Optical coating structure and optical lens thereof

Abstract

This invention belongs to the field of lens coating, specifically an optical coating structure and its optical lens. The optical coating structure includes a superhydrophobic layer composed of a monolayer formed by chemical bonding of fluorosilane compounds; a plateau layer composed of an alumina thin film prepared by atomic layer deposition (ALD), the alumina thin film containing hydroxyl groups that provide a chemically active surface for the superhydrophobic layer; an antireflective layer composed of an alternating high and low refractive index dielectric film system formed by ALD; and an inner barrier layer composed of a metal oxide barrier film formed by ALD, used to form a highly stable interface between the optical substrate and the antireflective film system, and to block the diffusion of impurity ions from the optical substrate. This invention significantly improves the overall mechanical and thermal stability of the coating, enabling it to withstand high and low temperature cycling and frequent wiping without delamination or peeling, greatly extending the service life and reliability of the lens coating.

Description

Technical Field

[0001] This invention belongs to the field of lens coating, specifically an optical coating structure and its optical lens. Background Technology

[0002] Existing lens coating structures typically include multi-layered systems such as anti-reflective coatings and protective coatings. The layers are mainly bonded by physical adsorption or van der Waals forces, and there are obvious weak boundary layers at the interlayer interfaces. During long-term use, due to changes in ambient temperature, mechanical vibration, or wiping and cleaning, internal stress concentration is easily generated at the coating interfaces, leading to cracking, peeling, or localized detachment of the coating. This causes a sharp decline in the optical performance and protective function of the coating, affecting the bonding strength and interface stability between the lens and the coating.

[0003] Therefore, an optical coating structure is proposed to address the above problems. Summary of the Invention

[0004] The purpose of this invention is to address the shortcomings of the prior art by providing an optical coating structure and its optical lens, thereby solving the technical problems mentioned in the background art.

[0005] To address the above technical issues, the following technical solution is adopted: On the one hand, the optical substrate includes at least the following components sequentially from the outside to the inside: A superhydrophobic layer, which consists of a monolayer of fluorosilane compounds formed by chemical bonding; A platform layer is formed by an alumina film prepared by atomic layer deposition technology, wherein the alumina film contains hydroxyl groups that provide a chemically active surface for the superhydrophobic layer; An antireflective layer is composed of alternating layers of high and low refractive index media formed by atomic layer deposition technology; An inner barrier layer, which is composed of a metal oxide barrier film formed by atomic layer deposition technology, is located between the optical substrate and the antireflection stack; The inner barrier layer is used to block corrosive media in the environment and to prevent impurity ions in the optical substrate from diffusing upwards into the antireflection film system. The platform layer forms Si-O-Al covalent bonds by undergoing a dehydration condensation reaction between the hydroxyl groups on its surface and the silanol groups of the fluorosilane compound in the superhydrophobic layer, thereby achieving chemical bonding of the superhydrophobic layer on the platform layer. The superhydrophobic layer, platform layer, antireflective stack, and inner barrier layer are formed by in-situ continuous growth using atomic layer deposition technology, and adjacent layers are connected by chemical bonding to form an integrated stacked structure without adhesives.

[0006] Preferably, the antireflection stack is a multilayer film system composed of alternating layers of high-refractive-index material and low-refractive-index material deposited by atomic layer deposition technology, wherein the high-refractive-index material is titanium dioxide, the low-refractive-index material is silicon dioxide, and the number of cycles of the multilayer film system is 3 to 7.

[0007] Preferably, both the platform layer and the inner barrier layer are composed of an amorphous, extremely dense, and pinhole-free alumina film, with the platform layer having a thickness of 10–20 nm and the inner barrier layer having a thickness of 15–25 nm.

[0008] Preferably, the superhydrophobic layer has a monolayer structure with a thickness of 0.8–1.5 nm, and the fluorosilane compound is a perfluoroalkyl silane with a perfluoroalkyl chain at the end of its molecule.

[0009] Preferably, an antistatic layer is also included, which is located between the antireflection stack and the inner barrier layer. The antistatic layer is composed of an aluminum-doped zinc oxide transparent conductive film prepared by atomic layer deposition technology and is used to dissipate surface static charge.

[0010] Preferably, the aluminum doping concentration in the aluminum-doped zinc oxide film is 2.0 to 8.0 atomic percentages, and the aluminum-doped zinc oxide film is an n-type semiconductor material with a polycrystalline or nanocrystalline structure.

[0011] Preferably, a photothermal and antistatic composite layer is also included, which is located between the antireflective layer and the inner barrier layer. The photothermal and antistatic composite layer is composed of an indium tin oxide transparent conductive film prepared by atomic layer deposition technology. The indium tin oxide transparent conductive film has both near-infrared photothermal conversion function and electrostatic dissipation function.

[0012] Preferably, a heat insulation layer is also included, which is located between the inner barrier layer and the photothermal and antistatic composite layer; The heat insulation layer is used to block heat from being transferred to the optical substrate and internal components, and to direct heat to the mirror area for anti-fogging and defrosting.

[0013] Preferably, the antireflection stack, the platform layer, and the inner barrier layer are all formed by in-situ continuous deposition in the same vacuum reaction chamber using atomic layer deposition technology, and the interface between adjacent inorganic layers is an atomically sharp, pollution-free, continuous network structure bonded by covalent bonds.

[0014] In another aspect, an optical lens further includes an optical substrate, the optical substrate including a first surface and a second surface disposed opposite to the first surface, the inner barrier layer being disposed on the first surface by atomic deposition technology; The second surface is provided with a second antireflection layer by atomic deposition technology.

[0015] The beneficial effects of this invention are: The superhydrophobic layer, platform layer, antireflection stack and inner barrier layer are formed by in-situ continuous growth through atomic layer deposition technology. Adjacent layers are connected by chemical bonding to form an integrated stack structure without adhesive. This structure eliminates the weak interface problem caused by the traditional reliance on physical adsorption or van der Waals force between membrane layers, greatly improves the interlayer bonding force, and has no gaps or contamination at the interface, resulting in atomically flat surface. Therefore, the present invention significantly improves the overall mechanical and thermal stability of the coating layer, enabling it to withstand high and low temperature cycles and frequent wiping without delamination or peeling, thus greatly extending the service life and reliability of lens coatings. Attached Figure Description

[0016] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0017] In the attached diagram: Figure 1 This is a schematic diagram of the optical coating structure according to the first embodiment of the present invention; Figure 2 This is a schematic diagram of the optical coating structure according to the second embodiment of the present invention; Figure 3 This is a schematic diagram of the optical coating structure according to the third embodiment of the present invention; Figure 4 This is a schematic diagram of the optical coating structure according to the fourth embodiment of the present invention.

[0018] Figure label: 1. Superhydrophobic layer; 2. Platform layer; 3. Antireflective layer; 31. Second antireflective layer; 4. Inner barrier layer; 5. Optical substrate; 6. Antistatic layer; 7. Photothermal and antistatic composite layer; 8. Thermal insulation layer; 9. Isolation layer. Detailed Implementation

[0019] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention.

[0020] To further illustrate the technical means and effects of the present invention, the following description, in conjunction with preferred embodiments of the present invention, further explains the technical solution of the present invention. However, the present invention is not limited to the scope of the embodiments. The sources of the active ingredients in the products involved in the following embodiments and comparative examples are as follows (only the active ingredients are shown; the necessary excipients contained in other commercially available raw materials are not described in detail).

[0021] Specific implementation examples are given below.

[0022] Example 1 like Figure 1 As shown, the coating structure of this embodiment includes, from top to bottom, the following: superhydrophobic layer 1, platform layer 2, antireflection stack 3, inner barrier layer 4, optical substrate 5, and second antireflection stack 31. The inner barrier layer 4 is directly deposited on the first surface of the optical substrate 5 using ALD technology. This inner barrier layer 4 is composed of an amorphous, extremely dense, pinhole-free alumina thin film prepared by atomic layer deposition (ALD), with a thickness of approximately 20 nm (range 15–25 nm). The inner barrier layer 4 serves to prevent the diffusion of corrosive media from the environment to the optical substrate 5, and to prevent impurity ions (such as sodium and potassium ions) in the optical substrate 5 from diffusing upwards to the antireflection coating system, providing a pure, stable, and highly adhesive growth starting point for all the upper coating layers. In other words, the inner barrier layer 4 forms a highly stable interface between the optical substrate 1 and the entire upper coating layer, effectively improving the stability of the entire optical coating structure.

[0023] Optical substrate 5: Optical substrate 5 includes an optical glass substrate and an optical plastic substrate, providing mechanical strength, rigidity, and a main structure, and serving as a medium for light to pass through. The substrate has a first surface and a second surface disposed opposite to each other. It should be noted that optical glass substrates are characterized by a low coefficient of thermal expansion, high surface hardness, and a wide range of selectable refractive indices, enabling them to adapt to higher power and wider temperature ranges. However, they are also dense, brittle, and have higher processing costs per unit. Optical plastic substrates, typically made of PMMA, polycarbonate, or cyclic olefin copolymers, offer advantages such as light weight, high impact resistance, and low-cost mass production through injection molding. However, they have a high coefficient of thermal expansion, a low upper temperature limit (generally not exceeding 100°C), and are prone to moisture absorption, leading to changes in size and refractive index. This application does not require the use of both materials on the same substrate. Instead, it allows designers to choose between glass and plastic based on different application requirements for thermal stability, weight, impact resistance, cost, and mass production scale. Both types of substrates adhere to uniform dimensional tolerances, surface accuracy, and surface finish standards to ensure interchangeability. The final selection depends on the system's resistance to thermal drift, environmental tolerance, and mechanical strength. A second antireflection layer 31 is also formed on the second surface of the optical substrate 5 (opposite to the first surface) using atomic layer deposition technology. The structure of this second antireflection layer 31 is the same as that of the antireflection layer 3 on the first surface. Alternating layers are stacked, and a second anti-reflective layer 31 is provided on the second surface of the optical substrate 5.

[0024] Antireflection stack 3, on the inner barrier layer 4, alternately deposits high refractive index material layers and low refractive index material layers using ALD technology to form an antireflection film system with 5 cycles (specifically, it can be extended to the range of 3 to 7 cycles). Layered. The high refractive index material is titanium dioxide (TiO2). The low refractive index material is silicon dioxide ( ); in The thickness is approximately 12nm. The thickness is approximately 25 nm. By utilizing the principle of optical interference, the reflection loss of the substrate surface in the visible light band is significantly reduced, thereby increasing the overall transmittance of the device.

[0025] Platform layer 2 consists of an alumina film deposited using ALD technology, with a thickness of approximately 15 nm (range 10–20 nm). This platform layer 2 is composed of an amorphous, extremely dense, and pinhole-free alumina film prepared by atomic layer deposition. Its functions include: firstly, acting as the first line of environmental protection, its dense structure blocks the penetration of external water vapor, oxygen, and pollutant ions; secondly, serving as an attachment platform, its surface is rich in hydroxyl groups (-OH), providing a chemically active surface for the outermost superhydrophobic layer 1, ensuring its firm adhesion, with a thickness of approximately 15 nm. (10-20nm range).

[0026] Superhydrophobic layer 1 is formed through a chemical vapor deposition (CVD) surface modification process. The substrate, after all ALD inorganic layers have been deposited, is exposed to a vapor environment of fluorosilanes (e.g., perfluoroalkyl silanes). This superhydrophobic layer 1 is a monolayer structure with a thickness of approximately 1 nm (range 0.8–1.5 nm). Its molecular ends contain perfluoroalkyl chains, imparting extremely low surface energy. This superhydrophobic layer 1 is chemically bonded to the underlying... A highly ordered array is formed on the surface of platform layer 2; The specific reaction process is as follows: fluorosilane molecules... Hydrolysis of the group generates silanol group Subsequently with The hydroxyl groups on the surface undergo a dehydration condensation reaction to form strong Si-O-Al covalent bonds. This superhydrophobic layer 1 achieves superhydrophobic, oleophobic, antifouling, and self-cleaning functions, and its thickness is approximately 1 nm of perfluoroalkylsilane monolayer (range 0.8–1.5 nm).

[0027] In this embodiment, each film layer is formed by in-situ continuous deposition within the same vacuum reaction chamber using an in-situ ALD process. After one layer is deposited, the atmosphere is not introduced, and the deposition cycle for the next layer begins directly. The first precursor molecule of the subsequent film will undergo chemical adsorption and reaction with the surface atoms of the previous layer to form strong covalent bonds; The interfaces between adjacent inorganic layers are atomically sharp, pollution-free, and continuous network structures bonded by covalent bonds. The outermost superhydrophobic layer 1 is bonded to the plateau layer 2 via Si-O-Al covalent bonds. The entire membrane system is free of any adhesives, achieving chemical bonding integration across all membrane layers.

[0028] For example, sedimentation At that time, titanium precursor molecules will react with The -OH groups on the surface of the barrier layer react to form Ti-O-Al covalent bonds; alternating deposition and During this process, Si-O-Ti and Ti-O-Si covalent bonds are formed between adjacent layers, respectively; after the antireflection stack 3 is deposited, a platform layer is directly deposited. At this time, the aluminum precursor reacts with the top surface of the antireflection stack to form Al-O-Si covalent bonds. Each adjacent inorganic layer has an atomically sharp covalent bond interface. The superhydrophobic layer 1 is bonded to the plateau layer 2 via Si-O-Al covalent bonds.

[0029] Example 2 like Figure 2 As shown, the coating structure of this embodiment, from top to bottom (i.e., from the outside to the inside, with the air side as the outside and the optical substrate 5 side as the inside), includes the following layers in sequence: superhydrophobic layer 1, platform layer 2, antireflection stack 3, antistatic layer 6, inner barrier layer 4, optical substrate 5, and second antireflection stack 31. Each layer is prepared by atomic layer deposition technology or vapor phase surface modification technology based thereon.

[0030] Optical substrate 5, comprising an optical glass substrate and an optical plastic substrate, provides mechanical strength, rigidity, and a main structure, and serves as a medium through which light passes. The substrate has a first surface and a second surface disposed opposite to each other.

[0031] The inner barrier layer 4, as in Embodiment 1, is directly deposited on the first surface of the optical substrate 5 using ALD technology. This inner barrier layer 4 is composed of an amorphous, extremely dense, pinhole-free alumina thin film prepared by atomic layer deposition (ALD), with a thickness of approximately 20 nm (range 15–25 nm). It serves as an internal protective barrier, primarily preventing the upward diffusion of impurity ions (such as sodium and potassium ions) from the optical substrate, while simultaneously providing a pure, stable, and highly adhesive growth starting point for all the overlying film layers. The inner barrier layer 4 and the optical substrate 5 are bonded together through nucleation and growth of the ALD thin film on the substrate. Si-O-Al covalent bonds are formed by the reaction of silanol groups (-SiOH) on the surface of the optical substrate 5 with the ALD precursor. In this embodiment, the optical substrate 5 is an optical glass substrate.

[0032] An antistatic layer 6, comprising an aluminum-doped zinc oxide (AZO) transparent conductive film prepared by atomic layer deposition, is used to dissipate surface static charge. The aluminum doping concentration in the aluminum-doped zinc oxide film is 2.0–8.0 atomic percentages (preferably 5 at.%). This film is an n-type semiconductor material with a polycrystalline or nanocrystalline structure. Its conductivity mechanism is as follows: after aluminum atoms (Al) are doped into the zinc oxide (ZnO) lattice, each... Ion replacement Ions contribute an extra free electron (n-type doping), giving the thin film significant electronic conductivity. When static charge is generated on the lens surface, the AZO layer provides a low-resistance discharge path, rapidly distributing and dissipating the charge, preventing electrostatic dust adsorption.

[0033] This embodiment adds an active antistatic function. When static charge is generated on the lens surface due to friction or other factors, the AZO antistatic layer 6, acting as a continuous and uniform conductive network, immediately provides a low-resistance discharge path for the locally accumulated charge. The charge is rapidly distributed across the entire film surface and dissipated through neutralization with trace amounts of ions with opposite polarities in the air, preventing localized charge accumulation and physically eliminating static electricity. This causes dust and other particles to lose their electrostatic attraction, achieving active antifouling.

[0034] Similar to Example 1, in the antireflection stack 3, high-refractive-index material layers and low-refractive-index material layers are alternately deposited on the inner barrier layer 4 using ALD technology to form a 5-cycle antireflection film system. The high-refractive-index material is titanium dioxide (TiO2). The low refractive index material is silicon dioxide ( ); in The thickness is approximately 12nm. The thickness is approximately 25 nm. By utilizing the principle of optical interference, the reflection loss of the substrate surface in the visible light band is significantly reduced, thereby increasing the overall transmittance of the device.

[0035] Platform layer 2, above inner barrier layer 4, consists of an alumina film deposited using ALD technology, with a thickness of approximately 15 nm (range 10–20 nm). This platform layer 2 is composed of an amorphous, extremely dense, and pinhole-free alumina film prepared by atomic layer deposition. Its functions include: first, as the first line of environmental protection, its dense structure blocks the penetration of external water vapor, oxygen and pollutant ions; second, as an attachment platform, its surface is rich in hydroxyl groups (-OH), providing a chemically active surface for the outermost superhydrophobic layer 1, ensuring its firm adhesion.

[0036] Superhydrophobic layer 1 is formed through a chemical vapor deposition (CVD) surface modification process. The substrate, after all ALD inorganic layers have been deposited, is exposed to a vapor environment of fluorosilanes (e.g., perfluoroalkyl silanes). This superhydrophobic layer 1 is a monolayer structure with a thickness of approximately 1 nm (range 0.8–1.5 nm). Its molecular ends contain perfluoroalkyl chains, imparting extremely low surface energy. This superhydrophobic layer 1 is chemically bonded to the underlying... A highly ordered array is formed on the surface of platform layer 2; The specific reaction process is as follows: fluorosilane molecules... Hydrolysis of the group generates silanol group Subsequently with The hydroxyl groups on the surface undergo a dehydration condensation reaction to form strong Si-O-Al covalent bonds. This superhydrophobic layer 1 achieves superhydrophobic, oleophobic, antifouling, and self-cleaning functions.

[0037] In this embodiment, the antireflection stack 3, the inner barrier layer 4, and the platform layer 2 are all formed by in-situ continuous deposition in the same vacuum reaction chamber using ALD technology. After one layer is deposited, the atmosphere is not introduced, and the deposition cycle for the next layer begins directly. The first precursor molecule of the next film will undergo chemical adsorption and reaction with the surface atoms of the previous layer to form strong covalent bonds (such as Al-O-Si bonds, Ti-O-Si bonds, Ti-O-Al bonds, etc.). The interfaces between adjacent inorganic layers are atomically sharp, pollution-free, and continuous network structures bonded by covalent bonds. The outermost superhydrophobic layer 1 is bonded to the plateau layer 2 via Si-O-Al covalent bonds. The entire membrane system is free of any adhesives, achieving chemical bonding integration across all membrane layers.

[0038] In this embodiment, a second antireflection layer 31 is also formed on the second surface of the optical substrate 5 (opposite to the first surface) using atomic layer deposition technology. The structure of this second antireflection layer 31 is the same as that of the antireflection layer 3 on the first surface. Alternating layers.

[0039] When moisture, dust, oil, or other contaminants from the external environment act on the lens surface, the outermost superhydrophobic layer 1 utilizes its extremely low surface energy to cause water droplets to roll off and carry away dust, achieving self-cleaning. The platform layer 2 acts as an environmental barrier, preventing moisture and corrosive media from penetrating inward. The inner barrier layer 4 blocks impurity ion contamination from the glass substrate. The antireflective stack 3 works efficiently in a clean and stable internal environment, ensuring maximum transmittance of incident light. The entire structure works synergistically to provide the optical lens with durable self-cleaning and protective properties.

[0040] Example 3 like Figure 3As shown, the film structure of this embodiment includes, from top to bottom, the following layers: superhydrophobic layer 1, platform layer 2, antireflective layer 3, photothermal and antistatic composite layer 7, heat insulation layer 8, inner barrier layer 4, optical substrate 5, and second antireflective layer 31.

[0041] Optical substrate 5: Optical substrate 5 includes an optical glass substrate and an optical plastic substrate.

[0042] Thermal insulation layer 8, which is located below the antistatic composite layer and above the inner barrier layer 4, is composed of... Its structure. Its function is to block heat from being transferred to the optical substrate 5 and internal components, and to direct heat to the mirror area for anti-fogging and defrosting.

[0043] A photothermal and antistatic composite layer 7 is deposited on top of the thermal insulation layer 8 using ALD technology. This composite layer consists of an indium tin oxide (ITO) transparent conductive film prepared by atomic layer deposition (ALD) technology, and possesses both near-infrared photothermal conversion and electrostatic dissipation functions. Its photothermal function is based on the material's photothermal conversion effect: the high concentration of free electrons in the ITO film has a strong absorption capacity for photons in the near-infrared band. The excited hot carriers transfer energy to the crystal lattice through electron-phonon scattering, significantly increasing the film temperature. The generated heat is transferred to the mirror surface through thermal conduction, raising the mirror surface temperature above the ambient dew point, thus achieving anti-fogging and defrosting. Its antistatic function is based on the semiconductor conductivity mechanism and electrostatic dissipation principle of the ITO film: tin doping introduces free electrons, giving the film excellent conductivity and enabling rapid dissipation of surface static charge.

[0044] Anti-reflective laminate 3, with the same 5-cycle structure as in Example 1. Layer stack. In this embodiment, the antireflection stack 3 is deposited on top of the ITO layer, and the optical effects of the ITO layer have been taken into account during the optical design.

[0045] Platform layer 2, the same as in embodiment 1, has a thickness of approximately 15nm. (10-20nm range).

[0046] Superhydrophobic layer 1, same as in Example 1, is a perfluoroalkylsilane monolayer (range 0.8-1.5 nm) with a thickness of approximately 1 nm.

[0047] In this embodiment, the heat insulation layer 8, the ITO layer, the antireflective laminate 3, and the platform layer 2 are all chemically bonded by continuous deposition in the same cavity through in-situ ALD process. Insulation layer 8 and the top and bottom Al-O-Si and In-O-Si covalent bonds are formed between the inorganic layers and ITO, respectively. Each adjacent inorganic layer has a sharp, atomically bonded interface. The superhydrophobic layer 1 is bonded to the plateau layer 2 via Si-O-Al covalent bonds.

[0048] A second anti-reflection layer 31 is provided on the second surface of the optical substrate 5.

[0049] This embodiment achieves the core function of active anti-fogging and defrosting. When the lens is in a high-humidity or low-temperature environment and faces the risk of fogging, the ITO layer (photothermal and antistatic composite layer) generates heat through photothermal conversion (utilizing ambient near-infrared light) or Joule heating. The generated heat is conducted upwards, rapidly increasing the lens surface temperature. Heat insulation layer 8 It effectively blocks heat from escaping into the lens, ensuring that heat energy acts efficiently and directionally on the lens surface, keeping the lens surface temperature always above the ambient dew point, thereby actively preventing the formation of fog or frost. Meanwhile, the ITO layer rapidly dissipates surface static charge, reducing dust adsorption; the superhydrophobic layer 1 provides self-cleaning functionality. These three elements work together to provide comprehensive protection for the optical lens in extreme environments.

[0050] Example 4 This embodiment provides a film structure, which includes, from top to bottom: a superhydrophobic layer 1, a platform layer 2, an isolation layer 9, an antireflection stack 3, an inner barrier layer 4, an optical substrate 5, and a second antireflection stack 31. The superhydrophobic layer 1 is a perfluoroalkylsilane monolayer with a thickness of 0.8–1.5 nm, preferably 1 nm, which is bonded to the platform layer 2 through Si-O-Al covalent bonds.

[0051] Platform layer 2 has a thickness of 10–20 nm. The layer, preferably 15 nm, is prepared using atomic layer deposition technology.

[0052] The isolation layer 9 is a high-purity silicon dioxide thin film prepared by atomic layer deposition (ALD) technology, serving as a chemical and stress buffer layer. This layer prevents the overlying platform layer 2 from being affected. With the anti-reflective layer 3 below It prevents unnecessary chemical reactions and alleviates interlayer stress caused by differences in thermal expansion coefficients, thereby enhancing overall mechanical stability.

[0053] Anti-reflective laminate 3 with 5 cycles Alternating layers, prepared using atomic layer deposition technology, provide highly efficient anti-reflection. The antireflective layer 3 provides high light transmittance, the isolation layer 9 prevents interlayer chemical reactions and releases thermal stress, and the superhydrophobic layer 1 gives the surface a self-cleaning function. The synergistic effect of these multiple layers provides comprehensive protection for the long-term stable use of optical components in extreme environments.

[0054] In this process, the antireflection stack 3, the isolation layer 9, and the platform layer 2 are all continuously deposited within the same cavity using an in-situ ALD process, forming atomically sharp covalent bond interfaces between adjacent inorganic layers: the isolation layer 9... Top layer of the anti-reflective layer 3 below Forming Si-O-Ti covalent bonds with the upper plateau layer 2 Al-O-Si covalent bonds are formed. The superhydrophobic layer 1 is anchored to the platform layer 2 by Si-O-Al covalent bonds.

[0055] The inner barrier layer 4 is directly deposited on the first surface of the optical substrate 5 using ALD technology. The inner barrier layer 4 is composed of an alumina thin film prepared by atomic layer deposition technology. It is an amorphous, extremely dense, and pinhole-free thin film with a thickness of approximately 20 nm (range 15–25 nm).

[0056] Optical substrate 5: The optical substrate 5 includes an optical glass substrate and an optical plastic substrate, providing mechanical strength, rigidity, and a main structure, and serving as a medium for light to pass through. The substrate has a first surface and a second surface disposed opposite to each other.

[0057] A second antireflection layer 31 is formed on the second surface of the optical substrate 5 using atomic layer deposition technology. The structure of the second antireflection layer 31 is the same as that of the antireflection layer 3 on the first surface. Alternating layers.

[0058] In summary, this application enables the in-situ continuous growth of each film layer through atomic layer deposition technology, with adjacent layers connected by chemical bonding to form an integrated stacked structure without adhesives. This structure eliminates the weak interface problem caused by the reliance on physical adsorption or van der Waals forces between traditional film layers, greatly improving the interlayer bonding force, and resulting in gap-free and pollution-free interfaces with atomically flat surfaces. Therefore, the present invention significantly improves the overall mechanical and thermal stability of the coating layer, enabling it to withstand high and low temperature cycles and frequent wiping without delamination or peeling, thus greatly extending the service life and reliability of lens coatings.

[0059] In the description of this invention, preferred embodiments of the invention have been described in detail above. However, the invention is not limited to the specific details of the above embodiments. Within the scope of the technical concept of the invention, various simple modifications can be made to the technical solution of the invention, and these simple modifications all fall within the protection scope of the invention.

[0060] It should also be noted that the various specific technical features described in the above specific embodiments can be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, the present invention will not describe the various possible combinations separately.

Claims

1. An optical coating structure, characterized in that, The optical substrate includes, from the outside to the inside, at least the following: A superhydrophobic layer, which consists of a monolayer of fluorosilane compounds formed by chemical bonding; A platform layer is formed by an alumina film prepared by atomic layer deposition technology, wherein the alumina film contains hydroxyl groups that provide a chemically active surface for the superhydrophobic layer; An antireflective layer is composed of alternating layers of high and low refractive index media formed by atomic layer deposition technology; An inner barrier layer, which is composed of a metal oxide barrier film formed by atomic layer deposition technology, is located between the optical substrate and the antireflection stack; The inner barrier layer is used to block corrosive media in the environment and to prevent impurity ions in the optical substrate from diffusing upwards into the antireflection film system. The platform layer forms Si-O-Al covalent bonds by undergoing a dehydration condensation reaction between the hydroxyl groups on its surface and the silanol groups of the fluorosilane compound in the superhydrophobic layer, thereby achieving chemical bonding of the superhydrophobic layer on the platform layer. The superhydrophobic layer, platform layer, antireflective stack, and inner barrier layer are formed by in-situ continuous growth using atomic layer deposition technology, and adjacent layers are connected by chemical bonding to form an integrated stacked structure without adhesives.

2. The optical coating structure according to claim 1, characterized in that, The antireflection stack is a multilayer film system composed of alternating layers of high-refractive-index material and low-refractive-index material deposited by atomic layer deposition technology. The high-refractive-index material is titanium dioxide, and the low-refractive-index material is silicon dioxide. The number of cycles in the multilayer film system is 3 to 7.

3. The optical coating structure according to claim 1, characterized in that: Both the platform layer and the inner barrier layer are composed of an amorphous, extremely dense, and pinhole-free aluminum oxide film. The thickness of the platform layer is 10–20 nm, and the thickness of the inner barrier layer is 15–25 nm.

4. The optical coating structure according to claim 1, characterized in that: The superhydrophobic layer has a monolayer structure with a thickness of 0.8–1.5 nm, and the fluorosilane compound is a perfluoroalkylsilane with a perfluoroalkyl chain at the end of its molecule.

5. The optical coating structure according to claim 1, characterized in that: It also includes an antistatic layer located between the antireflection stack and the inner barrier layer. The antistatic layer is composed of an aluminum-doped zinc oxide transparent conductive film prepared by atomic layer deposition technology and is used to dissipate surface static charge.

6. The optical coating structure according to claim 5, characterized in that: The aluminum doping concentration in the aluminum-doped zinc oxide thin film is 2.0 to 8.0 atomic percentages, and the aluminum-doped zinc oxide thin film is an n-type semiconductor material with a polycrystalline or nanocrystalline structure.

7. The optical coating structure according to claim 1, characterized in that: It also includes a photothermal and antistatic composite layer, which is located between the antireflective stack and the inner barrier layer. The photothermal and antistatic composite layer is composed of an indium tin oxide transparent conductive film prepared by atomic layer deposition technology. The indium tin oxide transparent conductive film has both near-infrared photothermal conversion function and electrostatic dissipation function.

8. The optical coating structure according to claim 7, characterized in that: It also includes a heat insulation layer, which is located between the inner barrier layer and the photothermal and antistatic composite layer; The heat insulation layer is used to block heat from being transferred to the optical substrate and internal components, and to direct heat to the mirror area for anti-fogging and defrosting.

9. The optical coating structure according to claim 1, characterized in that: The antireflection stack, platform layer, and inner barrier layer are all formed by in-situ continuous deposition in the same vacuum reaction chamber using atomic layer deposition technology. The interfaces between adjacent inorganic layers are atomically sharp, pollution-free, and continuous network structures bonded by covalent bonds.

10. An optical lens, characterized in that: The optical coating structure according to any one of claims 1 to 9 further includes an optical substrate, the optical substrate including a first surface and a second surface disposed opposite to the first surface, and the inner barrier layer is disposed on the first surface by atomic deposition technology; The second surface is provided with a second antireflection layer by atomic deposition technology.

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