Quartz developing tank

The quartz developing tank addresses uneven liquid flow issues by employing a structured pipe and baffle system to achieve consistent developer distribution, enhancing photolithography process reliability.

CN222259843UActive Publication Date: 2024-12-27KUNSHAN YIHAO EQUIPMENT TECHNOLOGY CO LTD
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Patent Information

Application Number
CN202420941112.6
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-05-05
Publication Date
2024-12-27
Estimated Expiration
2034-05-05

AI Technical Summary

Technical Problem

Uneven liquid flow in developing tanks leads to uneven distribution of developer on wafer surfaces, affecting the development effect in photolithography processes.

Method used

A quartz developing tank design featuring an outer and inner tank configuration with specific pipe and baffle arrangements, including a circulating water inlet and outlet system, baffles, and filter plates to regulate flow, ensuring even and smooth liquid distribution.

Benefits of technology

The design ensures even and smooth liquid flow, maintaining development consistency and effectiveness by adjusting flow rate and velocity, preventing backflow and overflow, and facilitating stable pressure.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to the technical field of wafer cleaning, and discloses a quartz developing tank which comprises a shell, an inner tank and an outer tank are arranged in the shell, the outer tank is arranged on one side of the inner tank, a circulating water outlet pipe is arranged on the bottom surface of the outer tank, a circulating water inlet pipe is arranged at the lower end of the side surface of the inner tank, and a water outlet pipe is arranged on the bottom surface of the inner tank. A baffle is arranged between the outer groove and the inner groove, supporting columns are arranged on the bottom face of the inner groove, and a filter plate is arranged on the upper surfaces of the multiple supporting columns. According to the utility model, the liquid level gradually moves upwards from the bottom through the circulating water inlet pipe and the water outlet hole, the flow rate and the flow velocity are adjusted through the overflow port, and then the liquid flows through the circulating water outlet pipe, so that the liquid is uniform and stable in the flowing process and does not influence development.
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Description

Technical Field

[0001] The utility model relates to the technical field of developing tanks, in particular to a quartz developing tank. Background Art

[0002] The developing tank is an important device used in the photolithography process. Its function is to develop the photoresist (photoresist) exposed to light and remove the unexposed parts to form the desired pattern or structure. Uneven liquid flow may cause uneven distribution of the developer on the wafer surface, thereby affecting the development effect. Therefore, a quartz developing tank is proposed to address the above problems. Utility Model Content

[0003] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a quartz developing tank, comprising an outer shell, an inner tank and an outer tank are arranged in the outer shell, the outer tank is arranged on one side of the inner tank, a circulating water outlet pipe is arranged on the bottom surface of the outer tank, a circulating water inlet pipe is arranged on the lower end of the side surface of the inner tank, a water outlet pipe is arranged on the bottom surface of the inner tank, a baffle is arranged between the outer tank and the inner tank, a support column is arranged on the bottom surface of the inner tank, and filter plates are arranged on the upper surfaces of multiple support columns.

[0004] Furthermore, the circulating water inlet pipe is arranged close to the front and rear sides of the inner tank, the end of the circulating water inlet pipe is in contact with the side wall of the inner tank, and a water outlet hole is provided at the tail of the circulating water inlet pipe.

[0005] Furthermore, triangular overflow outlets are arranged on the upper ends of the baffles.

[0006] Furthermore, the height of the circulating water inlet pipe is lower than the height of the circulating water outlet pipe, and the height of the water outlet pipe is lower than the height of the circulating water inlet pipe.

[0007] Furthermore, the height of the baffle is lower than the heights of the outer groove and the inner groove.

[0008] Furthermore, the circulating water inlet pipe is arranged below the filter plate, the area of ​​the filter plate is smaller than the area of ​​the bottom surface of the inner tank, and a plurality of filter holes are arranged through the upper surface of the filter plate.

[0009] The utility model has the following beneficial effects:

[0010] In the utility model, the liquid level is gradually moved upward from the bottom through the circulating water inlet pipe and the water outlet hole, the flow rate and flow velocity are adjusted through the overflow port, and then the liquid flows through the circulating water outlet pipe, so that the liquid flows evenly and smoothly without affecting the development. BRIEF DESCRIPTION OF THE DRAWINGS

[0011] Figure 1 This is a structural schematic diagram of a quartz developing tank proposed by the utility model;

[0012] Figure 2 The utility model is a side sectional view of a quartz developing tank.

[0013] Legend:

[0014] 1. Outer shell; 2. Inner tank; 3. Outer tank; 4. Circulating water outlet pipe; 5. Circulating water inlet pipe; 6. Water outlet pipe; 7. Baffle; 8. Support column; 9. Filter plate; 10. Water outlet hole; 11. Overflow port; 12. Filter hole. DETAILED DESCRIPTION

[0015] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0016] Reference Figure 1-2 As shown, an embodiment of the utility model is as follows: a quartz developing tank comprises a shell 1, an inner tank 2 and an outer tank 3 are arranged in the shell 1, the outer tank 3 is arranged on one side of the inner tank 2, a circulating water outlet pipe 4 is arranged on the bottom surface of the outer tank 3, a circulating water inlet pipe 5 is arranged on the lower end of the side surface of the inner tank 2, a water outlet pipe 6 is arranged on the bottom surface of the inner tank 2, a baffle plate 7 is arranged between the outer tank 3 and the inner tank 2, a support column 8 is arranged on the bottom surface of the inner tank 2, a filter plate 9 is arranged on the upper surface of the plurality of support columns 8, a circulating water inlet pipe 5 is arranged near the front and rear sides of the inner tank 2, the end of the circulating water inlet pipe 5 is in contact with the side wall of the inner tank 2, a water outlet hole 10 is arranged at the tail of the circulating water inlet pipe 5, and the baffle plate 7 blocks the inner tank 2 The developer is separated from the outer tank 3, and a triangular overflow port 11 is arranged on the upper end of the baffle plate 7. The height of the baffle plate 7 is lower than that of the outer tank 3 and the inner tank 2. The developer flows out from the circulating water outlet pipe 4, is filtered, and then enters the circulating water inlet pipe 5, and flows out from the water outlet hole 10. The water outlet hole 10 is arranged at the tail of the circulating water inlet pipe 5, and is distributed left and right and up and down with the circulating water outlet pipe 4, so that the developer is in a circulating state. At the same time, when the developer enters the outer tank 3 from the inner tank 2 through the overflow port 11, the overflow port 11 adjusts the speed and flow rate of the developer flowing out of the inner tank 2, thereby adjusting the liquid flow performance in the tank, so that the developer can circulate smoothly and evenly.

[0017] Furthermore, the height of the circulating water inlet pipe 5 is lower than that of the circulating water outlet pipe 4 to prevent the liquid from flowing back or overflowing from the circulating water outlet pipe 4. Setting the circulating water inlet pipe 5 at a lower position helps to maintain the pressure stability in the system. The height of the water outlet pipe 6 is lower than that of the circulating water inlet pipe 5 to facilitate the discharge of the liquid.

[0018] Furthermore, the circulating water inlet pipe 5 is arranged below the filter plate 9, so that the developer circulates from the bottom, reducing the impact of unstable and uneven liquid on the overall solution flow. The area of ​​the filter plate 9 is smaller than the area of ​​the bottom of the inner tank 2, and a plurality of filter holes 12 are arranged through the upper surface of the filter plate 9. The small area of ​​the filter plate 9 and the plurality of filter holes 12 allow enough liquid to pass through the filter plate 9 without hindering the flow of the liquid due to the large area, thereby affecting the flow rate of the developer or preventing the developer from flowing evenly.

[0019] Working principle: The staff first adds the developer into the inner tank 2 and the outer tank 3 through a hose. When the inner tank 2 and the outer tank 3 are both filled with the developer, the addition is stopped. The circulating water inlet pipe 5 and the circulating water outlet pipe 4 are connected to a pump, and the developer is pumped out from the outer tank 3 from the circulating water outlet pipe 4. The developer is then filled into the inner tank 2 from the circulating water inlet pipe 5. The developer enters the inner tank 2 through the outlet hole 10. When the liquid level passes through the overflow hole, the flow rate and flow from the inner tank 2 to the outer tank 3 are adjusted through the overflow port 11, and then the developer is discharged through the circulating water outlet pipe 4 and re-enters the circulating water inlet pipe 5.

[0020] Finally, it should be noted that the above is only a preferred embodiment of the present invention and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art can still modify the technical solutions described in the aforementioned embodiments or make equivalent substitutions for some of the technical features therein. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A quartz developing tank, characterized in that: The invention comprises an outer shell (1), an inner tank (2) and an outer tank (3) are arranged in the outer shell (1), the outer tank (3) is arranged on one side of the inner tank (2), a circulating water outlet pipe (4) is arranged on the bottom surface of the outer tank (3), a circulating water inlet pipe (5) is arranged at the lower end of the side surface of the inner tank (2), a water outlet pipe (6) is arranged on the bottom surface of the inner tank (2), a baffle (7) is arranged between the outer tank (3) and the inner tank (2), a supporting column (8) is arranged on the bottom surface of the inner tank (2), and a plurality of filter plates (9) are arranged on the upper surfaces of the supporting columns (8).

2. A quartz developing tank according to claim 1, characterized in that: The circulating water inlet pipe (5) is arranged close to the front and rear sides of the inner tank (2), the end of the circulating water inlet pipe (5) is in contact with the side wall of the inner tank (2), and a water outlet hole (10) is provided at the tail of the circulating water inlet pipe (5).

3. A quartz developing tank according to claim 1, characterized in that: A triangular overflow port (11) is arranged on the upper end of the baffle (7).

4. A quartz developing tank according to claim 1, characterized in that: The height of the circulating water inlet pipe (5) is lower than the height of the circulating water outlet pipe (4), and the height of the water outlet pipe (6) is lower than the height of the circulating water inlet pipe (5).

5. A quartz developing tank according to claim 1, characterized in that: The height of the baffle (7) is lower than the heights of the outer tank (3) and the inner tank (2).

6. A quartz developing tank according to claim 1, characterized in that: The circulating water inlet pipe (5) is arranged below the filter plate (9); the area of ​​the filter plate (9) is smaller than the area of ​​the bottom surface of the inner tank (2); and a plurality of filter holes (12) are arranged in a penetrating manner on the upper surface of the filter plate (9).