201results about "Liquid processing with progressive mechanical movement" patented technology

System and method for cleaning a solar row of solar panels. The solar row has an upper edge elevated from ground level more than a lower edge to provide an inclination of the solar row. A cleaning assembly operates to clean a surface of the solar panels. A support frame supports the cleaning assembly and enables the cleaning assembly to move (1) upwardly and downwardly in the width direction of the solar row, and (2) in the length direction of the solar row. Operation and movement of the cleaning assembly is controlled by a control unit to cause the cleaning assembly to clean a surface of the solar panels during downward movement of the cleaning assembly. The cleaning assembly is preferably not operative during its upward vertical movement. During the downward movement, the cleaning assembly removes dirt, debris and dust from the surface of the solar panels and generates an air stream to blow off the dirt, debris, and dust.

A drive shaft, which is driven by a drive motor, is held firmly at two points by bearing structures. The bearing structure has a hole in which a bearing member is fit. The bearing member has hole, which is concentric with respect to the hole in which the bearing member is fit. A crimp, which is made of elastic material, having interfering portions that interfere with the bearing member is provided between the bearing member and the hole in the bearing structure in which the bearing member is fit.

A process and apparatus for cleaning a transport belt of a machine for the production or processing a web. The apparatus includes at least one nozzle device composed of a rotatable nozzle head having at least one cleaning nozzle, a transport device including a crosspiece extending substantially crosswise to a transport belt travel direction, in which the at least one nozzle device is coupled to the transport device and adapted for displacement along the crosspiece. A traversing speed of the nozzle device is very low and falls within a range of between approximately 1 mm / min and 10 mm / min. Alternatively, the at least one nozzle is positionable in a plurality of cleaning positions that are successively arranged crosswise to the transport belt, and the at least one nozzle is held stationary in each respective cleaning position for a predefined time period. The process includes displacing the at least one cleaning nozzle at a very slow traversing speed within a range of between approximately 1 mm / min and 10 mm / min. Alternatively, the process includes discontinuously moving the at least one cleaning nozzle to a plurality of cleaning positions successively arranged in a transport belt travel direction, positioning the at least one nozzle to remain in the cleaning positions for a predefined period of time, and rapidly displacing the at least one nozzle between adjacent cleaning positions.

A cleaning apparatus which comprises a spray cleaning arrangement capable of even cleaning of devices. The cleaning arrangement is disposed within a housing, and is directed towards a conveyor belt, which transports the device to be cleaned across the various wash, rinse and drying zones of the apparatus. At least one spray wand is provided for the circulation of a wash fluid having at least one row of holes disposed longitudinally thereacross for releasing the wash fluid onto the device to be washed. The spray wand has a decreasing internal traverse cross-sectional area from one end to the second end such that a substantially uniform internal pressure is maintained between the two ends during washing. The holes on the spray wands are preferably microtunnels which can be disposed at high density along the spray wand. The spray wand can also be rotated such that the direction of spray may be adjusted. The various wash, rinse and drying zones are ideally designed as modules with their own conveyor belts, such that contamination due to fluid carry-over is minimized. A top guiding system is also provided directional control to the moving devices.

A cleaning apparatus (10) for a radiation source assembly (35) in a fluid treatment system is described. The cleaning apparatus comprise cleaning chamber (20) and a second chamber (25, 30) independent of the cleaning chamber which defines a fluid (typically water) buffer layer to obviate or mitigate cleaning fluid from the cleaning chamber leaking into the fluid being treated. The fluid treatment system is particularly useful for us in clean water applications in which ultraviolet radiation is used to treat the water while having the advantages of in situ cleaning of the radiation source when it becomes fouled.

There is disclosed a substrate treating method comprising supplying a treating solution onto a substrate, and continuously discharging a first cleaning solution to the substrate from a first discharge region disposed in a nozzle, while moving the nozzle and substrate with respect to each other in one direction, wherein a length of a direction crossing at right angles to the direction of the first discharge region is equal to or more than a maximum diameter or longest side of the substrate, the nozzle continuously spouts a first gas to the substrate from a first jet region, and the length of a direction crossing at right angles to the direction of the first jet region is equal to or more than the maximum diameter or longest side of the substrate.

A manufacturing method of a semiconductor device including a liquid immersion movement exposure of interposing a liquid between an exposure target substrate and a projection optical system of an exposure apparatus, and carrying out an exposure processing with respect to a plurality of exposure regions set on a surface of the substrate while relatively moving the substrate with respect to the system, a first liquid immersion movement of relatively moving the substrate with respect to the system while interposing the liquid between the substrate and the system, in adjacent exposure regions of said each exposure region, and a second liquid immersion movement of relatively moving the substrate with respect to the system at a speed lower than a movement speed in the first movement, while interposing the liquid between the substrate and the system, in a distance that is longer than a movement distance in the first movement.

A wafer processing apparatus includes a common path, extending in a Y-axis direction, in which one wafer or a plurality of wafers are conveyed, a plurality of process units stacked on both sides of the common path to constitute multi-stage structures, a main handler moved in the common path in the Y-axis direction and rotated about a Z axis at an angle theta to load / unload the wafer into / from the process units, an arm section arranged to move in the main handler in the Z-axis direction, a plurality of holding arms arranged in the arm section to constitute a multi-stage structure so as to respectively hold the wafers, each holding arm being advanced and retreated on an X-Y plane from the arm section, an optical sensor, arranged in the arm section, for detecting a holding state of the wafer in each of the plurality of holding arms, and a controller for controlling an operation of the main handler, an operation of the arm section, and operations of the plurality of holding arms on the basis of a detection result from the optical sensor, wherein the controller advances or retreats each holding arm while operating at least one of the main handler and the arm section, and causes the optical sensor to detect the holding state of the wafer by each holding arm before the holding arm reaches a corresponding one of the process units.

A cleaning tape for use in cleaning transporting surfaces of transporting rollers arranged along a photographic material transporting passageway includes a tape body provided on at least one side thereof with an adhesive layer spaced a distance away from one lengthwise end therteof. A porous screen is laid on the adhesive layer.

Provided is a high-pressure liquid jet cleaner which is capable of assuredly removing particles adhered to the inside of a large number of scribe lines formed at consistent intervals in a thin film solar cell panel and which eliminates a fear that the surface of a thin film formed at the surface of the solar cell panel may be damaged or that the thin film may be detached. Jet nozzles are arranged at consistent intervals in the longitudinal direction of a nozzle holder, corresponding to the positions of the respective scribe lines of the thin film solar cell panel. The nozzle holder is supported by supports provided at both ends of the nozzle holder in a manner to allow the nozzle holder to move in the longitudinal direction of the nozzle holder. While the solar cell panel is conveyed in relation to the nozzle holder in parallel to the scribe lines, a high-pressure liquid is jetted out in a straight line from the jet nozzles of the nozzle holder to the large number of respective scribe lines of the solar cell panel for cleaning, such that the high-pressure liquid jetting direction of each jet nozzle is parallel to that of the other jet nozzles.

A cleaning-in-place system for use with an easily cleanable modular belt. The belt has modules with a body having a first opening formed between adjacent pairs of teeth. The opening extends toward the center of the sprocket to provide access to the hinge area, when the belt engages with the sprocket, for application of cleaning fluid.

In a substrate processing apparatus of the present invention, a buffer bath is provided at any point in a supplying passage of a processing solution supplying part, and a micro bubble generator is provided in the buffer bath. When a substrate is processed, large quantities of micro bubbles can be generated and stored in the buffer bath, and the micro bubbles can be supplied from the buffer bath to a processing bath. This enables the large quantities of micro bubbles to be supplied to the surrounding of the substrate, while the use of the small micro bubble generator avoids an increase in the size of the substrate processing apparatus.

The present invention provides a method of cleaning steel sheet, said method of cleaning steel sheet feeding a cleaning solution activated by ultrasonic waves of a frequency of 0.8 MHz to 3 MHz to a surface of steel sheet at an angle inclined by 1 to 80° with respect to a line perpendicular to the surface of the steel sheet in a direction opposite to the running direction, thereby enabling megasonic waves to be applied to cleaning of running steel sheet and improving the cleaning effect and cleaning speed, and a continuous cleaning system of steel sheet.

There is disclosed an electronic imaging device having an imaging element, a mechanism which removes dust attached to the imaging element or an optical element disposed in front of the imaging element, and a display section which displays that at least the mechanism is operating. Consequently, an operator of the electronic imaging device can exactly recognize whether or not the mechanism to remove the dust is operating. Examples of the mechanism which removes the dust include an excitation mechanism which vibrates a dustproof filter disposed in front of the imaging element, a mechanism which removes the dust by a gas flow and the like.

An apparatus for cleaning contaminants from a construction mat is described including a washing chamber and an automated conveyor assembly translating the construction mat into and out of the washing chamber. The washing chamber includes a plurality of elongated tines adapted to scrape debris from the was mat and a spray system direction cleansing liquid under pressure at the mat, and a closed loop water reclamation system for filtering and recycling cleansing liquid for reusing the spray system.

A system for cleaning elongated objects uses a single inclined conveyor with a lower end adjacent a back stop disposed inside a tank containing cleaning solution. The elongated objects pile up between the back stop and the conveyor and a jet manifold sprays a lower side of the pile where pusher flights on the conveyor pick off the objects one at a time. A flip back plate strips the objects from the conveyor to continuously circulate the objects in the cleaning solution from the bottom to the top of the pile. The plate is retracted to allow the conveyor to deliver the objects to a rinse water basin where the clean objects are rinsed and then removed.

A substrate carrying apparatus includes an arm body; supporting portion provided in the arm body and adapted to support a region inside the periphery of the rear face of the substrate; a one-side restricting portion and an other-side restricting portion provided at opposite positions across the periphery of the substrate to restrict the peripheral positions of the substrate; and liquid receivers provided between each supporting portion and each restricting portion. A liquid drop attached to the rear peripheral portion of the substrate flows down on the bottom face of each liquid receiver. Even though repeated substrate carrying operations are performed and thus the liquid drop is accumulated in each liquid receiver, there is no risk that the liquid drop in each liquid receiver would be scattered in the air by the action of the periphery of the substrate and hence the scattered liquid would be attached again onto the surface of the substrate.