Residual charge removal apparatus, method, process chamber, and semiconductor process equipment

By using a charge cleaning disk and a rotating mechanism in semiconductor process equipment to automatically remove residual charge from the surface of an electrostatic chuck, the problems of long time consumption, low safety, and high resource consumption in existing technologies are solved, achieving a fast and safe charge removal effect.

CN122294346APending Publication Date: 2026-06-26BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-12-23
Publication Date
2026-06-26

AI Technical Summary

Technical Problem

In existing technologies, manually opening the cavity to wipe away residual charge on the surface of the electrostatic chuck is time-consuming, has low safety, and is extremely resource-intensive, failing to guarantee the safety of the process chamber and the quality of the process.

Method used

A residual charge removal device is adopted, including a charge cleaning disk and a rotating mechanism. The charge cleaning disk is automatically moved in and out of the process chamber by a drive device. The residual charge is removed by contacting the conductive layer with the electrostatic chuck, avoiding the need for opening the chamber.

Benefits of technology

It achieves rapid and effective removal of residual charge on the surface of the electrostatic chuck, avoiding safety risks and resource waste, and ensuring the safety and process quality of the process chamber.

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Abstract

This application provides a residual charge removal apparatus, method, process chamber, and semiconductor process equipment. The apparatus, applied to semiconductor process equipment, includes a charge cleaning disk and a rotating mechanism. The rotating mechanism includes a first rotating shaft and a driving device. The charge cleaning disk is connected to the first rotating shaft. The driving device drives the first rotating shaft to rotate so that the charge cleaning disk is positioned above the electrostatic chuck when residual charge needs to be removed from the electrostatic chuck in the process chamber. The charge cleaning disk includes a conductive layer for removing residual charge from the surface of the electrostatic chuck when in contact with it. This enables automatic cleaning of residual charge on the surface of the electrostatic chuck, allowing for rapid and effective removal of residual charge without opening the process chamber. This avoids the safety risks and resource consumption of related components in the process chamber caused by opening the chamber to wipe away residual charge.
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