Plasma treatment system for microbial activation

Abstract

According to an embodiment, a plasma treatment system for microorganisms includes a plasma generation unit that generates a reactive gas through plasma discharge; a microorganism treatment unit that includes a chamber having an internal space for accommodating a culture medium containing microorganisms, an inlet that injects the reactive gas from the plasma generation unit, and an outlet for discharging gas generated in the internal space, wherein the microorganism treatment unit includes a sparger that disperses the reactive gas supplied through the inlet in the form of bubbles, and a blade that agitates the culture medium within the chamber, and the sparger and the blade are disposed adjacent to a bottom surface of the chamber.

Description

[0001] Cross-references to related applications

[0002] This application claims priority to Korean Patent Application No. 10-2025-0141035, filed September 29, 2025, and Korean Patent Application No. 10-2025-0009315, filed January 22, 2025, pursuant to 35 USC §119, the entire disclosure of which is incorporated herein by reference. Technical Field

[0003] The following disclosure relates to a plasma treatment system for microorganisms and a method for activating microorganisms using plasma treatment. Background Technology

[0004] Plasma is the fourth state of matter, a high-energy state following solids, liquids, and gases. Specifically, the plasma state is a mixture of molecules ionized when high energy is applied to a gas, producing electrons, ions, and neutral particles. Plasma is electrically neutral and characterized by high energy and reactivity. Technology utilizes the properties of plasma to generate it by applying high voltage or high-frequency energy to a gas, and then uses this plasma to process various substances. Plasma contains activated chemical and physical elements, such as reactive oxygen species (ROS), reactive nitrogen species (RNS), ions, free radicals, and ultraviolet (UV) light. These elements can be used to modify material surfaces or induce chemical reactions.

[0005] Traditional plasma technology has long been applied in various industrial and environmental fields. Representatively, plasma technology plays a crucial role in chemical synthesis processes such as nitrogen fixation and ammonia synthesis. These technologies are based on the property of plasma to promote reactions between gas molecules or chemicals at high temperatures and energy levels. Furthermore, plasma exhibits superior performance in sterilization and purification technologies and helps address environmental and sanitation issues, such as pathogen removal and the decomposition of hazardous substances.

[0006] However, the application of existing plasma technology is mainly limited to chemical reactions and physical treatments, while its application in biological systems is still in its early stages. In particular, the technology of using plasma reactive species to control or promote microbial metabolic reactions has not yet been clearly defined. This is due to the complex effects of plasma-generated reactive oxygen species (ROS) and reactive nitrogen species (RNS) on microbial physiological and biochemical mechanisms, and the limited understanding of their interactions.

[0007] Therefore, there is an increasing need to develop technologies that can apply plasma reactive substances to biological systems. Summary of the Invention

[0008] One embodiment of this disclosure aims to provide a system for activating microbial metabolism, which can utilize plasma reactive substances to control or promote microbial metabolic reactions.

[0009] One embodiment of this disclosure aims to provide a method for activating microbial metabolism, which utilizes plasma-reactive substances to enhance microbial metabolic responses.

[0010] The aspects of this disclosure are not limited to those described above. That is, other aspects not described will be readily apparent to those skilled in the art from the following description.

[0011] In one general aspect, a plasma treatment system for microorganisms includes: a plasma generating unit that generates reactive gas through plasma discharge; and a microorganism treatment unit comprising: a chamber having an internal space for containing a culture medium containing microorganisms, an inlet for injecting reactive gas from the plasma generating unit, and an outlet for discharging gas generated in the internal space, wherein the microorganism treatment unit includes: a bubbler that disperses the reactive gas supplied through the inlet in the form of bubbles; and blades that agitate the culture medium in the chamber, and the bubbler and blades are positioned adjacent to the bottom surface of the chamber.

[0012] The microbial treatment unit may also include a collision plate disposed above the blades and having an open area on one side, wherein the bubbler, blades and collision plate may be stacked sequentially in the chamber starting from the bottom surface of the chamber.

[0013] Multiple collision plates can be provided and configured to form a curved movement path for the culture medium.

[0014] The collision plate may include: a first collision plate that contacts a first surface of one of the opposing inner walls of the chamber and is spaced apart from a second surface; and a second collision plate that contacts a second surface and is spaced apart from the first surface, and the first and second collision plates may be alternately arranged along the vertical direction of the chamber.

[0015] The collision plate may have a streamlined curved cross section and may be configured to have a predetermined upward tilt angle relative to the horizontal plane.

[0016] The surface of the collision plate can be coated with photocatalytic materials.

[0017] The microbial treatment unit may also include an ultraviolet irradiation unit that irradiates ultraviolet light to activate the photocatalytic material, and the ultraviolet irradiation unit may be positioned close to the collision plate.

[0018] The ultraviolet irradiation unit can be installed on the opposite inner wall of the chamber.

[0019] The microbial processing unit may also include a heater that controls the temperature of the culture medium inside the chamber, and the heater may be disposed on the bottom surface of the chamber.

[0020] The microbial treatment unit may further include: a sensor that measures at least one of the dissolved oxygen content, pH value, or concentration of a specific metabolite in the culture medium; and a control unit that controls the plasma generation unit, and the control unit may be configured to adjust the conditions for the plasma generation unit to generate activating substances based on the values ​​measured by the sensor. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of a plasma treatment system for microorganisms according to an embodiment of the present disclosure.

[0022] Figure 2 It is along Figure 1 A cross-sectional view taken from the A-A' line.

[0023] Figure 3 This is a flowchart of a method for microbial metabolic activation according to an embodiment of the present disclosure. Detailed Implementation

[0024] The present disclosure is described in detail below. Unless otherwise defined, the terminology used herein should be interpreted as having the meaning commonly understood by one of ordinary skill in the art. The accompanying drawings and embodiments are intended to enable those skilled in the art to readily understand and practice the present disclosure. Content that may obscure the essence of the invention may be omitted from the drawings and examples, and the present disclosure is not limited to the drawings and embodiments.

[0025] Unless the context clearly indicates otherwise, the singular form used in the specification is intended to include the plural form as well.

[0026] In this specification, the terms “comprising,” “having,” “including,” etc., mean that the features or components described in the specification are present, and unless otherwise specified, the possibility of adding one or more other features or components is not excluded in advance.

[0027] The plasma treatment system 1000 for microorganisms disclosed herein provides a plasma treatment system 1000 for microorganisms that can control the concentration of reactive substances and enhance the metabolic reactions of microorganisms through plasma treatment.

[0028] Figure 1 This is a diagram illustrating a plasma treatment system 1000 for microorganisms according to an embodiment of the present disclosure. (Refer to...) Figure 1 The plasma treatment system 1000 for microorganisms disclosed herein includes an injection unit 300, a control unit 400, a power supply device (not shown), a microorganism treatment unit 100, and a plasma generation unit 200.

[0029] The injection unit 300 supplies reactive material from the plasma generation unit 200 to the microbial processing unit 100. For example, the injection unit 300 may be manufactured as a tube with excellent heat resistance and chemical stability, and configured to connect the outlet of the plasma discharge tube 210 and the inlet 111 of the chamber 110.

[0030] The control unit 400 controls the overall operation of the system 1000. In one example, the control unit 400 receives data such as temperature, pressure, pH, and dissolved oxygen from sensor 140 in real time and compares this data with set values ​​to comprehensively control the operation of the high-pressure generator 213, multiple valves 221 and 223, pump 230, motor 121, heater 160, etc., thereby automatically maintaining optimal conditions for microbial culture and plasma treatment. In one example, the control unit 400 may include a microcontroller.

[0031] The power supply unit (not shown) reliably supplies the operating power required by each component of the system 1000 (control unit 400, high voltage generator 213, motor 121, pump 230, heater 160, etc.).

[0032] The microbial processing unit 100 includes, for example, a chamber 110, an inlet 111, an outlet 112, a bubbler 123, a blade 122, a motor 121, a collision plate 130, a sensor 140, an oxygen generator 150, a heater 160, and an ultraviolet irradiation unit 170.

[0033] Chamber 110 is configured to contain a culture medium containing microorganisms within the internal space 101. In one example, chamber 110 is provided with a sealable structure. In one example, chamber 110 is made of a material with corrosion resistance and heat resistance to remain stable against chemical and physical changes during plasma reactive substances and the culture process. In one example, the material of chamber 110 may include, but is not limited to, at least one of stainless steel, borosilicate glass, quartz, and polyetheretherketone (PEEK).

[0034] Inlet 111 and outlet 112 are configured to supply reactive gas to chamber 110 and exhaust internal gas. In one example, inlet 111 is connected to injection unit 300 and receives reactive material generated from plasma generation unit 200. In one example, outlet 112 is used to exhaust residual gas or byproducts after reaction with the culture medium to the outside of chamber 110.

[0035] In one example, inlet 111 is located on the bottom surface of chamber 110 or on a side adjacent to the bottom surface. In one example, outlet 112 is located above chamber 110. In one example, inlet 111 may be installed through the bottom surface of chamber 110 or through a side adjacent to the bottom surface.

[0036] The bubbler 123 initially disperses the reactive gas supplied to the chamber 110 through inlet 111 into the culture medium as microbubbles. In one example, inlet 111 is connected to the bubbler 123. The gas supplied through inlet 111 is immediately converted into microbubbles as it passes through the bubbler 123, allowing the gas to be effectively dispersed into the culture medium. In one example, the bubbler 123 is arranged on the bottom surface of the chamber 110. By positioning the bubbler 123 on the underside of the chamber 110 and connecting inlet 111 to the bubbler 123, the reactive gas has the longest possible path through the culture medium, thereby maximizing the residence time of the reactive gas in the culture medium.

[0037] Blades 122 are multiple blades connected to and rotating together with the rotating shaft of motor 121. In one example, blades 122 are arranged below chamber 110, similar to bubbler 123. In another example, blades 122 are arranged above bubbler 123 to physically break up bubbles dispersed by bubbler 123 into smaller fractions and forcibly mix the bubbles with the culture medium. This mechanically improves the efficiency of reactive gas dissolution in the culture medium.

[0038] By organizing the inlet 111, bubbler 123, and blades 122 on the lower side of chamber 110, the efficiency of reactive substance delivery is improved. Specifically, the gas inlet 111 is positioned on the lower side, i.e., the lowest point of chamber 110, so that the injected reactive gas travels across the entire height of the culture medium to reach the upper outlet 112. This physically maximizes the residence time and movement path of bubbles within the culture medium, minimizes material loss due to unreacted gas release, and ensures sufficient time for the reactive substance to dissolve within the culture medium. Furthermore, the progressive interaction of the components arranged on the lower side increases the amount of gas dissolved per unit time.

[0039] First, the reactive gas supplied through inlet 111 passes through bubbler 123 and is initially converted into finely segmented bubbles, thereby increasing the initial gas-liquid contact area. Subsequently, blades 122 rotating at high speed above bubbler 123 physically break these bubbles into even smaller microbubbles through strong shearing force, while simultaneously creating a strong vortex at the bottom of chamber 110 to force convection of the microbubbles throughout the culture medium. This mechanical agitation resolves concentration gradients within the culture medium, ensuring that reactive substances, temperature, nutrients, etc., are uniformly distributed throughout chamber 110. This prevents reactive substances from concentrating in specific areas, which could lead to localized oxidative stress in microorganisms, and ensures that all microorganisms are under consistent treatment conditions.

[0040] Therefore, this arrangement systematically combines the technical advantages of ensuring the longest reaction time, maximizing contact area through multi-step physical processes, and ensuring a uniform culture environment. This increases the total amount of injected reactive substances delivered to the microorganisms, ultimately enhancing microbial metabolic responses.

[0041] Motor 121 is mounted at the lower end of chamber 110 and generates power to rotate blade 122. In one example, motor 121 may be a high-speed motor capable of high-speed rotation, and its rotational speed may be adjusted according to a control signal from control unit 400.

[0042] Figure 2 It is along Figure 1 The cross-sectional view taken along line A-A'. (Refer to...) Figure 2 When viewed from above, the collision plate 130 can be seen in chamber 110.

[0043] In one example, a plurality of collision plates 130 are provided, and the plurality of collision plates 130 are arranged in multiple layers within the chamber 110. The collision plates 130 are positioned above the blade 122. For example, the plurality of collision plates 130 are arranged alternately along the upward path of the gas. In one example, the plurality of collision plates 130 includes a first collision plate 131 and a second collision plate 132. The first collision plate 131 is fixed to contact a first surface in the opposing inner wall of the chamber 110 and spaced apart from a second surface by a predetermined distance. Conversely, the second collision plate 132 is fixed to contact a second surface and spaced apart from the first surface by a predetermined distance. In one example, the first surface and the second surface are connected by the bottom surface of the chamber 110 to form a sidewall of the chamber 110.

[0044] Alternatively, UV irradiation units 170 are respectively disposed on a first surface and a second surface of chamber 110, and a first collision plate 131 is fixed and contacts the first UV irradiation unit 170, and a second collision plate 132 is fixed and contacts the second UV irradiation unit 170. Preferably, the UV irradiation units 170 are arranged close to the collision plates 130 coated with photocatalyst to minimize light loss caused by UV light absorption or scattering by the culture medium and to maximize the photon density reaching the photocatalyst surface. The UV irradiation unit 170 can be provided as a panel in the form of a surface light source attached to the inner wall of chamber 110, and can have a "light source-catalyst integration" structure in which the collision plate 130 coated with photocatalyst is fixed and directly contacts the panel. Alternatively, the UV irradiation unit 170 can be a thin rod-shaped UV lamp or a linear UV-LED module, and can be alternately arranged between the collision plates 130.

[0045] By positioning the ultraviolet irradiation unit 170 close to the collision plate 130, the distance between the light source and the catalyst surface is minimized, thereby inducing a highly efficient photocatalytic reaction with lower energy compared to external irradiation methods, and maximizing the generation of secondary reactive substances such as hydroxyl radicals.

[0046] The first collision plate 131 and the second collision plate 132 are arranged alternately along the vertical direction of the chamber 110. Due to this arrangement, bubbles rising from the bottom of the chamber 110 may not rise in a straight line, but should first pass through the space between the first collision plate 131 and the second surface, and then pass through the space between the upper second collision plate 132 and the first surface. As this process is repeated, the overall rising path of the gas exhibits a zigzag or serpentine shape.

[0047] Therefore, the bubbles travel a longer path, rather than the shortest straight line from the lower chamber 110 to the upper outlet 112, thus increasing their residence time in the culture medium. Furthermore, the repeated passage through the narrow channel and the continuous change in direction induces turbulence, further improving the contact efficiency and mass transfer efficiency between the reactive gases and the culture medium.

[0048] In one example, the collision plate 130 may have a streamlined convex cross-section. This induces rising bubbles to flow smoothly along the surface of the collision plate 130, thereby suppressing the occurrence of dead zones where gas stagnation occurs and allowing the entire surface of the collision plate 130 to participate in the reaction effectively.

[0049] In one example, each collision plate 130 may be configured to have a predetermined upward tilt angle relative to the horizontal plane. This tilt angle is used to actively induce the bubble to move not only horizontally, but also toward the center of the chamber 110 or a specific position on the next collision plate 130.

[0050] In one example, each collision plate 130 may be coated with a photocatalytic material on at least one of the surface that actively contacts the gas, or the bottom and top surfaces. In one example, the photocatalytic material may include titanium dioxide (TiO2).

[0051] Back Figure 1 Sensor 140 is configured to measure environmental variables within chamber 110 in real time. In one example, sensor 140 is mounted on sensor 140 port within chamber 110 to measure the temperature, pressure, pH, dissolved oxygen (DO), etc., of the culture medium and transmit the measurement data to control unit 400.

[0052] Oxygen generator 150 can be configured to supply oxygen required for metabolic reactions when the cultured microorganisms are aerobic. Separate from the supply of plasma reactive substances, oxygen generator 150 can be used, under the control of control unit 400, to maintain the dissolved oxygen level in the culture medium at an optimal level.

[0053] Heater 160 is configured to maintain the temperature of the culture medium within chamber 110 at the optimal growth temperature for microorganisms. In one example, heater 160 is arranged adjacent to the bottom surface of chamber 110. In another example, heater 160 may be mounted on the bottom surface of chamber 110. When heater 160 is arranged on the bottom surface, it can work in conjunction with the stirring action of the blades 122 below to rapidly circulate the heated culture medium throughout chamber 110. Alternatively, heater 160 may be provided in the form of a jacket enclosing the outer wall of chamber 110. This allows for uniform heat transfer throughout the culture medium and prevents localized overheating that could lead to thermal damage to microorganisms. The operation of heater 160 is controlled by control unit 400 based on temperature values ​​measured by sensor 140.

[0054] The plasma generation unit 200 includes a gas supply unit 201, a plasma discharge tube 210, a high-voltage generator 150, multiple valves 221 and 223, a pump 230, and a high-voltage generator 213.

[0055] The gas supply unit 201 stores the raw materials gas (e.g., oxygen, nitrogen, argon, helium, etc.) for plasma discharge and supplies the raw materials gas to the plasma discharge tube 210.

[0056] Plasma discharge tube 210 generates reactive substances selected from reactive oxygen species and reactive nitrogen species through plasma discharge. In one example, plasma discharge tube 210 can stably generate plasma under atmospheric pressure using dielectric barrier discharge (DBD) technology 211. Specifically, plasma discharge tube 210 may consist of two opposing electrodes 212 and a dielectric 211 between them, and plasma is formed by applying a high voltage in the form of alternating current or pulses to the electrodes 212. In this case, the generated reactive substances may be one or more selected from nitric oxide, nitrogen dioxide, nitrates, nitrites, nitrogen radicals, ozone, hydroxyl radicals, and hydrogen peroxide.

[0057] The high-voltage generator 213 supplies high-voltage power to the electrodes 212 of the plasma discharge tube 210. The high-voltage generator 213 receives control signals from the control unit 400 and adjusts the intensity of the output voltage, thereby actively controlling the intensity of plasma generation, i.e., the concentration of the generated reactive substances.

[0058] Multiple valves 221 and 223 are configured for precise control of gas flow. In one example, valves 221 and 223 include a first valve 221 and a second valve 223. The first valve 221 is a proportional control solenoid valve installed in the injection unit 300, and precisely controls the flow rate, velocity, and pressure of the reactive gas supplied to the microbial treatment unit 100 by finely adjusting the opening of valves 221 and 223 based on signals from the control unit 400. The second valve 223 is a proportional control solenoid valve located in a pipeline equipped with a gas supply unit 201 or outlet 112, and can be used to control gas flow.

[0059] Pump 230 supplies gas from gas supply unit 201 to plasma discharge tube 210 at a constant pressure. Pump 230 can be used to comprehensively control the concentration of reactive substances in conjunction with voltage regulation of high voltage generator 213 via control unit 400.

[0060] In one example, the plasma treatment system 1000 for microorganisms disclosed herein may have a modular structure.

[0061] This means that the main components of the system, namely the microbial processing unit 100, the plasma generation unit 200, and the control unit 400, are each composed of independent physical units. Each unit can be detachably connected to another unit through different mechanical and electrical interfaces.

[0062] Therefore, users can configure a customized system by selectively combining each unit according to the type of microorganism to be treated or the treatment purpose. Furthermore, when a specific unit fails or requires performance improvement, only that unit can be easily replaced or upgraded without disassembling the entire system, thus significantly improving the system's operational flexibility and scalability.

[0063] Next, a method for microbial metabolic activation using the plasma treatment system for microorganisms described above will be described. Figure 3 This is a method for microbial metabolic activation according to an embodiment of the present disclosure. (See also...) Figure 3 A method for microbial metabolic activation according to an embodiment of the present disclosure may include a reactive substance generation step (S100), a reactive substance injection and dispersion step (S200), a metabolic promotion step (S300), and an excretion step (S400). A control unit 400 is configured to perform each step.

[0064] In the reactive substance generation step (S100), the plasma generation unit 200 generates reactive substances according to a control signal from the control unit 400. Specifically, the control unit 400 opens valves 221 and 223 of the gas supply unit 201 to supply a raw material gas selected from oxygen, nitrogen, argon, helium, etc., to the plasma discharge tube 210 via pump 230. Simultaneously, the high-voltage generator 213 applies a high voltage to the electrode 212 of the plasma discharge tube 210 to generate plasma, thereby producing a reactive gas including reactive oxygen and reactive nitrogen substances. In this case, the control unit 400 can control the concentration of the generated reactive substances by adjusting the output voltage of the high-voltage generator 213 and the operation of the pump 230.

[0065] In the active substance injection and dispersion step (S200), the generated reactive gas is injected into the lower part of the chamber 110 of the microbial treatment unit 100 through the injection unit 300. The injected reactive gas is initially dispersed into microbubbles as it passes through the bubbler 123 located on the bottom surface of the chamber 110. Subsequently, the gas is physically further broken up by the high-speed rotating blades 122 above the bubbler 123 and forcibly stirred with the culture medium to ensure uniform dispersion within the chamber 110. In this step, the control unit 400 precisely controls the rotational speed of the motor 121 and the proportional control solenoid valves 221 and 223 of the injection unit 300 to precisely adjust the flow rate, speed, and degree of dispersion of the reactive substance injected into the culture medium.

[0066] In the metabolism promotion step (S300), reactive substances uniformly dispersed in the culture medium come into contact with microorganisms, inducing various biochemical reactions, such as altering cell membrane permeability or regulating the activity of specific enzymes, thereby promoting microbial growth and metabolic reactions.

[0067] In particular, this step can be performed by causing bubbles passing through the blades 122 to rise along a complex zigzag path formed by the multi-layered collision plates 130. This maximizes the residence time of the gas within the culture medium, thereby enhancing the reaction efficiency between reactive substances and microorganisms.

[0068] If the surface of the collision plate 130 is coated with a photocatalyst, the photocatalyst can be activated by the ultraviolet irradiation unit 170, thereby generating additional highly reactive substances, such as hydroxyl radicals, within the chamber 110. In this case, the combined effect of the externally injected reactive substances and the internally generated reactive substances can further amplify metabolic promotion.

[0069] Throughout the process, the control unit 400 monitors environmental data in real time, such as temperature, pH and dissolved oxygen content, based on the sensors 140 in the chamber 110, and controls the operation of the heater 160 and the oxygen generator 150, thereby maintaining the optimal environment for microbial metabolic reactions.

[0070] Finally, in the discharge step (S400), any residual gases after the reaction with the microorganisms and any gaseous byproducts generated during metabolism are safely discharged to the outside of the system through the outlet 112 located at the top of the chamber 110.

[0071] This disclosure systematically combines the multi-stage physical action of the bubbler, blades, and collision plate with the chemical action of the photocatalyst and ultraviolet irradiator to maximize the delivery of reactive substances and reaction efficiency, thereby effectively promoting microbial metabolic reactions.

[0072] Furthermore, this disclosure maintains a uniform culture medium environment through mechanical stirring and actively controls process variables through real-time sensor feedback, thereby preventing microbial damage and obtaining stable, highly reproducible results.

[0073] Furthermore, according to this disclosure, each functional unit is configured as an independent module, making it possible to customize the system configuration to suit the intended use, and because the replacement and upgrade of specific modules are easy, it has the advantage of improving the operational flexibility and economy of the system.

[0074] The plasma treatment system for microorganisms according to embodiments of the present disclosure can effectively treat microorganisms with plasma by minimizing losses during the delivery of reactive substances. Furthermore, the plasma treatment system can be applied in the fields of biotechnology and environmental technology to enhance microbial metabolism and produce specific metabolites.

[0075] The method for microbial activation according to embodiments of this disclosure can improve microbial growth and metabolic rates and increase energy efficiency.

[0076] The effects of this disclosure are not limited to those described above, and those skilled in the art to which this disclosure pertains will clearly understand from this specification and the accompanying drawings any effects not mentioned.

[0077] While this disclosure has been described above with reference to specific matters and limited examples and comparative examples, these are only intended to aid in a thorough understanding of the disclosure. Therefore, this disclosure is not limited to these embodiments. Various modifications and changes can be made by those skilled in the art based on this description.

[0078] Therefore, the spirit of this disclosure should not be limited to the exemplary embodiments described above, and the following claims, as well as all modifications equivalent to or related to the claims, are intended to fall within the scope and spirit of the invention.

Claims

1. A plasma treatment system for microorganisms, comprising: The plasma generation unit generates reactive gases through plasma discharge; The microbial processing unit includes a chamber having an internal space for containing a culture medium containing microorganisms, an inlet for injecting the reactive gas from the plasma generating unit, and an outlet for discharging the gas generated in the internal space. The microbial treatment unit includes: A bubbler that disperses the reactive gas supplied through the inlet in the form of bubbles; as well as The blades agitate the culture medium within the chamber, and The bubbler and the blades are positioned adjacent to the bottom surface of the chamber.

2. The plasma treatment system according to claim 1, wherein the microbial treatment unit further comprises a collision plate, the collision plate being disposed above the blade and having an open area on one side, and The bubbler, the blades, and the impact plate are stacked sequentially inside the chamber, starting from the bottom surface of the chamber.

3. The plasma processing system according to claim 2, wherein the collision plates are provided in a plurality of manner, and the collision plates are configured to form a curved movement path of the culture medium.

4. The plasma processing system according to claim 2, wherein the collision plate comprises: A first impact plate contacts a first surface of one of the opposing inner walls of the chamber and is spaced apart from a second surface; as well as The second impact plate contacts the second surface and is spaced apart from the first surface, and The first collision plate and the second collision plate are alternately arranged along the vertical direction of the chamber.

5. The plasma processing system of claim 2, wherein the collision plate has a streamlined curved cross-section and is configured to have a predetermined upward tilt angle relative to the horizontal plane.

6. The plasma processing system according to any one of claims 2 to 5, wherein the surface of the collision plate is coated with a photocatalytic material.

7. The plasma processing system according to claim 6, wherein the microbial processing unit further comprises an ultraviolet irradiation unit, the ultraviolet irradiation unit irradiating ultraviolet light to activate the photocatalytic material, and The ultraviolet irradiation unit is positioned close to the collision plate.

8. The plasma processing system according to claim 7, wherein the ultraviolet irradiation unit is disposed on the opposite inner wall of the chamber.

9. The plasma processing system of claim 1, wherein the microbial processing unit further comprises a heater that controls the temperature of the culture medium within the chamber, and The heater is disposed on the bottom surface of the chamber.

10. The plasma processing system according to claim 1, wherein the microbial processing unit further comprises: A sensor that measures at least one of the dissolved oxygen content, pH value, or concentration of a specific metabolite in the culture medium; as well as The control unit controls the plasma generating unit, and The control unit is configured to adjust the conditions for the plasma generation unit to generate reactive substances based on the values ​​measured by the sensor.

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