200results about "Liquid processing with progressive mechanical movement" patented technology

System and method for cleaning a solar row of solar panels. The solar row has an upper edge elevated from ground level more than a lower edge to provide an inclination of the solar row. A cleaning assembly operates to clean a surface of the solar panels. A support frame supports the cleaning assembly and enables the cleaning assembly to move (1) upwardly and downwardly in the width direction of the solar row, and (2) in the length direction of the solar row. Operation and movement of the cleaning assembly is controlled by a control unit to cause the cleaning assembly to clean a surface of the solar panels during downward movement of the cleaning assembly. The cleaning assembly is preferably not operative during its upward vertical movement. During the downward movement, the cleaning assembly removes dirt, debris and dust from the surface of the solar panels and generates an air stream to blow off the dirt, debris, and dust.

A drive shaft, which is driven by a drive motor, is held firmly at two points by bearing structures. The bearing structure has a hole in which a bearing member is fit. The bearing member has hole, which is concentric with respect to the hole in which the bearing member is fit. A crimp, which is made of elastic material, having interfering portions that interfere with the bearing member is provided between the bearing member and the hole in the bearing structure in which the bearing member is fit.

A cleaning apparatus which comprises a spray cleaning arrangement capable of even cleaning of devices. The cleaning arrangement is disposed within a housing, and is directed towards a conveyor belt, which transports the device to be cleaned across the various wash, rinse and drying zones of the apparatus. At least one spray wand is provided for the circulation of a wash fluid having at least one row of holes disposed longitudinally thereacross for releasing the wash fluid onto the device to be washed. The spray wand has a decreasing internal traverse cross-sectional area from one end to the second end such that a substantially uniform internal pressure is maintained between the two ends during washing. The holes on the spray wands are preferably microtunnels which can be disposed at high density along the spray wand. The spray wand can also be rotated such that the direction of spray may be adjusted. The various wash, rinse and drying zones are ideally designed as modules with their own conveyor belts, such that contamination due to fluid carry-over is minimized. A top guiding system is also provided directional control to the moving devices.

There is disclosed a substrate treating method comprising supplying a treating solution onto a substrate, and continuously discharging a first cleaning solution to the substrate from a first discharge region disposed in a nozzle, while moving the nozzle and substrate with respect to each other in one direction, wherein a length of a direction crossing at right angles to the direction of the first discharge region is equal to or more than a maximum diameter or longest side of the substrate, the nozzle continuously spouts a first gas to the substrate from a first jet region, and the length of a direction crossing at right angles to the direction of the first jet region is equal to or more than the maximum diameter or longest side of the substrate.

A manufacturing method of a semiconductor device including a liquid immersion movement exposure of interposing a liquid between an exposure target substrate and a projection optical system of an exposure apparatus, and carrying out an exposure processing with respect to a plurality of exposure regions set on a surface of the substrate while relatively moving the substrate with respect to the system, a first liquid immersion movement of relatively moving the substrate with respect to the system while interposing the liquid between the substrate and the system, in adjacent exposure regions of said each exposure region, and a second liquid immersion movement of relatively moving the substrate with respect to the system at a speed lower than a movement speed in the first movement, while interposing the liquid between the substrate and the system, in a distance that is longer than a movement distance in the first movement.

A substrate processing system includes a substrate processing apparatus and a cleaning/drying apparatus. The substrate processing apparatus includes an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block and a first interface block. The cleaning/drying apparatus includes a cleaning/drying processing block and a second interface block. An exposure device is arranged adjacent to the second interface block. In the cleaning/drying processing block, cleaning processing is applied to a substrate before exposure processing and drying processing is applied to the substrate after the exposure processing.

A wafer processing apparatus includes a common path, extending in a Y-axis direction, in which one wafer or a plurality of wafers are conveyed, a plurality of process units stacked on both sides of the common path to constitute multi-stage structures, a main handler moved in the common path in the Y-axis direction and rotated about a Z axis at an angle theta to load/unload the wafer into/from the process units, an arm section arranged to move in the main handler in the Z-axis direction, a plurality of holding arms arranged in the arm section to constitute a multi-stage structure so as to respectively hold the wafers, each holding arm being advanced and retreated on an X-Y plane from the arm section, an optical sensor, arranged in the arm section, for detecting a holding state of the wafer in each of the plurality of holding arms, and a controller for controlling an operation of the main handler, an operation of the arm section, and operations of the plurality of holding arms on the basis of a detection result from the optical sensor, wherein the controller advances or retreats each holding arm while operating at least one of the main handler and the arm section, and causes the optical sensor to detect the holding state of the wafer by each holding arm before the holding arm reaches a corresponding one of the process units.

A cleaning tape for use in cleaning transporting surfaces of transporting rollers arranged along a photographic material transporting passageway includes a tape body provided on at least one side thereof with an adhesive layer spaced a distance away from one lengthwise end therteof. A porous screen is laid on the adhesive layer.

In a substrate processing apparatus of the present invention, a buffer bath is provided at any point in a supplying passage of a processing solution supplying part, and a micro bubble generator is provided in the buffer bath. When a substrate is processed, large quantities of micro bubbles can be generated and stored in the buffer bath, and the micro bubbles can be supplied from the buffer bath to a processing bath. This enables the large quantities of micro bubbles to be supplied to the surrounding of the substrate, while the use of the small micro bubble generator avoids an increase in the size of the substrate processing apparatus.

The present invention provides a method of cleaning steel sheet, said method of cleaning steel sheet feeding a cleaning solution activated by ultrasonic waves of a frequency of 0.8 MHz to 3 MHz to a surface of steel sheet at an angle inclined by 1 to 80° with respect to a line perpendicular to the surface of the steel sheet in a direction opposite to the running direction, thereby enabling megasonic waves to be applied to cleaning of running steel sheet and improving the cleaning effect and cleaning speed, and a continuous cleaning system of steel sheet.

An apparatus for cleaning contaminants from a construction mat is described including a washing chamber and an automated conveyor assembly translating the construction mat into and out of the washing chamber. The washing chamber includes a plurality of elongated tines adapted to scrape debris from the was mat and a spray system direction cleansing liquid under pressure at the mat, and a closed loop water reclamation system for filtering and recycling cleansing liquid for reusing the spray system.