Back contact batteries, battery modules and photovoltaic systems
By optimizing the alternating arrangement of p-type and n-type doped layers on a silicon substrate in a back-contact solar cell and setting an isolation layer in between, the leakage problem caused by the lateral diffusion of dopants was solved, achieving higher isolation performance and cell efficiency.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- ZHEJIANG AIKO SOLAR ENERGY TECH CO LTD
- Filing Date
- 2026-04-28
- Publication Date
- 2026-06-26
AI Technical Summary
In existing technologies, during the fabrication of back-contact solar cells, the lateral diffusion of dopants in the p-type and n-type regions leads to leakage, making it difficult to ensure effective isolation between the p-region and n-region without creating deep trenches.
Alternating p-type and n-type doped layers are arranged on a silicon substrate, with an isolation layer in between. The isolation layer includes a bulk region, a first transition region, and a second transition region. Effective isolation performance is ensured by optimizing the overall width of the isolation layer and the width of the transition region.
Without creating deep trenches, the isolation performance of the p-region and n-region is significantly improved, leakage paths are blocked, and the efficiency of the back contact battery is increased.
Smart Images

Figure CN122294582A_ABST