Photoresist uniformity developing machine with cooling structure

Abstract

The application discloses a photoresist uniform coating and developing machine containing a cooling structure and belongs to the technical field of developing machines. The developing machine contains a developing table, two developing tanks and two rinsing tanks arranged on the lower side of the inside of the developing table, a developing mechanism mounted on the top side of the inside of the developing table, and a drying mechanism arranged on the front side of the developing table. The photoresist uniform coating and developing machine containing the cooling structure can automatically immerse photoresist films into developing solution for development, and can automatically immerse the photoresist films into rinsing solution for rinsing after the development is completed. The whole process does not need manual tank replacement, the working efficiency is improved, and the developing solution or the rinsing solution is prevented from being adhered to the hands of the personnel. The photoresist films can be automatically swung during the development or the rinsing, and the development quality of the photoresist films is improved.

Description

Technical Field

[0001] This invention relates to the field of developing machine technology, specifically to a photoresist homogenizing and developing machine with a cooling structure. Background Technology

[0002] A developing machine is a printing processing device that completes some or all of the processes such as developing, washing, coating, and drying in one go through semi-automatic and fully automatic programs on the exposed printing plate.

[0003] The photolithography developing machine has four tanks, which contain developer, rinsing solution, and rinsing solution respectively. When the photolithography developing machine is working, it is usually necessary to manually move the film for development and then manually change the tank, which makes it easy for the developer or rinsing solution on the film to stick to your hands. Summary of the Invention

[0004] To address the shortcomings of existing technologies, this invention provides a photoresist spin coater and developer with a cooling structure, which solves the problem that traditional photoresist developers require manual wiggling of the film for development and then manual tank changing.

[0005] To achieve the above objectives, the present invention is implemented through the following technical solution: a photoresist spin coater and developer with a cooling structure, comprising a developing table, wherein two developing tanks and two rinsing tanks are provided on the lower side of the interior of the developing table, a developing mechanism is installed on the top side of the interior of the developing table, and a drying mechanism is provided on the front side of the developing table.

[0006] The developing mechanism includes a first rotary cylinder installed on the top side inside the developing table. The output shaft of the first rotary cylinder is connected to a driving hydraulic cylinder. The output shaft of the driving hydraulic cylinder is connected to a limit block. A horizontal beam is provided on one side of the limit block. Two moving blocks are slidably sleeved on the outside of the beam. The lower ends of the two moving blocks are connected to a developing bracket. A second rotary cylinder is installed on one side of the beam between the two moving blocks. The output shaft of the second rotary cylinder is connected to a turntable. An eccentric rod is hinged to one side of each side of the turntable. The ends of the two eccentric rods away from the turntable are respectively hinged to the front sides of the two moving blocks.

[0007] Preferably, the two developing tanks and the two rinsing tanks are equidistant from each other, the limiting block is located directly above the center between the developing tank and the rinsing tank, and the two developing supports are located directly above the two developing tanks.

[0008] Preferably, the developing support includes a concave frame disposed at the lower end of the moving block, a filter frame is hinged between the two ends of the concave frame, and a cooling fan is installed on the top side inside the concave frame.

[0009] Preferably, an electric push rod is installed on one side of the concave frame, and a drive disk is rotatably mounted on one end of the electric push rod. One end of the drive disk is connected to the filter screen frame. The rotation centers of the filter screen frame and the drive disk are located on the same axis. The output shaft of the electric push rod is hinged to a connecting rod, and the end of the connecting rod away from the output shaft of the electric push rod is hinged to one edge of the drive disk.

[0010] Preferably, the drying mechanism includes a drying box located in front of the developing table, a material support mechanism inside the drying box, and a shell communicating with the interior of the drying box on one side. A drying fan is installed inside the shell, and a heating tube is horizontally installed inside the shell on one side of the drying fan.

[0011] Preferably, the material support mechanism includes a lifting hydraulic cylinder installed inside the lower side of the drying oven. The output shaft of the lifting hydraulic cylinder is connected to a limit plate. A support plate is hinged to the upper part of the limit plate, and a rubber pad is provided on the upper part of the support plate.

[0012] Preferably, an adjusting hydraulic cylinder is installed on the lower part of one side of the limiting plate. An adjusting rod is hinged to the output shaft of the adjusting hydraulic cylinder. The end of the adjusting rod away from the output shaft of the adjusting hydraulic cylinder is hinged to the lower part of one side of the support plate. A strip groove corresponding to the adjusting rod is provided on the lower part of the limiting plate. The end of the adjusting rod away from the output shaft of the adjusting hydraulic cylinder passes through the strip groove and is laterally slidably connected to the limiting plate.

[0013] Preferably, a guide plate is inclined downward on the upper front side of the drying box, and a support plate is provided on the lower front side of the drying box. A placement groove is provided on the upper part of the support plate, and a storage box is placed in the placement groove. The storage box is located below the guide plate.

[0014] This invention provides a photoresist spin coater and developer with a cooling structure, which has the following advantages compared with the prior art:

[0015] 1. After the photoresist is placed into the filter frame, the developing machine can automatically immerse the photoresist in the developing solution for development. After development, it can automatically immerse the photoresist in the rinsing solution for rinsing. The entire process does not require manual tank changing, which improves work efficiency and avoids the developing solution or rinsing solution sticking to the operator's hands. During development or rinsing, the machine can automatically oscillate the photoresist to improve the development quality of the photoresist.

[0016] 2. After the photoresist is rinsed, it can be automatically fed into the drying oven for drying. After drying, it can automatically unload the photoresist. From development to unloading, the entire process requires no manual operation, making it convenient and fast. Attached Figure Description

[0017] Figure 1 This is a schematic diagram of the structure of the present invention;

[0018] Figure 2 This is a schematic diagram of the developing mechanism of the present invention;

[0019] Figure 3 This is a schematic diagram of the structure of the developing bracket of the present invention;

[0020] Figure 4 This is a schematic diagram of the drying mechanism of the present invention;

[0021] Figure 5 This is a schematic diagram of the internal structure of the drying oven of the present invention;

[0022] Figure 6 This is a schematic diagram of the material support mechanism of the present invention.

[0023] In the diagram: 1. Developing table; 2. Developing tank; 3. Rinsing tank; 4. Developing mechanism; 41. First rotary cylinder; 42. Drive hydraulic cylinder; 43. Limiting block; 44. Crossbeam; 45. Moving block; 46. Developing support; 461. Concave frame; 462. Filter frame; 463. Cooling fan; 464. Electric push rod; 465. Drive disc; 466. Connecting rod; 47. Second rotary cylinder; 48. Turntable; 49. Eccentric rod; 5. Drying mechanism; 51. Drying box; 52. Material support mechanism; 521. Lifting hydraulic cylinder; 522. Limiting plate; 523. Support plate; 524. Adjusting hydraulic cylinder; 525. Adjusting rod; 526. Support pad; 53. Housing; 54. Drying fan; 55. Heating tube; 56. Support plate; 57. Storage box; 58. Guide plate. Detailed Implementation

[0024] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0025] Please see Figure 1-6 This invention provides three technical solutions:

[0026] Example 1

[0027] Please see Figure 1 In this embodiment of the invention, a photoresist homogenizing and developing machine with a cooling structure includes a developing table 1. The lower side of the developing table 1 is provided with two developing tanks 2 and two rinsing tanks 3. The top side of the developing table 1 is provided with a developing mechanism 4, and the front side of the developing table 1 is provided with a drying mechanism 5.

[0028] Please see Figure 2In this embodiment of the invention, the developing mechanism 4 includes a first rotary cylinder 41 installed on the top side inside the developing table 1. The output shaft of the first rotary cylinder 41 is connected to a driving hydraulic cylinder 42. The output shaft of the driving hydraulic cylinder 42 is connected to a limiting block 43. A horizontal beam 44 is horizontally arranged on one side of the limiting block 43. Two moving blocks 45 are laterally slidably sleeved on the outside of the beam 44. The lower ends of the two moving blocks 45 are connected to a developing bracket 46. A second rotary cylinder 47 is installed on one side of the beam 44 between the two moving blocks 45. The output shaft of the second rotary cylinder 47 is connected to a turntable 48. An eccentric rod 49 is hinged to one side of both sides of the turntable 48. The ends of the two eccentric rods 49 away from the turntable 48 are respectively hinged to the front side of the two moving blocks 45.

[0029] In use, the photoresist to be developed is placed into the two developing supports 46. Then, the hydraulic cylinder 42 drives the limiting block 43 to move downwards, which in turn drives the crossbeam 44 to move downwards, so that the two developing supports 46 are respectively immersed in the developing solution inside the two developing tanks 2. The developing solution inside the developing tanks 2 develops the photoresist. After development is complete, the hydraulic cylinder 42 drives the developing supports 46 to leave the developing tanks 2. Then, the first rotary cylinder 41 drives the hydraulic cylinder 42 to rotate 180 degrees. The two developing supports 46 are respectively aligned with the two rinsing tanks 3. After alignment, the hydraulic cylinder 42 is driven to immerse the developing supports 46 in the rinsing solution inside the rinsing tank 3 for rinsing. During developing or rinsing, the second rotary cylinder 47 drives the turntable 48 to rotate back and forth continuously. The turntable 48 causes the eccentric rod 49 to move eccentrically. The eccentric rod 49 drives the moving block 45 to slide back and forth on the crossbeam 44, thereby causing the developing supports 46 to swing back and forth, improving the quality of developing or rinsing the photoresist.

[0030] For further details, please refer to Figure 2 In this embodiment of the invention, two developing tanks 2 and two rinsing tanks 3 are equidistantly arranged, and the limiting block 43 is located directly above the center between the developing tank 2 and the rinsing tank 3. Two developing supports 46 are located directly above the two developing tanks 2. When the crossbeam 44 rotates 180 degrees, the two developing supports 46 will be located directly above the two rinsing tanks 3 respectively.

[0031] For further details, please refer to [link / reference]. Figure 3 In this embodiment of the invention, the developing support 46 includes a concave frame 461 disposed at the lower end of the moving block 45. A filter frame 462 is hinged between the two ends of the concave frame 461, and a cooling fan 463 is installed on the top side inside the concave frame 461. The cooling fan 463 performs a cooling operation on the photoresist after rinsing.

[0032] Example 2 differs from Example 1 in that:

[0033] Please see Figure 3In this embodiment of the invention, an electric push rod 464 is installed on one side of the concave frame 461, and a drive disk 465 is rotatably provided on one end of the electric push rod 464. One end of the drive disk 465 is connected to the filter frame 462. The rotation centers of the filter frame 462 and the drive disk 465 are located on the same axis. The output shaft of the electric push rod 464 is hinged to a connecting rod 466. The end of the connecting rod 466 away from the output shaft of the electric push rod 464 is hinged to one edge of the drive disk 465.

[0034] Please see Figure 4-5 In this embodiment of the invention, the drying mechanism 5 includes a drying box 51 disposed in front of the developing table 1. The drying box 51 is provided with a material support mechanism 52, and a shell 53 communicating with the interior is disposed on one side of the drying box 51. A drying fan 54 is installed on the inner side of the shell 53, and a heating tube 55 is horizontally installed on one side of the drying fan 54 inside the shell 53.

[0035] Please see Figure 4-5 In this embodiment of the invention, the material support mechanism 52 includes a lifting hydraulic cylinder 521 installed inside the lower side of the drying oven 51. The output shaft of the lifting hydraulic cylinder 521 is connected to a limit plate 522. A support plate 523 is hinged to the upper part of the limit plate 522. A rubber pad 526 is provided on the upper part of the support plate 523.

[0036] In operation, the drive hydraulic cylinder 42 moves the filter frame 462 out of the rinsing tank 3. Then, the first rotary cylinder 41 rotates the limit block 43 90 degrees, so that the two filter frames 462 are directly above the drying chamber 51. The electric push rod 464 causes the connecting rod 466 to rotate the drive plate 465, which in turn rotates the filter frames 462, causing them to flip over. This allows the photoresist in the filter frames 462 to fall onto the support pad 526. Next, the lifting hydraulic cylinder 521 moves the limit plate 522 downward, so that the photoresist on the support pad 526 is below the housing 53. Then, the drying fan 54 blows air, and under the heating of the heating tube 55, hot air is blown onto the photoresist, thus drying the photoresist.

[0037] Example 3 differs from Example 1 in that:

[0038] Please see Figure 6 In this embodiment of the invention, an adjusting hydraulic cylinder 524 is installed on the lower part of one side of the limiting plate 522. An adjusting rod 525 is hinged to the output shaft of the adjusting hydraulic cylinder 524. The end of the adjusting rod 525 away from the output shaft of the adjusting hydraulic cylinder 524 is hinged to the lower part of one side of the support plate 523. A strip groove corresponding to the adjusting rod 525 is provided on the lower part of the limiting plate 522. The end of the adjusting rod 525 away from the output shaft of the adjusting hydraulic cylinder 524 passes through the strip groove and is laterally slidably connected to the limiting plate 522.

[0039] Please see Figure 4 In this embodiment of the invention, a guide plate 58 is inclined downward on the upper front side of the drying box 51, and a support plate 56 is provided on the lower front side of the drying box 51. A placement groove is provided on the upper part of the support plate 56, and a storage box 57 is placed in the placement groove. The storage box 57 is located below the guide plate 58.

[0040] In use, the lifting hydraulic cylinder 521 moves the limit plate 522 out of the drying chamber 51, and then the adjusting hydraulic cylinder 524 moves the adjusting rod 525. The adjusting rod 525 will drive the support plate 523 to rotate, so that it tilts towards the guide plate 58 on the drying chamber 51. In this way, the photoresist on the pad 526 will slide onto the guide plate 58, and then slide from the guide plate 58 into the storage box 57, completing the unloading operation.

[0041] Working principle: The photoresist to be developed is placed into two filter frames 462. Then, the hydraulic cylinder 42 drives the limiting block 43 to move downward, which in turn drives the crossbeam 44 to move downward, so that the two filter frames 462 are respectively immersed in the developing solution inside the two developing tanks 2. The developing solution inside the developing tanks 2 develops the photoresist. After development is completed, the hydraulic cylinder 42 drives the filter frames 462 to leave the developing tanks 2. Then, the first rotary cylinder 41 drives the hydraulic cylinder 42 to rotate 180 degrees, so that the two filter frames 462 correspond to the two rinsing tanks 3 respectively. After correspondence, the hydraulic cylinder 42 immerses the filter frames 462 in the rinsing solution inside the rinsing tanks 3 for rinsing.

[0042] During development or rinsing, the second rotary cylinder 47 drives the turntable 48 to rotate back and forth continuously. The turntable 48 causes the eccentric rod 49 to move eccentrically. The eccentric rod 49 then drives the moving block 45 to slide back and forth on the crossbeam 44, which in turn drives the filter frame 462 to swing back and forth, thereby improving the quality of photoresist development or rinsing.

[0043] After rinsing, the drive hydraulic cylinder 42 drives the filter frame 462 to leave the rinsing tank 3. Then, the first rotary cylinder 41 drives the limit block 43 to rotate 90 degrees, so that the two filter frames 462 are directly above the drying chamber 51. The cooling fan 463 can blow air to cool the photoresist. After cooling, the electric push rod 464 drives the connecting rod 466 to drive the drive disk 465 to rotate. The drive disk 465 drives the filter frame 462 to rotate, so that it flips over. In this way, the photoresist in the filter frame 462 will fall onto the support pad 526. Then, the lifting hydraulic cylinder 521 drives the limit plate 522 to move downward, so that the photoresist on the support pad 526 is below the housing 53. Then, the drying fan 54 blows air, and under the heating of the heating tube 55, hot air is blown onto the photoresist, thereby drying the photoresist.

[0044] After drying, the lifting hydraulic cylinder 521 moves the limit plate 522 out of the drying chamber 51. Then, the adjusting hydraulic cylinder 524 moves the adjusting rod 525, which in turn rotates the support plate 523, causing it to tilt toward the guide plate 58 on the drying chamber 51. This allows the photoresist on the pad 526 to slide onto the guide plate 58 and then slide from the guide plate 58 into the storage box 57, completing the unloading operation.

[0045] Finally, the next batch of photoresist is placed into the filter frame 462 for developing, rinsing, cooling and drying.

[0046] Furthermore, any content not described in detail in this specification is existing technology known to those skilled in the art.

Claims

1. A photoresist spin coater and developer with a cooling structure, comprising a developing table (1), wherein two developing tanks (2) and two rinsing tanks (3) are provided on the lower side of the interior of the developing table (1), characterized in that: The developing table (1) is equipped with a developing mechanism (4) on its inner top side, and a drying mechanism (5) is provided on the front side of the developing table (1). The developing mechanism (4) includes a first rotary cylinder (41) installed on the top side inside the developing table (1). The output shaft of the first rotary cylinder (41) is connected to a driving hydraulic cylinder (42). The output shaft of the driving hydraulic cylinder (42) is connected to a limit block (43). A horizontal beam (44) is horizontally arranged on one side of the limit block (43). Two moving blocks (45) are horizontally slidably sleeved on the outside of the beam (44). The lower ends of the two moving blocks (45) are connected to a developing bracket (46). A second rotary cylinder (47) is installed on one side of the beam (44) between the two moving blocks (45). The output shaft of the second rotary cylinder (47) is connected to a turntable (48). An eccentric rod (49) is hinged to one side of both sides of the turntable (48). The ends of the two eccentric rods (49) away from the turntable (48) are respectively hinged to the front side of the two moving blocks (45).

2. The photoresist spin coater and developer with a cooling structure according to claim 1, characterized in that: The two developing tanks (2) and the two rinsing tanks (3) are equidistant from each other. The limiting block (43) is located directly above the center between the developing tank (2) and the rinsing tank (3). The two developing supports (46) are located directly above the two developing tanks (2).

3. The photoresist spin coater and developer with a cooling structure according to claim 1, characterized in that: The developing support (46) includes a concave frame (461) disposed at the lower end of the movable block (45), a filter frame (462) is hinged between the two ends of the concave frame (461), and a cooling fan (463) is installed on the top side inside the concave frame (461).

4. A photoresist spin coater and developer with a cooling structure according to claim 3, characterized in that: An electric push rod (464) is installed on one side of the concave frame (461), and a drive disk (465) is rotatably mounted on one end of the electric push rod (464). One end of the drive disk (465) is connected to the filter frame (462). The rotation centers of the filter frame (462) and the drive disk (465) are located on the same axis. The output shaft of the electric push rod (464) is hinged to a connecting rod (466). The end of the connecting rod (466) away from the output shaft of the electric push rod (464) is hinged to one edge of the drive disk (465).

5. A photoresist spin coater and developer with a cooling structure according to claim 1, characterized in that: The drying mechanism (5) includes a drying box (51) located in front of the developing table (1). The drying box (51) is equipped with a material support mechanism (52), and a shell (53) communicating with the interior is provided on one side of the drying box (51). A drying fan (54) is installed on the inner side of the shell (53), and a heating tube (55) is horizontally installed on one side of the drying fan (54) inside the shell (53).

6. A photoresist spin coater and developer with a cooling structure according to claim 5, characterized in that: The material support mechanism (52) includes a lifting hydraulic cylinder (521) installed inside the lower side of the drying oven (51). The output shaft of the lifting hydraulic cylinder (521) is connected to a limit plate (522). A support plate (523) is hinged to the upper part of the limit plate (522). A rubber pad (526) is provided on the upper part of the support plate (523).

7. A photoresist spin coater and developer with a cooling structure according to claim 6, characterized in that: An adjusting hydraulic cylinder (524) is installed on the lower part of one side of the limiting plate (522). An adjusting rod (525) is hinged to the output shaft of the adjusting hydraulic cylinder (524). The end of the adjusting rod (525) away from the output shaft of the adjusting hydraulic cylinder (524) is hinged to the lower part of one side of the support plate (523). A strip groove corresponding to the adjusting rod (525) is provided on the lower part of the limiting plate (522). The end of the adjusting rod (525) away from the output shaft of the adjusting hydraulic cylinder (524) passes through the strip groove and is laterally slidably connected to the limiting plate (522).

8. A photoresist spin coater and developer with a cooling structure according to claim 5, characterized in that: A guide plate (58) is inclined downward on the upper front side of the drying box (51), and a support plate (56) is provided on the lower front side of the drying box (51). A placement groove is provided on the upper part of the support plate (56), and a storage box (57) is placed in the placement groove. The storage box (57) is located below the guide plate (58).

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