Exposure apparatus and substrate support assembly

Abstract

The application provides an exposure device and a substrate support assembly. The exposure device comprises a substrate table, a light emitting system and a light transmitting cover plate. The substrate table is used for carrying a substrate. The light emitting system is arranged above the substrate. The side of the light emitting system facing the substrate is provided with a light emitting surface. The light emitting surface is provided with a light emitting area. The light emitting area emits light rays along a first direction towards the substrate. The projection of the substrate along the opposite direction of the first direction covers the light emitting area. The light transmitting cover plate is at least partially arranged between the light emitting area and the substrate. The projection of the light transmitting cover plate along the opposite direction of the first direction at least covers the light emitting area. The side of the light transmitting cover plate facing the substrate forms a smooth surface. The smooth surface has oppositely arranged first and second ends. The vertical distance from the smooth surface to the substrate table gradually decreases along a second direction. The second direction is from the first end to the second end. The application can reduce the interference of substrate exhaust on the light rays emitted by the light emitting area, improve the light transmission rate and improve the substrate exposure effect.

Description

Technical Field

[0001] This application relates to the field of optical exposure technology, and in particular to an exposure apparatus and a substrate support assembly. Background Technology

[0002] With the continuous development of science and technology, the manufacturing of devices such as LCD panels and semiconductor devices plays an increasingly important role in industrial applications. In the manufacturing process of LCD panels and semiconductor devices, exposure equipment is typically used to expose the substrate. During the exposure process, when light is emitted from the light-emitting system onto the substrate, the photosensitive materials such as the resist on the substrate generate exhaust gases. These exhaust gases react with impurities in the air, or with acid, alkali, or organic impurities in the surface film of the light-emitting area of ​​the light-emitting system, forming atomized droplets. When these atomized droplets float in the light path or adhere to the surface of the light-emitting area, they reduce light transmittance and affect the exposure effect. Summary of the Invention

[0003] This application provides an exposure apparatus and a substrate support assembly, which can reduce the interference of substrate exhaust on the light emitted from the light-emitting area, improve light transmittance, and improve the substrate exposure effect.

[0004] To address the aforementioned technical problems, this application provides an exposure apparatus comprising a substrate stage, a light-emitting system, and a light-transmitting cover plate. The substrate stage is used to support a substrate. The light-emitting system is disposed above the substrate and has a light-emitting surface on one side facing the substrate. The light-emitting surface has a light-emitting area, and the light-emitting area emits light rays toward the substrate along a first direction. The projection of the substrate along the opposite direction of the first direction covers the light-emitting area. The light-transmitting cover plate is at least partially disposed between the light-emitting area and the substrate, and the projection of the light-transmitting cover plate along the opposite direction of the first direction at least covers the light-emitting area. The light-transmitting cover plate forms a smooth surface on one side facing the substrate. The smooth surface has a first end and a second end disposed opposite to each other. The vertical distance from the smooth surface to the substrate stage gradually decreases along a second direction, which is the direction from the first end to the second end.

[0005] To address the aforementioned technical problems, this application further provides a substrate support assembly for the aforementioned exposure apparatus. The exposure apparatus includes a substrate support assembly and a light-emitting system. The light-emitting system is disposed above the substrate and has a light-emitting surface on one side facing the substrate. The light-emitting surface has a light-emitting area, and the light-emitting area emits light towards the substrate along a first direction. The projection of the substrate along the opposite direction of the first direction covers the light-emitting area. The substrate support assembly includes a substrate stage and a light-transmitting cover plate. The substrate stage supports the substrate. The light-transmitting cover plate is at least partially disposed between the light-emitting area and the substrate, and the projection of the light-transmitting cover plate along the opposite direction of the first direction at least covers the light-emitting area. The light-transmitting cover plate forms a smooth surface on one side facing the substrate. The smooth surface has a first end and a second end disposed opposite to each other. The vertical distance from the smooth surface to the substrate stage gradually decreases along a second direction, which is the direction from the first end to the second end.

[0006] The beneficial effects of this application are as follows: The exposure apparatus of this application includes a substrate stage, a light-emitting system, and a light-transmitting cover plate. The substrate stage is used to support the substrate; the light-emitting system is used to be disposed above the substrate, and the light-emitting system has a light-emitting surface on one side facing the substrate, the light-emitting surface has a light-emitting area, the light-emitting area emits light towards the substrate along a first direction, and the projection of the substrate along the opposite direction of the first direction covers the light-emitting area; the light-transmitting cover plate is at least partially disposed between the light-emitting area and the substrate, and the projection of the light-transmitting cover plate along the opposite direction of the first direction at least covers the light-emitting area; wherein, the light-transmitting cover plate is used to form a smooth surface on one side facing the substrate, the smooth surface has a first end and a second end disposed opposite to each other, the vertical distance from the smooth surface to the substrate stage gradually decreases along a second direction, the second direction being the direction from the first end to the second end. By employing the above method, a light-transmitting cover plate is at least partially disposed between the light-emitting area and the substrate, and its projection in the opposite direction to the first direction at least covers the light-emitting area. This prevents gas venting generated on the substrate, as well as atomized droplets generated by the reaction of gas venting with impurities, from floating and rising to the light-emitting area, thus reducing the interference of substrate gas venting on the light emitted from the light-emitting area. Furthermore, since light passes through the light-transmitting cover plate, a light-passing area also exists on the cover plate. The side of the light-transmitting cover plate facing the substrate forms a smooth surface, and the vertical distance from the smooth surface to the substrate gradually decreases along the second direction. This allows the smooth surface to extend downwards from the first end to the second end, enabling droplets that float to the smooth surface and adhere to it to slide towards the second end of the smooth surface, thereby allowing them to flow out of the light-passing area of ​​the light-transmitting cover plate. Therefore, the interference of droplets on the emitted light is reduced when light passes through the light-transmitting cover plate. Thus, this application can reduce the interference of substrate gas venting on the light emitted from the light-emitting area, improve light transmittance, and enhance the substrate exposure effect. Attached Figure Description

[0007] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort. Wherein:

[0008] Figure 1 This is a schematic diagram of one embodiment of the exposure apparatus of this application;

[0009] Figure 2 This is a schematic diagram of another embodiment of the exposure apparatus of this application;

[0010] Figure 3 This is a schematic diagram of another embodiment of the exposure apparatus of this application;

[0011] Figure 4 This is a schematic diagram of another embodiment of the exposure device of this application;

[0012] Figure 5 This is a cross-sectional structural schematic diagram of one embodiment of the light-transmitting cover plate of this application. Detailed Implementation

[0013] In the following description, specific details such as particular system architectures and techniques are set forth for illustrative purposes and not for limitation, in order to provide a thorough understanding of the embodiments of this application. However, those skilled in the art will understand that this application may also be implemented in other embodiments without these specific details. In other instances, detailed descriptions of well-known systems, apparatuses, circuits, and methods have been omitted so as not to obscure the description of this application with unnecessary detail.

[0014] The terms “first,” “second,” etc., used in this application are used to distinguish different objects, not to describe a specific order. Furthermore, the terms “comprising” and “having,” and any variations thereof, are intended to cover non-exclusive inclusion. It should be understood that, when used in this specification and the appended claims, the term “comprising” indicates the presence of the described feature, integral, step, operation, element, and / or component, but does not exclude the presence or addition of one or more other features, integrals, steps, operations, elements, components, and / or collections thereof. It should also be understood that the terminology used in this specification is for the purpose of describing particular embodiments only and is not intended to limit the application. As used in this specification and the appended claims, the singular forms “a,” “an,” and “the” are intended to include the plural forms unless the context clearly indicates otherwise. It should also be further understood that the term “and / or,” as used in this specification and the appended claims, refers to any combination and all possible combinations of one or more of the associated listed items, and includes such combinations.

[0015] It should be noted that when one element is fixed to another element, this includes fixing the element directly to the other element or fixing the element to the other element through at least one other intermediate element. When one element is connected to another element, this includes connecting the element directly to the other element or connecting the element to the other element through at least one other intermediate element.

[0016] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0017] With the continuous development of science and technology, the manufacturing of devices such as LCD panels and semiconductor devices plays an increasingly important role in industrial applications. In the manufacturing process of LCD panels and semiconductor devices, exposure equipment is typically used to expose the substrate. During the exposure process, when light is emitted from the light-emitting system onto the substrate, the photosensitive materials such as the resist on the substrate generate exhaust gases. These exhaust gases react with impurities in the air, or with acid, alkali, or organic impurities in the surface film of the light-emitting area of ​​the light-emitting system, forming atomized droplets. When these atomized droplets float in the light path or adhere to the surface of the light-emitting area, they reduce light transmittance and affect the exposure effect.

[0018] This application first proposes an exposure device, such as Figures 1 to 5 As shown, Figure 1 This is a schematic diagram of one embodiment of the exposure apparatus of this application; Figure 2 This is a schematic diagram of another embodiment of the exposure apparatus of this application; Figure 3 This is a schematic diagram of another embodiment of the exposure apparatus of this application;

[0019] Figure 4 This is a schematic diagram of another embodiment of the exposure device of this application; Figure 5 This is a cross-sectional structural schematic diagram of one embodiment of the light-transmitting cover plate of this application. For example... Figures 1 to 4As shown, the exposure apparatus includes a substrate stage 20, a light-emitting system 40, and a light-transmitting cover plate 10. The substrate stage 20 is used to support a substrate 30; the light-emitting system 40 is disposed above the substrate 30, and has a light-emitting surface (not shown) on one side facing the substrate 30. The light-emitting surface has a light-emitting area 42, and the light-emitting area 42 emits light towards the substrate 30 along a first direction y1. The projection of the substrate 30 along the opposite direction of the first direction y1 covers the light-emitting area 42; the light-transmitting cover plate 10 is at least partially disposed between the light-emitting area 42 and the substrate 30, and the projection of the light-transmitting cover plate 10 along the opposite direction of the first direction y1 at least covers the light-emitting area 42; wherein, the light-transmitting cover plate 10 forms a smooth surface 11 on one side facing the substrate 30, the smooth surface 11 has a first end 111 and a second end 112 disposed opposite to each other, and the vertical distance h from the smooth surface 11 to the substrate stage 20 gradually decreases along a second direction x, the second direction x being the direction from the first end 111 to the second end 112.

[0020] The vertical distance h refers to the spacing in the vertical direction y.

[0021] In one application scenario, during exposure processing, the light-emitting system 40 is positioned above the substrate 30, and the light-transmitting cover plate 10 is at least partially positioned between the light-emitting area 42 and the substrate 30. The light-emitting area 42, the portion of the light-transmitting cover plate 10 positioned between the light-emitting area 42 and the substrate 30, and the substrate 30 are arranged in the vertical direction y.

[0022] In one application scenario, an optical element 41 is provided on the light-emitting surface of the light-emitting system 40, and the optical element 41 forms a light-emitting region 42.

[0023] The projection of the substrate 30 along the opposite direction of the first direction y1 covers the light-emitting region 42, which enables the light-emitting region 42 to expose the substrate 30.

[0024] The light-transmitting cover plate 10 is at least partially disposed between the light-emitting region 42 and the substrate 30, and its projection along the opposite direction of the first direction y1 at least covers the light-emitting region 42. This allows light emitted from the light-emitting region 42 to pass through the light-transmitting cover plate 10 and reach the substrate 30 for exposure processing. The light-transmitting cover plate 10 can prevent exhaust gas generated on the substrate 30, atomized droplets generated by the reaction of exhaust gas with impurities contained in the air, etc., from floating and rising to the light-emitting region 42, thus reducing their interference with the light-emitting region 42.

[0025] The light-transmitting cover plate 10 is located on the exposure light path, and the area through which light passes on the light-transmitting cover plate 10 can be defined as the light-passing area of ​​the light-transmitting cover plate 10.

[0026] The side of the light-transmitting cover 10 facing the substrate 30 can be defined as the first side surface. The first side surface forms a smooth surface 11, and the vertical distance h from the smooth surface 11 to the substrate 30 gradually decreases along the second direction x. This allows the smooth surface 11 to extend downwards from the first end 111 to the second end 112, enabling droplets that float to the smooth surface 11 and adhere to it to slide towards the second end 112. In one application scenario, when the exposure apparatus also includes a gas supply system 51, the gas supply system 51 can be configured to supply gas from the first end 111 to the second end 112 of the smooth surface 11 to increase the droplet flow rate. At the same time, by setting the vertical distance h from the smooth surface 11 to the substrate 30 to gradually decrease along the second direction x, airflow resistance can be reduced, airflow speed can be increased, and droplet flow speed can be further increased. This reduces the risk of droplets adhering to the light-transmitting area of ​​the light-transmitting cover 10 and affecting light transmission.

[0027] It should be noted that the specific shape of the light-transmitting cover plate 10 is not limited, that is, the light-transmitting cover plate 10 can have a smooth surface 11 formed on one side facing the substrate 30, and the vertical distance h from the smooth surface 11 to the substrate stage 20 gradually decreases along the second direction x.

[0028] By means of the above method, the light-transmitting cover plate 10 is at least partially disposed between the light-emitting area 42 and the substrate 30, and its projection in the opposite direction of the first direction y1 at least covers the light-emitting area 42. This can prevent the exhaust gas generated on the substrate 30, the atomized droplets generated by the reaction of exhaust gas and impurities, and other substances from floating up to the light-emitting area 42, thereby reducing their interference with the light emitted from the light-emitting area 42. Furthermore, since light passes through the light-transmitting cover plate 10, there is also a light-passing area on the light-transmitting cover plate 10. A smooth surface 11 is formed on one side of the light-transmitting cover plate 10 facing the substrate 30. The vertical distance h from the smooth surface 11 to the substrate 30 gradually decreases along the second direction x. This allows the smooth surface 11 to extend downward from the first end 111 to the second end 112. This allows the droplets that float up to the smooth surface 11 and adhere to the smooth surface 11 to slide towards the second end 112 of the smooth surface 11, thereby allowing them to flow out of the light-passing area of ​​the light-transmitting cover plate 10. Therefore, the interference of droplets with the emitted light can be reduced when light passes through the light-transmitting cover plate 10. Therefore, this application can reduce the interference of the exhaust gas of the substrate 30 on the light emitted from the light-emitting region 42, improve the light transmittance, and improve the exposure effect of the substrate 30.

[0029] In some embodiments, the light-emitting system 40 includes a projection optics system with a predetermined projection magnification. The projection optics system projects the original pattern image onto the resist of the substrate 30 using patterned light to expose the substrate 30, thereby transferring the pattern from the original image onto the substrate 30. The projection optics system is a core module for achieving high-precision pattern transfer, especially in the semiconductor technology field, where its performance directly determines the process node and chip yield.

[0030] In some embodiments, the exposure apparatus further includes an illumination optics system (not shown), a stage (not shown), and a controller (not shown). The illumination optics system is used to emit light to the projection optics system.

[0031] In this embodiment, the exposure apparatus can be a step-scan exposure device, which exposes the substrate 30 while scanning both the original and the substrate 30, thereby transferring the pattern of the original onto the substrate 30. The exposure apparatus is also referred to as a scanning exposure device or scanner. In this embodiment, the original is, for example, a quartz mask on which circuit patterns, etc., are formed in each of a plurality of impact areas to be transferred onto the substrate 30. The substrate 30 is a wafer coated with photoresist, and, for example, a single-crystal silicon substrate can be used. In this embodiment, a step-scan exposure apparatus is described exemplarily, but this application can also be applied to step-repeat exposure apparatuses, etc.

[0032] The controller, for example, is formed by a computer including a CPU and memory, and is electrically connected to the various units in the exposure apparatus, thereby enabling the overall operation of the exposure apparatus.

[0033] The illumination optics system can be, for example, a mercury lamp, an ArF excimer laser, or a KrF excimer laser.

[0034] In some embodiments, the illumination optics system shapes light emitted from a light source into, for example, a strip or arc-shaped slit, and uses this slit-shaped light to illuminate a portion of the original image. The light passing through that portion of the original image enters the projection optics system (i.e., the light-emitting system 40) as pattern light reflecting that portion of the original image. The projection optics system has a predetermined projection magnification and projects the pattern image of the original image onto the substrate 30 using the pattern light. The original image and the substrate 30 are supported by an original image stage and a substrate stage 20, respectively, and are arranged in an optically conjugate position via the projection optics system. The controller synchronously scans the original image stage and the substrate stage 20 relative to each other in a predetermined scanning direction at a speed ratio matched to the projection magnification of the projection optics system. Using this arrangement, the pattern of the original image can be transferred onto the substrate 30.

[0035] In one implementation, such as Figures 1 to 4 As shown, the exposure apparatus also includes a gas supply system 51, the projection of which is located outside the light-emitting area 42 in the opposite direction of the first direction y1; a gas supply space 50 is formed between the substrate stage 20 and the light-transmitting cover plate 10, the gas supply space 50 has an air inlet side 501 and an air outlet side 502, the gas supply system 51 supplies airflow from the air inlet side 501 to the gas supply space 50, the air inlet side 501 is disposed near the first end 111, and the air outlet side 502 is disposed near the second end 112.

[0036] Specifically, the light emitted from the light-emitting area 42 passes through the light-transmitting cover plate 10 and enters the gas supply space 50. After passing through the gas supply space 50, it reaches the substrate 30. The exhaust gas from the substrate 30 and the fog generated by the reaction of exhaust gas and impurities in the gas supply space 50 will affect the light emission effect. Therefore, the gas supply system 51 is set up to deliver airflow in a specific direction into the gas supply space 50, which is conducive to removing exhaust gas, fog and other impurities from the gas supply space 50. This can improve the purity of the gas supply space 50, reduce the interference of impurities in the gas supply space 50 on the light emission, and improve the exposure effect of the substrate 30.

[0037] The air supply space 50 can be a semi-open space or a sealed space with an air inlet and an air outlet. Within the air supply space 50, the airflow flows from the air inlet side 501 to the air outlet side 502. By positioning the air inlet side 501 closer to the first end 111 and the air outlet side 502 closer to the second end 112, the airflow direction is such that it flows from the first end 111 to the second end 112 of the smooth surface 11, which helps to remove droplets adhering to the smooth surface 11 using the airflow.

[0038] For example, an air outlet can be formed on the air outlet side 502, and the method of forming the air outlet is not limited. For example, as Figure 2 As shown, the air outlet can be formed by the gap between the light-transmitting cover plate 10 and the substrate stage 20; for example, as Figure 1 , Figure 3 , Figure 4 As shown, the leeward area of ​​the light-transmitting cover plate 10 covers the substrate stage 20, forming an air outlet in the leeward area, so that the airflow carries the droplets from the first end 111 to the second end 112, and then flows out of the air outlet and out of the air supply space 50.

[0039] By setting the projection of the gas supply system 51 in the opposite direction to the first direction y1 outside the light-emitting area 42, the interference of the gas supply system 51 on the light path of the substrate 30 exposure can be reduced. Since fog will be generated in the gas supply space 50, the gas supply system 51 is set to supply airflow from the air inlet side 501 to the gas supply space 50, so that the fog in the gas supply space 50 can be blown from the air inlet side 501 to the air outlet side 502, reducing the risk of fog accumulation in the gas supply space 50 and reducing the risk of fog rising to the smooth surface 11 and causing droplets to adhere. Furthermore, since the air inlet side 501 is set close to the first end 111 and the air outlet side 502 is set close to the second end 112, the flow of air can be used to provide sliding force for the droplets attached to the smooth surface 11, promoting the droplets to slide from the first end 111 to the second end 112, and then slide out of the light-transmitting area of ​​the light-transmitting cover plate 10.

[0040] Furthermore, the first end 111 to the second end 112 of the smooth surface 11 are inclined downwards, which allows the cross-sectional area of ​​the air delivery space 50 to gradually decrease along the second direction x, thereby accelerating the airflow velocity, improving the driving effect on the droplets, and increasing the droplet sliding speed.

[0041] In one implementation, such as Figure 1 , Figure 2 As shown, in the first vertical plane a parallel to the second direction x, the cross-section of the smooth surface 11 is arc-shaped; the second direction x is the direction from the first end 111 to the second end 112.

[0042] It should be noted that, in this application, a vertical plane refers to a plane that is parallel to the vertical direction y and perpendicular to the horizontal plane.

[0043] Wherein, the first vertical plane a is a vertical plane parallel to the second direction x, and the smooth surface 11 has an arc-shaped cross section in the first vertical plane a, which allows the smooth surface 11 to extend downward from the first end 111 to the second end 112 in an arc shape, and the droplets on the smooth surface 11 can slide from the first end 111 to the second end 112 along the arc-shaped slide.

[0044] In the above manner, the cross-section of the smooth surface 11 in the first vertical plane a can be made arc-shaped. This setting can increase the rate at which the droplet slides toward the second end 112 of the smooth surface 11. In one application scenario, when the exposure device also includes an air supply system 51, the air supply system 51 can be set to supply air from the first end 111 of the smooth surface 11 toward the second end 112 to increase the droplet flow speed. This arc-shaped setting can increase the airflow speed, thereby increasing the droplet sliding speed.

[0045] In other implementations, such as Figure 3 As shown, in the first vertical plane a parallel to the second direction x, the cross section of the smooth surface 11 is a straight line.

[0046] This configuration allows the smooth surface 11 to extend downwards from the first end 111 to the second end 112 in the form of a smooth slope, which can reduce the flow path of the droplet as it slides from the first end 111 to the second end 112 on the smooth surface 11, and shorten the time it takes for the droplet to slide out of the light-transmitting area of ​​the light-transmitting cover plate 10.

[0047] In one implementation, such as Figure 1 As shown, the light-transmitting cover 10 is an arc-shaped cover.

[0048] The thickness of the light-transmitting cover plate 10 can be reduced by the above method. For example, when the cross-section of the smooth surface 11 in the first vertical plane a parallel to the second direction x is arc-shaped, the light-transmitting cover plate 10 is set as an arc-shaped cover plate, and the inner side of the arc-shaped cover plate can be directly used as the smooth surface 11. The structure is simple and easy to obtain, which helps to reduce production costs.

[0049] Furthermore, the curved cover plate helps to make the shape of the side of the light-transmitting cover plate 10 facing the light-emitting area 42 match the shape of the smooth surface 11 (both are curved), thereby reducing the thickness of the light-transmitting cover plate 10 in the first direction y1. For example, the distance between the side of the light-transmitting cover plate 10 facing the light-emitting area 42 and the smooth surface 11 can be equal everywhere, so as to improve the thickness uniformity of the light-transmitting cover plate 10 at all points while reducing the thickness, and reduce the interference of the light-transmitting cover plate 10 on the light emitted to the substrate 30.

[0050] Similarly, in other embodiments, such as Figure 3 As shown, the smooth surface 11 can be configured such that its cross-section in the first vertical plane a is a straight line, and the light-transmitting cover plate 10 includes at least a light-transmitting flat plate. The smooth surface 11 is formed on the side of the light-transmitting flat plate facing the substrate 30 to reduce the thickness of the light-transmitting cover plate 10. For example, the light-transmitting flat plate is inclined between the light-emitting region 42 and the substrate 30, so that the vertical distance h from the light-transmitting flat plate to the substrate stage 20 gradually decreases along the second direction x, and the smooth surface 11 is formed on the side of the light-transmitting flat plate facing the substrate 30. This configuration facilitates the use of the smooth inclined surface of the light-transmitting flat plate as the smooth surface 11, and the flat plate structure is easy to obtain, simple in structure, and easy to manufacture and assemble.

[0051] In other embodiments, depending on the needs of use, the shape of the side of the light-transmitting cover 10 facing the light-emitting area 42 can be other shapes to change the thickness of the light-transmitting cover 10 at various points in the first direction y1, thereby adjusting the interference effect of the light-transmitting cover 10 on the passing light and optimizing the exposure effect of the light-emitting area 42 on the substrate 30.

[0052] In one implementation, such as Figure 1 , Figure 5 As shown, the light-transmitting cover plate 10 has a plurality of through grooves 12 extending along the second direction x on the side facing the substrate 30, and the opening of the through groove 12 faces the substrate 30 along the first direction y1; the inner wall of the through groove 12 has a smooth surface 11; the second direction x is the direction from the first end 111 to the second end 112.

[0053] The light-transmitting cover plate 10 has multiple through grooves 12 extending along the second direction x on the side facing the substrate 30, i.e., multiple through grooves 12 extending along the second direction x are formed on the first side; the inner wall of the through groove 12 forms a smooth surface 11, i.e., multiple smooth surfaces 11 can be formed on the first side through the through groove 12.

[0054] Since the first side faces the substrate 30, atomized droplets are easily attached to each area on the first side. Therefore, by opening multiple through grooves 12 in the above manner, it is helpful to divert and guide the droplets attached to the first side, so that droplets in different areas on the first side can slide along the second direction x to the second end 112 through the smooth surface 11 of the corresponding through groove 12. This diversion and guidance can improve the flow rate of the droplets.

[0055] Furthermore, in one application scenario, when the exposure apparatus also includes an air delivery system 51 that delivers air from the first end 111 to the second end 112, multiple through slots 12 are provided to divert the airflow at the first side, so that the airflow near the first side can flow in different through slots 12 respectively. Therefore, the airflow velocity near the first side can be increased, and the uniformity of the airflow velocity can also be improved. In turn, the airflow can be improved to carry away the atomized droplets and the exhaust gas of the substrate 30, and the impact of the atomized droplets and the exhaust gas of the substrate 30 on the light transmission effect of the light-transmitting cover plate 10 can be reduced.

[0056] In one implementation, such as Figure 5 As shown, the cross-section of the smooth surface 11 within the second vertical plane b is arc-shaped; the second vertical plane b is perpendicular to the first vertical plane a, and the first vertical plane a is parallel to the second direction x.

[0057] It should be noted that the number of smooth surfaces 11 formed on the first side is not limited. For example, when the first side contains only one smooth surface 11, the cross-section of the smooth surface 11 in the second vertical plane b is arc-shaped.

[0058] For example, multiple through-slots 12 are formed on the first side, and the inner wall of each through-slot 12 is formed with a smooth surface 11. The cross-section of each smooth surface 11 in the second vertical plane b is arc-shaped. This structure can effectively reduce flow resistance. When the airflow flows through the through-slot 12, the arc-shaped through-slot 12 can improve the smoothness of airflow and improve the convenience of airflow carrying away atomized droplets.

[0059] For example, in other embodiments, the inner wall of each through groove 12 may also form multiple smooth surfaces 11, which will not be described in detail here.

[0060] In other embodiments (not shown), the cross-section of the smooth surface 11 in the second vertical plane b can also be of other shapes. For example, the cross-section of the smooth surface 11 in the second vertical plane b can be a straight line.

[0061] In one implementation, such as Figure 5 As shown, the cross-section of the through-slot 12 in the second vertical plane b is arc-shaped. In this way, each through-slot 12 can form a smooth surface 11, which is simple in structure and has low flow resistance.

[0062] In other embodiments (not shown), the cross-section of the through groove 12 in the second vertical plane b is square or trapezoidal. In this way, each through groove 12 can form three smooth surfaces 11, resulting in a simple structure.

[0063] In other embodiments, the cross-section of the through groove 12 in the second vertical plane b may also be of other shapes.

[0064] In one implementation, such as Figure 5 As shown, a baffle 13 is provided between adjacent through slots 12. The baffle 13 extends toward the substrate stage 20 along the first direction y1 and is spaced apart from the substrate 30.

[0065] The baffle 13 can improve the diversion effect and further increase the airflow velocity in each channel 12.

[0066] In some embodiments, baffles 13 are provided on both sides of the through groove 12 to increase the airflow velocity within the through groove 12.

[0067] In some embodiments, the baffle 13 may also be configured as a light-transmitting structure to reduce interference with the exposure light.

[0068] In one implementation, such as Figure 1 , Figure 3 , Figure 4 As shown, the exposure apparatus also includes an air inlet pipe 52, the air inlet of which is connected to the air supply system 51, and the air outlet of which is connected to the air supply space 50; the air outlet of the air inlet pipe 52 faces the first end 111.

[0069] The air inlet of the air inlet pipe 52 can serve as the air intake side 501 of the air delivery space 50. The airflow of the air delivery system 51 flows into the air delivery space 50 through the air inlet pipe 52, and the air inlet pipe 52 exits towards the first end 111 of the smooth surface 11, so that the airflow starts blowing from the first end 111 of the smooth surface 11.

[0070] In one application scenario, when multiple smooth surfaces 11 are formed on the first side, the exposure device includes multiple air inlet pipes 52, and the air outlet of each air inlet pipe 52 is directed toward the first end 111 of the corresponding smooth surface 11.

[0071] By setting the air inlet pipe 52 for air delivery in the above manner, the air delivery accuracy of the air delivery system 51 can be improved, so that the airflow can flow from the first end 111 to the second end 112, and the airflow can flow over the entire smooth surface 11 to carry away the atomized droplets in the entire smooth surface 11 and improve the exposure effect.

[0072] In some embodiments (not shown), the outlet of the air inlet pipe 52 is arranged radially horizontally.

[0073] Specifically, an air intake pipe 52 can be provided on the side of the first end 111 away from the second end 112, so that the airflow flows from the side of the first end 111 away from the second end 112 into the first end 111 of the smooth surface 11, and then flows along the smooth surface 11 to the second end 112, so as to reduce the flow resistance when the airflow flows in the smooth surface 11.

[0074] In one implementation, such as Figure 1 , Figure 3 , Figure 4 As shown, the exposure apparatus also includes a sealing member 60, which is disposed near the first end 111 and together with the light-transmitting cover plate 10 covers the substrate stage 20 to form a first sealing cavity 601. The first sealing cavity 601 serves as an air supply space 50. The air inlet of the first sealing cavity 601 is close to the air inlet side 501 of the air supply space 50, and the air outlet of the first sealing cavity 601 is close to the air outlet side 502 of the air supply space 50. The light emitted from the light-emitting area 42 passes through the light-transmitting cover plate 10 and reaches the substrate 30 to form an exposure area (not shown in the figure). At least the exposure area is located within the first sealing cavity 601.

[0075] The projection of the seal 60 in the opposite direction to the first direction y1 is located outside the light-emitting region 42.

[0076] Specifically, the first sealing cavity 601 forms a closed air supply space 50, which facilitates the reduction of the return of substances discharged from the air supply space 50 to the air supply space 50.

[0077] The distance from the first end 111 of the smooth surface 11 to the substrate stage 20 is greater than the distance from the second end 112 to the substrate stage 20. Therefore, the sealing element 60 is set close to the first end 111 to facilitate the connection between the light-transmitting cover plate 10 and the substrate stage 20, thereby achieving a seal. In one application scenario, the side of the light-transmitting cover plate 10 close to the second end 112 can directly abut against the substrate stage 20 to achieve a seal, thereby realizing the structure in which the sealing element 60 and the light-transmitting cover plate 10 together cover the substrate stage 20.

[0078] Specifically, at least the exposure area is located within the first sealed cavity 601, which allows the exhaust gas generated on the substrate 30 during exposure to be located within the first sealed cavity 601 and thus carried away by the airflow, preventing any missed exhaust gas from affecting the exposure effect of the substrate 30.

[0079] In this way, the sealing element 60 and the light-transmitting cover plate 10 can form a closed air supply space 50, which reduces the risk of atomized droplets flowing out of the air supply space 50 and exhaust gas from the substrate 30 flowing back into the air supply space 50, improves the purity of the air supply space 50, and thus reduces the interference of impurities in the air supply space 50 on the emitted light, thereby improving the exposure effect of the substrate 30.

[0080] In some implementations, such as Figure 1 , Figure 3 As shown, the substrate 30 is disposed on the substrate stage 20 and located within the first sealing cavity 601, which can further improve the sealing effect. In other embodiments, such as Figure 4 As shown, the exposure area of ​​the substrate 30 can also be located inside the first sealing cavity 601, and the sealing member 60 can be disposed on the substrate 30.

[0081] In one implementation, such as Figure 1 , Figure 3 , Figure 4 As shown, the exposure apparatus also includes an air inlet pipe 52 disposed within the first sealing cavity 601; a second sealing cavity 602 is formed within the sealing member 60, the air inlet of the second sealing cavity 602 is connected to the air supply system 51, the air outlet of the second sealing cavity 602 is connected to the air inlet of the air inlet pipe 52, and the air outlet of the air inlet pipe 52 is connected to the first sealing cavity 601 and faces the first end 111.

[0082] Specifically, the air inlet of the air inlet pipe 52 can serve as the air inlet of the first sealed cavity 601. The airflow of the air delivery system 51 first flows into the second sealed cavity 602, and then enters the first sealed cavity 601 (i.e., the air delivery space 50) through the air inlet pipe 52, and exits towards the first end 111 of the smooth surface 11.

[0083] In one application scenario, the substrate 30 is placed on the substrate stage 20 and located within the first sealed cavity 601. The air inlet and outlet of the first sealed cavity 601 are closed, the first sealed cavity 601 is evacuated, and gas is introduced into the second sealed cavity 602. During the exposure process of the substrate 30, the air inlet and outlet of the first sealed cavity 601 are opened. Due to the pressure difference, the airflow in the second sealed cavity 602 will quickly flow into the first sealed cavity 601 and exit towards the first end 111. Therefore, setting the second sealed cavity 602 can increase the airflow velocity within the gas delivery space 50.

[0084] In other embodiments (not shown), the air inlet pipe 52 may be omitted, and only the second sealing cavity 602 and the first sealing cavity 601 may be provided, with the air outlet of the second sealing cavity 602 connected to the air inlet of the first sealing cavity 601. For example, if the sealing member 60 has an opening on the side facing the first sealing cavity 601 that connects to the second sealing cavity 602, then this opening is both the air outlet of the second sealing cavity 602 and the air inlet of the first sealing cavity 601.

[0085] In one implementation, such as Figure 1 , Figure 3 , Figure 4 As shown, the exposure device also includes an air outlet pipe 53, the air inlet of which is connected to the first sealing cavity 601 and faces the second end 112; the air outlet of the air outlet pipe 53 is connected to the space outside the first sealing cavity 601.

[0086] Among them, the air outlet pipe 53 can serve as the air outlet of the first sealing cavity 601, and exhaust the airflow in the first sealing cavity 601.

[0087] Since the air inlet of the air outlet pipe 53 faces the second end 112, the airflow flowing along the smooth surface 11 to the second end 112 can be guided into the air outlet pipe 53, and then guided out of the first sealing cavity 601.

[0088] In some embodiments, the air inlet of the air outlet pipe 53 is arranged parallel to the airflow direction at the second end 112 to reduce flow resistance, so that the airflow flowing along the smooth surface 11 can smoothly enter the air outlet pipe 53.

[0089] In one application scenario, when multiple smooth surfaces 11 are formed on the first side, the exposure device may also include multiple air outlets 53, with the air outlet of each air outlet 53 facing the second end 112 of the corresponding smooth surface 11.

[0090] In one implementation, such as Figure 1 , Figure 3 , Figure 4 As shown, the exposure apparatus also includes a suction system 54, the air inlet of which is connected to the air outlet of the first sealed cavity 601, for suctioning the airflow inside the first sealed cavity 601.

[0091] In some applications, the air inlet of the suction system 54 can also be connected to the first sealed cavity 601 through the air outlet pipe 53.

[0092] In one embodiment (not shown), a light-transmitting cover plate 10 is disposed on a substrate stage 20 to form a first sealing cavity 601; wherein, the light-transmitting cover plate 10 includes a flow guiding portion and a fixing portion, and a smooth surface 11 is formed on one side of the flow guiding portion facing the substrate 30; one end of the fixing portion of the light-transmitting cover plate 10 is connected to the side of the flow guiding portion near the first end 111, and the other end extends toward the substrate stage 20 and abuts against the substrate stage 20; the side of the flow guiding portion near the second end 112 extends downward at an angle and abuts against the substrate stage 20; the air inlet of the first sealing cavity 601 is disposed near the first end 111, and the air outlet is disposed near the second end 112.

[0093] The exposure device may further include an air inlet pipe 52, which is disposed within the first sealing cavity 601.

[0094] This application further proposes a substrate support assembly for an exposure apparatus, such as... Figures 1 to 5As shown, the exposure apparatus includes a substrate support assembly (not shown) and a light-emitting system 40. The light-emitting system 40 is disposed above the substrate 30 and has a light-emitting surface on one side facing the substrate 30. The light-emitting surface has a light-emitting area 42, which emits light rays towards the substrate 30 along a first direction y1. The projection of the substrate 30 along the opposite direction of the first direction y1 covers the light-emitting area 42. The specific implementation and working principle of the light-emitting system 40 can be found in the above embodiments and will not be repeated here. The substrate support assembly includes a substrate stage 20 and a light-transmitting cover plate 10. The substrate stage 20 is used to support the substrate 30. The specific implementation and working principle of the substrate stage 20 can be found in the above embodiments and will not be repeated here. A light-transmitting cover plate 10 is at least partially disposed between the light-emitting region 42 and the substrate 30. The projection of the light-transmitting cover plate 10 in the opposite direction to the first direction y1 at least covers the light-emitting region 42. The light-transmitting cover plate 10 forms a smooth surface 11 on one side facing the substrate 30. The smooth surface 11 has a first end 111 and a second end 112 disposed opposite to each other. The vertical distance h from the smooth surface 11 to the substrate stage 20 gradually decreases along the second direction x, where the second direction x is the direction from the first end 111 to the second end 112. Specific implementation methods and working principles of the light-transmitting cover plate 10 can be found in the above embodiments, and will not be repeated here.

[0095] Applying the above-mentioned substrate support assembly to the exposure apparatus can effectively reduce the phenomenon of fogging of the light-emitting area 42 of the light-emitting system 40 caused by exposure exhaust during the use of the exposure apparatus, and can effectively reduce the interference of such exhaust on light emission during exposure. Specifically, a light-transmitting cover plate 10 is at least partially disposed between the light-emitting area 42 and the substrate 30, and its projection along the opposite direction of the first direction y1 at least covers the light-emitting area 42. This prevents the exhaust gas generated on the substrate 30, as well as the atomized droplets generated by the reaction of exhaust gas and impurities, from floating up to the light-emitting area 42, thus reducing their interference with the light emitted from the light-emitting area 42. Furthermore, since light passes through the light-transmitting cover plate 10, there is also a light-passing area on the light-transmitting cover plate 10. A smooth surface 11 is formed on one side of the light-transmitting cover plate 10 facing the substrate 30. The vertical distance h from the smooth surface 11 to the substrate 30 gradually decreases along the second direction x. This allows the smooth surface 11 to extend downwards from the first end 111 to the second end 112, allowing droplets that float up to the smooth surface 11 and adhere to it to slide towards the second end 112 of the smooth surface 11, thereby allowing them to flow out of the light-passing area of ​​the light-transmitting cover plate 10. Therefore, the interference of droplets with the emitted light is reduced when light passes through the light-transmitting cover plate 10.

[0096] Unlike existing technologies, the exposure apparatus of this application includes a substrate stage, a light-emitting system, and a light-transmitting cover plate. The substrate stage is used to support the substrate; the light-emitting system is disposed above the substrate, and has a light-emitting surface on one side facing the substrate, with a light-emitting area. The light-emitting area emits light towards the substrate along a first direction, and the projection of the substrate in the opposite direction of the first direction covers the light-emitting area; the light-transmitting cover plate is at least partially disposed between the light-emitting area and the substrate, and the projection of the light-transmitting cover plate in the opposite direction of the first direction at least covers the light-emitting area; wherein, the light-transmitting cover plate forms a smooth surface on one side facing the substrate, the smooth surface having a first end and a second end disposed opposite to each other, the vertical distance from the smooth surface to the substrate stage gradually decreasing along a second direction, the second direction being the direction from the first end to the second end. By employing the above method, a light-transmitting cover plate is at least partially disposed between the light-emitting area and the substrate, and its projection in the opposite direction to the first direction at least covers the light-emitting area. This prevents gas venting generated on the substrate, as well as atomized droplets produced by the reaction of gas venting with impurities, from floating and rising to the light-emitting area, thus reducing their interference with the light emitted from the light-emitting area. Furthermore, since light passes through the light-transmitting cover plate, a light-passing area also exists on the cover plate. A smooth surface is formed on the side of the light-transmitting cover plate facing the substrate, and the vertical distance from the smooth surface to the substrate gradually decreases along the second direction. This allows the smooth surface to extend downwards from the first end to the second end, enabling droplets that float to the smooth surface and adhere to it to slide towards the second end of the smooth surface, thereby flowing out of the light-passing area of ​​the light-transmitting cover plate. Therefore, the interference of droplets with the emitted light is reduced when light passes through the light-transmitting cover plate. Thus, this application can reduce the interference of substrate gas venting with the light emitted from the light-emitting area, improve light transmittance, and enhance the substrate exposure effect.

[0097] It is worth noting that the accompanying drawings are only for illustrating the structural and connection relationships of the product in this application, and do not limit the specific structural dimensions of the product in this application.

[0098] The above description is merely an embodiment of this application and does not limit the patent scope of this application. Any equivalent structural or procedural transformations made using the content of this application's specification and drawings, or direct or indirect applications in other related technical fields, are similarly included within the patent protection scope of this application.

Claims

1. An exposure apparatus, characterized in that, The exposure apparatus includes: A substrate stage, which is used to support a substrate; A light-emitting system is provided above the substrate. The light-emitting system has a light-emitting surface on one side facing the substrate. The light-emitting surface has a light-emitting area. The light-emitting area emits light rays toward the substrate along a first direction. The projection of the substrate in the opposite direction of the first direction covers the light-emitting area. A light-transmitting cover plate, wherein the light-transmitting cover plate is at least partially disposed between the light-emitting area and the substrate, and the projection of the light-transmitting cover plate in the opposite direction to the first direction at least covers the light-emitting area; The light-transmitting cover plate is used to form a smooth surface on one side facing the substrate. The smooth surface has a first end and a second end that are disposed opposite to each other. The vertical distance from the smooth surface to the substrate stage gradually decreases along a second direction, which is the direction from the first end to the second end.

2. The exposure apparatus according to claim 1, characterized in that, In a first vertical plane parallel to the second direction, the cross-section of the smooth surface is arc-shaped; the second direction is the direction from the first end to the second end.

3. The exposure apparatus according to claim 2, characterized in that, The light-transmitting cover is an arc-shaped cover.

4. The exposure apparatus according to claim 1, characterized in that, The side surface is formed with a plurality of through slots extending along the second direction, and the openings of the through slots face the substrate along the first direction; The inner wall of the through groove forms the smooth surface; the second direction is the direction from the first end to the second end.

5. The exposure apparatus according to claim 1, characterized in that, The smooth surface has a circular arc cross-section in the second vertical plane; The second vertical plane is perpendicular to the first vertical plane, and the first vertical plane is parallel to the second direction.

6. The exposure apparatus according to claim 4, characterized in that, A baffle is provided between adjacent through slots, the baffle extending toward the substrate stage along the first direction and spaced apart from the substrate.

7. The exposure apparatus according to claim 1, characterized in that, Also includes: The air supply system, whose projection in the opposite direction to the first direction is located outside the light-emitting area; An air supply space is formed between the substrate stage and the light-transmitting cover plate. The air supply space has an air inlet side and an air outlet side. The air supply system delivers airflow from the air inlet side to the air supply space. The air inlet side is located near the first end, and the air outlet side is located near the second end.

8. The exposure apparatus according to claim 7, characterized in that, The exposure apparatus further includes: An air intake pipe, wherein the air inlet of the air intake pipe is connected to the air delivery system, and the air outlet of the air intake pipe is connected to the air delivery space; the air outlet of the air intake pipe faces the first end.

9. The exposure apparatus according to claim 7, characterized in that, Also includes: A sealing element is disposed near the first end and together with the light-transmitting cover plate covers the substrate to form a first sealing cavity; The first sealed cavity serves as the air supply space, with the air inlet of the first sealed cavity near the air inlet side and the air outlet of the first sealed cavity near the air outlet side. The light emitted from the light-emitting area passes through the light-transmitting cover plate and reaches the substrate to form an exposure area, and at least the exposure area is located within the first sealed cavity; Preferably, the exposure device further includes an air inlet pipe disposed within the first sealed cavity; a second sealed cavity is formed within the sealing member, the air inlet of the second sealed cavity is connected to the air supply system, the air outlet of the second sealed cavity is connected to the air inlet of the air inlet pipe, and the air outlet of the air inlet pipe is connected to the first sealed cavity and faces the first end.

10. A substrate support assembly for an exposure apparatus, characterized in that, The exposure apparatus includes a substrate support assembly and a light emission system. The light emission system is disposed above the substrate and has a light emission surface on one side facing the substrate. The light emission surface has a light emission area. The light emission area emits light rays toward the substrate along a first direction, and the projection of the substrate in the opposite direction of the first direction covers the light emission area. The substrate support assembly includes: A substrate stage, which is used to support the substrate; A light-transmitting cover plate, wherein the light-transmitting cover plate is at least partially disposed between the light-emitting area and the substrate, and the projection of the light-transmitting cover plate in the opposite direction to the first direction at least covers the light-emitting area; The light-transmitting cover plate is used to form a smooth surface on one side facing the substrate. The smooth surface has a first end and a second end that are disposed opposite to each other. The vertical distance from the smooth surface to the substrate stage gradually decreases along a second direction, which is the direction from the first end to the second end.

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