A semiconductor structure and a method of fabricating the same

By setting up a discontinuous structure with a vacuum cavity inside the protection ring of the RF chip, the problems of high-frequency signal loss and mechanical stress transmission caused by dielectric materials are solved, thereby improving the Q value, signal transmission speed and stability of the RF chip.

CN122421773APending Publication Date: 2026-07-17GUANGZHOU ZENGXIN TECH CO LTD
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Patent Information

Application Number
CN202610509337.8
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2026-04-16
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

The use of dielectric materials in the chip guard ring of existing radio frequency chips leads to high-frequency signal energy loss, mechanical stress transmission, parasitic capacitance, and stability issues, affecting the chip's Q value, resonator efficiency, and filter selectivity.

Method used

The system employs first and second protective rings, each containing a vacuum cavity, forming an intermittent structure. This reduces dielectric loss, blocks the transmission of mechanical stress and parasitic capacitance, prevents the influence of moisture, and ensures that the dielectric constant does not change with temperature.

Benefits of technology

It improves the Q value, signal transmission speed, mechanical stability and reliability of the RF chip, reduces the impact of moisture, and enhances the stability of the RF chip and the integrity of signal transmission.

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Abstract

本发明提供一种半导体结构及其制备方法,在该半导体结构中,包括第一保护环和第二保护环,其中,所述第一保护环内具有若干个第一真空腔,所述第二保护环内具有若干个第一真空腔,使得第一保护环和第二保护环均为断续式保护环且断口处均通过第一真空腔连接,因此,其能够提高射频芯片的性能。
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