Interferometric defect detection and classification
What is Al technical title?
Al technical title is built by PatSnap Al team. It summarizes the technical point description of the patent document.
A defect and detection system technology, applied in the field of common-optical path interference, can solve expensive, unstable, complex and other problems
Inactive Publication Date: 2011-06-08
焕・J・郑
View PDF10 Cites 51 Cited by
Summary
Abstract
Description
Claims
Application Information
AI Technical Summary
This helps you quickly interpret patents by identifying the three key elements:
Problems solved by technology
Method used
Benefits of technology
Problems solved by technology
However, these systems are not only complex and expensive, but also have serious disadvantages: photon noise and sample pattern noise can be excessive, and they are also unstable due to the fact that the probe and reference beams use two different optical paths
Their method is not only complex and computationally intensive, but also not suitable for detection of small defects
Method used
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more
Image
Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
Click on the blue label to locate the original text in one second.
Reading with bidirectional positioning of images and text.
Smart Image
Examples
Experimental program
Comparison scheme
Effect test
Embodiment Construction
[0057] A detailed description of the subject matter of the invention is provided below. While several embodiments have been described, it should be understood that the inventive body of work is not limited to any one embodiment, but includes many variations, modifications and equivalents as well as combinations of features in different embodiments. Furthermore, while numerous specific details are set forth in the following description in order to provide a thorough understanding of the inventive body of work, some embodiments may be practiced without some or all of these details. Furthermore, for the purpose of clarity, certain technical material that is known in the related technical fields has not been described in detail to avoid unnecessarily obscuring the inventive working subject. The words "reticle" and "mask" are used interchangeably herein to refer to a patterned object that is used as a subject to create other patterned objects.
[0058] Light fields can be describe...
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more
PUM
Login to view more
Abstract
Systems and methods for using common-path interferometric imaging for defect detection and classification are described. An illumination source generates and directs coherent light toward the sample. An optical imaging system collects light reflected or transmitted from the sample including a scattered component and a specular component that is predominantly undiffracted by the sample. A variablephase controlling system is used to adjust the relative phase of the scattered component and the specular component so as to change the way they interfere at the image plane. The resultant signal is compared to a reference signal for the same location on the sample and a difference above threshold is considered to be a defect. The process is repeated multiple times each with a different relative phase shift and each defect location and the difference signals are stored in memory. This data is used to calculate an amplitude and phase for each defect.
Description
[0001] Cross-references for applications [0002] This application claims U.S. Patent Application No. 12 / 190,144, filed August 12, 2008, U.S. Provisional Patent Application No. 61 / 130,729, filed June 3, 2008, U.S. Provisional Patent Application 61 / 135,616, U.S. Provisional Patent Application 61 / 189,508, filed August 20, 2008, U.S. Provisional Patent Application 61 / 189,509, filed August 20, 2008, U.S. Provisional Patent Application 61, filed August 20, 2008 / 189,510, and U.S. Provisional Patent Application No. 61 / 210,513, filed March 19, 2009, each of which is incorporated herein by reference. technical field [0003] This patent specification relates to common-optical path interference. More specifically, this patent specification relates to high-resolution common-optical path interference imaging for detection and classification of defects in microlithographic devices, such as semiconductor devices and integrated circuits, and defects in lithographic reticles. Background ...
Claims
the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more
Application Information
Patent Timeline
Application Date:The date an application was filed.
Publication Date:The date a patent or application was officially published.
First Publication Date:The earliest publication date of a patent with the same application number.
Issue Date:Publication date of the patent grant document.
PCT Entry Date:The Entry date of PCT National Phase.
Estimated Expiry Date:The statutory expiry date of a patent right according to the Patent Law, and it is the longest term of protection that the patent right can achieve without the termination of the patent right due to other reasons(Term extension factor has been taken into account ).
Invalid Date:Actual expiry date is based on effective date or publication date of legal transaction data of invalid patent.
Login to view more 
Login to view more