter; the modulator receives a combined beam of light from the light source assembly and is used at least to load a hologram having a corresponding specific light wave. The light-incident side of the filter faces the modulator, and the light-outcident side of the filter faces the holographic material. The filter can transmit the specific light wave according to the hologram.

2. The optical element exposure apparatus according to claim 1, characterized in that, The combined light beam includes multiple light rays of different wavelengths; The modulator can form a hologram with multiple light waves based on multiple light waves of different wavelengths, and the filter can transmit a specific light wave among the multiple light waves according to the hologram.

3. The optical element exposure apparatus according to claim 1, characterized in that, The filter is a dynamically refreshed filter.

4. The optical element exposure apparatus according to claim 3, characterized in that, The dynamic refresh filter is configured as a liquid crystal switch or a transmissive amplitude-type spatial light modulator.

5. The optical element exposure apparatus according to claim 1, characterized in that, The optical path structure includes a lens and an objective lens; The light-incident side of the lens faces the modulator, and the light-outcident side of the lens faces the filter; The light-incident side of the objective lens faces the light-outcident side of the filter, and the light-outcident side of the objective lens is at least directed toward the holographic material.

6. The optical element exposure apparatus according to any one of claims 1-5, characterized in that, The light source assembly includes at least one light source, which is used to emit light toward the modulator at least once.

7. The optical element exposure apparatus according to any one of claims 1-5, characterized in that, The light source assembly includes multiple light sources and a light combining element, wherein the multiple light sources emit light with different wavelengths; The light combining element is used to acquire light from multiple light sources and combine the light to form the combined light beam, with the light-emitting side of the light combining element facing the modulator.

8. The optical element exposure apparatus according to claim 7, characterized in that, The plurality of light sources includes a first light source, a second light source, and a third light source with different emission wavelengths; The first light source is used to emit light of at least a first wavelength, the second light source is used to emit light of at least a second wavelength, and the third light source is used to emit light of at least a third wavelength.

9. The optical element exposure apparatus according to claim 7, characterized in that, The number of optical path structures is set to multiple, and the multiple optical path structures include a first optical path structure and a second optical path structure; The first optical path structure and the second optical path structure are respectively used to face both sides of the holographic material. The first optical path structure includes a first modulator and a first filter that cooperate with each other, and the second optical path structure includes a second modulator and a second filter that cooperate with each other.

10. The optical element exposure apparatus according to claim 9, characterized in that, The first modulator and the second modulator satisfy: in, The phase distribution of the first modulator, The phase distribution of the second modulator, This represents the phase distribution of the plane containing the holographic material.

11. The optical element exposure apparatus according to claim 9, characterized in that, It also includes a beam splitter, wherein the light-incident side of the beam splitter faces the light source assembly, and the light-outceasing side of the beam splitter faces the first modulator and the second modulator; The beam splitter is at least used to propagate a first portion of the combined beam toward the first modulator and a second portion of the combined beam toward the second modulator.

12. A method for exposing an optical element, characterized in that, include: The light source assembly is controlled to emit a combined light beam toward the modulator; The modulator is controlled to receive the combined light beam and load a hologram, the hologram having a corresponding specific light wave; The control filter transmits a specific light wave according to the hologram and exposes the holographic material with the specific light wave.

13. The optical element exposure method according to claim 12, characterized in that, The combined light beam comprises multiple light rays of different wavelengths, and the method includes: The modulator forms the hologram based on multiple light rays of different wavelengths, and the hologram has multiple light waves including specific light waves; The filter is dynamically refreshed so that it transmits a specific light wave from the plurality of light waves according to the hologram.

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