Drying device for silicon wafer cleaning machine

Abstract

The utility model relates to the field of silicon wafers, and discloses a drying device for a silicon wafer cleaning machine, which comprises a drying box, the outer wall of the drying box is provided with a replacement port, and the outer wall of the drying box is provided with a transmission port; the drying part is arranged in the drying box; the pretreatment part is arranged in the drying box; a cleaned silicon wafer is flatly laid in a filter box, then a handle is held by a hand, the filter box is pushed inwards along the track of a connecting rail, then a magnetic shifting rod is shifted, and the magnetic shifting rod is not in magnetic attraction connection with a magnetic block any more, so that the magnetic shifting rod controls a clamping block to rotate, and then the clamping block is in clamping connection with a clamping groove; and then a motor is driven to drive the fixed frame to rotate, and the fixed frame stably rotates under the action of a sliding block and an annular rail, so that the effect of uniformly drying the silicon wafer under the action of a dryer is achieved.

Description

Technical Field

[0001] The utility model relates to the field of silicon wafers, in particular to a drying device for a silicon wafer cleaning machine. Background Art

[0002] Silicon wafers refer to silicon wafers with high purity, perfect crystal shape and certain thickness, which are made of silicon single crystal wafers or silicon multi-crystal wafers. Silicon wafers have stable crystal structure and high dimensional accuracy, and are important materials for semiconductor electronics and lighting industries.

[0003] Current silicon wafer cleaning machines use drying devices to dry the cleaned silicon wafers, allowing them to quickly enter the next process. However, some water stains will still remain on the surface of the silicon wafers that have just been cleaned. If these water stains cannot be squeezed or wiped off, the subsequent drying process time will be extended and the silicon wafers will not be able to enter the next process faster. Utility Model Content

[0004] The utility model aims to provide a drying device for a silicon wafer cleaning machine, so as to achieve the purpose of solving the above-mentioned background technical problems.

[0005] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a drying device for a silicon wafer cleaning machine, comprising a drying box, the outer wall of which is provided with a replacement port, and the outer wall of which is provided with a transfer port; a drying part arranged inside the drying box; a pretreatment part arranged inside the drying box; a collection box, which is slidably connected to the inside of the drying box, and the collection box is adapted to the transfer port; and a bottom leg, which is fixedly connected to the bottom of the drying box.

[0006] Preferably, the drying part includes: a motor fixedly connected to the outer wall of the drying box; a ring rail fixedly connected to the inner wall of the drying box; a connecting rail fixedly connected to the inner wall of the drying box; and a dryer fixedly connected to the top of the inner wall of the drying box and arranged equidistantly around the circumference.

[0007] Preferably, the output end of the motor passes through the drying box and is fixedly connected to a fixed frame, a sliding block is fixedly connected to one side of the fixed frame, the sliding block is adapted to the annular rail, a slot is provided on the inner side of the fixed frame, a sliding rail is fixedly connected to the inner side of the fixed frame, the sliding rail is adapted to the connecting rail, and a filter box is slidably connected to the outer wall of the connecting rail.

[0008] Preferably, a connection port is opened inside the filter box, a handle is fixedly connected to one side of the filter box, a magnetic block is fixedly connected to one side of the filter box, a magnetic lever is rotatably connected to one side of the filter box, one end of the magnetic lever passes through the filter box and is fixedly connected to a card block, and the card block is adapted to the card slot.

[0009] Preferably, the pretreatment part includes: a hydraulic pump fixedly connected to the top of the drying box; and a filter plate slidably connected to the inside of the filter box.

[0010] Preferably, the output end of the hydraulic pump passes through the drying box and is fixedly connected to a pressing plate, the pressing plate is adapted to the filter plate, the bottom of the filter plate is fixedly connected to a connecting column, the outer wall of the connecting column is provided with a limiting groove, and is equidistantly arranged, the outer wall of the connecting column is slidably connected to a connecting cylinder, the inner wall of the connecting cylinder sliding connection port, the outer wall of the connecting cylinder is provided with a braking groove, the inside of the braking groove is slidably connected to a triangular clamp block, one end of the triangular clamp block is fixedly connected to the inner wall of the braking groove by a spring.

[0011] Preferably, the bottom end of the connecting tube is fixedly connected to a fixing plate, the fixing plate is slidably connected to a clamping rod inside, the outer wall of the clamping rod is fixedly connected to one side of the fixing plate with a spring, the clamping rod is engaged with a limiting groove, a sliding groove is provided at the bottom of the connecting tube, a gradient groove is provided at the bottom of the connecting tube, an axle rod 1 is slidably connected to the inside of the sliding groove, a connecting rod is provided between the axle rod 1 and the clamping rod, one end of the connecting rod is rotatably connected to the outer wall of the brake block, and the other end is rotatably connected to the outer wall of the clamping rod through the axle rod.

[0012] Preferably, a brake block is slidably connected inside the gradient groove, a spring 1 is arranged between the brake block and the connecting tube, one end of the spring 1 is fixedly connected to the bottom of the brake block, and the other end is fixedly connected to the bottom of the connecting tube, and a pressing ring is fixedly connected to the bottom of the brake block.

[0013] The utility model provides a drying device for a silicon wafer cleaning machine. It has the following beneficial effects:

[0014] (1) The utility model lays the cleaned silicon wafers flat inside the filter box, then holds the handle to push the filter box inward along the track of the connecting rail, then moves the magnetic lever so that the magnetic lever is no longer magnetically connected to the magnetic block, so that the magnetic lever controls the card block to rotate, and then engages with the card slot to achieve the effect of relatively fixing the filter box and the fixed frame, then drives the motor to drive the fixed frame to rotate, and under the action of the sliding block and the annular rail, the fixed frame rotates stably, so that under the action of the dryer, the silicon wafer is evenly dried.

[0015] (2) The utility model lays the silicon wafer flat inside the filter box, and then presses the pressing ring according to the thickness of the silicon wafer, so that the brake block slides along the trajectory of the gradient groove, so that the brake block squeezes the shaft rod 1, and controls the shaft rods 1 on both sides to slide toward each other along the trajectory of the slide groove, so that with the assistance of the connecting rod, the clamping rods on both sides move relatively, so that the clamping rods are no longer engaged with the limiting groove, thereby controlling the connecting tube to slide along the outer wall of the connecting column, and after sliding to a suitable position, loosening the connecting column, so that the pressing ring is controlled to reset under the action of the spring 1, and the clamping rod is controlled to be engaged with the limiting groove again under the action of the spring, and then the filter plate is placed inside the filter box, so that the connecting port squeezes the triangular clamping block, and the triangular clamping block is controlled to shrink inwardly until the triangular clamping block completely passes through the connecting port, and resets under the action of the spring, thereby achieving the effect of fixing the filter plate, and then driving the hydraulic pump to squeeze the pressing plate against the filter plate, forcing the gap between the filter plate and the filter box to be reduced, thereby achieving the pretreatment effect of dewatering the silicon wafer. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 This is the main schematic diagram of the overall structure of the utility model;

[0017] Figure 2 This is a front view of the overall structure of the utility model;

[0018] Figure 3 This is a view of the drying part of the utility model;

[0019] Figure 4 This is a view of the pretreatment part of the utility model;

[0020] Figure 5 This is a detailed view of the pretreatment part of the utility model.

[0021] In the figure: 1 drying box, 2 drying part, 3 pretreatment part, 4 collection box, 5 bottom leg;

[0022] 211 motor, 212 fixing frame, 213 ring rail, 214 connecting rail, 215 dryer, 216 filter box, 217 handle, 218 magnetic lever, 219 magnetic block, 220 card block;

[0023] 311 hydraulic pump, 312 pressing plate, 313 filter plate, 314 connecting column, 315 connecting tube, 316 triangular clamping block, 317 fixing plate, 318 clamping rod, 319 connecting rod, 320 shaft rod 1, 321 brake block, 322 spring 1, 323 pressing ring. DETAILED DESCRIPTION

[0024] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0025] In the present invention, unless otherwise clearly specified and limited, the terms "install", "connect", "connect", "fix" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances. Embodiment 1

[0026] The preferred embodiment of the drying device for a silicon wafer cleaning machine provided by the utility model is as follows Figure 1-5 As shown: a drying device for a silicon wafer cleaning machine, including a drying box 1, the outer wall of the drying box 1 is provided with a replacement port, the outer wall of the drying box 1 is provided with a transfer port; a drying part 2 arranged inside the drying box 1; a pretreatment part 3 arranged inside the drying box 1; a collecting box 4, slidably connected to the inside of the drying box 1, the collecting box 4 is adapted to the transfer port; and a bottom leg 5, fixedly connected to the bottom of the drying box 1.

[0027] The drying part 2 includes: a motor 211, fixedly connected to the outer wall of the drying box 1; a ring rail 213, fixedly connected to the inner wall of the drying box 1; a connecting rail 214, fixedly connected to the inner wall of the drying box 1; and a dryer 215, fixedly connected to the top of the inner wall of the drying box 1, and arranged equidistantly around the circumference.

[0028] The output end of the motor 211 passes through the drying box 1 and is fixedly connected to a fixed frame 212. A sliding block is fixedly connected to one side of the fixed frame 212. The sliding block is adapted to the annular rail 213. A card slot is provided on the inner side of the fixed frame 212. A sliding rail is fixedly connected to the inner side of the fixed frame 212. The sliding rail is adapted to a connecting rail 214. A filter box 216 is slidably connected to the outer wall of the connecting rail 214.

[0029] A connection port is provided inside the filter box 216, a handle 217 is fixedly connected to one side of the filter box 216, a magnetic block 219 is fixedly connected to one side of the filter box 216, a magnetic lever 218 is rotatably connected to one side of the filter box 216, one end of the magnetic lever 218 passes through the filter box 216 and is fixedly connected to a clamping block 220, which is adapted to the clamping slot.

[0030] Furthermore, the present embodiment spreads the cleaned silicon wafers into the interior of the filter box 216, and then holds the handle 217 to push the filter box 216 inward along the track of the connecting rail 214, and then moves the magnetic lever 218 so that the magnetic lever 218 is no longer magnetically connected to the magnetic block 219, so that the magnetic lever 218 controls the rotation of the card block 220, and then engages with the card slot to achieve the effect of relative fixation of the filter box 216 and the fixed frame 212, and then drives the motor 211 to make the motor 211 drive the fixed frame 212 to rotate, and under the action of the sliding block and the annular rail 213, the fixed frame 212 rotates stably, so that under the action of the dryer 215, the silicon wafer is evenly dried. Embodiment 2

[0031] Based on Example 1, a preferred embodiment of a drying device for a silicon wafer cleaning machine provided by the utility model is as follows: Figure 1-5 As shown, the pretreatment part 3 includes: a hydraulic pump 311 fixedly connected to the top of the drying box 1; and a filter plate 313 slidably connected to the inside of the filter box 216.

[0032] The output end of the hydraulic pump 311 passes through the drying box 1 and is fixedly connected with a pressing plate 312, which is adapted to the filter plate 313. A connecting column 314 is fixedly connected to the bottom of the filter plate 313. The outer wall of the connecting column 314 is provided with a limiting groove, which is equidistantly arranged. The outer wall of the connecting column 314 is slidably connected with a connecting cylinder 315, and the inner wall of the connecting cylinder 315 is slidably connected to the connecting port. The outer wall of the connecting cylinder 315 is provided with a braking groove, and a triangular block 316 is slidably connected to the inside of the braking groove, and one end of the triangular block 316 is fixedly connected to the inner wall of the braking groove with a spring.

[0033] The bottom end of the connecting tube 315 is fixedly connected with a fixing plate 317, and the fixing plate 317 is internally slidably connected with a clamping rod 318, the outer wall of the clamping rod 318 is fixedly connected with a spring on one side of the fixing plate 317, the clamping rod 318 is engaged with the limiting groove, a sliding groove is provided at the bottom of the connecting tube 315, and a gradient groove is provided at the bottom of the connecting tube 315, and an axle rod 320 is slidably connected inside the sliding groove, and a connecting rod 319 is arranged between the axle rod 320 and the clamping rod 318, one end of the connecting rod 319 is rotatably connected to the outer wall of the brake block 321, and the other end is rotatably connected to the outer wall of the clamping rod 318 through the axle rod.

[0034] A brake block 321 is slidably connected inside the gradient groove, a spring 322 is provided between the brake block 321 and the connecting tube 315, one end of the spring 322 is fixedly connected to the bottom of the brake block 321, and the other end is fixedly connected to the bottom of the connecting tube 315, and a pressing ring 323 is fixedly connected to the bottom of the brake block 321.

[0035] Furthermore, in this embodiment, after the silicon wafer is flattened into the interior of the filter box 216, the pressing ring 323 is pressed according to the thickness of the silicon wafer, so that the brake block 321 slides along the trajectory of the gradient groove, and the brake block 321 squeezes the shaft rod 1 320, and the shaft rods 1 320 on both sides are controlled to slide toward each other along the trajectory of the slide groove, so that with the assistance of the connecting rod 319, the clamping rods 318 on both sides move relative to each other, so that the clamping rods 318 are no longer engaged with the limiting groove, so as to control the connecting tube 315 to slide along the outer wall of the connecting column 314, and after sliding to a suitable position, the connecting column 314 is loosened, so that the spring 1 322 The pressing ring 323 is controlled to reset under the action of the spring, and the control clamping rod 318 is controlled to engage with the limiting groove again under the action of the spring, and then the filter plate 313 is placed in the interior of the filter box 216, so that the connecting port squeezes the triangular clamping block 316, and the triangular clamping block 316 is controlled to shrink inward until the triangular clamping block 316 completely passes through the connecting port and resets under the action of the spring to achieve the effect of fixing the filter plate 313, and then the hydraulic pump 311 is driven to make the pressing sheet 312 squeeze the filter plate 313, forcing the gap between the filter plate 313 and the filter box 216 to be reduced, thereby achieving the pretreatment effect of dehydrating the silicon wafer.

[0036] When in use, first, the cleaned silicon wafer is flattened into the interior of the filter box 216, and then the handle 217 is held to push the filter box 216 into the interior along the track of the connecting rail 214, and then the magnetic lever 218 is toggled so that the magnetic lever 218 is no longer magnetically connected to the magnetic block 219, so that the magnetic lever 218 controls the card block 220 to rotate, and then engages with the card slot to achieve the effect of relatively fixing the filter box 216 and the fixed frame 212, and then the motor 211 is driven to make the motor 211 drive the fixed frame 212 to rotate, and under the action of the sliding block and the annular rail 213, the fixed frame 212 rotates stably, so that under the action of the dryer 215, the silicon wafer is evenly dried; secondly, after the silicon wafer is flattened into the interior of the filter box 216, according to the thickness of the silicon wafer, the pressing ring 323 is pressed to make the brake block 321 slide along the track of the gradient groove, so that the brake block 321 squeezes the shaft rod 1 320 to control the two sides The cam 314 is pressed against the top of the support frame 316 to push the support frame 318 back into position, and the cam 314 is pressed against the support frame 316 to push the support frame 318 back into position, thereby releasing the support frame 316.

[0037] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.

[0038] Finally, it should be noted that the above are only preferred embodiments of the present invention and are not intended to limit the present invention. Although the present invention has been described in detail with reference to the above embodiments, those skilled in the art can still modify the technical solutions described in the above embodiments or replace some of the technical features therein by equivalents. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

Claims

1. A drying device for a silicon wafer cleaning machine, characterized in that: It comprises a drying box (1), wherein the outer wall of the drying box (1) is provided with a replacement port, and the outer wall of the drying box (1) is provided with a transmission port; A drying area (2) disposed inside the drying box (1); A pretreatment portion (3) disposed inside the drying box (1); A collecting box (4) is slidably connected to the interior of the drying box (1), and the collecting box (4) is adapted to the transmission port; The bottom leg (5) is fixedly connected to the bottom of the drying box (1).

2. A drying device for a silicon wafer cleaning machine according to claim 1, characterized in that: The drying part (2) comprises: A motor (211) fixedly connected to an outer wall of the drying box (1); An annular rail (213) fixedly connected to the inner wall of the drying box (1); A connecting rail (214) fixedly connected to the inner wall of the drying box (1); The dryers (215) are fixedly connected to the top of the inner wall of the drying box (1) and are arranged at equal intervals around the circumference.

3. A drying device for a silicon wafer cleaning machine according to claim 2, characterized in that: The output end of the motor (211) passes through the drying box (1) and is fixedly connected to a fixed frame (212); a sliding block is fixedly connected to one side of the fixed frame (212); the sliding block is matched with the annular rail (213); a slot is provided on the inner side of the fixed frame (212); a sliding rail is fixedly connected to the inner side of the fixed frame (212); the sliding rail is matched with the connecting rail (214); and a filter box (216) is slidably connected to the outer wall of the connecting rail (214).

4. A drying device for a silicon wafer cleaning machine according to claim 3, characterized in that: A connection port is provided inside the filter box (216); a handle (217) is fixedly connected to one side of the filter box (216); a magnetic block (219) is fixedly connected to one side of the filter box (216); a magnetic lever (218) is rotatably connected to one side of the filter box (216); one end of the magnetic lever (218) passes through the filter box (216) and is fixedly connected to a clamping block (220); the clamping block (220) is adapted to fit the clamping slot.

5. The drying device for a silicon wafer cleaning machine according to claim 1, characterized in that: The pretreatment part (3) includes: A hydraulic pump (311) is fixedly connected to the top of the drying box (1); The filter plate (313) is slidably connected to the interior of the filter box (216).

6. A drying device for a silicon wafer cleaning machine according to claim 5, characterized in that: The output end of the hydraulic pump (311) passes through the drying box (1) and is fixedly connected to a pressing plate (312). The pressing plate (312) is adapted to the filter plate (313). The bottom of the filter plate (313) is fixedly connected to a connecting column (314). The outer wall of the connecting column (314) is provided with limiting grooves which are arranged at equal intervals. The outer wall of the connecting column (314) is slidably connected to a connecting cylinder (315). The inner wall of the connecting cylinder (315) is slidably connected to the inner wall of the connecting port. The outer wall of the connecting cylinder (315) is provided with a braking groove. A triangular clamping block (316) is slidably connected to the interior of the braking groove. One end of the triangular clamping block (316) is fixedly connected to the inner wall of the braking groove by a spring.

7. A drying device for a silicon wafer cleaning machine according to claim 6, characterized in that: The bottom end of the connecting tube (315) is fixedly connected to a fixing plate (317), the fixing plate (317) is slidably connected to a clamping rod (318) inside, the outer wall of the clamping rod (318) is fixedly connected to one side of the fixing plate (317) with a spring, the clamping rod (318) is snap-fitted and connected to the limiting groove, a sliding groove is provided at the bottom of the connecting tube (315), a gradient groove is provided at the bottom of the connecting tube (315), an axle rod 1 (320) is slidably connected inside the sliding groove, a connecting rod (319) is provided between the axle rod 1 (320) and the clamping rod (318), one end of the connecting rod (319) is rotatably connected to the outer wall of the brake block (321), and the other end is rotatably connected to the outer wall of the clamping rod (318) through the axle rod.

8. The drying device for a silicon wafer cleaning machine according to claim 7, characterized in that: A brake block (321) is slidably connected inside the gradient groove, a spring (322) is provided between the brake block (321) and the connecting tube (315), one end of the spring (322) is fixedly connected to the bottom of the brake block (321), and the other end is fixedly connected to the bottom of the connecting tube (315), and a pressing ring (323) is fixedly connected to the bottom of the brake block (321).

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