A high-entropy aluminum silicide ceramic material of type M5Si3, its preparation method and application
By preparing M5Si3 type high-entropy aluminum silicide ceramic materials, and using flash sintering and spark plasma sintering technologies to form a dense oxide layer, the problem of insufficient oxidation resistance of high-entropy ceramic materials in high-temperature oxidation environments was solved, enabling long-term service capability in hot-end components of hypersonic vehicles.
Patent Information
- Application Number
- CN202610660041.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-05-13
- Publication Date
- 2026-07-17
AI Technical Summary
Existing high-entropy carbide and high-entropy diboride ceramic materials have poor oxidation resistance under high-temperature oxidizing conditions, which cannot meet the long-term service requirements of hot-end components of hypersonic aircraft under extreme high-temperature environments.
M5Si3 type high-entropy aluminum silicide ceramic material was prepared by mixing elemental metal powder with aluminum powder and silicon powder, followed by wet ball milling, flash sintering, and spark plasma sintering. This process formed a dense oxide layer structure of glass phase + high melting point oxide, which improved the oxidation resistance.
It can resist oxidation for 80 minutes at 2400℃ with an oxidation depth of only 0.688 mm, meeting the requirements for hot-end structure protection of hypersonic vehicles. Moreover, the preparation method is simple and can be mass-produced.
Smart Images

Figure CN122403985A_ABST