Cleaning device for circulating water metal filter screen of silicon wafer cutting machine

Abstract

The utility model relates to a cleaning device for a circulating water metal filter screen of a silicon wafer cutting machine, which is characterized by comprising an ultrasonic vibration rod arranged in a filter barrel and penetrating through the metal filter screen; the ultrasonic generator is arranged outside the filtering barrel, is connected with the ultrasonic vibration rod and provides ultrasonic output for the ultrasonic vibration rod; the liquid level sensor is arranged above the ultrasonic vibration rod, the lower end of the liquid level sensor extends into the metal filter screen in the filter barrel, and the upper end of the liquid level sensor is in communication connection with an external liquid level protection function module through a liquid level sensor connecting wire. According to the utility model, the requirements on reliability and quality of the silicon wafer cutting machine are improved, the use cost of the cutting machine is reduced, the circulating water filtering efficiency is improved and enhanced, the silicon wafer cutting quality and the cutting productivity are improved, the use cost of consumables is reduced, and the tedious degree of operation is reduced.

Description

Technical Field

[0001] The utility model relates to a cleaning device for a metal filter screen of circulating water of a silicon wafer cutting machine, belonging to the technical field of filtering and cleaning devices. Background Art

[0002] The traditional silicon wafer cutting machine circulating water filtration device adopts a bag filter. The structure of the bag filter is as follows: Figure 2 As shown, a filter barrel A1 with a circulating water inlet A5 and a circulating water outlet A4 is used, and a filter barrel flange A3 is encapsulated at the upper end of the filter barrel A1. A bag filter A2 is placed inside the filter barrel A1 to achieve the function of filtering the circulating water. This traditional filtering device has the following disadvantages: during the cutting process, the silicon powder in the circulating water quickly blocks the bag, and the water flow of the circulating water is reduced or very small under the pressure of the water pump, which directly affects the cutting speed and quality of the silicon wafer. In this case, the filter bag cannot be cleaned and can only be replaced frequently, resulting in a low yield rate during the silicon wafer cutting process, causing trouble, low efficiency, and increased cost of consumables. Summary of the invention

[0003] The utility model aims to provide a cleaning device for a metal filter screen of circulating water of a silicon wafer cutting machine, so as to solve the problems existing in a traditional cloth bag filter device for circulating water of a silicon wafer cutting machine, namely, the filter bag cannot be cleaned, the filtration efficiency is low, the water flow is uneven, the quality of cut silicon wafers is affected, the production capacity is low, the use is cumbersome, and the cost of consumables is high.

[0004] In order to solve the above problems, the technical solution adopted by the utility model is:

[0005] The cleaning device for the metal filter screen of the circulating water of the silicon wafer cutting machine is used to clean the metal filter screen inside the circulating water filter barrel of the silicon wafer cutting machine. The special features include:

[0006] An ultrasonic vibration rod is placed inside the filter barrel and penetrates the metal filter screen;

[0007] an ultrasonic generator, which is arranged outside the filter barrel, connected to the ultrasonic vibration rod and provides ultrasonic output thereto; and

[0008] The liquid level sensor is arranged above the ultrasonic vibrating rod, with its lower end extending into the metal filter mesh inside the filter barrel, and its upper end communicatingly connected with the external liquid level protection function module via the liquid level sensor connecting line.

[0009] Furthermore, the ultrasonic vibrator and the liquid level sensor are installed on the filter barrel flange via a fixed flange, the ultrasonic vibrator penetrates the fixed flange and the filter barrel flange, and extends into the metal filter mesh in the filter barrel; the liquid level sensor penetrates the fixed flange and the filter barrel flange and extends into a predetermined position inside the filter barrel.

[0010] Furthermore, the ultrasonic generator has an ultrasonic output end, and is connected to the ultrasonic vibration rod input line of the ultrasonic vibration rod via the ultrasonic output end.

[0011] Furthermore, the liquid level protection function module is installed inside the ultrasonic generator.

[0012] Furthermore, the liquid level protection function module is configured with two liquid level protection function module connection ends on the ultrasonic generator, and the liquid level protection function module is connected and communicated with the liquid level sensor connection line via the two liquid level protection function module connection ends.

[0013] Furthermore, the liquid level protection function module is configured with two liquid level protection function module alarm output terminals on the ultrasonic generator as liquid shortage alarm outputs.

[0014] The cleaning device of the metal filter screen of the circulating water of the silicon wafer cutting machine of the utility model solves the influence of the cleanliness of the circulating water filtration on the quality and timeliness of silicon wafer cutting, and solves the protection function of the ultrasonic vibration rod being damaged when the circulating water is abnormal under extreme conditions or other improper operations cause other problems. It improves the reliability and quality requirements of the silicon wafer cutting machine, reduces the use cost of the cutting machine, improves and enhances the circulating water filtration efficiency, improves the silicon wafer cutting quality and cutting capacity, reduces the cost of consumables, and reduces the complexity of operation. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 : A schematic diagram of the structure of a cleaning device for a metal filter screen of a silicon wafer cutting machine circulating water according to the first embodiment;

[0016] Figure 2 : Schematic diagram of the structure of the bag filter device for circulating water of a traditional silicon wafer cutting machine;

[0017] Figure 3 : Workflow control diagram of the cleaning device for the metal filter screen of the circulating water of the silicon wafer cutting machine of the first embodiment;

[0018] exist Figure 1 Among them, 1. filter barrel, 2. metal filter, 3. filter barrel flange, 3B, fixed flange, 4. circulating water inlet, 5. circulating water outlet, 6. ultrasonic vibrator, 7. liquid level detection line, 9. circulating filtration water flow direction, 10. backwashing water flow direction, 11. liquid level sensor, 12. ultrasonic vibrator input line, 13. ultrasonic generator, 14. ultrasonic output end, 15. liquid level sensor connection line, 16. liquid level protection function module, 17. liquid level protection function module connection end 1, 18. liquid level protection function module connection end 2, 19. liquid level protection function module alarm output end 1, 20. liquid level protection function module alarm output end 2;

[0019] exist Figure 2 In the figure, A1, filter barrel, A2, bag filter, A3, filter barrel flange, A4, circulating water outlet, A5, circulating water inlet. DETAILED DESCRIPTION

[0020] The utility model is described in detail below with reference to the accompanying drawings.

[0021] Embodiment 1

[0022] The present embodiment relates to a cleaning device for a metal filter screen of circulating water of a silicon wafer cutting machine, which is an auxiliary part of the silicon wafer cutting machine, comprising an ultrasonic generator 13 arranged on one side of a filter barrel 1, and an ultrasonic vibration rod 6 and a liquid level sensor 11 placed in the filter barrel 1, wherein a liquid level protection functional module 16 is arranged inside the ultrasonic generator 13, the ultrasonic vibration rod 6 extends into the filter barrel 1 and passes through the middle of the metal filter screen 2, and the liquid level sensor 11 is located at a predetermined position above the filter barrel 1. A fixed flange B3 is installed on the filter barrel flange 3 above the filter barrel 1, and the fixed flange 3B is used to connect and fix the ultrasonic vibration rod 6 and the liquid level sensor 11; the ultrasonic vibration rod 6 and the liquid level sensor 11 pass through and are fixed on the fixed flange B3 and the filter barrel flange 3; the outer end of the ultrasonic vibration rod 6 is connected to the ultrasonic output end 14 of the ultrasonic generator 13 via the ultrasonic vibration rod input line 12; one end of the liquid level sensor 11 extends into the filter barrel 1 to detect the liquid level height in the filter barrel 1; the upper end of the liquid level sensor 11 is connected and communicated with the two connecting ends of the liquid level protection function module (liquid level protection function module connecting end 17 and liquid level protection function module connecting end 2 18) via the liquid level sensor connecting line 15; the liquid level protection function module 16 has two signal output ends for insufficient liquid alarm, namely, liquid level protection function module alarm output end 19 and liquid level protection function module alarm output end 20.

[0023] The liquid level protection function module in this embodiment is used to improve the reliability of the ultrasonic vibrator, increase its service life and reduce costs in case of extreme situations where the ultrasonic crystal of the ultrasonic vibrator is damaged due to overheating due to lack of water in the filter barrel.

[0024] The cleaning function and working process of the cleaning device for the metal filter screen of the circulating water of the silicon wafer cutting machine in this embodiment are described as follows:

[0025] Start the silicon wafer cutting machine and circulating water pump, and the filtered circulating water begins to flow. Figure 1 As shown in the circulating filtered water flow direction 9, the circulating water enters the metal filter screen 2 inside the filter barrel 1 through the circulating water inlet 4, and the circulating water then flows out through the circulating water outlet 5;

[0026] When the ultrasonic vibrating rod cleans the metal filter barrel, the silicon wafer cutting machine sends a start command to the ultrasonic generator 13; the liquid level sensor 11 detects the circulating water level of the filter barrel 1;

[0027] When the liquid level sensor 11 detects that the liquid level is normal (the liquid level is within the normal range of the liquid level detection line 7), the liquid level protection function module 16 starts the ultrasonic generator 13, and the ultrasonic output end 14 of the ultrasonic generator 13 provides ultrasonic output to the ultrasonic vibration rod 6, and the ultrasonic vibration rod 6 performs ultrasonic cleaning on the metal filter 2;

[0028] When the liquid level sensor 11 does not detect the liquid level (the liquid level is below the liquid level detection line 7), the liquid level protection function module 16 sends a stop working instruction to the ultrasonic generator 13, the ultrasonic generator 13 stops working, the ultrasonic output end 14 stops outputting signals, and the ultrasonic vibration rod 6 stops cleaning the metal filter screen;

[0029] When the liquid level sensor 11 continuously detects the liquid level, the liquid level protection function module 16 continues to work, the ultrasonic output end 14 of the ultrasonic generator 13 continuously provides ultrasonic output to the ultrasonic vibration rod 6, and the ultrasonic vibration rod 6 continuously ultrasonically cleans the metal filter 2 until the silicon wafer cutting machine completes cutting.

[0030] The backwashing function and working process of the cleaning device for the metal filter screen of the circulating water of the silicon wafer cutting machine of this embodiment are described as follows:

[0031] After a cutting is completed, the circulating water pump Figure 1 The direction of the circulating water flow in the filter is changed to the backwash water flow 10, and the inner wall of the filter barrel 1 and the metal filter screen 2 are backwashed by the backwash water. At the same time, the liquid level sensor equipped with the ultrasonic vibrator continuously detects the liquid level. When the liquid level reaches the liquid level detection line 7, the liquid level protection function module 16 continuously starts the ultrasonic generator 13 to work, and the ultrasonic output end 14 of the ultrasonic generator 13 continuously provides ultrasonic output to the ultrasonic vibrator 6. The ultrasonic vibrator 6 continuously performs ultrasonic cleaning on the metal filter screen 2 and rinses away the silicon powder remaining on the inner wall of the filter barrel 1 and hanging on the filter screen 2, so as to prepare for the next cutting.

[0032] The utility model discloses a cleaning device for a metal filter screen of circulating water of a silicon wafer cutting machine, which utilizes ultrasonic cavitation effect to ultrasonically clean the filter screen, thereby reducing or eliminating the blockage of the filter screen by silicon powder, and replacing the undesirable phenomenon caused by bag filtration.

Claims

1. A cleaning device for a metal filter screen for circulating water of a silicon wafer cutting machine, used to clean the metal filter screen inside the filter barrel of circulating water of a silicon wafer cutting machine, characterized in that: include: An ultrasonic vibration rod is placed inside the filter barrel and penetrates the metal filter screen; an ultrasonic generator, which is arranged outside the filter barrel, connected to the ultrasonic vibration rod and provides ultrasonic output thereto; and The liquid level sensor is arranged above the ultrasonic vibrating rod, with its lower end extending into the metal filter mesh inside the filter barrel, and its upper end communicatingly connected with the external liquid level protection function module via the liquid level sensor connecting line.

2. The cleaning device for the metal filter screen of the circulating water of the silicon wafer cutting machine according to claim 1, characterized in that: The ultrasonic vibrator and the liquid level sensor are installed on the filter barrel flange via a fixed flange. The ultrasonic vibrator penetrates the fixed flange and the filter barrel flange and extends into the metal filter mesh in the filter barrel; the liquid level sensor penetrates the fixed flange and the filter barrel flange and extends into a predetermined position inside the filter barrel.

3. The cleaning device for the metal filter screen of the silicon wafer cutting machine circulating water according to claim 1, characterized in that: The ultrasonic generator has an ultrasonic output end, and is connected to the ultrasonic vibration rod input line of the ultrasonic vibration rod via the ultrasonic output end.

4. The cleaning device for the metal filter screen of the silicon wafer cutting machine circulating water according to claim 1, characterized in that: The liquid level protection function module is installed inside the ultrasonic generator.

5. The cleaning device for the metal filter screen of the circulating water of the silicon wafer cutting machine according to claim 1, characterized in that: The liquid level protection function module is configured with two liquid level protection function module connection ends on the ultrasonic generator, and the liquid level protection function module is connected and communicated with the liquid level sensor connection line via the two liquid level protection function module connection ends.

6. The cleaning device for the metal filter screen of the circulating water of the silicon wafer cutting machine according to claim 1, characterized in that: The liquid level protection function module is configured with two liquid level protection function module alarm output terminals on the ultrasonic generator as liquid shortage alarm outputs.

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