The invention discloses a differential interference detection device and a detection method for pattern-free
wafer surface defects, which are characterized in that a
laser light source lens is coupled into an
optical fiber, sequentially passes through a
collimator, a half-wave plate and a
beam expander, is reflected into a quarter-wave plate through a
beam splitter prism and a reflector, and is split into P light and S light by a
polarization beam splitter prism; after being reflected by the two right-angle prisms, the light beams are transmitted in a
common path, focused by the focusing mirror and irradiated to the surface of a
wafer through the diaphragm; and subsequently, the light is reflected by the
wafer, returns to the
beam splitter prism along the original path, passes through the
beam splitter prism and the polaroid, enters the
polarization beam splitter prism through the focusing mirror, is split into P light and S light signals and is collected by the photoelectric
detector, and then the
phase gradient of the detected surface is solved, so that accurate surface defect information is obtained. According to the invention, the existence and the shape of the surface defect can be detected on line, the three-dimensional geometric structure of the surface defect can be measured, and the defect type and the forming source can be accurately distinguished, so that the defect geometric structure detection and identification problem is solved.