Semiconductor grinding fluid material preparation device

Abstract

The utility model discloses a semiconductor grinding fluid material preparation device which comprises three stainless steel stirring kettles, namely a 260L pure water stirring kettle, a 500L liquid medicine stirring kettle and a 500L mixing stirring kettle, and the pure water stirring kettle is communicated with the liquid medicine stirring kettle after being connected with the liquid medicine stirring kettle through a three-way pipe; the four diaphragm pumps are respectively arranged at a liquid outlet of the pure water stirring kettle, a liquid inlet and a liquid outlet of the liquid medicine stirring kettle and a liquid outlet of the mixing stirring kettle; the two filters are respectively connected to a diaphragm pump at a liquid outlet of the liquid medicine stirring kettle and a diaphragm pump at a liquid outlet of the mixing stirring kettle; the sensor assembly comprises a liquid level sensor, a pressure sensor, a temperature sensor and a flow sensor. By arranging the three stirring kettles, various medicaments, alumina powder and water can be separately stored, precise control mixing can be carried out according to needs, and the flow, the liquid level, the pressure and the temperature can be automatically metered.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor polishing liquid preparation, in particular to a semiconductor polishing liquid material preparation device. Background Art

[0002] The preparation of semiconductor polishing liquid in the prior art is usually monitored manually. When different liquid concentrations are required, the manual preparation method is cumbersome and has low precision. In order to achieve precise control of the mixing of various reagents, alumina powder and water, it is necessary to develop an automatic feeding stirring kettle, in which the mixed pH can be monitored online and the stirring speed is adjustable. A skid station is required to achieve automatic metering, such as flow, liquid level, pressure, temperature, etc.

[0003] To this end, the utility model provides a semiconductor polishing liquid material preparation device to solve the above technical problems. Utility Model Content

[0004] Purpose of the utility model: To solve the problem that the preparation of semiconductor polishing liquid in the prior art is usually manually monitored, and when different liquid concentrations are required, the manual preparation method is cumbersome and has low precision.

[0005] In order to achieve the above purpose, the utility model provides the following technical solutions:

[0006] A semiconductor polishing liquid material preparation device, comprising:

[0007] Three stainless steel stirring kettles, the three stainless steel stirring kettles are: a 260L pure water stirring kettle, a 500L liquid medicine stirring kettle and a 500L mixed stirring kettle, the pure water stirring kettle and the liquid medicine stirring kettle are connected through a three-way pipe and then connected to the mixed stirring kettle;

[0008] A diaphragm pump, wherein four diaphragm pumps are provided, which are respectively provided at the liquid outlet of the pure water stirring kettle, the liquid inlet and liquid outlet of the liquid stirring kettle, and the liquid outlet of the mixing stirring kettle;

[0009] A filter, wherein two filters are provided, and are respectively connected to a diaphragm pump at a liquid outlet of the liquid stirring kettle and a diaphragm pump at a liquid outlet of the mixing stirring kettle;

[0010] The sensor assembly comprises a liquid level sensor, a pressure sensor, a temperature sensor and a flow sensor. The liquid level sensor, the pressure sensor and the temperature sensor are respectively arranged in each stirring tank, and the flow sensor is arranged at the liquid outlet of each stirring tank.

[0011] Furthermore, the pure water stirring kettle, the liquid medicine stirring kettle and the mixed stirring kettle are all the same in structure except for their sizes. The stirring kettle comprises:

[0012] Stainless steel outer wall;

[0013] An inner cylinder, wherein the inner cylinder is arranged in a stainless steel outer wall and is made of PP material;

[0014] A stirring kettle top cover, wherein the stirring kettle top cover is arranged above the stainless steel outer wall;

[0015] A stirring blade is arranged in the inner cylinder and is driven to rotate by a motor.

[0016] Furthermore, a heating rod and a stirring motor are arranged at the bottom of the pure water stirring kettle to make the liquid temperature uniform.

[0017] Furthermore, the sensor assembly also includes a pH sensor, and the pH sensor is arranged in the mixing stirring tank and the liquid stirring tank.

[0018] Furthermore, the semiconductor polishing liquid material preparation device also includes a weighing barrel, which is used to weigh the liquid discharged after stirring in the mixing and stirring kettle.

[0019] Furthermore, each device of the semiconductor polishing liquid material preparation apparatus is controlled by an electric actuator.

[0020] By setting up three stirring tanks, various reagents, alumina powder and water can be stored separately, mixed precisely as needed, and the flow, liquid level, pressure and temperature can be automatically measured. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a schematic diagram of the top view structure of the utility model;

[0022] Figure 2 It is a structural schematic diagram of a stirring kettle in the utility model;

[0023] Figure 3 It is a schematic diagram of the workflow of the present utility model.

[0024] In the figure: 1. Pure water stirring kettle; 2. Liquid stirring kettle; 3. Mixing stirring kettle; 4. Diaphragm pump; 5. Filter; 6. Stainless steel outer wall; 7. Inner cylinder; 8. Stirring kettle top cover; 9. Stirring blades; 10. Motor; 11. Liquid level sensor; 12. Temperature sensor; 13. Pressure sensor; 14. Heating rod; 15. Stirring motor; 16. Weighing and barreling. DETAILED DESCRIPTION

[0025] In the following description, a large number of specific details are given to provide a more thorough understanding of the utility model. However, it is obvious to those skilled in the art that the utility model can be implemented without one or more of these details. In other examples, in order to avoid confusion with the utility model, some technical features known in the art are not described.

[0026] The applicant believes that in the prior art, the preparation of semiconductor polishing liquid is usually manually monitored. When different liquid concentrations are required, the manual preparation method is relatively cumbersome and has low accuracy.

[0027] To this end, the applicant designed Figure 1-3 The semiconductor polishing liquid material preparation device shown in the figure comprises: three stainless steel stirring kettles, which are: a 260L pure water stirring kettle 1, a 500L liquid medicine stirring kettle 2 and a 500L mixed stirring kettle 3, wherein the pure water stirring kettle 1 is connected to the liquid medicine stirring kettle 2 through a three-way pipe and then connected to the mixed stirring kettle 3; a diaphragm pump 4, wherein four diaphragm pumps 4 are arranged, respectively arranged at the liquid outlet of the pure water stirring kettle 1, the liquid inlet and the liquid outlet of the liquid medicine stirring kettle 2, and the liquid outlet of the mixed stirring kettle 3; a filter 5, wherein two filters 5 are arranged, respectively connected to the liquid medicine stirring kettle 2 and the diaphragm pump 4 at the liquid outlet of the mixing and stirring kettle 3; a sensor component, the sensor component includes a liquid level sensor 11, a pressure sensor 13, a temperature sensor 12 and a flow sensor, the liquid level sensor 11, the pressure sensor 13 and the temperature sensor 12 are respectively arranged in each stirring kettle, and the flow sensor is arranged at the liquid outlet of each stirring kettle; each device of the semiconductor polishing liquid material preparation device is controlled by an electric actuator, the equipment can realize HMI human-machine interaction, and the main control of the semiconductor polishing liquid material preparation device is equipped with a 7-inch touch-screen all-in-one machine.

[0028] Further optional in this embodiment, the pure water stirring kettle 1, the liquid medicine stirring kettle 2 and the mixed stirring kettle 3 are all the same in structure except for their different sizes, and the stirring kettle comprises: a stainless steel outer wall 6; an inner cylinder 7, the inner cylinder 7 is arranged in the stainless steel outer wall 6, and the inner cylinder 7 is made of PP material; a stirring kettle top cover 8, the stirring kettle top cover 8 is arranged above the stainless steel outer wall 6; a stirring blade 9, the stirring blade 9 is arranged through the inner cylinder 7, and the stirring blade 9 is driven to rotate by a motor 10; potassium permanganate and alumina powder are both manually weighed and put into the feeding port of the finished mixed liquid stirring kettle, and the system controls the amount and proportion of water added to make the stirring medium meet the process parameters, and each stirring kettle is provided with transportation by a diaphragm pump 4, and the operation of each stirring kettle is independent and convenient for cleaning and maintenance.

[0029] In this embodiment, it is further optional that a heating rod 14 and a stirring motor 15 are provided at the bottom of the pure water stirring tank 1 to make the liquid temperature uniform.

[0030] In this embodiment, the sensor assembly further includes a pH sensor, and the pH sensor is arranged in the mixing stirring tank 3 and the liquid stirring tank 2.

[0031] In the present embodiment, it is further optional that the semiconductor polishing liquid material preparation device further comprises a weighing barrel 16 , and the weighing barrel 16 is used to weigh the liquid discharged from the mixing and stirring kettle 3 after stirring.

[0032] Working principle: During the working process, firstly, pure water is injected into the pure water stirring kettle 1 for heating and maintaining a constant temperature of 30°C; the required medicine liquid is injected into the medicine liquid stirring kettle 2, and it is circulated and stirred, and the pH value sensor monitors the pH value of the medicine liquid in real time; after the pure water and medicine liquid in the pure water stirring kettle 1 and the medicine liquid stirring kettle 2 meet the mixing requirements, the diaphragm pump 4 is turned on, and the pure water and medicine liquid are injected into the mixing stirring kettle 3 for stirring and mixing, and the medicine liquid is filtered through the filter 5 when it is pumped out of the medicine liquid stirring pump; during the stirring process of the mixing agitator, the stirring kettle is depressurized and the pH value is monitored in real time. After the requirement is met, the diaphragm pump 4 is turned on, and the mixed medicine liquid is pumped out of the mixing stirring pump for secondary filtration, and then pumped into the weighing barrel 16 for weighing to obtain the semiconductor polishing liquid; the used medicine liquid stirring pump and the mixing stirring pump are both drained through the diaphragm pump 4.

[0033] It is obvious to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the present invention can be implemented in other specific forms without departing from the spirit or essential features of the present invention. Therefore, the embodiments should be regarded as exemplary and non-restrictive from any point of view, and the scope of the present invention is defined by the appended claims rather than the above description, and it is intended that all changes falling within the meaning and scope of the equivalent elements of the claims be included in the present invention. Any reference numeral in a claim should not be regarded as limiting the claim to which it relates.

Claims

1. A semiconductor polishing liquid material preparation device, characterized in that: include: Three stainless steel stirring kettles, the three stainless steel stirring kettles are: a 260L pure water stirring kettle, a 500L liquid medicine stirring kettle and a 500L mixed stirring kettle, the pure water stirring kettle and the liquid medicine stirring kettle are connected through a three-way pipe and then connected to the mixed stirring kettle; A diaphragm pump, wherein four diaphragm pumps are provided, which are respectively provided at the liquid outlet of the pure water stirring kettle, the liquid inlet and liquid outlet of the liquid stirring kettle, and the liquid outlet of the mixing stirring kettle; A filter, wherein two filters are provided, and are respectively connected to a diaphragm pump at a liquid outlet of the liquid stirring kettle and a diaphragm pump at a liquid outlet of the mixing stirring kettle; The sensor assembly comprises a liquid level sensor, a pressure sensor, a temperature sensor and a flow sensor. The liquid level sensor, the pressure sensor and the temperature sensor are respectively arranged in each stirring tank, and the flow sensor is arranged at the liquid outlet of each stirring tank.

2. A semiconductor polishing liquid material preparation device according to claim 1, characterized in that: The pure water stirring kettle, the liquid medicine stirring kettle and the mixed stirring kettle are all the same in structure except for their sizes. The stirring kettle comprises: Stainless steel outer wall; An inner cylinder, wherein the inner cylinder is arranged in a stainless steel outer wall and is made of PP material; A stirring kettle top cover, wherein the stirring kettle top cover is arranged above the stainless steel outer wall; A stirring blade is arranged in the inner cylinder and is driven to rotate by a motor.

3. A semiconductor polishing liquid material preparation device according to claim 1, characterized in that: A heating rod and a stirring motor are arranged at the bottom of the pure water stirring kettle to make the liquid temperature uniform.

4. A semiconductor polishing liquid material preparation device according to claim 1, characterized in that: The sensor assembly also includes a pH sensor, which is arranged in the mixing and stirring tank and the liquid medicine stirring tank.

5. A semiconductor polishing liquid material preparation device according to claim 1, characterized in that: The device for preparing semiconductor polishing liquid material also includes a weighing barrel, which is used to weigh the liquid discharged from the mixing and stirring kettle after stirring.

6. A semiconductor polishing liquid material preparation device according to claim 1, characterized in that: Each device of the semiconductor polishing liquid material preparation device is controlled by an electric actuator.

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