Tooling for adjusting the relative parallelism of crystals on a disk

Abstract

The utility model provides a tool for adjusting the relative parallelism of crystals on a disk. The base includes a base bottom plate, and a mounting shaft arranged on the base bottom plate, the mounting shaft is a cylindrical structure arranged relative to the upper end surface of the base bottom plate; the bearing is sleeved on the mounting shaft; the end surface of the rotating platform body is arranged in contact with the bearing; a through hole is arranged along the axial direction of the platform body, and the aperture of the through hole is not less than the axial diameter of the mounting shaft; a limited sleeve is arranged along the end surface of the rotating platform, and the caliber of the limited sleeve is configured to be sleeved on the outer side of the bearing, and after the rotating platform is sleeved on the bearing, a gap is set between the bottom end of the limited sleeve of the rotating platform and the upper end surface of the base; a reference block is arranged on the upper end surface of the mounting shaft, located in the space defined by the through hole, and the height of the upper end surface of the reference block is less than the height of the upper end surface of the rotating platform.

Description

Technical Field

[0001] The utility model relates to the technical field of optical processing, in particular to a tool for adjusting the relative parallelism of crystals on a disk. Background Art

[0002] For laser crystals, especially round rod laser crystals such as YAG rods, the parallelism of the two light-transmitting surfaces is an extremely important indicator in the processing process. As we all know, the crystal polishing process is to first use the side of the crystal to polish one of the light-transmitting surfaces. In order to ensure that the other light-transmitting surface is parallel to the surface that has been brightened and polished, the other surface is usually not polished based on the side. Because this processing method has low precision, the polished side is usually used as a reference, and a comparison goniometer is used to adjust the parallelism of the polished surface and the bottom surface of the polishing plate (or polishing fixture).

[0003] The existing method of adjusting parallelism is to place a piece of optical plastic board on the workbench of the comparison goniometer. At least the upper bottom surface of the optical plastic board is a bright surface, and the autocollimation telescope is perpendicular to the bottom surface of the optical plastic board. The leveling process is to place the crystal plate on the optical plastic board, and adjust it while rotating the crystal plate. This rotation step is exactly the operation mode of simulating the crystal plate on the grinding and polishing plate. When the rotating platform rotates one circle and the cursor on the display screen remains stationary, the parallelism of the crystal on the plate is adjusted.

[0004] However, during long-term use, the optical plastic plate will suffer varying degrees of wear, which will lead to inaccurate adjustment of parallelism and invisibly increase the difficulty of adjustment. Utility Model Content

[0005] The utility model aims to solve one of the above-mentioned technical problems and provide a tool for adjusting the relative parallelism of crystals on a disk, so as to simplify the adjustment method and adjustment accuracy of the crystal parallelism.

[0006] To achieve the above purpose, the utility model adopts the following technical solutions:

[0007] A tool for adjusting the relative parallelism of crystals on a disk, comprising:

[0008] Base: including a base bottom plate, and a mounting shaft arranged on the base bottom plate, wherein the mounting shaft is a cylindrical structure arranged relative to the upper end surface of the base bottom plate;

[0009] Bearing: mounted on the mounting shaft;

[0010] The rotating platform comprises a platform body, the end face of which is fitted with a bearing; a through hole is provided along the axial direction of the platform body, and the aperture of the through hole is not less than the diameter of the mounting shaft; a limited sleeve is provided along the end face of the rotating platform, and the aperture of the limited sleeve is configured to be able to be sleeved on the outside of the bearing. After the rotating platform is sleeved on the bearing, a gap is provided between the bottom end of the limited sleeve of the rotating platform and the upper end face of the base;

[0011] The reference block is arranged on the upper end surface of the mounting shaft and is located in the space defined by the through hole, and the height of the upper end surface of the reference block is smaller than the height of the upper end surface of the rotating platform.

[0012] In some embodiments of the utility model, a transition section is arranged between the base bottom plate and the installation shaft. The transition section is a cylindrical structure arranged relative to the upper end surface of the base bottom plate. The radial dimension of the transition section is larger than the radial dimension of the installation shaft, smaller than the radial dimension of the base bottom plate, and larger than the radial dimension of the bearing hole; the transition section fits the inner ring of the bearing.

[0013] In some embodiments of the present invention, the base bottom plate is a cylinder, and the installation axis is located at the center of the base bottom plate in the axial direction.

[0014] In some embodiments of the utility model, the axial height of the base bottom plate is smaller than the axial height of the installation shaft and larger than the axial height of the transition section.

[0015] In some embodiments of the utility model, a protruding section is provided along the circumferential edge of the through hole in a direction toward one side of the base, and the protruding section fits the inner ring of the bearing.

[0016] In some embodiments of the present invention, the reference block is made of a photoresist board.

[0017] In some embodiments of the present invention, the radial dimension of the reference block is smaller than the radial dimension of the bearing.

[0018] In some embodiments of the utility model, the upper peripheral edge and the lower peripheral edge of the base bottom plate are chamfered.

[0019] In some embodiments of the utility model, the base and the rotating platform are made of stainless steel.

[0020] Compared with the prior art, the technical advantages of the utility model are:

[0021] 1. A rotatable structure that can be fixed on the goniometer is constructed between the base and the rotating platform. The level of the rotating platform can be adjusted within a range of 360° by fixing the reference block on the rotating platform and adjusting the level of the platform while rotating. The horizontal position of the base and the rotating platform is adjusted according to the reference block to ensure the horizontal position of the processed crystal.

[0022] 2. The tooling structure is simple and stable, easy to use, and will not break down for a long time with normal maintenance; in addition, the tooling rotating platform is made of stainless steel, which is wear-resistant and has a long service life. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative labor.

[0024] Figure 1 is a schematic diagram of the base structure;

[0025] Figure 2 It is a schematic diagram of the rotating platform structure;

[0026] Figure 3 This is a structural diagram of the installation status of the base and the rotating platform;

[0027] Figure 4 It is a schematic diagram of the cross-sectional structure of the base and the rotating platform;

[0028] Figure 5 This is a diagram of the working state of the tooling goniometer.

[0029] In the above figures:

[0030] 1-base, 101-base bottom plate, 102-mounting shaft, 103-transition section;

[0031] 2-Bearing;

[0032] 3-rotating platform, 301-platform body, 302-through hole, 303-limiting sleeve, 304-protruding section;

[0033] 4- Benchmark block;

[0034] 5-goniometer, 501-goniometer base, 502-illuminator. DETAILED DESCRIPTION

[0035] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present invention more clearly understood, the present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention.

[0036] It should be noted that when an element is referred to as being "disposed on", "connected to", or "fixed to" another element, it may be directly on the other element or indirectly on the other element. When an element is referred to as being "connected to" another element, it may be directly connected to the other element or indirectly connected to the other element. In addition, the terms "first" and "second" are used for descriptive purposes only and are not to be understood as indicating or implying relative importance.

[0037] The utility model provides a tool for adjusting the relative parallelism of the crystal on the disk, which is used to adjust the parallelism of the crystal during the crystal polishing process to ensure the parallelism of the crystal on both sides. The tool provided by the utility model mainly includes four parts, namely, a base 1, a bearing 2, a rotating platform 3, and a reference block 4. The assembly structure is referenced Figure 3 and Figure 4 .

[0038] refer to Figure 1 The base 1 includes a base bottom plate 101 and a mounting shaft 102 disposed on the base bottom plate 101. The mounting shaft 102 is a cylindrical structure disposed relative to the upper end surface of the base bottom plate 101. In this embodiment, the base 1 is made of stainless steel. To prevent the sharp edge of the base 1 from scratching the user, the edges of the upper and lower bottom surfaces of the base 1 are chamfered by 1 mm.

[0039] In the use state, the base 1 is used to be fixed on the comparison goniometer 5, so one side of the base bottom plate 101 is flat, and in this embodiment, it is a circular plate, and because it has a certain height, it is a short cylindrical shape. As a preferred embodiment, the mounting shaft 102 is located at the center of the base bottom plate 101 in the axial direction, that is, at the center of the plate surface.

[0040] The mounting shaft 102 on the base bottom plate 101 is used to fit the bearing 2. The diameter of the bearing 2 matches the diameter of the mounting shaft 102 and is slightly larger than the diameter of the mounting shaft 102 to ensure that the bearing 2 can be fitted on the mounting shaft 102. However, the diameter of the bearing 2 is not too large to avoid shaking during the rotation process. In this embodiment, the model of the bearing 2 is 6009, with an outer diameter of 75 mm, an inner diameter of 45 mm, and a width of 16 mm.

[0041] refer to Figure 2 The rotating platform 3 is further mounted on the outer side of the bearing 2, and includes a platform body 301, and the end surface of the platform body 301 close to the base 1 is arranged to fit the upper end surface of the bearing 3. A through hole 302 is arranged along the axial direction of the platform body 301, and the aperture of the through hole 302 is not less than the diameter of the mounting shaft 102, so as to ensure that the rotating platform 3 does not generate friction with the mounting shaft 102 during the rotation process.

[0042] A limiting sleeve 303 is arranged along the end surface of the rotating platform 3, and the diameter of the limiting sleeve 303 is configured to be able to be mounted on the outer side of the bearing 2; after the rotating platform 3 is mounted on the bearing 2, a gap is set between the bottom end of the rotating platform limiting sleeve 303 and the upper end surface of the base 1 to avoid motion interference between the rotating platform 3 and the base 1.

[0043] The reference block 4 is made of a light plastic board as a reference for measuring the horizontality, so the parallelism of the reference block 4 must be good. When the rotating platform 3 is mounted on the bearing 2, the upper end face of the mounting shaft 102 is exposed, and the reference block 4 is set on the upper end face of the mounting shaft 103. The size of the reference block 4 is configured so that after the reference block 4 is set on the upper end face of the mounting shaft 103, the height of the upper end face of the reference block 103 is less than the height of the upper end face of the rotating platform 3 away from the base 1, so that the reference block 4 is located in the space defined by the through hole 302 to avoid escaping from the space. As a preferred embodiment, the radial dimension of the reference block 4 is smaller than the radial dimension of the bearing 2.

[0044] In some embodiments of the present invention, a transition section 103 is provided between the base bottom plate 101 and the mounting shaft 102. The transition section 103 is a cylindrical structure provided relative to the upper end surface of the base bottom plate. The radial dimension of the transition section 103 is larger than the radial dimension of the mounting shaft 103, smaller than the radial dimension of the base bottom plate 101, and larger than the radial dimension of the bearing hole. The function of the transition section 103 is to lower the bearing 2.

[0045] As a preferred implementation, in some embodiments of the present invention, the axial height of the base bottom plate 101 is smaller than the axial height of the installation shaft 102 , and larger than the axial height of the transition section 103 .

[0046] In some embodiments of the present invention, a protruding section 304 is provided along the circumferential edge of the through hole 302 in a direction toward one side of the base 1 , and the protruding section 304 fits against the upper end surface of the bearing 1 .

[0047] A three-section coaxial structure is formed between the base bottom plate 101, the transition section 103 and the installation shaft 102. The platform body 301, the protruding section 304 and the limiting sleeve 303 also form a three-section coaxial structure. The transition section 103 and the protruding section 304 are respectively matched with the inner ring of the bearing 2 to limit and fix the bearing 2 at the bottom and top to ensure stable rotation of the fixture.

[0048] In order to ensure the processing accuracy, it is necessary to ensure the processing accuracy of the tooling itself. After the base 1, the reference block 4, and the rotating platform 3 are assembled, the parallelism of each component needs to be ensured. The parallelism between the bottom surface of the base 1 and the top surface of the rotating platform 3 needs to be controlled within 10″.

[0049] The usage of this tool is as follows, refer to Figure 5 .

[0050] Adjust the crystal plates to ensure tooling accuracy. Fix the base to the goniometer base 501 with double-sided tape, and assemble the bearing 2, the rotating platform 3 and the reference block 4. It should be noted that in the preferred embodiment, the center of the base bottom plate 101 needs to be aligned with the light emitter 502 to ensure that the reference block 4 is located on the light path of the light emitter 502.

[0051] The light emitter 502 emits a cross cursor to observe whether the light path on the reference block 4 is in the original position and whether deflection occurs. If manual observation is inaccurate, an external display can be connected to observe the position of the cursor on the reference block 4. If the cursor on the reference block 4 is in the original position, it proves that the levelness of the tooling meets the requirements for use.

[0052] If the cross cursor is not in the original position, the horizontality of the tooling can be judged by the deflection of the cursor. Add a pad at the low point and adjust the tooling to the level. The pad can be made of double-sided tape.

[0053] The rotating platform 3 is rotated one circle to adjust the tooling to be horizontal from all angles.

[0054] After the crystal is placed on the plate, place the crystal plate in the middle of the rotating platform 3, making sure that the bright side of the crystal faces upward and is aligned with the self-luminous device. Rotate the rotating platform 3, and the crystal plate rotates with the rotating platform. Adjust the fine-tuning knob while rotating until the rotating platform 3 rotates one circle and the cursor on the display returns to its original position and remains stationary, which means that the parallelism of the crystal on the plate relative to the bottom surface of the polishing plate (or polishing fixture) is adjusted.

[0055] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. A tool for adjusting the relative parallelism of crystals on a disk, characterized in that: include: Base: including a base bottom plate, and a mounting shaft arranged on the base bottom plate, wherein the mounting shaft is a cylindrical structure arranged relative to the upper end surface of the base bottom plate; Bearing: mounted on the mounting shaft; The rotating platform comprises a platform body, the end face of which is fitted with a bearing; a through hole is provided along the axial direction of the platform body, and the aperture of the through hole is not less than the diameter of the mounting shaft; a limited sleeve is provided along the end face of the rotating platform, and the aperture of the limited sleeve is configured to be able to be sleeved on the outside of the bearing. After the rotating platform is sleeved on the bearing, a gap is provided between the bottom end of the limited sleeve of the rotating platform and the upper end face of the base; The reference block is arranged on the upper end surface of the mounting shaft and is located in the space defined by the through hole, and the height of the upper end surface of the reference block is smaller than the height of the upper end surface of the rotating platform.

2. The tooling for adjusting the relative parallelism of crystals on a disk as claimed in claim 1, characterized in that: A transition section is arranged between the base bottom plate and the mounting shaft. The transition section is a cylindrical structure arranged relative to the upper end surface of the base bottom plate. The radial dimension of the transition section is larger than the radial dimension of the mounting shaft, smaller than the radial dimension of the base bottom plate, and larger than the radial dimension of the bearing hole. The transition section fits the inner ring of the bearing.

3. The tooling for adjusting the relative parallelism of crystals on a disk as claimed in claim 1 or 2, characterized in that: The base bottom plate is a cylinder, and the mounting axis is located at the center of the base bottom plate in the axial direction.

4. The tooling for adjusting the relative parallelism of crystals on a disk as claimed in claim 2, characterized in that: The axial height of the base bottom plate is smaller than the axial height of the mounting shaft, and larger than the axial height of the transition section.

5. The tooling for adjusting the relative parallelism of crystals on a disk as claimed in claim 1, characterized in that: A protruding section is provided along the circumferential edge of the through hole in a direction toward one side of the base, and the protruding section fits the inner ring of the bearing.

6. The tooling for adjusting the relative parallelism of crystals on a disk as claimed in claim 1, characterized in that: The reference block is made of a light-coated board.

7. The tooling for adjusting the relative parallelism of crystals on a disk as claimed in claim 1 or 6, characterized in that: The radial dimension of the reference block is smaller than the radial dimension of the bearing.

8. The tooling for adjusting the relative parallelism of crystals on a disk as claimed in claim 1, characterized in that: The upper peripheral edge and the lower peripheral edge of the base bottom plate are chamfered.

9. The tooling for adjusting the relative parallelism of crystals on a disk as claimed in claim 1, characterized in that: The base and the rotating platform are made of stainless steel.

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