Back contact cells and methods and apparatus for their manufacture, stacked cells, photovoltaic modules

Abstract

The present disclosure relates to the field of photovoltaics, and provides a back contact cell, a manufacturing method and device thereof, a laminated cell, and a photovoltaic module. The back contact cell comprises a substrate, one surface of the substrate comprising first and second regions arranged alternately along a first direction, and a third region between the first and second regions; a first passivation contact structure in the first region; a first electrode on a side of the first passivation contact structure away from the substrate; a second passivation contact structure in the second region; a second electrode on a side of the second passivation contact structure away from the substrate; an insulating structure in the third region and in a first isolation groove enclosed by the first and second passivation contact structures; and a reflective structure on a side of the insulating structure away from the substrate and in a second isolation groove enclosed by the first and second electrodes, the first, second electrodes and reflective structure comprising the same conductive material, at least to improve the absorption and utilization of light by the back contact cell.

Description

Technical Field

[0001] This disclosure relates to the photovoltaic field, and in particular to a back contact battery and its manufacturing method and apparatus, a tandem battery, and a photovoltaic module. Background Technology

[0002] With the gradual depletion of fossil fuels, photovoltaic cells are becoming increasingly widely used as a new energy alternative. A photovoltaic cell is a device that converts solar energy into electrical energy. It utilizes the photovoltaic principle to generate charge carriers, which are then extracted using electrodes, thus facilitating the efficient use of electrical energy.

[0003] Current photovoltaic cells mainly include BC cells (Back Contact Cell), TOPCON cells (Tunnel Oxide Passivated Contact Cell), PERC cells (Passivated Emitter and Rear Cell), and heterojunction cells (Heterojunction with Intrinsic Thin-layer, or HIT or HJT). By using different film layer configurations and functional limitations, optical losses are reduced, and photogenerated carrier recombination on and within the silicon substrate is decreased, thereby improving the photoelectric conversion efficiency of solar cells.

[0004] However, the transmittance or reflectance of light varies among different film layers in a photovoltaic cell, thus affecting the absorption and utilization of light by the photovoltaic cell. Summary of the Invention

[0005] This disclosure provides a back-contact battery and its manufacturing method and apparatus, a tandem battery, and a photovoltaic module, which at least helps to improve the absorption and utilization rate of light by the back-contact battery.

[0006] This disclosure provides a back contact battery, comprising: a substrate, one surface of which includes a first region and a second region alternately arranged along a first direction, and a third region located between the first region and the second region; a first passivated contact structure located in the first region; a first electrode located on the side of the first passivated contact structure away from the substrate; a second passivated contact structure located in the second region; a second electrode located on the side of the second passivated contact structure away from the substrate; an insulating structure located in the third region and within a first isolation groove formed by the first passivated contact structure and the second passivated contact structure; and a reflective structure located on the side of the insulating structure away from the substrate and within a second isolation groove formed by the first electrode and the second electrode, wherein the first electrode, the second electrode, and the reflective structure comprise the same conductive material.

[0007] Optionally, the insulating structure is connected to the first passivated contact structure and the second passivated contact structure; the reflective structure has a third isolation groove between itself and the first electrode, and the reflective structure has a fourth isolation groove between itself and the second electrode.

[0008] Optionally, the back contact battery further includes: an isolation portion that fills the third isolation groove and the fourth isolation groove.

[0009] Optionally, at least one of the first electrode, the second electrode, and the reflective structure has rounded corners.

[0010] Optionally, the first passivation contact structure includes: a first passivation contact portion located in the first region; and a first conductive adhesive located between the first passivation contact portion and the first electrode; the second passivation contact structure includes: a second passivation contact portion located in the second region; and a second conductive adhesive located between the second passivation contact portion and the second electrode.

[0011] Optionally, the first passivated contact structure includes: a first passivated contact portion located in the first region; a first dielectric portion located on the side of the first passivated contact portion away from the first region; and a first conductive adhesive located between the first dielectric portion and the first electrode, wherein the first electrode is embedded in the first dielectric portion and connected to the first passivated contact portion; the second passivated contact structure includes: a second passivated contact portion located in the second region; a second dielectric portion located on the side of the second passivated contact portion away from the second region; and a second conductive adhesive located between the second dielectric portion and the second electrode, wherein the second electrode is embedded in the second dielectric portion and connected to the second passivated contact portion.

[0012] Optionally, along the second direction, the thickness of one of the first passivated contact portion and the second passivated contact portion is less than the thickness of the other, the thickness of the first passivated contact structure is equal to the thickness of the second passivated contact structure, and the thickness of the insulating structure is equal to the thickness of the first passivated contact structure; the second direction is the thickness direction of the substrate.

[0013] Optionally, along the second direction, the thickness of one of the first passivation contact structure and the second passivation contact structure is less than the thickness of the other, the top surface of the insulating structure away from the substrate is inclined relative to the first direction, one side of the top surface of the insulating structure away from the substrate is connected to the top surface of the first passivation contact structure away from the substrate, and the other side of the top surface of the insulating structure away from the substrate is connected to the top surface of the second passivation contact structure away from the substrate; the second direction is the thickness direction of the substrate.

[0014] Optionally, the electrode is either the first electrode or the second electrode, and the passivation contact structure is either the first passivation contact structure or the second passivation contact structure; along the first direction, there is a gap between the side surface of the electrode and the side surface of the passivation contact structure.

[0015] Optionally, along the first direction, the width of the second isolation groove is greater than the width of the first isolation groove.

[0016] Optionally, the electrode is either the first electrode or the second electrode, and the passivation contact structure is either the first passivation contact structure or the second passivation contact structure; along the first direction, the ratio of the width of the electrode to the width of the passivation contact structure is greater than or equal to 1 / 9 and less than 1.

[0017] This disclosure also provides a method for manufacturing a back contact battery, comprising: providing a substrate, one surface of which includes a first region and a second region alternately arranged along a first direction, and a third region located between the first region and the second region; forming a first passivated contact structure and a second passivated contact structure, the first passivated contact structure being located in the first region and the second passivated contact structure being located in the second region; forming an insulating structure, the insulating structure being located in the third region and within a first isolation groove formed by the first passivated contact structure and the second passivated contact structure; forming a first electrode, a second electrode, and a reflective structure, the first electrode being located on the side of the first passivated contact structure away from the substrate, the second electrode being located on the side of the second passivated contact structure away from the substrate, and the reflective structure being located on the side of the insulating structure away from the substrate and within a second isolation groove formed by the first electrode and the second electrode.

[0018] Optionally, the step of forming the first electrode, the second electrode, and the reflective structure includes: covering a conductive film on the surface formed by the first passivation contact structure, the second passivation contact structure, and the insulating structure; using a first laser to cut the conductive film located at the junction of the first region and the third region, and to cut the conductive film located at the junction of the second region and the third region, wherein the remaining conductive film located in the first region is the first electrode, the remaining conductive film located in the second region is the second electrode, and the remaining conductive film located in the third region is the reflective structure.

[0019] Optionally, after cutting with the first laser, a second laser is used to round the corners of at least one of the first electrode, the second electrode, and the reflective structure, so that the corners of at least one of the first electrode, the second electrode, and the reflective structure are rounded corners; wherein, the energy density of the first laser is higher than the energy density of the second laser; and / or, the pulse overlap rate of the first laser is lower than the pulse overlap rate of the second laser.

[0020] This disclosure also provides a manufacturing apparatus for a back contact battery, used to form a back contact battery as described in any of the preceding claims, or for implementing a manufacturing method for a back contact battery as described in any of the preceding claims, comprising: a conveying module for providing a substrate, one surface of the substrate including a first region and a second region alternately arranged along a first direction, and a third region located between the first region and the second region; a passivation manufacturing module for forming a first passivation contact structure and a second passivation contact structure, the first passivation contact structure being located in the first region and the second passivation contact structure being located in the second region; an insulation manufacturing module for forming an insulation structure, the insulation structure being located in the third region and within a first isolation groove formed by the first passivation contact structure and the second passivation contact structure; and an electrode manufacturing module for forming a first electrode, a second electrode, and a reflective structure, the first electrode being located on the side of the first passivation contact structure away from the substrate, the second electrode being located on the side of the second passivation contact structure away from the substrate, and the reflective structure being located on the side of the insulation structure away from the substrate and within a second isolation groove formed by the first electrode and the second electrode.

[0021] This disclosure also provides a stacked battery, comprising: a bottom battery, which is a back contact battery as described in any of the preceding claims, or a back contact battery formed by a manufacturing method of a back contact battery as described in any of the preceding claims, or a back contact battery formed by a manufacturing method of a back contact battery as described in any of the preceding claims; and a perovskite battery located on one side of the bottom battery.

[0022] This disclosure also provides a photovoltaic module, comprising: a battery string, formed by connecting a plurality of back-contact batteries as described in any of the preceding claims, or formed by connecting a plurality of back-contact batteries formed by a manufacturing method of a back-contact battery as described in any of the preceding claims, or formed by connecting a plurality of back-contact batteries formed by a manufacturing apparatus of a back-contact battery as described in any of the preceding claims, or formed by connecting a plurality of stacked batteries as described in the preceding claims; an encapsulating film for covering the surface of the battery string; and a cover plate for covering the surface of the encapsulating film facing away from the battery string.

[0023] The technical solution provided in this disclosure has at least the following advantages: Optically, the reflective structure acts as a light reflector on the back side of the back contact battery, effectively reflecting unused light transmitted through the substrate back into the substrate, thereby improving the light absorption and utilization rate of the back contact battery. Furthermore, on one hand, the insulating structure helps ensure that there is no short circuit between the first and second passivated contact structures, and when the back contact battery is generating power, the insulating structure can reduce electrical crosstalk between the first and second passivated contact structures. On the other hand, the insulating structure helps reduce the height difference between the first and second passivated contact structures and the substrate located in the third region by filling the first isolation groove, thereby reducing the height difference between the first and second electrodes and the reflective structure, thus improving the flatness of the back side of the back contact battery and enhancing its structural stability. Moreover, the insulating structure has high light transmittance, allowing more light to be reflected by the reflective structure and ultimately absorbed and utilized by the substrate located in the third region, further improving the light absorption and utilization rate of the back contact battery. The insulating structure also provides support for the reflective structure. Attached Figure Description

[0024] One or more embodiments are illustrated by way of example with corresponding pictures in the accompanying drawings. These illustrations do not constitute a limitation on the embodiments. Unless otherwise stated, the pictures in the accompanying drawings do not constitute a limitation on scale. In order to more clearly illustrate the technical solutions in the embodiments of this disclosure or the conventional technology, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this disclosure. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0025] Figure 1 This is a schematic diagram of a first partial cross-sectional structure of a back contact battery provided in an embodiment of the present disclosure. Figure 2 This is a schematic diagram of a second partial cross-sectional structure of a back contact battery provided in an embodiment of the present disclosure. Figure 3 This is a schematic diagram of a third partial cross-sectional structure of a back contact battery provided in an embodiment of the present disclosure. Figure 4 This is a schematic diagram of a fourth partial cross-sectional structure of a back contact battery provided in an embodiment of the present disclosure. Figure 5 This is a schematic diagram of a fifth partial cross-sectional structure of a back contact battery provided in an embodiment of the present disclosure; Figure 6 This is a schematic diagram of a sixth partial cross-sectional structure of a back contact battery provided in an embodiment of the present disclosure; Figure 7This is a schematic diagram of a seventh partial cross-sectional structure of a back contact battery provided in an embodiment of the present disclosure. Figure 8 This is a schematic diagram of an eighth partial cross-sectional structure of a back contact battery provided in an embodiment of the present disclosure; Figure 9 A schematic diagram of a ninth partial cross-sectional structure of a back contact battery provided in an embodiment of this disclosure; Figure 10 This is a schematic diagram of a tenth partial cross-sectional structure of a back contact battery provided in an embodiment of the present disclosure. Figure 11 A process flow diagram of a method for manufacturing a back contact battery according to another embodiment of this disclosure; Figure 12 A partial cross-sectional view of a back contact battery manufacturing method provided in another embodiment of this disclosure after forming a first passivated contact structure and a second passivated contact structure; Figure 13 A partial cross-sectional view of the structure after forming an insulating structure in a method for manufacturing a back contact battery according to another embodiment of this disclosure; Figure 14 A partial cross-sectional view of the structure after forming a conductive film in a method for manufacturing a back contact battery according to another embodiment of this disclosure; Figure 15 A partial cross-sectional view of the back contact battery manufacturing method provided in another embodiment of this disclosure after cutting with a first laser; Figure 16 A schematic diagram of a functional module of an apparatus for implementing a method for manufacturing a back contact battery, provided in yet another embodiment of this disclosure; Figure 17 A partial cross-sectional schematic diagram of a stacked battery provided in yet another embodiment of the present disclosure; Figure 18 A partial three-dimensional schematic diagram of a cell string in a photovoltaic module provided in another embodiment of the present disclosure; Figure 19 This is a partial cross-sectional schematic diagram of a photovoltaic module provided in another embodiment of the present disclosure.

[0026] Explanation of reference numerals in the attached figures: 100, Substrate; 10, Surface; 110, First Region; 120, Second Region; 130, Third Region; 12, Passivated Contact Structure; 101, First Passivated Contact Structure; 111, First Passivated Contact Part; 1111, First Passivation Layer; 1112, First Doped Conductive Part; 1113, First Transparent Conductive Layer; 121, First Conductive Adhesive; 131, First Dielectric Part; 102, Second Passivated Contact Structure; 112, Second Passivated Contact Part; 1121, Second Passivation Layer; 1122, Second Doped Conductive Part; 1123, Second Transparent Conductive Layer; 122, Second Conductive Adhesive; 1 32. Second dielectric section; 103. Electrode; 113. First electrode; 123. Second electrode; 104. Insulating structure; 105. First isolation groove; 115. Second isolation groove; 125. Third isolation groove; 135. Fourth isolation groove; 106. Reflective structure; 107. Isolation section; 108. Conveying module; 118. Passivation manufacturing module; 128. Insulation manufacturing module; 138. Electrode manufacturing module; 36. Conductive film; 361. Protrusion; 119. Bottom cell; 129. Perovskite cell; 40. Back contact cell; 41. Encapsulating film; 42. Cover plate; 43. Solder strip. Detailed Implementation

[0027] As can be seen from the background technology, further research is needed on the absorption and utilization of light by photovoltaic cells.

[0028] This disclosure provides a back-contact battery and its manufacturing method and apparatus, a tandem battery, and a photovoltaic module. In the back-contact battery, the reflective structure optically serves as a light reflector on the back side of the battery, which helps to reflect unused light transmitted through the substrate back into the substrate, thereby improving the light absorption and utilization rate of the back-contact battery. Furthermore, on one hand, the insulating structure helps to further ensure that there is no short circuit between the first passivated contact structure and the second passivated contact structure, and when the back-contact battery is generating electricity, the insulating structure can reduce electrical crosstalk between the first and second passivated contact structures. On the other hand, the insulating structure helps to fill the first isolation groove, reducing the height difference between the first passivated contact structure, the second passivated contact structure, and the substrate located in the third region, thereby reducing the height difference between the first electrode, the second electrode, and the reflective structure, thus improving the flatness of the back side of the back-contact battery and enhancing its structural stability. Moreover, the insulating structure has high light transmittance, allowing more light to be reflected by the reflective structure and ultimately absorbed and utilized by the substrate located in the third region, further improving the light absorption and utilization rate of the back-contact battery. The insulating structure also provides support for the reflective structure.

[0029] In the description of the embodiments of this disclosure, technical terms such as "first" and "second" are used only to distinguish different objects and should not be construed as indicating or implying relative importance or implicitly specifying the number, specific order, or primary or secondary relationship of the indicated technical features. In the description of the embodiments of this disclosure, "multiple" means two or more (including two), unless otherwise explicitly defined. Similarly, "multiple sets" refers to two or more sets (including two sets), and "multiple pieces" refers to two or more pieces (including two pieces).

[0030] In this document, the term "embodiment" means that a particular feature, structure, or characteristic described in connection with an embodiment may be included in at least one embodiment of this disclosure. The appearance of this phrase in various places throughout the specification does not necessarily refer to the same embodiment, nor is it a separate or alternative embodiment mutually exclusive with other embodiments. It will be explicitly and implicitly understood by those skilled in the art that the embodiments described herein can be combined with other embodiments.

[0031] In the description of the embodiments of this disclosure, the term "and / or" is merely a description of the relationship between related objects, indicating that three relationships can exist. For example, A and / or B can represent three cases: A exists, A and B exist simultaneously, and B exists. Additionally, the character " / " in this document generally indicates that the preceding and following related objects have an "or" relationship.

[0032] In the description of the embodiments of this disclosure, the technical terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," and "circumferential," etc., indicating orientation or positional relationships, are based on the orientation or positional relationships shown in the accompanying drawings and are only for the convenience of describing the embodiments of this disclosure and simplifying the description. They do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on the embodiments of this disclosure. For example, if the device or element in the illustration is inverted, then the element described as "below," "under," "below," or "bottom" of other elements or features will be oriented "above" or "top" of said other elements or features. Therefore, the term "below" may, depending on the context in which the term is used, encompass both above and below orientations, which will be obvious to those skilled in the art. Materials may be oriented in other ways (e.g., rotated 90 degrees, inverted, flipped), and the spatial relative descriptive terms used herein may be interpreted accordingly.

[0033] In the description of the embodiments of this disclosure, unless otherwise expressly specified and limited, technical terms such as "installation," "connection," "joining," and "fixing" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in the embodiments of this disclosure according to the specific circumstances.

[0034] In the description of the embodiments disclosed herein, electrical connection between one component and another means that both components are made of conductive materials, and the two components are in direct contact and connected or connected via other conductive materials, so that current flows between the two components when the device is generating electricity. Electrical contact between one component and another means that the two components are not only in contact, but also that current flows between them when the device is generating electricity because both components are made of conductive materials.

[0035] In the description of embodiments of this disclosure, the terms "about," "approximately," "roughly," or "about" for a numerical value referring to a specific parameter include the numerical value, and those skilled in the art will understand that the deviation from the numerical value is within acceptable tolerances of the specific parameter. For example, "about" or "about" for a numerical value may include additional numerical values ​​that are in the range of 90.0% to 110.0% of the numerical value, such as in the range of 95.0% to 105.0%, 97.5% to 102.5%, 99.0% to 101.0%, 99.5% to 100.5%, or 99.9% to 100.1%.

[0036] In the accompanying drawings corresponding to the embodiments of this disclosure, the thickness and / or area of ​​layers, films, panels, regions, etc., are enlarged for better understanding and ease of description. Throughout the specification, the same reference numerals denote the same elements. Furthermore, when describing a component as being "generally" formed on another component, it means that the component is not formed on the entire surface (or front surface) of the other component, nor on a portion of the edge of the entire surface.

[0037] In the description of embodiments of this disclosure, when a component "includes" another component, other components are not excluded unless otherwise stated, and may be further included. When a component (such as a layer, film, region, or substrate) is described as being on or on the surface of another component, the component may be "directly" located on the surface of the other component, or there may be an intermediate component between the two components. Conversely, when a component is described as being on the surface of another component, or a component is "directly" on another component, or another component is formed or disposed on the surface of a component, it indicates that there is no intermediate component between the two components. For simplicity and clarity, various components may be drawn at any scale. In the drawings, some components may be omitted for simplicity.

[0038] The terminology used in the description of the various embodiments herein is for the purpose of describing particular embodiments only and is not intended to be limiting. As used in the description of the various embodiments and the appended claims, the term "the component" is also intended to include the plural form unless the context clearly indicates otherwise.

[0039] The “components” mentioned above can refer to layers, films, regions, parts, structures, etc.

[0040] The embodiments of this disclosure will now be described in detail with reference to the accompanying drawings. However, those skilled in the art will understand that many technical details have been provided in the embodiments of this disclosure to facilitate a better understanding of the embodiments. However, the technical solutions claimed in the embodiments of this disclosure can be implemented even without these technical details and various variations and modifications based on the following embodiments.

[0041] This disclosure provides an embodiment of a back contact battery, which will be described in detail below with reference to the accompanying drawings.

[0042] Reference Figure 1 and Figure 2The back contact battery includes: a substrate 100, a surface 10 of the substrate 100 including a first region 110 and a second region 120 arranged alternately along a first direction X, and a third region 130 located between the first region 110 and the second region 120; a first passivation contact structure 101 located in the first region 110; a first electrode 113 located on the side of the first passivation contact structure 101 away from the substrate 100; a second passivation contact structure 102 located in the second region 120; a second electrode 123 located on the side of the second passivation contact structure 102 away from the substrate 100; an insulating structure 104 located in the third region 130 and in a first isolation groove 105 formed by the first passivation contact structure 101 and the second passivation contact structure 102; and a reflective structure 106 located on the side of the insulating structure 104 away from the substrate 100 and in a second isolation groove 115 formed by the first electrode 113 and the second electrode 123.

[0043] in, Figure 1 This is a schematic diagram of a first partial cross-sectional structure of a back contact battery provided in an embodiment of the present disclosure. Figure 2 This is a partial cross-sectional view of a second type of back-contact battery provided in an embodiment of the present disclosure. It should be noted that the first isolation groove 105 and the second isolation groove 115 are shown in the diagram for clarity. Figure 2 The first isolation groove 105 and the second isolation groove 115 are roughly divided by dashed lines, and Figure 2 Can be regarded as Figure 1 The back contact battery does not have an insulating or reflective structure.

[0044] It is worth noting that, in the back contact battery, in order to avoid the risk of short circuit between the first passivation contact structure 101 and the second passivation contact structure 102, the substrate 100 surface 10 has, in addition to the first region 110 for supporting the first passivation contact structure 101 and the second region 120 for supporting the second passivation contact structure 102, an additional third region 130 located between the first region 110 and the second region 120, and the third region 130 has a first isolation groove 105 formed by the first passivation contact structure 101 and the second passivation contact structure 102.

[0045] Based on this, an insulating structure 104 is designed in the first isolation groove 105, and a reflective structure 106 is designed on the insulating structure 104. The reflective structure 106 can be used as a light reflector on the back side of the back contact battery, which is beneficial to reflect the light that has been transmitted out of the substrate 100 but not utilized back into the substrate 100, thereby improving the absorption and utilization rate of light by the back contact battery, and thus improving the short-circuit current and photoelectric conversion efficiency of the back contact battery. Furthermore, on the one hand, the insulating structure 104 helps to further ensure that there is no short circuit between the first passivation contact structure 101 and the second passivation contact structure 102, and when the back contact battery is in the power generation state, the insulating structure 104 can reduce the electrical crosstalk between the first passivation contact structure 101 and the second passivation contact structure 102. On the other hand, the insulating structure 104 helps to fill the first isolation groove 105, reduce the height difference between the first passivation contact structure 101, the second passivation contact structure 102 and the substrate 100 located in the third region 130, thereby reducing the height difference between the first electrode 113, the second electrode 123 and the reflective structure 106 located on the first passivation contact structure 101, the second passivation contact structure 102 and the insulating structure 104, respectively, thereby improving the flatness of the back side of the back contact battery, avoiding microcracks or cracks caused by excessive protrusion or depression in some areas, thereby improving the structural stability of the back contact battery.

[0046] It is worth noting that, compared with the first passivation contact structure 101 and the second passivation contact structure 102, the insulating structure 104 generally has a higher light transmittance, so that more light can be reflected by the reflective structure 106 and finally absorbed and utilized by the substrate 100 located in the third region 130, thereby further improving the light absorption and utilization rate of the back contact battery. Moreover, the insulating structure 104 plays a supporting role for the reflective structure 106.

[0047] The following will describe in more detail an embodiment of the back contact battery provided in this disclosure with reference to the accompanying drawings.

[0048] In some embodiments, reference Figure 1 The insulating structure 104 is connected to the first passivated contact structure 101 and the second passivated contact structure 102; the reflective structure 106 has a third isolation groove 125 between itself and the first electrode 113, and a fourth isolation groove 135 between itself and the second electrode 123. Thus, the third isolation groove 125 and the fourth isolation groove 135 can prevent short circuits caused by the connection between the first electrode 113 and the second electrode 123.

[0049] In some cases, the insulating structure 104 can contact the first passivated contact structure 101 and the second passivated contact structure 102 on opposite sides along the first direction X, respectively.

[0050] In some cases, refer to Figure 3 and Figure 2 , Figure 3 This is a schematic diagram of a third partial cross-sectional structure of a back contact battery according to an embodiment of the present disclosure. The back contact battery may further include: an isolation portion 107, filled with a third isolation groove 125 and a fourth isolation groove 135. Thus, an isolation portion 107 separates the first electrode 113 from the reflective structure 106, and also separates the second electrode 123 from the reflective structure 106. Regardless of whether the reflective structure 106 is a conductive or insulating material, the isolation portion 107 can separate the first electrode 113, the reflective structure 106, and the second electrode 123, effectively preventing short circuits between the first electrode 113 and the second electrode 123. Furthermore, the isolation portion 107 has a high reflectivity, which facilitates the reflection of light penetrating to the third isolation groove 125 and the fourth isolation groove 135 back into the substrate 100, thereby further improving the light absorption and utilization rate of the back contact battery.

[0051] In some examples, the material of the isolation portion 107 can be an insulating encapsulating film or an insulating paste.

[0052] In some examples, the reflectivity of the isolation section 107 can be greater than 90%.

[0053] In some cases, along the first direction X, the width of the third isolation groove 125 and the width of the fourth isolation groove 135 can be 20μm to 200μm, for example, 20μm to 50μm, 50μm to 100μm, 100μm to 150μm, or 150μm to 200μm. Optionally, the width of the third isolation groove 125 and the width of the fourth isolation groove 135 can be 20μm, 30μm, 40μm, 50μm, 60μm, 70μm, 80μm, 90μm, 100μm, 110μm, 120μm, 130μm, 140μm, 150μm, 160μm, 170μm, 180μm, 190μm, or 200μm, etc.

[0054] In some embodiments, reference Figure 1 At least one of the first electrode 113, the second electrode 123, and the reflective structure 106 has a rounded corner. In other words, the top surface of at least one of the first electrode 113, the second electrode 123, and the reflective structure 106 away from the substrate 100 and the opposite side surface along the first direction are connected by a curved surface. This helps to avoid the edges of the first electrode 113, the second electrode 123, and / or the reflective structure 106 being too sharp, improves the structural stability of the back contact cell, and also facilitates the fabrication process of the photovoltaic module end when the back contact cell is fabricated into a photovoltaic module, and improves the yield of the photovoltaic module.

[0055] The internal structure of the first passivated contact structure 101 and the second passivated contact structure 102 will be described in detail below through two embodiments.

[0056] In some embodiments, reference Figure 4 or Figure 5 The first passivated contact structure 101 may include: a first passivated contact portion 111 located in the first region 110; and a first conductive adhesive 121 located between the first passivated contact portion 111 and the first electrode 113.

[0057] The second passivated contact structure 102 may include: a second passivated contact portion 112 located in the second region 120; and a second conductive adhesive 122 located between the second passivated contact portion 112 and the second electrode 123.

[0058] Thus, without sintering, the first electrode 113 can be bonded to the first passivated contact portion 111 using the first conductive adhesive 121. The first electrode 113 and the first conductive adhesive 121 work together to collect the charge carriers collected in the first passivated contact portion 111. Without sintering, the second electrode 123 can be bonded to the second passivated contact portion 112 using the second conductive adhesive 122. The second electrode 123 and the second conductive adhesive 122 work together to collect the charge carriers collected in the second passivated contact portion 112.

[0059] In some cases, one of the two opposite sides of the insulating structure 104 along the first direction X is in contact with both the first passivation contact 111 and the first conductive adhesive 121, and the other of the two opposite sides of the insulating structure 104 along the first direction X is in contact with both the second passivation contact 112 and the second conductive adhesive 122.

[0060] In other embodiments, reference is made to Figure 6 The first passivation contact structure 101 may include: a first passivation contact portion 111 located in the first region 110; a first dielectric portion 131 located on the side of the first passivation contact portion 111 away from the first region 110; and a first conductive adhesive 121 located between the first dielectric portion 131 and the first electrode 113, wherein the first electrode 113 is embedded in the first dielectric portion 131 and connected to the first passivation contact portion 111.

[0061] The second passivated contact structure 102 may include: a second passivated contact portion 112 located in the second region 120; a second dielectric portion 132 located on the side of the second passivated contact portion 112 away from the second region 120; and a second conductive adhesive 122 located between the second dielectric portion 132 and the second electrode 123, wherein the second electrode 123 is embedded in the second dielectric portion 132 and connected to the second passivated contact portion 112.

[0062] In this way, the first electrode 113 can be first bonded to the first passivated contact portion 111 using the first conductive adhesive 121, and the second electrode 123 can be first bonded to the second passivated contact portion 112 using the second conductive adhesive 122, so as to achieve the positioning of the first electrode 113 and the second electrode 123. The first region 110 can be passivated and protected using the first dielectric portion 131, and the second region 120 can be passivated and protected using the second dielectric portion 132.

[0063] It is worth noting that the first conductive adhesive 121 and the second conductive adhesive 122 are typically manufactured using a screen printing process, while the first passivated contact portion 111 and the first dielectric portion 131 are manufactured using a combination of deposition and etching processes. Based on this, the first dielectric portion 131 can serve as a transition layer between the first passivated contact portion 111 and the first conductive adhesive 121, preventing damage to the first passivated contact portion 111 during the manufacturing process of the first conductive adhesive 121, thus avoiding a reduction in the passivation effect of the first passivated contact portion 111 on the first region 110. Furthermore, the first dielectric portion 131 can also provide a passivation effect on the first region 110. Similarly, the second dielectric portion 132 can serve as a transition layer between the second passivated contact portion 112 and the second conductive adhesive 122, preventing damage to the second passivated contact portion 112 during the manufacturing process of the second conductive adhesive 122, thus avoiding a reduction in the passivation effect of the second passivated contact portion 112 on the second region 120. Furthermore, the second dielectric portion 132 can also provide a passivation effect on the second region 120.

[0064] Furthermore, to achieve the connection between the first electrode 113 and the first passivation contact 111, and the connection between the second electrode 123 and the second passivation contact 112, the first electrode 113 and the second electrode 123 can be laser-processed to cause the first electrode 113 to be embedded in the first dielectric portion 131 and connected to the first passivation contact 111, and to cause the second electrode 123 to be embedded in the second dielectric portion 132 and connected to the second passivation contact 112. Based on this, when the first electrode 113 and the second electrode 123 are aluminum foils, a partial film layer between the first electrode 113 and the first passivation contact 111 can be formed into an aluminum-silicon alloy, and a partial film layer between the second electrode 123 and the second passivation contact 112 can be formed into an aluminum-silicon alloy.

[0065] In some cases, the material of the first dielectric portion 131 and the material of the second dielectric portion 132 may include at least one of aluminum oxide, silicon nitride, silicon oxynitride, or silicon oxide.

[0066] In some cases, one of the two opposite sides of the insulating structure 104 along the first direction X is in contact with the first passivation contact 111, the first dielectric part 131 and the first conductive adhesive 121, and the other of the two opposite sides of the insulating structure 104 along the first direction X is in contact with the second passivation contact 112, the second dielectric part 132 and the second conductive adhesive 122.

[0067] The following describes in detail the thickness relationship among the first passivated contact structure 101, the second passivated contact structure 102, and the insulating structure 104 through two scenarios. It should be noted that the following scenarios apply to the back contact batteries provided in the two embodiments described above.

[0068] In some cases, refer to Figure 4 , Figure 4 This is a schematic diagram of a fourth partial cross-sectional structure of a back contact battery provided in an embodiment of the present disclosure. Along the second direction Y, the thickness of one of the first passivated contact portion 111 and the second passivated contact portion 112 is less than the thickness of the other. The thickness of the first passivated contact structure 101 is equal to the thickness of the second passivated contact structure 102, and the thickness of the insulating structure 104 is equal to the thickness of the first passivated contact structure 101. The second direction Y is the thickness direction of the substrate 100.

[0069] It should be noted that, since at least a portion of the film layers in the first passivation contact 111 and the second passivation contact 112 need to be doped with different types of doping elements, and / or, the difference in surface morphology between the first region 110 and the second region 120, it is easy for the thickness of the first passivation contact 111 to be different from the thickness of the second passivation contact 112. Based on this, the thickness of the first conductive adhesive 121 and the thickness of the second conductive adhesive 122 can be designed to be different to compensate for the thickness difference between the first passivation contact 111 and the second passivation contact 112, thereby ensuring that the thickness of the first passivation contact structure 101 is equal to the thickness of the second passivation contact structure 102. In this way, the opening of the first isolation groove 105 formed by the first passivation contact structure 101 and the second passivation contact structure 102 is flat, which is conducive to designing an insulating structure 104 with a flat top surface in the first isolation groove 105, so as to design the first electrode 113, the second electrode 123 and the reflective structure 106 that are roughly in the same layer.

[0070] In some examples, continue to refer to Figure 4Along the second direction Y, the thickness of the first passivated contact portion 111 can be greater than the thickness of the second passivated contact portion 112, and the thickness of the first conductive adhesive 121 can be less than the thickness of the second conductive adhesive 122, such that the top surface of the first passivated contact structure 101 away from the first region 110 is flush with or approximately flush with the top surface of the second passivated contact structure 102 away from the second region 120. Approximately flush means that, along the second direction Y, the height difference between the top surface of the first passivated contact structure 101 away from the first region 110 and the top surface of the second passivated contact structure 102 away from the second region 120 is less than 1 μm. Optionally, the height difference between the top surface of the first passivated contact structure 101 away from the first region 110 and the top surface of the second passivated contact structure 102 away from the second region 120 is less than 0.5 μm.

[0071] Furthermore, the top surface of the insulating structure 104 away from the third region 130 is flush or nearly flush with the top surface of the first passivated contact structure 101 away from the first region 110.

[0072] In other examples, along the second direction, the thickness of the first passivated contact portion can be less than the thickness of the second passivated contact portion, and the thickness of the first conductive adhesive can be greater than the thickness of the second conductive adhesive, such that the top surface of the first passivated contact structure away from the first region is flush or approximately flush with the top surface of the second passivated contact structure away from the second region.

[0073] In some examples, at least a portion of the film layer in the first passivation contact 111 may be doped with a P-type dopant, and at least a portion of the film layer in the second passivation contact 112 may be doped with an N-type dopant. The substrate 100 may be doped with either an N-type or a P-type dopant. The specific structures of the first passivation contact 111 and the second passivation contact 112 will be described in detail later.

[0074] In other cases, refer to Figure 5 or Figure 6 Along the second direction Y, the thickness of one of the first passivation contact structure 101 and the second passivation contact structure 102 can be less than the thickness of the other. The top surface of the insulating structure 104 away from the substrate 100 is inclined relative to the first direction X. One side of the top surface of the insulating structure 104 away from the substrate 100 is connected to the top surface of the first passivation contact structure 101 away from the substrate 100, and the other side of the top surface of the insulating structure 104 away from the substrate 100 is connected to the top surface of the second passivation contact structure 102 away from the substrate 100. The second direction Y is the thickness direction of the substrate 100.

[0075] in, Figure 5 This is a schematic diagram of a fifth partial cross-sectional structure of a back contact battery provided in an embodiment of the present disclosure; Figure 6 This is a schematic diagram of a sixth partial cross-sectional structure of a back contact battery provided in an embodiment of this disclosure.

[0076] Thus, the first isolation groove 105 formed by the first passivated contact structure 101 and the second passivated contact structure 102 (see reference) Figure 2 The slot is tilted to facilitate the design of the top-tiled insulating structure 104 as a transition structure between the first passivation contact structure 101 and the second passivation contact structure 102, avoiding areas with abrupt thickness changes on the back side of the back contact battery, thereby improving the structural stability of the back contact battery. In addition, the top-tiled insulating structure 104 can also provide strong support for the reflective structure 106.

[0077] In some examples, continue to refer to Figure 5 or Figure 6 Along the second direction Y, the thickness of the first passivated contact portion 111 can be greater than the thickness of the second passivated contact portion 112, and the thickness of the first conductive adhesive 121 can be equal to the thickness of the second conductive adhesive 122, such that the thickness of the first passivated contact structure 101 is greater than the thickness of the second passivated contact structure 102. In other examples, along the second direction, the thickness of the first passivated contact portion can be less than the thickness of the second passivated contact portion, and the thickness of the first conductive adhesive can be equal to the thickness of the second conductive adhesive, such that the thickness of the first passivated contact structure is less than the thickness of the second passivated contact structure.

[0078] In some examples, refer to Figure 6 Along the second direction Y, the thickness of the first dielectric portion 131 can be equal to the thickness of the second dielectric portion 132.

[0079] In the various embodiments described above, reference is made to Figure 7 , Figure 8 , Figure 9 or Figure 10 The first passivation contact 111 may include at least: a first passivation layer 1111, at least located in the first region 110; and a first doped conductive portion 1112, located on the side of the first passivation layer 1111 away from the substrate 100. The second passivation contact 112 may include at least: a second passivation layer 1121, at least located in the second region 120; and a second doped conductive portion 1122, located on the side of the second passivation layer 1121 away from the substrate 100.

[0080] In some cases, refer to Figure 7 , Figure 7 This is a schematic diagram of a seventh partial cross-sectional structure of a back contact battery provided in an embodiment of the present disclosure. The first conductive adhesive 121 can be in contact with the first doped conductive part 1112, the second conductive adhesive 122 can be in contact with the second doped conductive part 1122, the first electrode 113 is bonded to the first conductive adhesive 121, and the second electrode 123 is bonded to the second conductive adhesive 122.

[0081] In other cases, refer to Figure 8 , Figure 8 This is a partial cross-sectional view of an eighth back contact battery according to an embodiment of the present disclosure. A first dielectric portion 131 is spaced between the first conductive adhesive 121 and the first doped conductive portion 1112, and a second dielectric portion 132 is spaced between the second conductive adhesive 122 and the second doped conductive portion 1122. Not only is the first electrode 113 bonded to the first conductive adhesive 121, but the second electrode 123 is also bonded to the second conductive adhesive 122. The first electrode 113 is embedded in the first conductive adhesive 121 and the first dielectric portion 131 and connected to the first doped conductive portion 1112, and the second electrode 123 is also embedded in the second conductive adhesive 122 and the second dielectric portion 132 and connected to the second doped conductive portion 1122.

[0082] In some other cases, refer to Figure 9 or Figure 10 The first passivation contact 111 may further include: a first transparent conductive layer 1113, located on the side of the first doped conductive portion 1112 away from the first passivation layer 1111; the second passivation contact 112 may further include: a second transparent conductive layer 1123, located on the side of the second doped conductive portion 1122 away from the second passivation layer 1121.

[0083] In some examples, reference Figure 9 , Figure 9 This is a ninth partial cross-sectional view of a back-contact battery according to an embodiment of the present disclosure. The first conductive adhesive 121 can be in contact with the first transparent conductive layer 1113, and the second conductive adhesive 122 can be in contact with the second transparent conductive layer 1123. Thus, the first transparent conductive layer 1113 enables electrical connection between the first doped conductive portion 1112 and the first conductive adhesive 121, and the second transparent conductive layer 1123 enables electrical connection between the second doped conductive portion 1122 and the second conductive adhesive 122. The first electrode 113 is bonded to the first conductive adhesive 121, and the second electrode 123 is bonded to the second conductive adhesive 122.

[0084] In other examples, refer to Figure 10 , Figure 10 This is a partial cross-sectional view of a back contact battery according to an embodiment of the present disclosure. A first dielectric portion 131 is spaced between the first conductive adhesive 121 and the first transparent conductive layer 1113, and a second dielectric portion 132 is spaced between the second conductive adhesive 122 and the second transparent conductive layer 1123. Not only is the first electrode 113 bonded to the first conductive adhesive 121, but the second electrode 123 is also bonded to the second conductive adhesive 122. Furthermore, the first electrode 113 is embedded in the first conductive adhesive 121 and the first dielectric portion 131 and connected to the first transparent conductive layer 1113, and the second electrode 123 is also embedded in the second conductive adhesive 122 and the second dielectric portion 132 and connected to the second transparent conductive layer 1123.

[0085] It is worth noting that the materials of the first transparent conductive layer 1113 and the second transparent conductive layer 1123 can be the same. For example, the materials of the first transparent conductive layer 1113 and / or the second transparent conductive layer 1123 may include at least one of indium oxide, tin-doped indium oxide, tungsten-doped indium oxide, titanium-doped indium oxide, cerium-doped indium oxide, molybdenum-doped indium oxide, hydrogen-doped indium oxide, zinc oxide, aluminum-doped zinc oxide, gallium-doped zinc oxide, indium-doped zinc oxide, tin oxide, or fluorine-doped tin oxide. However, the materials of the first transparent conductive layer 1113 and the first conductive adhesive 121 are different, and the materials of the second transparent conductive layer 1123 and the second conductive adhesive 122 are different. Furthermore, the first transparent conductive layer 1113 and the second transparent conductive layer 1123 are generally formed using processes such as sputtering, evaporation, or deposition.

[0086] It should be noted that the first electrode 113 being embedded in the first dielectric portion 131 means that a portion of the first electrode 113 is embedded in the first dielectric portion 131; the second electrode 123 being embedded in the second dielectric portion 132 means that a portion of the second electrode 123 is embedded in the second dielectric portion 132.

[0087] The following provides a detailed explanation of the different types of back-contact batteries.

[0088] In some examples, the materials of the first passivation layer 1111 and the second passivation layer 1121 may both include at least one of amorphous silicon, microcrystalline silicon, or nanocrystalline silicon. Thus, the back contact cell can be an HBC cell (Heterojunction Back Contact Cell).

[0089] In other examples, the materials of the first passivation layer 1111 and the second passivation layer 1121 may both include at least one of silicon oxide, aluminum oxide, silicon nitride, silicon oxynitride, titanium oxide, hafnium oxide, zirconium oxide, or silicon carbide. Thus, the back contact cell can be a TBC cell (TOPCon Back Contact Cell, tunnel oxide passivated back contact cell).

[0090] In some other examples, the material of one of the first passivation layer 1111 and the second passivation layer 1121 may include at least one of amorphous silicon, microcrystalline silicon, or nanocrystalline silicon, and the material of the other of the first passivation layer 1111 and the second passivation layer 1121 may include at least one of silicon oxide, aluminum oxide, silicon nitride, silicon oxynitride, titanium oxide, hafnium oxide, zirconium oxide, or silicon carbide. Thus, the back contact cell can be an HTBC cell (Heterojunction Tunnel Oxide Passivated BackContact Cell).

[0091] In some further examples, one of the first passivation layer 1111 and the second passivation layer 1121 may be made of at least one of silicon oxide, aluminum oxide, silicon nitride, silicon oxynitride, titanium oxide, hafnium oxide, zirconium oxide, or silicon carbide, and the other of the first passivation layer 1111 and the second passivation layer 1121 may be an emitter structure, which is the same as the emitter structure used in PERC (Passivated Emitter and Rear Cell) batteries. Thus, the back contact battery may be an HPBC (Hybrid Passivated Back Contact Cell) battery.

[0092] In the various examples described above, the materials of the first doped conductive portion 1112 and the second doped conductive portion 1122 may include silicon material layers in a single-crystal, polycrystalline, amorphous, or microcrystalline state (a state simultaneously possessing single-crystal and amorphous states is referred to as microcrystalline). Based on this, the crystalline state of the first doped conductive portion 1112 and the crystalline state of the second doped conductive portion 1122 may include at least one of microcrystalline, nanocrystalline, microcrystalline, or a mixture of nanocrystalline and microcrystalline states.

[0093] In some examples, one of the first doped conductive portion 1112 and the second doped conductive portion 1122 is doped with a P-type dopant element, and the other is doped with an N-type dopant element. The N-type dopant element can be at least one of group V elements such as phosphorus (P), bismuth (Bi), antimony (Sb), or arsenic (As); the P-type dopant element can be at least one of group III elements such as boron (B), aluminum (Al), gallium (Ga), or gallium (In).

[0094] In some embodiments, the substrate 100 may be an N-type semiconductor substrate doped with N-type dopants or a P-type semiconductor substrate doped with P-type dopants.

[0095] In some embodiments, the material of the substrate 100 may be an elemental semiconductor material. Specifically, the elemental semiconductor material is composed of a single element, such as silicon or germanium. The elemental semiconductor material may be monocrystalline, polycrystalline, amorphous, or microcrystalline; for example, silicon may be at least one of monocrystalline silicon, polycrystalline silicon, amorphous silicon, or microcrystalline silicon. In other embodiments, the material of the substrate 100 may also be a compound semiconductor material. Common compound semiconductor materials include, but are not limited to, silicon germanide, silicon carbide, gallium arsenide, indium gallium dihydrogen phosphate, perovskite, cadmium telluride, and copper indium selenide.

[0096] In some embodiments, reference Figure 1The first electrode 113, the second electrode 123, and the reflective structure 106 all use the same conductive material. This allows for the simultaneous formation of the first electrode 113, the second electrode 123, and the reflective structure 106 in the same step, simplifying the manufacturing process and reducing the material costs required to form them. Furthermore, compared to insulating materials, such as the insulating structure 104, conductive materials generally have higher reflectivity. This allows the reflective structure 106, with its higher reflectivity, to effectively reflect light energy transmitted from the substrate 100 located in the third region 130 back into the substrate 100, thereby improving the light absorption and utilization rate of the substrate 100.

[0097] It should be noted that, Figure 1 The diagram roughly illustrates two light propagation paths of light incident on the reflective structure 106 through the substrate 100 and reflected onto the surface 10. (Refer to...) Figure 1 Based on the different propagation angles of light transmitted from the substrate 100 located in the third region 130, after the light transmitted from the substrate 100 located in the third region 130 is reflected by the reflective structure 106, it may be reflected back to the third region 130, or it may be reflected to the first region 110 or the second region 120.

[0098] In some cases, the first electrode 113, the second electrode 123, and the reflective structure 106 can all be aluminum foil.

[0099] In some embodiments, reference Figure 1 Along the second direction Y, the thickness of the first electrode 113, the second electrode 123, and the reflective structure 106 can be 5μm to 30μm, for example, 5μm to 10μm, 10μm to 15μm, 15μm to 20μm, 20μm to 25μm, or 25μm to 30μm. Optionally, the thickness of the first electrode 113, the second electrode 123, and the reflective structure 106 can be 5μm, 6μm, 7μm, 8μm, 9μm, 10μm, 11μm, 12μm, 13μm, 14μm, 15μm, 16μm, 17μm, 18μm, 19μm, 20μm, 21μm, 22μm, 23μm, 24μm, 25μm, 26μm, 27μm, 28μm, 29μm, or 30μm, etc.

[0100] In some embodiments, reference Figure 1Electrode 103 can be either a first electrode 113 or a second electrode 123, and passivation contact structure 12 can be either a first passivation contact structure 101 or a second passivation contact structure 102. Along the first direction X, there is a gap between the side surface of electrode 103 and the side surface of passivation contact structure 12. This gap helps ensure that the first electrode 113 is located only in a portion of the first region 110, and the second electrode 123 is located only in a portion of the second region 120, thereby effectively preventing contact between electrode 103 and reflective structure 106.

[0101] In some cases, the distance between the side surface of the electrode 103 and the side surface of the passivation contact structure 12 along the first direction X can be 10μm to 100μm, for example, it can be 10μm to 20μm, 20μm to 30μm, 30μm to 40μm, 40μm to 50μm, 50μm to 60μm, 60μm to 70μm, 70μm to 80μm, 80μm to 90μm or 90μm to 100μm. Optionally, the spacing between the side surface of the electrode 103 and the side surface of the passivation contact structure 12 can be 10μm, 15μm, 20μm, 25μm, 30μm, 35μm, 40μm, 45μm, 50μm, 55μm, 60μm, 65μm, 70μm, 75μm, 80μm, 85μm, 90μm, 95μm or 100μm, etc.

[0102] It is worth noting that if the design spacing is 10μm~100μm, the charge carriers only need to be transported laterally for about 10μm~100μm in the passivated contact structure 12 before they can be collected by the electrode 103. This can significantly reduce the transport resistance encountered by the charge carriers in the electrode 103, thereby improving the collection efficiency of the back contact cell for charge carriers.

[0103] In some embodiments, reference Figure 1 Along the first direction X, the width of the second isolation groove 115 can be greater than the width of the first isolation groove 105. The first passivation contact structure 101 and the second passivation contact structure 102 form the first isolation groove 105, and the first electrode 113 and the second electrode 123 form the second isolation groove 115. Designing the width of the second isolation groove 115 to be greater than the width of the first isolation groove 105 also helps ensure that the first electrode 113 is only located in a portion of the first region 110, and the second electrode 123 is only located in a portion of the second region 120, thereby effectively preventing contact between the electrode 103 and the reflective structure 106.

[0104] In some cases, the width of the second isolation groove 115 along the first direction X can be 120μm to 350μm, for example, it can be 120μm to 150μm, 150μm to 200μm, 250μm to 300μm, or 300μm to 350μm. Optionally, the width of the second isolation groove 115 can be 120μm, 125μm, 130μm, 135μm, 140μm, 145μm, 150μm, 155μm, 160μm, 165μm, 170μm, 175μm, 180μm, 185μm, 190μm, 195μm, 200μm, 205μm, 210μm, 215μm, 220μm, or 225μm. 230μm, 235μm, 240μm, 245μm, 250μm, 255μm, 260μm, 265μm, 270μm, 275μm, 280μm, 285μm, 290 μm, 295μm, 300μm, 305μm, 310μm, 315μm, 320μm, 325μm, 330μm, 335μm, 340μm, 345μm or 350μm, etc.

[0105] In some cases, the width of the first isolation groove 105 along the first direction X can be 70μm to 300μm, for example, it can be 700μm to 100μm, 100μm to 150μm, 150μm to 200μm, or 250μm to 300μm. The optional width of the first isolation groove 105 can be 70μm, 75μm, 80μm, 85μm, 90μm, 95μm, 100μm, 105μm, 110μm, 115μm, 120μm, 125μm, 130μm, 135μm, 140μm, 145μm, 150μm, 155μm, 160μm, 165μm, 170μm, 175μm, or 180μm. m, 185μm, 190μm, 195μm, 200μm, 205μm, 210μm, 215μm, 220μm, 225μm, 230μm, 235μm, 240μm , 245μm, 250μm, 255μm, 260μm, 265μm, 270μm, 275μm, 280μm, 285μm, 290μm, 295μm or 300μm, etc.

[0106] It is worth noting that designing the width of the first isolation trench 105 to be 70μm~300μm is beneficial to reduce the electrical crosstalk between the first passivation contact structure 101 and the second passivation contact structure 102, while ensuring that the width of the first isolation trench 105 is reduced within the limited layout width of the surface 10, so as to increase the width of the first passivation contact structure 101 and the second passivation contact structure 102, thereby improving the carrier collection efficiency of the first passivation contact structure 101 and the second passivation contact structure 102.

[0107] In some embodiments, reference Figure 1 Electrode 103 can be either a first electrode 113 or a second electrode 123, and passivation contact structure 12 can be either a first passivation contact structure 101 or a second passivation contact structure 102. Along the first direction X, the ratio of the width of electrode 103 to the width of passivation contact structure 12 is greater than or equal to 1 / 9 and less than 1. This helps to reduce the difference in width between electrode 103 and passivation contact structure 12, shortening the lateral transport path length required for charge carriers to travel from passivation contact structure 12 to electrode 103, thereby reducing the transport resistance experienced by charge carriers.

[0108] It is worth noting that the width of electrodes prepared using paste is generally much narrower than that of passivation contact structures. This results in a longer lateral transport distance for charge carriers within the passivation contact structure, increasing the transport resistance experienced by the charge carriers. In practical applications, the width of electrodes prepared using paste is typically only 5μm to 25μm, while the width of passivation contact structures is 250μm to 500μm. Therefore, the ratio of the width of the paste-prepared electrode to the width of the passivation contact structure is much less than 1 / 9.

[0109] However, in the back contact battery provided in one embodiment of this disclosure, the electrode 103 may not be made of slurry. For example, both the electrode 103 and the reflective structure 106 can be aluminum foil. Therefore, the ratio of the width of the electrode 103 to the width of the passivation contact structure 12 can be designed to be greater than or equal to 1 / 9 and less than 1.

[0110] In some cases, along the first direction X, the ratio of the width of the electrode 103 to the width of the passivation contact structure 12 can be 1 / 9 to 0.2, 0.2 to 0.3, 0.3 to 0.4, 0.4 to 0.5, 0.5 to 0.6, 0.6 to 0.7, 0.7 to 0.8, 0.8 to 0.9, or greater than 0.9 and less than 1. Optionally, the ratio of the width of the electrode 103 to the width of the passivation contact structure 12 can be 1 / 9, 0.15, 0.2, 0.25, 0.3, 0.35, 0.4, 0.45, 0.5, 0.55, 0.6, 0.65, 0.7, 0.75, 0.8, 0.85, 0.9, or 0.95, etc.

[0111] In some cases, the width of electrode 103 along the first direction X can be 50μm to 430μm, for example, it can be 50μm to 100μm, 100μm to 150μm, 150μm to 200μm, 200μm to 250μm, 250μm to 300μm, 300μm to 350μm, 350μm to 400μm or 400μm to 430μm, etc. Optionally, the width of electrode 103 can be 50μm, 60μm, 70μm, 80μm, 90μm, 100μm, 110μm, 120μm, 130μm, 140μm, 150μm, 160μm, 170μm, 180μm, 190μm, 200μm, 210μm, 220μm, 230μm, 240μm, 250μm, 260μm, 270μm, 280μm, 290μm, 300μm, 310μm, 320μm, 330μm, 340μm, 350μm, 360μm, 370μm, 380μm, 390μm, 400μm, 410μm, 420μm, or 430μm, etc.

[0112] In some cases, the width of the passivation contact structure 12 along the first direction X can be 250μm to 450μm, for example, 250μm to 300μm, 300μm to 350μm, 350μm to 400μm, or 400μm to 450μm. Optionally, the width of the electrode 103 can be 250μm, 260μm, 270μm, 280μm, 290μm, 300μm, 310μm, 320μm, 330μm, 340μm, 350μm, 360μm, 370μm, 380μm, 390μm, 400μm, 410μm, 420μm, 430μm, 440μm, or 450μm.

[0113] In summary, the reflective structure 106 can optically serve as a light reflector on the back side of the back contact battery, which is beneficial for reflecting the light that has been transmitted out of the substrate 100 but not utilized back into the substrate 100, thereby improving the light absorption and utilization rate of the back contact battery. Furthermore, on the one hand, the insulating structure 104 helps to further ensure that there is no short circuit between the first passivated contact structure 101 and the second passivated contact structure 102, and when the back contact battery is generating electricity, the insulating structure 104 can reduce the electrical crosstalk between the first passivated contact structure 101 and the second passivated contact structure 102. On the other hand, the insulating structure 104 helps to fill the first isolation groove 105, thereby reducing the height difference between the first passivated contact structure 101, the second passivated contact structure 102 and the substrate 100 located in the third region 130, thereby reducing the height difference between the first electrode 113, the second electrode 123 and the reflective structure 106, thus improving the flatness of the back side of the back contact battery and improving the structural stability of the back contact battery. On the other hand, the insulating structure 104 has a high light transmittance, so that more light can be reflected by the reflective structure 106 and finally absorbed and utilized by the substrate 100 located in the third region 130, thereby further improving the light absorption and utilization rate of the back contact battery, and the insulating structure 104 also plays a supporting role for the reflective structure 106.

[0114] Another embodiment of this disclosure provides a method for manufacturing a back contact battery, used to form the back contact battery provided in the foregoing embodiment. The manufacturing method of the back contact battery provided in another embodiment of this disclosure will be described in detail below with reference to the accompanying drawings. It should be noted that parts that are the same as or corresponding to those in the foregoing embodiments can be referred to the corresponding descriptions in the foregoing embodiments, and will not be repeated hereafter.

[0115] refer to Figures 11 to 13 as well as Figure 1 , Figure 11 This is a process flow diagram of a method for manufacturing a back contact battery according to another embodiment of this disclosure. Figure 12 A partial cross-sectional view of the manufacturing method of a back contact battery according to another embodiment of this disclosure after forming the first passivated contact structure and the second passivated contact structure. Figure 13 A partial cross-sectional view of the back contact battery manufacturing method provided in another embodiment of this disclosure after the formation of the insulating structure; the manufacturing method of the back contact battery includes at least the following steps: S1: A substrate 100 is provided, and a surface 10 of the substrate 100 includes a first region 110 and a second region 120 arranged alternately along a first direction X, and a third region 130 located between the first region 110 and the second region 120.

[0116] S2: A first passivated contact structure 101 and a second passivated contact structure 102 are formed, wherein the first passivated contact structure 101 is located in the first region 110 and the second passivated contact structure 102 is located in the second region 120.

[0117] S3: An insulating structure 104 is formed, which is located in the third region 130 and in the first isolation groove 105 formed by the first passivation contact structure 101 and the second passivation contact structure 102.

[0118] S4: Form a first electrode 113, a second electrode 123 and a reflective structure 106. The first electrode 113 is located on the side of the first passivation contact structure 101 away from the substrate 100. The second electrode 123 is located on the side of the second passivation contact structure 102 away from the substrate 100. The reflective structure 106 is located on the side of the insulating structure 104 away from the substrate 100 and is located in the second isolation groove 115 formed by the first electrode 113 and the second electrode 123.

[0119] Thus, not only is a first isolation groove 105 formed to isolate the first passivation contact structure 101 and the second passivation contact structure 102, but an insulating structure 104 is also formed in the first isolation groove 105 to further reduce electrical crosstalk between the first passivation contact structure 101 and the second passivation contact structure 102. On this basis, a reflective structure 106 is also formed in the second isolation groove 115 formed by the first electrode 113 and the second electrode 123 to reflect the light that has been transmitted out of the substrate 100 but not utilized back into the substrate 100, thereby improving the absorption and utilization rate of light by the back contact battery.

[0120] Furthermore, by filling the first isolation trench 105 with the insulating structure 104, the height difference between the first passivation contact structure 101, the second passivation contact structure 102, and the substrate 100 located in the third region 130 can be reduced. In the subsequent steps of forming the first electrode 113, the second electrode 123, and the reflective structure 106, the support of the insulating structure 104 and the filling of the first isolation trench 105 can provide a manufacturing reference surface with high flatness for the first electrode 113, the second electrode 123, and the reflective structure 106, thereby improving the yield of the formed first electrode 113, the second electrode 123, and the reflective structure 106.

[0121] The following provides a detailed description of a method for manufacturing a back contact battery according to another embodiment of this disclosure.

[0122] In some embodiments, in conjunction with reference Figure 13 , Figure 14 and Figure 1 The steps of forming the first electrode 113, the second electrode 123, and the reflective structure 106 may include: combining with a reference Figure 13 and Figure 14 , Figure 14A partial cross-sectional view of a back contact battery manufacturing method according to another embodiment of this disclosure after the formation of a conductive film, showing a conductive film 36 covering the surface formed by the first passivation contact structure 101, the second passivation contact structure 102, and the insulating structure 104; (Refer to reference) Figure 14 and Figure 1 The conductive film 36 located at the junction of the first region 110 and the third region 130 is cut by a first laser, and the conductive film 36 located at the junction of the second region 120 and the third region 130 is also cut. The remaining conductive film 36 located in the first region 110 is the first electrode 113, the remaining conductive film 36 located in the second region 120 is the second electrode 123, and the remaining conductive film 36 located in the third region 130 is the reflective structure 106.

[0123] This facilitates the simultaneous formation of the first electrode 113, the second electrode 123, and the reflective structure 106, thereby simplifying the fabrication process of the back contact battery and reducing the material costs required to form the first electrode 113, the second electrode 123, and the reflective structure 106.

[0124] It is worth noting that, based on the filling of the first isolation groove 105 by the insulating structure 104, the step of covering the conductive film 36 helps to prevent the conductive film 36 from being suspended in the third region 130. That is, the insulating structure 104 can provide strong support for the conductive film 36 located in the third region 130, so that in the subsequent step of cutting the first laser conductive film 36, the conductive film 36 is not easily vibrated or torn during laser cutting, thereby improving the cutting accuracy of the conductive film 36. Finally, a third isolation groove 125 with the required size is formed between the reflective structure 106 and the first electrode 113, and a fourth isolation groove 135 with the required size is formed between the reflective structure 106 and the first electrode 113.

[0125] Furthermore, in the step of cutting using the first laser conductive film 36, not only is a third isolation groove 125 formed at the junction of the first region 110 and the third region 130, but a fourth isolation groove 135 is also formed at the junction of the second region 120 and the third region 130. The remaining conductive film 36 in the third region 130 can be reused, as it remains between the third isolation groove 125 and the fourth isolation groove 135. In other words, based on the isolation effect of the third isolation groove 125 and the fourth isolation groove 135, the remaining conductive film 36 in the third region 130 is no longer waste and can be used as a reflective structure 106 to improve the light absorption and utilization rate of the back contact battery.

[0126] Furthermore, on the one hand, based on the support and fixation of the conductive film 36 located in the third region 130 by the insulating structure 104, the cut conductive film 36 is not easily slipped or collapsed by external forces, and thus will not overlap with the first passivation contact structure 101 or the second passivation contact structure 102, thereby effectively avoiding short circuits between the first passivation contact structure 101 and the second passivation contact structure 102. On the other hand, the surface formed by the first passivation contact structure 101, the second passivation contact structure 102 and the insulating structure 104 has a high flatness, which is conducive to forming a conductive film 36 with a high flatness and avoiding the reduction in yield caused by wrinkles in some areas of the conductive film 36.

[0127] In some cases, the conductive film 36 can be aluminum foil.

[0128] In some cases, refer to Figure 1 The thickness of the first passivated contact structure 101 is equal to the thickness of the second passivated contact structure 102, and the thickness of the insulating structure 104 is equal to the thickness of the first passivated contact structure 101. In other cases, refer to... Figure 5 The thickness of one of the first passivation contact structure 101 and the second passivation contact structure 102 is less than the thickness of the other. The top surface of the insulating structure 104 away from the substrate 100 is inclined relative to the first direction X. One side of the top surface of the insulating structure 104 away from the substrate 100 is connected to the top surface of the first passivation contact structure 101 away from the substrate 100, and the other side of the top surface of the insulating structure 104 away from the substrate 100 is connected to the top surface of the second passivation contact structure 102 away from the substrate 100.

[0129] It is worth noting that, whether Figure 1 The insulation structure 104 shown is still Figure 5 As shown in the insulating structure 104, based on the transition effect of the insulating structure 104, the conductive film 36 can be smoothly attached to the first passivation contact structure 101 and the second passivation contact structure 102 along the top surface of the insulating structure 104 away from the third region 130, providing a stable processing interface for subsequent laser processing of the conductive film 36.

[0130] In some cases, refer to Figure 15 and Figure 1 , Figure 15 A partial cross-sectional view of the manufacturing method of the back contact battery provided in another embodiment of this disclosure after cutting with a first laser. After cutting with the first laser, a second laser can be used to round the corner of at least one of the first electrode 113, the second electrode 123 and the reflective structure 106, so that the corner of at least one of the first electrode 113, the second electrode 123 and the reflective structure 106 is a rounded corner structure.

[0131] It is worth noting that during the step of cutting the conductive film 36 with the first laser, protrusions 361 may easily be generated on the edges of the first electrode 113, the second electrode 123, or the reflective structure 106. The protrusions 361 may be sharp burrs or slag, which may cause the first electrode 113 and the reflective structure 106 to cause micro-short circuits at the third isolation trench 125 based on burrs or slag, or cause the second electrode 123 and the reflective structure 106 to cause micro-short circuits at the fourth isolation trench 135 based on burrs or slag, thereby reducing the yield of the back contact battery.

[0132] Based on this, a second laser is also used to round the corner of at least one of the first electrode 113, the second electrode 123, and the reflective structure 106. This helps to melt the burrs or slag on the edges of the first electrode 113, the second electrode 123, or the reflective structure 106, and shrink them into a smooth curved surface under the action of surface tension. This further reduces the risk of short circuits and makes the corner of at least one of the first electrode 113, the second electrode 123, and the reflective structure 106 a rounded corner structure, thereby further improving the yield of the back contact battery.

[0133] Furthermore, in the steps of preparing the first electrode 113, the second electrode 123, and the reflective structure 106, both the first laser and the second laser avoid the central region of the first passivation contact structure 101 and the second passivation contact structure 102 as much as possible, so as to reduce the laser damage caused by the first laser and the second laser to the first passivation contact structure 101 and the second passivation contact structure 102.

[0134] In some examples, the energy density of the first laser can be higher than that of the second laser. The first laser is used to disconnect the conductive film 36 to form the third isolation groove 125 and the fourth isolation groove 135, while the second laser is used to round the corners of at least one of the first electrode 113, the second electrode 123, or the reflective structure 106. Therefore, designing the energy density of the first laser to be higher than that of the second laser helps to ensure that the corners of at least one of the first electrode 113, the second electrode 123, and the reflective structure 106 are rounded, while minimizing damage to the first passivation contact structure 101 and the second passivation contact structure 102 caused by the second laser.

[0135] In other examples, the pulse overlap rate of the first laser can be lower than that of the second laser. It is worth noting that the second laser primarily focuses on treating burrs or slag generated at the corners of at least one of the first electrode 113, the second electrode 123, or the reflective structure 106, thus allowing for a higher pulse overlap rate to increase the laser energy in localized areas. Therefore, designing the pulse overlap rate of the first laser to be lower than that of the second laser helps to ensure that the corners of at least one of the first electrode 113, the second electrode 123, and the reflective structure 106 are rounded, while minimizing damage to the first passivated contact structure 101 and the second passivated contact structure 102 caused by the first laser.

[0136] In some other examples, the energy density of the first laser can be higher than that of the second laser, and the pulse overlap rate of the first laser can be lower than that of the second laser.

[0137] In some examples, the energy density of the first laser can be 0.3 mJ to 1.0 mJ, for example, it can be 0.3 mJ to 0.4 mJ, 0.4 mJ to 0.5 mJ, 0.5 mJ to 0.6 mJ, 0.6 mJ to 0.7 mJ, 0.7 mJ to 0.8 mJ, 0.8 mJ to 0.9 mJ, or 0.9 mJ to 1 mJ. Optionally, it can be 0.3 mJ, 0.35 mJ, 0.4 mJ, 0.45 mJ, 0.5 mJ, 0.55 mJ, 0.6 mJ, 0.65 mJ, 0.7 mJ, 0.75 mJ, 0.8 mJ, 0.85 mJ, 0.9 mJ, 0.95 mJ, or 1 mJ.

[0138] In one example, for HBC or HTBC batteries that are more sensitive to heat, the energy density of the first laser can be 0.3 mJ to 0.7 mJ; for other types of BC batteries that are less sensitive to heat, the energy density of the first laser can be 0.4 mJ to 1.0 mJ, and optionally, 0.6 mJ to 0.9 mJ.

[0139] In some examples, the energy density of the second laser can be 0.05mJ to 0.3mJ, for example, it can be 0.05mJ to 0.1mJ, 0.15mJ to 0.2mJ, 0.2mJ to 0.25mJ or 0.25mJ to 0.3mJ, etc. Optionally, the concentration can be 0.05mJ, 0.06mJ, 0.07mJ, 0.08mJ, 0.09mJ, 0.1mJ, 0.11mJ, 0.12mJ, 0.13mJ, 0.14mJ, 0.15mJ, 0.16mJ, 0.17mJ, 0.18mJ, 0.19mJ, 0.2mJ, 0.21mJ, 0.22mJ, 0.23mJ, 0.24mJ, 0.25mJ, 0.26mJ, 0.27mJ, 0.28mJ, 0.29mJ, or 0.3mJ, etc.

[0140] In some examples, the first laser can be a single-pulse laser, and the pulse overlap rate of the first laser can be 30% to 70%, for example, 30% to 40%, 40% to 50%, 50% to 60%, or 60% to 70%. Optionally, it can be 30%, 31%, 32%, 33%, 34%, 35%, 36%, 37%, 38%, 39%, 40%, 41%, 42%, 43%, 44%, 45%, 46%, 47%, 48%, 49%, 50%, 51%, 52%, 53%, 54%, 55%, 56%, 57%, 58%, 59%, 60%, 61%, 62%, 63%, 64%, 65%, 66%, 67%, 68%, 69%, or 70%, etc.

[0141] In some examples, the second laser can be a single-pulse laser, and the pulse overlap rate of the second laser can be 70% to 98%, for example, 70% to 80%, 80% to 90%, or 90% to 98%. Optionally, it can be 70%, 71%, 72%, 73%, 74%, 75%, 76%, 77%, 78%, 79%, 80%, 81%, 82%, 83%, 84%, 85%, 86%, 87%, 88%, 89%, 90%, 91%, 92%, 93%, 94%, 95%, 96%, 97%, or 98%, etc.

[0142] In some examples, the wavelengths of the first and second lasers can be 1064 nm.

[0143] In some examples, the second laser can be designed to be positively defocused relative to the side of the conductive film 36 away from the substrate 100. In other words, the laser focus of the second laser can be slightly raised away from the side of the conductive film 36 away from the substrate 100, so that the second laser can scan the corner of at least one of the first electrode 113, the second electrode 123 or the reflective structure 106 with a larger spot size and a lower peak energy density.

[0144] In one example, the defocusing amount of the second laser can be 0.2mm to 2mm, for example, it can be 0.2mm to 0.5mm, 0.5mm to 1mm, 1mm to 1.5mm, or 1.5mm to 2mm. Preferably, the defocusing amount of the second laser can be 0.2mm, 0.3mm, 0.4mm, 0.5mm, 0.6mm, 0.7mm, 0.8mm, 0.9mm, 1mm, 1.1mm, 1.2mm, 1.3mm, 1.4mm, 1.5mm, 1.6mm, 1.7mm, 1.8mm, 1.9mm, or 2mm, etc.

[0145] In some cases, refer to Figure 4 The step of forming the first passivated contact structure 101 may include at least: forming a first passivated contact portion 111 located in the first region 110; and forming a first conductive adhesive 121 located on the side of the first passivated contact portion 111 away from the first region 110.

[0146] refer to Figure 4 The step of forming the second passivated contact structure 102 may include at least: forming a second passivated contact portion 112 located in the second region 120; and forming a second conductive adhesive 122 located on the side of the second passivated contact portion 112 away from the second region 120.

[0147] Thus, whether in the first laser step or the second laser step, the first conductive adhesive 121 protects the first passivated contact 111, preventing laser damage to the first passivated contact 111, and the second conductive adhesive 122 protects the second passivated contact 112, preventing laser damage to the second passivated contact 112, thereby ensuring that both the first passivated contact 111 and the second passivated contact 112 have a good passivation effect on the substrate 100.

[0148] In some examples, a screen printing process can be used to form a first conductive adhesive 121 on the first region 110 and a second conductive adhesive 122 on the second region 120.

[0149] Another embodiment of this disclosure provides a manufacturing apparatus for a back contact battery, used to form the back contact battery provided in the foregoing embodiments, or to implement the manufacturing method of the back contact battery provided in the foregoing embodiments. The manufacturing apparatus for a back contact battery provided in another embodiment of this disclosure will be described in detail below with reference to the accompanying drawings. It should be noted that parts that are the same as or corresponding to those in the foregoing embodiments can be referred to the corresponding descriptions in the foregoing embodiments, and will not be repeated hereafter.

[0150] Figure 16This is a functional module diagram of an apparatus for implementing a method for manufacturing a back contact battery according to another embodiment of the present disclosure. The apparatus for manufacturing a back contact battery may include at least: a conveying module 108 for providing a substrate 100, one surface 10 of the substrate 100 including a first region 110 and a second region 120 alternately arranged along a first direction X, and a third region 130 located between the first region 110 and the second region 120; a passivation manufacturing module 118 for forming a first passivation contact structure 101 and a second passivation contact structure 102, the first passivation contact structure 101 being located in the first region 110 and the second passivation contact structure 102 being located in the second region 120; and an insulation manufacturing module 12. 8, for forming an insulating structure 104, the insulating structure 104 being located in the third region 130 and in the first isolation groove 105 formed by the first passivation contact structure 101 and the second passivation contact structure 102; electrode manufacturing module 138, for forming a first electrode 113, a second electrode 123 and a reflective structure 106, the first electrode 113 being located on the side of the first passivation contact structure 101 away from the substrate 100, the second electrode 123 being located on the side of the second passivation contact structure 102 away from the substrate 100, and the reflective structure 106 being located on the side of the insulating structure 104 away from the substrate 100 and in the second isolation groove 115 formed by the first electrode 113 and the second electrode 123.

[0151] Thus, with the help of the insulation manufacturing module 128, an insulation structure 104 can be formed that can reduce electrical crosstalk between the first passivation contact structure 101 and the second passivation contact structure 102, and can also reduce the height difference between the first passivation contact structure 101, the second passivation contact structure 102 and the substrate 100 located in the third region 130. On this basis, with the help of the electrode manufacturing module 138, the first electrode 113, the second electrode 123 and the reflection structure 106 are formed simultaneously, which simplifies the manufacturing process and allows the reflection structure 106 to reflect the light transmitted out of the substrate 100 back into the substrate 100, thereby improving the light absorption and utilization rate of the back contact battery.

[0152] It should be noted that, Figure 16 This is only a schematic diagram of the modules and does not impose any restrictions on the equipment and instruments included in each module. You can flexibly select and adjust them according to the actual application.

[0153] Another embodiment of this disclosure provides a stacked battery, which includes the back contact battery provided in the foregoing embodiments, or a back contact battery formed by the manufacturing method of the back contact battery provided in the foregoing embodiments, or a back contact battery formed by the manufacturing apparatus of the back contact battery provided in the foregoing embodiments. The stacked battery provided in another embodiment of this disclosure will be described in detail below with reference to the accompanying drawings. It should be noted that the parts that are the same as or corresponding to those in the foregoing embodiments can be referred to the corresponding descriptions in the foregoing embodiments, and will not be repeated hereafter.

[0154] refer to Figure 17 , Figure 17 This is a partial cross-sectional schematic diagram of a tandem solar cell provided in another embodiment of the present disclosure. The tandem solar cell includes: a bottom cell 119, which is a back contact cell provided in the foregoing embodiment, or a back contact cell formed by the manufacturing method of the back contact cell provided in the foregoing embodiment, or a back contact cell formed by the manufacturing apparatus of the back contact cell provided in the foregoing embodiment; and a perovskite cell 129, which is located on one side of the bottom cell 119.

[0155] In some embodiments, the perovskite solar cell 129 may include: a first transport layer, a perovskite substrate, a second transport layer, a transparent conductive portion, and an antireflection layer stacked together. The first transport layer is directly opposite the base cell 119.

[0156] In some examples, the first transport layer can be either an electron transport layer or a hole transport layer, and the second transport layer can be either an electron transport layer or a hole transport layer.

[0157] In some embodiments, the bandgap width of the perovskite cell 129 is wider than that of the bottom cell 119. Therefore, stacking the perovskite cell 129 on top of the bottom cell 119 can give the stacked cell a wider spectral response range, thereby maximizing the utilization of solar energy and improving the efficiency of the back contact cell.

[0158] In some embodiments, the stacked cell may further include an intermediate connecting layer (not shown in the figure), which connects the bottom cell 119 and the perovskite cell 129.

[0159] In some cases, the intermediate connecting layer is typically a tunnel junction or a very thin metal or transparent electrode composite layer. Optionally, the intermediate connecting layer can be a transparent conductive oxide, which has good photoelectric properties, high photon transmittance, and high conductivity, thereby enabling the perovskite solar cell 129 and the bottom cell 119 to maintain good ohmic contact.

[0160] In other cases, the back grid, back main grid, front grid, and front main grid of the back contact cell 119, which serves as the bottom cell 119, can also act as an intermediate connection layer to achieve electrical connection with the perovskite cell 129. It should be noted that electrical connection actually means that both materials are conductive, and they are directly contacted or connected via other conductive materials. Therefore, when the back contact cell is generating electricity, there is an electrical connection between them.

[0161] This disclosure also provides a photovoltaic module in another embodiment. The photovoltaic module includes multiple back contact cells as provided in the foregoing embodiments, or multiple back contact cells formed by a manufacturing method of the foregoing embodiments, or multiple back contact cells formed by a manufacturing apparatus of the foregoing embodiments, or multiple stacked cells as provided in the foregoing embodiments. The photovoltaic module is used to convert received light energy into electrical energy. It should be noted that the parts that are the same as or corresponding to the foregoing embodiments can be referred to the corresponding descriptions of the foregoing embodiments, and will not be repeated below.

[0162] Reference Figure 18 , Figure 19 as well as Figure 1 A photovoltaic module includes: a battery string, which is formed by connecting multiple back contact batteries 40 provided in the foregoing embodiments, or by connecting multiple back contact batteries 40 formed by the manufacturing method of back contact batteries provided in the foregoing embodiments, or by connecting multiple back contact batteries 40 formed by the manufacturing apparatus of back contact batteries provided in the foregoing embodiments, or by connecting multiple stacked batteries provided in the foregoing embodiments; an encapsulating film 41 for covering the surface of the battery string; and a cover plate 42 for covering the surface of the encapsulating film 41 facing away from the battery string.

[0163] in, Figure 18 A partial three-dimensional schematic diagram of a cell string in a photovoltaic module provided in another embodiment of the present disclosure; Figure 19 This is a partial cross-sectional schematic diagram of a photovoltaic module provided in another embodiment of the present disclosure.

[0164] In some embodiments, the back contact battery 40, i.e., the BC battery, includes, but is not limited to, IBC (Interdigitated Back Contact Cell), HBC, TBC, HTBC, or HPBC batteries.

[0165] In some cases, multiple back contact batteries 40 can be electrically connected via solder strips 43. It is worth noting that electrical connection actually means that both are made of conductive materials and are directly connected or connected via other conductive materials. Therefore, when the back contact battery 40 is generating electricity, there is an electrical connection between them.

[0166] It should be noted that, Figure 18 and Figure 19This illustration only shows one positional relationship between the back contact batteries 40, where electrodes of different polarities in each back contact battery 40 are located on the same surface, and the side of each back contact battery 40 with electrodes faces the same direction. Solder ribbons 43 connect the same side of two adjacent back contact batteries 40 respectively. In other embodiments, the back contact batteries may also be arranged such that the sides of two adjacent back contact batteries with electrodes are located on different sides, in which case solder ribbons connect the different sides of the two adjacent back contact batteries.

[0167] In some embodiments, the back contact battery 40 is electrically connected in a single sheet or in multiple segments to form multiple battery strings, and the multiple battery strings are electrically connected in series and / or parallel. The back contact battery 40 can be a single sheet of battery or a slice of battery, where a slice of battery refers to a battery formed by cutting a single sheet of battery.

[0168] In some embodiments, the encapsulating film 41 includes a first encapsulating layer and a second encapsulating layer. The first encapsulating layer covers one of the front or back sides of the back contact battery 40, and the second encapsulating layer covers the other of the front or back sides of the back contact battery 40. Specifically, at least one of the first encapsulating layer or the second encapsulating layer may be an organic encapsulating film such as polyvinyl butyral (PVB), ethylene-vinyl acetate copolymer (EVA), polyolefin thermoplastic elastomer (POE), or polyethylene glycol terephthalate (PET). Alternatively, at least one of the first encapsulating layer or the second encapsulating layer may also be an EP film, an EPE film, or a PVP film. Among them, EP film refers to a co-extruded film composed of stacked EVA film and POE film; EPE film refers to a co-extruded film formed by sequentially stacking EVA film, POE film, and EVA film; and PVP film refers to a co-extruded film formed by stacking POE film, EVA film, and POE film. Co-extruded films can be prepared by sequentially extruding one or more raw materials onto another pre-made film during the film processing, or by bonding different types of pre-made films together.

[0169] In some cases, the first encapsulation layer and the second encapsulation layer still have a boundary line before lamination. After lamination, the photovoltaic module will no longer have the concept of a first encapsulation layer and a second encapsulation layer. That is, the first encapsulation layer and the second encapsulation layer have formed an integral encapsulation film 41.

[0170] In some embodiments, the cover plate 42 can be a glass cover plate, a plastic cover plate, or other cover plate with light-transmitting function. Specifically, the surface of the cover plate 42 facing the encapsulating film 41 can be an uneven surface or a textured surface containing multiple raised structures, thereby increasing the utilization rate of incident light. The cover plate 42 includes a first cover plate and a second cover plate, the first cover plate being opposite to the first encapsulation layer, and the second cover plate being opposite to the second encapsulation layer.

[0171] Those skilled in the art will understand that the above embodiments are specific examples of implementing this disclosure, and in practical applications, various changes in form and detail may be made without departing from the spirit and scope of the embodiments of this disclosure. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the embodiments of this disclosure; therefore, the scope of protection of the embodiments of this disclosure should be determined by the scope defined in the claims.

Claims

1. A back-contact battery, characterized in that, include: A substrate, one surface of which includes a first region and a second region arranged alternately along a first direction, and a third region located between the first region and the second region; The first passivated contact structure is located in the first region; The first electrode is located on the side of the first passivated contact structure away from the substrate; The second passivated contact structure is located in the second region; The second electrode is located on the side of the second passivated contact structure away from the substrate; An insulating structure is located in the third region and within the first isolation groove formed by the first passivated contact structure and the second passivated contact structure; The reflective structure is located on the side of the insulating structure away from the substrate and is situated within a second isolation groove formed by the first electrode and the second electrode, wherein the first electrode, the second electrode, and the reflective structure comprise the same conductive material.

2. The back contact battery according to claim 1, characterized in that, The insulating structure is connected to the first passivated contact structure and the second passivated contact structure; the reflective structure has a third isolation groove between itself and the first electrode, and the reflective structure has a fourth isolation groove between itself and the second electrode.

3. The back contact battery according to claim 2, characterized in that, Also includes: The isolation section is filled with the third isolation groove and the fourth isolation groove.

4. The back contact battery according to claim 1 or 2, characterized in that, The corners of at least one of the first electrode, the second electrode, and the reflective structure are rounded.

5. The back contact battery according to claim 1, characterized in that, The first passivated contact structure includes: a first passivated contact portion located in the first region; and a first conductive adhesive located between the first passivated contact portion and the first electrode. The second passivated contact structure includes: a second passivated contact portion located in the second region; and a second conductive adhesive located between the second passivated contact portion and the second electrode.

6. The back contact battery according to claim 1, characterized in that, The first passivated contact structure includes: a first passivated contact portion located in the first region; a first dielectric portion located on the side of the first passivated contact portion away from the first region; and a first conductive adhesive located between the first dielectric portion and the first electrode, wherein the first electrode is embedded in the first dielectric portion and connected to the first passivated contact portion. The second passivation contact structure includes: a second passivation contact portion located in the second region; a second dielectric portion located on the side of the second passivation contact portion away from the second region; and a second conductive adhesive located between the second dielectric portion and the second electrode, wherein the second electrode is embedded in the second dielectric portion and connected to the second passivation contact portion.

7. The back contact battery according to claim 5 or 6, characterized in that, Along the second direction, the thickness of one of the first passivated contact portion and the second passivated contact portion is less than the thickness of the other, the thickness of the first passivated contact structure is equal to the thickness of the second passivated contact structure, and the thickness of the insulating structure is equal to the thickness of the first passivated contact structure; the second direction is the thickness direction of the substrate.

8. The back contact battery according to claim 5 or 6, characterized in that, Along the second direction, the thickness of one of the first passivation contact structure and the second passivation contact structure is less than the thickness of the other. The top surface of the insulating structure away from the substrate is inclined relative to the first direction. One side of the top surface of the insulating structure away from the substrate is connected to the top surface of the first passivation contact structure away from the substrate, and the other side of the top surface of the insulating structure away from the substrate is connected to the top surface of the second passivation contact structure away from the substrate. The second direction is the thickness direction of the substrate.

9. The back contact battery according to claim 1, characterized in that, The electrode is either the first electrode or the second electrode, and the passivation contact structure is either the first passivation contact structure or the second passivation contact structure; Along the first direction, there is a gap between the side surface of the electrode and the side surface of the passivation contact structure.

10. The back contact battery according to claim 1, characterized in that, Along the first direction, the width of the second isolation groove is greater than the width of the first isolation groove.

11. The back contact battery according to claim 1, characterized in that, The electrode is either the first electrode or the second electrode, and the passivation contact structure is either the first passivation contact structure or the second passivation contact structure; Along the first direction, the ratio of the width of the electrode to the width of the passivation contact structure is greater than or equal to 1 / 9 and less than 1.

12. A method for manufacturing a back-contact battery, characterized in that, include: A substrate is provided, one surface of which includes a first region and a second region arranged alternately along a first direction, and a third region located between the first region and the second region; A first passivated contact structure and a second passivated contact structure are formed, wherein the first passivated contact structure is located in the first region and the second passivated contact structure is located in the second region; An insulating structure is formed, the insulating structure being located in the third region and within the first isolation groove formed by the first passivated contact structure and the second passivated contact structure; A first electrode, a second electrode, and a reflective structure are formed. The first electrode is located on the side of the first passivated contact structure away from the substrate, the second electrode is located on the side of the second passivated contact structure away from the substrate, and the reflective structure is located on the side of the insulating structure away from the substrate and is located in a second isolation groove formed by the first electrode and the second electrode.

13. The method for manufacturing a back contact battery according to claim 12, characterized in that, The steps of forming the first electrode, the second electrode, and the reflective structure include: A conductive film is coated on the surface formed by the first passivated contact structure, the second passivated contact structure, and the insulating structure. The conductive film located at the junction of the first region and the third region is cut using a first laser, and the conductive film located at the junction of the second region and the third region is also cut. The remaining conductive film located in the first region becomes the first electrode, the remaining conductive film located in the second region becomes the second electrode, and the remaining conductive film located in the third region becomes the reflective structure.

14. The method for manufacturing a back contact battery according to claim 13, characterized in that, After cutting with the first laser, a second laser is used to round the corners of at least one of the first electrode, the second electrode, and the reflective structure, so that the corners of at least one of the first electrode, the second electrode, and the reflective structure are rounded corner structures. Wherein, the energy density of the first laser is higher than that of the second laser; and / or, the pulse overlap rate of the first laser is lower than that of the second laser.

15. An apparatus for manufacturing a back contact battery, used to form a back contact battery as described in any one of claims 1 to 11, or for carrying out a method for manufacturing a back contact battery as described in any one of claims 12 to 14, characterized in that, include: A delivery module for providing a substrate, one surface of which includes a first region and a second region arranged alternately along a first direction, and a third region located between the first region and the second region; A passivation manufacturing module is used to form a first passivation contact structure and a second passivation contact structure, wherein the first passivation contact structure is located in the first region and the second passivation contact structure is located in the second region; An insulation manufacturing module is used to form an insulation structure located in the third region and within a first isolation groove formed by the first passivated contact structure and the second passivated contact structure; An electrode manufacturing module is used to form a first electrode, a second electrode, and a reflective structure. The first electrode is located on the side of the first passivated contact structure away from the substrate, the second electrode is located on the side of the second passivated contact structure away from the substrate, and the reflective structure is located on the side of the insulating structure away from the substrate and is located in a second isolation groove formed by the first electrode and the second electrode.

16. A stacked battery, characterized in that, include: The bottom battery is a back contact battery as described in any one of claims 1 to 11, or a back contact battery formed by a manufacturing method of a back contact battery as described in any one of claims 12 to 14, or a back contact battery formed by a manufacturing apparatus of a back contact battery as described in claim 15. A perovskite solar cell, wherein the perovskite solar cell is located on one side of the bottom solar cell.

17. A photovoltaic module, characterized in that, include: The battery string is formed by connecting a plurality of back contact batteries as described in any one of claims 1 to 11, or by connecting a plurality of back contact batteries formed by a method of manufacturing a back contact battery as described in any one of claims 12 to 14, or by connecting a plurality of back contact batteries formed by a manufacturing apparatus for a back contact battery as described in claim 15, or by connecting a plurality of stacked batteries as described in claim 16. An encapsulating film is used to cover the surface of the battery string; A cover plate is used to cover the surface of the encapsulating film that faces away from the battery string.

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